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JPS5458792A - Photo-sensitive resin composition - Google Patents

Photo-sensitive resin composition

Info

Publication number
JPS5458792A
JPS5458792A JP12446377A JP12446377A JPS5458792A JP S5458792 A JPS5458792 A JP S5458792A JP 12446377 A JP12446377 A JP 12446377A JP 12446377 A JP12446377 A JP 12446377A JP S5458792 A JPS5458792 A JP S5458792A
Authority
JP
Japan
Prior art keywords
photo
sensitive polymer
direct bonds
aliphatic
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12446377A
Other languages
Japanese (ja)
Inventor
Kaoru Iwata
Tsuneo Hagiwara
Akihiro Horiie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP12446377A priority Critical patent/JPS5458792A/en
Publication of JPS5458792A publication Critical patent/JPS5458792A/en
Pending legal-status Critical Current

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  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE: The title composition developable by an aqueous solvent, consisting of a specific photo-sensitive polymer, a polymerizable monomer having an ethylenic double bond, and a photosensitizer.
CONSTITUTION: A) A photo-sensitive polymer is blended with B) 20W100wt.% of a monomer having a polymerizable ethylenic double bond, and C) 0.005W 1.0wt.% of a photosensitizer based on the total weight of A) and B). A) The photo-sensitive polymer has terminal groups hindered by the groups shown by the formulas I and X (R1 is H or methyl; R2 is 2W5C alkylne; p is 1W20; R3 is tetra functional organic group whose direct bonds a and b, and c and d are bonded to the neighboring carbon atoms respectively; R4 residue after removal of terminal hydroxyl groups from an aliphatic polyester and/or am aliphatic polyol having an average molecular weight of 300W4000 and terminal hydroxyl groups) and a main chain consisting of repeating units shown by the formulas III and/or IV (R5 is 2W15C aliphatic, alicylic, or aromatic group; the direct bonds and f are bonded, but the directbonds and e, the direct bonds f and f are not)
COPYRIGHT: (C)1979,JPO&Japio
JP12446377A 1977-10-19 1977-10-19 Photo-sensitive resin composition Pending JPS5458792A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12446377A JPS5458792A (en) 1977-10-19 1977-10-19 Photo-sensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12446377A JPS5458792A (en) 1977-10-19 1977-10-19 Photo-sensitive resin composition

Publications (1)

Publication Number Publication Date
JPS5458792A true JPS5458792A (en) 1979-05-11

Family

ID=14886135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12446377A Pending JPS5458792A (en) 1977-10-19 1977-10-19 Photo-sensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5458792A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540650A (en) * 1982-09-13 1985-09-10 Merck Patent Gesellschaft Mit Beschrankter Haftung Photoresists suitable for forming relief structures of highly heat-resistant polymers
US5707782A (en) * 1996-03-01 1998-01-13 The Board Of Trustees Of The University Of Illinois Photoimageable, dielectric, crosslinkable copolyesters

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540650A (en) * 1982-09-13 1985-09-10 Merck Patent Gesellschaft Mit Beschrankter Haftung Photoresists suitable for forming relief structures of highly heat-resistant polymers
US5707782A (en) * 1996-03-01 1998-01-13 The Board Of Trustees Of The University Of Illinois Photoimageable, dielectric, crosslinkable copolyesters

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