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JPS59213728A - Manufacture of silicone compound - Google Patents

Manufacture of silicone compound

Info

Publication number
JPS59213728A
JPS59213728A JP8788383A JP8788383A JPS59213728A JP S59213728 A JPS59213728 A JP S59213728A JP 8788383 A JP8788383 A JP 8788383A JP 8788383 A JP8788383 A JP 8788383A JP S59213728 A JPS59213728 A JP S59213728A
Authority
JP
Japan
Prior art keywords
group
formula
reaction
organopolysiloxane
silicone compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8788383A
Other languages
Japanese (ja)
Other versions
JPS6313446B2 (en
Inventor
Hiroshi Adachi
足達 廣士
Osamu Hayashi
修 林
Kazuo Okabashi
岡橋 和郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8788383A priority Critical patent/JPS59213728A/en
Publication of JPS59213728A publication Critical patent/JPS59213728A/en
Publication of JPS6313446B2 publication Critical patent/JPS6313446B2/ja
Granted legal-status Critical Current

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  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)

Abstract

PURPOSE:To obtain a photopolymerizable silicone compound capable of affording coating film of high heat and chemical resistance through the irradiation of radiation or viscible light, by the reaction between each specific organopolysiloxane and unsaturated compound. CONSTITUTION:The objective compound can be obtained by the reaction, while stirring at room temperature, between (A) an organopolysiloxane of formula I (R is phenyl or alkyl, n is 2-100) (pref. a hydroxy-terminated ladder organopolysiloxane with a polymerization degree 5-10) and (B) an unsaturated compound of formula II [X is H or (halogen-substituted) phenyl; Y is H, methyl, or ethyl] as a terminal functional group-introducing reagent, so that pref. one chlorosilane group in the component (B) is made to react with are hydroxyl group in the component (A).

Description

【発明の詳細な説明】 本発明は新規なシリコーン化合物の製造法に関する。[Detailed description of the invention] The present invention relates to a novel method for producing silicone compounds.

すなわち、式(1): (式中、Rはフェニル基またはアルキル基、nは2〜1
00の整数を示す)で示されるオルガノポリシルキサン
と式(2): (式中、Xは水素原子、フェニル基またはへ田ゲン置換
されたフェニル基、Yは水素原子、メチル基、またはエ
チル基を示す)で示される末端管能基導入試薬である不
飽和化合物とを反応させることによって、光重合性シリ
コーン化合物を製造するものである。
That is, formula (1): (wherein, R is a phenyl group or an alkyl group, and n is 2 to 1
(representing an integer of 00) and the organopolysilxane represented by the formula (2): (wherein, A photopolymerizable silicone compound is produced by reacting with an unsaturated compound, which is a terminal functional group-introducing reagent represented by (indicated by group).

本発明に用いられるオルガノポリシロキサンは式(1)
で示される末端とド四キシラダー型オルガノポリシロキ
サンであり、重合度は100以下、好ましくは5〜10
である0式(1)中、Rはメチル基、エチル基、プロピ
ル基、フェニル基などを示す。
The organopolysiloxane used in the present invention has the formula (1)
It is an organopolysiloxane with terminals represented by
In formula (1), R represents a methyl group, an ethyl group, a propyl group, a phenyl group, or the like.

前記オルガノポリシロキサンは、たとえばフェニルトリ
ク目ルシランまたはアルキルトリクロルシランを加水分
解することによりえられるが、水酸化カリ、ラムなどの
縮合触媒を必要に応じて用いることにより任意の分子量
を有するものが合成される。
The organopolysiloxane can be obtained, for example, by hydrolyzing phenyltrichlorosilane or alkyltrichlorosilane, but it can also be synthesized with any molecular weight by using a condensation catalyst such as potassium hydroxide or ram as necessary. be done.

本発明では式(1)中、nは2〜100の整数であるが
、nが1であるとオルガノポリシロキサンがラダー構造
にならず、nが1ooを超えると重量あたりの反応点が
少なくなりえられるシリコーン化合物の光重合性が劣る
In the present invention, in formula (1), n is an integer from 2 to 100, but if n is 1, the organopolysiloxane will not have a ladder structure, and if n exceeds 1oo, the number of reaction points per weight will decrease. The resulting silicone compound has poor photopolymerizability.

本発明に用いられる不飽和化合物は式(2)で示される
ように式(8): (式中、Xは水素原子、フェニル基、またはハpゲン置
換されたフェニル基、Yは水素原子、メチル基、または
エチル基を示す)で示される感光性基と、式(4): で示されるりaoシラン基とをその構造中に有する末端
管能基導入試薬である。
The unsaturated compound used in the present invention is represented by the formula (8) as shown in the formula (2): (wherein, This reagent for introducing a terminal functional group has in its structure a photosensitive group represented by a methyl group or an ethyl group and an ao silane group represented by the formula (4).

前記不飽和化合物は式(5): (式中、又は水素原子、フェニル基、またはハpゲン置
換されたフェニル基、Yは水素原子、メチル基、または
エチル基を示す)で示されるアクリル酸アリルを式(6
): で示されるジメチルクロルシランによって反応式:のご
とくヒドロシリル化することにより合成される。該反応
ではアリル基が優先的にヒドロシリル化される。
The unsaturated compound is an acrylic acid represented by formula (5): (in the formula, or a hydrogen atom, a phenyl group, or a phenyl group substituted with a hydrogen atom, and Y represents a hydrogen atom, a methyl group, or an ethyl group) Allyl is expressed by the formula (6
): It is synthesized by hydrosilylation using dimethylchlorosilane as shown in the reaction formula: In this reaction, allyl groups are preferentially hydrosilylated.

式(5)で示されるアクリル酸アリルとしては、たとえ
ばアクリル酸アリル、メタクリル酸アリル、ケイ皮酸ア
リルなどがあげられる。
Examples of the allyl acrylate represented by formula (5) include allyl acrylate, allyl methacrylate, and allyl cinnamate.

前記反応式で示されるアクリル酸アリルのヒト四シリル
反応は、重合禁止剤としてハイド四キノン存在下、白金
黒触媒を用いて行なうことができ不飽和化合物の生成は
工RスペクトルによりMRされる。
The human tetrasilyl reaction of allyl acrylate shown in the above reaction formula can be carried out using a platinum black catalyst in the presence of hyde tetraquinone as a polymerization inhibitor, and the formation of unsaturated compounds can be observed by MR spectroscopy.

本発明の製造法は式(1)で示されるオルガノポリシロ
キサンと式(2)で示される不飽和化合物とを前者のヒ
ト四キシル基1個に対して後者のクロルシラン1個が反
応する割合で混合したのち、室温で6時間ff!拌しオ
ルガノポリシロキサンの末端のヒドロキシル基をシリル
化することにより末端に不飽和結合を有するシリコーン
化合物をうるものである。該反応は無触媒ですみやかに
進行する。
The production method of the present invention is to react an organopolysiloxane represented by formula (1) with an unsaturated compound represented by formula (2) at a ratio of one human tetraxyl group of the former to one chlorosilane of the latter. After mixing, leave at room temperature for 6 hours ff! By stirring and silylating the terminal hydroxyl group of the organopolysiloxane, a silicone compound having an unsaturated bond at the terminal is obtained. The reaction proceeds quickly without a catalyst.

固体状のオルガノポリシロキサンを溶媒に溶解し均一層
として反応を行うが、そのような溶媒としてはテトラヒ
ドロフラン、メチルエチルケトン、イソブチルケトンな
どのケトン系溶剤、ベンゼン、トルエン、キシレンなど
の芳香族炭化水素などがあげられる。
Solid organopolysiloxane is dissolved in a solvent and reacted as a uniform layer. Examples of such solvents include ketone solvents such as tetrahydrofuran, methyl ethyl ketone, and isobutyl ketone, and aromatic hydrocarbons such as benzene, toluene, and xylene. can give.

反応生成物の工Rスペクトルでヒト四キシル基に帰属さ
れる吸収が減少することによりヒドロキシル基のシリル
化が確認される。
The silylation of the hydroxyl group is confirmed by the decrease in the absorption attributed to the human tetraxyl group in the reaction product R spectrum.

そのようにしてえられるシリコーン化合物と増感剤、希
釈剤などとを混合してなる組成物に紫外線、マタハ強イ
可視光義を照射すると、該シリコーン化合物が重合して
耐熱性、耐薬品性に優れた被膜を形成する。
When the composition obtained by mixing the silicone compound, sensitizer, diluent, etc. thus obtained is irradiated with ultraviolet light or strong visible light, the silicone compound polymerizes and becomes heat resistant and chemical resistant. Forms an excellent film.

以下実施例に基づいて本発明をさらに詳しく説明するが
、本発明はかがる実施例のみに限定されるものではない
The present invention will be described in more detail below based on Examples, but the present invention is not limited to these Examples.

参考例1 (末端ヒト田キシフェニルラダーポリシロキサン前駆体
の製造)フェニルトリクo o シ5 ン(06H5S
i(M3 ) 105−81i+(0,5モル)をメチ
ルイソブチルケトン200ccに溶解した。
Reference Example 1 (Production of terminal-terminated phenyl ladder polysiloxane precursor) Phenyltricone (06H5S)
i(M3) 105-81i+ (0.5 mol) was dissolved in 200 cc of methyl isobutyl ketone.

攪拌機、冷却器、温度計および滴下漏斗を取付けた21
の四つロフラスコにイオン交換水11を入れ、水浴で冷
却しておいた。
21 fitted with stirrer, condenser, thermometer and dropping funnel
Ion-exchanged water 11 was placed in a four-round flask and cooled in a water bath.

ン溶液を滴下漏斗より4時間かけて徐々に滴下すること
により加水分解反応を行なった。
A hydrolysis reaction was carried out by gradually dropping the solution from a dropping funnel over a period of 4 hours.

その後室温でさらに60分間攪拌を続けて加水分解反応
を完結した。
Thereafter, stirring was continued for an additional 60 minutes at room temperature to complete the hydrolysis reaction.

ついで二層分離した反応溶液から分液漏斗を用いてケト
ン層を分離し、該ケトン層をイオン交換水で中性になる
まで数回水洗いしたのち、溶媒を除去し減圧乾器中15
0’oで1時間乾燥した。
Next, a ketone layer was separated from the two-layered reaction solution using a separatory funnel, and the ketone layer was washed several times with ion-exchanged water until it became neutral.The solvent was removed and the ketone layer was dried in a vacuum dryer for 15 minutes.
It was dried at 0'o for 1 hour.

かくしてえられたオルガノポリシルキサン前駆体は白色
粉末で、その工RスペクトルにはSi −OHに帰属さ
れるピークが3400 am−1に、Si −0−Si
に帰属されるピー フカ1 i 55cm−1およびI
Q45am−1にそれツレ!測され、前記前駆体が末端
にヒドロキシル基を有するラダー構造であることが罹詔
された。
The organopolysiloxane precursor thus obtained is a white powder, and its engineering R spectrum has a peak at 3400 am-1 assigned to Si-OH and a peak at 3400 am-1 that is assigned to Si-0-Si.
Pifuca 1 i 55cm-1 and I
That's it for Q45am-1! It was determined that the precursor had a ladder structure with a hydroxyl group at the end.

分子量はおよそ1500であった。The molecular weight was approximately 1500.

参考例2 (末端ヒト四キシフェニルラダーポリシロキサンの製造
)還流冷却管、攪拌機、温度計を取付けた三つロフラス
コに参考例1でえられた前駆体10yとキシレン50c
cトヲ入れ均一に溶解したところに縮合触媒としてり四
ルギ酸エチル0.3gを加え溶解した。
Reference Example 2 (Production of terminally human tetraxyphenyl ladder polysiloxane) Precursor 10y obtained in Reference Example 1 and xylene 50c were placed in a three-necked flask equipped with a reflux condenser, a stirrer, and a thermometer.
After adding C and dissolving it uniformly, 0.3 g of ethyl tetraformate as a condensation catalyst was added and dissolved.

その均一層を160°0で5時間反応させた。反応中炭
酸ガスの発生が認められた。
The homogeneous layer was reacted at 160°0 for 5 hours. Generation of carbon dioxide gas was observed during the reaction.

反応終了後反応混合物を放冷し、10倍体積のメタノー
ル中に注いでポリマーを析出させた。アスピレータ−1
ついでロータリーポンプで減圧下100’Gテホリマー
の乾燥を行なった。
After the reaction was completed, the reaction mixture was allowed to cool and poured into 10 times the volume of methanol to precipitate the polymer. Aspirator-1
The 100'G teformer was then dried under reduced pressure using a rotary pump.

収量は8g、分子量は3000であった。The yield was 8g and the molecular weight was 3000.

その工Rスペクトルで5i−OHに帰属される吸収が3
40OCZII−1に観測され、えられたポリマーが末
端とド覧キシフェニルラダーボリシ彎キサンであること
が確認された。
In the engineering R spectrum, the absorption attributed to 5i-OH is 3
40OCZII-1, and it was confirmed that the obtained polymer was a polyoxyphenyl ladder polysoxyxane with terminals.

参考例6 (末端基導入試薬の製造) アクリル酸アリル30部(重量部、以下同様)ジメチル
クロルシラン60部、白金黒触m O,1i、fi合合
圧止剤してハイド四キノンO”5部、トルエン100部
を三つロフラスコに入れ100’aで4時間反応させた
。溶媒を留去することにより生成物を白色粉末としてえ
た。
Reference Example 6 (Manufacture of end group introduction reagent) 30 parts of allyl acrylate (parts by weight, the same applies hereinafter), 60 parts of dimethylchlorosilane, platinum black catalyst O, 1i, and fi were combined to form a pressure stopper and hydride tetraquinone O" 5 parts of toluene and 100 parts of toluene were placed in a three-necked flask and allowed to react at 100'a for 4 hours.The solvent was distilled off to obtain a product as a white powder.

その工Rスペクトルには5i−Rに帰属される吸収は観
測されず、ヒドロシリル化は完結していた。
No absorption attributed to 5i-R was observed in the R spectrum, indicating that hydrosilylation was complete.

実施例1 末端ヒドロキシフェニ/l/ラダーポリシロキサン均一
溶液に、r−アクリルキシプロピルジメチルクロル92
2フ部をTH? 100部に溶解した溶液を15°cJ
で攪拌しながら60分間で滴下した。滴下終了後さらに
30分間攪拌することにより反応を完結した。
Example 1 To a homogeneous solution of terminal hydroxyphenylene/l/ladder polysiloxane, r-acryloxypropyl dimethyl chloride 92
TH for the 2nd part? 15°cJ of a solution dissolved in 100 parts
The mixture was added dropwise over 60 minutes while stirring. After the dropwise addition was completed, the reaction was completed by stirring for an additional 30 minutes.

その反応混合物に100部のヘキサンを加えたのち、数
回洗浄した。さらに該反応混合物を無水硫酸ナトリウム
で一昼夜乾燥させた0ついで減圧下で溶媒を除去したの
ち減圧乾燥することによって目的とするシリコーン化合
物をえた。
After adding 100 parts of hexane to the reaction mixture, it was washed several times. Further, the reaction mixture was dried over anhydrous sodium sulfate for a day and night, the solvent was removed under reduced pressure, and the desired silicone compound was obtained by drying under reduced pressure.

そのシリコーン化合物の工Rスペクトルではヒドロキシ
ル基に帰属される4400cm−1の吸収は減少し、新
たに1720 am  にカルボニル基に帰属される吸
収が確認された。
In the engineered R spectrum of the silicone compound, the absorption at 4400 cm -1 attributed to the hydroxyl group decreased, and a new absorption at 1720 am attributed to the carbonyl group was confirmed.

実施例2 末端ヒドロキシメチルラダーポリシルキサン(重合度5
、ヒドロキシル基の数4)15部をTHP500部に溶
解した均一溶液に、r−メタクリ6キシプロビルジメチ
ルクo)srシヲン9.5部をrHy120部に溶解し
た溶液を15°C!で攪拌しながら40分間で滴下し−
た。滴下終了後さらに60分間攪拌することにより反応
を完結させた。その後実施例1と同じように処理してシ
リコーン化合物をえた。
Example 2 Terminal hydroxymethyl ladder polysiloxane (polymerization degree 5
, the number of hydroxyl groups 4) A homogeneous solution of 15 parts dissolved in 500 parts of THP was heated to 15°C! Add dropwise over 40 minutes while stirring.
Ta. After the dropwise addition was completed, the reaction was completed by further stirring for 60 minutes. Thereafter, it was treated in the same manner as in Example 1 to obtain a silicone compound.

ソノ工Rスペクトルではヒドロキシル基に帰属すれる吸
収が減少し、新たにカルボニル基に帰属される吸収が確
認された。
In the Sonoko R spectrum, the absorption attributed to the hydroxyl group decreased, and a new absorption attributed to the carbonyl group was confirmed.

Claims (1)

【特許請求の範囲】[Claims] (1)式(1): (式中、Rはフェニル基またはアルキル基、nは2〜1
00の整数を示す)で示されるオルガノポリシルキサン
と式(2): (式中、Xは水素原子、フェニル基、またはへ四ゲン置
換されたフェニル基、Yは水素原子、メチル基、または
エチル基を示す)で示される末端管能基導入試薬である
不飽和化合物とを反応させることを特徴とするシリコー
ン化合物の製造法0
(1) Formula (1): (wherein, R is a phenyl group or an alkyl group, n is 2 to 1
(representing an integer of 00) and the organopolysilxane represented by the formula (2): (wherein, Method for producing a silicone compound 0 characterized by reacting with an unsaturated compound which is a reagent for introducing a terminal functional group (representing an ethyl group)
JP8788383A 1983-05-17 1983-05-17 Manufacture of silicone compound Granted JPS59213728A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8788383A JPS59213728A (en) 1983-05-17 1983-05-17 Manufacture of silicone compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8788383A JPS59213728A (en) 1983-05-17 1983-05-17 Manufacture of silicone compound

Publications (2)

Publication Number Publication Date
JPS59213728A true JPS59213728A (en) 1984-12-03
JPS6313446B2 JPS6313446B2 (en) 1988-03-25

Family

ID=13927267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8788383A Granted JPS59213728A (en) 1983-05-17 1983-05-17 Manufacture of silicone compound

Country Status (1)

Country Link
JP (1) JPS59213728A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5750753A (en) * 1996-01-24 1998-05-12 Chisso Corporation Method for manufacturing acryloxypropysilane
US6284858B1 (en) 1997-03-14 2001-09-04 Nippon Steel Chemical Co., Ltd. Silicone compounds and process for producing the same
JP2010235874A (en) * 2009-03-31 2010-10-21 Kaneka Corp Curable composition

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0519871Y2 (en) * 1987-06-08 1993-05-25

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5750753A (en) * 1996-01-24 1998-05-12 Chisso Corporation Method for manufacturing acryloxypropysilane
US6284858B1 (en) 1997-03-14 2001-09-04 Nippon Steel Chemical Co., Ltd. Silicone compounds and process for producing the same
JP2010235874A (en) * 2009-03-31 2010-10-21 Kaneka Corp Curable composition

Also Published As

Publication number Publication date
JPS6313446B2 (en) 1988-03-25

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