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JPS5420926A - Formation of electrode - Google Patents

Formation of electrode

Info

Publication number
JPS5420926A
JPS5420926A JP8425777A JP8425777A JPS5420926A JP S5420926 A JPS5420926 A JP S5420926A JP 8425777 A JP8425777 A JP 8425777A JP 8425777 A JP8425777 A JP 8425777A JP S5420926 A JPS5420926 A JP S5420926A
Authority
JP
Japan
Prior art keywords
formation
electrode
plated layer
mask
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8425777A
Other languages
Japanese (ja)
Inventor
Masayasu Tsunematsu
Akihiro Tomosawa
Masachika Narushima
Isao Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8425777A priority Critical patent/JPS5420926A/en
Publication of JPS5420926A publication Critical patent/JPS5420926A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE: To prevent a deterioration in step coverage of a passivating film on an Au plated layer in formation of a three phase electrode consisting of Ti, Pt and Au on a ground layer such as a semiconductor, by using a polyimide resin mask at the time of Au plating and leaving the part of the mask contacting with the Au plated layer.
COPYRIGHT: (C)1979,JPO&Japio
JP8425777A 1977-07-15 1977-07-15 Formation of electrode Pending JPS5420926A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8425777A JPS5420926A (en) 1977-07-15 1977-07-15 Formation of electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8425777A JPS5420926A (en) 1977-07-15 1977-07-15 Formation of electrode

Publications (1)

Publication Number Publication Date
JPS5420926A true JPS5420926A (en) 1979-02-16

Family

ID=13825392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8425777A Pending JPS5420926A (en) 1977-07-15 1977-07-15 Formation of electrode

Country Status (1)

Country Link
JP (1) JPS5420926A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7117583B2 (en) * 2002-03-18 2006-10-10 International Business Machines Corporation Method and apparatus using a pre-patterned seed layer for providing an aligned coil for an inductive head structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7117583B2 (en) * 2002-03-18 2006-10-10 International Business Machines Corporation Method and apparatus using a pre-patterned seed layer for providing an aligned coil for an inductive head structure

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