Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/016—Diazonium salts or compounds
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/20—Exposure; Apparatus therefor
  • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
  • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
  • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Optics & Photonics (AREA)
• Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
• Photosensitive Polymer And Photoresist Processing (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Dot-Matrix Printers And Others (AREA)
• Laser Beam Printer (AREA)
• Exposure Or Original Feeding In Electrophotography (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=24789881

Family Applications (1)

Country Status (8)

Cited By (4)

Families Citing this family (4)

• 1977
  • 1977-06-03 CA CA279,807A patent/CA1094860A/en not_active Expired
  • 1977-06-04 DE DE19772725309 patent/DE2725309A1/en not_active Withdrawn
  • 1977-06-07 NL NL7706254A patent/NL7706254A/en not_active Application Discontinuation
  • 1977-06-08 BE BE178298A patent/BE855507A/en not_active IP Right Cessation
  • 1977-06-08 BR BR7703742A patent/BR7703742A/en unknown
  • 1977-06-08 SE SE7706658A patent/SE7706658L/en not_active Application Discontinuation
  • 1977-06-09 FR FR7717657A patent/FR2354575A1/en active Granted
  • 1977-06-10 JP JP6879477A patent/JPS52151024A/en active Pending

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