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JPS554982A - Semiconductor device manufacturing method using automatic exposure capable of fitting pattern - Google Patents

Semiconductor device manufacturing method using automatic exposure capable of fitting pattern

Info

Publication number
JPS554982A
JPS554982A JP7838878A JP7838878A JPS554982A JP S554982 A JPS554982 A JP S554982A JP 7838878 A JP7838878 A JP 7838878A JP 7838878 A JP7838878 A JP 7838878A JP S554982 A JPS554982 A JP S554982A
Authority
JP
Japan
Prior art keywords
automatic exposure
mask
patterns
semiconductor device
device manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7838878A
Other languages
Japanese (ja)
Inventor
Toru Imamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP7838878A priority Critical patent/JPS554982A/en
Publication of JPS554982A publication Critical patent/JPS554982A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To increase the number of elements on a base plate and reduce the cost of a mask, by placing target patterns, to be provided for a mask in an automatic exposure device, inside scribed lines provided for element patterns.
CONSTITUTION: Target patterns 14, to be provided for mask 11 in an automatic exposure device, are formed inside scribed lines 15, which were used when each element pattern 12 was formed. To accomplish this, target patterns 14 may be printed simultaneously with the printing of each element 12. By this method, patterns 14 are prevented from occupying a part of the semiconductor base plate so that the number of effective element inside tha base plate can be increased and the cost of the mask can be reduced.
COPYRIGHT: (C)1980,JPO&Japio
JP7838878A 1978-06-27 1978-06-27 Semiconductor device manufacturing method using automatic exposure capable of fitting pattern Pending JPS554982A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7838878A JPS554982A (en) 1978-06-27 1978-06-27 Semiconductor device manufacturing method using automatic exposure capable of fitting pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7838878A JPS554982A (en) 1978-06-27 1978-06-27 Semiconductor device manufacturing method using automatic exposure capable of fitting pattern

Publications (1)

Publication Number Publication Date
JPS554982A true JPS554982A (en) 1980-01-14

Family

ID=13660626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7838878A Pending JPS554982A (en) 1978-06-27 1978-06-27 Semiconductor device manufacturing method using automatic exposure capable of fitting pattern

Country Status (1)

Country Link
JP (1) JPS554982A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58106826A (en) * 1981-12-18 1983-06-25 Nec Corp Manufacture of semiconductor device
JPS5994418A (en) * 1982-11-19 1984-05-31 Nec Kyushu Ltd Semiconductor device
JPS6254432A (en) * 1985-09-02 1987-03-10 Seiko Epson Corp Semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58106826A (en) * 1981-12-18 1983-06-25 Nec Corp Manufacture of semiconductor device
JPS5994418A (en) * 1982-11-19 1984-05-31 Nec Kyushu Ltd Semiconductor device
JPS6254432A (en) * 1985-09-02 1987-03-10 Seiko Epson Corp Semiconductor device

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