JPS5810455A - Lapping machine - Google Patents
Lapping machineInfo
- Publication number
- JPS5810455A JPS5810455A JP56108600A JP10860081A JPS5810455A JP S5810455 A JPS5810455 A JP S5810455A JP 56108600 A JP56108600 A JP 56108600A JP 10860081 A JP10860081 A JP 10860081A JP S5810455 A JPS5810455 A JP S5810455A
- Authority
- JP
- Japan
- Prior art keywords
- grinding
- diamond
- abrasive grains
- lapping
- granules
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、ラップ盤の改良に関するものである。ここで
は時計用カバーガラスの加工を例にとって詳しく説明す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in lapping machines. Here, we will explain in detail the processing of a watch cover glass as an example.
第1図に一般的なラップ盤を示した。ラップ盤は、本体
1のほか、上ラップ定盤2と下ラップ定盤3と上ラップ
定盤の昇降用のエアシ1】ンダ4及び加工物を固定する
キャリヤ5と751らなる。Figure 1 shows a typical lapping machine. The lapping machine consists of a main body 1, an upper lap surface plate 2, a lower lap surface plate 3, an air cylinder 4 for raising and lowering the upper lap surface plate, and a carrier 5 and 751 for fixing the workpiece.
従来1時計用カバーガラス等の研削は、加工物をキャリ
ヤー5で固定し上ラップ定盤2と下ラップ定盤3の間に
はさみ、上ラップ定盤(第2図)にある砥粒穴dより、
水にかくはんした遊離砥粒をかけながら加工していた。Conventionally, when grinding a cover glass for a watch, etc., the workpiece is fixed with a carrier 5, sandwiched between the upper lap surface plate 2 and the lower lap surface plate 3, and the abrasive hole d in the upper lap surface plate (Fig. 2) is used. Than,
Processing was carried out while applying free abrasive grains stirred in water.
研削−研磨工程における遊砥粒は粒径の大きい遊離砥粒
から小さい遊離砥粒へと段階を追って用いられていた。In the grinding-polishing process, free abrasive grains are used in stages from large-sized free abrasive grains to small-sized free abrasive grains.
上下2つのラップ定盤は、第2図に示すような2〜3m
の溝マが格子状に20m間隔で切ってあり、いずれも上
下の交換が可能なように砥粒穴6がおいている。第2図
では、1/4の部分のみを示したが、上記加工が全面に
施されている。The two upper and lower lap plates are 2 to 3 meters long as shown in Figure 2.
Grooves are cut in a grid pattern at intervals of 20 m, and abrasive grain holes 6 are placed in each case so that the upper and lower parts can be replaced. In FIG. 2, only 1/4 part is shown, but the above-mentioned processing is applied to the entire surface.
第3図(a)〜(C)は、遊離砥粒8を用いた研削の状
態を示す図であり、遊離砥粒8は、加工物9とラップ定
盤2.3の間を遊離していて、遊離砥粒8が回転しなが
ら加工物の表面を削り落とす。削り落ちた加工物の破片
やスラッジと遊離砥粒8は、第2図のラップ定盤の溝7
を通ってタンクへ流れ落ち、ポンプで循環される。従っ
て破片やスラッジと遊離砥粒8の分離ができないため、
破片やスラッジによる深いキズが入りやすい。さらに研
削が続けられると遊離砥粒8は劣下し丸味を帯びてくる
。このため研削速度が一定せず、1日7.5時間研削し
た場合毎日交換しなければならなかった。このため、廃
棄物が莫大な量となるため、その処理の経費、設備が必
要となっていた。FIGS. 3(a) to 3(C) are diagrams showing the state of grinding using free abrasive grains 8, in which the free abrasive grains 8 move freely between the workpiece 9 and the lapping surface plate 2.3. As the free abrasive grains 8 rotate, they scrape off the surface of the workpiece. The scraped pieces of the workpiece, sludge, and loose abrasive grains 8 are removed from the grooves 7 of the lapping surface plate in Fig. 2.
It flows down into the tank and is circulated by a pump. Therefore, it is not possible to separate debris or sludge from free abrasive grains 8.
Prone to deep scratches from debris and sludge. As the grinding continues, the free abrasive grains 8 deteriorate and become rounder. For this reason, the grinding speed was not constant, and if grinding was performed for 7.5 hours a day, it had to be replaced every day. As a result, a huge amount of waste is generated, which requires expense and equipment for processing.
上記方法によって研削した場合、研削時間を10分以上
必要とし、研削後の加工物に付着した遊離砥粒8を洗浄
するのにも時間がかかるため、洗浄等の後工程の手間を
含めた総研側時間が長いという問題がある。When grinding is performed using the above method, the grinding time is 10 minutes or more, and it also takes time to clean the loose abrasive grains 8 attached to the workpiece after grinding. There is a problem that side time is long.
従って、遊離砥粒を使った従来の研削方法における欠点
をまとめると下記5点に整理される。Therefore, the shortcomings of conventional grinding methods using free abrasive grains can be summarized into the following five points.
■遊離砥粒の劣下やスラッジによって研削能力が低下す
る。■Grinding ability decreases due to deterioration of free abrasive grains and sludge.
■研削時間が長い。■Grinding time is long.
■スラッジと遊離砥粒が分離できないだめキズの発生が
ある。■If the sludge and free abrasive particles cannot be separated, scratches may occur.
■廃棄物の処理に経費が必要。■Expenses are required to process waste.
■遊離砥粒の交換が毎日必要。■Free abrasive grains need to be replaced every day.
そこで本発明は以上の欠点に鑑みて、成されたもので、
研削、研磨の時間短縮、歩留向上、経費節約を計ったラ
ップ盤を提供することを目的とする。Therefore, the present invention has been made in view of the above drawbacks.
The objective is to provide a lapping machine that reduces grinding and polishing time, improves yield, and saves costs.
本発明の要旨とするところは、前掲の特許請求の範囲に
記載した通りである。以下に本発明の好適な一実施例を
図面を参照にし詳細に説明する。The gist of the present invention is as described in the claims below. A preferred embodiment of the present invention will be described in detail below with reference to the drawings.
第4図は、ダイヤモンドペレット10を設けたラップ定
盤を示す図でダイヤモンドペレット中のダイヤモンド粒
子は、前記の遊離砥粒に対して固定砥粒である。ダイヤ
モンドの結晶粒子を第5図に示す。図の粒子の大きさは
約6μで1個の粒子につき、数千の微細な結晶の研削ポ
イントを有しており、研削過程中に微細な結晶粒子が研
砕・除去されることによって新しい微細なとがったエツ
ジが作り出される。そのため、従来の遊離砥粒による研
削に比べて、約5倍の速さの研削速度を得ることができ
た。しかも、遊離砥粒が必要ないので、研削液として水
を用いるだけでじゅうぶんである。スラッジは、廃液を
遠心分離機に通すことによって、除去されるので、水の
循環利用ができ、キズの発生を防ぐことができる。FIG. 4 shows a lapping surface plate provided with diamond pellets 10, and the diamond particles in the diamond pellets are fixed abrasive grains as opposed to the above-mentioned free abrasive grains. Figure 5 shows diamond crystal grains. The size of the particles shown in the figure is approximately 6μ, and each particle has several thousand fine crystal grinding points, and as the fine crystal particles are ground and removed during the grinding process, new fine crystals are created. A sharp edge is created. Therefore, compared to conventional grinding using free abrasive grains, it was possible to obtain a grinding speed approximately five times faster. Moreover, since free abrasive grains are not required, it is sufficient to use water as the grinding fluid. Sludge is removed by passing the waste liquid through a centrifuge, so water can be recycled and scratches can be prevented.
筺
第6図(a)〜(C)%、ダイヤモンドペレットを使っ
た研削禍程を示す図である。ダイヤモンド粒子11の研
削ポイントは、加工物9を研削しながら、次々と新しい
研削ポイントを作り出している。このとき、上定盤2に
かかる圧力を、上ラップ定盤昇降用−ア5タツダ4の空
気圧を増すことによって、加圧12され、研削時間は、
いっそう短縮される。Figures 6(a) to 6(c) are diagrams showing the grinding process using diamond pellets. The grinding points of the diamond particles 11 create new grinding points one after another while grinding the workpiece 9. At this time, the pressure applied to the upper surface plate 2 is increased to 12 by increasing the air pressure of the upper lap surface plate lifter 4, and the grinding time is
It will be further shortened.
特に本発明では、必要寸法まで研削したあと、今まで加
圧されていた上ラップ定盤を、空気圧を調整することに
よって逆圧13とし、加工物9にかかる圧力を低下させ
る。この状態でラップ盤の運転を続けると、研削は進ま
なくなり、加工物表面の凹凸の凸部を削るにとどまる。In particular, in the present invention, after grinding to the required dimensions, the upper lap surface plate, which has been pressurized up to now, is brought to a reverse pressure 13 by adjusting the air pressure, thereby reducing the pressure applied to the workpiece 9. If the lapping machine continues to operate in this state, the grinding will not progress and only the uneven convexes and convexities on the surface of the workpiece will be removed.
すなわち、こnは研磨の第1歩であり、この状態を5分
〜10分続けると、表面は滑らかになって透明性をおび
てくる。従って次工程の研磨に要する時間が短縮される
。That is, this is the first step of polishing, and if this state is continued for 5 to 10 minutes, the surface becomes smooth and transparent. Therefore, the time required for the next step of polishing is shortened.
以上、詳細に説明されたごとく、本発明は、研削−研磨
の時間短縮、遊離砥粒の廃止、歩留の向上といった効果
を得る。As described above in detail, the present invention provides effects such as shortening the grinding-polishing time, eliminating free abrasive grains, and improving yield.
第1図は、一般的な両面同時研削−研一用うツブ盤の斜
視図、第2図は、従来の上下ラップ定盤の一部省略図二
第3図は、遊離砥粒を用いた研削の状態を示す拡大断面
図、第4図は、本発明に係わるダイヤモンドペレットを
設けたラップ定盤の一部省略図、第5図は、ダイヤモン
ドペレットに使われている多結晶ダイヤモンド3・・・
下ラップ定盤、5・・・キャリヤー、10・・・ダイヤ
モンドペレット。Fig. 1 is a perspective view of a general grinding machine for double-sided simultaneous grinding and polishing, Fig. 2 is a partially omitted view of a conventional upper and lower lap surface plate, and Fig. 3 is a grinding machine using free abrasive grains. 4 is a partially omitted view of a lapping surface plate provided with diamond pellets according to the present invention, and FIG. 5 is an enlarged cross-sectional view showing the state of polycrystalline diamond 3...
Lower lap surface plate, 5... carrier, 10... diamond pellet.
Claims (1)
研削−研磨用ラップ盤に於て、前記ラップ定盤の全面に
ダイヤモンドペレットを設けたことを特徴とするラップ
盤。A lapping machine for double-sided simultaneous grinding and polishing having two upper and lower lapping plates and a carrier, characterized in that diamond pellets are provided on the entire surface of the lapping plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56108600A JPS5810455A (en) | 1981-07-10 | 1981-07-10 | Lapping machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56108600A JPS5810455A (en) | 1981-07-10 | 1981-07-10 | Lapping machine |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5810455A true JPS5810455A (en) | 1983-01-21 |
Family
ID=14488906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56108600A Pending JPS5810455A (en) | 1981-07-10 | 1981-07-10 | Lapping machine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5810455A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999010129A1 (en) * | 1997-08-26 | 1999-03-04 | Ning Wang | A pad for chemical-mechanical polishing and apparatus and methods of manufacture thereof |
JP2006301239A (en) * | 2005-04-20 | 2006-11-02 | Ricoh Co Ltd | Developing device, process cartridge, and image forming apparatus |
-
1981
- 1981-07-10 JP JP56108600A patent/JPS5810455A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999010129A1 (en) * | 1997-08-26 | 1999-03-04 | Ning Wang | A pad for chemical-mechanical polishing and apparatus and methods of manufacture thereof |
JP2006301239A (en) * | 2005-04-20 | 2006-11-02 | Ricoh Co Ltd | Developing device, process cartridge, and image forming apparatus |
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