JPS5740949A - Measurement of resistivity of semiconductor - Google Patents
Measurement of resistivity of semiconductorInfo
- Publication number
- JPS5740949A JPS5740949A JP11633380A JP11633380A JPS5740949A JP S5740949 A JPS5740949 A JP S5740949A JP 11633380 A JP11633380 A JP 11633380A JP 11633380 A JP11633380 A JP 11633380A JP S5740949 A JPS5740949 A JP S5740949A
- Authority
- JP
- Japan
- Prior art keywords
- measuring
- correction factor
- measurement
- circuit
- measuring position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Measurement Of Resistance Or Impedance (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To obtain a correct measured value, by a method wherein the measurement of resistivity is done after deciding a measuring position in accordance with a signal designating measuring position fed from a control circuit and the value is corrected by a correcting circuit. CONSTITUTION:A semiconductor sample 1 to be measured is placed on a measurement positioning mechanism 6 to move the positioned mechanism (so that) the sample is located at a predetermined measuring position by a designating signal fed from a control circuit 10 and a measuring probe 5 contacts with the sample 1 to perform the measurement of resistivity by a measuring circuit 7 containing a constant-current source and a voltage measuring circuit. And the measured result is sent to a measured value correcting circuit 8 and a memory stores the correction factor list on position. Therefore, a correction factor for the measuring position is read out from the correction factor list in accordance with measuring position information sent from the control circuit 10 and a correct measured value can be obtained by multiplying the correction factor by the measured result.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11633380A JPS5740949A (en) | 1980-08-23 | 1980-08-23 | Measurement of resistivity of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11633380A JPS5740949A (en) | 1980-08-23 | 1980-08-23 | Measurement of resistivity of semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5740949A true JPS5740949A (en) | 1982-03-06 |
Family
ID=14684361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11633380A Pending JPS5740949A (en) | 1980-08-23 | 1980-08-23 | Measurement of resistivity of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5740949A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62149520A (en) * | 1985-12-24 | 1987-07-03 | Aisin Seiki Co Ltd | Actuator using fluid pressure |
US4725773A (en) * | 1986-06-27 | 1988-02-16 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Cross-contact chain |
JPS6447960A (en) * | 1987-08-19 | 1989-02-22 | Mitsubishi Petrochemical Co | Method and apparatus for measuring resistivity |
JP2009252976A (en) * | 2008-04-04 | 2009-10-29 | Hitachi Kokusai Denki Engineering:Kk | Semiconductor wafer resistivity measuring apparatus |
JP2011211060A (en) * | 2010-03-30 | 2011-10-20 | Hitachi Kokusai Denki Engineering:Kk | Semiconductor wafer resistivity measuring apparatus |
JP2017187439A (en) * | 2016-04-08 | 2017-10-12 | 日置電機株式会社 | Processing device, inspection device, and processing method |
WO2023243578A1 (en) * | 2022-06-14 | 2023-12-21 | 日置電機株式会社 | Measurement device, measurement method, and measurement program |
-
1980
- 1980-08-23 JP JP11633380A patent/JPS5740949A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62149520A (en) * | 1985-12-24 | 1987-07-03 | Aisin Seiki Co Ltd | Actuator using fluid pressure |
US4725773A (en) * | 1986-06-27 | 1988-02-16 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Cross-contact chain |
JPS6447960A (en) * | 1987-08-19 | 1989-02-22 | Mitsubishi Petrochemical Co | Method and apparatus for measuring resistivity |
JP2009252976A (en) * | 2008-04-04 | 2009-10-29 | Hitachi Kokusai Denki Engineering:Kk | Semiconductor wafer resistivity measuring apparatus |
JP2011211060A (en) * | 2010-03-30 | 2011-10-20 | Hitachi Kokusai Denki Engineering:Kk | Semiconductor wafer resistivity measuring apparatus |
JP2017187439A (en) * | 2016-04-08 | 2017-10-12 | 日置電機株式会社 | Processing device, inspection device, and processing method |
WO2023243578A1 (en) * | 2022-06-14 | 2023-12-21 | 日置電機株式会社 | Measurement device, measurement method, and measurement program |
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