JPH11171597A - Glass for chemical tempering, chemically tempered glass and glass substrate for information recording medium - Google Patents
Glass for chemical tempering, chemically tempered glass and glass substrate for information recording mediumInfo
- Publication number
- JPH11171597A JPH11171597A JP9339722A JP33972297A JPH11171597A JP H11171597 A JPH11171597 A JP H11171597A JP 9339722 A JP9339722 A JP 9339722A JP 33972297 A JP33972297 A JP 33972297A JP H11171597 A JPH11171597 A JP H11171597A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- chemically strengthened
- information recording
- recording medium
- ion exchange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、大きな熱膨張係数
（例えば、100℃から300℃の温度範囲において9.0×10
-6 /℃以上）を有する、イオン交換処理による化学強化
が可能な化学強化用ガラス、該化学強化用ガラスをイオ
ン交換処理により強化した化学強化ガラス、及び該化学
強化ガラスを用いた情報記録媒体用ガラス基板に関する
ものである。BACKGROUND OF THE INVENTION The present invention relates to a high thermal expansion coefficient (for example, 9.0 × 10
−6 / ° C. or higher), chemically strengthened glass capable of being chemically strengthened by ion exchange treatment, chemically strengthened glass obtained by strengthening the chemically strengthened glass by ion exchange treatment, and information recording medium using the chemically strengthened glass. The present invention relates to a glass substrate for use.
【０００２】[0002]
【従来の技術】近年、情報記録媒体（例えば、磁気ディ
スク、光ディスク、光磁気ディスクなど）用の基板は、
情報記録容量の高密度化要求にともない、基板表面の平
坦性及び平滑性の向上が要求されている。ここで、情報
記録媒体のうちの磁気ディスクを代表例として説明する
と、磁気ディスクを用いる磁気ディスク装置は、パソコ
ンの代表的な外部記録装置として、大容量化・小型化・
低価格化が著しい。2. Description of the Related Art In recent years, substrates for information recording media (for example, magnetic disks, optical disks, magneto-optical disks, etc.)
With the demand for higher density of information recording capacity, improvement in flatness and smoothness of the substrate surface is required. Here, a magnetic disk of information recording media will be described as a representative example. A magnetic disk device using a magnetic disk is a typical external recording device of a personal computer, and has a large capacity, a small size, and a large capacity.
Significant price reductions.
【０００３】このような磁気ディスク装置の進歩は、情
報の記録・再生を行う磁気ディスク、磁気ヘッドの高性
能化、記録再生チャンネルの高速化、サーボ回路の高速
化・高精度化など、装置を構成する個別部品・個別技術
の高性能化によるが、その中でも記録・再生に直接関わ
る基幹部品である磁気ディスク、磁気ヘッドの特性向上
によるところが大きい。[0003] Advances in such magnetic disk devices have led to the development of devices such as magnetic disks for recording and reproducing information, higher performance of magnetic heads, higher speed of recording / reproducing channels, and higher speed and higher accuracy of servo circuits. Although the performance of the individual components and individual technologies that constitute them has been improved, the major factor is that the characteristics of magnetic disks and magnetic heads, which are the core components directly involved in recording and reproduction, have been improved.
【０００４】かかる特性向上のうち、磁気ディスクの特
性向上として、高記録密度化（特に線記録密度の向上）
が挙げられるが、この特性向上には、磁性膜の改良と共
に磁気ヘッドの低浮上量化の影響が大きい。例えば、最
新の磁気ディスク装置では、３５〜５０nm程度の浮上量
が実現されようとしている。[0004] Among the above-mentioned improvements in characteristics, the improvement of the recording density (particularly, the linear recording density) has been considered as the improvement of the characteristics of the magnetic disk.
However, the improvement of the magnetic film is largely affected by the improvement of the magnetic film and the reduction of the flying height of the magnetic head. For example, in the latest magnetic disk drives, flying heights of about 35 to 50 nm are being realized.
【０００５】そして、このような情報記録媒体（ディス
ク）のディスク装置におけるヘッドの低浮上量化を実現
するために、ディスク表面の平坦性及び平滑性の向上が
要求されている。言い換えると、ディスクの高記録密度
化（特に線記録密度の向上）を実現するためには、ヘッ
ドの低浮上量化が必要であり、そのためにディスク表面
の平坦性及び平滑性の向上が要求されている。[0005] In order to realize a low flying height of a head in such a disk device for an information recording medium (disk), it is required to improve the flatness and smoothness of the disk surface. In other words, in order to realize a higher recording density of the disk (especially, an increase in the linear recording density), it is necessary to lower the flying height of the head, and therefore, it is required to improve the flatness and smoothness of the disk surface. I have.
【０００６】一方、情報記録媒体（ディスク）用のガラ
ス基板に用いられる化学強化ガラスとしては、例えば特
公平6-76224号公報（強化ガラスの製造方法）に示され
る組成のガラスが一般的な例として挙げられる。その組
成を具体的に示すと重量％で、64〜70％のSiO2、14〜20
％のAl2O3、4〜6％のLi2O、7〜10％のNa2O、0〜4 ％のM
gO、0〜1.5％のZrO2である。なお、化学強化はイオン交
換処理により施される。On the other hand, as a chemically strengthened glass used for a glass substrate for an information recording medium (disk), for example, a glass having a composition disclosed in Japanese Patent Publication No. 6-76224 (a method for manufacturing a strengthened glass) is a typical example. It is listed as. The composition is concretely expressed in terms of% by weight, 64 to 70% SiO 2 , 14 to 20%.
% Of Al 2 O 3, 4~6% of Li 2 O, 7 to 10% of Na 2 O, 0 to 4% of M
gO, a ZrO 2 0 to 1.5%. The chemical strengthening is performed by an ion exchange treatment.
【０００７】[0007]
【発明が解決しようとする課題】前述したように、ディ
スクの高記録密度化（特に線記録密度の向上）を実現す
るためには、ヘッドの低浮上量化（例えば35〜50nm程度
の低浮上量）が必要である。そして、ヘッドの低浮上量
化を実現するために、ディスク表面が平坦かつ平滑であ
ることが要求されることは当然であるが、35〜50nm程度
の低浮上量を保つためには、使用環境温度による微妙な
影響も見逃せない。As described above, in order to realize a higher recording density (in particular, an increase in linear recording density) of a disk, a lower flying height of a head (for example, a lower flying height of about 35 to 50 nm) is required. )is necessary. It is natural that the disk surface must be flat and smooth in order to realize a low flying height of the head.However, in order to maintain a low flying height of about 35 to 50 nm, the operating environment temperature You can not overlook the subtle effects of.
【０００８】即ち、35〜50nm程度の低浮上量を保つため
には、ディスクの熱膨張係数と、ヘッド（サスペンショ
ン部）、スピンドルなどのＨＤＤ構成部品の熱膨張係数
とを同一レベルにする必要がある。現在、ＨＤＤ構成部
品であるヘッド（サスペンション部）やスピンドルなど
は、ステンレス材料により構成されており、その熱膨張
係数は、100℃〜300℃の温度範囲において9.0×10-6 /
℃以上の値となっている。That is, in order to maintain a low flying height of about 35 to 50 nm, it is necessary to make the thermal expansion coefficient of the disk the same as that of the HDD components such as the head (suspension portion) and the spindle. is there. At present, the HDD components such as the head (suspension portion) and the spindle are made of stainless steel, and have a thermal expansion coefficient of 9.0 × 10 −6 / 100 ° C. to 300 ° C.
It is a value of ℃ or more.
【０００９】一方、情報記録媒体（ディスク）用の基板
として使用されている従来の化学強化ガラス（組成例：
重量％で64〜70％のSiO2、14〜20％のAl2O3、4〜6％のL
i2O、7〜10％のNa2O、0〜4 ％のMgO、0〜1.5％のZrO2）
の熱膨張係数は、100℃から300℃の温度範囲において9.
0×10-6 /℃未満の値であった。このように、ＨＤＤ構
成部品とディスク基板に大きな熱膨張率の差があると、
使用環境温度によっては、35〜50nm程度のヘッド浮上量
を保つことができないという問題点があった。On the other hand, a conventional chemically strengthened glass used as a substrate for an information recording medium (disk) (composition example:
SiO 2 of 64 to 70% by weight, 14-20% of Al 2 O 3, 4 to 6% of L
i 2 O, 7~10% of Na 2 O, 0~4% of MgO, 0 to 1.5% of ZrO 2)
Has a coefficient of thermal expansion of 9.
The value was less than 0 × 10 −6 / ° C. Thus, if there is a large difference in the coefficient of thermal expansion between the HDD component and the disk substrate,
There is a problem that the head flying height of about 35 to 50 nm cannot be maintained depending on the use environment temperature.
【００１０】本発明は、かかる問題点を解決することが
可能であり、大きな熱膨張係数（例えば、100℃から300
℃の温度範囲において9.0×10-6 /℃以上）を有する、
イオン交換処理による化学強化が可能な化学強化用ガラ
ス、該化学強化用ガラスをイオン交換処理により強化し
た化学強化ガラス、及び該化学強化ガラスを用いた情報
記録媒体用ガラス基板を提供することを目的とする。The present invention can solve such a problem and has a large thermal expansion coefficient (for example, from 100 ° C. to 300 ° C.).
9.0 × 10 -6 / ° C or more in the temperature range of ° C),
An object of the present invention is to provide a glass for chemical strengthening capable of being chemically strengthened by ion exchange treatment, a chemically strengthened glass obtained by strengthening the glass for chemical strengthening by ion exchange treatment, and a glass substrate for an information recording medium using the chemically strengthened glass. And
【００１１】[0011]
【課題を解決するための手段】そのため、本発明は第一
に「重量比（以下ｗｔ％）で、 ＳｉＯ2 ５６ 〜 ６０ ｗｔ％ Ａｌ2O3 １２ 〜 １５ ｗｔ％ Ｌｉ2O ４ 〜 １０ ｗｔ％ Ｎａ2O ９ 〜 １２ ｗｔ％ Ｋ2O ０ 〜 ５ ｗｔ％ （但し、Ｌｉ2O＋Ｎａ2O＋Ｋ2O １６.１ 〜 ２０
ｗｔ％） ＭｇＯ ０ 〜 ５ ｗｔ ＺｒＯ2 ０ 〜 ５ ｗｔ％ Ａｓ2O3 ０ 〜 １ ｗｔ％ Ｓｂ2O3 ０ 〜 １ ｗｔ％ の組成を有し、イオン交換処理による化学強化が可能な
化学強化用ガラス（請求項１）」を提供する。A solution for the] Therefore, in the present invention, "weight ratio in the first (hereinafter wt%), SiO 2 56 ~ 60 wt% Al 2 O 3 12 ~ 15 wt% Li 2 O 4 ~ 10 wt % Na 2 O 9 to 12 wt% K 2 O 0 to 5 wt% (however, Li 2 O + Na 2 O + K 2 O 16.1 to 20%
MgO 0 to 5 wt ZrO 2 0 to 5 wt% As 2 O 3 0 to 1 wt% Sb 2 O 3 0 to 1 wt% Chemical strengthening capable of chemical strengthening by ion exchange treatment Glass (Claim 1) ".
【００１２】また、本発明は第二に「請求項１記載の化
学強化用ガラスがイオン交換処理により化学強化されて
なり、かつ100℃から300℃の温度範囲における熱膨張係
数が9.0×10-6 /℃以上の値であることを特徴とする化
学強化ガラス（請求項２）」を提供する。また、本発明
は第三に「請求項２記載の化学強化ガラスを用いたこと
を特徴とする情報記録媒体用ガラス基板（請求項３）」
を提供する。[0012] The present invention also second to "claim 1 chemically strengthened glass according is being chemically strengthened by ion exchange treatment, and thermal expansion coefficient in a temperature range of 300 ° C. from 100 ° C. is 9.0 × 10 - A chemically strengthened glass (Claim 2) having a value of at least 6 / ° C. The third aspect of the present invention is "a glass substrate for an information recording medium characterized by using the chemically strengthened glass according to claim 2 (claim 3)".
I will provide a.
【００１３】[0013]
【発明の実施の形態】本発明にかかる上記組成範囲は、
実験化学的に見い出されたものであり、組成範囲限定の
理由は次の通りである。ＳｉＯ2はガラス形成酸化物で
あり、失透に対する安定性を向上させるが、5６ｗｔ％
未満では、化学的耐久性が低下する。また、６０ｗｔ％
を越えると粘性が高くなり、溶融性が低下する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The composition range according to the present invention is as follows.
It has been found experimentally and the reasons for limiting the composition range are as follows. SiO 2 is a glass-forming oxide that improves stability against devitrification, but
If it is less than 10, the chemical durability is reduced. In addition, 60wt%
If it exceeds, the viscosity increases and the meltability decreases.
【００１４】Ａｌ2O3は失透に対する安定性、化学的耐
久性を向上させるが、１５ｗｔ％を越えると耐失透性が
低下（悪化）する。また、１２ｗｔ％未満ではガラスの
化学的耐久性が低下し、またガラス表面のイオン交換性
能の効果が不十分となる。Ｌｉ2Oは、他のアルカリ金属
酸化物のように大幅な屈折率低下や化学的耐久性の悪化
を伴うことなく、溶融温度及び屈伏点を低下させるため
の必須成分であり、しかも熱膨張係数を増大させる成分
でもある。Al 2 O 3 improves the stability against devitrification and the chemical durability, but if it exceeds 15 wt%, the devitrification resistance is reduced (deteriorated). On the other hand, if the content is less than 12 wt%, the chemical durability of the glass decreases, and the effect of ion exchange performance on the glass surface becomes insufficient. Li 2 O is an essential component for lowering the melting temperature and the yield point without causing a significant decrease in the refractive index and deterioration of the chemical durability unlike other alkali metal oxides, and also has a thermal expansion coefficient It is also a component that increases.
【００１５】また、Ｌｉ2Oは、イオン交換による化学強
化作業により、ガラス表面においてイオン交換される成
分であるが、４ｗｔ％未満では十分なイオン交換性能が
得られず、１０ｗｔ％を越えると化学的耐久性及び失透
に対する安定性が低下する。Ｎａ2Oは、イオン交換によ
る化学強化作業により、ガラス表面においてイオン交換
される（主としてＫイオンとイオン交換される）成分で
あるが、溶融温度及び屈伏点を低下させ、熱膨張係数を
増大させる成分でもある。Li 2 O is a component which is ion-exchanged on the glass surface by a chemical strengthening operation by ion exchange. However, if it is less than 4 wt%, sufficient ion exchange performance cannot be obtained. Durability and stability against devitrification decrease. Na 2 O is a component that is ion-exchanged (mainly ion-exchanged with K ions) on the glass surface by chemical strengthening work by ion exchange, but lowers the melting temperature and the yield point and increases the thermal expansion coefficient. It is also a component.
【００１６】Ｎａ2Oは、９ｗｔ％未満では溶融性が低下
し、１２ｗｔ％を越えると化学的耐久性及び失透に対す
る安定性が低下する。Ｋ2Oは、その添加により溶融温度
を低下させることができる。しかし、５ｗｔ％を越える
と、化学的耐久性が低下する。ここで、Ｌｉ2O、Ｎａ
2O、Ｋ2Oの合計量として１６.１ｗｔ％以上含有させる
ことにより、熱膨張係数が100℃から300℃の温度範囲に
おいて9.0×10-6 /℃以上の値となる。If Na 2 O is less than 9 wt%, the meltability is reduced, and if it exceeds 12 wt%, chemical durability and stability against devitrification are reduced. The addition of K 2 O can lower the melting temperature. However, when the content exceeds 5 wt%, the chemical durability decreases. Here, Li 2 O, Na
When the total content of 2 O and K 2 O is 16.1 wt% or more, the coefficient of thermal expansion becomes 9.0 × 10 −6 / ° C. or more in a temperature range of 100 ° C. to 300 ° C.
【００１７】但し、Ｌｉ2O、Ｎａ2O、Ｋ2Oの合計量とし
て、２０ｗｔ％を越えると、化学的耐久性が低下し、失
透に対する安定性も低下する。ＭｇＯは溶融温度を低下
させるが、５ｗｔ％を越えると失透に対する安定性が低
下し、分相傾向も増大する。ＺｒＯ2は失透に対する安
定性と化学的耐久性を向上させるが、５ｗｔ％を越える
と、逆に失透傾向が増大する。However, if the total amount of Li 2 O, Na 2 O, and K 2 O exceeds 20 wt%, the chemical durability decreases and the stability against devitrification also decreases. MgO lowers the melting temperature, but if it exceeds 5% by weight, the stability against devitrification decreases and the tendency for phase separation increases. ZrO 2 improves the stability against devitrification and the chemical durability, but when it exceeds 5 wt%, the tendency to devitrify increases.
【００１８】Ａｓ2O3 とＳｂ2O3 は脱泡剤として用いる
が、それぞれ１ｗｔ％以下で十分な効果を得ることがで
きる。本発明（請求項１）にかかる化学強化用ガラス
は、以上のような組成を有するので、イオン交換処理に
より化学強化が可能であるだけでなく、化学強化された
ガラスが大きな熱膨張係数（100℃から300℃の温度範囲
において9.0×10-6 /℃以上）を有することとなる（請
求項２）。Although As 2 O 3 and Sb 2 O 3 are used as defoaming agents, a sufficient effect can be obtained at 1 wt% or less. Since the glass for chemical strengthening according to the present invention (claim 1) has the above composition, not only can the glass be chemically strengthened by ion exchange treatment, but also the glass that has been chemically strengthened has a large thermal expansion coefficient (100%). (At least 9.0 × 10 −6 / ° C. in the temperature range of from 300 ° C. to 300 ° C.).
【００１９】また、本発明（請求項２）にかかる化学強
化ガラスは、化学強化されたガラスが大きな熱膨張係数
（100℃から300℃の温度範囲において9.0×10-6 /℃以
上）を有するので、高強度や前記ヘッドの低浮上量化が
要求される情報記録媒体用ガラス基板に用いて好適であ
る（請求項３）。即ち、本発明（請求項２）にかかる化
学強化ガラスは、大きな熱膨張係数を有し、ＨＤＤ構成
部品の熱膨張率との差を従来よりも小さくできる。その
ため、ヘッドの低浮上量化が要求される情報記録媒体用
ガラス基板に用いた場合に、使用環境温度によっては、
35〜50nm程度のヘッド浮上量を保つことができないとい
う従来の問題点を解決することができる。In the chemically strengthened glass according to the present invention (claim 2), the chemically strengthened glass has a large coefficient of thermal expansion (9.0 × 10 −6 / ° C. or more in a temperature range of 100 ° C. to 300 ° C.). Therefore, it is suitable for use as a glass substrate for an information recording medium that requires high strength and a low flying height of the head (claim 3). That is, the chemically strengthened glass according to the present invention (claim 2) has a large coefficient of thermal expansion, and the difference from the coefficient of thermal expansion of HDD components can be made smaller than before. Therefore, when used for a glass substrate for an information recording medium that requires a low flying height of the head, depending on the operating environment temperature,
The conventional problem that the head flying height of about 35 to 50 nm cannot be maintained can be solved.
【００２０】このように、本発明によれば、前記問題点
を解決できる程度の大きな熱膨張係数を有する、イオン
交換処理による化学強化が可能な化学強化用ガラス、該
化学強化用ガラスをイオン交換処理により強化した化学
強化ガラス、及び該化学強化ガラスを用いた情報記録媒
体用ガラス基板を提供することができる。以下、本発明
を実施例により具体的に説明するが、本発明はこの例に
限定されるものではない。As described above, according to the present invention, a chemically strengthened glass having a large thermal expansion coefficient capable of solving the above-mentioned problems and capable of being chemically strengthened by ion exchange treatment, It is possible to provide a chemically strengthened glass reinforced by a treatment and a glass substrate for an information recording medium using the chemically strengthened glass. Hereinafter, the present invention will be described specifically with reference to examples, but the present invention is not limited to these examples.
【００２１】[0021]
【実施例】本実施例にかかる化学強化用ガラスの組成例
（数値はｗｔ％）と、該化学強化用ガラスをイオン交換
処理により強化した化学強化ガラスの熱膨張係数（温度
範囲：100℃〜300℃）を表１（組成１〜組成６）及び表
２（組成７〜組成１２）に示す。なお、熱膨張係数は、
表中でα(×10-7/℃)と示してある。EXAMPLE A composition example (numerical value is wt%) of the glass for chemical strengthening according to the present embodiment, and a coefficient of thermal expansion of the glass for chemical strengthening by ion exchange treatment (temperature range: 100 ° C. to 100 ° C.) 300 ° C.) are shown in Table 1 (Composition 1 to Composition 6) and Table 2 (Composition 7 to Composition 12). The coefficient of thermal expansion is
In the table, α (× 10 −7 / ° C.) is indicated.
【００２２】本実施例にかかる化学強化用ガラス（組成
１〜組成１２）は、以下の工程により製造した。まず、
表１、２の各組成成分の原料に相当する酸化物、炭酸
塩、硝酸塩等を使用し、前記各組成（表１、２）に対応
する所望の割合にて各原料を秤量し、粉末状態において
十分に混合することにより各調合原料とした。The glass for chemical strengthening (composition 1 to composition 12) according to this example was produced by the following steps. First,
Using oxides, carbonates, nitrates, and the like corresponding to the raw materials of the respective components shown in Tables 1 and 2, each raw material was weighed at a desired ratio corresponding to each of the above-mentioned compositions (Tables 1 and 2), and powdered. Each of the prepared raw materials was obtained by sufficiently mixing the above.
【００２３】次に、各調合原料を例えば１４００℃に加
熱された電気炉中の白金坩堝にそれぞれ投入し、溶融し
て清澄化させた。その後、これを撹拌均質化し、予め加
熱された鉄製の鋳型に鋳込み、徐冷することにより、前
記各組成（組成１〜組成１２）を有する化学強化用ガラ
スをそれぞれ製造した。Next, each prepared raw material was put into a platinum crucible in an electric furnace heated to, for example, 1400 ° C., and was melted and clarified. Thereafter, this was homogenized by stirring, cast into a pre-heated iron mold, and gradually cooled to produce chemically strengthened glass having each of the above-described compositions (composition 1 to composition 12).
【００２４】以上の工程により製造した化学強化用ガラ
スをイオン交換処理により強化すると、表１及び表２に
示す大きな熱膨張係数を有する化学強化ガラスが得られ
た。ここで、本実施例にかかる前記化学強化用ガラスか
ら磁気記録媒体用基板を製造する工程を以下に示す。ま
ず、所定寸法に前記化学強化用ガラスを切り出し、孔あ
けした後、所定厚さまで研削加工を行った。When the glass for chemical strengthening produced by the above steps was strengthened by ion exchange treatment, chemically strengthened glass having a large thermal expansion coefficient as shown in Tables 1 and 2 was obtained. Here, a process of manufacturing a substrate for a magnetic recording medium from the glass for chemical strengthening according to the present embodiment will be described below. First, the glass for chemical strengthening was cut out to a predetermined size, drilled, and then ground to a predetermined thickness.
【００２５】次に、内外径加工を行ってから再度、研
削、研磨加工を行った。次に、基板洗浄を施した後、化
学強化を行った。化学強化に際しては、硝酸カリウムと
硝酸ナトリウムを混合した溶液を加熱し、その溶液中に
基板を所定時間浸漬させた。最後に、溶液中から基板を
取り出して、再度基板洗浄を行うことにより、磁気記録
媒体用基板を製造した。Next, after the inner and outer diameters were processed, grinding and polishing were performed again. Next, after cleaning the substrate, chemical strengthening was performed. During chemical strengthening, a solution in which potassium nitrate and sodium nitrate were mixed was heated, and the substrate was immersed in the solution for a predetermined time. Finally, the substrate was taken out of the solution, and the substrate was washed again, thereby producing a magnetic recording medium substrate.
【００２６】このようにして製造した磁気記録媒体用基
板の上に、下地膜、磁性膜、保護膜、潤滑膜を順次形成
すれば磁気ディスクとなる。本実施例にかかる化学強化
用ガラスは、表１及び表２に示す組成を有するので、イ
オン交換処理による化学強化が可能であるだけでなく、
化学強化されたガラスが大きな熱膨張係数（100℃から3
00℃の温度範囲において9.0×10-6 /℃以上）を有する
こととなった。A magnetic disk is obtained by sequentially forming a base film, a magnetic film, a protective film, and a lubricating film on the magnetic recording medium substrate thus manufactured. Since the glass for chemical strengthening according to this example has the composition shown in Tables 1 and 2, not only can the glass be chemically strengthened by ion exchange treatment,
Chemically strengthened glass has a large coefficient of thermal expansion (100 ° C to 3
9.0 × 10 −6 / ° C. or more in a temperature range of 00 ° C.).
【００２７】また、本実施例にかかる化学強化ガラス
は、化学強化されたガラスが大きな熱膨張係数（100℃
から300℃の温度範囲において9.0×10-6 /℃以上）を有
するので、高強度や前記ヘッドの低浮上量化が要求され
る情報記録媒体用ガラス基板に用いて好適であった。即
ち、本実施例にかかる化学強化ガラスを用いた磁気記録
媒体用ガラス基板は、大きな熱膨張係数を有し、ＨＤＤ
主要構成部品であるスピンドル、ヘッド（サスペンショ
ン部）といった部品のステンレス材料と熱膨張係数の値
が近いので、使用環境温度が変化しても、35〜50nm程度
の磁気ヘッド浮上量を保つことが可能となり、高密度記
録化に寄与することができた。In the chemically strengthened glass according to the present embodiment, the chemically strengthened glass has a large thermal expansion coefficient (100 ° C.).
(In the temperature range of from 9.0 to 10 ° C./° C. or more in a temperature range of from 300 ° C. to 300 ° C.), so that it was suitable for use as a glass substrate for an information recording medium, which requires high strength and low flying height of the head. That is, the glass substrate for a magnetic recording medium using the chemically strengthened glass according to the present embodiment has a large coefficient of thermal expansion,
Since the thermal expansion coefficient is close to the stainless steel material of the main components such as the spindle and head (suspension part), the magnetic head flying height of about 35 to 50 nm can be maintained even when the operating temperature changes. And could contribute to high density recording.
【００２８】[0028]
【表１】 [Table 1]
【００２９】[0029]
【表２】 [Table 2]
【００３０】[0030]
【発明の効果】以上説明したように、本発明によれば、
大きな熱膨張係数（例えば、100℃から300℃の温度範囲
において9.0×10-6 /℃以上）を有する、イオン交換処
理による化学強化が可能な化学強化用ガラス、該化学強
化用ガラスをイオン交換処理により強化した化学強化ガ
ラス、及び該化学強化ガラスを用いた情報記録媒体用ガ
ラス基板を提供することができる。As described above, according to the present invention,
Chemical strengthening glass that has a large thermal expansion coefficient (for example, 9.0 × 10 −6 / ° C. or more in a temperature range of 100 ° C. to 300 ° C.) and that can be chemically strengthened by ion exchange treatment. It is possible to provide a chemically strengthened glass reinforced by a treatment and a glass substrate for an information recording medium using the chemically strengthened glass.
【００３１】本発明にかかる化学強化用ガラスは、イオ
ン交換処理による化学強化が可能であるだけでなく、化
学強化されたガラスが大きな熱膨張係数（100℃から300
℃の温度範囲において9.0×10-6 /℃以上）を有する。
また、本発明にかかる化学強化ガラスは、化学強化され
たガラスが大きな熱膨張係数（100℃から300℃の温度範
囲において9.0×10-6 /℃以上）を有するので、高強度
や前記ヘッドの低浮上量化が要求される情報記録媒体用
ガラス基板に用いて好適である。The glass for chemical strengthening according to the present invention can not only be chemically strengthened by ion exchange treatment, but also has a large thermal expansion coefficient (from 100 ° C. to 300 ° C.).
9.0 × 10 −6 / ° C. or more in the temperature range of ° C.).
Further, the chemically strengthened glass according to the present invention has a large thermal expansion coefficient (9.0 × 10 −6 / ° C. or more in a temperature range of 100 ° C. to 300 ° C.), and thus has a high strength and a high strength of the head. It is suitable for use as a glass substrate for an information recording medium requiring a low flying height.
【００３２】即ち、本発明にかかる化学強化ガラスは、
大きな熱膨張係数を有し、ＨＤＤ構成部品（スピンド
ル、ヘッド（サスペンション部）といったステンレス製
部品）材料の熱膨張率との差を従来よりも小さくでき
る。そのため、ヘッドの低浮上量化が要求される情報記
録媒体用ガラス基板に用いた場合に、使用環境温度によ
っては、35〜50nm程度のヘッド浮上量を保つことができ
ないという従来の問題点を解決することができる。 以上That is, the chemically strengthened glass according to the present invention comprises:
It has a large coefficient of thermal expansion, and the difference from the coefficient of thermal expansion of HDD component parts (stainless steel parts such as a spindle and a head (suspension part)) can be made smaller than before. Therefore, when used for a glass substrate for an information recording medium that requires a low flying height of the head, it solves the conventional problem that the head flying height of about 35 to 50 nm cannot be maintained depending on the use environment temperature. be able to. that's all
Claims (3)
ｗｔ％） ＭｇＯ ０ 〜 ５ ｗｔ ＺｒＯ2 ０ 〜 ５ ｗｔ％ Ａｓ2O3 ０ 〜 １ ｗｔ％ Ｓｂ2O3 ０ 〜 １ ｗｔ％ の組成を有し、イオン交換処理による化学強化が可能な
化学強化用ガラス。1. SiO 2 56-60 wt% Al 2 O 3 12-15 wt% Li 2 O 4 -10 wt% Na 2 O 9 -12 wt% K 2 O 0 in weight ratio (hereinafter referred to as wt%) 5 wt% (however, Li 2 O + Na 2 O + K 2 O 16.1 to 20
MgO 0 to 5 wt ZrO 2 0 to 5 wt% As 2 O 3 0 to 1 wt% Sb 2 O 3 0 to 1 wt% Chemical strengthening capable of chemical strengthening by ion exchange treatment For glass.
ン交換処理により化学強化されてなり、かつ100℃から3
00℃の温度範囲における熱膨張係数が9.0×10-6 /℃以
上の値であることを特徴とする化学強化ガラス。2. The glass for chemical strengthening according to claim 1, which is chemically strengthened by ion exchange treatment, and has a temperature of from 100 ° C. to 3 ° C.
A chemically strengthened glass having a thermal expansion coefficient in a temperature range of 00 ° C. of 9.0 × 10 −6 / ° C. or more.
ことを特徴とする情報記録媒体用ガラス基板。3. A glass substrate for an information recording medium, wherein the chemically strengthened glass according to claim 2 is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9339722A JPH11171597A (en) | 1997-12-10 | 1997-12-10 | Glass for chemical tempering, chemically tempered glass and glass substrate for information recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9339722A JPH11171597A (en) | 1997-12-10 | 1997-12-10 | Glass for chemical tempering, chemically tempered glass and glass substrate for information recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11171597A true JPH11171597A (en) | 1999-06-29 |
Family
ID=18330199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9339722A Pending JPH11171597A (en) | 1997-12-10 | 1997-12-10 | Glass for chemical tempering, chemically tempered glass and glass substrate for information recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11171597A (en) |
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