JPH0329829A - semiconductor pressure transducer - Google Patents
semiconductor pressure transducerInfo
- Publication number
- JPH0329829A JPH0329829A JP16498689A JP16498689A JPH0329829A JP H0329829 A JPH0329829 A JP H0329829A JP 16498689 A JP16498689 A JP 16498689A JP 16498689 A JP16498689 A JP 16498689A JP H0329829 A JPH0329829 A JP H0329829A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- pedestal
- silicon
- pressure transducer
- semiconductor pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 15
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 22
- 229910052710 silicon Inorganic materials 0.000 claims description 22
- 239000010703 silicon Substances 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 9
- 230000006355 external stress Effects 0.000 description 6
- 230000008646 thermal stress Effects 0.000 description 5
- 238000009530 blood pressure measurement Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000008642 heat stress Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は自動車をはじめ広い産業分野にて圧力の検出ま
たは測定に用いられる圧力変換器、特に、シリコン感圧
ダイアフラムチップを金属容器内に封入してなる半導体
圧力変換器のシリコン感圧ダイアフラムチソプの台座の
材料構成に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a pressure transducer used for detecting or measuring pressure in a wide range of industrial fields including automobiles, and in particular, to a pressure transducer in which a silicon pressure-sensitive diaphragm chip is sealed in a metal container. The present invention relates to a material structure of a pedestal for a silicon pressure-sensitive diaphragm of a semiconductor pressure transducer.
半導体圧力変換器の一般的な基本構造としては、シリコ
ン感圧ダイアフラムチップを等しい熱膨脹係数をもつ、
例えば、シリコンからなる台座を介して容器に接合する
方法がとられている。これはチップを支持する台座とチ
ップとの間の熱膨脹係数の差によるストレス(以下熱ス
トレスと称する)がダイアフラムを変形させて、あたか
も測定圧力によるダイアフラムの変形と同等の結果を生
じるのを防ぐためである.第3図は熱膨脹係数の等しい
シリ,コンからなる台座を用いた従来の半導体圧力変換
器の構造の一例で、シリコン感圧ダイアフラムチップ1
は被測定圧力導入孔8aを有するシリコンからなる台座
8の上部にはんだ4により接合される。この台座8は被
測定圧力を導入する導圧パイプ3の上部に、同様、はん
だ4で接合される.導圧パイブ3の材料は前述の理由に
より熱膨脹係数が台座に近いことが望ましく、例えば、
re−Ni系の合金等が使用される。シリコン感圧ダイ
アフラムチップ1は容器蓋部5を容器底部6に溶接等で
接合することにより外部より保護されている。The general basic structure of a semiconductor pressure transducer is a silicon pressure-sensitive diaphragm chip with an equal coefficient of thermal expansion.
For example, a method of bonding to a container via a pedestal made of silicon has been used. This is to prevent stress due to the difference in thermal expansion coefficient between the chip and the pedestal that supports the chip (hereinafter referred to as thermal stress) from deforming the diaphragm, resulting in the same result as deforming the diaphragm due to measurement pressure. It is. Figure 3 shows an example of the structure of a conventional semiconductor pressure transducer using a pedestal made of silicon and silicon, which have the same coefficient of thermal expansion.
is joined by solder 4 to the upper part of a pedestal 8 made of silicon and having a pressure to be measured introduction hole 8a. This pedestal 8 is similarly joined with solder 4 to the upper part of the pressure guiding pipe 3 through which the pressure to be measured is introduced. For the reasons mentioned above, it is desirable that the material of the pressure guiding pipe 3 has a coefficient of thermal expansion close to that of the pedestal, for example,
A re-Ni alloy or the like is used. The silicon pressure-sensitive diaphragm chip 1 is protected from the outside by joining a container lid 5 to a container bottom 6 by welding or the like.
容器蓋部5と容器底部6により形威される空間部7は圧
力測定または検出の用途によって、即ち絶対圧測定か相
対圧測定かによって密閉,開放の両方式がとられる。絶
対圧測定には、空間部7を基準の圧力室とし、真空また
は所定の圧力に図外の手段により保ち気密に封じる。相
対圧の測定には、例えば、容器蓋部5に孔を明け空間部
7を大気開放とする。シリコン感圧ダイアフラムチソプ
1の出力信号は図外の気密貫通端子で容器の外部に取り
出す。The space 7 formed by the container lid 5 and the container bottom 6 can be either closed or open depending on the purpose of pressure measurement or detection, ie whether absolute pressure measurement or relative pressure measurement. For absolute pressure measurement, the space 7 is used as a reference pressure chamber, which is maintained at a vacuum or a predetermined pressure by means not shown and hermetically sealed. To measure the relative pressure, for example, a hole is made in the container lid 5 and the space 7 is opened to the atmosphere. The output signal of the silicon pressure sensitive diaphragm 1 is taken out to the outside of the container through an airtight through terminal (not shown).
前述の半導体圧力変換器においては、熱ストレス緩和の
ため、シリコン感圧ダイアフラムチソプと同じ材質のシ
リコンからなる台座を用い、この台座は熱膨脹係数の近
いFe−Ni系合金等の導圧パイプに接合するようにし
ている。しかし、このシリコンからなる台座と導圧バイ
ブとの間の熱ストレスは、前述のように、導圧バイブに
シリコンの熱膨脹係数に近いFe−Ni系合金を用いて
も、金属の熱膨脹係数とシリコンのそれとを完全に一致
させることは困難で熱ストレスが生じる。この熱ストレ
スのため通常生じる比較的低い外部応力でこの台座に破
断が発生する問題があった。In the aforementioned semiconductor pressure transducer, in order to alleviate thermal stress, a pedestal made of silicon, which is the same material as the silicon pressure-sensitive diaphragm, is used. I'm trying to connect it. However, as mentioned above, the thermal stress between the pedestal made of silicon and the pressure vibrator is caused by the thermal expansion coefficient of the metal and the silicon It is difficult to completely match that of the temperature and heat stress occurs. Due to this thermal stress, there is a problem in that the pedestal breaks due to the relatively low external stress that normally occurs.
本発明の課題は前述のような熱ストレスが生じても、通
常生じる比較的低い外部応力では破断することのない強
度の高いシリコンからなる台座を提供することにある。An object of the present invention is to provide a pedestal made of high-strength silicon that will not break under the relatively low external stress that normally occurs even if the thermal stress described above occurs.
前述の課題を解決するために、本発明のシリコン感圧ダ
イアフラムチソブに被測定圧力を供給する導圧バイブが
貫通して取り付けられた容器底部と、容器蓋部とが気密
接合されて構成される金属容器内に、圧力導入孔を有す
る台座をかいして前記導圧パイプに接合されたシリコン
感圧ダイアフラムチソプを封入してなる半導体圧力変換
器においては、前記台座はその接合面の面方位が(10
0)の単結晶シリコンからなるようにする。In order to solve the above-mentioned problems, the bottom of the container through which the pressure vibrator for supplying the pressure to be measured is attached to the silicon pressure-sensitive diaphragm of the present invention is attached, and the lid of the container are hermetically connected. In a semiconductor pressure transducer, a silicon pressure-sensitive diaphragm tysop is enclosed in a metal container which is connected to the pressure guiding pipe through a pedestal having a pressure introduction hole, and the pedestal has a joint surface of the pedestal. The direction is (10
0) single crystal silicon.
本発明の半導体圧力変換器においては、台座に単結晶シ
リコンを使用し、この台座と導圧バイプとの接合面の面
方位ガ(100)であるようにしたので、その破断強度
は第2図に示すように他の面方位、例えば(111),
(110)に対して、おのおの12%34%高まる。In the semiconductor pressure transducer of the present invention, single-crystal silicon is used for the pedestal, and the plane orientation of the joint surface between the pedestal and the pressure-conducting pipe is ga (100), so its breaking strength is shown in Figure 2. Other plane orientations, such as (111), as shown in
(110), increases by 12% and 34%, respectively.
これによって外部応力に対して強度の高いシリコンから
なる台座が得られる。As a result, a pedestal made of silicon with high strength against external stress can be obtained.
第1図は本発明の半導体圧力変換器の一実施例の断面図
であり、シリコン感圧ダイアフラムチ・ノプlは被測定
圧力導入孔2aを有する単結晶シリコンからなる台座2
の上部にはんだ4により接合される。この台座2は被測
定圧力を導入する導圧バイプ3の上部に、同様、はんだ
4で接合される。FIG. 1 is a cross-sectional view of one embodiment of the semiconductor pressure transducer of the present invention, in which a silicon pressure-sensitive diaphragm tip 1 has a pedestal 2 made of single-crystal silicon having a measurement target pressure introduction hole 2a.
It is joined to the upper part of the board with solder 4. This pedestal 2 is similarly joined with solder 4 to the upper part of a pressure guiding pipe 3 through which the pressure to be measured is introduced.
導圧パイプ3の材料は前述の理由により熱膨脹係数が台
座に近いことが望ましく、例えば、Fe−Nl系の合金
等が使用される。ここで前記の単結晶シリコンからなる
台座2は、この台座と導圧パイプ3との接合面の面方位
を(100)としてある。For the reasons mentioned above, it is desirable that the material of the pressure guiding pipe 3 has a coefficient of thermal expansion close to that of the pedestal, and for example, a Fe--Nl alloy or the like is used. Here, in the pedestal 2 made of single crystal silicon, the plane orientation of the joint surface between the pedestal and the pressure guiding pipe 3 is (100).
第2図は、単結晶シリコンの各面方位に対する押し倒し
試験による破断強度を示し、面方位(100)は面方位
(111)に比して12%,面方位(110)に対して
34%高まることを示している。従って、接合面を面方
位(100)とした単結晶シリコンからなる台座を備え
る本発明の半導体圧力変換器は、この破断強度に比例し
て外部応力に耐えることができる。Figure 2 shows the breaking strength of single-crystal silicon in a push-down test for each plane orientation, with the (100) plane increasing by 12% compared to the (111) plane, and 34% higher than the (110) plane. It is shown that. Therefore, the semiconductor pressure transducer of the present invention, which includes a pedestal made of single-crystal silicon with the bonding surface oriented (100), can withstand external stress in proportion to this breaking strength.
なお、容器蓋部5,容器底部6,空間部7の構造と機能
は第3図に示す半導体圧力変換器と同様である。The structure and function of the container lid 5, container bottom 6, and space 7 are similar to those of the semiconductor pressure transducer shown in FIG.
本発明の半導体圧力変換器においては、台座に接着面の
面方位(100)の単結晶シリコンを用いたので、他の
面方位の台座を使用する半導体圧力変換器に比して、単
結晶シリコンの破断強度に応じて面方位(111)を用
いるものに対しては12%,面方位(110)を用いる
ものに対しては34%外部応力に対して強度の高いもの
が得られ、通常生じる比較的低い外部応力では台座が破
断ずることがなくなった。In the semiconductor pressure transducer of the present invention, since the pedestal is made of single-crystal silicon with the plane orientation of the adhesive surface (100), the single-crystal silicon According to the fracture strength of 12% for those using plane orientation (111), and 34% for those using plane orientation (110), high strength against external stress is obtained, which usually occurs. The pedestal no longer breaks or shifts under relatively low external stress.
第1図は本発明の半導体圧力変換器の一実施例の断面図
、第2図は単結晶シリコンの面方位一破断強度図、第3
図、は従来の半導体圧力変換器の一例の断面図である.
1:シリコン感圧ダイアフラムチンプ
2:台座〔面方位(100)の単結晶シリコンからなる
)
2a:圧力導入孔
3:s圧パイプ
5:容器蓋部
−7−
惇實V¥碇FIG. 1 is a cross-sectional view of an embodiment of the semiconductor pressure transducer of the present invention, FIG.
Figure 2 is a cross-sectional view of an example of a conventional semiconductor pressure transducer. 1: Silicon pressure sensitive diaphragm chimp 2: Pedestal [made of single crystal silicon with plane orientation (100)] 2a: Pressure introduction hole 3: S pressure pipe 5: Container lid part -7- Atsushi V\Anchor
Claims (1)
給する導圧パイプが貫通して取り付けられた容器底部と
、容器蓋部とが気密接合されて構成される金属容器内に
、圧力導入孔を有する台座を介して前記導圧パイプに接
合されたシリコン感圧ダイアフラムチップを封入してな
る半導体圧力変換器において、 前記台座はその接合面の面方位が(100)の単結晶シ
リコンからなることを特徴とする半導体圧力変換器。[Scope of Claims] 1) In a metal container configured by airtightly joining a container bottom and a container lid, through which a pressure guiding pipe for supplying measured pressure to a silicon pressure-sensitive diaphragm chip is attached. , a semiconductor pressure transducer including a silicon pressure-sensitive diaphragm chip bonded to the pressure guiding pipe via a pedestal having a pressure introduction hole, wherein the pedestal is a single crystal whose bonding surface has a plane orientation of (100). A semiconductor pressure transducer characterized by being made of silicon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16498689A JPH0329829A (en) | 1989-06-27 | 1989-06-27 | semiconductor pressure transducer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16498689A JPH0329829A (en) | 1989-06-27 | 1989-06-27 | semiconductor pressure transducer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0329829A true JPH0329829A (en) | 1991-02-07 |
Family
ID=15803662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16498689A Pending JPH0329829A (en) | 1989-06-27 | 1989-06-27 | semiconductor pressure transducer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0329829A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001304997A (en) * | 2000-04-27 | 2001-10-31 | Toyota Central Res & Dev Lab Inc | Semiconductor pressure sensor |
JP2008051820A (en) * | 2007-09-26 | 2008-03-06 | Toyota Central R&D Labs Inc | Semiconductor device |
EP2411781A1 (en) * | 2009-03-26 | 2012-02-01 | Endress+Hauser GmbH+Co. KG | Pressure sensor |
JP2021025966A (en) * | 2019-08-08 | 2021-02-22 | ローム株式会社 | MEMS sensor |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55119031A (en) * | 1979-03-08 | 1980-09-12 | Nippon Denso Co Ltd | Piezoelectric converter |
JPS58102123A (en) * | 1981-12-15 | 1983-06-17 | Toshiba Corp | Semiconductor pressure sensor |
JPS59154075A (en) * | 1983-02-22 | 1984-09-03 | Nec Corp | Semiconductor pressure sensor |
JPS61214583A (en) * | 1985-03-20 | 1986-09-24 | Hitachi Ltd | Semiconductor pressure converter |
-
1989
- 1989-06-27 JP JP16498689A patent/JPH0329829A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55119031A (en) * | 1979-03-08 | 1980-09-12 | Nippon Denso Co Ltd | Piezoelectric converter |
JPS58102123A (en) * | 1981-12-15 | 1983-06-17 | Toshiba Corp | Semiconductor pressure sensor |
JPS59154075A (en) * | 1983-02-22 | 1984-09-03 | Nec Corp | Semiconductor pressure sensor |
JPS61214583A (en) * | 1985-03-20 | 1986-09-24 | Hitachi Ltd | Semiconductor pressure converter |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001304997A (en) * | 2000-04-27 | 2001-10-31 | Toyota Central Res & Dev Lab Inc | Semiconductor pressure sensor |
JP2008051820A (en) * | 2007-09-26 | 2008-03-06 | Toyota Central R&D Labs Inc | Semiconductor device |
EP2411781A1 (en) * | 2009-03-26 | 2012-02-01 | Endress+Hauser GmbH+Co. KG | Pressure sensor |
US8794077B2 (en) | 2009-03-26 | 2014-08-05 | Endress + Hauser Gmbh + Co. Kg | Pressure sensor |
JP2021025966A (en) * | 2019-08-08 | 2021-02-22 | ローム株式会社 | MEMS sensor |
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