JPS52147074A - Ion implantation apparatus - Google Patents
Ion implantation apparatusInfo
- Publication number
- JPS52147074A JPS52147074A JP6361676A JP6361676A JPS52147074A JP S52147074 A JPS52147074 A JP S52147074A JP 6361676 A JP6361676 A JP 6361676A JP 6361676 A JP6361676 A JP 6361676A JP S52147074 A JPS52147074 A JP S52147074A
- Authority
- JP
- Japan
- Prior art keywords
- ion implantation
- implantation apparatus
- ion
- divergence
- reduce
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To reduce the divergence of ion beam fluxes at the time of positive charge ion implantation of large current and perform ion implantation of less loss in current quantity by newly adding a negative ion source.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6361676A JPS5856955B2 (en) | 1976-06-02 | 1976-06-02 | Ion implantation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6361676A JPS5856955B2 (en) | 1976-06-02 | 1976-06-02 | Ion implantation device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52147074A true JPS52147074A (en) | 1977-12-07 |
JPS5856955B2 JPS5856955B2 (en) | 1983-12-17 |
Family
ID=13234412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6361676A Expired JPS5856955B2 (en) | 1976-06-02 | 1976-06-02 | Ion implantation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5856955B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5515206A (en) * | 1978-07-19 | 1980-02-02 | Toshiba Corp | Electronic beam exposure apparatus |
JPS5515205A (en) * | 1978-07-19 | 1980-02-02 | Toshiba Corp | Electronic beam exposure apparatus |
-
1976
- 1976-06-02 JP JP6361676A patent/JPS5856955B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5515206A (en) * | 1978-07-19 | 1980-02-02 | Toshiba Corp | Electronic beam exposure apparatus |
JPS5515205A (en) * | 1978-07-19 | 1980-02-02 | Toshiba Corp | Electronic beam exposure apparatus |
JPS633452B2 (en) * | 1978-07-19 | 1988-01-23 | Tokyo Shibaura Electric Co |
Also Published As
Publication number | Publication date |
---|---|
JPS5856955B2 (en) | 1983-12-17 |
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