JPS5136129A - Kankoseisoseibutsu - Google Patents

Kankoseisoseibutsu

Info

Publication number: JPS5136129A
Authority: JP; Japan
Prior art keywords: kankoseisoseibutsu
Prior art date: 1974-09-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP49109194A

Other languages

Japanese (ja)

Other versions

JPS5241052B2 (en

Inventor

Hiroo Kawada

Keiichi Yumiki

Noritaka Kita

Yoshio Kurita

Minoru Kyono

Masabumi Uehara

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Konica Minolta Inc

Original Assignee

Konica Minolta Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1974-09-20

Filing date

1974-09-20

Publication date

1976-03-26

1974-09-20 Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc

1974-09-20 Priority to JP49109194A priority Critical patent/JPS5136129A/en

1976-03-26 Publication of JPS5136129A publication Critical patent/JPS5136129A/en

1977-10-15 Publication of JPS5241052B2 publication Critical patent/JPS5241052B2/ja

Status Granted legal-status Critical Current

Landscapes

Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Compositions Of Macromolecular Compounds (AREA)

JP49109194A 1974-09-20 1974-09-20 Kankoseisoseibutsu Granted JPS5136129A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP49109194A JPS5136129A (en)	1974-09-20	1974-09-20	Kankoseisoseibutsu

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP49109194A JPS5136129A (en)	1974-09-20	1974-09-20	Kankoseisoseibutsu

Publications (2)

Publication Number	Publication Date
JPS5136129A true JPS5136129A (en)	1976-03-26
JPS5241052B2 JPS5241052B2 (en)	1977-10-15

Family

ID=14503998

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP49109194A Granted JPS5136129A (en)	1974-09-20	1974-09-20	Kankoseisoseibutsu

Country Status (1)

Country	Link
JP (1)	JPS5136129A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52150619A (en) *	1976-06-10	1977-12-14	Toray Industries	Photosensitive resin composition
JPS6389864A (en) *	1986-10-03	1988-04-20	Mitsubishi Kasei Corp	Photosensitive lithographic printing plate
US5068163A (en) *	1988-06-18	1991-11-26	Hoechst Aktiengesellschaft	Radiation-sensitive positive working composition and copying material
US5275908A (en) *	1990-01-27	1994-01-04	Hoechst Aktiengesellschaft	Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof
US5376496A (en) *	1990-02-02	1994-12-27	Hoechst Aktiengesellschaft	Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder
US6190825B1 (en)	1998-01-30	2001-02-20	Agfa-Gevaert N.V.	Polymers containing N-substituted maleimide units and their use in radiation-sensitive mixtures

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3528929A1 (en) *	1985-08-13	1987-02-26	Hoechst Ag	RADIATION-SENSITIVE MIXTURE, THIS CONTAINING RADIATION-SENSITIVE RECORDING MATERIAL AND METHOD FOR THE PRODUCTION OF RELIEF IMAGES
JP4713262B2 (en) *	2005-07-22	2011-06-29	昭和電工株式会社	Photosensitive resin composition
JP4644857B2 (en) *	2005-07-22	2011-03-09	昭和電工株式会社	Photosensitive resin composition

1974
- 1974-09-20 JP JP49109194A patent/JPS5136129A/en active Granted

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52150619A (en) *	1976-06-10	1977-12-14	Toray Industries	Photosensitive resin composition
JPS566536B2 (en) *	1976-06-10	1981-02-12
JPS6389864A (en) *	1986-10-03	1988-04-20	Mitsubishi Kasei Corp	Photosensitive lithographic printing plate
US5068163A (en) *	1988-06-18	1991-11-26	Hoechst Aktiengesellschaft	Radiation-sensitive positive working composition and copying material
US5275908A (en) *	1990-01-27	1994-01-04	Hoechst Aktiengesellschaft	Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof
US5376496A (en) *	1990-02-02	1994-12-27	Hoechst Aktiengesellschaft	Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder
US6190825B1 (en)	1998-01-30	2001-02-20	Agfa-Gevaert N.V.	Polymers containing N-substituted maleimide units and their use in radiation-sensitive mixtures

Also Published As

Publication number	Publication date
JPS5241052B2 (en)	1977-10-15

Publication	Publication Date	Title
FR2287755B1 (en)	1982-02-05
AU7459474A (en)	1975-04-29
AU495821B2 (en)	1976-10-07
AU6599874A (en)	1975-08-28
AU7465674A (en)	1976-04-29
CH608825A5 (en)	1979-01-31
AU480925A (en)	1976-06-17
AU482043A (en)	1976-04-29
AU482369A (en)	1975-12-11
BE829576A (en)	1975-11-28
BE836321A (en)	1976-04-01
BE836685A (en)	1976-04-16
BG19620A1 (en)	1975-10-10
BG19760A1 (en)	1975-10-10
BG19776A1 (en)	1975-10-10
BG19873A1 (en)	1975-10-30
BG20030A1 (en)	1975-10-30
BG20200A1 (en)	1975-11-05
BG20422A1 (en)	1975-12-05
BG20431A1 (en)	1975-12-05
BG20446A1 (en)	1975-12-20
BG20481A1 (en)	1975-12-05
BG20669A1 (en)	1975-12-20
BG20673A1 (en)	1975-12-20
BG20842A1 (en)	1976-01-20