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JPH10284642A - Highly heat dissipating ic package substrate - Google Patents

Highly heat dissipating ic package substrate

Info

Publication number
JPH10284642A
JPH10284642A JP9126194A JP12619497A JPH10284642A JP H10284642 A JPH10284642 A JP H10284642A JP 9126194 A JP9126194 A JP 9126194A JP 12619497 A JP12619497 A JP 12619497A JP H10284642 A JPH10284642 A JP H10284642A
Authority
JP
Japan
Prior art keywords
cavity
package substrate
copper
chip
package
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9126194A
Other languages
Japanese (ja)
Inventor
Takatsugu Komatsu
隆次 小松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Micron Co Ltd
Original Assignee
Nihon Micron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Micron Co Ltd filed Critical Nihon Micron Co Ltd
Priority to JP9126194A priority Critical patent/JPH10284642A/en
Publication of JPH10284642A publication Critical patent/JPH10284642A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/15321Connection portion the connection portion being formed on the die mounting surface of the substrate being a ball array, e.g. BGA

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a highly reliable IC package substrate and an IC package having superior heat dissipating property, electrical characteristics, reliability in electrical connection, configuration preciseness, heat-resistant property and sealing property, in which materials can be mounted on a substrate reliably. SOLUTION: A copper or copper alloy plate having superior thermal conductivity and electrical conducting property is used for the base material 20 of an IC package substrate. A bonding terminal 24 to be used for electrical connection with an IC-chip terminal through an electric insulating film 22, a wiring circuit 24 and an external connection terminal 24b are formed on the substrate 20, the center part of the base material 20 is removed by machining, and a cavity 26 to be used for mounting and housing the IC chip is formed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】各種ICチップを搭載収納するキ
ャビティ穴を有するICパッケージであって熱放散性並
びに電気的特性及び信頼性に優れる金属を基材とするI
Cパッケージとその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention An IC package having a cavity for accommodating various IC chips therein and having a metal base material having excellent heat dissipation, electrical characteristics, and reliability.
The present invention relates to a C package and a manufacturing method thereof.

【0002】[0002]

【従来の技術】近年のICの急速な高速化、大容量化及
び高機能化に伴いその発熱量が増大し、この発熱対策を
講じなければICの動作を保証することが困難になって
きている。これに対応するため従来のプラスチック材料
を基材とするICパッケージに代えて、金属板を基材と
するICパッケージが検討されている。
2. Description of the Related Art In recent years, the amount of heat generated by ICs has been rapidly increased, the capacity has been increased, and the functions have been increased, and the operation of the ICs has been difficult to guarantee without taking measures against the heat generation. I have. To cope with this, an IC package using a metal plate as a base has been studied instead of a conventional IC package using a plastic material as a base.

【0003】金属板を基板に使用したICパッケージと
しては、アルミニューム板の中央部にICチップを搭載
するためのキャビティを彫り込み形成し、その外周表面
に電気的絶縁層を介して配線回路を被着形成したもの及
び、銅板の表面に電気的絶縁被膜を介して配線回路を形
成し前記のキャビティを絞り加工して成るもの又、同様
に表面に配線回路を被着形成した銅系金属板2枚を張り
合わせてキャビティを形成したものがある。これらのI
CパッケージはICチップを金属板に直接搭載するた
め、優れた熱放散性を有し、また電気的特性にも優れた
信頼性のある製品を提供できる利点がある。
[0003] As an IC package using a metal plate as a substrate, a cavity for mounting an IC chip is formed in the center of an aluminum plate, and a wiring circuit is formed on the outer peripheral surface thereof through an electrical insulating layer. A copper-based metal plate having a wiring circuit formed on the surface of a copper plate via an electrical insulating film and drawing the cavity, or a copper-based metal plate 2 having a wiring circuit formed on the surface in the same manner. There is one in which cavities are formed by laminating pieces. These I
Since the C package mounts the IC chip directly on the metal plate, it has an advantage that it has excellent heat dissipation and can provide a reliable product having excellent electrical characteristics.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、前記の
アルミニューム板を使用するICパッケージ基板にはい
くつかの問題があった。すなわち、アルミニュームは非
常に酸化しやすく電気を通さないアルミナの被膜が表面
に形成するという特徴がある。このアルミニューム板を
グランド回路層として電気的接続をとる際、メッキ接続
の信頼性が問題になるため予め酸化防止のためジンケー
ト処理や無電解Niメッキ等の表面処理を施している
が、その接続の信頼性が低いためアルミニューム板をグ
ランド回路層として有効に活かすことが難しいうえコス
トアップになるのと、アルミニューム材料はSiを主原
料とするICチップにくらべて熱膨張率が大きいため、
寸法の大きいICチップになればなるほど、アルミニュ
ーム板とICチップとの熱膨張の差による不整合が生じ
るという問題がある。又、銅系金属板を絞り加工して、
ICチップを搭載するキャビティを形成するICパッケ
ージ基板については、生産性及び電気的接続の信頼性は
優れているものの、いくつかの問題があった。すなわ
ち、この絞り加工は該金属板表面に配線回路を形成して
から行わなければならないため、形成した配線回路への
加工歪みが避けられず、加工条件が不適切だと変形や損
傷を与えることがある。このため特に多層構造のICパ
ッケージ基板を確実に製作することは非常に難しいとい
う問題がある。さらに、絞り加工でICを搭載するキャ
ビティ部を形成するため、このキャビティの側壁にどう
しても傾斜がつく。この結果、ICチップの端子と基板
上のボンディング端子との距離が大きくなるためボンデ
ィングワイヤが長くなり、その接続の信頼性が低下する
という問題がある。さらに、銅系金属板を2枚張り合わ
せてキャビティを形成したICパッケージ基板について
は、接着剤による張り合わせの信頼性、位置合わせ精
度、スルーホールの電気的接続の信頼性等に問題があ
る。本発明はこれらの問題点を解決するためになされた
ものであり、その目的とするところは、銅又は銅合金板
を基材としその中央部にICチップを搭載するためのキ
ャビティ部を機械加工でもって形成するとともに、該基
材をグランド回路層又は電源供給回路層とし、該キャビ
ティが形成される側の表面に電気的絶縁皮膜を介して1
層又は2層以上の配線回路を形成する方法によって、電
気的接続の信頼性、電気的特性、熱放散性及び、形状精
度、封止性に優れるICパッケージ基板及びICパッケ
ージと、その製造方法を提供しようとするものである。
However, the IC package substrate using the aluminum plate has several problems. In other words, aluminum has a feature that a film of alumina which is very easily oxidized and does not conduct electricity is formed on the surface. When this aluminum plate is used as a ground circuit layer for electrical connection, the reliability of the plating connection becomes a problem, so surface treatment such as zincate treatment or electroless Ni plating is applied in advance to prevent oxidation. It is difficult to effectively use the aluminum plate as the ground circuit layer due to the low reliability of the device, and the cost increases.Also, the aluminum material has a larger coefficient of thermal expansion than the IC chip using Si as a main material.
As the size of an IC chip becomes larger, there is a problem that a mismatch occurs due to a difference in thermal expansion between the aluminum plate and the IC chip. Also, copper metal plate is drawn,
An IC package substrate that forms a cavity for mounting an IC chip has several problems, although it has excellent productivity and reliability of electrical connection. In other words, since this drawing must be performed after forming a wiring circuit on the surface of the metal plate, processing distortion to the formed wiring circuit is unavoidable, and deformation or damage may occur if processing conditions are inappropriate. There is. For this reason, there is a problem that it is extremely difficult to reliably manufacture a multi-layer IC package substrate. Further, since the cavity for mounting the IC is formed by drawing, the sidewall of the cavity is necessarily inclined. As a result, since the distance between the terminal of the IC chip and the bonding terminal on the substrate becomes large, the bonding wire becomes long, and there is a problem that the reliability of the connection is reduced. Furthermore, an IC package substrate in which a cavity is formed by bonding two copper-based metal plates together has problems in reliability of bonding by an adhesive, positioning accuracy, reliability of electrical connection of through holes, and the like. The present invention has been made to solve these problems, and an object of the present invention is to machine a cavity for mounting an IC chip in the center of a copper or copper alloy plate as a base material. The base material is used as a ground circuit layer or a power supply circuit layer.
An IC package substrate and an IC package having excellent electrical connection reliability, electrical characteristics, heat dissipation, shape accuracy, and encapsulation by a method of forming a layer or a wiring circuit of two or more layers, and a method of manufacturing the same. It is something to offer.

【0005】[0005]

【課題を解決するための手段】本発明は上記目標を達成
するため次の手段を備える。すなわち、金属板を基材と
する基板の片面上にICチップと外部の実装基板とを電
気的に接続するための端子及び配線回路が電気的絶縁層
を介して被着形成され、かつこの基板の中央部にICチ
ップを搭載収納するキャビティ部が設けられたICパッ
ケージ基板において、該基材を銅又は銅合金とし、この
上に被着形成された該電気的絶縁被膜を介して該端子及
び該配線回路を形成した後に、該銅又は銅合金基材を機
械加工によって削除して形成することを特徴とする。
又、前記絶縁層を貫通するスルーホールでもって前記配
線回路及び外部接続用端子と基材の銅又は銅合金を接続
して、該基材をグランド回路層又は電源供給回路層とす
る電気回路を形成することを特徴とする。又、前記の電
気的絶縁被膜を貫通するスルーホールでもってグランド
回路層又は、電源供給回路層である該銅又は銅合金基材
に接続する回路に代えて、該キャビティーの外縁表面を
はちまき状に絶縁しないで該基材面をそのまま露出する
か、又は該外縁の4辺を浅く段差加工して、これらの加
工表面に直接グランド回路接続用端子又は、電源供給回
路接続用端子を形成したことを特徴とする。又、グラン
ド回路層又は電源供給回路層とする前記基材上に電気的
絶縁被膜を介して配線回路を2層以上複数層を形成した
ことを特徴とする。又、前記配線回路及び端子が形成さ
れた表面と反対側の表面の一部又は全部に電気的絶縁被
膜を被着形成したことを特徴とする。又、前記キャビテ
ィの外周部表面に形成され、ICチップと電気的に接続
するためのボンディング端子の外側を取囲むようにダム
を設置したことを特徴とする。又、前記キャビティ部に
ICチップを接着搭載し、ICチップの端子と前記ボン
ディング端子とをボンディングワイヤでボンディング接
続した後、該キャビティをポッテング又はトランスファ
ーモールドによって封止することを特徴とする。
The present invention includes the following means for achieving the above-mentioned object. That is, a terminal and a wiring circuit for electrically connecting an IC chip and an external mounting substrate are formed on one surface of a substrate having a metal plate as a base material via an electrically insulating layer, and In the IC package substrate provided with a cavity portion for mounting and housing an IC chip in the center of the substrate, the base material is made of copper or a copper alloy, and the terminal and the terminal are interposed through the electrically insulating film formed thereon. After the wiring circuit is formed, the copper or copper alloy base material is removed by machining to form the wiring circuit.
Further, an electric circuit is provided in which the wiring circuit and the external connection terminal and the copper or copper alloy of the base material are connected by a through hole penetrating the insulating layer, and the base material is used as a ground circuit layer or a power supply circuit layer. It is characterized by forming. In addition, instead of a circuit connected to the copper or copper alloy base material which is a ground circuit layer or a power supply circuit layer with a through hole penetrating the electrical insulating film, the outer peripheral surface of the cavity is torn. The base material surface is exposed as it is without insulation, or the four sides of the outer edge are processed shallowly to form a ground circuit connection terminal or a power supply circuit connection terminal directly on these processed surfaces. It is characterized by. Further, two or more wiring circuits are formed on the base material serving as a ground circuit layer or a power supply circuit layer via an electrical insulating film. Further, an electrical insulating coating is formed on a part or all of the surface opposite to the surface on which the wiring circuit and the terminals are formed. A dam is formed on the outer peripheral surface of the cavity so as to surround the outside of the bonding terminal for electrically connecting to the IC chip. Further, an IC chip is bonded and mounted in the cavity portion, and the terminal of the IC chip and the bonding terminal are connected by bonding with a bonding wire, and then the cavity is sealed by potting or transfer molding.

【0006】[0006]

【作 用】本発明に係るICパッケージはパッケージの
基材として銅又は銅合金板を使用し、該基材上に電気的
絶縁被膜を介して端子及び配線回路を形成するととも
に、該基板中央部に機械加工によってICチップを搭載
するためのキャビティを形成して得られる。したがっ
て、該基板の基材に銅又は銅合金を用いることにより、
熱放散性に優れ、アルミニュームのように特別な酸化防
止被膜処理を施すことなく、そのままメッキして優れた
電気的接続をとることができる。しかも、電気伝導性に
優れ、電気容量の大きな該基材をグランド回路層又は電
源供給回路層とすることができることから、電流量の変
化に対し安定した電位レベルの回路層を有する電気的特
性の優れたICパッケージ基板を得ることができる。
又、ICチップを収納搭載するキャビティを機械加工に
よって該基材を削除して形成するため、形状精度に優れ
たキャビティを有するICパッケージ基板を得ることが
できるとともに、予め該基板上に被着形成した電気的絶
縁被膜、端子及び配線回路が何層あっても、これらに加
工による変形や、損傷を全く与えることがないため、き
わめてて信頼性の高いICパッケージ基板を得ることが
でき、さらに該キャビティの側壁を該基板表面に対して
直角に形成できるため、キャビティに搭載したICチッ
プの端子と該基板上のボンディング端子を接続するボン
ディングワイヤの長さを短くすることができ、該ボンデ
ィングワイヤの接続の信頼性に優れたICパッケージ基
板を得ることができる。この他、基材が金属の銅又は銅
合金であるのと、該基板を貫通するスルーホールがない
ため耐湿性に優れたICパッケージ基板を得ることがで
きる。したがって、前記基板のキャビティに搭載された
ICチップはポッティング又は、トランスファーモール
ドによってその封止が好適になされ、熱放散性、電気的
特性、電気的接続性、形状精度、耐湿性の優れた信頼性
の高いICパッケージを提供することができる。
The IC package according to the present invention uses a copper or copper alloy plate as a base material of the package, forms terminals and wiring circuits on the base material via an electrical insulating film, and forms a central portion of the substrate. A cavity for mounting an IC chip is formed by machining. Therefore, by using copper or copper alloy for the substrate of the substrate,
It is excellent in heat dissipation and can be plated as it is to provide excellent electrical connection without special anti-oxidation coating treatment like aluminum. In addition, since the substrate having excellent electric conductivity and having a large electric capacity can be used as the ground circuit layer or the power supply circuit layer, the electric characteristic having the circuit layer of the potential level which is stable with respect to the change in the amount of current is obtained. An excellent IC package substrate can be obtained.
Further, since the cavity for accommodating and mounting the IC chip is formed by removing the base material by machining, it is possible to obtain an IC package substrate having a cavity having excellent shape accuracy and to form an IC package substrate on the substrate in advance. No matter how many layers of the electrically insulating coating, terminals and wiring circuits are formed, they are not deformed or damaged by processing at all, so that an extremely reliable IC package substrate can be obtained. Since the side wall of the cavity can be formed at right angles to the surface of the substrate, the length of the bonding wire connecting the terminal of the IC chip mounted in the cavity and the bonding terminal on the substrate can be shortened. An IC package substrate having excellent connection reliability can be obtained. In addition, an IC package substrate having excellent moisture resistance can be obtained because the substrate is made of metal copper or copper alloy and there is no through hole penetrating the substrate. Therefore, the IC chip mounted in the cavity of the substrate is suitably sealed by potting or transfer molding, and has excellent reliability of heat dissipation, electrical characteristics, electrical connectivity, shape accuracy, and moisture resistance. IC package with high reliability can be provided.

【実施例】【Example】

【0007】以下、本発明の好適な実施例を添付図面に
基づいて説明する。図1は本発明に係るICパッケージ
基板の一実施例の構成及び、このICパッケージ基板に
ICチップ10を搭載収納し、かつ外部接続用半田ボー
ルを形成したICパッケージを示す。実施例のICパッ
ケージ基板の基材20には銅又は銅合金板を使用し、こ
の基材20上に電気的絶縁被膜22を介してボンディン
グ端子24a、配線回路24、外部接続用端子24bを
形成するとともに、基材20を機械加工によって削除し
ICチップの搭載収納用キャビティ26を形成したこと
を特徴とする。
Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. FIG. 1 shows a configuration of an embodiment of an IC package substrate according to the present invention, and an IC package in which an IC chip 10 is mounted and housed on the IC package substrate and solder balls for external connection are formed. A copper or copper alloy plate is used as the base material 20 of the IC package substrate of the embodiment, and the bonding terminals 24a, the wiring circuit 24, and the external connection terminals 24b are formed on the base material 20 via the electric insulating film 22. In addition, the substrate 20 is removed by machining to form a cavity 26 for mounting and storing an IC chip.

【0008】図2に上記実施例における基材20、電気
的絶縁被膜22,配線回路24等の構成を拡大して示
す。電気的絶縁皮膜22は基材20上でICチップ10
を搭載するキャビティ26の外側表面に被着形成され、
ボンディング端子24a、配線回路24、外部接続用端
子24bはこの電気的絶縁皮膜22の表面に被着形成さ
れている。28は基材20の外周エリアに形成された外
部接続用端子24b上に接続形成された半田ボールであ
る。50はキャビティ26にICチップを搭載し、IC
チップの端子とボンディング端子24aを電気的に接続
した後、キャビティ26を樹脂材料で封止する際に、こ
の樹脂が外部接続用端子が配置形成された部分にまで流
れないように防止して、ICパッケージ全体の厚さを薄
くするためのダムである。23aはボンディング端子と
グランド回路層又は電源供給回路層である基材20と
を、又23cは該基材20と外部接続用端子24bとを
電気的に接続するためのスルーホールを示す。
FIG. 2 shows an enlarged view of the structure of the base 20, the electrically insulating film 22, the wiring circuit 24 and the like in the above embodiment. The electric insulating film 22 is formed on the substrate 20 by the IC chip 10.
Is formed on the outer surface of the cavity 26 for mounting the
The bonding terminal 24a, the wiring circuit 24, and the external connection terminal 24b are formed on the surface of the electrically insulating film 22 by adhesion. Reference numeral 28 denotes a solder ball connected and formed on the external connection terminal 24b formed in the outer peripheral area of the base material 20. 50 is for mounting an IC chip in the cavity 26,
After electrically connecting the chip terminals and the bonding terminals 24a, when sealing the cavity 26 with a resin material, the resin is prevented from flowing to the portion where the external connection terminals are arranged and formed. This is a dam for reducing the thickness of the entire IC package. Reference numeral 23a denotes a bonding terminal and the substrate 20 which is a ground circuit layer or a power supply circuit layer, and reference numeral 23c denotes a through hole for electrically connecting the substrate 20 to the external connection terminal 24b.

【0009】図3に上記実施例のICパッケージ基板の
上面図を示す。ICパッケージは平面形状の外形が略正
方形に形成され、その中央部にICチップ10を搭載収
納するキャビティ26が凹状に形成され。ボンディング
端子24a、配線回路24、外部接続用端子24bはキ
ャビティ26を取り囲むように配置され、キャビティ2
6の周縁から基材20の外縁に向けて放射状に形成され
る。ICチップの端子とボンディング端子24aはボン
ディングワイヤで接続する構成としているが、このボン
ディングワイヤの代わりにTABテープを用いてこれら
を接続してもよい。又、キャビティ26は機械加工によ
り図1,2に示すようにその底面は平坦面に加工され
る。
FIG. 3 shows a top view of the IC package substrate of the above embodiment. The IC package has a planar shape having a substantially square outer shape, and a cavity 26 for mounting and housing the IC chip 10 is formed in the center thereof in a concave shape. The bonding terminal 24a, the wiring circuit 24, and the external connection terminal 24b are arranged so as to surround the cavity 26.
6 are formed radially from the peripheral edge toward the outer edge of the substrate 20. Although the terminal of the IC chip and the bonding terminal 24a are connected by a bonding wire, they may be connected by using a TAB tape instead of the bonding wire. The bottom surface of the cavity 26 is machined into a flat surface as shown in FIGS.

【0010】基材20の材質としては熱放散性、電気的
特性の面から純銅が好適であるが、取扱い面及び寸法ア
ップに伴う変形防止の面からはより強度の高い銅合金が
有効である。図1,2に示す実施例では、基材20とし
ては純銅板を使用した。又、電気的絶縁被膜22は、通
常の銅張り積層板に用いられるもので所定の電気的絶縁
特性を有する素材であれば特に限定されないが、高出力
ICパッケージを主用途とする本発明には耐熱性に優れ
るポリイミド樹脂、耐熱ガラスエポキシ樹脂等が好適で
ある。
As a material of the substrate 20, pure copper is preferable in terms of heat dissipation and electrical characteristics, but a copper alloy having higher strength is effective in terms of handling and prevention of deformation due to an increase in size. . In the examples shown in FIGS. 1 and 2, a pure copper plate was used as the substrate 20. The electrical insulation film 22 is not particularly limited as long as it is used for a normal copper-clad laminate and has a predetermined electrical insulation property. A polyimide resin, a heat-resistant glass epoxy resin, or the like having excellent heat resistance is suitable.

【0011】図4は基材20に配線回路を形成し、機械
加工によってICパッケージ基板を製造する実施例を示
す。すなわち、図4−aはICパッケージの基材となる
銅又は銅合金板材を示しており、前記実施例では0.6
mm厚の純銅板を使用した。この基材20に配線凹路を
形成するため銅張り積層板を熱圧着した(図4−b)。
この積層板の銅箔厚さは18μmで電気的絶縁被膜22
としての樹脂材料には厚さは0.1mm(7)FR−4
を使用した。この樹脂材料にポリイミドフイルムのよう
な薄厚の樹脂を使用すると、十分な電気的絶縁性が確保
できるとともに、基材20と電気的絶縁被膜22との熱
膨張率の差による基板の曲がりが防止できるという利点
があり有利である。
FIG. 4 shows an embodiment in which a wiring circuit is formed on a substrate 20 and an IC package substrate is manufactured by machining. That is, FIG. 4-a shows a copper or copper alloy plate material serving as a base material of the IC package,
A pure copper plate having a thickness of mm was used. A copper-clad laminate was thermocompression-bonded to the substrate 20 to form a wiring recess (FIG. 4-b).
The thickness of the copper foil of this laminate is 18 μm and the electrical insulation coating 22
The resin material has a thickness of 0.1 mm (7) FR-4
It was used. When a thin resin such as a polyimide film is used as the resin material, sufficient electrical insulation can be ensured, and the substrate can be prevented from being bent due to a difference in thermal expansion coefficient between the base material 20 and the electrical insulating film 22. This is an advantage.

【0012】次に、グランド回路層との接続ををとる箇
所に銅箔42、電気的絶縁被膜22を貫通し基材20に
到達するスルーホール穴23a、23cをドリルで複数
箇所穴開けした後、配線回路24形成部の全面及びスル
ーホール23a、23cの内壁を銅メッキする。次い
で、銅箔42及び銅メッキ層42aをエッチングしてボ
ンティング端子24a、配線回路24、外部接続用端子
24bを形成する(図4−C)。その後、基板中央部を
エンドミル等の切削工具を用いて機械加工し、ICチッ
プ10搭載収納用の深さ0.3mmのキャビティ26を
形成する。さらに、ボンディング端子24aにワイヤボ
ンディング性を、外部接続用端子24bに半田付着性を
付与するため及び、前記工程で削り出したキャビティ2
6の酸化変色を防止するために金メッキを施し、次いで
該端子24a,24b及び、該キャビティ26を除き配
線回路24を保護被膜(ソルダーレジスト)29で外装
保護する。この後、必要に応じて該端子24aの外周部
にダム50を形成する。最後に、外部接続用端子24b
上に半田ボール28を形成して本発明のICパッケージ
基板を製造する(図4−d)。なお、製品によってはパ
ッケージ基板段階で半田ボール28を取り付けずに、I
Cチップを搭載した後に半田ボール28を取り付けるよ
うにしてもよい。又、半田ボール28の代わりに金バン
プ、ポリマーバンプ等を用いてもよい。
Next, after drilling a plurality of through holes 23a and 23c which penetrate the copper foil 42 and the electrically insulating coating 22 and reach the base material 20 at locations where connection with the ground circuit layer is to be made. Then, copper plating is applied to the entire surface of the wiring circuit 24 forming portion and the inner walls of the through holes 23a and 23c. Next, the copper foil 42 and the copper plating layer 42a are etched to form the bonding terminals 24a, the wiring circuit 24, and the external connection terminals 24b (FIG. 4C). Thereafter, the central portion of the substrate is machined using a cutting tool such as an end mill to form a cavity 26 having a depth of 0.3 mm for mounting and storing the IC chip 10. Further, in order to impart wire bonding properties to the bonding terminals 24a and solder adhesion properties to the external connection terminals 24b, and to form the cavities 2 cut out in the above process.
Then, gold plating is applied to prevent the oxidation and discoloration of No. 6, and then the wiring circuit 24 is externally protected with a protective coating (solder resist) 29 except for the terminals 24a and 24b and the cavity 26. Thereafter, a dam 50 is formed on the outer peripheral portion of the terminal 24a as necessary. Finally, the external connection terminal 24b
A solder ball 28 is formed thereon to manufacture an IC package substrate of the present invention (FIG. 4D). In some products, the solder balls 28 are not attached at the package substrate stage,
After the C chip is mounted, the solder ball 28 may be attached. Further, gold bumps, polymer bumps, or the like may be used instead of the solder balls 28.

【0013】上記実施例では基材20上に配線回路24
を形成する方法として、銅張り積層板を基材20上に熱
圧着することによって銅箔42を基材20上に貼着した
が、この代わりに電気的絶縁特性を有する材料を基材上
にコーティングする方法で電気的絶縁被膜を被着形成
し、この上にイオンプレーティング法、スパッタリング
法、メッキ法等で電気導体層を形成することも可能であ
る。
In the above embodiment, the wiring circuit 24
As a method of forming the copper foil, the copper foil 42 was stuck on the base material 20 by thermocompression bonding the copper-clad laminate onto the base material 20, but instead of this, a material having an electrical insulating property was placed on the base material. It is also possible to form an electrical insulating film by coating and then form an electrical conductor layer thereon by ion plating, sputtering, plating or the like.

【0014】図5はICパッケージ基板の第2実施例
で、キャビティ26の周縁部四辺を基材20の露出面3
2とし、この表面を全面又は部分的に金メッキしてIC
チップ用ボンディング端子32aとして基材20をグラ
ンド回路層又は電源供給回路層である基材20にスルー
ホール23aを用いずに接続する構造とするとともに、
該端子32aの外周部に配線回路24及び、該基材20
と該配線回路24とを電気的に接続するスルーホール2
3cを形成したICパッケージ基板である。このICパ
ッケージ基板においては基材20の露出面32を直接グ
ランド回路接続又は電源凹路接続用ボンディング端子3
2aとすることにより、配線回路24の引き回し本数を
減らすことができるとともに、ICチップ10のグラン
ド回路接続又は電源回路接続が容易に行えるというメリ
ットがある。
FIG. 5 shows a second embodiment of the IC package substrate.
2, this surface is entirely or partially gold-plated and IC
A structure in which the substrate 20 is connected to the ground circuit layer or the power supply circuit layer 20 without using the through holes 23a as the chip bonding terminals 32a,
The wiring circuit 24 and the base material 20 are provided on the outer peripheral portion of the terminal 32a.
Hole 2 for electrically connecting the wiring circuit 24 to the
This is an IC package substrate on which 3c is formed. In this IC package substrate, the exposed surface 32 of the substrate 20 is directly connected to the ground circuit connection or power supply concave circuit connection bonding terminal 3.
By setting it to 2a, the number of wiring circuits 24 can be reduced, and the ground circuit or the power supply circuit of the IC chip 10 can be easily connected.

【0015】図6はICパッケージ基板の第3実施例
で、キャビティ26の周縁部四辺を2重にとりまくよう
に、電気的絶縁層22a、22bを貫通するスルーホー
ル23a、23bでもって、それぞれグランド回路層で
ある基材20及び電源供給回路層である第1段の配線回
路層と接続されたグランド回路接続用及び電源供給回路
接続用ボンディング端子32a、32bを形成し、この
外周部に2層の配線回路24を電気的絶縁被膜22a、
22bを挟んで2段に形成したものである。このような
構成とすることにより、基材20をグランド回路層、配
線回路24の第1段を電源供給回路層、第2段を信号回
路層とすることができる。なお、反対に基材20を電源
供給回路層、第1段をグランド回路層とすることもでき
る。この実施例では、グランド回路接続用及び電源供給
回路接続用ボンディング端子32a、32bを、スルー
ホール23a,23bでそれぞれの配線回路層に接続す
る構造としたが、第3の実施例に示したように金メッキ
された基材20の露出面及び、第1段の配線回路の先端
部を、それぞれグランド回路接続用及び電源供給回路接
続用ボンディング端子としてもよい。
FIG. 6 shows a third embodiment of the IC package substrate, in which through holes 23a and 23b penetrating through the electrically insulating layers 22a and 22b are provided so as to surround four sides of the peripheral portion of the cavity 26 doubly. Ground circuit connection and power supply circuit connection bonding terminals 32a and 32b connected to the substrate 20 as the circuit layer and the first wiring circuit layer as the power supply circuit layer are formed. Wiring circuit 24 is electrically insulating coating 22a,
22b are formed in two steps. With such a configuration, the base 20 can be a ground circuit layer, the first stage of the wiring circuit 24 can be a power supply circuit layer, and the second stage can be a signal circuit layer. Conversely, the substrate 20 may be a power supply circuit layer, and the first stage may be a ground circuit layer. In this embodiment, the bonding terminals 32a and 32b for connecting the ground circuit and the power supply circuit are connected to the respective wiring circuit layers through the through holes 23a and 23b. However, as shown in the third embodiment. The exposed surface of the base material 20 and the leading end of the first-stage wiring circuit may be used as bonding terminals for ground circuit connection and power supply circuit connection, respectively.

【0016】このように配線回路24を多層形成したI
Cパッケージ基板において外部接続端子24bの上に半
田ボール28を形成する場合は、通常表面層でスルーホ
ール23bから外れた部位の配線回路24上に接合形成
するが、本実施例のICパッケージ基板では電気的絶縁
被膜をきわめて薄く形成できるため、ブラインドスルー
ホールの直上に半田ボールを形成することが可能であ
る。又、各配線回路層間の電気的接続は該配線回路24
及び電気的絶縁被膜22をドリルによる機械加工又は、
レーザ加工によって穴開け貫通した後、その内壁を銅メ
ッキすることによって形成したスルーホール23b、2
3cでもって行う。
In this way, the wiring circuit 24 is formed in a multilayer
When the solder balls 28 are formed on the external connection terminals 24b in the C package substrate, the solder balls 28 are usually formed on the wiring circuit 24 at a position outside the through hole 23b in the surface layer. However, in the IC package substrate of this embodiment, Since the electrically insulating coating can be formed extremely thin, it is possible to form a solder ball immediately above the blind through hole. The electrical connection between the wiring circuit layers is made by the wiring circuit 24.
And machining the electrical insulation coating 22 with a drill or
After drilling and penetrating by laser processing, through holes 23b, 2
3c.

【0017】以上の実施例では、基材20の片面にのみ
電気的絶縁被膜22を被着形成したICパッケージ基板
を説明したが、この場合電気的絶縁被膜22を基材20
に熱圧着又は、接着キュアして被着形成する際、その熱
収縮によって基材20が引っ張られて曲がるおそれがあ
る。このためその反対面の全部又は一部に電気的絶縁被
膜を同様に被着形成することによって、この引っ張りに
よる曲げ応力を互いに打ち消しあってより形状精度に優
れたICパッケージ基板が得られるという効果がある。
In the above embodiment, the IC package substrate in which the electric insulating film 22 is formed only on one side of the substrate 20 has been described.
When the substrate 20 is adhered and formed by thermocompression bonding or adhesive curing, the substrate 20 may be pulled and bent by the heat shrinkage. For this reason, by forming an electrical insulating coating on all or a part of the opposite surface in the same manner, the bending stress due to the tension is canceled out by each other, so that an IC package substrate having more excellent shape accuracy can be obtained. is there.

【0018】以上、本発明に係る実施例を説明したが、
さらに配線回路24が形成された基材20と反対側の表
面に放熱フィンを取り付けることによって、熱放散性を
さらに高めることができる。又、ICチップを搭載収納
するキャビティを形成する方法として、超音波加工、放
電加工によって行ってもよい。
The embodiment according to the present invention has been described above.
Further, by disposing the radiation fins on the surface opposite to the base material 20 on which the wiring circuit 24 is formed, the heat dissipation can be further enhanced. Also, as a method of forming a cavity for mounting and storing an IC chip, ultrasonic processing or electric discharge processing may be used.

【0019】[0019]

【発明の効果】本発明に係るICパッケージ基板は、基
材に銅又は銅合金板を用いこの表面に電気的絶縁被膜を
介して配線回路を被着形成するとともに、この配線回路
と基材とをスルーホールで電気的に接続して、該基材を
グランド回路層又は電源供給回路層とすることにより、
熱放散性、電気的特性、電気接続の信頼性、形状精度、
耐湿性、封止性に優れ、ICチップを搭載収納するキャ
ビティを有する構造の製品を低コストで提供することが
でき、かつ又、このICパッケージ基板の配線回路を多
層に形成した信頼性の高い製品を精度良く容易に製造す
ることが可能になる。
According to the IC package substrate of the present invention, a copper or copper alloy plate is used as a base material, and a wiring circuit is formed on the surface of the IC package substrate via an electrical insulating film. Are electrically connected by through holes, and the base material is used as a ground circuit layer or a power supply circuit layer,
Heat dissipation, electrical characteristics, reliability of electrical connection, shape accuracy,
It is possible to provide at low cost a product having excellent moisture resistance and sealing properties, and having a structure having a cavity for accommodating and mounting an IC chip. In addition, a highly reliable wiring circuit of the IC package substrate is formed in multiple layers. Products can be manufactured easily with good accuracy.

【0020】[0020]

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るICパッケージ基板及びICパッ
ケージの構成を示す断面図である。
FIG. 1 is a cross-sectional view showing a configuration of an IC package substrate and an IC package according to the present invention.

【図2】基材上に形成する電気的絶縁被膜及び配線回路
の構成を示す説明図である。
FIG. 2 is an explanatory diagram showing a configuration of an electrical insulating film and a wiring circuit formed on a base material.

【図3】ICチップを搭載収納するためのキャビティ及
び配線回路等の平面配置を示す説明図である。
FIG. 3 is an explanatory view showing a planar arrangement of a cavity for mounting and housing an IC chip, a wiring circuit, and the like.

【図4】ICパッケージの製造方法の一実施例を示す説
明図である。
FIG. 4 is an explanatory view showing one embodiment of a method of manufacturing an IC package.

【図5】ICパッケージ基板の第2の実施例を示す説明
図である。
FIG. 5 is an explanatory view showing a second embodiment of the IC package substrate.

【図6】ICパッケージ基板の第3の実施例を示す説明
図である。
FIG. 6 is an explanatory diagram showing a third embodiment of the IC package substrate.

【図7】アルミニューム板を基材とした従来のICパッ
ケージ基板及びICパッケージを示す説明図である。
FIG. 7 is an explanatory view showing a conventional IC package substrate and an IC package using an aluminum plate as a base material.

【図8】銅系金属板を基材としこれを絞り加工して製造
されるICパッケージ基板及びICパッケージを示す説
明図である。
FIG. 8 is an explanatory view showing an IC package substrate and an IC package manufactured by drawing a copper-based metal plate as a base material and drawing the same.

【符号の説明】[Explanation of symbols]

10 ICチップ 20 基材 22 電気的絶縁被膜 23aスルーホール 23bスルーホール 23cスルーホール 24 配線回路 24aボンディング端子 24b外部接続用端子 26 キャビティ 28 半田ボール 29 保護被膜(ソルダーレジスト) 30 接合面 32 露出面 32aグランド回路接続用又は電源供給回路接続用ボン
ディング端子 32bグランド回路接続用又は電源供給回路接続用ボン
ディング端子 42 銅箔 50 ダム
DESCRIPTION OF SYMBOLS 10 IC chip 20 Base material 22 Electrical insulating film 23a through hole 23b through hole 23c through hole 24 Wiring circuit 24a bonding terminal 24b external connection terminal 26 cavity 28 solder ball 29 protective film (solder resist) 30 bonding surface 32 exposed surface 32a Bonding terminal for ground circuit connection or power supply circuit connection 32b Bonding terminal for ground circuit connection or power supply circuit connection 42 Copper foil 50 dam

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】正方形又は矩形形状を有する板状の銅又は
銅合金基材の中央部に、機械加工で形成されたICチッ
プを搭載収納するためのキャビティを有し、該キャビテ
ィの外周辺部表面に電気的絶縁被膜を被着した上に該I
Cチップの端子と電気的接続をとるための複数のボンデ
ィング端子並びにこれにつながる配線回路及び、外部の
実装基板と電気的接続を行うために該配線回路につなが
る複数の外部接続用端子又はこの上に金属ボールを形成
配置し、さらに該ボンディング端子及び外部接続用端子
又は該金属ボールを除いて保護被膜(ソルダーレジス
ト)を被着外装すると共に、該電気的絶縁層を貫通して
該銅又は銅合金基材に接続するスルーホールを介して該
配線回路及び該外部接続用端子を電気的に接続してグラ
ンド回路層又は、電源供給回路層を形成したことを特徴
とする熱放散性及び、電気的特性、電気的接続の信頼性
に優れるICパッケージ基板。
A cavity for accommodating an IC chip formed by machining in a central portion of a plate-like copper or copper alloy substrate having a square or rectangular shape, and an outer peripheral portion of the cavity. After applying an electrically insulating coating on the surface,
A plurality of bonding terminals for making electrical connection with the terminals of the C chip and a wiring circuit connected thereto, and a plurality of external connection terminals connected to the wiring circuit for making an electrical connection with an external mounting substrate or a plurality of external connection terminals A metal ball is formed and arranged, and a protective coating (solder resist) is applied and covered except for the bonding terminal and the external connection terminal or the metal ball, and the copper or copper is penetrated through the electrical insulating layer. The wiring circuit and the external connection terminal are electrically connected to each other through through holes connected to the alloy base material to form a ground circuit layer or a power supply circuit layer. Package substrate with excellent electrical characteristics and electrical connection reliability.
【請求項2】前記の電気的絶縁被膜を貫通するスルーホ
ールでもってグランド回路層又は、電源供給回路層であ
る該銅又は銅合金基材に接続する回路に代えて、該キャ
ビティーの外縁表面をはちまき状に絶縁しないで該基材
面をそのまま露出するか、又は該外縁の4辺を浅く段差
加工して、これらの加工表面に直接グランド回路接続用
端子又は、電源供給回路接続用端子を形成したことを特
徴とする電気的特性及び電気的接続の信頼性に優れる請
求項1記載のICパッケージ基板。
2. An outer peripheral surface of the cavity instead of a circuit connected to the copper or copper alloy substrate which is a ground circuit layer or a power supply circuit layer by a through hole penetrating the electric insulating film. The base surface is exposed as it is without being insulated in the form of a tongue, or the four sides of the outer edge are subjected to shallow step processing, and a ground circuit connection terminal or a power supply circuit connection terminal is directly formed on these processed surfaces. 2. The IC package substrate according to claim 1, wherein the IC package substrate has excellent electrical characteristics and electrical connection reliability.
【請求項3】前記のグランド回路層又は電源供給回路層
を含め配線回路を3層以上の多層に形成したことを特徴
とする請求項1及び2記載のICパッケージ基板。
3. The IC package substrate according to claim 1, wherein wiring circuits including the ground circuit layer or the power supply circuit layer are formed in three or more layers.
【請求項4】前記のキャビティーが形成された面と反対
側の銅又は銅合金基材表面の全部又は一部に、電気的絶
縁被膜を被着形成したことを特徴とする形状精度に優れ
る請求項1、2及び3記載のICパッケージ基板。
4. An excellent shape accuracy characterized in that an electrically insulating coating is formed on all or a part of the surface of the copper or copper alloy base material opposite to the surface on which the cavity is formed. The IC package substrate according to claim 1, 2 or 3.
【請求項5】前記のボンディング端子の外側を取囲むよ
うにダムを設置し、前記のキャビティに樹脂材料を注入
して該キャビティに接着搭載されたICチップを封止す
る際、該樹脂材料の流れ止めとし、ICパッケージの厚
さを薄くできる構造としたことを特徴とする請求項1、
2、3及び4記載のICパッケージ基板。
5. A dam is provided so as to surround the outside of the bonding terminal, and a resin material is injected into the cavity to seal an IC chip bonded and mounted in the cavity. 2. The structure as claimed in claim 1, wherein the structure is a flow stop, and the thickness of the IC package can be reduced.
5. The IC package substrate according to 2, 3, and 4.
【請求項6】請求項1、2、3、4及び5記載のICパ
ッケージ基板の中央部に形成された該キャビティにIC
チップを接着搭載し、このICチップの端子と該ICパ
ッケージ基板上のボンディング端子とをボンディングワ
イヤーでボンディング接続した後、該キャビティに樹脂
材料を注入して該ICチップ、該ワイヤー及び該ボンデ
ィング端子を封止してなる熱放散性、電気的特性及び電
気接続の信頼性に優れるICパッケージ。
6. The IC package according to claim 1, 2, 3, 4 or 5, wherein the IC is provided in the cavity formed in the center of the IC package substrate.
After the chip is bonded and mounted, the terminals of the IC chip and the bonding terminals on the IC package substrate are connected by bonding wires, and then a resin material is injected into the cavity to connect the IC chip, the wires and the bonding terminals. Sealed IC package with excellent heat dissipation, electrical characteristics and electrical connection reliability.
JP9126194A 1997-04-09 1997-04-09 Highly heat dissipating ic package substrate Pending JPH10284642A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9126194A JPH10284642A (en) 1997-04-09 1997-04-09 Highly heat dissipating ic package substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9126194A JPH10284642A (en) 1997-04-09 1997-04-09 Highly heat dissipating ic package substrate

Publications (1)

Publication Number Publication Date
JPH10284642A true JPH10284642A (en) 1998-10-23

Family

ID=14929034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9126194A Pending JPH10284642A (en) 1997-04-09 1997-04-09 Highly heat dissipating ic package substrate

Country Status (1)

Country Link
JP (1) JPH10284642A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101311707B1 (en) * 2013-03-26 2013-09-25 주식회사 심텍 Die stack package and method for fabricating the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101311707B1 (en) * 2013-03-26 2013-09-25 주식회사 심텍 Die stack package and method for fabricating the same

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