JPS5926006A - Detection of beam position in multibeam scanner - Google Patents
Detection of beam position in multibeam scannerInfo
- Publication number
- JPS5926006A JPS5926006A JP13652182A JP13652182A JPS5926006A JP S5926006 A JPS5926006 A JP S5926006A JP 13652182 A JP13652182 A JP 13652182A JP 13652182 A JP13652182 A JP 13652182A JP S5926006 A JPS5926006 A JP S5926006A
- Authority
- JP
- Japan
- Prior art keywords
- beams
- scanning direction
- detection
- scanned
- plural
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Dot-Matrix Printers And Others (AREA)
- Laser Beam Printer (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Facsimile Scanning Arrangements (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、変調b」能な複数のビームをポリコものであ
り、さらに詳しくは、被走査面」−で印字開始位置を決
めるための記号(以下SOS信号という。)を検知する
ビーム位置検知方法に係わる。DETAILED DESCRIPTION OF THE INVENTION The present invention uses a plurality of beams that can be modulated. This relates to a beam position detection method for detecting.
」−記マルチビーム走査装置はシンクルビーム走査装置
に比へポリコンミラーの回転数を低減することかできる
ので耐久性や振動の曲から利点か大きい。しかし、SO
S信号の検知については各ビーム相互の関係か加わるの
で非常に難しくなる。The multi-beam scanning device can reduce the number of rotations of the polycon mirror compared to the shingle beam scanning device, so it has great advantages in terms of durability and vibration resistance. However, S.O.
Detection of the S signal becomes very difficult because it depends on the relationship between each beam.
一つの方法として、ビーム発生装置の相互位置を正確に
決めておいて各ビームのうちの1つのビーム位置のみを
検出し他のビームの位置は検知さレタビームの位置を補
正してSO5信号とするやり方か考えられる。One method is to accurately determine the relative positions of the beam generators, detect only the position of one of the beams, detect the positions of the other beams, and correct the position of the letter beam to generate the SO5 signal. I can think of a way to do it.
例えは、第1図に示すように100μ11間隔て発光部
をもつ半導体レーサー(1)を主走査方向に対してθ飴
壮けて設置し、第2図に示す焦点距離5朋のコリメータ
レンズ(2)ポリコンミラ−(3)及び焦点距11i[
t’ 50Q*mのfθレンス(4)トて被走査面上に
投影する場合を考えると、1oOμn1のビーム間隔に
対し被走査面上で±30μIl+の誤差を許容するとし
ても、ビームは1−00倍に拡大さルルので半導体レー
ザー(1)を傾看ける角度θを−鳴・・爺詰)
の精度としなりれはならない。また、半導体レーサ(1
)の各発光部を階段状にすらす場合は:−二Q、3μI
llの精度ですらさねばならない。このような高精度で
の半導体レーサーの配置或いは、製作は非常に難しいも
のである。For example, as shown in Fig. 1, semiconductor lasers (1) having light emitting parts are placed at 100μ11 intervals and are set θ 1000 in the main scanning direction, and a collimator lens (1) with a focal length of 5 mm as shown in Fig. 2 ( 2) Polycon mirror (3) and focal length 11i [
Considering the case where an fθ lens (4) of t' 50Q*m is projected onto the scanned surface, even if an error of ±30μIl+ is allowed on the scanned surface for a beam spacing of 1oOμn1, the beam will be 1− Since it is magnified 00 times, the angle θ at which the semiconductor laser (1) is tilted must be as accurate as 0.00 times and not distorted. In addition, semiconductor laser (1
) to make each light emitting part step-like: -2Q, 3μI
It has to be even accurate. It is extremely difficult to arrange or manufacture semiconductor lasers with such high precision.
上記方法の変形として、第3図に示すように被走査面上
でのビームの相互位置を各ビーム毎に設けたミラー(5
) (5) (5)で調整することが考えられる。As a modification of the above method, as shown in FIG. 3, a mirror (5
) (5) Adjustment using (5) can be considered.
即ち、各ミラー(5) (5) (5)を主走査方向と
平行な軸のまわりに回動してビーム間隔を調整するとと
もに副走査方向と平行な軸のまわりに回動して各ビーム
の主走査方向の位置を調整するのである。しかし、この
方法もミラー(51(5) (5)のiIMvという新
たな調整要素が加わるうえにその調整が非常に微妙なも
のであり、実際に(1難しい方法である。That is, each mirror (5) (5) (5) is rotated around an axis parallel to the main scanning direction to adjust the beam spacing, and also rotated around an axis parallel to the sub-scanning direction to adjust each beam. The position in the main scanning direction is adjusted. However, this method also adds a new adjustment element, iIMv of the mirror (51(5) (5)), and the adjustment is very delicate, so it is actually (1 difficult method).
そこで各ビーム毎に別々にビーム位置を検知することか
考えられるが、通常のレーザービームプリンタでは走査
線の間にすきまができないようにするために被走査面上
ではビームかオーパーラ・ノブするように設定されてい
る(第4図)。例えは、ビーム間隔を100μ!1】と
也だ場合中心7強度しO2て定・義しjこビーム径を被
走査面」−で200μm程度になるように設定する訳で
ある。しかしこのような寸−ハーラップは、各ビーム毎
に設けられた検知装置か他のビームをも検知してしまい
誤動作の原因となる。Therefore, it is possible to detect the beam position separately for each beam, but in order to prevent gaps between scanning lines in normal laser beam printers, the beam position is detected separately on the surface to be scanned. (Figure 4). For example, the beam spacing is 100μ! 1), the center 7 intensity is defined as O2, and the beam diameter is set to be about 200 μm on the surface to be scanned. However, such a large harp causes the detection device provided for each beam to detect other beams as well, causing malfunctions.
本発明はこのような点に鑑みてなされたものであり、マ
ルチビーム走査装置のビーム位置検知をビームがオーバ
ーラツプしているにもかかわらす各ビーム毎に精度よく
検知できるビーム位置検知方法を提供するこよを目的と
する。The present invention has been made in view of these points, and provides a beam position detection method that can accurately detect the beam position of each beam in a multi-beam scanning device even when the beams overlap. Aim for the purpose.
上述の目的は、複数のビームを該ビームによる被走査面
の照射か主走査方向にすれるように構成するとともに受
光部を複数のビームの走査線上に垂直に配置し、011
記受光部かビームを検知するとそのビームを消却し、検
知後の消却を各ビームについて順次おこなうことによっ
て達成される。The above purpose is to configure a plurality of beams so that the surface to be scanned is irradiated with the beams in the main scanning direction, and to arrange a light receiving section perpendicularly to the scanning line of the plurality of beams.
This is achieved by extinguishing the beam when the recording/receiving section detects the beam, and sequentially extinguishing each beam after detection.
第5図は本発明の実施例を示す図で、複数のビームBl
、B2. B8. B4. I怖を走査線上で主走査方
向にすれるようにし、これに対し1つの受光素子15を
走査線上に垂直に配置したものである。この受光素子E
は便宜的に第3図に示すように感光ドラム6の側方に配
置され、応答性のよい、例えはフォトダイオードを用い
る。FIG. 5 is a diagram showing an embodiment of the present invention, in which a plurality of beams Bl
,B2. B8. B4. The light receiving element 15 is arranged so as to be able to move along the scanning line in the main scanning direction, and one light receiving element 15 is arranged perpendicularly to the scanning line. This light receiving element E
is conveniently placed on the side of the photosensitive drum 6 as shown in FIG. 3, and uses a photodiode with good responsiveness, for example.
副走査方向にオーバーラツプした複数のビーム13は主
走査方向に他のビーム(こ影響を与えない距Ml りだ
け夫々ずらされている。The plurality of beams 13 that overlap in the sub-scanning direction are shifted in the main-scanning direction by a distance Ml that does not affect the other beams.
ビームBはガウスビームであるのでこれを受光素子Eで
検知する際スレッショールドThをピークの中間にとる
のがもっとも誤差の影靴を受けにくい。それ故前記距^
14 L)は最低ビームの大きさの半分は必要である。Since the beam B is a Gaussian beam, when it is detected by the light receiving element E, setting the threshold Th in the middle of the peak is the least susceptible to errors. Therefore, the distance ^
14 L) requires at least half the beam size.
ここでビームの大きさとはビーム強度が中心強度の1/
e2になる大きさを言う。尚実際にはセッテインクの誤
差もあリビームの大きさの2倍程度の距141t Dを
あけた方かよい。Here, the size of the beam means that the beam intensity is 1/of the center intensity.
Say the size that becomes e2. In reality, it would be better to leave a distance of 141tD, which is about twice the size of the rebeam, due to errors in the setting ink.
第7図は第5図の実施例の制mljの一例を示すタイム
チャートである。この場合ビーム131〜135は最初
に全て点灯される。そしてビームか受光素子りに検知さ
れる順に消却されてゆき、受光素子Eからは各ビームの
SO5信号が出力される。FIG. 7 is a time chart showing an example of control mlj in the embodiment shown in FIG. In this case, beams 131-135 are all turned on initially. The beams are then erased in the order in which they are detected by the light receiving element E, and the SO5 signal of each beam is output from the light receiving element E.
ビームの点滅制御はまた第8図のようにおこなうことも
てきる。第8図のタイムチャートにおいては、各ビーム
は前のビームか消却されてから点月しそのビームか受光
素子■−に検知されると消却する。従って、あるビーム
か受光素子1・、にさしかかるとき他のビームは消月し
ているので各ピー4間の主走査方向のf?+1離I〕は
第7図の制御方式より短くすることかできる。The blinking control of the beam can also be performed as shown in FIG. In the time chart of FIG. 8, each beam lights up after the previous beam is extinguished, and disappears when that beam is detected by the light-receiving element. Therefore, when a certain beam approaches the light receiving element 1, the other beams are extinguished, so f? in the main scanning direction between each beam 4? +1 distance I] can be made shorter than in the control system shown in FIG.
第9図はビーム数か多い場合のビームの配置例を示すも
ので、ビームを副走査方向に2つのクループ(Bl、
B2.13+l、 B4)と(J B6. B7.13
s )に分けこのクループを副走査方向に2段に並へる
とともに主走肯方向にすらしたものである。ここて各ビ
ームの主走査方向の部間lは21)たけ離し各クループ
を1?l]t?+t L)たけすらすようにする。Figure 9 shows an example of beam arrangement when the number of beams is large.
B2.13+l, B4) and (J B6. B7.13
The croup is arranged in two stages in the sub-scanning direction and even in the main-scanning direction. Here, the distance l in the main scanning direction of each beam is 21) 1? l]t? +t L) Make sure to take it as long as you can.
上述の通り本発明は、変調可能な複数のビームて被走査
面」二を同時に走査するマルチビーム走査装置において
、複数のビームを該ビームによる被走査面の照射が主走
査方向にすれるように構成するとともに受光部を複数の
ビームの走査線・」二に垂直に配置し、Ai+記受光部
かビームを検知するとそのビームを消却し、該検知後の
消却を各ビームについて1唄次おこなうものであるから
、ビームか被走査面」二で副走査方向にオーバーラツプ
するにもかかわらす各ビームの位置を正確に検知するこ
とかできるものである。As described above, the present invention provides a multi-beam scanning device that simultaneously scans a scanned surface with a plurality of modulated beams, in which the plurality of beams are arranged such that the beams irradiate the scanned surface in the main scanning direction. In addition, the light receiving section is arranged perpendicular to the scanning line of a plurality of beams, and when the Ai + recording light receiving section detects the beam, the beam is extinguished, and the extinction after the detection is performed once for each beam. Therefore, the position of each beam can be accurately detected even though the beams overlap in the sub-scanning direction on the scanned surface.
第1図は複数の発光部をもつ半導体レーサーを示す図、
第2,3図はマルチビーム走査装置のビーム位置検知の
一例として本発明者により提案検5」された方法を説明
する図、第4図は複数のビームの発光部と被走査ihj
上における相互の関係を示す図、第5,9図は本発明各
実施例のビームと受光部との関係を説明する図、第6図
はビームと受光素子出力の関係を説明する図、第7,8
図は本発明のビーム位置検知方法の制御を説明する図で
ある。
■・・・半導体レーサー 2・・・コリメータレンス
3・・・ポリゴンミラー 4・・・fθレンズ5・・
・ミラー 6°°感光ドラムB・ビーム
1亡・・受光素子
出願人 ミノルタカメラ株式会社
第1図
第2図
!
第3図
第5図
第6図
第7図
第3図Figure 1 is a diagram showing a semiconductor racer with multiple light emitting parts.
Figures 2 and 3 are diagrams explaining a method proposed and tested by the present inventor as an example of beam position detection in a multi-beam scanning device, and Figure 4 shows the light emitting parts of multiple beams and the scanned ihj.
5 and 9 are diagrams illustrating the relationship between the beam and the light-receiving unit in each embodiment of the present invention; FIG. 6 is a diagram illustrating the relationship between the beam and the output of the light-receiving element; 7,8
The figure is a diagram illustrating control of the beam position detection method of the present invention. ■...Semiconductor racer 2...Collimator lens 3...Polygon mirror 4...Fθ lens 5...
・Mirror 6°° Photosensitive drum B・Beam
1st death... Light receiving element applicant Minolta Camera Co., Ltd. Figure 1 Figure 2! Figure 3 Figure 5 Figure 6 Figure 7 Figure 3
Claims (1)
査するマルチビーム走査装置において、複数のビームを
該ビームによる被走査ih+の照射か主走査方向にすれ
るように構成するとともに受光部を複数のビームの走査
線上に垂直に配置し、前記受光部がビームを検知すると
そのビームをiP] tlし該検知後の消灯を各ビーム
について順次おこなうことを特徴とするビーム位置検知
方法。1 In a multi-beam scanning device that simultaneously scans a scanning surface with a plurality of modulated beams, the plurality of beams are configured so that the beams to be scanned ih+ are irradiated in the main scanning direction, and the light receiving section is A beam position detection method characterized in that the beams are arranged perpendicularly on a scanning line of a plurality of beams, and when the light receiving section detects the beam, the beam is turned off after the detection, and each beam is sequentially turned off.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13652182A JPS5926006A (en) | 1982-08-04 | 1982-08-04 | Detection of beam position in multibeam scanner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13652182A JPS5926006A (en) | 1982-08-04 | 1982-08-04 | Detection of beam position in multibeam scanner |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5926006A true JPS5926006A (en) | 1984-02-10 |
JPH0357453B2 JPH0357453B2 (en) | 1991-09-02 |
Family
ID=15177117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13652182A Granted JPS5926006A (en) | 1982-08-04 | 1982-08-04 | Detection of beam position in multibeam scanner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5926006A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62262816A (en) * | 1986-05-09 | 1987-11-14 | Ricoh Co Ltd | Two beam detecting method |
JPH1152262A (en) * | 1997-08-07 | 1999-02-26 | Hitachi Koki Co Ltd | Optical scanner |
US6005243A (en) * | 1997-03-03 | 1999-12-21 | Ricoh Company, Ltd. | Synchronous adjustment method, apparatus, and computer program product in a multiple beam optical system |
JP2001512564A (en) * | 1997-02-06 | 2001-08-21 | オプトランド,インコーポレイテッド | Injector with built-in fiber optic pressure sensor and associated compensation status monitoring device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6959411B1 (en) | 2020-07-31 | 2021-11-02 | 日本食品化工株式会社 | Enzyme agent for epimerization reaction catalyst of sugar, production method of epimerization reaction product and epimerization reaction product |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57102609A (en) * | 1980-12-18 | 1982-06-25 | Canon Inc | Method and device for scanning using plural number of beams |
-
1982
- 1982-08-04 JP JP13652182A patent/JPS5926006A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57102609A (en) * | 1980-12-18 | 1982-06-25 | Canon Inc | Method and device for scanning using plural number of beams |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62262816A (en) * | 1986-05-09 | 1987-11-14 | Ricoh Co Ltd | Two beam detecting method |
JP2001512564A (en) * | 1997-02-06 | 2001-08-21 | オプトランド,インコーポレイテッド | Injector with built-in fiber optic pressure sensor and associated compensation status monitoring device |
US6005243A (en) * | 1997-03-03 | 1999-12-21 | Ricoh Company, Ltd. | Synchronous adjustment method, apparatus, and computer program product in a multiple beam optical system |
JPH1152262A (en) * | 1997-08-07 | 1999-02-26 | Hitachi Koki Co Ltd | Optical scanner |
Also Published As
Publication number | Publication date |
---|---|
JPH0357453B2 (en) | 1991-09-02 |
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