Nothing Special   »   [go: up one dir, main page]

JPS55118911A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS55118911A
JPS55118911A JP2591679A JP2591679A JPS55118911A JP S55118911 A JPS55118911 A JP S55118911A JP 2591679 A JP2591679 A JP 2591679A JP 2591679 A JP2591679 A JP 2591679A JP S55118911 A JPS55118911 A JP S55118911A
Authority
JP
Japan
Prior art keywords
polymer
group
resin composition
photosensitive resin
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2591679A
Other languages
Japanese (ja)
Other versions
JPS5728488B2 (en
Inventor
Shoji Watanabe
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP2591679A priority Critical patent/JPS55118911A/en
Publication of JPS55118911A publication Critical patent/JPS55118911A/en
Publication of JPS5728488B2 publication Critical patent/JPS5728488B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: To prepare a photosensitive resin composition useful for printing plates, etc., having high photosensitivity and giving a cured product having high crosslink density and strength, by mixing a polymer having cinnamic acid residual groups substituted with electrophilic groups, with a polymer having cinnamic acid residual groups substituted with electron donative groups, at a specific ratio.
CONSTITUTION: (A) A polymer having the structural unit I (R1 is H or methyl; R2 is divalent organic group or single bond; X is electrophilic group such as cyano group) is mixed with (B) a polymer having the structural unit II (R1' is H or methyl; R2' is divalent organic group or single bond; Y is electron donative group such as alkoxy group) at a molar ratio (A)/(B) of 20/80W80/20. The relative sensitivity for light is highest at (A)/(B) of 50/50. Preferably, the molecular weights of (A) and (B) are 5,000W200,000 and (A) and (B) are compound with a sensitizer having a triplet energy of 50W70Kcal (e.g. p-nitroaniline etc.).
COPYRIGHT: (C)1980,JPO&Japio
JP2591679A 1979-03-06 1979-03-06 Photosensitive resin composition Granted JPS55118911A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2591679A JPS55118911A (en) 1979-03-06 1979-03-06 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2591679A JPS55118911A (en) 1979-03-06 1979-03-06 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS55118911A true JPS55118911A (en) 1980-09-12
JPS5728488B2 JPS5728488B2 (en) 1982-06-17

Family

ID=12179094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2591679A Granted JPS55118911A (en) 1979-03-06 1979-03-06 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS55118911A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5294484A (en) * 1991-08-03 1994-03-15 Sony Corporation Polyvinyl aromatic carboxylic acid ester and video printing paper
JPH0741515A (en) * 1993-05-20 1995-02-10 Gold Star Co Ltd Thermally stable photopolymerizable substance for alignment of liquid crystal
KR100481014B1 (en) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 Photosensitive resin composition using photopolymer
KR101015112B1 (en) 2004-07-12 2011-02-16 코오롱인더스트리 주식회사 Photosensitive resin composition with improved adhesion and tentability
JP2012144610A (en) * 2011-01-11 2012-08-02 Kansai Univ Photoresponsive polymer and molded object made by forming the photoresponsive polymer, and its usage

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5294484A (en) * 1991-08-03 1994-03-15 Sony Corporation Polyvinyl aromatic carboxylic acid ester and video printing paper
JPH0741515A (en) * 1993-05-20 1995-02-10 Gold Star Co Ltd Thermally stable photopolymerizable substance for alignment of liquid crystal
KR100481014B1 (en) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 Photosensitive resin composition using photopolymer
KR101015112B1 (en) 2004-07-12 2011-02-16 코오롱인더스트리 주식회사 Photosensitive resin composition with improved adhesion and tentability
JP2012144610A (en) * 2011-01-11 2012-08-02 Kansai Univ Photoresponsive polymer and molded object made by forming the photoresponsive polymer, and its usage

Also Published As

Publication number Publication date
JPS5728488B2 (en) 1982-06-17

Similar Documents

Publication Publication Date Title
JPS56141321A (en) Photosetting resin composition
SG18493G (en) Polyamides with hexafluoroisopropylidene groups,positively acting photosensitive compositions and recording materials using them
ES8300802A1 (en) Radiation-polymerizable composition and radiation-sensible copying material produced therewith.
KR890009793A (en) Thermosetting Ionomer Cement System
JPS55118030A (en) Photopolymerizable composition
JPS5749621A (en) Preparation of heat-resistant resin
JPS5710605A (en) Photopolymerizable composition
JPS55118911A (en) Photosensitive resin composition
KR890017278A (en) Photoinitiator Copolymer
JPS56145922A (en) Material for curable resin
JPS55118917A (en) Production of quinazolone ring-containing epoxy resin
JPS55104264A (en) Bezyl ketal derivative
JPS5653114A (en) Preparation of polymeric material for positive resist sensitive to radiation and far ultraviolet rays
JPS5742724A (en) Curable composition
JPS5553335A (en) Composite type electrophotographic plate
KR920020270A (en) Positive-acting radiation sensitive mixtures and radiation sensitive recording materials prepared using the mixtures
JPS57192461A (en) Photosensitive resin composition
JPS5649756A (en) Modifier for moldable resin
KR910000964A (en) A latent cationic polymerization initiator and a resin composition containing the same
JPS55135139A (en) New photosensitive polymer
JPS55717A (en) Photo-setting resin composition
JPS5749646A (en) Epoxy resin composition
JPS5682802A (en) Ultraviolet-curing coating composition
JPS5620023A (en) Curable composition
JPS56131566A (en) Maleimide derivative and its preparation