JPS5525424A - Stabilization of halogen-containing polymer - Google Patents
Stabilization of halogen-containing polymerInfo
- Publication number
- JPS5525424A JPS5525424A JP9751178A JP9751178A JPS5525424A JP S5525424 A JPS5525424 A JP S5525424A JP 9751178 A JP9751178 A JP 9751178A JP 9751178 A JP9751178 A JP 9751178A JP S5525424 A JPS5525424 A JP S5525424A
- Authority
- JP
- Japan
- Prior art keywords
- halogen
- containing polymer
- formula
- parts
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE: To obtain the title polymer having flame resistance and retardancy with a slight deterioration and discoloration in molding, by incorporating a specific organotin compound and a phenylboronic acid compound with a halogen-containing polymer, e.g. polyvinyl chloride.
CONSTITUTION: (A) A halogen-containing polymer, e.g. polyvinyl chloride, is incorporated with (B) 0.05W10.0 Parts by wt. of an organotin compound of formula I: [R1 and R2 are 1W18C alkyl groups; at least one of X and Y is acyl or mercaptan group; the other is formula II (Z is oxygen, sulfur, or maleic acid residue)] and (C) 0.05W10.0 parts by wt. of a phenylboronic acid of formula III: (R1 and R2 are H, 1W36C alkyl, alkoxyalkyl groups, etc.) to give the desired polymer.
USE: Impact-resistant resins copolymerized with butadiene and acnylic esters are used for electrical and electronic parts, construction and vehile materials.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9751178A JPS5525424A (en) | 1978-08-10 | 1978-08-10 | Stabilization of halogen-containing polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9751178A JPS5525424A (en) | 1978-08-10 | 1978-08-10 | Stabilization of halogen-containing polymer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5525424A true JPS5525424A (en) | 1980-02-23 |
Family
ID=14194275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9751178A Pending JPS5525424A (en) | 1978-08-10 | 1978-08-10 | Stabilization of halogen-containing polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5525424A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100680427B1 (en) | 2003-07-30 | 2007-02-08 | 주식회사 하이닉스반도체 | Photoresist Polymer and Photoresist Composition Containing it |
| KR100680428B1 (en) | 2003-09-29 | 2007-02-08 | 주식회사 하이닉스반도체 | Photoresist Polymer and Photoresist Composition Containing it |
| KR100680403B1 (en) | 2003-10-06 | 2007-02-08 | 주식회사 하이닉스반도체 | Photoresist Polymer and Photoresist Composition Containing it |
-
1978
- 1978-08-10 JP JP9751178A patent/JPS5525424A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100680427B1 (en) | 2003-07-30 | 2007-02-08 | 주식회사 하이닉스반도체 | Photoresist Polymer and Photoresist Composition Containing it |
| KR100680428B1 (en) | 2003-09-29 | 2007-02-08 | 주식회사 하이닉스반도체 | Photoresist Polymer and Photoresist Composition Containing it |
| KR100680403B1 (en) | 2003-10-06 | 2007-02-08 | 주식회사 하이닉스반도체 | Photoresist Polymer and Photoresist Composition Containing it |
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