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JPH1174701A - Connection structure for dielectric waveguide line - Google Patents

Connection structure for dielectric waveguide line

Info

Publication number
JPH1174701A
JPH1174701A JP23315297A JP23315297A JPH1174701A JP H1174701 A JPH1174701 A JP H1174701A JP 23315297 A JP23315297 A JP 23315297A JP 23315297 A JP23315297 A JP 23315297A JP H1174701 A JPH1174701 A JP H1174701A
Authority
JP
Japan
Prior art keywords
conductor layer
dielectric waveguide
dielectric
line
waveguide line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23315297A
Other languages
Japanese (ja)
Inventor
Hiroshi Uchimura
弘志 内村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP23315297A priority Critical patent/JPH1174701A/en
Publication of JPH1174701A publication Critical patent/JPH1174701A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00Waveguides; Transmission lines of the waveguide type
    • H01P3/12Hollow waveguides
    • H01P3/121Hollow waveguides integrated in a substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00Coupling devices of the waveguide type
    • H01P5/02Coupling devices of the waveguide type with invariable factor of coupling
    • H01P5/022Transitions between lines of the same kind and shape, but with different dimensions
    • H01P5/024Transitions between lines of the same kind and shape, but with different dimensions between hollow waveguides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0237High frequency adaptations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits

Landscapes

  • Waveguide Connection Structure (AREA)
  • Waveguides (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide the connection structure for a dielectric waveguide line where a transmission loss in the connection section is small and the connection is easily attained with respect to the structure that is used for transmission of a high frequency signal for a printed circuit board applicable to a high frequency printed circuit board or a semiconductor element containing package or the like and where dielectric waveguide lines are connected and that is advantageous for miniaturization of the printed circuit board. SOLUTION: Waveguide regions 15A, 15B exposed to end faces of dielectric boards 11A, 11B are pressed into contact while being opposite to each other in a connection section between a 1st dielectric waveguide line 10A and a 2nd dielectric waveguide line 10B, an upper face conductor layer 12A of the 1st dielectric waveguide line 10A is extended onto an upper face conductor layer 12B of the 2nd dielectric waveguide line 12B, and a lower face conductor layer 13B of the 2nd dielectric waveguide line 10B is extended under a lower face conductor layer 13A of the 1st dielectric waveguide line 10A and they are connected respectively. Thus, a connection with a low loss is easily realized without leakage of electromagnetic waves.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、マイクロ波帯およ
びミリ波帯等の高周波信号を伝送するための誘電体導波
管線路同士の接続構造に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a connection structure between dielectric waveguide lines for transmitting high-frequency signals in a microwave band, a millimeter wave band or the like.

【0002】[0002]

【従来技術】マイクロ波帯やミリ波帯等の高周波信号を
扱う高周波回路の分野では、その回路に用いられる高周
波用の各素子が小さく、単一の回路基板内で回路システ
ムが構成される場合もあるが、多くの場合は回路が機能
毎にブロック化され、その間が高周波用の伝送線路で接
続される。従来より、これらの高周波信号を伝送するた
めの伝送線路としては導波管・同軸線路・マイクロスト
リップ線路・コプレーナ線路・誘電体導波管線路等が知
られているが、それらの伝送線路の接続方法は様々であ
る。
2. Description of the Related Art In the field of high-frequency circuits that handle high-frequency signals such as microwave bands and millimeter-wave bands, when high-frequency elements used in the circuits are small and a circuit system is formed on a single circuit board. However, in many cases, the circuit is divided into blocks for each function, and the circuit is connected between the blocks by a high-frequency transmission line. Conventionally, transmission lines for transmitting these high-frequency signals include waveguides, coaxial lines, microstrip lines, coplanar lines, and dielectric waveguide lines. The methods vary.

【0003】例えば、導波管の場合は端部に接続用のフ
ランジを形成し、それを合わせてネジ止めすることによ
り接続される。また同軸線路の場合は同軸構造の専用の
コネクタを用いて接続される。このように導波管や同軸
線路の場合には容易に接続できるが、これらは高周波回
路を構成する基板上または基板内に形成して回路を小型
化することができない。
[0003] For example, in the case of a waveguide, a connection flange is formed at an end portion, and the waveguide is connected by screwing together. In the case of a coaxial line, it is connected using a dedicated connector having a coaxial structure. As described above, in the case of a waveguide or a coaxial line, they can be easily connected, but they cannot be formed on or in a substrate constituting a high-frequency circuit to reduce the size of the circuit.

【0004】一方、高周波回路基板あるいは高周波用半
導体素子収納用パッケージ等に用いられる配線基板内に
形成されることの多いマイクロストリップ線路あるいは
コプレーナ線路は、金線等のボンディングワイヤあるい
は金リボン等のボンディングリボンを用いて信号線路お
よびグランド導体層をそれぞれ接続することによって接
続され、回路の小型化にも有利である。
On the other hand, a microstrip line or a coplanar line which is often formed in a wiring board used for a high-frequency circuit board or a package for accommodating a high-frequency semiconductor element is formed by bonding wires such as gold wires or bonding wires such as gold ribbons. The connection is made by connecting the signal line and the ground conductor layer using the ribbon, respectively, which is advantageous for miniaturization of the circuit.

【0005】また、同様に回路の小型化に有利な誘電体
導波管線路の場合は、ほぼ同サイズの誘電体導波管線路
同士の端面を当接し、誘電体基板の上下に形成されたグ
ランド導体層を半田等で電気的に接続することにより接
続されている。
Similarly, in the case of a dielectric waveguide line which is advantageous for miniaturization of a circuit, the end faces of dielectric waveguide lines having substantially the same size are brought into contact with each other and are formed above and below a dielectric substrate. The connection is made by electrically connecting the ground conductor layers with solder or the like.

【0006】[0006]

【発明が解決しようとする課題】一般的に高周波の領域
では線路における信号強度の減衰が大きいので、伝送線
路には低損失であることが要求される。従って、線路の
接続部における損失も小さいことが望ましい。
Generally, in a high-frequency region, signal intensity in a line is greatly attenuated, so that a transmission line is required to have low loss. Therefore, it is desirable that the loss at the connection part of the line is also small.

【0007】導波管や同軸線路の場合は低損失で容易に
線路の接続ができるが、上述したように高周波半導体素
子収納用パッケージや高周波回路基板等の高周波回路を
構成する配線基板に用いるには大き過ぎるという問題点
があった。
In the case of a waveguide or a coaxial line, the line can be easily connected with low loss. However, as described above, it is used for a wiring board constituting a high-frequency circuit such as a high-frequency semiconductor element storage package or a high-frequency circuit board. Had the problem of being too large.

【0008】一方、マイクロストリップ線路やコプレー
ナ線路の場合は、上述したように線路の接続が金線や金
リボン等で行なわれることから、その接続部での特性イ
ンピーダンスが不連続となって高周波信号の反射が発生
して高周波特性が劣化するため、低損失での線路の接続
が困難であるという問題点があった。
On the other hand, in the case of a microstrip line or a coplanar line, the connection of the line is made by a gold wire or a gold ribbon as described above, so that the characteristic impedance at the connection portion becomes discontinuous and the high-frequency signal becomes high. There is a problem that it is difficult to connect the lines with low loss because reflection occurs and the high-frequency characteristics deteriorate.

【0009】さらに、マイクロストリップ線路やコプレ
ーナ線路により高周波用半導体素子収納用パッケージ内
の回路からパッケージ外部に線路を引き出す場合、パッ
ケージ内部を気密封止するための壁をこれらの線路が貫
通する必要がある。この場合、壁がある部分で線路の周
りの誘電率が変わるので、特性インピーダンスが変化
し、高周波信号の反射により伝送特性が劣化するという
問題があった。
Further, when a line is drawn out of a circuit in a package for housing a high-frequency semiconductor element by a microstrip line or a coplanar line to the outside of the package, these lines need to penetrate a wall for hermetically sealing the inside of the package. is there. In this case, since the dielectric constant around the line changes at the portion where the wall is present, there is a problem that the characteristic impedance changes and transmission characteristics deteriorate due to reflection of a high-frequency signal.

【0010】また、従来の誘電体導波管線路の接続によ
れば、誘電体導波管線路同士の当接部のグランド導体層
間で隙間が生じやすく、線路を伝播する高周波信号のモ
ードによってはその隙間から高周波信号の電磁波が漏れ
てしまい、低損失な線路の接続が困難であるという問題
点があった。
Further, according to the conventional connection of the dielectric waveguide lines, a gap is easily formed between the ground conductor layers at the contact portions of the dielectric waveguide lines, and depending on the mode of the high-frequency signal propagating through the lines. Electromagnetic waves of high-frequency signals leak from the gaps, and it is difficult to connect low-loss lines.

【0011】本発明は上記事情に鑑みて案出されたもの
であり、その目的は、高周波用の回路基板や半導体素子
収納用パッケージ等に適用可能な配線基板における高周
波信号の伝送に用いられ、基板の小型化に有利な誘電体
導波管線路同士を接続する構造について、接続部におけ
る伝送損失が小さく、しかも容易に接続が可能な誘電体
導波管線路の接続構造を提供することにある。
The present invention has been devised in view of the above circumstances, and has as its object to be used for transmission of a high-frequency signal in a wiring board applicable to a high-frequency circuit board, a semiconductor element housing package, and the like. An object of the present invention is to provide a connection structure of a dielectric waveguide line which has a small transmission loss at a connection portion and can be easily connected with respect to a structure for connecting the dielectric waveguide lines which is advantageous for miniaturization of a substrate. .

【0012】[0012]

【課題を解決するための手段】本発明者は、上記の問題
点に関して検討を重ねた結果、特開平6−53711 号に開
示されているような、誘電体導波管線路同士を接続する
構造について、各誘電体導波管線路の端面の導波管領域
が互いに一致するようにして当接して固定し、かつ誘電
体基板の上下に形成されたグランド導体層をその当接位
置からずらせて電気的に接続し、あるいは当接位置にお
いて導波管領域を覆うような補助的な導体板を貼付して
グランド導体層同士を電気的に接続することにより、上
記問題が解決できることを見いだした。
The present inventor has studied the above problems, and as a result, has found that a structure for connecting dielectric waveguide lines as disclosed in Japanese Patent Laid-Open No. 6-53711. For each of the dielectric waveguide lines, the waveguide regions at the end faces of the dielectric waveguide lines are brought into contact with each other so that they are in contact with each other, and the ground conductor layers formed above and below the dielectric substrate are shifted from the contact positions. It has been found that the above problem can be solved by electrically connecting or attaching an auxiliary conductor plate that covers the waveguide region at the contact position and electrically connecting the ground conductor layers.

【0013】本発明の誘電体導波管線路の接続構造は、
上面導体層と下面導体層とに挟持された誘電体基板中に
前記上面導体層と前記下面導体層間を電気的に接続する
2列の貫通導体が形成され、前記上面導体層と前記下面
導体層と前記貫通導体とに囲まれた導波管領域によって
高周波信号を伝送する第1の誘電体導波管線路と第2の
誘電体導波管線路とを、前記誘電体基板の端面に露出し
た前記導波管領域同士が対向するように互いに当接させ
るとともに、前記第1の誘電体導波管線路の上面導体層
を前記第2の誘電体導波管線路の上面導体層上に延長し
て上面導体層同士を電気的に接続し、かつ前記第2の誘
電体導波管線路の下面導体層を前記第1の誘電体導波管
線路の下面導体層下に延長して下面導体層同士を電気的
に接続することにより、接続したことを特徴とするもの
である。
The connection structure of the dielectric waveguide of the present invention is as follows.
Two rows of through conductors for electrically connecting the upper conductor layer and the lower conductor layer are formed in a dielectric substrate sandwiched between the upper conductor layer and the lower conductor layer, and the upper conductor layer and the lower conductor layer are formed. A first dielectric waveguide line and a second dielectric waveguide line for transmitting a high-frequency signal by a waveguide region surrounded by the through-conductor and the through conductor are exposed at an end face of the dielectric substrate; The waveguide regions are brought into contact with each other so as to face each other, and the upper conductor layer of the first dielectric waveguide is extended on the upper conductor layer of the second dielectric waveguide. And electrically connects the upper conductor layers to each other, and extends the lower conductor layer of the second dielectric waveguide below the lower conductor layer of the first dielectric waveguide. It is characterized by being connected by electrically connecting them.

【0014】また、本発明の誘電体導波管線路の接続構
造は、上面導体層と下面導体層とに挟持された誘電体基
板中に前記上面導体層と前記下面導体層間を電気的に接
続する2列の貫通導体が形成され、前記上面導体層と前
記下面導体層と前記貫通導体とに囲まれた導波管領域に
よって高周波信号を伝送する第1の誘電体導波管線路と
第2の誘電体導波管線路とを、前記誘電体基板の端面に
露出した前記導波管領域同士が対向するように互いに当
接させるとともに、前記第1の誘電体導波管線路の上面
導体層を前記第2の誘電体導波管線路の上面導体層上に
延長して上面導体層同士を電気的に接続し、かつ前記第
1の誘電体導波管線路の下面導体層を前記第2の誘電体
導波管線路の下面導体層下に延長して下面導体層同士を
電気的に接続することにより、接続したことを特徴とす
るものである。
Further, in the connection structure for a dielectric waveguide line according to the present invention, the upper conductor layer and the lower conductor layer are electrically connected to each other in a dielectric substrate sandwiched between the upper conductor layer and the lower conductor layer. A first dielectric waveguide line for transmitting a high-frequency signal through a waveguide region surrounded by the upper conductor layer, the lower conductor layer, and the through conductor; And a dielectric waveguide line is abutted against each other such that the waveguide regions exposed on the end face of the dielectric substrate face each other, and the upper surface conductor layer of the first dielectric waveguide line is Is extended over the upper conductor layer of the second dielectric waveguide line to electrically connect the upper conductor layers, and the lower conductor layer of the first dielectric waveguide line is Extending below the lower conductor layer of the dielectric waveguide line of the first and electrically connecting the lower conductor layers to each other And a, is characterized in that it has connections.

【0015】さらにまた、本発明の誘電体導波管線路の
接続構造は、上面導体層と下面導体層とに挟持された誘
電体基板中に前記上面導体層と前記下面導体層間を電気
的に接続する2列の貫通導体が形成され、前記上面導体
層と前記下面導体層と前記貫通導体とに囲まれた導波管
領域によって高周波信号を伝送する2つの誘電体導波管
線路を、前記誘電体基板の端面に露出した前記導波管領
域同士が対向するように互いに当接させるとともに、各
々の誘電体導波管線路の上面導体層同士および下面導体
層同士を前記2列の貫通導体の間隔以上の幅を有する導
体板で電気的に接続することにより、接続したことを特
徴とするものである。
Still further, the connection structure for a dielectric waveguide line according to the present invention is characterized in that the upper conductor layer and the lower conductor layer are electrically connected in a dielectric substrate sandwiched between the upper conductor layer and the lower conductor layer. Two rows of through conductors to be connected are formed, and two dielectric waveguide lines transmitting a high-frequency signal by a waveguide region surrounded by the upper conductor layer, the lower conductor layer, and the through conductor, The waveguide regions exposed on the end face of the dielectric substrate are brought into contact with each other so as to face each other, and the upper conductor layers and the lower conductor layers of each dielectric waveguide line are connected in the two rows of through conductors. Are electrically connected by a conductor plate having a width equal to or larger than the distance between the electrodes.

【0016】本発明の誘電体導波管線路の接続構造によ
れば、2つの誘電体導波管線路の接続部において、誘電
体基板の端面に露出した導波管領域同士が対向するよう
に一致させて互いに当接させるとともに、誘電体基板同
士の端面の当接部を越えて一方の誘電体導波管線路の上
面導体層を他方の誘電体導波管線路の上面導体層上に、
および一方の誘電体導波管線路の下面導体層を他方の誘
電体導波管線路の下面導体層下にそれぞれ延長して電気
的に接続したことから、あるいは上面導体層同士および
下面導体層同士を2列の貫通導体の間隔以上の幅すなわ
ち導波管領域の幅以上の幅を有する導体板でもって誘電
体基板同士の端面の当接部を跨いで電気的に接続したこ
とから、誘電体基板同士の当接部の上部および下部に上
面導体層および下面導体層の隙間がなくなり、それによ
り導波管領域同士の当接部から外部への高周波信号の電
磁波の漏れがなくなるので、誘電体導波管線路同士の低
損失な接続が可能となり、しかも容易に接続することが
できる誘電体導波管線路の接続構造となる。
According to the connection structure of the dielectric waveguide lines of the present invention, at the connection portion of the two dielectric waveguide lines, the waveguide regions exposed on the end face of the dielectric substrate face each other. The upper conductor layer of one dielectric waveguide line is placed on the upper conductor layer of the other dielectric waveguide line beyond the contact part of the end faces of the dielectric substrates while being in contact with each other.
And the lower conductor layer of one dielectric waveguide line is extended below and electrically connected to the lower conductor layer of the other dielectric waveguide line. Is electrically connected across the abutting portion of the end faces of the dielectric substrates with a conductor plate having a width equal to or greater than the interval between two rows of through conductors, that is, a width equal to or greater than the width of the waveguide region. There is no gap between the upper conductor layer and the lower conductor layer at the upper and lower portions of the abutting portion between the substrates, thereby preventing leakage of high frequency signal electromagnetic waves from the abutting portion between the waveguide regions to the outside. A low loss connection between the waveguide lines is made possible, and the connection structure of the dielectric waveguide lines can be easily connected.

【0017】[0017]

【発明の実施の形態】以下、本発明の誘電体導波路の接
続構造を図面を参照しながら説明する。まず、図7は本
発明の接続構造が適用される誘電体導波管線路の一例を
示す斜視図であり、同図の誘電体導波管線路1によれ
ば、所定の厚みaの誘電体基板2の上面および下面にそ
れぞれ誘電体基板2の少なくとも線路形成位置を狭持す
るように上面導体層3および下面導体層4が形成されて
いる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A connection structure of a dielectric waveguide according to the present invention will be described below with reference to the drawings. First, FIG. 7 is a perspective view showing an example of a dielectric waveguide line to which the connection structure of the present invention is applied. According to the dielectric waveguide line 1 shown in FIG. An upper conductor layer 3 and a lower conductor layer 4 are formed on the upper and lower surfaces of the substrate 2 so as to sandwich at least the line formation position of the dielectric substrate 2.

【0018】また、誘電体基板2中の上面導体層3と下
面導体層4との間には、上面導体層3および下面導体層
4を電気的に接続する2列の貫通導体として、ビアホー
ル導体が多数設けられて2列のビアホール導体群5を構
成しており、これにより、上面導体層3と下面導体層4
と2列のビアホール導体群5とに囲まれた領域で導波管
領域6を有する誘電体導波管線路1を構成している。
In addition, between the upper conductor layer 3 and the lower conductor layer 4 in the dielectric substrate 2, via-hole conductors are provided as two rows of through conductors for electrically connecting the upper conductor layer 3 and the lower conductor layer 4. Are provided to form two rows of via-hole conductor groups 5, whereby the upper conductor layer 3 and the lower conductor layer 4
And a region surrounded by the two rows of via-hole conductor groups 5 constitutes the dielectric waveguide line 1 having the waveguide region 6.

【0019】ビアホール導体群5は所定の間隔bで2列
に信号伝送方向すなわち信号線路形成方向に所定の繰り
返し間隔cで形成されている。所定の間隔bはこの導波
管領域で伝送する高周波信号に応じて、信号の遮断波長
の1/2より大きく設定する。また、間隔aに対する制
限は特にはないが、b/2程度とすることにより、上面
導体層3および下面導体層4をH面とするシングルモー
ドで用いることができる。一方、所定の繰り返し間隔c
は、導波管領域6により伝送される高周波信号の波長の
1/2未満の間隔に設定されることで電気的な壁を形成
している。
The via-hole conductor groups 5 are formed in two rows at a predetermined interval b and at a predetermined repetition interval c in the signal transmission direction, that is, the signal line forming direction. The predetermined interval b is set to be larger than 1/2 of the cutoff wavelength of the signal according to the high frequency signal transmitted in the waveguide region. There is no particular limitation on the distance a, but by setting it to about b / 2, it is possible to use the single-mode in which the upper conductor layer 3 and the lower conductor layer 4 are H-planes. On the other hand, a predetermined repetition interval c
Are formed at intervals less than half the wavelength of the high-frequency signal transmitted by the waveguide region 6, thereby forming an electrical wall.

【0020】このようにビアホール導体群5のピッチc
が信号波長λcの2分の1未満とされていると、電気的
な側壁により高周波信号の電磁波は伝送線路に対して垂
直方向に伝播することができず、反射しながら伝送線路
方向に伝播される。その結果、上面導体層3と下面導体
層4および2列のビアホール導体群5によって囲まれる
断面積がa×bの領域の導波管線路領域6により、誘電
体導波管と非常に良く類似した伝送特性が得られる。
As described above, the pitch c of the via-hole conductor group 5
Is less than one half of the signal wavelength λc, the electromagnetic wave of the high-frequency signal cannot be propagated in the direction perpendicular to the transmission line due to the electric side wall, and is propagated in the direction of the transmission line while being reflected. You. As a result, the waveguide line region 6 having a cross-sectional area of a × b surrounded by the upper conductor layer 3 and the lower conductor layer 4 and the two rows of via-hole conductor groups 5 is very similar to the dielectric waveguide. The obtained transmission characteristics are obtained.

【0021】なお、ビアホール導体群5を4列あるいは
6列に配設してビアホール導体群5による疑似的な導体
壁を2重・3重に形成することにより、導体壁からの電
磁波の漏れをより効果的に防止することもでき、また、
2列のビアホール導体群5の各列を形成するビアホール
同士を電気的に接続する補助導体層を所望により適宜形
成してもよい。
By arranging the via-hole conductor groups 5 in four rows or six rows and forming pseudo conductor walls formed by the via-hole conductor groups 5 in two or three layers, leakage of electromagnetic waves from the conductor walls can be reduced. Can be more effectively prevented,
An auxiliary conductor layer for electrically connecting the via holes forming each row of the two rows of via hole conductor groups 5 may be appropriately formed as desired.

【0022】さらに、上面導体層3および下面導体層4
を電気的に接続する2列の貫通導体は必ずしもビアホー
ル導体5により形成する必要はなく、例えば上面導体層
3と下面導体層4とを電気的に接続する2列(2枚)の
貫通導体層により構成してもよい。
Further, the upper conductor layer 3 and the lower conductor layer 4
Are not necessarily formed by the via-hole conductors 5, for example, two rows (two sheets) of through-conductor layers electrically connecting the upper conductor layer 3 and the lower conductor layer 4 are formed. May be used.

【0023】このような導波管線路領域6によれば、誘
電体導波管となるので、誘電体基板2の比誘電率をεと
すると導波管サイズは通常の導波管の1/ε1/2 の大き
さになる。従って、誘電体基板2を比誘電率の大きい材
料によって構成するほど導波管サイズは小さくすること
ができ、高密度に配線が形成される多層配線基板または
半導体素子収納用パッケージの伝送線路として利用可能
な大きさとなる。
According to such a waveguide line region 6, since the dielectric waveguide is formed, if the relative permittivity of the dielectric substrate 2 is set to ε, the waveguide size is 1 / the size of a normal waveguide.大 き1/2 size. Therefore, when the dielectric substrate 2 is made of a material having a large relative dielectric constant, the waveguide size can be reduced, and the dielectric substrate 2 is used as a transmission line of a multilayer wiring board on which wiring is formed at a high density or a package for housing semiconductor elements. It will be as large as possible.

【0024】次に、本発明の誘電体導波管線路の接続構
造の実施の形態の一例を、このような誘電体導波管線路
に本発明の接続構造を適用した例により図1に示す。こ
の図1は2つの誘電体導波管線路を接続した本発明の実
施の形態の一例を示す分解斜視図である。
Next, an example of an embodiment of the connection structure of the dielectric waveguide line of the present invention is shown in FIG. 1 by an example in which the connection structure of the present invention is applied to such a dielectric waveguide line. . FIG. 1 is an exploded perspective view showing an example of an embodiment of the present invention in which two dielectric waveguide lines are connected.

【0025】図1において、10Aは第1の誘電体導波管
線路、10Bは第2の誘電体導波管線路であり、11A・11
Bは誘電体基板、12A・12Bは上面導体層、13A・13B
は下面導体層であり、誘電体基板は11A・11Bは上面導
体層12A・12Bと下面導体層13A・13Bとに挟持されて
いる。14A・14Bは2列のビアホール導体群であり、上
面導体層12A・12Bと下面導体層13A・13B間を電気的
に接続する2列の貫通導体として多数のビアホール導体
により構成されている。これにより、上面導体層12A・
12Bと下面導体層13A・13Bと2列のビアホール導体群
14A・14Bとに囲まれた領域で導波管領域15A・15Bを
構成している。
In FIG. 1, reference numeral 10A denotes a first dielectric waveguide line, 10B denotes a second dielectric waveguide line, and 11A and 11A.
B is a dielectric substrate, 12A and 12B are upper conductor layers, 13A and 13B
Is a lower conductor layer, and the dielectric substrate 11A, 11B is sandwiched between upper conductor layers 12A, 12B and lower conductor layers 13A, 13B. 14A and 14B are two rows of via-hole conductor groups, each of which is constituted by a large number of via-hole conductors as two rows of through conductors for electrically connecting between the upper conductor layers 12A and 12B and the lower conductor layers 13A and 13B. Thereby, the upper conductor layer 12A
12B, lower conductor layers 13A and 13B and two rows of via hole conductors
Waveguide regions 15A and 15B are constituted by regions surrounded by 14A and 14B.

【0026】ここで、第1の誘電体導波管線路10Aおよ
び第2の誘電体導波管線路10Bにおいて、図7に示した
誘電体導波管線路1と同様に、誘電体基板11A・11Bは
所定厚みaを有し、2列のビアホール導体群14A・14B
は所定の間隔bで2列に導波管領域15A・15B形成方向
に所定の繰り返し間隔cで形成されている。
Here, in the first dielectric waveguide line 10A and the second dielectric waveguide line 10B, similarly to the dielectric waveguide line 1 shown in FIG. 11B has a predetermined thickness a and has two rows of via-hole conductor groups 14A and 14B.
Are formed in two rows at a predetermined interval b and at a predetermined repetition interval c in the direction in which the waveguide regions 15A and 15B are formed.

【0027】図1に示した本発明の誘電体導波管線路の
接続構造によれば、第1の誘電体導波管線路10Aと第2
の誘電体導波管線路10Bとを、それぞれの誘電体基板11
A・11Bの端面に露出した導波管領域15A・15B同士が
対向するように互いに当接させるとともに、第1の誘電
体導波管線路10Aの上面導体層12Aを第2の誘電体導波
管線路10Bの上面導体層12B上に延長して上面導体層12
A・12B同士を電気的に接続し、かつ第2の誘電体導波
管線路10Bの下面導体層13Bを第1の誘電体導波管線路
10Aの下面導体層13A下に延長して下面導体層13A・13
B同士を電気的に接続することにより、誘電体基板11A
・11Bの端面の当接位置に導体層の隙間を開けることな
く接続したことを特徴とする。
According to the connection structure of the dielectric waveguide line of the present invention shown in FIG. 1, the first dielectric waveguide line 10A is connected to the second dielectric waveguide line 10A.
And the respective dielectric substrates 11
The waveguide regions 15A and 15B exposed at the end faces of the A and 11B are brought into contact with each other so as to face each other, and the upper conductor layer 12A of the first dielectric waveguide line 10A is connected to the second dielectric waveguide. The upper surface conductor layer 12 extends on the upper surface conductor layer 12B of the pipe line 10B.
A and 12B are electrically connected to each other, and the lower conductor layer 13B of the second dielectric waveguide line 10B is connected to the first dielectric waveguide line.
Extending below the lower conductor layer 13A of 10A, the lower conductor layers 13A
B are electrically connected to each other to form a dielectric substrate 11A.
-It is characterized in that it is connected without leaving a gap between the conductor layers at the contact position of the end face of 11B.

【0028】このように誘電体導波管線路10A・10B同
士の接続部の構造を階段状にし、誘電体基板11A・11B
の端面に露出した導波管領域15A・15Bの断面が一致す
るように合わせた後、誘電体基板11A・11Bの端面とず
らせた位置で上面導体層12A・12B同士および下面導体
層13A・13B同士を半田等で接続する。これにより第1
の誘電体導波管線路10Aと第2の誘電体導波管線路10B
とが容易に電気的および機械的に接続され、上下面の導
体層をH面としたTE10モードで用いた場合に誘電体基
板11A・11B同士を当接させた端面からの電磁波の漏れ
がない接続構造となる。
As described above, the structure of the connection portion between the dielectric waveguide lines 10A and 10B is made stepwise, and the dielectric substrates 11A and 11B are formed.
The upper and lower conductor layers 12A and 12B and the lower conductor layers 13A and 13B are aligned at positions shifted from the end faces of the dielectric substrates 11A and 11B after matching so that the cross sections of the waveguide regions 15A and 15B exposed at the end faces of the dielectric layers 11A and 15B coincide. Are connected to each other with solder or the like. This makes the first
Dielectric waveguide line 10A and second dielectric waveguide line 10B
Are easily electrically and mechanically connected to each other, and there is no leakage of electromagnetic waves from the end face where the dielectric substrates 11A and 11B are brought into contact with each other when used in the TE10 mode in which the upper and lower conductor layers are H surfaces. It becomes a connection structure.

【0029】次に、本発明の誘電体導波管線路の接続構
造の実施の形態の他の例を図1と同様の分解斜視図で図
2に示す。
Next, another embodiment of the connection structure of the dielectric waveguide line according to the present invention is shown in FIG. 2 in an exploded perspective view similar to FIG.

【0030】図2において、20Aは第1の誘電体導波管
線路、20Bは第2の誘電体導波管線路であり、21A・21
Bは誘電体基板、22A・22Bは上面導体層、23A・23B
は下面導体層であり、誘電体基板は21A・21Bは上面導
体層22A・22Bと下面導体層23A・23Bとに挟持されて
いる。24A・24Bは2列のビアホール導体群であり、上
面導体層22A・22Bと下面導体層23A・23B間を電気的
に接続する2列の貫通導体として多数のビアホール導体
により構成されている。これにより、上面導体層22A・
22Bと下面導体層23A・23Bと2列のビアホール導体群
24A・24Bとに囲まれた領域で導波管領域25A・25Bを
構成している。
In FIG. 2, reference numeral 20A denotes a first dielectric waveguide line, reference numeral 20B denotes a second dielectric waveguide line, and 21A and 21A.
B is a dielectric substrate, 22A and 22B are upper conductor layers, 23A and 23B
Is a lower conductor layer, and the dielectric substrate 21A / 21B is sandwiched between upper conductor layers 22A / 22B and lower conductor layers 23A / 23B. 24A and 24B are a group of via-hole conductors in two rows, and are constituted by a large number of via-hole conductors as two rows of through-hole conductors for electrically connecting the upper conductor layers 22A and 22B and the lower conductor layers 23A and 23B. Thereby, the upper conductor layer 22A
22B, lower conductor layers 23A and 23B and two rows of via-hole conductor groups
A region surrounded by 24A and 24B constitutes waveguide regions 25A and 25B.

【0031】ここで、第1の誘電体導波管線路20Aおよ
び第2の誘電体導波管線路20Bにおいても、図7に示し
た誘電体導波管線路1と同様に、誘電体基板21Aは所定
厚みaを有し、誘電体基板21Bはその所定厚みaよりも
上面導体層22Bおよび下面導体層23Bの厚みだけ薄い厚
みを有しており、2列のビアホール導体群24A・24Bは
所定の間隔bで2列に導波管領域25A・25B形成方向に
所定の繰り返し間隔cで形成されている。
Here, the first dielectric waveguide line 20A and the second dielectric waveguide line 20B also have a dielectric substrate 21A similar to the dielectric waveguide line 1 shown in FIG. Has a predetermined thickness a, the dielectric substrate 21B has a thickness smaller than the predetermined thickness a by the thickness of the upper conductor layer 22B and the lower conductor layer 23B, and the two rows of via-hole conductor groups 24A and 24B Are formed in two rows at a predetermined repetition interval c in the formation direction of the waveguide regions 25A and 25B.

【0032】図2に示した本発明の誘電体導波管線路の
接続構造によれば、第1の誘電体導波管線路20Aと第2
の誘電体導波管線路20Bとを、それぞれの誘電体基板21
A・21Bの端面に露出した導波管領域25A・25B同士が
対向するように互いに当接させるとともに、第1の誘電
体導波管線路20Aの上面導体層22Aを第2の誘電体導波
管線路20Bの上面導体層22B上に延長して上面導体層22
A・22B同士を電気的に接続し、かつ第1の誘電体導波
管線路20Aの下面導体層23Aを第2の誘電体導波管線路
20Bの下面導体層23B下に延長して下面導体層23A・23
B同士を電気的に接続することにより、誘電体基板21A
・21Bの端面の当接位置に導体層の隙間を開けることな
く接続したことを特徴とする。
According to the connection structure of the dielectric waveguide line of the present invention shown in FIG. 2, the first dielectric waveguide line 20A is connected to the second dielectric waveguide line 20A.
And the respective dielectric substrates 21
The waveguide regions 25A and 25B exposed at the end faces of the first and second waveguides A and 21B are brought into contact with each other so as to face each other, and the upper conductor layer 22A of the first dielectric waveguide line 20A is connected to the second dielectric waveguide. The upper conductor layer 22 extends on the upper conductor layer 22B of the pipe line 20B.
A and 22B are electrically connected to each other, and the lower conductor layer 23A of the first dielectric waveguide line 20A is connected to the second dielectric waveguide line.
The lower conductor layers 23A and 23 extend below the lower conductor layer 23B of 20B.
B are electrically connected to each other to form the dielectric substrate 21A.
-It is characterized in that it is connected to the contact position of the end face of 21B without leaving a gap between the conductor layers.

【0033】このように誘電体導波管線路20A・20B同
士の接続部の構造を第1の誘電体導波管線路20Aの上面
導体層22Aと下面導体層23Aとにより接続部の第2の誘
電体導波管線路20Bの誘電体基板21Bを挟持するように
し、誘電体基板21A・21Bの端面に露出した導波管領域
25A・25Bの断面が一致するように合わせた後、誘電体
基板21A・21Bの端面とずらせた位置で上面導体層22A
・22B同士および下面導体層23A・23B同士を半田等で
接続する。これにより第1の誘電体導波管線路20Aと第
2の誘電体導波管線路20Bとが容易に電気的および機械
的に接続され、上下面の導体層をH面としたTE10モー
ドで用いた場合に誘電体基板21A・21B同士を当接させ
た端面からの電磁波の漏れがない接続構造となる。
As described above, the structure of the connecting portion between the dielectric waveguide lines 20A and 20B is changed to the second connecting portion by the upper conductor layer 22A and the lower conductor layer 23A of the first dielectric waveguide line 20A. A waveguide region exposed on the end faces of the dielectric substrates 21A and 21B so as to sandwich the dielectric substrate 21B of the dielectric waveguide 20B.
After matching so that the cross sections of 25A and 25B coincide with each other, the upper surface conductor layer 22A is shifted from the end faces of the dielectric substrates 21A and 21B.
-Connect 22B to each other and lower surface conductor layers 23A and 23B by soldering or the like. As a result, the first dielectric waveguide line 20A and the second dielectric waveguide line 20B are easily electrically and mechanically connected to each other, and are used in the TE10 mode in which the upper and lower conductor layers are H-planes. In this case, the connection structure has no leakage of electromagnetic waves from the end face where the dielectric substrates 21A and 21B are in contact with each other.

【0034】次に、本発明の誘電体導波管線路の接続構
造の実施の形態の他の例を図1・図2と同様の分解斜視
図で図3に示す。
Next, FIG. 3 is an exploded perspective view similar to FIGS. 1 and 2 showing another embodiment of the connection structure of the dielectric waveguide line according to the present invention.

【0035】図3において、30Aは第1の誘電体導波管
線路、30Bは第2の誘電体導波管線路であり、31A・31
Bは誘電体基板、32A・32Bは上面導体層、33A・33B
は下面導体層であり、誘電体基板は31A・31Bは上面導
体層32A・32Bと下面導体層33A・33Bとに挟持されて
いる。34A・34Bは2列のビアホール導体群であり、上
面導体層32A・32Bと下面導体層33A・33B間を電気的
に接続する2列の貫通導体として多数のビアホール導体
により構成されている。これにより、上面導体層32A・
32Bと下面導体層33A・33Bと2列のビアホール導体群
34A・34Bとに囲まれた領域で導波管領域35A・35Bを
構成している。
In FIG. 3, 30A is a first dielectric waveguide line, 30B is a second dielectric waveguide line, and 31A and 31
B is a dielectric substrate, 32A and 32B are upper conductor layers, 33A and 33B
Is a lower conductor layer, and the dielectric substrate 31A, 31B is sandwiched between the upper conductor layers 32A, 32B and the lower conductor layers 33A, 33B. 34A and 34B are a group of via-hole conductors in two rows, each of which is constituted by a large number of via-hole conductors as two rows of through conductors for electrically connecting the upper conductor layers 32A and 32B and the lower conductor layers 33A and 33B. Thereby, the upper conductor layer 32A
32B, lower conductor layers 33A and 33B and two rows of via hole conductors
The region surrounded by 34A and 34B constitutes the waveguide regions 35A and 35B.

【0036】ここで、第1の誘電体導波管線路30Aおよ
び第2の誘電体導波管線路30Bにおいても、図7に示し
た誘電体導波管線路1と同様に、誘電体基板31A・31B
は所定厚みaを有し、2列のビアホール導体群34A・34
Bは所定の間隔bで2列に導波管領域35A・35B形成方
向に所定の繰り返し間隔cで形成されている。
Here, in the first dielectric waveguide line 30A and the second dielectric waveguide line 30B, similarly to the dielectric waveguide line 1 shown in FIG. 7, the dielectric substrate 31A is formed.・ 31B
Has a predetermined thickness a and has two rows of via-hole conductor groups 34A and 34A.
B is formed in two rows at a predetermined interval b at a predetermined repetition interval c in the direction of forming the waveguide regions 35A and 35B.

【0037】図3に示した本発明の誘電体導波管線路の
接続構造によれば、第1の誘電体導波管線路30Aと第2
の誘電体導波管線路30Bとを、それぞれの誘電体基板31
A・31Bの端面に露出した導波管領域35A・35B同士が
対向するように互いに当接させるとともに、各々の誘電
体導波管線路30A・30Bの上面導体層32A・32B同士お
よび下面導体層33A・33B同士を2列の貫通導体の間隔
以上の幅を有する導体板36で電気的に接続することによ
り、接続したことを特徴とする。
According to the connection structure of the dielectric waveguide line of the present invention shown in FIG. 3, the first dielectric waveguide line 30A is connected to the second dielectric waveguide line 30A.
And the respective dielectric substrates 31
The waveguide regions 35A and 35B exposed at the end faces of the A and 31B are brought into contact with each other so as to face each other, and the upper conductor layers 32A and 32B of the respective dielectric waveguide lines 30A and 30B and the lower conductor layers are formed. 33A and 33B are electrically connected to each other by a conductor plate 36 having a width equal to or greater than the interval between two rows of through conductors.

【0038】なお、図3では導体板36を上面導体層32A
・32Bおよび下面導体層33A・33Bに接続する前の状態
で示しており、それぞれの誘電体基板31A・31Bの端面
に露出した導波管領域35A・35B同士が対向するように
互いに当接させた後、図3中の上面導体層32A・32Bに
それぞれ二点鎖線および一点鎖線で示した部位ならびに
下面導体層33A・33Bにそれぞれ二点鎖線および一点鎖
線で示した部位に対して、導体板36を半田等の溶融金属
や銀ペースト等の導電性ペーストを用いて貼付したりネ
ジ等を用いて取着することにより上面導体層32A・32B
および下面導体層33A・33Bにそれぞれ電気的に接合
し、上面導体層32A・32B同士および下面導体層33A・
33B同士を電気的に接続して誘電体導波管線路30A・30
B同士を接続する。
In FIG. 3, the conductor plate 36 is formed on the upper conductor layer 32A.
The state before connecting to 32B and the lower conductor layers 33A and 33B is shown, and the waveguide regions 35A and 35B exposed at the end faces of the respective dielectric substrates 31A and 31B are brought into contact with each other so as to face each other. After that, in FIG. 3, the upper conductor layers 32A and 32B are indicated by the two-dot chain line and the one-dot chain line, and the lower conductor layers 33A and 33B are respectively indicated by the two-dot chain line and the one-dot chain line. The upper surface conductor layers 32A and 32B are attached by using a molten metal such as solder or a conductive paste such as silver paste, or by attaching them using screws or the like.
And the lower conductor layers 33A and 33B, respectively, and electrically connected to the upper conductor layers 32A and 32B and the lower conductor layers 33A and 33B.
33B are electrically connected to each other to form a dielectric waveguide line 30A / 30.
B are connected to each other.

【0039】このように誘電体導波管線路30A・30B同
士の接続部の構造を、誘電体基板31A・31Bの端面に露
出した導波管領域35A・35Bの断面が一致するように合
わせた後、誘電体基板31A・31Bの端面に位置する上面
導体層32A・32B同士および下面導体層33A・33B同士
の導体の隙間を導体板36で導波管領域35A・35Bを覆う
ように電気的に接続する。これにより第1の誘電体導波
管線路30Aと第2の誘電体導波管線路30Bとが容易に電
気的および物理的に接続されるとともに上面導体層32A
・32B同士および下面導体層33A・33B同士の導体の隙
間を導体板36で遮蔽することができ、上下面の導体層を
H面としたTE10モードで用いた場合に誘電体基板31A
・31B同士を当接させた端面からの電磁波の漏れがない
接続構造となる。
As described above, the structure of the connecting portion between the dielectric waveguide lines 30A and 30B is adjusted so that the cross sections of the waveguide regions 35A and 35B exposed at the end faces of the dielectric substrates 31A and 31B coincide. Thereafter, the gap between the conductors between the upper conductor layers 32A and 32B and between the lower conductor layers 33A and 33B located at the end faces of the dielectric substrates 31A and 31B is electrically connected to the conductor plates 36 so as to cover the waveguide regions 35A and 35B. Connect to As a result, the first dielectric waveguide line 30A and the second dielectric waveguide line 30B are easily electrically and physically connected, and the upper conductor layer 32A is formed.
The gap between conductors between 32B and between the lower conductor layers 33A and 33B can be shielded by the conductor plate 36, and the dielectric substrate 31A can be used in the TE10 mode in which the upper and lower conductor layers are H surfaces.
-The connection structure has no leakage of electromagnetic waves from the end faces where the 31Bs are in contact with each other.

【0040】なお、この導体板36には、後述するように
金属板等の他にも、誘電体基板31A・31B同士の当接部
の上面導体層32A・32B同士および下面導体層33A・33
B同士の上に印刷塗布した銀ペースト等の導電性ペース
トを用いることもできる。
In addition to the metal plate and the like as described later, the conductor plate 36 may include upper surface conductor layers 32A and 32B and lower surface conductor layers 33A and 33 at the contact portions between the dielectric substrates 31A and 31B.
It is also possible to use a conductive paste such as a silver paste printed and applied on Bs.

【0041】なお、以上の本発明の誘電体導波管線路の
接続構造の例における誘電体基板同士の当接面は、いず
れも導波管領域に対して垂直な面となっているが、これ
は導波管領域同士が一致するように隙間無く当接されて
接合されれば斜めの面であってもよく、また、導波管領
域同士の位置合わせがしやすいように、互いにはまり合
うよう一方が凸で他方が凹であるような形状をしていて
もよい。
In the above-described example of the connection structure of the dielectric waveguide line of the present invention, the contact surfaces between the dielectric substrates are all perpendicular to the waveguide region. This may be an oblique surface as long as the waveguide regions are abutted and joined without a gap so that they coincide with each other, and they fit into each other so that the waveguide regions can be easily aligned. The shape may be such that one is convex and the other is concave.

【0042】本発明における誘電体導波管線路の誘電体
基板としては、誘電体として機能し高周波信号の伝送を
妨げることのない特性を有するものであればとりわけ限
定するものではないが、伝送線路を形成する際の精度お
よび製造の容易性の点からは、誘電体基板はセラミック
スからなることが望ましい。
The dielectric substrate of the dielectric waveguide line according to the present invention is not particularly limited as long as it functions as a dielectric and does not hinder the transmission of high-frequency signals. It is desirable that the dielectric substrate be made of ceramics from the viewpoints of precision in forming the substrate and easiness of manufacture.

【0043】このようなセラミックスとしてはこれまで
様々な比誘電率を持つセラミックスが知られているが、
上記のような導波管線路によって高周波信号を伝送する
ためには常誘電体であることが望ましい。これは、一般
に強誘電体セラミックスは高周波領域では誘電損失が大
きく伝送損失が大きくなるためである。従って、誘電体
基板1の比誘電率εr は4〜100 程度が適当である。
As such ceramics, ceramics having various relative dielectric constants have been known.
In order to transmit a high-frequency signal through the above-described waveguide line, a paraelectric material is desirable. This is because ferroelectric ceramics generally have large dielectric loss and high transmission loss in a high frequency range. Therefore, the relative dielectric constant ε r of the dielectric substrate 1 is suitably about 4 to 100.

【0044】また、一般に多層配線基板や半導体素子収
納用パッケージに形成される配線層の線幅は最大でも1
mmであることから、比誘電率が100 の材料を用い、上
部がH面すなわち磁界が上側の面に平行に巻く電磁界分
布になるように用いた場合、用いることのできる最小の
周波数は15GHzと算出され、マイクロ波帯の領域でも
利用可能となる。一方、一般的に誘電体基板として用い
られる樹脂からなる誘電体は、比誘電率εr が2程度で
あるため、線幅が1mmの場合、約100 GHz以上でな
いと利用することができないものとなる。
In general, the line width of a wiring layer formed on a multilayer wiring board or a package for housing a semiconductor element has a maximum of 1
mm, the minimum frequency that can be used is 15 GHz when a material having a relative dielectric constant of 100 is used and the upper surface is an H plane, that is, an electromagnetic field distribution in which the magnetic field is wound parallel to the upper surface. , And can be used in the microwave band region. On the other hand, a dielectric made of a resin generally used as a dielectric substrate has a relative dielectric constant ε r of about 2, so that a line width of 1 mm cannot be used unless the line width is about 100 GHz or more. Become.

【0045】また、このような常誘電体セラミックスの
中にはアルミナやシリカ等のように誘電正接が非常に小
さなものが多いが、全ての常誘電体セラミックスが利用
可能であるわけではない。誘電体導波管線路の場合は導
体による損失はほとんどなく、信号伝送時の損失のほと
んどは誘電体による損失であり、誘電体による損失α
(dB/m)は下記のように表わされる。 α=27.3×tanδ/λ/{1−(λ/λc )2 1/2 式中、tanδ:誘電体の誘電正接 λ :誘電体中の波長 λc :遮断波長 規格化された矩形導波管(WRJシリーズ)形状に準ず
ると、上式中の{1−(λ/λc )2 1/2 は0.75程度
である。
In addition, many of such paraelectric ceramics have very small dielectric loss tangents, such as alumina and silica, but not all paraelectric ceramics can be used. In the case of a dielectric waveguide line, there is almost no loss due to the conductor, and most of the loss during signal transmission is due to the dielectric, and the loss due to the dielectric α
(DB / m) is expressed as follows. α = 27.3 × tanδ / λ / {1- (λ / λc) 21/2 where tanδ: dielectric loss tangent of dielectric λ: wavelength in dielectric λc: cut-off wavelength Standardized rectangular waveguide According to the (WRJ series) shape, {1- (λ / λc) 2 } 1/2 in the above equation is about 0.75.

【0046】従って、実用に供し得る伝送損失である−
100 (dB/m)以下にするには、下記の関係が成立す
るように誘電体を選択することが必要である。
Therefore, the transmission loss is practically usable.
In order to make it 100 (dB / m) or less, it is necessary to select a dielectric so that the following relationship is satisfied.

【0047】f×εr 1/2 ×tanδ≦0.8 式中、fは使用する周波数(GHz)である。F × ε r 1/2 × tan δ ≦ 0.8 where f is the frequency (GHz) to be used.

【0048】このような誘電体基板としては、例えばア
ルミナセラミックスやガラスセラミックス・窒化アルミ
ニウムセラミックス等があり、例えばセラミックス原料
粉末に適当な有機溶剤・溶媒を添加混合して泥漿状にな
すとともにこれを従来周知のドクターブレード法やカレ
ンダーロール法等を採用してシート状となすことによっ
て複数枚のセラミックグリーンシートを得、しかる後、
これらセラミックグリーンシートの各々に適当な打ち抜
き加工を施すとともにこれらを積層し、アルミナセラミ
ックスの場合は1500〜1700℃、ガラスセラミックスの場
合は850 〜1000℃、窒化アルミニウムセラミックスの場
合は1600〜1900℃の温度で焼成することによって製作さ
れる。
Examples of such a dielectric substrate include alumina ceramics, glass ceramics, and aluminum nitride ceramics. For example, a ceramic raw material powder is mixed with an appropriate organic solvent and a solvent to form a slurry, which is conventionally formed. A plurality of ceramic green sheets are obtained by forming a sheet using a well-known doctor blade method, a calendar roll method, or the like, and thereafter,
Each of these ceramic green sheets is subjected to an appropriate punching process and laminated. It is manufactured by firing at a temperature.

【0049】また、上面導体層および下面導体層として
は、例えば誘電体基板がアルミナセラミックスから成る
場合、タングステン等の金属粉末に適当なアルミナ・シ
リカ・マグネシア等の酸化物や有機溶剤・溶媒等を添加
混合してペースト状にしたものを厚膜印刷法により少な
くとも伝送線路を完全に覆うようにセラミックグリーン
シート上に印刷し、しかる後、約1600℃の高温で焼成
し、厚み10〜15μm程度となるようにして形成する。ま
た、金属粉末としては、ガラスセラミックスの場合は銅
・金・銀が、窒化アルミニウムセラミックスの場合はタ
ングステン・モリブデンが好適である。
As the upper conductor layer and the lower conductor layer, for example, when the dielectric substrate is made of alumina ceramics, an oxide such as alumina, silica, magnesia, or an organic solvent or solvent is used for a metal powder such as tungsten. The paste that was added and mixed was printed on a ceramic green sheet by a thick film printing method so as to completely cover at least the transmission line, and then fired at a high temperature of about 1600 ° C. to a thickness of about 10 to 15 μm. It is formed as follows. Further, as the metal powder, copper / gold / silver is preferable for glass ceramics, and tungsten / molybdenum is preferable for aluminum nitride ceramics.

【0050】なお、誘電体導波管線路の接続部において
上面導体層および下面導体層を延長するには、そのさら
に上または下に誘電体層を形成すればよい。
In order to extend the upper conductor layer and the lower conductor layer at the connection portion of the dielectric waveguide, a dielectric layer may be formed further above or below it.

【0051】また、2列の貫通導体としては、上記のよ
うに例えばビアホール導体群やスルーホール導体群等に
より形成すればよいが、その断面形状は、製作が容易な
円形の他、矩形や菱形等の多角形であってもよい。これ
ら貫通導体は、例えばセラミックグリーンシートに打ち
抜き加工を施して作製した貫通孔に上面導体層および下
面導体層と同様の金属ペーストを埋め込み、しかる後、
誘電体基板と同時に焼成し形成すればよい。なお、貫通
導体をビアホール導体群やスルーホール導体群により構
成する場合、各貫通導体は直径50〜300 μmが適当であ
る。
The two rows of through conductors may be formed by, for example, a via hole conductor group, a through hole conductor group, or the like as described above. And the like. These through conductors, for example, the same metal paste as the upper surface conductor layer and the lower surface conductor layer is embedded in a through hole produced by punching a ceramic green sheet, and then,
It may be formed by firing simultaneously with the dielectric substrate. When the through conductors are formed by via-hole conductor groups or through-hole conductor groups, it is appropriate that each through-conductor has a diameter of 50 to 300 μm.

【0052】また、導体板36は、接続部の導体層の隙間
から電磁波が漏れるのを防ぐためのものであるため、そ
の隙間を覆えるものであれば、導電性の金属板または金
属ペースト・金属箔等のいずれでもよい。
Further, since the conductor plate 36 is for preventing electromagnetic waves from leaking from the gap between the conductor layers of the connecting portions, any conductive metal plate or metal paste, if it can cover the gap, can be used. Any of metal foil and the like may be used.

【0053】次に、本発明の誘電体導波管線路の接続構
造を半導体素子収納用パッケージに適用した例を図4に
断面図で示す。図4は図1に示した接続構造を適用した
例であり、同図において、40は回路基板、41A・41Bは
回路基板40上に実装された2つの半導体素子収納用パッ
ケージである。42A・42Bは各半導体素子収納用パッケ
ージ41A・41Bの内部から基板端面にかけて形成された
誘電体導波管線路であり、それぞれ誘電体基板43A・43
Bが上面導体層44A・44Bと下面導体層45A・45Bとに
より挟持され、誘電体基板43A・43B内部に2列の貫通
導体(図示せず)が形成されて導波管領域を形成してい
る。そして、誘電体導波管線路42A・42Bの一方の端部
には半導体素子収納用パッケージ41A・41Bのキャビテ
ィ内部に実装された高周波用半導体素子46A・46Bが導
波管領域と接続するためのビアホールとボンディングワ
イヤとを介して電気的に接続され、他方の端部は半導体
素子収納用パッケージ41A・41Bのキャビティ外部にお
いて本発明の接続構造によって接続されている。
Next, FIG. 4 is a cross-sectional view showing an example in which the connection structure of the dielectric waveguide line of the present invention is applied to a package for housing a semiconductor element. FIG. 4 shows an example in which the connection structure shown in FIG. 1 is applied. In FIG. 4, reference numeral 40 denotes a circuit board, and 41A and 41B denote two semiconductor element housing packages mounted on the circuit board 40. Reference numerals 42A and 42B denote dielectric waveguide lines formed from the insides of the respective semiconductor element storage packages 41A and 41B to the end faces of the substrates.
B is sandwiched between the upper conductor layers 44A and 44B and the lower conductor layers 45A and 45B, and two rows of through conductors (not shown) are formed inside the dielectric substrates 43A and 43B to form a waveguide region. I have. At one end of the dielectric waveguide lines 42A and 42B, the high-frequency semiconductor elements 46A and 46B mounted inside the cavities of the semiconductor element housing packages 41A and 41B are connected to the waveguide region. It is electrically connected via a via hole and a bonding wire, and the other end is connected outside the cavity of the semiconductor element housing packages 41A and 41B by the connection structure of the present invention.

【0054】なお、同図においてaは誘電体基板43A・
43B同士の当接位置を、bは誘電体導波管線路42Aの上
面導体層44Aを誘電体導波管線路42Bの誘電体基板43B
上に延長した上面導体層44A・44B同士の接続位置を、
cは誘電体導波管線路42Bの下面導体層45Bを誘電体導
波管線路42Aの誘電体基板43A下に延長した下面導体層
45A・45B同士の接続位置をそれぞれ示している。
In the figure, a is a dielectric substrate 43A.
The contact position between 43B is indicated by b. The upper surface conductor layer 44A of the dielectric waveguide line 42A is connected to the dielectric substrate 43B of the dielectric waveguide line 42B.
The connection position between the upper conductor layers 44A and 44B extended upward
c is a lower conductor layer obtained by extending the lower conductor layer 45B of the dielectric waveguide line 42B below the dielectric substrate 43A of the dielectric waveguide line 42A.
The connection positions of 45A and 45B are shown.

【0055】このような誘電体導波管線路の接続構造に
より半導体素子収納用パッケージ同士を接続すること
で、従来のように、高周波伝送線路が半導体素子収納用
パッケージ41A・41Bのキャビティ内部から外部に出る
ときに生じる高周波信号の反射や、キャビティ外部での
誘電体導波管線路同士の接続部における高周波信号の漏
れや反射等が生じなくなり、良好な高周波特性でもって
誘電体導波管線路同士を接続することが可能となる。
By connecting the semiconductor element housing packages to each other by such a connection structure of the dielectric waveguide lines, the high-frequency transmission line is connected from the inside of the cavity of the semiconductor element housing packages 41A and 41B to the outside as in the conventional case. Reflection of high-frequency signals that occurs when the waveguides exit, and leakage or reflection of high-frequency signals at the connection between the dielectric waveguide lines outside the cavity do not occur, and the dielectric waveguide lines have good high-frequency characteristics. Can be connected.

【0056】[0056]

【実施例】まず、図7に示したような構成の、長さ30m
mの誘電体導波管線路を作製した。この誘電体導波管線
路においては、厚さ0.2 mmのセラミック誘電体シート
を4層積層し、貫通導体としてb=2mm、c=0.26m
mとなるように直径0.1 mmの2列のビアホール導体群
を形成した。また、高周波信号の給電部は0.1 mmのビ
アホールを積層したセラミック誘電体シートの上から3
層まで形成し、ピン給電できるように構成した。誘電体
材料の誘電特性は、比誘電率が5.0 、60GHzにおける
誘電正接が8×10-4のガラスセラミックスを用い、上面
導体層・下面導体層およびビアホール導体群は銅メタラ
イズペーストを印刷塗布した後、900℃の窒素雰囲気中
で焼成して形成した。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, a 30 m long structure as shown in FIG.
m of dielectric waveguide lines were manufactured. In this dielectric waveguide line, four layers of ceramic dielectric sheets having a thickness of 0.2 mm are laminated, and b = 2 mm and c = 0.26 m as through conductors.
Two rows of via-hole conductor groups having a diameter of 0.1 mm were formed so as to have a diameter m. The power supply part for the high-frequency signal is 3 m from the top of the ceramic dielectric sheet on which the 0.1 mm via hole is laminated.
Layers were formed to allow pin feeding. The dielectric properties of the dielectric material are as follows: a glass ceramic having a relative dielectric constant of 5.0 and a dielectric loss tangent of 8 × 10 -4 at 60 GHz is used. The upper and lower conductor layers and the via hole conductor group are printed and coated with a copper metallizing paste. At 900 ° C. in a nitrogen atmosphere.

【0057】このようにして作製した誘電体導波管線路
について高周波信号の伝送特性を測定した。その測定結
果を図5に線図で示す。
The transmission characteristics of a high-frequency signal were measured for the dielectric waveguide line thus manufactured. The measurement results are shown in a diagram in FIG.

【0058】図5において横軸は周波数f(GHz)
を、縦軸は伝送特性S(dB)を、2つの特性曲線はそ
れぞれS11およびS21を表している。図5は給電ピンの
損失を含めた特性を示すものであるが、S21の特性曲線
から分かるように、40から45GHzにおいて−1dBの
良好な特性が得られている。
In FIG. 5, the horizontal axis represents the frequency f (GHz).
And the vertical axis the transmission characteristic S (dB), the two characteristic curves represent the S 11 and S 21, respectively. Figure 5 is shows the characteristics including the loss of the power supply pin, as can be seen from the characteristic curve of the S 21, good characteristics of -1dB in 45GHz is obtained from 40.

【0059】次に、この誘電体導波管線路を2つ用意
し、それらの誘電体基板同士を導波管領域を一致させて
当接して樹脂系接着剤で接続すると同時に、図3に示し
た例の導体板として銀ペーストを誘電体基板の当接部の
上面導体層および下面導体層上に2列のビアホール導体
群の間隔以上の幅の3mmで、導波管領域の方向に長さ
1mmで塗布して、本発明の誘電体導波管線路の接続構
造を作製した。
Next, two dielectric waveguide lines are prepared, and these dielectric substrates are brought into contact with the waveguide regions in alignment with each other and connected with a resin adhesive, and at the same time, as shown in FIG. A silver paste was used as the conductor plate in the above example, and a width of 3 mm or more in width in the direction of the waveguide region was set on the upper conductor layer and the lower conductor layer in contact with the dielectric substrate at a width of at least the distance between two rows of via hole conductor groups. It was applied with a thickness of 1 mm to produce a connection structure of the dielectric waveguide line of the present invention.

【0060】この本発明の接続構造を有する誘電体導波
管線路について同様に高周波信号の伝送特性を測定し
た。その測定結果を図6に図5と同様の線図で示す。
The transmission characteristics of high-frequency signals of the dielectric waveguide having the connection structure of the present invention were measured in the same manner. FIG. 6 shows the measurement result in the same diagram as FIG.

【0061】図6においても横軸は周波数f(GHz)
を、縦軸は伝送特性S(dB)を、2つの特性曲線はそ
れぞれS11およびS21を表している。この図6の結果と
図5の結果とを比較することにより、接続構造に起因す
る損失はほとんどなく、本発明の誘電体導波管線路の接
続構造は接続部における伝送損失が小さく、しかも容易
に接続が可能なものであることが分かる。
Also in FIG. 6, the horizontal axis is the frequency f (GHz).
And the vertical axis the transmission characteristic S (dB), the two characteristic curves represent the S 11 and S 21, respectively. By comparing the result of FIG. 6 with the result of FIG. 5, there is almost no loss due to the connection structure, and the connection structure of the dielectric waveguide line of the present invention has a small transmission loss at the connection portion and is easy to use. It can be seen that the connection is possible.

【0062】[0062]

【発明の効果】以上詳述した通り、本発明の誘電体導波
管線路の接続構造によれば、2つの誘電体導波管線路の
接続部において、誘電体基板の端面に露出した導波管領
域同士が対向するように一致させて互いに当接させると
ともに、誘電体基板同士の端面の当接部を越えて一方の
誘電体導波管線路の上面導体層を他方の誘電体導波管線
路の上面導体層上に、および一方の誘電体導波管線路の
下面導体層を他方の誘電体導波管線路の下面導体層下に
それぞれ延長して電気的に接続したことから、あるいは
上面導体層同士および下面導体層同士を2列の貫通導体
の間隔以上の幅すなわち導波管領域の幅以上の幅を有す
る導体板でもって誘電体基板同士の端面の当接部を跨い
で電気的に接続したことから、誘電体基板同士の当接部
の上部および下部に上面導体層および下面導体層の隙間
がなくなり、それにより導波管領域同士の当接部から外
部への高周波信号の電磁波の漏れがなくなって、誘電体
導波管線路同士の低損失な接続が可能となり、しかも容
易に接続することができる誘電体導波管線路の接続構造
となった。
As described above in detail, according to the connection structure of the dielectric waveguide line of the present invention, the waveguide exposed at the end face of the dielectric substrate at the connection portion between the two dielectric waveguide lines. Tube regions are brought into contact with each other so as to be opposed to each other, and the upper surface conductor layer of one dielectric waveguide line is moved beyond the contact portion at the end face of the dielectric substrates to the other dielectric waveguide. Because the upper conductor layer of the line and the lower conductor layer of one dielectric waveguide line are extended under the lower conductor layer of the other dielectric waveguide line and electrically connected to each other, or The conductor layers and the lower conductor layers are electrically connected to each other by a conductor plate having a width equal to or greater than the distance between two rows of through conductors, that is, a width equal to or greater than the width of the waveguide region, across the contact portions of the end faces of the dielectric substrates. Connected to the upper and lower parts of the abutment between the dielectric substrates There is no gap between the upper conductor layer and the lower conductor layer, so that leakage of high frequency signal electromagnetic waves from the abutting portion of the waveguide regions to the outside is eliminated, and low-loss connection between the dielectric waveguide lines is achieved. A connection structure of a dielectric waveguide line which can be connected easily can be obtained.

【0063】本発明によれば、高周波用の回路基板や半
導体素子収納用パッケージ等に適用可能な配線基板にお
ける高周波信号の伝送に用いられ、基板の小型化に有利
な誘電体導波管線路同士を接続する構造について、接続
部における伝送損失が小さく、しかも容易に接続が可能
な誘電体導波管線路の接続構造を提供することができ
た。
According to the present invention, two dielectric waveguide lines are used for transmitting high-frequency signals on a wiring board applicable to a high-frequency circuit board or a package for accommodating a semiconductor element, and are advantageous for miniaturization of the board. With respect to the connection structure, a connection structure of a dielectric waveguide line having a small transmission loss at a connection portion and capable of being easily connected can be provided.

【0064】本発明の誘電体導波管線路の接続構造を半
導体素子収納用パッケージや高周波回路の配線基板に適
用することで、これらにおける誘電体導波管線路の接続
における容易で信頼性の高い低コストの高周波回路接続
構造が提供できる。
By applying the connection structure of the dielectric waveguide line of the present invention to a package for housing a semiconductor element or a wiring board of a high-frequency circuit, it is easy and highly reliable to connect the dielectric waveguide line in these. A low-cost high-frequency circuit connection structure can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の誘電体導波管線路の接続構造の実施の
形態の一例を示す分解斜視図である。
FIG. 1 is an exploded perspective view showing an example of an embodiment of a connection structure of a dielectric waveguide line according to the present invention.

【図2】本発明の誘電体導波管線路の接続構造の実施の
形態の他の例を示す分解斜視図である。
FIG. 2 is an exploded perspective view showing another example of the embodiment of the connection structure of the dielectric waveguide line of the present invention.

【図3】本発明の誘電体導波管線路の接続構造の実施の
形態の他の例を示す分解斜視図である。
FIG. 3 is an exploded perspective view showing another example of the embodiment of the connection structure of the dielectric waveguide line of the present invention.

【図4】本発明の誘電体導波管線路の接続構造を半導体
素子収納用パッケージに適用した実施の形態の一例を示
す断面図である。
FIG. 4 is a cross-sectional view showing an example of an embodiment in which the connection structure of the dielectric waveguide line of the present invention is applied to a package for housing a semiconductor element.

【図5】図7に示した誘電体導波管線路の伝送特性を示
す線図である。
FIG. 5 is a diagram showing transmission characteristics of the dielectric waveguide line shown in FIG. 7;

【図6】本発明の誘電体導波管線路の接続構造の伝送特
性を示す線図である。
FIG. 6 is a diagram showing transmission characteristics of a connection structure of a dielectric waveguide line according to the present invention.

【図7】本発明の誘電体導波管線路の接続構造が適用さ
れる誘電体導波管線路の一例を示す斜視図である。
FIG. 7 is a perspective view showing an example of a dielectric waveguide line to which the connection structure of the dielectric waveguide line of the present invention is applied.

【符号の説明】[Explanation of symbols]

1、42A、42B・・・・・・・・・・・・・・・誘電体
導波管線路 10A、20A、30A・・・・・・・・・・・・・・第1の
誘電体導波管線路 10B、20B、30B・・・・・・・・・・・・・・第2の
誘電体導波管線路 2、11A、11B、21A、21B、31A、31B、43A、43B
・・・誘電体基板 3、12A、12B、22A、22B、32A、32B、44A、44B
・・・上面導体層 4、13A、13B、23A、23B、33A、33B、45A、45B
・・・下面導体層 5、14A、14B、24A、24B、34A、34B・・・貫通導
体(ビアホール導体群) 6、15A、15B、25A、25B、35A、35B・・・導波管
領域 36・・・導体板
1, 42A, 42B: dielectric waveguide line 10A, 20A, 30A: first dielectric Waveguide lines 10B, 20B, 30B... Second dielectric waveguide lines 2, 11A, 11B, 21A, 21B, 31A, 31B, 43A, 43B
... Dielectric substrate 3, 12A, 12B, 22A, 22B, 32A, 32B, 44A, 44B
... Top conductor layer 4, 13A, 13B, 23A, 23B, 33A, 33B, 45A, 45B
... lower surface conductor layer 5, 14A, 14B, 24A, 24B, 34A, 34B ... through conductor (via hole conductor group) 6, 15A, 15B, 25A, 25B, 35A, 35B ... waveguide region 36 ... Conductor plates

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 上面導体層と下面導体層とに挟持された
誘電体基板中に前記上面導体層と前記下面導体層間を電
気的に接続する2列の貫通導体が形成され、前記上面導
体層と前記下面導体層と前記貫通導体とに囲まれた導波
管領域によって高周波信号を伝送する第1の誘電体導波
管線路と第2の誘電体導波管線路とを、前記誘電体基板
の端面に露出した前記導波管領域同士が対向するように
互いに当接させるとともに、前記第1の誘電体導波管線
路の上面導体層を前記第2の誘電体導波管線路の上面導
体層上に延長して上面導体層同士を電気的に接続し、か
つ前記第2の誘電体導波管線路の下面導体層を前記第1
の誘電体導波管線路の下面導体層下に延長して下面導体
層同士を電気的に接続することにより、接続したことを
特徴とする誘電体導波管線路の接続構造。
1. A two-row through conductor that electrically connects the upper conductor layer and the lower conductor layer is formed in a dielectric substrate sandwiched between the upper conductor layer and the lower conductor layer, and the upper conductor layer A first dielectric waveguide line and a second dielectric waveguide line for transmitting a high-frequency signal through a waveguide region surrounded by the lower conductor layer and the through conductor; And the upper surface conductor layer of the first dielectric waveguide line is brought into contact with each other so that the waveguide regions exposed at the end surfaces of the second dielectric waveguide line face each other. The upper conductor layer is extended over the first conductor layer to electrically connect the upper conductor layers to each other, and the lower conductor layer of the second dielectric waveguide is connected to the first conductor layer.
A connection structure for a dielectric waveguide line, wherein the connection is established by extending below the lower conductor layer of the dielectric waveguide line and electrically connecting the lower conductor layers to each other.
【請求項2】 上面導体層と下面導体層とに挟持された
誘電体基板中に前記上面導体層と前記下面導体層間を電
気的に接続する2列の貫通導体が形成され、前記上面導
体層と前記下面導体層と前記貫通導体とに囲まれた導波
管領域によって高周波信号を伝送する第1の誘電体導波
管線路と第2の誘電体導波管線路とを、前記誘電体基板
の端面に露出した前記導波管領域同士が対向するように
互いに当接させるとともに、前記第1の誘電体導波管線
路の上面導体層を前記第2の誘電体導波管線路の上面導
体層上に延長して上面導体層同士を電気的に接続し、か
つ前記第1の誘電体導波管線路の下面導体層を前記第2
の誘電体導波管線路の下面導体層下に延長して下面導体
層同士を電気的に接続することにより、接続したことを
特徴とする誘電体導波管線路の接続構造。
2. A dielectric substrate sandwiched between an upper conductor layer and a lower conductor layer, wherein two rows of through conductors for electrically connecting the upper conductor layer and the lower conductor layer are formed, and the upper conductor layer is formed. A first dielectric waveguide line and a second dielectric waveguide line for transmitting a high-frequency signal through a waveguide region surrounded by the lower conductor layer and the through conductor; And the upper surface conductor layer of the first dielectric waveguide line is brought into contact with each other so that the waveguide regions exposed at the end surfaces of the second dielectric waveguide line face each other. The upper conductor layer is extended on the second conductor layer to electrically connect the upper conductor layers to each other, and the lower conductor layer of the first dielectric waveguide is connected to the second conductor waveguide.
A connection structure for a dielectric waveguide line, wherein the connection is established by extending below the lower conductor layer of the dielectric waveguide line and electrically connecting the lower conductor layers to each other.
【請求項3】 上面導体層と下面導体層とに挟持された
誘電体基板中に前記上面導体層と前記下面導体層間を電
気的に接続する2列の貫通導体が形成され、前記上面導
体層と前記下面導体層と前記貫通導体とに囲まれた導波
管領域によって高周波信号を伝送する2つの誘電体導波
管線路を、前記誘電体基板の端面に露出した前記導波管
領域同士が対向するように互いに当接させるとともに、
各々の誘電体導波管線路の上面導体層同士および下面導
体層同士を前記2列の貫通導体の間隔以上の幅を有する
導体板で電気的に接続することにより、接続したことを
特徴とする誘電体導波管線路の接続構造。
3. A dielectric substrate sandwiched between an upper conductor layer and a lower conductor layer, two rows of through conductors for electrically connecting the upper conductor layer and the lower conductor layer are formed, and the upper conductor layer And two dielectric waveguide lines transmitting a high-frequency signal by a waveguide region surrounded by the lower conductor layer and the through conductor, the waveguide regions exposed on the end face of the dielectric substrate are connected to each other. Abut each other so as to face each other,
The upper conductor layers and the lower conductor layers of each dielectric waveguide line are electrically connected to each other by a conductor plate having a width equal to or larger than the distance between the two rows of through conductors. Connection structure of dielectric waveguide line.
JP23315297A 1997-08-28 1997-08-28 Connection structure for dielectric waveguide line Pending JPH1174701A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23315297A JPH1174701A (en) 1997-08-28 1997-08-28 Connection structure for dielectric waveguide line

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23315297A JPH1174701A (en) 1997-08-28 1997-08-28 Connection structure for dielectric waveguide line

Publications (1)

Publication Number Publication Date
JPH1174701A true JPH1174701A (en) 1999-03-16

Family

ID=16950541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23315297A Pending JPH1174701A (en) 1997-08-28 1997-08-28 Connection structure for dielectric waveguide line

Country Status (1)

Country Link
JP (1) JPH1174701A (en)

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