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JPS53129587A - Electron beam exposure unit - Google Patents

Electron beam exposure unit

Info

Publication number
JPS53129587A
JPS53129587A JP4433777A JP4433777A JPS53129587A JP S53129587 A JPS53129587 A JP S53129587A JP 4433777 A JP4433777 A JP 4433777A JP 4433777 A JP4433777 A JP 4433777A JP S53129587 A JPS53129587 A JP S53129587A
Authority
JP
Japan
Prior art keywords
electron beam
exposure unit
beam exposure
irradiating
inspecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4433777A
Other languages
Japanese (ja)
Inventor
Nobuaki Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP4433777A priority Critical patent/JPS53129587A/en
Publication of JPS53129587A publication Critical patent/JPS53129587A/en
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To expose the sample surface to light while inspecting it by irradiating low velocity beam, apart from the pattern drawing beam irradiating system, to detect secondary electrons or reflected electrons.
COPYRIGHT: (C)1978,JPO&Japio
JP4433777A 1977-04-18 1977-04-18 Electron beam exposure unit Pending JPS53129587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4433777A JPS53129587A (en) 1977-04-18 1977-04-18 Electron beam exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4433777A JPS53129587A (en) 1977-04-18 1977-04-18 Electron beam exposure unit

Publications (1)

Publication Number Publication Date
JPS53129587A true JPS53129587A (en) 1978-11-11

Family

ID=12688691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4433777A Pending JPS53129587A (en) 1977-04-18 1977-04-18 Electron beam exposure unit

Country Status (1)

Country Link
JP (1) JPS53129587A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56110923A (en) * 1980-02-04 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Reduction, projection and exposure device
JPS58103151A (en) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd Inspection of semiconductor substrate
JPS58103150A (en) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd Manufacture of semiconductor substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56110923A (en) * 1980-02-04 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Reduction, projection and exposure device
JPS58103151A (en) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd Inspection of semiconductor substrate
JPS58103150A (en) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd Manufacture of semiconductor substrate

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