Nothing Special   »   [go: up one dir, main page]

JPS5480083A - High resolution mask - Google Patents

High resolution mask

Info

Publication number
JPS5480083A
JPS5480083A JP14215678A JP14215678A JPS5480083A JP S5480083 A JPS5480083 A JP S5480083A JP 14215678 A JP14215678 A JP 14215678A JP 14215678 A JP14215678 A JP 14215678A JP S5480083 A JPS5480083 A JP S5480083A
Authority
JP
Japan
Prior art keywords
high resolution
resolution mask
mask
resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14215678A
Other languages
Japanese (ja)
Inventor
Piitaa Riikusutein Jiyon
Ruushiyan Gurasu Hawaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IISUTO IMUPERIARU INTERN CORP
Original Assignee
IISUTO IMUPERIARU INTERN CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IISUTO IMUPERIARU INTERN CORP filed Critical IISUTO IMUPERIARU INTERN CORP
Publication of JPS5480083A publication Critical patent/JPS5480083A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP14215678A 1977-12-02 1978-11-16 High resolution mask Pending JPS5480083A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US85706177A 1977-12-02 1977-12-02

Publications (1)

Publication Number Publication Date
JPS5480083A true JPS5480083A (en) 1979-06-26

Family

ID=25325096

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14215678A Pending JPS5480083A (en) 1977-12-02 1978-11-16 High resolution mask

Country Status (4)

Country Link
JP (1) JPS5480083A (en)
DE (1) DE2852134A1 (en)
GB (1) GB2009442B (en)
IT (1) IT1107980B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552442A (en) * 1978-10-12 1980-04-16 Tsuonguraato Mejiei Tanatsui E Universal building frame construction
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2142158A (en) * 1983-05-25 1985-01-09 Philips Electronic Associated Electron lithography masks
DE3729432A1 (en) * 1987-09-03 1989-03-16 Philips Patentverwaltung METHOD FOR PRODUCING A MASK FOR RADIATION LITHOGRAPHY
WO2010086850A2 (en) 2009-01-29 2010-08-05 Digiflex Ltd. Process for producing a photomask on a photopolymeric surface

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552442A (en) * 1978-10-12 1980-04-16 Tsuonguraato Mejiei Tanatsui E Universal building frame construction
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask

Also Published As

Publication number Publication date
IT7852139A0 (en) 1978-11-30
DE2852134A1 (en) 1979-06-07
IT1107980B (en) 1985-12-02
GB2009442A (en) 1979-06-13
GB2009442B (en) 1982-10-20

Similar Documents

Publication Publication Date Title
JPS5480082A (en) Mask for projecting print
GB2001799B (en) Electron lens
JPS53121009A (en) Ceramicssmetal structures
GB2001938A (en) Lithographic apparatus
JPS5481941A (en) Projector
JPS549619A (en) Photosensitive composition
JPS5392630A (en) Projector
AU4029478A (en) Lithographic imaging composition
JPS5480083A (en) High resolution mask
JPS543029A (en) N*nndisubstituted ppphenylendiamine
JPS53134367A (en) Xxray mask
JPS5410729A (en) Photomask
JPS541952A (en) Eliminator
JPS53149649A (en) Arrester
JPS5387598A (en) Mask
JPS5441132A (en) Mask for xxray exposure
GB1552780A (en) Screen printing
GB2009759A (en) Electron resist
JPS5430250A (en) Photosensitive composition
ZA775104B (en) Prostacyslin analogs
JPS53148652A (en) Rotationntransmitting mechanism
JPS5489807A (en) Screen mask
JPS5432072A (en) Photomask
GB1545449A (en) Printing
JPS53117381A (en) Positive resist