JPS599179A - Surface treatment of thin metallic film - Google Patents
Surface treatment of thin metallic filmInfo
- Publication number
- JPS599179A JPS599179A JP11945682A JP11945682A JPS599179A JP S599179 A JPS599179 A JP S599179A JP 11945682 A JP11945682 A JP 11945682A JP 11945682 A JP11945682 A JP 11945682A JP S599179 A JPS599179 A JP S599179A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- surface treatment
- film metal
- series
- metal according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Record Carriers (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、薄膜金属の表面処理方法に関し、特に薄膜金
属の錆もしくは腐蝕等による拐質の変化を防ぐと共に、
薄膜金属表面の摩擦を小さくする処理方法を提供するも
のである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for surface treatment of thin film metals, and in particular, to prevent changes in particles due to rust or corrosion of thin film metals, and to
The present invention provides a treatment method for reducing friction on a thin film metal surface.
薄膜金属とは、数10μIn以下のノ9みの金属層を持
つ月利であって、構成は該薄膜金属表面であっても1寸
だ基体」二に該薄膜金属が設けらノ1.ていてもよい。A thin film metal is a metal layer having a thickness of several tens of μIn or less, and is composed of a substrate whose surface is only 1 inch thick, and a substrate on which the thin film metal is provided. You can leave it there.
」二連の薄膜金属は、例えば電極に用いらり、る他薄膜
金属がコノ・ルト、コノ・ルI・系合金等の磁七目2料
の場合は磁気記録H旧として有用である。A double series of thin film metals can be used, for example, as electrodes, and if the thin film metal is a magnetic material such as a Conort or Conor I alloy, it is useful for magnetic recording.
従来、これらの薄膜金属の表面の摩擦が大きく例えば磁
気記録H料として薄膜金属を用いると、消磁用、記録用
もしくは再生用のヘッドとの摩擦あるいは薄膜金属のガ
イド部分との摩擦等により薄膜金属の走行が悪く、均一
な磁気記録をし難い金属の金属層はきわめて薄いだめ、
錆が発生すると金属層全体を比較的腐食し易い。このだ
め薄膜金属を例えば電極材Flとして用いた場合1表面
抵抗や体桔抵抗の変化や薄膜金属と媒体との間の電気的
障壁が変化し、媒体への電荷の注入効率が変化する問題
があった。また例えば磁気記録相料として用いた場合、
錆の発生によシ磁気的特性を失うか著しく損う問題があ
った。Conventionally, when a thin film metal is used as a magnetic recording H material, the surface friction of these thin film metals is large, and the thin film metal is damaged due to friction with a demagnetizing, recording or reproducing head, or friction with a guide portion of the thin film metal. The metal layer is extremely thin, making it difficult to perform uniform magnetic recording.
When rust occurs, it is relatively easy to corrode the entire metal layer. If a thin film metal is used, for example, as an electrode material Fl, there are problems such as changes in surface resistance and body resistance, changes in the electrical barrier between the thin film metal and the medium, and changes in charge injection efficiency into the medium. there were. For example, when used as a magnetic recording phase material,
There is a problem in that the magnetic properties are lost or significantly damaged due to the occurrence of rust.
上記問題点を整理すると薄膜金属の金属層が露出してい
ることに起因する。そこで金属層の少なくとも表面を処
理することが考えられる。この処理する相別としては活
性剤が有望である。つまり親水基が金属面(金属層の表
面)に吸着し、親油基が金属面を覆うだめ、水もしくは
酸素と金属面とが接触し難くなり防錆および防食の効果
が生じる。また活性剤の親油基が滑剤となるだめ摩擦を
小さくすることができる。しかし、上述のような効果を
得るためには、活性剤を薄く、かつ、均一に吸着処理す
る必要がある。すなわち活性剤による処理層がJワいと
電極として特性が損われたシ磁気的な信号が弱くなる。The above problems are caused by the fact that the metal layer of the thin metal film is exposed. Therefore, it is possible to treat at least the surface of the metal layer. Activators are promising as a phase separation agent for this treatment. In other words, the hydrophilic groups are adsorbed onto the metal surface (the surface of the metal layer), and the lipophilic groups cover the metal surface, making it difficult for water or oxygen to come into contact with the metal surface, resulting in rust and corrosion prevention effects. In addition, the lipophilic group of the activator acts as a lubricant, making it possible to reduce friction. However, in order to obtain the above effects, it is necessary to adsorb the activator thinly and uniformly. In other words, if the layer treated with the activator is too thick, the electrode characteristics will be impaired and the magnetic signal will become weaker.
また薄くすると均一に付着し難く、活性剤がイ」着して
いない部分から錆が発生する問題点あ−だ。Another problem is that if it is thinned, it will be difficult to adhere uniformly, and rust will occur in areas where the activator has not adhered.
本発明はかかる従来の問題点を克服することのできる薄
膜金属10表面処理力法を提供するものである。The present invention provides a surface treatment method for thin film metal 10 that can overcome these conventional problems.
本発明の薄膜金属の表面処理方法は、有機化合物からな
る活性剤を薄膜金属の表面に付着せしめ、次いで活性剤
が171着した薄膜金属の表面を研摩利で研摩すること
を特徴とする。The method for surface treatment of a thin film metal of the present invention is characterized by attaching an activator made of an organic compound to the surface of the thin film metal, and then polishing the surface of the thin film metal to which the activator has adhered with a polishing tool.
すなわち、本発明は活性剤が付着した金属面を研摩する
ことにより、均一にしかも極めて薄く活性剤が金属面に
付着することをつきとめたことにより外されたものであ
る、
この原因は明白で・はないものの5次の2つの点が考え
られる。That is, the present invention was developed based on the discovery that by polishing the metal surface to which the activator was attached, the activator adhered uniformly and extremely thinly to the metal surface.The reason for this is obvious. Although there is no such thing, the following two points can be considered.
(1)過剰に付着した活性剤が、研摩すると研摩材でぬ
ぐいとられる。(1) Excessive adhering activator is wiped off by the abrasive when polished.
(2)部分的に過剰に付着した活性剤が、研摩によりイ
で1着していない金属表面に171着する。(2) 171 parts of the partially excessively adhered activator are deposited on the metal surface that was not previously deposited in A due to polishing.
」二記2つの点により、活性剤が均一にしかも薄く付着
するものと考えられる。It is thought that the activator adheres uniformly and thinly due to the two points mentioned above.
次に本発明の処理方法について説明する。Next, the processing method of the present invention will be explained.
まず薄膜金属に活性剤を付着する方法としては、使用す
る活性剤を適当な溶媒に溶解もしくは分散した活性剤液
を、エアーナイフ塗工もしくはり7C−ス塗工等の通常
の方法で薄膜金属に塗布して付着させる。次に研摩材で
適当な圧力、速度により薄膜金属に44着した活性剤を
研摩処理する。First, the method of attaching the activator to the thin film metal is to apply an activator liquid in which the activator to be used is dissolved or dispersed in a suitable solvent, and apply it to the thin film metal using a conventional method such as air knife coating or 7C-s coating. Apply it to the surface and let it adhere. Next, the activator adhering to the thin film metal is polished using an abrasive material at an appropriate pressure and speed.
ここで、本発明に用いられる材料について説明する。Here, the materials used in the present invention will be explained.
まず、本発明の薄膜金属に供せられる材料としては鉄、
ニッケル、コノくルト、銅、クロム、またはこれらの合
金などが挙げられる、址だ活性剤としては炭素数6〜2
2の炭化水素化合物、弗化炭化水素化合物のカルボン酸
、スルホン酸およびそれらの塩、第四級アンモニウム系
もしくはベタイン系が供せられる。まだ弗化炭化水素化
合物を親油基とする活性剤は摩擦が小さく−その中でも
ノ4−フルオロ化合物が特に好ましい。また親油基の分
子長(親油基の炭素数)が異なる少なくとも2種以上の
活性剤を用いると9分子長の差によって薄膜金属の金属
面にミクロな凹凸が形成され、摩擦係数が低1;する、
研摩利としては、研摩により薄膜金属の金属表面に傷を
力えないイ」質であればよい。具体的には例えば、鏡面
仕上をした鋼、綿花等の植物性繊維。First, the materials used for the thin film metal of the present invention include iron,
Examples of the activator include nickel, chrome, copper, chromium, or alloys thereof, and those having a carbon number of 6 to 2.
Hydrocarbon compounds of No. 2, carboxylic acids of fluorinated hydrocarbon compounds, sulfonic acids and salts thereof, quaternary ammonium series or betaine series are provided. Active agents having a fluorinated hydrocarbon compound as a lipophilic group have low friction; among these, 4-fluoro compounds are particularly preferred. In addition, when at least two types of activators with different molecular lengths of lipophilic groups (number of carbon atoms in the lipophilic groups) are used, microscopic irregularities are formed on the metal surface of the thin film metal due to the difference in molecular length, resulting in a low coefficient of friction. 1. Yes, the polishing material may be of a good quality that does not damage the metal surface of the thin film metal due to polishing. Specifically, for example, mirror-finished steel and vegetable fibers such as cotton.
絹や羊皮等の動物性繊組等が供される。Animal fibers such as silk and sheepskin are provided.
なお以上述べた例はごく一例であり1本発明に不必要な
限定を加えるものでないこと勿論である。It should be noted that the above-mentioned examples are just examples and do not impose any unnecessary limitations on the present invention.
次に具体的に本発明の実施例について説明する、まず第
1表に示しだ薄膜金属に、エアーナイフ塗工法で、第2
表に示した活性剤液を塗工し、活性剤を金属面にイ”3
着させた。これらに第3表に示したような研摩拐で研摩
した。研摩方法はいずれも研摩利を固定し、薄膜金属を
走行させて行なった。また比較例として第4表に研摩し
ていない薄膜金属をあげだ一実施例巡1〜隔13および
比較例Nn 1〜%10を90℃90係RHに1週間放
置後、顕微鏡による目視で錆を、またひっかき試験機で
腐蝕を評価した。表中0印は錆もしくはひっかき傷がな
い場合、△印は部分的に錆もしくはひっかき傷がでる場
合、X印は全面に錆もしくはひっかき傷がでる場合を示
す。また動摩擦係数の測定は、直径6mmのステンレス
棒に各薄膜金属の金属面を接触して行なった。Next, concrete examples of the present invention will be explained. First, the thin film metal shown in Table 1 was coated with a second coated film using the air knife coating method.
Apply the activator liquid shown in the table and apply the activator to the metal surface for 3 seconds.
I made him wear it. These were polished using the polishing method shown in Table 3. In all polishing methods, the polishing rate was fixed and the thin metal film was moved. As a comparative example, unpolished thin film metals are listed in Table 4. Examples Nos. 1 to 13 and Comparative Examples Nn 1 to %10 were left at 90°C and 90% RH for one week, and then visually observed with a microscope. The corrosion was also evaluated using a scratch tester. In the table, the 0 mark indicates that there is no rust or scratches, the △ mark indicates that rust or scratches appear partially, and the X mark indicates that rust or scratches appear on the entire surface. The coefficient of dynamic friction was measured by contacting the metal surface of each thin film metal with a stainless steel rod having a diameter of 6 mm.
1、第1表〕薄膜金属
り第2表〕話性剤液
〔第3表」実施例
1第4表1比較例
以」二で明らかなように、本発明の薄膜金属の表面処理
方法によれば、動摩擦係数の低下、防錆および防蝕に著
しい効果がある。1. Table 1 Thin film metal coating Table 2 Talking agent liquid Table 3 Example 1 Table 4 Comparative example 2 As is clear from the method for surface treatment of thin film metal of the present invention According to this, it has remarkable effects on reducing the coefficient of dynamic friction, and preventing rust and corrosion.
寸だ本発明の処理方法は、きわめて容易に入手できる研
摩利を用いるため、低コストで行うことができる。さら
に処理方法自体も簡便である。したが−で本発明は工業
的に非常に有用な処理方法を提供するものである。Since the processing method of the present invention uses an extremely easily available polishing tool, it can be carried out at low cost. Furthermore, the processing method itself is simple. However, the present invention provides an industrially very useful treatment method.
Claims (1)
に付着せしめ、次いで上記処理剤がイ」着した薄膜金属
の表面を研摩拐で研摩すると吉を特徴とする薄膜金属の
表面処理方法。 か゛。 (2)N膜金属雪磁性相判から々ることを特徴とする特
許請求の範囲第1項記載の薄膜金属の表面処理方法。 (3)磁性材料がコバルト系合金からなることを特徴と
するIJf1訂請求の範囲第2項記載の薄膜金属の表面
処理方法。 (4)コハルl−系合金カコバルト・ニッケル合金テあ
ることを特徴とする特許請求の範囲第3項記載の薄膜金
属の表面処理方法。 (6)表面処理剤が親油基の分子長が異なる少なくとも
2種の有機化合物からなることを特徴とする特ii/r
請求の範囲第1項記載の薄膜金属の表面処理方法。 (6)有機化合物が炭素数が6〜2^油基を有する炭化
水素化合物または弗化炭化水素化合物であることを特徴
とする特許請求の範囲第1項または第6項記載の薄膜金
属の表面処理方法。 (ア)弗化炭化水素化合物がパーフルオロ化合物である
ことを特徴とする特許請求の範囲第6項記載の薄膜金属
の表面処理方法、 (8)表面処理剤がカルボン酸系、カルボン酸金属塩系
、スルホン酸系、スルホン酸金属塩系、第4級アンモニ
ウムイオン系、燐酸系、燐酸エステル系、燐酸金属塩系
、ベタイン系、スルホン酸アミド系、エーテル系、およ
びアルコール系からなるグループのなかから選ばれた少
なくとも1種の有機化合物からなることを特徴とする特
許請求の範囲第1項記載の薄膜金属の表面処理方法。 (9)研摩材が繊維質体からなることを特徴とする特許
請求の範囲第1項記載の薄膜金属の表面処理方法。 (+ 0)繊維質体が綿花であることを特徴とする特許
請求の範囲第9項記載の薄膜金属の表面処理方法。[Scope of Claims] (1) A thin film characterized in that a surface treatment agent made of an organic compound is attached to the surface of a thin film metal, and then the surface of the thin film metal to which the treatment agent is attached is polished by polishing. Metal surface treatment method. Ka゛. (2) The method for surface treatment of a thin film metal according to claim 1, characterized in that the N film metal snow magnetic phase is varied. (3) The method for surface treatment of a thin film metal according to claim 2 of the IJf1 revision, characterized in that the magnetic material is made of a cobalt-based alloy. (4) A method for surface treatment of a thin film metal according to claim 3, characterized in that a cobalt-nickel alloy is used. (6) Special feature ii/r characterized in that the surface treatment agent consists of at least two types of organic compounds whose lipophilic groups have different molecular lengths.
A method for surface treatment of a thin film metal according to claim 1. (6) The surface of the thin film metal according to claim 1 or 6, wherein the organic compound is a hydrocarbon compound or a fluorinated hydrocarbon compound having 6 to 2 carbon atoms and an oil group. Processing method. (a) A method for surface treatment of a thin film metal according to claim 6, characterized in that the fluorinated hydrocarbon compound is a perfluoro compound; (8) the surface treatment agent is a carboxylic acid type, a carboxylic acid metal salt; Among the groups consisting of sulfonic acid series, sulfonic acid metal salt series, quaternary ammonium ion series, phosphoric acid series, phosphoric acid ester series, phosphate metal salt series, betaine series, sulfonic acid amide series, ether series, and alcohol series. 2. The method for surface treating a thin film metal according to claim 1, wherein the method comprises at least one organic compound selected from the following. (9) A method for surface treating a thin film metal according to claim 1, wherein the abrasive material is made of a fibrous material. (+0) The method for surface treatment of a thin film metal according to claim 9, wherein the fibrous material is cotton.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11945682A JPS599179A (en) | 1982-07-08 | 1982-07-08 | Surface treatment of thin metallic film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11945682A JPS599179A (en) | 1982-07-08 | 1982-07-08 | Surface treatment of thin metallic film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS599179A true JPS599179A (en) | 1984-01-18 |
Family
ID=14761815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11945682A Pending JPS599179A (en) | 1982-07-08 | 1982-07-08 | Surface treatment of thin metallic film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS599179A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02174850A (en) * | 1988-12-28 | 1990-07-06 | Mitsubishi Gas Chem Co Inc | Polycarbonate medical molded product for sterilization by irradiation with radioactive rays |
US10573837B2 (en) | 2015-12-01 | 2020-02-25 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element |
-
1982
- 1982-07-08 JP JP11945682A patent/JPS599179A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02174850A (en) * | 1988-12-28 | 1990-07-06 | Mitsubishi Gas Chem Co Inc | Polycarbonate medical molded product for sterilization by irradiation with radioactive rays |
US10573837B2 (en) | 2015-12-01 | 2020-02-25 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element |
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