JPS59143157A - Production of photosensitive mask material and mask plate for plate making - Google Patents

Abstract

PURPOSE:To eliminate the masking and erasing processes using a correcting solution and to improve the working capacity for plate making, by forming the specific light shielding thin film and photosensitive peel layers on a transparent film supporter. CONSTITUTION:A peelable light shielding thin film layer 10 containing the binder resin and a colored pigment which cuts off the ultraviolet rays and transmits visible rays is formed on a supporter 9 consisting of a transparent film together with a photosensitive peel layer 11 containing the binder resin and a diazo or azide sensitizer having intensive adhesive power with the layer 10 with intensive film performance. Thus a photosensitive mask material 12 is obtained. Then a binding wire original 13 is put on the material 12 and exposed to ultraviolet rays for development, and the exposed and unexposed areas of the layer 11 are eluted to obtain a negative relief image 16 having the area corresponding to a binding wire 14 turned into a groove 15. Then the image 16 is peeled off excepting an area 16' to be masked, and at the same time the layer 10 is also peeled off. Thus a mask plate 18 is obtained with a necessary image formed in the form of a recess part 17.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a photosensitive mask material and a mask plate for plate making.

Conventionally, when printing an image in solid color without halftone dots, the mask plate used to make the print is used to create a manuscript in which the image to be reproduced is surrounded by so-called dotted lines (hereinafter referred to as a dotted line manuscript). There is a method of creating photosensitive materials based on photo-processing. That is, when a negative or positive crimp-line original is printed on a light-shielding photosensitive beer layer of a photosensitive monthly charge, and then development or development and etching is performed depending on the beer layer, as shown in Fig. 1 (A>
As shown in FIG. 2, a relief image 6 of a photosensitive beer layer is formed on a transparent film 2 of a photosensitive material 1 in which grooves 5 corresponding to the border lines 4 of an original 3 are formed.

Next, as shown in FIG. 1(B), the transparent film 2 is peeled off with a needle, knife, etc., leaving behind the masking portion 6' of the relief image 6, and the necessary image is formed as four parts 7 without light-shielding properties. A mask plate 8 is obtained. The mask plate 8 thus obtained is then subjected to similar photographic processing to produce a plate surface.

By the way, when printing in multiple colors, mask plates for each color are usually created by selectively stripping the relief image obtained from the gold plate negative original according to the color, and the gold plate negative original has a mask plate of a certain color. The mask version contains unnecessary border lines of other colors.

The grooves formed in the photosensitive beer layer corresponding to these 9 lines do not block light, so when creating mask plates for each color by selective peeling, a correction fluid with high active ray blocking properties is used. Applying a coating liquid containing the liquid onto the image,
It is necessary to dry, fill in, hide, and erase the grooves corresponding to unnecessary borderlines. This also applies to letters that are drawn using the lines themselves instead of being surrounded by hollow lines.

Even in printing, where different colors are precisely matched,
The part of the groove corresponding to the border line must be colored in one of the colors, and for the mask plate of the other color, a correction fluid is applied to the entire image of the matching part, and it dries to hide and erase the groove. Then you need to peel it off and create it.

Correction fluids used for this purpose include organic solvent bath type and aqueous solution type. Organic bath agent solution types require care when handling due to their flammability and odor.

The water-dispersed type also has drawbacks such as very slow drying and poor operational efficiency.

Furthermore, applying the correction fluid requires a large, flat area and a technique for applying it uniformly, which is an area in which improvements are required in the plate-making process.

The present invention has been made in view of the above-mentioned conventional difficulties, and is characterized by forming a removable thin film layer that blocks ultraviolet rays and transmits visible light on a transparent film support. In addition to providing light blocking properties,
The photosensitive beer layer formed on the thin film layer is made to have strong film properties and strong adhesion to the thin film layer, so that when the negative relief image is peeled off, the underlying thin film layer is made to have the same shape. The present invention will now be described in detail in that it is peeled off to form a necessary image, and the thin film layer corresponding to the border lines and lines on which characters are drawn always remains on the transparent film.

As shown in FIG. 2, the photosensitive mask material of the present invention has a removable 'lJ film layer (hereinafter referred to as a light-shielding 'M thin film layer) that is UV-blocking and visible-light-transparent on a transparent film support 9.
10, and on top of the light-shielding thin film layer 10, a photosensitive beer layer having strong film properties and firmly adhering to the light-shielding thin film layer 10.
It is composed by forming.

As the support 9 used in the present invention, a film of a film-forming thermoplastic polymer compound having a smooth surface and on which a light-shielding thin film layer described below can be provided is used. Examples include polyester, polycarbonate, polyamide, polypropylene, polyvinyl chloride, polystyrene, polymethyl methacrylate and copolymers thereof, diacetylcellulose, triacetylcellulose, flobylcellulose and mixed cellulose esters. Among these, biaxially oriented polyethylene terephthalate film, which has excellent dimensional stability, is particularly preferred.

In the present invention, the peelable light-shielding thin film layer 10 that blocks ultraviolet light and transmits visible light and the photosensitive beer layer 11 are constructed as follows. That is, if the adhesive force at the interface between the thin film layer 10 and the transparent film 9 is rA1, and the adhesive force at the interface between the A1 film thin film layer and the photosensitive beer layer 11 is defined as B, then the relationship between the thin film layer and the photosensitive beer layer is A<B. The composition is as follows.

In this case, A may have an adhesive strength that does not cause the thin film layer to fall off during normal film handling operations, and B may have any strong adhesive strength as long as the above conditions are satisfied.

According to the present invention, when the peelable light-shielding thin film layer that is still UV-shielding and visible light-transparent is partially peeled off, the edges of the portions corresponding to the border lines that remain on the transparent film must be sharply finished. Therefore, a composition with low tear strength is preferable.

The thin film layer is made of a binder polymer compound and a colored pigment or dye, and the binder polymer compound and the colored pigment or dye are dissolved and dispersed in an appropriate solvent, coated on a support film, and dried. It is formed by

Polyvinyl acetate, polyvinyl acetate,
Polyvinyl butyral, polyhinyl formal, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyvinyl fluoride, vinyl chloride-vinyl acetate copolymer, vinyl chloride-acid vinylitin copolymer, vinyl chloride-vinyl acetate-( maleic anhydride, acrylonitrile or vinyl alcohol) terpolymer, vinyl chloride-vinylidene chloride-(acrylonitrile, vinyl acetate or methyl methacrylate) terpolymer, acrylic ester-(methyl methacrylate or styrene) copolymers, linear thermoplastic polyesters or copolyesters such as polyethylene terephthalate or isophthalate, alcohol-soluble polyamides, polyurethanes, acetylcellulose, acetylbutylcellulose, nitrocellulose, ethylcellulose, acetylpropylcellulose, etc. thermoplastics; There are polymer compounds and thermosetting polymer compounds such as alkyd resins, melamine resins, phenol resins, epoxy resins, floor base resins, and polyurethane resins, and these polymer compounds can be used alone or in combination of two or more types. Can be used.

The colored pigment imparts a masking property to the thin film layer, which is the object of the present invention by blocking ultraviolet rays and transmitting visible rays, and it is possible to use a known colored pigment that blocks ultraviolet rays and transmits visible rays. can. Examples are C,I Pigment Orange 3 (common name Lake Red 41 (the same applies hereafter), C,1 Pigment Orange 3
, Pigmen)・Orange] 6 (Palcan Orange), C
, 1, Pigment Res 1-2 (Permanent Red FR
R), C, 1, Pigment Orange 13 (Pyrazolone Orange), C, I Pigment Yellow 1 (Hansa Yellow), c, ■, Hikment Orange 5 (Permanent Ret GG), C, T, Pigment Yellow 12 (
Organic normal phase such as benzidine yellow G) or C,
I Pigment Yellow 34. (chrome yellow), C
Inorganic pigments such as 1, Pigmen 1- (chrome vermilion) can be used alone or in combination of 2 fff or more.

In addition, as a dye, it similarly gives masking properties to the thin film layer.
Known materials that block UV light and transmit visible light can be used, for example, C01, Solvent Yellow 2, C
, Lnrubentoole/・15, same 40, 44, C
, 1, Nrubento Lesotho 25, and 83. These dyes can be used alone or in combination of two or more. Furthermore, colored pigments and dyes can also be used in combination.

The colored pigment or dye is used in an amount of 20 to 5 QQw/w%, preferably 50 to 200 to I
/W% ratio. Colored pigments, dye dispersants, and stabilizers may also be added as necessary.

The thin film layer has a thickness of 05 to 5 μm after drying, preferably 1 to 5 μm.
The thickness is 2μ, and if it is thinner than this, sufficient ultraviolet light shielding properties cannot be obtained, and if it is thicker, the film properties of the thin film layer become too large, making it impossible to obtain a sharp etch when peeling off the pattern after development and etching, which will be described later. become.

Since the photosensitive beer layer 11 is peeled off after being formed into a negative relief image through photographic processing, it is necessary to have good film forming properties and appropriate film strength. In addition, since the thin film layer underneath is also removed from the support at the same time during peeling, it is necessary to have strong adhesive strength to the thin film layer.

The photosensitive beer layer may be formed of a single photosensitive composition layer consisting of a binder polymer compound and a photosensitive agent, with the polymer compound layer having film properties as the lower layer and the photosensitive composition layer as the upper layer. A two-layered structure may also be used.

In this case, if the photosensitive beer layer has a two-layer structure,
Since the function as a photosensitizer and the function as a peelable film can be separated, there is no need to simultaneously consider improving peelability and preventing a decrease in sensitivity, unlike when the photosensitive beer layer is formed as a single layer.

Both negative type and positive type photosensitive compositions can be used.

As the photosensitizer used in the negative photosensitive composition, 4
- Condensate of diazodiphenylamine sulfate Htz and formaldehyde, 4- Condensate of diazodiphenylamine zinc chloride salt and formaldehyde, 4-/Azo/Condensate of phenylamine boron tetrafluoride Htz and formaldehyde, 4-
So-called diazo photosensitizers such as formaldehyde-based compounds of diazodiphenylamine and trichlorbensene sulfonate, 4, ll'-diazide-chalcone, 2,6-zo(/
1'-apdobenzal)-4-methylsoclohexanone, 2,6-di(4'-azidobenzal)-4-methyl-
Ncrohexanone, 4,4'-thia7tostilchen, 4
．． and-based photosensitizers such as 4'-cyan b-benzophenone, P-phenylene diazide, and 4,47-diazidophenylmethane; Erythritol triacrylate-1-, Metquin polyethylene glycol monomethacrylate, β-hydroxyethyl acrylate, polyethylene glycol diacrylate,
Polyethylene glycol dimethacrylate, pentaerythritol dimethacrylate, trimethylolethane trimethacrylate-1, etc., a monomer having a molecular weight of 2000 or less, a boiling point of 100°C or more at normal pressure, and a polymerizable ethylene group, and an anthraquinone derivative or benzoin alkyl ether. There are photopolymerizable photosensitizers that combine these as photopolymerization initiators.

When forming a photosensitive beer layer with a single layer of photosensitive composition +d
The content of the photosensitizer in the high needle polymer compound for the binder is /3 to 5Q in the case of azo photosensitizers and azide photosensitizers.
w/w%, preferably 5 to 3Qw/w%.

In the case of a flexible photopolymerization type photosensitizer, the monomer content with respect to the binder polymer compound is 0 to 3 Q w/w.
%, preferably 20 to 60 w/w%, and the content of the photopolymerization initiator is 0.01 to 20 W/W 95, preferably 0
．． 5~lQ w/w%.

Examples of binder polymer compounds used in negative photosensitive compositions include polyvinyl alcohol, polyacrylamide, polyvinylpyrrolidone, polyvinyl methacrylate and maleic acid copolymers, alcohol-soluble polyamides, acrylamide and diacetone acrylamide copolymers, These include partially saponified vinyl acetate, polyvinyl acetate, polyvinyl formal, and polyvinyl butyral.

These polymer compounds can be used alone or in combination of two or more.

Examples of the photosensitizer for positive photosensitive compositions include ortuginone cyacyto compounds. In this case, when the photosensitive beer layer is formed from a single layer of the photosensitive composition, the content of the photosensitizer relative to the binder polymer compound is 5 to 5 Q w/W%.
It is a desirable candy of 10 to 3 Qw/w.

Examples of polymeric compounds for binders for positive photosensitive 1(1-, 4ff) products include alkali-soluble acrylic copolymers, polyvinyl-3-7toxy-4-hydroquinhensal, polyvinyl formal, polyvinyl butyral, and polyacetic acid. There is vinyl, and these polymer compounds can be used alone or in combination of two or more types.

In addition to the above-mentioned binder polymer compound used for forming the photosensitive composition layer, a tough polymer compound that cannot be used can also be used for the film layer in the two-layer photosensitive beer layer. can. Examples include alcohol-soluble polyamides such as caprolactam, copolymers of hexamethylene diamine adipate and 4,47-cyamitsucin chlorohexylmethane adipate, and N-methylol derivatives of various polyamides.

A dye may be added to the photosensitive composition layer as long as it does not adversely affect the photosensitive mechanism.

In the present invention, the lower light-shielding thin film layer has a light-shielding property against ultraviolet rays, so it is not necessary to provide light-shielding properties. This makes it easy to check whether the ends of the paper have been cut or not.

Next, the production of a mask plate for plate making using such a photosensitive mask material will be described.

The light-shielding thin film layer 10 and the photosensitive beer layer 11 have been sequentially formed on the transparent film 9, and the photosensitive mask material 12 (see Fig. 2) is coated with a negative dip or a polyester as shown in Fig. 3).
/Tig's border line manuscript 13 is stacked and exposed to ultraviolet light,
Upon development, depending on the type of the photosensitive beer layer 11, exposed or unexposed areas are exposed, for example, as shown in the figure, the original 1
A negative relief image 16 is formed in which grooves 15 are formed at locations corresponding to the dividing lines 14 in FIG. in this case,
When the photosensitive beer layer 11 is composed of two layers, a polymer compound coating layer and a photosensitive composition layer, the polymer compound coating layer must be etched in addition to the development of the photosensitive composition layer.

Next, as shown in FIG. 3(B), when the relief image 16 is peeled off leaving the masked part 16', the light-shielding thin film layer 1 underneath is removed.
0 is also peeled off in the same shape as the relief image, and a mask plate 18 on which the necessary images are formed as four parts 17 is obtained.

At this time, the light-shielding thin film layer blocks ultraviolet rays or is transparent to visible light, so when the originals with the image to be peeled off are stacked on top of each other, they can be seen through from above, and the relief image 1 to be peeled off is visible.
6 can be easily confirmed and removed, so the workability of peeling is good.

Here, the portion 15' of the thin film layer corresponding to the dividing line 14 of the original 13 is not peeled off and remains on the transparent film 9 because there is no relief image 16 thereon, and when irradiated with actinic light, the portion corresponding to the dividing line is Light is blocked. The border line 14 of the original 13 may contain material used to create a mask plate of another color, or it may remain as a light-shielding thin film layer, so it cannot be hidden or erased using correction fluid, which was conventionally done. work becomes unnecessary. Furthermore, if a mask plate of a different color is made from a conventional photosensitive material using the same original, the part corresponding to the comb line is formed in a black color so as not to block ultraviolet rays, so By combining the mask plate created as described above, it is possible to make a plate surface on which different colors can be printed exactly against each other. This plate-making process also has good work efficiency because it is possible to see through what the mask plate has fallen down.

Next, the present invention will be explained in detail based on examples.

Example 1 A dispersion having the following composition was coated on a piece m1 of a polyethylene terephthalate film of 1"ll x OOtt to a dry film thickness of 2 μm and dried to form a light-shielding thin film layer.

A photosensitive composition liquid having the following composition was applied onto the above light-shielding N1 layer to give a film thickness of 10 μm after drying, and dried to obtain a photosensitive beer layer.

A negative border original was brought into close contact with the surface of the resulting photosensitive beer layer, and exposed for 5 minutes from a distance of 177z using a 2 kW ultra-high pressure mercury lamp. Next, the exposed film was developed with the following developer to completely dissolve and remove the photosensitive beer layer in the unexposed areas, and then washed with water and dried.

When the part of this film surrounded by the line was peeled off with the tip of a sword, it was surrounded by the line. The light-shielding thin film layer corresponding to the C-turn could also be peeled off, and a relief image that was UV-shielding and transparent to visible light was obtained.

The mask plate from which the relief image was partially peeled off could be used immediately for plate making without the need for correction.

Example 2 A dispersion having the following composition was coated on one side of a polyethylene phthalate film with a thickness of 100 μm to a dry film thickness of 2 μm, and dried to form a light-shielding thin film layer.

A coating solution having the following composition is applied onto the above light-shielding thin film layer to a dry film thickness of 10 μm, and dried, and then a photosensitive composition solution having the following composition is applied on top of this to a dry film thickness of 3 μm. 2 consisting of a film layer and a photosensitive composition layer.
A layered beer layer was formed.

The film thus obtained was combined with the original, exposed to ultraviolet light, and then developed with a 3 w/w % aqueous alkaline solution of caustic soda Q.

Further, when the photosensitive surface was rubbed with the developer of Example 1, a relief image of the beer layer was formed on the light-shielding thin film layer.

When this entire relief image was lifted and peeled off with the tip of a needle, the light-shielding thin film layer at the bottom of the relief was also peeled off, creating a mask plate, which could be used for plate making without treatment with correction fluid.

Example 3 Instead of liquid B in Example 1, a photosensitive composition liquid having the following composition was applied and dried to a film thickness of 10μ after drying,
It was made into a photosensitive beer layer.

A bong line original was brought into close contact with the surface of the resulting photosensitive beer layer and heated from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp.
Exposure was performed for minutes.

Next, the exposed film was developed with running water and dried for 7 days.

When the relief part surrounded by the binding line of this film is peeled off with the tip of a needle, the light-shielding property corresponding to the relief part is 74. The film layer also peeled off, and it could be used immediately for plate-making work without the need for correction.

Example 4 In place of liquid C in Example 2, the following photosensitive composition liquid was applied to a dry film thickness of 3 μm and dried to obtain a photosensitive beer layer.

A positive cross-lined manuscript was brought into close contact with the surface of the resulting photosensitive beer layer, and a 2 kW ultra-high pressure mercury lamp was used to illuminate the surface of the photosensitive beer layer for 4 hours from a distance of 1 m.
The film was exposed to light for a minute, developed with the following water bath solution, and dried.

Sodium salicylate 40L? (Wed 6
A negative relief of the 07 photosensitive vinyl layer was obtained.

Further etching with the above aqueous solution yielded a removable relief image, which could be used immediately as a plate-making mask.

As is clear from the above examples, in the photosensitive mask material for plate making and the method for producing a mask plate of the present invention, a removable light-shielding thin film having ultraviolet light-shielding properties and visible light-transmitting properties is coated on a transparent film support. A photosensitive beer layer is formed on the thin film layer, and a photosensitive beer layer that is firmly adhered to the thin film layer and has film properties is formed, and a relief image of the photosensitive beer layer formed by photographic processing is selectively created. By peeling, the light-shielding ILJ layer is peeled off in the same shape as the peeled relief image, and the portion of the light-shielding thin film layer corresponding to the border line of the original remains on the transparent film to have a light-shielding property against ultraviolet rays. This eliminates the need for hiding, masking, and erasing using correction fluid when creating mask plates for each color. Furthermore, since one visible light beam is transmitted through the light-shielding thin film layer, an image positioned below can be seen through the layer, making it easy to peel off a relief image. Therefore, the working capacity of plate making is significantly improved.

[Brief explanation of the drawing]

Figures 1 (A) and (B) show that the negative relief image in the conventional plate-making mask material is selectively peeled off.
FIG. 2 is a sectional view showing the mask material for plate making of the present invention, and FIGS. 3 (A) and (B) are the masks in the mask material for plate making of the present invention. FIG. 3 is a cross-sectional view for explaining how a plate is created. 9 Transparent film 10... Peelable thin film layer that blocks ultraviolet rays and transmits visible light 11... Photosensitive beer layer Agent Patent attorney Moritani -O

Claims (1)

[Scope of Claims] ] A support made of a transparent film, a peelable light-shielding W film layer formed on the support that is UV-shielding and transparent to visible light, and formed on the thin film layer, A photosensitive mask material for plate making, characterized in that it is composed of this and a photosensitive beer layer that adheres strongly and has no film properties. 2. After printing a crimp line original on the photosensitive beer layer of the photosensitive mask suspension for plate making as described in claim 1, development or development and etching are performed to remove exposed or unexposed portions of the photosensitive beer layer. By selectively peeling off the negative relief image of the photosensitive beer layer obtained in the bathing process, the underlying light-shielding layer is also peeled off in the same shape, forming a transparent film. A method for producing a mask plate for plate making, characterized by leaving a light-shielding thin film layer corresponding to the image portion to be masked and the border line of the upper border document.