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JPS57149739A - Controller for annealing treatment - Google Patents

Controller for annealing treatment

Info

Publication number
JPS57149739A
JPS57149739A JP3590881A JP3590881A JPS57149739A JP S57149739 A JPS57149739 A JP S57149739A JP 3590881 A JP3590881 A JP 3590881A JP 3590881 A JP3590881 A JP 3590881A JP S57149739 A JPS57149739 A JP S57149739A
Authority
JP
Japan
Prior art keywords
wave number
annealing
change
raman
bandwidth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3590881A
Other languages
Japanese (ja)
Other versions
JPS5815943B2 (en
Inventor
Takashi Katoda
Tatsu Yokoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP3590881A priority Critical patent/JPS5815943B2/en
Publication of JPS57149739A publication Critical patent/JPS57149739A/en
Publication of JPS5815943B2 publication Critical patent/JPS5815943B2/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65Raman scattering

Landscapes

  • Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To grasp the end point of annealing accurately by obtaining the change of bandwidth from a detector mounted to wave number except the central wave number of Raman bandwidth corresponding to phonon peculiar to a semiconductor and acquiring the change of peak intensity from a detector at the position of the central wave number. CONSTITUTION:Raman beams R generated through the irradiation of laser beams L2 during the time when a sample 11 is annealed by laser beams L1 are projected to a spectroscope 17, and developed to spectra in response to shift wave number. Photomultiplier tubes 20 and 19, 21 are each arranged at the position of the central wave number of Raman bandwidth and the position of the half width of a spectrum wave-form A, the spectra are amplified 22-24 and counted 25-27 at every channel, output is differentiated 28-29, and a change is discriminated 31-33. When discriminating signals are obtained simultaneously from each channel, finsihing signals are given to a control circuit 36 through an AND circuit 35, and a sample base 12 is moved 37. According to this constitution, the spectrum wave-form changes in the order of A C with the advance of annealing, and kept at C, and the end point of annealing is grasped accurately without sweeping the spectroscope.
JP3590881A 1981-03-12 1981-03-12 Annealing processing control device Expired JPS5815943B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3590881A JPS5815943B2 (en) 1981-03-12 1981-03-12 Annealing processing control device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3590881A JPS5815943B2 (en) 1981-03-12 1981-03-12 Annealing processing control device

Publications (2)

Publication Number Publication Date
JPS57149739A true JPS57149739A (en) 1982-09-16
JPS5815943B2 JPS5815943B2 (en) 1983-03-28

Family

ID=12455122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3590881A Expired JPS5815943B2 (en) 1981-03-12 1981-03-12 Annealing processing control device

Country Status (1)

Country Link
JP (1) JPS5815943B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59149029A (en) * 1983-02-16 1984-08-25 Agency Of Ind Science & Technol Evaluating device for compound semiconductor crystal substrate
US5155337A (en) * 1989-12-21 1992-10-13 North Carolina State University Method and apparatus for controlling rapid thermal processing systems

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59149029A (en) * 1983-02-16 1984-08-25 Agency Of Ind Science & Technol Evaluating device for compound semiconductor crystal substrate
US5155337A (en) * 1989-12-21 1992-10-13 North Carolina State University Method and apparatus for controlling rapid thermal processing systems

Also Published As

Publication number Publication date
JPS5815943B2 (en) 1983-03-28

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