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JPH1126851A - Laser device - Google Patents

Laser device

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Publication number
JPH1126851A
JPH1126851A JP17715597A JP17715597A JPH1126851A JP H1126851 A JPH1126851 A JP H1126851A JP 17715597 A JP17715597 A JP 17715597A JP 17715597 A JP17715597 A JP 17715597A JP H1126851 A JPH1126851 A JP H1126851A
Authority
JP
Japan
Prior art keywords
optical system
pulse
polarizing
laser
polarized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17715597A
Other languages
Japanese (ja)
Inventor
Junji Nishizaki
純司 西崎
Teruichiro Fukazawa
輝一郎 深澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP17715597A priority Critical patent/JPH1126851A/en
Publication of JPH1126851A publication Critical patent/JPH1126851A/en
Pending legal-status Critical Current

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  • Lasers (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide laser device which can emit a pulse beam having a high average power density, a uniform pulse waveform, and a high repetition rate by providing a delaying optical system which elongates the optical pulse width of a randomly polarized beam which is randomly polarized through a polarizing optical system. SOLUTION: A half mirror 3 and reflecting mirrors 4, 5, and 6 constitute a delaying optical system which elongates the optical pulse width of randomly polarized light randomly polarized through a polarizing optical system. When the optical system is operated, the system synthesizes two laser beams 7 and 8 into one coaxial beam 9 having a high repetition rate by using a polarizing prism 1. The high repetition rate is obtained by shifting the pulse time of the laser beams 7 and 8 from each other. Since the synthesized polarized beam 9 has orthogonally polarized light rays at every pulse, the beam 9 is resynthesized into a randomly polarized beam 10 through a depolarizing plate 2. Thereafter, the beam 10 is split into two beams by means of a half mirror so that one of the two beams may become a delayed beam.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、高パワ−密度且
つ高繰返し数のレ−ザ光を得ることが出来るレ−ザ装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser device capable of obtaining laser light having a high power density and a high repetition rate.

【0002】[0002]

【従来の技術】[Prior art]

(1) 高繰返し数のパルスレ−ザビ−ムを得る場合に
は、2本のパルスレ−ザビ−ムを同軸に合成する技術が
挙げられる。この方法は、2本のビ−ムを直交させ、直
交した位置にハ−フミラ−(一般的には反射率50%)
を45°に設置し、2本のレ−ザパルスを時間的にずら
すことにより、2本のビ−ムのパルス繰返し数を足した
繰返し数が得られる。
(1) In order to obtain a pulse laser beam having a high repetition rate, a technique of synthesizing two pulse laser beams coaxially can be mentioned. In this method, two beams are orthogonalized, and a half mirror (generally, a reflectance of 50%) is provided at an orthogonal position.
Is set at 45 ° and the two laser pulses are shifted in time to obtain a repetition number obtained by adding the pulse repetition numbers of the two beams.

【0003】(2) 高い平均パワ−密度を持ったビ−ム
を得る場合には、2本のビ−ムに予め直交した偏光を持
たせ、偏光プリズム等を用いて同軸上に合成させる。 (3) パルス幅を伸長する方法として、ハ−フミラ−を
用いてビ−ムを2本に分け、分けた片方のビ−ムをル−
プさせ時間遅延させて、再びハ−フミラ−に戻すことに
より同じ光軸上に戻す。
(2) In order to obtain a beam having a high average power density, two beams are provided with orthogonally polarized light in advance, and are coaxially combined using a polarizing prism or the like. (3) As a method of extending the pulse width, the beam is divided into two beams using a half mirror, and one of the divided beams is looped.
And then return to the half mirror to return to the same optical axis.

【0004】[0004]

【発明が解決しようとする課題】高い平均パワ−密度
で、パルス幅が広く、高繰返しのビ−ムを得るために
は、先ず従来技術の(2) のように、ビ−ムに予め偏光を
持たせ、偏光プリズムを用いて同軸合成することによ
り、高い平均パワ−密度を持った高繰返しのビ−ムを作
り出すことから始まる。しかし、パルス幅伸長を行うた
めには、従来技術の(3)のように、ハ−フミラ−を用い
て2本に分けて透過側ビ−ムをル−プさせて遅延時間を
作り、ハ−フミラ−の反対側ビ−ム後方から入射させる
方法が挙げられる。しかし、偏光を利用して合成してい
るため、パルス毎に偏光を持っており、パルス幅伸長さ
せるためのハ−フミラ−の反射率が偏光により反射率が
違ってしまう(P偏光の方が反射率大)。このため結果
的に、透過側ビ−ムをル−プさせ同軸上に戻しても、パ
ルス毎に伸長度に違いが生じてしまう。
In order to obtain a beam having a high average power density, a wide pulse width and a high repetition rate, first, as in the prior art (2), the beam is preliminarily polarized. , And by creating a high repetition beam with a high average power density by coaxial synthesis using a polarizing prism. However, in order to extend the pulse width, as in the prior art (3), a delay time is created by looping the transmission side beam into two using a half mirror and forming a delay time. A method of making the beam incident from behind the beam on the opposite side of the film. However, since the polarization is combined, polarization is provided for each pulse, and the reflectance of the half mirror for extending the pulse width differs depending on the polarization (P-polarized light has a higher reflectance). Large reflectance). As a result, even if the transmission side beam is looped and returned to the same axis, a difference occurs in the degree of elongation for each pulse.

【0005】この発明は、以上のような不都合を解決す
るものであり、高い平均パワ−密度且つパルス波形の形
状が揃った高繰返し数のパルスビ−ムが得られるレ−ザ
装置を提供することを目的とする。
An object of the present invention is to solve the above-mentioned disadvantages and to provide a laser device capable of obtaining a pulse beam having a high average power density and a high repetition rate with a uniform pulse waveform. With the goal.

【0006】[0006]

【課題を解決するための手段】この発明は、偏光を持っ
た2本のレ−ザビ−ムを同軸に合成する合成光学系と、
この合成光学系により合成された偏光ビ−ムをランダム
に偏光する偏光光学系と、この偏光光学系によりランダ
ム偏光されたランダム偏光ビ−ムの光パルス幅を伸長す
る遅延光学系とを具備するレ−ザ装置である。
According to the present invention, there is provided a synthesizing optical system for coaxially synthesizing two laser beams having polarized light,
A polarizing optical system for randomly polarizing the polarizing beam synthesized by the synthesizing optical system, and a delay optical system for extending the light pulse width of the randomly polarized beam randomly polarized by the polarizing optical system are provided. It is a laser device.

【0007】[0007]

【発明の実施の形態】以下、図面を参照して、この発明
の一実施の形態を説明する。この発明によるレ−ザ装置
は図1に示すように構成され、同一線上に偏光プリズム
1、偏光解消板2、およびハ−フミラ−3が所定間隔を
おいて配設されている。そして、ハ−フミラ−3の後方
には、ハ−フミラ−3と共に遅延ル−プを形成するよう
に反射ミラ−4、5、6が所定間隔をおいて配設されて
いる。
Embodiments of the present invention will be described below with reference to the drawings. The laser device according to the present invention is configured as shown in FIG. 1, and a polarizing prism 1, a depolarizing plate 2, and a half mirror 3 are arranged on a same line at predetermined intervals. Reflective mirrors 4, 5, and 6 are arranged at predetermined intervals behind the half mirror 3 so as to form a delay loop together with the half mirror 3.

【0008】この場合、偏光プリズム1が偏光を持った
2本のレ−ザビ−ムを同軸に合成する合成光学系を構成
し、偏光解消板2が合成光学系により合成された偏光ビ
−ムをランダムに偏光する偏光光学系を構成し、ハ−フ
ミラ−3および反射ミラ−4,5,6が偏光光学系によ
りランダム偏光されたランダム偏光ビ−ムの光パルス幅
を伸長する遅延光学系を構成している。
In this case, the polarizing prism 1 constitutes a synthesizing optical system for coaxially synthesizing two laser beams having polarized light, and the depolarizing plate 2 is a polarizing beam synthesized by the synthesizing optical system. A polarization optical system for randomly polarizing the light, and a half mirror-3 and reflection mirrors 4, 5, 6 for extending a light pulse width of a random polarization beam randomly polarized by the polarization optical system. Is composed.

【0009】又、図中の符号7はS偏光を持ったレ−ザ
パルスであるレ−ザビ−ム、8はP偏光を持ったレ−ザ
パルスであるレ−ザビ−ムである。9はレ−ザビ−ム7
と8が合成された高繰返しの偏光ビ−ム、10は偏光ビ
−ム9がランダム偏光されたランダム偏光ビ−ムであ
る。更に、11は遅延ル−プを経た後にハ−フミラ−3
にて半分に分けられたレ−ザビ−ムであり、図2に示す
ようにメイン,1周目,2周目が合成されたものであ
る。
Reference numeral 7 in the drawing denotes a laser beam which is a laser pulse having S-polarized light, and reference numeral 8 denotes a laser beam which is a laser pulse having P-polarized light. 9 is laser beam 7
A high repetition polarization beam obtained by synthesizing the polarization beam 8 and the random beam 10 is a random polarization beam in which the polarization beam 9 is randomly polarized. Furthermore, after passing through a delay loop, the half mirror-3 is used.
Is a laser beam divided in half, and the main, first and second laps are combined as shown in FIG.

【0010】さて動作時には、2本の合成するレ−ザビ
−ム7,8は、上記のように直交する偏光を持っている
が、この2本のレ−ザビ−ム7,8を偏光プリズム1を
用いて同軸の1本の高繰返しの偏光ビ−ム9に合成す
る。この時、ハ−フミラ−を用いないため、パルスエネ
ルギを損なわず合成することが出来る。この際、レ−ザ
ビ−ム7および8のパルス時間をずらすことにより、高
繰返しを得る。
In operation, the two laser beams 7 and 8 to be combined have orthogonal polarizations as described above, but the two laser beams 7 and 8 are polarized by a polarizing prism. 1 to form a single high-repetition-rate polarization beam 9 on the same axis. At this time, since the half mirror is not used, it is possible to perform the synthesis without losing the pulse energy. At this time, a high repetition rate is obtained by shifting the pulse times of the laser beams 7 and 8.

【0011】この合成された偏光ビ−ム9は、パルス毎
に直交した偏光を持っているため、偏光解消板2を通過
させ、ランダム偏光ビ−ム10にする。その後に、ハ−
フミラ−3にて2本のレ−ザビ−ムに分け、片方を遅延
ル−プとする。ここで、分かれたレ−ザビ−ム11のパ
ルス波形はパルスによらず一定形状となる。
Since the synthesized polarization beam 9 has a polarization orthogonal to each pulse, it passes through the depolarizer 2 to form a random polarization beam 10. After that,
The laser beam is divided into two laser beams by the Fumilla-3, one of which is a delay loop. Here, the pulse waveform of the divided laser beam 11 has a constant shape regardless of the pulse.

【0012】遅延ル−プにより時間を遅らせ、偏光解消
板を通過させた後、再びハ−フミラ−3に戻す。ここ
で、遅延ル−プを1周し、戻ってきたレ−ザビ−ムの半
分はメイン光軸に戻され、半分は遅延ル−プを2周する
ことになる。2周したレ−ザビ−ムは1周したレ−ザビ
−ム同様にハ−フミラ−3にて半分に分けられ、合成さ
れるエネルギと遅延ル−プに戻るエネルギに分けられ
る。以下、同様にして、時間遅れを作りながらメイン光
軸に戻される。
After the time is delayed by the delay loop and the light passes through the depolarizing plate, it is returned to the half mirror-3 again. Here, one round of the delay loop is made, half of the laser beam returned is returned to the main optical axis, and half of the laser beam makes two rounds of the delay loop. The laser beam that has made two rounds is divided in half by the half mirror 3 like the laser beam that has made one round, and is divided into energy to be synthesized and energy to return to the delay loop. Hereinafter, similarly, the light is returned to the main optical axis with a time delay.

【0013】尚、合成光学系の手前に、レ−ザビ−ムに
偏光を持たせる光学素子を設けても良い。又、偏光光学
系を構成する偏光解消板2の手前に、ビ−ム口径を縮小
させるダウンコリメ−ト光学系を設けても良い。又、遅
延光学系内に、新たに偏光解消板を設けても良い。
An optical element for imparting polarized light to the laser beam may be provided in front of the combining optical system. A down collimating optical system for reducing the beam diameter may be provided in front of the depolarizing plate 2 constituting the polarizing optical system. Further, a depolarizing plate may be newly provided in the delay optical system.

【0014】[0014]

【発明の効果】この発明によれば、レ−ザ装置は偏光を
持った2本のレ−ザビ−ムを同軸に合成する合成光学系
と、この合成光学系により合成された偏光ビ−ムをラン
ダムに偏光する偏光光学系と、この偏光光学系によりラ
ンダム偏光されたランダム偏光ビ−ムの光パルス幅を伸
長する遅延光学系とを具備しているので、得られるレ−
ザパルス波形は一定形状となり、元のレ−ザビ−ムのエ
ネルギを殆ど損なわずに合成することが出来、更に高繰
返し化を図ることが出来る。
According to the present invention, a laser device comprises a synthetic optical system for coaxially synthesizing two laser beams having polarized light, and a polarized beam synthesized by the synthetic optical system. Since the optical system comprises a polarizing optical system that randomly polarizes the light, and a delay optical system that extends the light pulse width of the randomly polarized beam that is randomly polarized by the polarizing optical system, the laser beam obtained is obtained.
The pulse waveform has a constant shape, and can be synthesized with little loss of the energy of the original laser beam, and further high repetition can be achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の一実施の形態に係るレ−ザ装置を示
す構成図。
FIG. 1 is a configuration diagram showing a laser device according to an embodiment of the present invention.

【図2】図1の一部を拡大して示す波形図。FIG. 2 is an enlarged waveform diagram showing a part of FIG. 1;

【符号の説明】[Explanation of symbols]

1…偏光プリズム(合成光学系),2…偏光解消板(偏
光光学系)、3…ハ−フミラ−、4,5,6…反射ミラ
−(遅延光学系)、7,8…レ−ザビ−ム。
DESCRIPTION OF SYMBOLS 1 ... Polarizing prism (synthetic optical system), 2 ... Depolarizing plate (polarizing optical system), 3 ... Half mirror, 4, 5, 6 ... Reflecting mirror (delay optical system), 7, 8 ... Laser -Mu.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 偏光を持った2本のレ−ザビ−ムを同軸
に合成する合成光学系と、この合成光学系により合成さ
れた偏光ビ−ムをランダムに偏光する偏光光学系と、こ
の偏光光学系によりランダム偏光されたランダム偏光ビ
−ムの光パルス幅を伸長する遅延光学系とを具備するこ
とを特徴とするレ−ザ装置。
1. A synthetic optical system for coaxially synthesizing two laser beams having polarized light, a polarizing optical system for randomly polarizing a polarized beam synthesized by the synthetic optical system, and A delay optical system for extending an optical pulse width of a random polarization beam that has been randomly polarized by a polarization optical system.
【請求項2】 上記合成光学系の手前に、上記レ−ザビ
−ムに偏光を持たせる光学素子が設けられたことを特徴
とする請求項1記載のレ−ザ装置。
2. The laser device according to claim 1, further comprising an optical element for imparting polarized light to said laser beam, before said synthetic optical system.
【請求項3】 上記偏光光学系を構成する第1の偏光解
消板の手前に、ビ−ム口径を縮小させるダウンコリメ−
ト光学系が設けられたことを特徴とする請求項1記載の
レ−ザ装置。
3. A down collimator for reducing a beam diameter before a first depolarizing plate constituting the polarizing optical system.
2. The laser device according to claim 1, further comprising a scanning optical system.
【請求項4】 上記遅延光学系内に、第2の偏光解消板
が設けられたことを特徴とする請求項1記載のレ−ザ装
置。
4. The laser device according to claim 1, wherein a second depolarizing plate is provided in the delay optical system.
JP17715597A 1997-07-02 1997-07-02 Laser device Pending JPH1126851A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17715597A JPH1126851A (en) 1997-07-02 1997-07-02 Laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17715597A JPH1126851A (en) 1997-07-02 1997-07-02 Laser device

Publications (1)

Publication Number Publication Date
JPH1126851A true JPH1126851A (en) 1999-01-29

Family

ID=16026155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17715597A Pending JPH1126851A (en) 1997-07-02 1997-07-02 Laser device

Country Status (1)

Country Link
JP (1) JPH1126851A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10241339B2 (en) 2016-01-15 2019-03-26 Boe Technology Group Co., Ltd. Laser pulse delay system and laser annealing system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10241339B2 (en) 2016-01-15 2019-03-26 Boe Technology Group Co., Ltd. Laser pulse delay system and laser annealing system

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