JPH1072235A - Glass substrate for plasma display panel - Google Patents
Glass substrate for plasma display panelInfo
- Publication number
- JPH1072235A JPH1072235A JP15882197A JP15882197A JPH1072235A JP H1072235 A JPH1072235 A JP H1072235A JP 15882197 A JP15882197 A JP 15882197A JP 15882197 A JP15882197 A JP 15882197A JP H1072235 A JPH1072235 A JP H1072235A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- display panel
- plasma display
- weight
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/078—Glass compositions containing silica with 40% to 90% silica, by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、プラズマディスプ
レイパネル用ガラス基板に関する。The present invention relates to a glass substrate for a plasma display panel.
【０００２】[0002]
【従来の技術】プラズマディスプレイパネル用ガラス基
板には、１．５〜３．５ｍｍの厚さの範囲のフロート法
によって板状に成形されたガラス、特にソーダライムシ
リカガラスが用いられている。フロート法によって成形
されるガラスは、大量生産に向いているうえ、平滑性に
もすぐれ、その点でプラズマディスプレイパネル用ガラ
ス基板として適しているといえる。2. Description of the Related Art For a glass substrate for a plasma display panel, glass formed into a plate shape by a float method having a thickness in the range of 1.5 to 3.5 mm, particularly soda lime silica glass, is used. Glass formed by the float method is suitable for mass production and has excellent smoothness, and in that respect, it can be said that it is suitable as a glass substrate for a plasma display panel.
【０００３】[0003]
【発明が解決しようとする課題】ところが、これらのガ
ラスには固有の着色がある。すなわち、画像表示の輝度
やコントラストを向上するうえで、障害になるような吸
収が可視域の波長に存在する。However, these glasses have an inherent coloring. In other words, absorption that interferes with the improvement of the brightness and contrast of an image display exists at a wavelength in the visible region.
【０００４】特に、フロート法により成形されたソーダ
ライムシリカガラスには１０００ｎｍ付近の近赤外域に
吸収のピークがあり、これが可視域にまで伸びているた
め、ガラスを緑色ないし青い色に着色させている。[0004] In particular, soda-lime silica glass formed by the float method has an absorption peak in the near-infrared region around 1000 nm and extends to the visible region, so that the glass is colored green or blue. I have.
【０００５】本発明は、上記問題点を解決し、輝度が高
くとれ表示上の問題となる着色の少ないプラズマディス
プレイパネル用ガラス基板を提供する。また、本発明
は、表示のコントラストを高くとれるようなプラズマデ
ィスプレイパネル用ガラス基板を提供する。The present invention solves the above-mentioned problems, and provides a glass substrate for a plasma display panel which has high brightness and less coloring which causes display problems. Further, the present invention provides a glass substrate for a plasma display panel capable of obtaining high display contrast.
【０００６】[0006]
【課題を解決するための手段】本発明は、１．５〜３．
５ｍｍの範囲の厚さで４００〜７００ｎｍにおける分光
透過率が８７％以上であるプラズマディスプレイパネル
用ガラス基板、特に、ガラスの組成が重量％表示で、 ＳｉＯ2 ５０〜７５、 Ａｌ2 Ｏ3 ０〜１５、 Ｒ2 Ｏ ６〜２４（ＲはＬｉ、ＮａまたはＫであ
り、これらの合量）、 Ｒ’Ｏ ６〜２４（Ｒ’はＭｇ、Ｃａ、Ｓｒ、Ｂａ
またはＺｎであり、これらの合量）、 なる成分を含み、２価の鉄の酸化物の含有量がＦｅＯに
換算して０．０２重量％以下であるプラズマディスプレ
イパネル用ガラス基板を提供する。According to the present invention, there is provided an image processing apparatus comprising:
A glass substrate for a plasma display panel having a thickness in the range of 5 mm and a spectral transmittance at 400 to 700 nm of 87% or more, in particular, when the composition of the glass is expressed by weight%, SiO 2 50 to 75, Al 2 O 30 to 15, R 2 O 6 to 24 (R is Li, Na or K, and their total amount), R′O 6 to 24 (R ′ is Mg, Ca, Sr, Ba)
A glass substrate for a plasma display panel, comprising a component represented by the following formula: wherein the content of divalent iron oxide is 0.02% by weight or less in terms of FeO.
【０００７】また、本発明は、ガラスの組成が重量％表
示で、 ＳｉＯ2 ５０〜７５、 Ａｌ2 Ｏ3 ０〜１５、 Ｒ2 Ｏ ６〜２４（ＲはＬｉ、ＮａまたはＫであ
り、これらの合量）、 Ｒ’Ｏ ６〜２４（Ｒ’はＭｇ、Ｃａ、Ｓｒ、Ｂａ
またはＺｎであり、これらの合量）、 なる成分を含み、２価の鉄の酸化物の含有量がＦｅＯに
換算して０．０２重量％以下であるとともに、重量表示
で１５０ｐｐｍ以下のＣｏＯと１２００ｐｐｍ以下のＮ
ｉＯとの少くともいずれか一方を含有して５５０ｎｍの
分光透過率を低減せしめてなるプラズマディスプレイパ
ネル用ガラス基板を提供する。In the present invention, the composition of the glass is expressed in terms of% by weight, and SiO 2 is 50 to 75, Al 2 O 3 is 0 to 15, and R 2 O is 6 to 24 (R is Li, Na or K. R′O 6 to 24 (R ′ is Mg, Ca, Sr, Ba)
Or Zn, and their total content). The content of the divalent iron oxide is 0.02% by weight or less in terms of FeO, and 150 ppm or less of CoO by weight. N of 1200 ppm or less
Provided is a glass substrate for a plasma display panel, which contains at least one of iO and reduces the spectral transmittance at 550 nm.
【０００８】[0008]
【発明の実施の形態】本発明の第１の態様におけるプラ
ズマディスプレイパネル用ガラス基板は、１．５〜３．
５ｍｍの範囲の厚さで４００〜７００ｎｍにおける分光
透過率が８７％以上である。このようなガラス基板をプ
ラズマディスプレイパネルの画像表示側の基板として用
いると、輝度の低下が起きず問題となる着色も目立たな
いプラズマディスプレイパネルが得られる。本ガラス基
板は、プラズマディスプレイパネルの画像表示側の基板
として用いられるが、画像表示の反対側に用いても支障
ない。DESCRIPTION OF THE PREFERRED EMBODIMENTS The glass substrate for a plasma display panel according to the first embodiment of the present invention has a thickness of 1.5 to 3 mm.
The spectral transmittance at 400 to 700 nm in a thickness in the range of 5 mm is 87% or more. When such a glass substrate is used as a substrate on the image display side of a plasma display panel, a plasma display panel in which the reduction in luminance does not occur and the problematic coloring is not noticeable can be obtained. The present glass substrate is used as a substrate on the image display side of the plasma display panel, but may be used on the opposite side of the image display.
【０００９】ガラスを商業生産するうえで、不純物とし
て鉄の混入は不可避に近く、通常は、ガラス全体に対し
て、Ｆｅ2 Ｏ3 に換算して０．０８重量％程度の鉄酸化
物が含有される。ガラス中では鉄酸化物は２価と３価の
イオンとして存在し、これらのイオンは、それぞれ特有
の吸収を可視域の波長に有する。前述のように、通常の
ソーダライムシリカガラスは、１０００ｎｍ付近の近赤
外域に吸収のピークを有するが、これは２価の鉄イオン
に起因する。In the commercial production of glass, the incorporation of iron as an impurity is almost inevitable. Usually, about 0.08% by weight of iron oxide in terms of Fe 2 O 3 is contained in the whole glass. Is done. In glass, iron oxide exists as divalent and trivalent ions, each of which has a specific absorption at a wavelength in the visible region. As described above, ordinary soda lime silica glass has an absorption peak in the near infrared region near 1000 nm, which is attributed to divalent iron ions.
【００１０】本発明では、ＦｅＯに換算した２価の鉄の
酸化物の含有量が好ましくは０．０２重量％以下、より
好ましくは０．０１５重量％以下、となるように制御す
る。この制御により、容易に、ガラスの４００〜７００
ｎｍにおける分光透過率が８７％以上になるようにでき
る。In the present invention, the content of the divalent iron oxide in terms of FeO is controlled so as to be preferably 0.02% by weight or less, more preferably 0.015% by weight or less. By this control, the glass of 400 to 700 can be easily formed.
The spectral transmittance in nm can be set to 87% or more.
【００１１】なお、３価の鉄イオンも３８０ｎｍ付近に
ピークを持つ吸収があり、主に５００ｎｍより短い波長
の透過率を下げ、黄色みを帯びた発色をする。したがっ
て、３価の鉄イオンも２価の鉄イオン同様に含有量が制
御されることが好ましい。The trivalent iron ion also has an absorption having a peak near 380 nm, reduces the transmittance mainly at a wavelength shorter than 500 nm, and develops a yellowish color. Therefore, it is preferable that the content of trivalent iron ions is controlled similarly to the case of divalent iron ions.
【００１２】好ましくは、Ｆｅ2 Ｏ3 に換算した全鉄の
含有量が０．０６重量％以下となることである。特に好
ましくは、上記全鉄の含有量が０．０５重量％以下とな
ることである。Preferably, the total iron content in terms of Fe 2 O 3 is 0.06% by weight or less. Particularly preferably, the total iron content is 0.05% by weight or less.
【００１３】２価の鉄の量の制御は、全鉄量を制御する
以外に、含まれる鉄酸化物のイオン状態を制御すること
によって行える。鉄酸化物のイオン状態は、ガラス中の
酸塩基度、熔融ガラス中の酸素濃度等の熔解条件に大き
く影響される。具体的には、酸化セリウムや硝酸ソーダ
などの酸化剤を適宜（通常は２重量％以下）添加するな
どして、全鉄中の２価の鉄の量の割合を減らし、ひいて
は、２価の鉄の絶対量を減らすことができる。この場
合、２価の鉄イオン／全鉄イオンの重量比は好ましくは
２０％以下にされる。[0013] The amount of divalent iron can be controlled by controlling the ionic state of the iron oxide contained in addition to controlling the total amount of iron. The ionic state of the iron oxide is greatly affected by melting conditions such as the acid-base content in the glass and the oxygen concentration in the molten glass. Specifically, the ratio of the amount of divalent iron in the total iron is reduced by appropriately adding an oxidizing agent such as cerium oxide or sodium nitrate (usually 2% by weight or less), and consequently divalent iron. The absolute amount of iron can be reduced. In this case, the weight ratio of divalent iron ions / total iron ions is preferably set to 20% or less.
【００１４】酸化剤として、ガラスの熔解時に用いられ
るＡｓ2 Ｏ3 やＳｂ2 Ｏ3 等の清澄剤を用いてもよい。
ただし、このような清澄剤を用いると、フロート法によ
る成形ができなくなる場合があるので注意が必要であ
る。フロートバス中の金属スズと反応するおそれがある
からである。As the oxidizing agent, a fining agent such as As 2 O 3 or Sb 2 O 3 used at the time of melting glass may be used.
However, it should be noted that the use of such a fining agent may make molding by the float method impossible. This is because there is a risk of reacting with metal tin in the float bath.
【００１５】基板ガラスの母組成については、重量％表
示で、 ＳｉＯ2 ５０〜７５（好ましくは５０〜７２）、 Ａｌ2 Ｏ3 ０〜１５、 Ｒ2 Ｏ ６〜２４（ＲはＬｉ、ＮａまたはＫであ
り、これらの合量）、 Ｒ’Ｏ ６〜２４（Ｒ’はＭｇ、Ｃａ、Ｓｒ、Ｂａ
またはＺｎであり、これらの合量）、 なる成分を含むことが好ましい。なお、Ａｌ2 Ｏ3 は必
須成分ではない。Regarding the mother composition of the substrate glass, SiO 2 50 to 75 (preferably 50 to 72), Al 2 O 3 0 to 15, R 2 O 6 to 24 (R is Li, Na or K, the total amount thereof), R'O 6 to 24 (R 'is Mg, Ca, Sr, Ba)
Or Zn, and the total amount thereof is preferably included. Note that Al 2 O 3 is not an essential component.
【００１６】基板ガラスが上記成分から本質的になる場
合、この範囲で、歪点が５５０℃以上であり、０℃〜３
００℃での平均熱膨張係数が７０×１０-7〜９０×１０
-7／℃となるような基板ガラスが得られる。歪点が５５
０℃以上の基板ガラスは、プラズマディスプレイパネル
用基板を製造する際の焼成工程で、不規則な熱変形や大
きな熱伸縮を生じにくいため、好ましい。また、０℃〜
３００℃での熱膨張係数が７０×１０-7〜９０×１０-7
／℃となるような基板ガラスは、プラズマディスプレイ
パネルの部材として通常用いられるガラスフリットと熱
膨張係数が整合しているため、プラズマディスプレイパ
ネルを製造する際に変形などの不具合を生じにくい。When the substrate glass consists essentially of the above components, the strain point is 550 ° C. or higher and 0 ° C. to 3 ° C. in this range.
The average coefficient of thermal expansion at 00 ° C. is 70 × 10 −7 to 90 × 10
A substrate glass having a temperature of −7 / ° C. is obtained. Strain point 55
Substrate glass at 0 ° C. or higher is preferable because irregular thermal deformation and large thermal expansion and contraction hardly occur in a firing step in manufacturing a plasma display panel substrate. Also, 0 ° C ~
The coefficient of thermal expansion at 300 ° C. is 70 × 10 −7 to 90 × 10 −7.
Since the substrate glass having a temperature of / ° C. has a coefficient of thermal expansion matching that of a glass frit that is generally used as a member of a plasma display panel, defects such as deformation are unlikely to occur when the plasma display panel is manufactured.
【００１７】なお、基板ガラスには、ガラスの熔解性、
清澄性または成形性を改善するために、ＳＯ3 、Ｆ、Ｃ
ｌを合量で２重量％以下、添加できる。また、ガラスの
化学的耐久性を向上させるために、Ｂ2 Ｏ3 、ＺｒＯ
2 、Ｌａ2 Ｏ3 、ＴｉＯ2 、ＳｎＯ2 、ＺｎＯを合量で
５重量％以下、添加できる。The substrate glass has a glass melting property,
SO 3 , F, C to improve clarity or formability
1 in a total amount of 2% by weight or less. In order to improve the chemical durability of glass, B 2 O 3 , ZrO
2 , La 2 O 3 , TiO 2 , SnO 2 and ZnO can be added in a total amount of 5% by weight or less.
【００１８】本発明の第２の態様におけるプラズマディ
スプレイパネル用基板では、上記の母組成のガラスを使
用することを前提として、ＦｅＯに換算した２価の鉄の
酸化物の含有量が０．０２重量％以下であるとともに、
重量表示で１５０ｐｐｍ以下のＣｏＯと１２００ｐｐｍ
以下のＮｉＯとの少くともいずれか一方を含有して、５
５０ｎｍの分光透過率をＣｏＯ、ＮｉＯがいずれも含有
されていない場合に比べて低減せしめたことを特徴とす
る。In the substrate for a plasma display panel according to the second aspect of the present invention, the content of the divalent iron oxide in terms of FeO is 0.02 on the premise that the glass having the above mother composition is used. Weight percent or less,
Less than 150ppm CoO and 1200ppm by weight
Containing at least one of the following NiO and 5
It is characterized in that the spectral transmittance at 50 nm is reduced as compared with the case where neither CoO nor NiO is contained.
【００１９】第１の態様の基板ガラスは光透過率が高い
ため、高輝度のプラズマディスプレイパネルが得られ
る。ところが、プラズマディスプレイパネルに用いる蛍
光体の発光効率が高い場合は、基板ガラスの光透過率が
高いと、コントラスト比が低下するおそれがある。Since the substrate glass of the first embodiment has a high light transmittance, a plasma display panel with high brightness can be obtained. However, when the luminous efficiency of the phosphor used in the plasma display panel is high, the contrast ratio may be reduced if the light transmittance of the substrate glass is high.
【００２０】本発明の第２の態様の基板ガラスでは、前
記と同様の母組成のガラスに重量表示で１５０ｐｐｍ以
下のＣｏＯと１２００ｐｐｍ以下のＮｉＯとの少くとも
いずれか一方を含有させて、５５０ｎｍの分光透過率を
低減せしめる。このようにして、プラズマディスプレイ
パネルに用いる蛍光体の発光効率が高い場合でも、表示
のコントラスト比を高くできる。５５０ｎｍの分光透過
率は、１．５〜３．５ｍｍの範囲の厚さで、好ましくは
４５％以上８５％未満、特に好ましくは４５％以上８０
％未満、である。ＣｏＯとＮｉＯとの含有量は、重量表
示でＣｏＯは１５〜１１０ｐｐｍ、ＮｉＯは１００〜１
１００ｐｐｍ、が好ましい。In the substrate glass according to the second aspect of the present invention, the glass having the same mother composition as described above contains at least one of CoO of 150 ppm or less and NiO of 1200 ppm or less by weight and has a 550 nm wavelength. Reduce the spectral transmittance. In this manner, the display contrast ratio can be increased even when the luminous efficiency of the phosphor used for the plasma display panel is high. The spectral transmittance at 550 nm is preferably from 45% to less than 85%, particularly preferably from 45% to 80% at a thickness in the range of 1.5 to 3.5 mm.
%. The contents of CoO and NiO are 15 to 110 ppm by weight and 100 to 1 ppm of NiO by weight.
100 ppm is preferred.
【００２１】ＮｉＯとＣｏＯとは、互いに補色の位置に
光の吸収を生じさせる。したがって、両者を含みかつ両
者の含有量を適当に釣り合わせることによって、不適当
な着色を生じることなく、光の透過率を低減できる。こ
の観点で、ＮｉＯ／ＣｏＯの重量比は５〜１５、特には
６〜１２、であることが好ましい。NiO and CoO cause absorption of light at positions complementary to each other. Therefore, by appropriately containing the two and appropriately balancing the content of both, the light transmittance can be reduced without causing inappropriate coloring. In this respect, the weight ratio of NiO / CoO is preferably 5 to 15, particularly preferably 6 to 12.
【００２２】本発明の第２の態様の基板ガラスにおいて
も、ＦｅＯに換算した２価の鉄の酸化物の含有量が０．
０２重量％以下、好ましくは０．０１５重量％以下、に
制御されているので、第１の態様の基板ガラスと同様
に、紫外域および近赤外域に問題となる吸収を生じな
い。In the substrate glass according to the second embodiment of the present invention, the content of the divalent iron oxide in terms of FeO is 0.10.
Since it is controlled to be not more than 02% by weight, preferably not more than 0.015% by weight, similarly to the substrate glass of the first embodiment, there is no problematic absorption in the ultraviolet region and near infrared region.
【００２３】３価の鉄イオンも、３８０ｎｍ付近にピー
クを持つ吸収があるので、Ｆｅ2 Ｏ3 に換算した全鉄の
含有量が０．０６重量％以下、特には０．０５重量％以
下、となるようにすることが好ましいのは、第１の態様
と同様である。Since trivalent iron ions also have an absorption having a peak near 380 nm, the total iron content in terms of Fe 2 O 3 is 0.06% by weight or less, particularly 0.05% by weight or less. It is similar to the first embodiment that it is preferable to make
【００２４】[0024]
【実施例】各成分の原料を目標組成になるように調合
し、白金るつぼを用いて１５００℃程度の温度で熔解し
た。次いで、熔解ガラスを流し出し、板状に成形後、徐
冷した試料の４００〜７００ｎｍでの分光透過率を１０
０ｎｍ間隔で測定した。EXAMPLES The raw materials of the respective components were prepared so as to have a target composition, and were melted at a temperature of about 1500 ° C. using a platinum crucible. Next, the molten glass was poured out, formed into a plate, and then slowly cooled.
Measurements were taken at 0 nm intervals.
【００２５】表１、表２には、こうして得られたガラス
の組成、厚さ、および４００〜７００ｎｍでの分光透過
率を示す。表１、表２中のＦｅ2 Ｏ3 、ＣｏＯおよびＮ
ｉＯを除く母ガラスの組成の欄に記載した、Ａ〜Ｄは、
表３に示すような組成を示す。表１、表２中の全鉄酸化
物量はＦｅ2 Ｏ3 に換算した値である。Tables 1 and 2 show the composition, thickness, and spectral transmittance at 400 to 700 nm of the glass thus obtained. Fe 2 O 3 , CoO and N in Tables 1 and 2
A to D described in the column of the composition of the mother glass excluding iO are as follows:
The composition is as shown in Table 3. The total iron oxide content in Tables 1 and 2 is a value converted into Fe 2 O 3 .
【００２６】例１０と例１１は比較例である。例１〜例
９は、４００〜７００ｎｍの分光透過率が８８％以上に
できている。例１０、例１１は、鉄酸化物の含有量が多
いため、７００ｎｍでの分光透過率の低下が見られる。Examples 10 and 11 are comparative examples. In Examples 1 to 9, the spectral transmittance at 400 to 700 nm is 88% or more. In Examples 10 and 11, since the content of iron oxide was large, a decrease in the spectral transmittance at 700 nm was observed.
【００２７】一方、ＮｉＯとＣｏＯとで５５０ｎｍの透
過率を下げたガラスの組成、厚さ、５５０ｎｍでの分光
透過率を表４に示す。例１３、例１４では、ＮｉＯとＣ
ｏＯとの添加により、５５０ｎｍでの分光透過率が８７
％よりも低くなっている。したがってプラズマディスプ
レイパネルの発光体の輝度が高い場合でも高コントラス
ト比が得られる。On the other hand, Table 4 shows the composition, thickness, and spectral transmittance at 550 nm of the glass whose transmittance at 550 nm was reduced by NiO and CoO. In Examples 13 and 14, NiO and C
With the addition of oO, the spectral transmittance at 550 nm is 87
% Is lower. Therefore, a high contrast ratio can be obtained even when the luminance of the luminous body of the plasma display panel is high.
【００２８】[0028]
【表１】 [Table 1]
【００２９】[0029]
【表２】 [Table 2]
【００３０】[0030]
【表３】 [Table 3]
【００３１】[0031]
【表４】 [Table 4]
【００３２】[0032]
【発明の効果】本発明によれば、輝度が高くとれ、表示
上の問題となる着色の少ないプラズマディスプレイパネ
ル用ガラス基板が得られる。また、本発明によれば、表
示のコントラストを高くとれるようなプラズマディスプ
レイパネル用ガラス基板が得られる。According to the present invention, it is possible to obtain a glass substrate for a plasma display panel, which has high luminance and is less colored, which is a display problem. Further, according to the present invention, a glass substrate for a plasma display panel, which can obtain a high display contrast, can be obtained.
Claims (5)
〜７００ｎｍにおける分光透過率が８７％以上であるプ
ラズマディスプレイパネル用ガラス基板。1. The method according to claim 1, wherein the thickness is in the range of 1.5 to 3.5 mm.
A glass substrate for a plasma display panel, having a spectral transmittance of 87% or more at -700 nm.
り、これらの合量）、 Ｒ’Ｏ ６〜２４（Ｒ’はＭｇ、Ｃａ、Ｓｒ、Ｂａ
またはＺｎであり、これらの合量）、 なる成分を含み、２価の鉄の酸化物の含有量がＦｅＯに
換算して０．０２重量％以下である請求項１記載のプラ
ズマディスプレイパネル用ガラス基板。2. The composition of the glass is expressed in terms of% by weight: SiO 2 50 to 75, Al 2 O 3 0 to 15, R 2 O 6 to 24 (R is Li, Na or K, and their total amount) R′O 6 to 24 (R ′ is Mg, Ca, Sr, Ba
2. The glass for a plasma display panel according to claim 1, wherein the content of the divalent iron oxide is 0.02% by weight or less in terms of FeO. substrate.
て０．０５重量％以下である請求項２記載のプラズマデ
ィスプレイパネル用ガラス基板。3. The glass substrate for a plasma display panel according to claim 2, wherein the total iron oxide content is 0.05% by weight or less in terms of Fe 2 O 3 .
り、これらの合量）、 Ｒ’Ｏ ６〜２４（Ｒ’はＭｇ、Ｃａ、Ｓｒ、Ｂａ
またはＺｎであり、これらの合量）、 なる成分を含み、２価の鉄の酸化物の含有量がＦｅＯに
換算して０．０２重量％以下であるとともに、重量表示
で１５０ｐｐｍ以下のＣｏＯと１２００ｐｐｍ以下のＮ
ｉＯとの少くともいずれか一方を含有して５５０ｎｍの
分光透過率を低減せしめてなるプラズマディスプレイパ
ネル用ガラス基板。4. The composition of the glass is expressed in terms of% by weight: SiO 2 50 to 75, Al 2 O 3 0 to 15, R 2 O 6 to 24 (R is Li, Na or K, and their total amount) R′O 6 to 24 (R ′ is Mg, Ca, Sr, Ba
Or the total amount of Zn), and the content of the oxide of divalent iron is 0.02% by weight or less in terms of FeO, and 150 ppm or less of CoO by weight. N of 1200 ppm or less
A glass substrate for a plasma display panel, comprising at least one of iO and reducing the spectral transmittance at 550 nm.
されるＮｉＯ／ＣｏＯの重量比が５〜１５である請求項
４記載のプラズマディスプレイパネル用ガラス基板。5. The glass substrate for a plasma display panel according to claim 4, wherein the glass substrate contains NiO and CoO, and the weight ratio of NiO / CoO is 5 to 15.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15882197A JP4029438B2 (en) | 1996-06-20 | 1997-06-16 | Glass substrate for plasma display panel |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8-160208 | 1996-06-20 | ||
| JP16020896 | 1996-06-20 | ||
| JP15882197A JP4029438B2 (en) | 1996-06-20 | 1997-06-16 | Glass substrate for plasma display panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1072235A true JPH1072235A (en) | 1998-03-17 |
| JP4029438B2 JP4029438B2 (en) | 2008-01-09 |
Family
ID=26485822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15882197A Expired - Fee Related JP4029438B2 (en) | 1996-06-20 | 1997-06-16 | Glass substrate for plasma display panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4029438B2 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0939060A1 (en) * | 1998-02-27 | 1999-09-01 | Asahi Glass Company Ltd. | Substrate glass for displays |
| JP2003507317A (en) * | 1999-08-26 | 2003-02-25 | コーニング インコーポレイテッド | Colorant glass |
| JP2004002062A (en) * | 2002-05-29 | 2004-01-08 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display unit |
| JP2006160546A (en) * | 2004-12-06 | 2006-06-22 | Hitachi Ltd | Flat surface-type display device |
| JP2006518326A (en) * | 2003-01-24 | 2006-08-10 | サン−ゴバン グラス フランス | Gray soda lime silicate glass composition for glazing production |
| JP2006252828A (en) * | 2005-03-09 | 2006-09-21 | Nippon Electric Glass Co Ltd | Glass substrate for plasma display panel |
| JP2010229032A (en) * | 2010-07-09 | 2010-10-14 | Nippon Electric Glass Co Ltd | Glass substrate for liquid crystal display, and liquid crystal display |
| JP2011011951A (en) * | 2009-07-03 | 2011-01-20 | Asahi Glass Co Ltd | Glass substrate for flat panel display, method for producing the same, and display panel using the same |
| EP2426094A1 (en) * | 2008-04-21 | 2012-03-07 | Asahi Glass Company, Limited | Glass plate for display panels, process for producing it, and process for producing TFT panel |
| WO2013118897A1 (en) * | 2012-02-09 | 2013-08-15 | 旭硝子株式会社 | Glass substrate for transparent conductive film formation, and substrate with transparent conductive film |
-
1997
- 1997-06-16 JP JP15882197A patent/JP4029438B2/en not_active Expired - Fee Related
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0939060A1 (en) * | 1998-02-27 | 1999-09-01 | Asahi Glass Company Ltd. | Substrate glass for displays |
| US6313052B1 (en) * | 1998-02-27 | 2001-11-06 | Asahi Glass Company Ltd. | Glass for a substrate |
| JP2003507317A (en) * | 1999-08-26 | 2003-02-25 | コーニング インコーポレイテッド | Colorant glass |
| JP2004002062A (en) * | 2002-05-29 | 2004-01-08 | Nippon Electric Glass Co Ltd | Glass substrate for flat panel display unit |
| JP4692915B2 (en) * | 2002-05-29 | 2011-06-01 | 日本電気硝子株式会社 | Front glass substrate for plasma display devices. |
| JP4662919B2 (en) * | 2003-01-24 | 2011-03-30 | サン−ゴバン グラス フランス | Gray soda lime silicate glass composition for glazing production |
| JP2006518326A (en) * | 2003-01-24 | 2006-08-10 | サン−ゴバン グラス フランス | Gray soda lime silicate glass composition for glazing production |
| JP2006160546A (en) * | 2004-12-06 | 2006-06-22 | Hitachi Ltd | Flat surface-type display device |
| JP2006252828A (en) * | 2005-03-09 | 2006-09-21 | Nippon Electric Glass Co Ltd | Glass substrate for plasma display panel |
| EP2426094A1 (en) * | 2008-04-21 | 2012-03-07 | Asahi Glass Company, Limited | Glass plate for display panels, process for producing it, and process for producing TFT panel |
| US8455375B2 (en) | 2008-04-21 | 2013-06-04 | Asahi Glass Company, Limited | Glass plate for display panels, process for producing it, and process for producing TFT panel |
| JP2011011951A (en) * | 2009-07-03 | 2011-01-20 | Asahi Glass Co Ltd | Glass substrate for flat panel display, method for producing the same, and display panel using the same |
| JP2010229032A (en) * | 2010-07-09 | 2010-10-14 | Nippon Electric Glass Co Ltd | Glass substrate for liquid crystal display, and liquid crystal display |
| WO2013118897A1 (en) * | 2012-02-09 | 2013-08-15 | 旭硝子株式会社 | Glass substrate for transparent conductive film formation, and substrate with transparent conductive film |
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|---|---|
| JP4029438B2 (en) | 2008-01-09 |
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