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JPS5240986A - Process for production of semiconductor element - Google Patents

Process for production of semiconductor element

Info

Publication number
JPS5240986A
JPS5240986A JP11597375A JP11597375A JPS5240986A JP S5240986 A JPS5240986 A JP S5240986A JP 11597375 A JP11597375 A JP 11597375A JP 11597375 A JP11597375 A JP 11597375A JP S5240986 A JPS5240986 A JP S5240986A
Authority
JP
Japan
Prior art keywords
production
semiconductor element
resistance layer
resistance
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11597375A
Other languages
Japanese (ja)
Inventor
Toshio Yonezawa
Takashi Yasujima
Takashi Amano
Hiroichi Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11597375A priority Critical patent/JPS5240986A/en
Publication of JPS5240986A publication Critical patent/JPS5240986A/en
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE: To suppress the depletion layer extending to the inside of resistance layer thereby reducing the variations in resistivity owing to application of reverse bias between high resistance layer and collector resistance.
COPYRIGHT: (C)1977,JPO&Japio
JP11597375A 1975-09-27 1975-09-27 Process for production of semiconductor element Pending JPS5240986A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11597375A JPS5240986A (en) 1975-09-27 1975-09-27 Process for production of semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11597375A JPS5240986A (en) 1975-09-27 1975-09-27 Process for production of semiconductor element

Publications (1)

Publication Number Publication Date
JPS5240986A true JPS5240986A (en) 1977-03-30

Family

ID=14675700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11597375A Pending JPS5240986A (en) 1975-09-27 1975-09-27 Process for production of semiconductor element

Country Status (1)

Country Link
JP (1) JPS5240986A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176769A (en) * 1981-04-21 1982-10-30 Nippon Telegr & Teleph Corp <Ntt> Semiconductor device and manufacture thereof
JPS63169057A (en) * 1985-12-27 1988-07-13 ビユル　エス．　アー． Method of forming electric resistor by doping semiconductor material and integrated circuit manufactured by the method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4844064A (en) * 1971-10-08 1973-06-25
JPS49132984A (en) * 1971-11-01 1974-12-20

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4844064A (en) * 1971-10-08 1973-06-25
JPS49132984A (en) * 1971-11-01 1974-12-20

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176769A (en) * 1981-04-21 1982-10-30 Nippon Telegr & Teleph Corp <Ntt> Semiconductor device and manufacture thereof
JPS63169057A (en) * 1985-12-27 1988-07-13 ビユル　エス．　アー． Method of forming electric resistor by doping semiconductor material and integrated circuit manufactured by the method
JPH0558672B2 (en) * 1985-12-27 1993-08-27 Bull Sa

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