JPS5688246A - Electron beam device - Google Patents
Electron beam deviceInfo
- Publication number
- JPS5688246A JPS5688246A JP16604479A JP16604479A JPS5688246A JP S5688246 A JPS5688246 A JP S5688246A JP 16604479 A JP16604479 A JP 16604479A JP 16604479 A JP16604479 A JP 16604479A JP S5688246 A JPS5688246 A JP S5688246A
- Authority
- JP
- Japan
- Prior art keywords
- pole
- tetra
- deflection
- electron beam
- octa
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To enable increase of the deflection without the increase of astigmation by transferring field centers of tetra-pole lenses and octa-pole lenses depending on the deflection of the electron beam caused by a deflecting means. CONSTITUTION:A deflecting means D1, tetra-pole lens Q1, octa-pole lens S1, tetra- pole lens Q2, octa-pole lens S2, tetra-pole lens Q3, deflecting means D2 are provided along the optical axis Z alternately. When a deflection source 8 is adjudted manually, an output signal is applied to an axis adjusting controlling circuit 9 corresponding to the direction and extent of the deflection, and a signal which makes field centers of the tetra-pole lenses Q1, Q2, Q3 to coincide with the center of the electron beam is provided to a focus controlling circuit 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16604479A JPS5688246A (en) | 1979-12-20 | 1979-12-20 | Electron beam device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16604479A JPS5688246A (en) | 1979-12-20 | 1979-12-20 | Electron beam device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5688246A true JPS5688246A (en) | 1981-07-17 |
Family
ID=15823903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16604479A Pending JPS5688246A (en) | 1979-12-20 | 1979-12-20 | Electron beam device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5688246A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06103946A (en) * | 1992-07-16 | 1994-04-15 | Internatl Business Mach Corp <Ibm> | Variable-shaft stigmator |
JP2016219432A (en) * | 2013-10-29 | 2016-12-22 | ヴァリアン メディカル システムズ インコーポレイテッド | X-ray tube having planar emitter with tunable emission characteristics and performing magnetic steering and magnetic focusing |
JPWO2021100172A1 (en) * | 2019-11-21 | 2021-05-27 |
-
1979
- 1979-12-20 JP JP16604479A patent/JPS5688246A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06103946A (en) * | 1992-07-16 | 1994-04-15 | Internatl Business Mach Corp <Ibm> | Variable-shaft stigmator |
JP2016219432A (en) * | 2013-10-29 | 2016-12-22 | ヴァリアン メディカル システムズ インコーポレイテッド | X-ray tube having planar emitter with tunable emission characteristics and performing magnetic steering and magnetic focusing |
JPWO2021100172A1 (en) * | 2019-11-21 | 2021-05-27 | ||
WO2021100172A1 (en) * | 2019-11-21 | 2021-05-27 | 株式会社日立ハイテク | Charged particle beam device and aberration correction method |
US20220415605A1 (en) * | 2019-11-21 | 2022-12-29 | Hitachi High-Tech Corporation | Charged Particle Beam Device and Aberration Correction Method |
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