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JPS54141491A - Plasma etching - Google Patents

Plasma etching

Info

Publication number
JPS54141491A
JPS54141491A JP5060578A JP5060578A JPS54141491A JP S54141491 A JPS54141491 A JP S54141491A JP 5060578 A JP5060578 A JP 5060578A JP 5060578 A JP5060578 A JP 5060578A JP S54141491 A JPS54141491 A JP S54141491A
Authority
JP
Japan
Prior art keywords
plasma etching
etching
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5060578A
Other languages
Japanese (ja)
Other versions
JPS6321338B2 (en
Inventor
Jiyunichi Nishizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP5060578A priority Critical patent/JPS54141491A/en
Publication of JPS54141491A publication Critical patent/JPS54141491A/en
Publication of JPS6321338B2 publication Critical patent/JPS6321338B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP5060578A 1978-04-26 1978-04-26 Plasma etching Granted JPS54141491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5060578A JPS54141491A (en) 1978-04-26 1978-04-26 Plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5060578A JPS54141491A (en) 1978-04-26 1978-04-26 Plasma etching

Publications (2)

Publication Number Publication Date
JPS54141491A true JPS54141491A (en) 1979-11-02
JPS6321338B2 JPS6321338B2 (en) 1988-05-06

Family

ID=12863589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5060578A Granted JPS54141491A (en) 1978-04-26 1978-04-26 Plasma etching

Country Status (1)

Country Link
JP (1) JPS54141491A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5664437A (en) * 1979-08-22 1981-06-01 Onera (Off Nat Aerospatiale) Method and device for chemically etching integrated circuit by dry process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5664437A (en) * 1979-08-22 1981-06-01 Onera (Off Nat Aerospatiale) Method and device for chemically etching integrated circuit by dry process
JPH0313741B2 (en) * 1979-08-22 1991-02-25 Onera (Off Nat Aerospatiale)

Also Published As

Publication number Publication date
JPS6321338B2 (en) 1988-05-06

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