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JPS5627149A - Table - Google Patents

Table

Info

Publication number
JPS5627149A
JPS5627149A JP10223479A JP10223479A JPS5627149A JP S5627149 A JPS5627149 A JP S5627149A JP 10223479 A JP10223479 A JP 10223479A JP 10223479 A JP10223479 A JP 10223479A JP S5627149 A JPS5627149 A JP S5627149A
Authority
JP
Japan
Prior art keywords
plate
holes
hot plate
hot
glass plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10223479A
Other languages
Japanese (ja)
Inventor
Michio Hirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP10223479A priority Critical patent/JPS5627149A/en
Publication of JPS5627149A publication Critical patent/JPS5627149A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable a sheet-shaped body, such as a glass plate to be placed on the specified position of a hot plate without impairing said body, by providing said hot plate with a plurality of gas withdrawing holes. CONSTITUTION:Hot plate 3 is provided with a plurality of small holes 5. When glass plate 2 is placed with an unfixing tool, such as unshown blades, the air between plate 2 and plate 3 goes out of holes 5 rapidly, thus permitting the compressed air generated instantaneously between plates 2, 3 not to float plate 2 in such a pressure, and plate 2 to come down exactly on the position intended to place.
JP10223479A 1979-08-13 1979-08-13 Table Pending JPS5627149A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10223479A JPS5627149A (en) 1979-08-13 1979-08-13 Table

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10223479A JPS5627149A (en) 1979-08-13 1979-08-13 Table

Publications (1)

Publication Number Publication Date
JPS5627149A true JPS5627149A (en) 1981-03-16

Family

ID=14321943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10223479A Pending JPS5627149A (en) 1979-08-13 1979-08-13 Table

Country Status (1)

Country Link
JP (1) JPS5627149A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59219969A (en) * 1983-05-30 1984-12-11 Agency Of Ind Science & Technol Manufacture of module of solar cell
JPS61147528A (en) * 1984-12-21 1986-07-05 Toshiba Corp Resist treating device
JPS61156814A (en) * 1984-12-28 1986-07-16 Toshiba Corp Method and apparatus for resist baking
JPS61180438A (en) * 1985-02-06 1986-08-13 Toshiba Corp Treating device for resist
JPH02103550A (en) * 1988-10-13 1990-04-16 Matsushita Electric Ind Co Ltd Hot plate for curing resist

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59219969A (en) * 1983-05-30 1984-12-11 Agency Of Ind Science & Technol Manufacture of module of solar cell
JPS61147528A (en) * 1984-12-21 1986-07-05 Toshiba Corp Resist treating device
JPH0237688B2 (en) * 1984-12-21 1990-08-27 Tokyo Shibaura Electric Co
JPS61156814A (en) * 1984-12-28 1986-07-16 Toshiba Corp Method and apparatus for resist baking
JPS61180438A (en) * 1985-02-06 1986-08-13 Toshiba Corp Treating device for resist
JPH02103550A (en) * 1988-10-13 1990-04-16 Matsushita Electric Ind Co Ltd Hot plate for curing resist

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