JPH03174148A - Image forming method - Google Patents

Abstract

PURPOSE:To enhance the quality of a negative character image obtained by superimposed contact work in light sensitive material for contact work by incorporating a redox compound to be allowed to release a development inhibitor by being oxidized in at least one of an emulsion layer and other hydrophilic colloidal layers and imagewise exposing the photosensitive material having a gamma value of >=10.0 to light substantially not containing <=370nm wavelength light. CONSTITUTION:The silver halide photographic sensitive material to be used in the light room is provided on a support with at least one of photosensitive silver halide emulsion layers and contains the redox compound to be allowed to release the development inhibitor by undergoing oxidation in at least one of the emulsion layer and the other hydrophilic colloidal layers. This photosensitive material has a gamma value of >=10.0 and it is imagewise exposed to the light substantially not having light of <=370nm wavelengths. The gamma is defined by expression I, thus permitting the quality of negative character image in the superimposed contact work in light sensitive material for contact work to be obtained.

Description

Detailed Description of the Invention (Industrial Field of Application) The present invention is directed to the use of photosensitive materials, particularly photosensitive materials for light room use that can be handled in an environment that can be substantially called a bright room in the process of photolithography. This paper relates to an image forming method.

(Prior Art) In the field of printing reproduction, there is a need to improve the efficiency of the photolithography process in order to cope with the diversity and complexity of printed matter.

Particularly in the collection and reversing processes, efforts have been made to improve work efficiency by performing the work in a brighter environment, and for this reason it is necessary to work in an environment that can essentially be called a bright room. Progress has been made in the development of photosensitive materials for plate making and exposure printers that can be used for printing.

The photosensitive material for bright room use described in this patent refers to a photosensitive material that can safely use light having a wavelength of 400 nm or more, which does not contain an ultraviolet light component, as safelight light for a long period of time.

The photosensitive material for bright room use used in the collection and reversing processes uses a developed film on which characters or halftone images have been formed as an original, and the original and the photosensitive material for reversing are closely combined.
It is a photosensitive material that is used to perform negative image/positive copy conversion or positive image/positive image conversion by exposure to light; , have the ability to perform negative image/positive image conversion according to the character image ■ Toe 7i1 of halftone image
There has been a demand for a single section property and the ability to adjust the line width of character line images, and photosensitive materials for bright room reversing have been provided to meet these demands.

However, in the advanced image conversion work of forming cut-out character images by overlapping and repeating, the conventional method using a bright room reversing process using a light-sensitive material for use in a bright room is not suitable for the conventional method using a darkroom reversing process using a conventional reversing photosensitive material for darkrooms. Compared to other methods, this method has the disadvantage that the quality of the extracted character image deteriorates.

To explain in more detail the method of forming cut-out character images by overlapping, as shown in Figure 1, transparent or anti-transparent pasting bases (A) and (C) (polyethylene terephthalate usually having a thickness of about 100 μm) are used. (U) film with characters or line images formed (line drawing original) (U) and film with halftone dot images (halftone original) (D)
The halftone dot original (d) is placed on top of the pasted one to form an original, and the emulsion side of the return photosensitive material 0) is brought into close contact with the halftone original (d) for exposure.

After exposure, a development process is performed to form blank white portions of line drawings in the halftone image.

The important points in this method of forming a character image are:
Ideally, negative image/positive image conversion is performed according to the dot product and image line of each halftone dot original and line drawing original. However, as is clear from Figure 1, halftone originals are exposed in direct contact with the emulsion surface of the photosensitive material for return, whereas line drawing originals are exposed using a pasting base (C) and a halftone original (secondary). > is exposed to the photosensitive material for return through the intermediate layer.

For this reason, if you apply an exposure amount that faithfully converts a halftone original from a negative image to a positive image, the line drawing original will be exposed out of focus through the spacer created by the paste base (c) and the halftone original (d). The image line in the white blank area becomes narrower, which is the cause of the deterioration of the quality of the cut-out character image, but this phenomenon is caused not only by the photographic performance of the light-sensitive material, but also by
The exposure light source also makes a large contribution.

JP 62-80640, JP 62-235938,
No. 62-235939, No. 63-104046, No. 63-103235, and No. 63-296031 disclose that a photosensitive material containing a hydrazine derivative and having a gamma value of 10 or more is used with a wavelength of substantially 370 nm or less. Techniques have been disclosed to improve image quality through light-free exposure. On the other hand, JP-A Nos. 61-213847, 64-72140, 64-72144, 64-
No. 72139 discloses a silver halide photographic material containing a redox compound that releases a development inhibitor upon oxidation.

(Problems to be Solved by the Invention) It is an object of the present invention to provide an image forming method with excellent quality of cut-out character images by overlapping in a reverse light-sensitive material for bright room use that can be handled under safelight in a bright room. It is about providing.

(Means for Solving the Problems) The above-mentioned object of the present invention is to form an image by imagewise exposing a bright room silver halide photographic light-sensitive material having at least one light-sensitive silver halide emulsion layer on a support. In the method, at least one of the emulsion layers or other hydrophilic colloid layers
A photosensitive material containing a redox compound in the layer that releases a development inhibitor when oxidized and exhibiting a γ value of 10.0 or more is exposed to substantially no light of 370 nm or less. This was achieved by an image forming method in which a photosensitive layer is imagewise exposed.

(Here, T is defined as 3, 0-0. 3-3-1 exposure amount giving a layer density of 0.3) The redox compound of the present invention which can release a development inhibitor when oxidized will be explained. .

The redox group of the redox compound is preferably hydroquinones, catechols, naphthohydroquinones, aminophenols, pyrazolidones, hydrazines, hydroxylamines, and reductones, and more preferably hydrazines.

The hydrazines used as the redox compound capable of releasing a development inhibitor upon oxidation of the present invention preferably have the following general formula (R-1), general formula (R-2), and general formula (R-3). It is expressed as A compound represented by general formula (R-1) is particularly preferred.

General formula (R-1) R+ N-N-G, -(Time)t-PUC; A
I AI General formula (R-2) AIAs As General formula (R-3) In these formulas, R' represents an aliphatic group or aromatic group ○ 1 or -P- group, G8 is a simple bond, Gl −
R* represents 10--S- or -N-, and R8 represents a water atom or R3.

AI1Ax represents a hydrogen atom, an alkylsulfonyl group, an arylsulfonyl group or an acyl group, which may be substituted, and in the general formula (R-1) t', at least one of A1 and A8 is a hydrogen atom. A is synonymous with A1 or -C
IltcH→Time) represents z-PIG.

A4 A represents a nitro group, a cyano group, a carboxyl group, a sulfo group or 10t Gz-R+.

Time represents a divalent linking group, t represents 0 or l, and PUG represents a development inhibitor.

General formulas (R-1), (R-2), and (R-3) will be explained in more detail.

In general formulas (R-1), (R-2), (R-3),
R,? ! The aliphatic group represented preferably has 1 to 30 carbon atoms.
In particular, it is a straight chain, branched or cyclic alkyl group having 1 to 20 carbon atoms.

The branched alkyl group may be cyclized to form a saturated heterocycle containing one or more heteroatoms, and the alkyl group may be an aryl group, an alkoxy group, or , sulfoxy group, sulfonamide group,
It may have 21 groups such as a carbonate bulky group.

Y in general formulas (R-1), (R-2), and (R-3):
The aromatic group represented by R+ is a monocyclic or bicyclic aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with a monocyclic or bicyclic aryl group to form a heteroaryl group.

For example, benzene ring, naphthalene ring, pyridine ring, pyrimidine ring, imidazole ring, pyrazole ring, quinoline ring,
Examples include isoquinoline ring, benzimidazole ring, thiazole ring, and benzothiazole ring, among which those containing a benzene ring are preferred.

Particularly preferred as R is an aryl group.

The aryl group or unsaturated heterocyclic group of R3 may be substituted, and typical substituents include alkyl groups, aralkyl groups, alkenyl groups, alkynyl groups, alkoxy groups, aryl groups, group, ureido group, urethane group, aryloxy group, sulfamoyl group, carbamoyl group, alkylthio group, arylthio group, sulfonyl group, sulfinyl group, hydroxy group, halogen atom, cyano group, sulfo group, aryloxycarbonyl group,
Acyl group, alkoxycarbonyl group, acyloxy group,
Examples include carbonamide group, sulfonamide group, carboxyl group, phosphoric acid amide group, etc. Preferred substituents include linear, branched or cyclic alkyl group (preferably one having 1 to 20 carbon atoms), aralkyl group (preferably is a monocyclic or bicyclic alkyl moiety having 1 to 20 carbon atoms),
Alkoxy group (preferably one having 1 to 30 carbon atoms), substituted amino group (preferably a 7mino group substituted with 5F with an alkyl group having 1 to 30 carbon atoms), acylamino group (preferably one having 2 to 40 carbon atoms) ), sulfonamide groups (preferably those having 1 to 40 carbon atoms), ureido groups (preferably those having 1 to 40 carbon atoms), phosphoric acid amide groups (
Preferably, those having 1 to 40 carbon atoms are preferred.

For general formulas (R-1), (R-2), and (R-3), -C- group and -SO- group are preferable, and -0- group is most preferable.

A1 and Af are a hydrogen atom, an alkylsulfonyl group having 20 or less carbon atoms, an arylsulfonyl group (preferably a phenylsulfonyl group, or a sum of Hammett's WA constants -
0.5 or more), an acyl group having 20 or less carbon atoms (preferably a benzoyl group, or a phenylsulfonyl group substituted so that the sum of Hammett's substituent constants is -0.5 or more), a benzoyl group, or a linear, branched or cyclic unsubstituted and substituted aliphatic acyl group (substituents include, for example, a halogen atom, an ether group, a sulfonate group, a carbonamide group, a hydroxyl group, a carboxy group,
Examples include sulfonic acid groups. )) is preferred.

Hydrogen atoms are most preferred as At and Ax.

A is a hydrogen atom, -CH*-CH-fTise←
, PUG4 are most preferred.

In general formulas (R-1), (R-2), and (R-3), T
ime represents a divalent linking group, and timing! 1llll
It may have a ff function, and t represents O or l.

The divalent linking group represented by Time represents a group that releases PUG from Time-PUG released from the oxidized product of the redox mother nucleus through one or more reaction steps.

As the divalent linking group represented by Time, for example, U.S. Pat.
U.S. Pat. Those that release PUG by intramolecular ring closure reaction after ring opening as described in US Pat. No. 525, etc.; U.S. Pat.
No. 4,483,919, JP 59-121.328
U.S. Patent Nos. 4 and 4, which release PUG with the formation of an acid anhydride through intramolecular ring-opening repetition of the carboxyl group of succinic acid monoester or its 188 units described in US Patent Nos. 4 and 4.
No. 09,323, No. 4,421,845, Research
Disclosure magazine N1121, 228 (1981
), U.S. Patent No. 4,416,977 (Japanese Unexamined Patent Publication No. 135,944/1982), Japanese Patent Unexamined Publication No. 58-209゜73
No. 6, No. 58-209,738, etc., which generates quinomonomethane or its analogs by electron transfer via a double bond conjugated with an aryloxy group or a heterocyclic oxy group and releases PUG. ; U.S. Patent No. 4.42
0.554 (JP 57-136.640), JP 57-135.945, JP 57-188.035, JP 58-98,728 and JP 58-209,73
A nitrogen-containing heterocycle described in No. 7 etc. that releases PUG from the γ position of the enamine by electron transfer of the moiety having an enamine structure; PU is formed by an intramolecular ring-closing reaction of an oxy group generated by electron transfer to a carbonyl group conjugated with a nitrogen atom.
G-emitting; U.S. Patent No. 4.146.396 (
JP-A-52-90932), JP-A-59-93, 44
No. 2, JP-A-59-75475, JP-A-5O-249
148, JP-A-60-249149, etc., which release PUG with the production of aldehydes; JP-A-51-146.828, JP-A-57-179.842;
59-104.641, which releases PUG with decarboxylation of the carboxyl group, -0-GoOC
RllRh-PUG (R, R1 represents a monovalent group), which has a III structure and releases PUG with decarboxylation and subsequent generation of aldehydes; JP-A-60-7
．． PU with the formation of isocyanates as described in No. 429
Those that release G; examples include those that release PUG through a coupling reaction with an oxidized color developer described in US Pat. No. 4,438,193 and the like.

Time of general formulas (R-1), (R-2), (R-3)
The divalent group represented by is preferably represented by the following general formula (T-
1) is represented by general formula (T-6). In these, vehicle weight represents the site where Time binds to PUG.

* indicates the other bonding site according to the general formula (T-1), where W represents an oxygen atom, a sulfur atom or a -N-R0 group, R11 and Rlm represent a hydrogen atom or a substituent, and R4 represents a substituent. t represents 1 or Ro or 2, when t is 2, two -W-C-R4 represent the same or different things, when R51 and Ro represent a substituent, and when R13 represents Examples are R, 4tE, R,, CO- group, R,, SO,- group, respectively.
Examples thereof include R,, NC〇- group and 11RNSO,- group. Here, R0ts represents an aliphatic group, an aromatic group, or a heterocyclic group, and RIS
represents an aliphatic group, an aromatic group, a heterocyclic group or a hydrogen atom.

Each of Ro, Rlt and Rlm represents a divalent group, and cases in which they are linked to form a cyclic structure are also included.

Specific examples of the group represented by the general formula (TL) include the following groups.

General formula (T-2) *-Nu-L ink-E-moto* In the formula, Nu represents a nucleophilic group, an oxygen atom or a sulfur atom is an example of a nucleophilic species, and E is It represents an electrophilic group and is a toad that can cleave the bond with the mark ** upon receiving a nucleophilic attack from Nu.
nk represents a linking group that sterically relates Nu and E so that they can undergo an intramolecular nucleophilic substitution reaction, and is represented by the general formula (
Specific examples of the group represented by T-2) are as follows.

1,, +13 General Formula (T-3) In the formula, W, Rz, R4 and t have the same meanings as explained for (T-1), and specifically include the following groups.

^ut General formula (T-4) General formula (T-5) General formula (T-6) In the formula, W and Ro have the same meanings as explained in the general formula (T-1).

Specific examples of the group represented by general formula (T-6) include the following groups.

Umbrella-○+C-Umbrella Umbrella-5-C-'11m Also, as Time, general formula (T-1) ~ -General formula T-
A group formed by combining two or more groups represented by 6) is also useful. Preferred specific examples thereof are shown below: *, *
The ratio has the same meaning as in the case of general formulas (T-1) to -general formula T-6).

Umbrella-〇-CHI mHs / tRs Umbrella-〇-C0゜ iHs L C[l.

Skewer-0-C-O÷C1(t+-rN C-*Umbrella O
CII(s) For specific examples of these divalent linking groups represented by Time, see JP-A-61-236,549 and JP-A-64.
-88451, Japanese Patent Application No. 63-98.803, etc. are also described in detail.

PUG represents a group having a development inhibiting effect as (Time't PUG or PUG).

The development inhibitor represented by PUG or (Timee-, PUC; Su (C,!

! l:, Mess) and Chi H James (↑
,l.

``The Theory of the Photography 47 Process (The Th@ory of Ph
otographicProcesses) J 3rd edition, published by Macmillan in 1966,
It is described on pages 344 to 346. Specifically, mercaptotetrazoles, mercaptotriazoles, mercaptoimidazoles, mercaptopyrimidines, mercaptobenzimidazoles, mercaptobenzthiazoles, mercaptobenzoxazoles, mercaptothiadiazoles, benztriazoles, benzimidazoles, and indazoles. , adenines, guanines, tetrazoles, tetraazaindenes, triazaindenes, mercaptoarenes, and the like.

The development inhibitor represented by PUG may be substituted. Examples of substituents include the following:
These groups may be further substituted.

For example, alkyl groups, aralkyl groups, alkenyl groups, alkynyl groups, alkoxy groups, aryl groups, substituted atom groups,
Acylamino group, sulfonylamino group, ureido group, urethane group, aryloxy group, sulfamoyl group, carbamoyl group, alkylthio group, arylthio group, sulfonyl group, sulfinyl group, hydroxy group, halogen atom, cyano group, sulfo group , aryloxycarbonyl group, acyl group, alkoxycarbonyl group, acyloxy group, carbonamide group, sulfonamide group, carboxyl group, sulfoxy group, phosphono group, phosphinico group, phosphoric acid amide group, etc.

Preferred examples of the V& group include a nitro group, a sulfo group, a carboxyl group, a sulfamoyl group, a phosphono group, a phosphinico group, and a sulfonamido group.

The main development inhibitors are shown below.

(2) 1-(4-hydroxyphenyl)-5-mercaptotetrazole (3) 1-(4-aminophenyl)-5-mercaptotetrazole (4) 1-(4-carboxyphenyl)-5-mercaptotetrazole ( 5) 1-(4-=chlorophenyl)-5-mercaptotetrazole (6) 1-(4-methylphenyl)-5-mercaptotetrazole (711-(2,4-dihydroxyphenyl)-5-mercaptotetrazole (8) 1-(4-Sulfamoylphenyl)-5-mercaptotetrazole (9) 1-(3-carboxyphenyl)-5-mercaptotetrazole Of!i!-(3,5-dicarboxyphenyl)-5-
Mercaptotetrazole GO 1-(4-methoxyphenyl)-5-mercaptotetrazole (1-(2-methoxyphenyl)-5-mercaptotetrazole 113) 1-(4-(2-hydroxyethoxy)phenyl)-5-mercapto Tetrazole 114) 1-(
2,4-dichlorophenyl)-5-mercaptotetrazole 1115) 1-(4-dimethylaminophenyl)-5-
Mercaptotetrazole GO1-(4-nitrophenyl>-5-mercaptotetrazole (5) 1,4-bis(5-mercapto-1-tetrazolyl)benzene α 1-(α-naphthyl)-5-mercaptotetrazole Q!111 -(4-sulfophenyl)-5-mercaptotetrazole cls 1-(3-sulfophenyl)-5-mercaptotetrazole (21) 1-(β-naphthyl)-5-mercaptotetrazole (22) 1-methyl-5- Mercaptotetrazole (23) 1-ethyl-5-mercaptotetrazole (24) 1-propyl-5-mercaptotetrazole (25) 1-octyl-5-mercaptotetrazole (26) 1-dodecyl-5-mercaptotetrazole (27) l-Cyclohexyl-5-mercaptotetrazole (28) 1-palmityl-5-mercaptotetrazole (29) 1-carboxyethyl-5-mercaptotetrazole (30) 1-(2,2-jethoxyethyl)-5-mercaptotetrazole ( 31) l-(2-aminoethyl)-5-mercaptotetrazole hydrochloride (32) 1-(2-diethylaminoethyl)-5-mercaptotetrazole (33) 2-(5-mercapto-1-tetrazolyl)ethyltrimethyl Ammonium chloride (34) l-(3
-phenoxycarbonylphenyl)-5-mercaptotetrazole (35) 1-(3-maleinimidophenyl)-6-mercaptotetrazolecap azole- (1) 4-phenyl-3-mercaptotriazole)
4-phenyl-5-methyl-3-mercaptotriazole (314,5-diphenyl-3-mercaptotriazole (4) 4-(4-carboxyphenyl)-3-mercaptotriazole (5) 4-methyl-3-mercaptotriazole (6)
4-(2-dimethylaminoethyl)-3-mercaptotriazole (7) 4-(α-naphthyl)-3-mercaptotriazole (8) 4-(4-sulfophenyl)-3-mercaptotriazole (9) 4- (3-nitrophenyl)-3-mercaptotriazole (2) 1゜5-diphenyl-2-mercaptoimidazole (3) 1-(4-carboxyphenyl)-2-mercaptoimidazole (4) to 1-(4- (xylcarbamoyl)-2-mercaptoyazole (5) l-(3-nitrophenyl)-2-mercaptoimidazole (6) 1-(4-sulfophenyl)-2-mercaptoimidazole kabi midinthiouracil methylthiouracil Ethylthiouracilprobylthiouracilnonylthiouracil7notiouracilhydroxythiouracilmercaptobenzimidazole- (02-mercaptobenzimidazole (2) 5-carboxy-2-mercaptobenzimidazole C3) 5-amino-2-mercaptobenzimidazole Imidazole (4) 5-nitro-2-mercaptobenzimidazole (5) 5-chloro-2-mercaptobenzimidazole (6) 5-methoxy-2-mercaptobenzimidazole (7) 2-mercaptonaphthoimidazole (8) 2
-mercapto-5-sulfobenzimidazole (9) 1-(2-hydroxyethyl)-2-mercaptobenzimidazole GO) 5-caproamido-2-mercaptobenzimidazole (105-(2-ethylhexanoylamino)-2- Mercaptobenzimidazole Lucadyl (1) 5-methylthio-2-mercapto-1,3゜4-
Thiadiazole (2) 5-ethylthio-2-mercapto-1,3゜4
-Thiadiazole (3) 5-(2-dimethylaminoethylthio)-2-mercapto-1,3,4-thiadiazole-Jshik415-(2-carboxypropylthio)-2-mercapto-1,3,4- Thiadiazole (5) 2-phenoxycarbonylmethylthio-5-mercapto-1,3,
4-Thiadiazole 7 Mercap Benzthiazole (1) 2-mercaptobenzthiazole (2) 5-nitro-2-mercaptobenzthiazo-1-3) 5-carboxy-2-mercaptobenzthiazole 5-sulfo-2-mercaptobenz Thiazo (4) 8 Mercaptobenzoxazole (1) 2-mercaptobenzoxazole (2) 5-nitro-2-mercaptobenzoxazole (3) 5-carboxy-2-mercaptobenzoxazole (4) 5-Sulfo -2-mercaptobenzoxazoleben'zole 5.6-dimethylbenzotriazole 5-butylbenzotriazole 5-methylbenzotriazole 5-chlorobenzotriazole 5-bromobenzotriazole 5.6-dichlorobenzotriazole 4.6-dichlorobenzo Triazole 5-Nitrobenzotriazole 4-Nitro-6-chloro-benzotriazole 5.6-Trichlorobenzotriazole 0 5-carboxybenzotriazole (12+ 5-sulfobenzotriazole Na salt ■
5-methoxycarbonylbenzotriazole 5-aminobenzotriazole 5-butoxybenzotriazole 5-ureidobenzotriazole benzotriazole 5-phenoxycarbonylbenzotriazole 0! Il 5-(2,3-dichloropropyloxycarbonyl)benzotriazolebenzimi-rubenzioxazole 5-chlorobenzimidazole 5-nitrobenzimidazole 5-n-butylbenzimidazole 5-methylbenzimidazole 4-chlorobenzimidazole5. 6-dimethylbenzimidazole 5-nitro-2-(trifluoromethyl)benzimidazole inzole (1) 5-nitroindazole<2) 6-nitroindazole (3) 5-aminoindazole (4) 6-aξno Indazole (5) Indazole (6) 3-nitroindazole (7) 5-nitro-3-chlorointasole (8)
3-Chloro-5-nitrointasol (9) 3-
Carboxy-5-nitroindazole 1+Takuru (1) 5-(4-nitrophenyl)tetrazole (2)
5-phenyltetrazole (3) 5-(3-carboxyphenyl)-tetrazole-ene (1) 4-hydroxy-6-methyl-5-nitro1.
3,3a,7-thitraazaindene (2) 4-mercapto-6-methyl-5-nitro-1,3,3a,7-thitraazaindene mercabutor (1) 4-nitrothiophenol 0 thiophenol (3) 2-carboxythiophenol Also, in the general formulas (R-1), (R-2), and (R-3), R, or +Time)-%PUG contains an immobile compound such as a coupler. Ballast groups and general formulas (R-1), (R-2), (R-3
) may be incorporated with a group that promotes adsorption of the compound represented by () to silver halide.

The ballast group has the general formula (R-1), (R-2), (R-3
) is an organic group that provides a sufficient molecular weight to substantially prevent the compound represented by the formula from diffusing into other layers or into the processing solution, and includes an alkyl group, an aryl group, a heterocyclic group, an ether group, a thioether group, and an amide group. group, a ureido group, a urethane group, a sulfonamide group, etc. The ballast group is preferably a ballast group having a substituted benzene ring, particularly a ballast group having a benzene ring substituted with a branched alkyl group.

Specifically, the adsorption promoting group to silver halide is 4-
Thiazoline-2-thione, 4-imidacyline-2-thione, 2-thiohydantoin, rhodanine, thiobarbital acid, tetrazoline-5-thione, 1,2,4-) liazoline-3-thione, 1,3,4-oxazoline -2
Cyclic thioamide groups, linear thioamides such as -thione, benzimidacillin-2-thione, benzoxazoline-2-thione, benzothiazoline-2-thione, thiotriazine, 1.3-ia dacilin-2-thione. group, aliphatic mercapto group, aromatic mercapto group, heterocyclic mercapto group (if the carbon atom to which the -3R group is bonded is a nitrogen atom, it has the same meaning as a cyclic thioamide group which has a tautomeric relationship with this group) , specific examples of this group are the same as those listed above.

Groups with disulfide bonds, benzotriazole, triazole, tetrazole, indazole, nitrogen, oxygen, such as benzyodazole, imidazole, benzothiazole, thiazole, thiazoline, benzoxazole, oxazole, oxazoline, thiadiazole, oxathiazole, triazine, azaindene , a 5- or 6-membered nitrogen-containing heterocyclic group consisting of a combination of sulfur and carbon, and a quaternary heterocyclic salt such as benzimidazolinium.

These may be further substituted with suitable f substituents.

Examples of the f substituent include those described as the I substituent of R.

Specific examples of compounds used in the present invention are listed below, but the present invention is not limited thereto.

■ 7 ■ 8゜ ■ 9゜ u11 12° CJt (four I-21゜ l-22゜ NO! 1-25° 1-26° 1-27° 1-28° l-30° 1-31° 1-32° 1-33° τ−34° 1-36° 1-38° 1-39° 1-’4G.

1-42° ot 1-43° I-44゜ 1-45° 1-46° 1-47° -48° 1111 ■-49 0 No. N.

■-51 No. ■-52 ■-53 ■-34 NO2 NO8 ■-55 ■-56 -57 08 59 -60 ■-61 ■-62 3 ■ 4 ■-65 ■ 6! -67 ] 67 ■ 8 C&ll+3 ■ 9 ■ 0 The method for synthesizing the redox compound used in the present invention is described, for example, in JP-A-61-213.847 and JP-A-62-260,15.
No. 3, U.S. Patent No. 4,684,604, Patent Application No. 1983-
No. 98.803, U.S. Pat. No. 3,379,529, U.S. Pat. No. 3,620,746, U.S. Pat.
, No. 332,878, JP-A-49-129.536,
It is described in No. 56-153,336, No. 56-153,342, etc.

The redox compound of the present invention contains 1.0xlO-" to 5.0xlO-1-o1 per 111 moles of halogenation, preferably 1.Oxl'O-' to 1,0xlO-"
It is used within the range of mol/rrr.

The redox compounds of the present invention can be used in suitable water-miscible solvents such as alcohols (methanol, ethanol,
It can be used by dissolving it in ketones (acetone, methyl ethyl ketone), dimethyl formamide, dimethyl sulfoxide, methyl cellosolve, etc.

In addition, by the well-known emulsification dispersion method, dibutyl phthalate, tricresyl phosphate, glyceryl triacetate, or diethyl phthalate is dissolved in oil using an auxiliary solvent such as ethyl acetate or cyclohexanone, and mechanically emulsified. A dispersion can also be prepared and used. Alternatively, a powder of a redox compound can be dispersed in water using a Pall mill, a colloid mill, or an ultrasonic wave, using a method known as a solid dispersion method.

In the present invention, various known methods or systems can be used to form an image with gradation T of 10 or more.

For example, systems using silver halide photographic emulsions are known. A negative image is usually obtained in this system.

For example, a method in which a lithium-type silver halide sensitive material made of silver chlorobromide is processed with a hydroquinone developer (lithium developer) with an extremely low concentration of sulfite ions (less than 0°1 mol/l), that is, a lithium development system, is This is a well-known method.

In addition, the above lithium-type silver halide sensitive material was used in a hydroquinone developer, and the sulfite ion concentration was quite high (0.2 mol/f1 or more), but the pH was high (10.5 or more) and the developer contained a nitroindazole compound. A system that allows you to obtain high-contrast images by using
(disclosed in ) is also known. (Hereinafter, referred to as FSL development system.

Furthermore, there is a method of obtaining a high contrast last by processing a photosensitive material containing a tetrazolium compound with a PQ type or MQ type developer containing a relatively high concentration of sulfite. 2-/♂3/7 issue,
same! 3- / 77 / ri button and the same! No. 3-/7720. (Hereinafter referred to as tetrazolium high contrast development system.) Furthermore, hydrazine derivatives (for example, U.S. Patent U, /4
No. 6.7142, 14. /1,1', No. 977, same gu, ko 2/, Zayo 7, same gu, 22φ, gu O/, same u,
No. 2413.73P, same u, J7J, J06, same name,
As seen in Nos. 31/ and 71/, a surface latent image type silver halide photographic light-sensitive material to which a specific acylhydrazine compound (t) is added is treated with a sulfite preservative at I) H//, 0 to 12.3. There is also known a method fF (hereinafter referred to as hydrazine high contrast development system) for obtaining ultrahigh contrast negative images by processing with a solution containing t-0, /j mole/1 or more.

In addition, in order to make a light-sensitive material that can be practically handled in a bright room, inorganic desensitizers such as rhodium salts, iridium salts, and cupric chloride are added to extremely reduce the sensitivity of silver halide emulsions. A method of forming grains by adding an organic desensitizer such as pinacryptol yellow or phenosafranine to the emulsion, and a method of making the emulsion insensitive to the wavelength range of safelight light that is felt to be in a bright room. Another method includes a method in which a dye (safelight dye) that absorbs the long wavelength end of silver halide in that region is contained in the sensitive material.

It is preferable that these inorganic desensitizers be contained in an amount of io-6 mol 1 mol-Ag or more. Especially lo-6 to lO mol 1 mol-A g power 11. stomach.

Further, it is preferable that the organic desensitizer contains 10-'mol of 17 Ru Ag or more. Particularly preferred is lo-5 to 10-2 mol/mol-Ag.

For details on the method of brightening the room using these desensitizers, see Japanese Patent Application Laid-Open No. 11-1989/F09-G No. 3, ibid. Tah/! 7
No. 630, etc.

Also, as a method of brightening the room using dye, uoo-
This can be achieved by incorporating a dye having an extremely thick absorption in the photosensitive material into the photosensitive material. Special application for this method in 1962-2062! It is described in detail in issue r.

By combining these methods and the above-mentioned developing system, it is possible to realize a bright room light-sensitive material having an r of 10 or more, which is the object of the present invention.

Next, methods for "imagewise exposing the photosensitive layer with light that does not substantially contain light of J70 nm or less" include a method of incorporating an ultraviolet absorber into the photosensitive material, a method of using an optical filter that absorbs ultraviolet rays, Examples include a method using a light source that does not substantially emit light at a wavelength of 370 nm or less.

First, the first method will be explained.

Here, the ultraviolet absorber increases the inherent sensitivity of the silver halide emulsion by 2.
//The amount of ultraviolet absorber used is below, but as this ultraviolet absorber, an ultraviolet absorber having a peak at JOO~uoonm can be used, and more preferably, an ultraviolet absorber having a peak at 3θO~3r
It is an ultraviolet absorber having a peak at Onm.

As the ultraviolet absorber, for example, a benzotriazole compound substituted with an aryl group, a ψ-thiazolidone compound, a benzophenone compound, a cinnamic acid ester compound, a butadiene compound, a benzoxazole compound, and an ultraviolet absorbing polymer can be used.

Specific examples of ultraviolet absorbers can be found in U.S. Patent J,! 33°72
Gu issue, 3,3/gu, 7 Lipi issue, 3.3!2, bu 27
No., Japanese Patent Application Publication No. Sho←j-271ψ, U.S. Patent J, 70! ,
10! No. 3,707,371, No. 0111,
22 evening issue, same! ,700,1/-! ! No. J, ψ Tata, No. 762, West German Patent Application Publication/, j4 (7,143
It is written in the number etc.

Examples of compounds of the ultraviolet absorber of the present invention are shown below, but the present invention is not limited to these compounds.

S C) 3N a O 2 /3 H H H /μ /! 6 /7 H H /1 0 S Oa Na +22 3 1 2 yo 1 H (JCH3 67 Co2 H C4H, (t) 30 In the present invention, the ultraviolet absorber is the specific sensitivity of J&Onm's silver halide emulsion. It is added so as to make the f/72 or less, and the amount added is such that the absorbance at 3·AOnm is 0.3 or more, and more preferably the amount that makes the absorbance at J40nnl 0.4A or more. be.

It depends on the molar absorption coefficient of the UV absorber, but usually /
It is added in the range of 0-2f/m2 to /77m2.

Preferably, it is evening θη~j00η7 m2.

The ultraviolet absorber of the present invention is contained in an emulsion layer, a surface protective layer, an intermediate layer, etc.

The above ultraviolet absorber can be used in a suitable solvent [e.g. water, alcohol (Example 1f) methanol, ethanol, propatool, etc.
, acetone, methyl cellosolve, etc., or a mixed solvent thereof] and added to the coating solution for a non-photosensitive hydrophilic colloid layer of the present invention.

Two or more of these ultraviolet absorbers can also be used in combination.

According to the present invention, the above-mentioned safelight dye and ultraviolet absorber may be present in the same layer or in different layers.

Next, the second method will be explained. As an optical filter that absorbs ultraviolet rays (filter for pinch light source),
Fuji Photo Film Sharp Cut Filter 5C-
3r, 5C-Jri, SC-daO% SC-gu/, etc.
It is preferable to use a filter that hardly transmits light of 370 nm or less. Specifically, the transmittance is 20%.
It is preferably 70% or less, and more preferably 70% or less.

Next, a third method will be explained. The light source itself is J70
Examples of light sources that do not substantially emit energy in the nm70o region include Idolfin, manufactured by Eye Graphics ■, and plate-making printer P-403 manufactured by Dainippon Screen ■.
Light source (metal halide trap TYPE 5Pu-
xooo (2KW) manufactured by Nippon Battery Co., Ltd.).

The light source used in this third method is 300-4
Of the emission energy in the t20nm region, 30
The emission energy applied to the range of 0 to 770 nm is 30 nm.
% or less is preferable, and 20% or less is particularly preferably used.

Furthermore, commercially available photosensitive materials for bright rooms (for example, KUV-700 manufactured by Fuji Photo Film ■, Konishiroku Photo Film ■ (:R,
It is also possible to use a light source with a higher capacity than the conventional light source for bright rooms, and to expose the light through an optical filter (light source filter) that cuts ultraviolet rays. The high-capacity light source used here is, for example, the ultra-high pressure mercury lamp H-/r-LSI (/j
Kvv), etc.

Optical filter that absorbs ultraviolet rays (filter for light source)
This button is used when exposing between a light source and a photosensitive material, or when a layer containing an ultraviolet absorber or the like is provided in the photosensitive material so that light that does not substantially contain J70nm70o light reaches the photosensitive layer. For this purpose, conventional known light sources can be used. For example, a light source for plate-making printer P-407 (ultra-high pressure mercury lamp: (J RC
-C? 1n-toooo), P-427FM light source manufactured by the same company, and the like.

In the method of the present invention, the exposure time is selected depending on the capacity of the light source used, the sensitivity (including spectral sensitivity) of the photosensitive material, etc., but is usually 60 seconds or more! It takes place in seconds. In some cases, exposure may be performed for a long time (2 to 3 minutes).

Next, the hydrazine high contrast development system will be explained in detail.

Examples of hydrazine derivatives used in this method include US Patent 'A, 4t71. In addition to the aryl hydrazides described in No. P2♂ in which a sulfinic acid residue is bonded to a hydrazo moiety, compounds represented by the following general formula (III) can be mentioned.

General formula (good) R-N)iN)i-G-R2 In the formula, R1 represents an aliphatic group or an aromatic group, and R2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted alkyl group. G represents a substituted aryl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted aryloxy group, and G is a carbonyl group, a sulfonyl group, a sulfoxy group, a phosphoryl group, or an N-substituted or unsubstituted iminomethylene group. represent

In the general formula (l[), the aliphatic group represented by is preferably one having a carbon number of /~30, particularly a carbon number /
~20 straight chain, branched or cyclic alkyl groups. The alkyl group herein may be cyclized to form a saturated heterocycle containing seven or more heteroatoms therein. Further, this alkyl group may have a substituent such as an aryl group, an alkoxy group, a sulfoxy group, a sulfonamide group, or a carbonamide group.

The aromatic group represented by R1 in the general formula ([) is a monocyclic or bicyclic aryl group or an unsaturated heterocyclic group.

Here, the unsaturated heterocyclic group may be condensed with a monocyclic or bicyclic ring group to form a heteroaryl group.

For example, benzene ring, naphthalene ring, pyridine ring, pyri□
Jin ring, imidazole ring, pyrazole ring, quinoline ring,
Examples include an inquinoline ring, a benzimidazole ring, a thiazole ring, and a benzothiazole ring, among which those containing a benzene ring are preferred.

Particularly preferred as R1 is an aryl group.

The aryl group or unsaturated heterocyclic group of R1 may be substituted, and typical substituents include a straight chain, branched pipe or cyclic alkyl group (preferably one having a carbon number of ~20), Aralkyl groups (preferably monocyclic or bicyclic ones with an alkyl moiety having 1 to 3 carbon atoms), alkoxy groups (preferably having 1 to 20 carbon atoms), substituted amino groups (preferably 1 to 3 carbon atoms), /~20 alkyl group), acylamino group (preferably one having 2 to 30 carbon atoms), sulfonamide group (preferably one having 7 to 30 carbon atoms)
), ureido group (preferably carbon number 1 to 30
) etc.

In the general formula (11), the alkyl group represented by 82 is preferably an alkyl group having a carbon number/~g, and having a substituent such as a halogen atom, a cyano group, a carboxy group, a sulfo group, an alkoxy group, or a phenyl group. may have.

In the general formula (II), the optionally substituted aryl group among the groups represented by R2 is a monocyclic or bicyclic aryl group, and includes, for example, a benzene ring. This aryl group is, for example, a norogen atom, an alkyl group, a cyano group,
It may be substituted with a carboxyl group, a sulfo group, etc.

Among the groups represented by R2 in general formula (II), the optionally substituted alkoxy group is an alkoxy group having a carbon number of 1 to t, and may be substituted with a halogen atom, an aryl group, or the like.

Among the groups represented by R2 in general formula (TI), the optionally substituted aryloxy group is preferably a monocyclic one, and examples of the substituent include a halogen atom.

Among the groups represented by R2, when G is a carbonyl group, preferred are a hydrogen atom, a methyl group, a metquine group, an ethquine group, and a substituted or unsubstituted phenyl group, with a hydrogen atom being particularly preferred.

When G is a sulfonyl group, R2 is preferably a methyl group, an ethyl group, a phenyl group or a φ-methylphenyl group, with a methyl group being particularly preferred.

When G is a phosphoryl group, R2 is preferably a methoxy group, an ethoxy group, a methoxy group, a phenoxy group, or a phenyl group, with a phenoxy group being particularly preferred.

When G is a sulfoxy group, R2 is preferably a cyanobenzyl group or a methylthiobenzyl group, and when G is an N-substituted or unsubstituted iminomethylene group, R2 is preferably a methyl group, an ethyl group, a substituted or It is an unsubstituted phenyl group.

R or R2 in the general formula (If) may have a ballast group commonly used in immobile photographic additives such as couplers incorporated therein.

The ballast fi is a group relatively inert to photography having two or more carbon atoms, and is selected from, for example, an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group, an alkylphenoxy group, etc. be able to.

R' or R2 in the general formula (1) may have a group incorporated therein to enhance adsorption to the silver halide grain surface. Such adsorption groups include thiourea groups, heterocyclic thioamide groups, mercapto heterocyclic groups, triazole groups, and the like.

Examples include the groups described in No. 3♂r and ior.

G in general formula (n) is most preferably a carbonyl group.

Specific examples of the compound represented by general formula (II) are shown below. However, the present invention is not limited to the following compounds.

■-1) ■-2) ■-3) ■-4) ■-5) tHs ■-6) ■-7) ■-8) ■-9) n-10) R ■-11) ff-12) n-13) ■-14) lI-15) H n-18) n-19) n-20) II-21) N If-22) n-23) U-25) ll-26) n-27) t[-23) ■-29) ll-30) n-31) N n-32) 11-33) II-34) II-35) II-36) The hydrazine-induced pairs used in the present invention include the above-mentioned In addition to those of RESEARCHDISCLO5URE
Item23516 (November 1983 issue, P, 34
6) and the documents cited therein, as well as U.S. Pat.
No. 80.207, No. 4,269,929, No. 4.27
No. 6.364, No. 4.278,748, No. 4,385
, No. 108, No. 4,459,347, No. 4,560,
No. 638, No. 4,478.928, British Patent No. 2,01
1,391B, JP-A-60-179734, JP-A No. 62-
No. 270,948, No. 63-29,751, JP-A-6
No. 1-170.733, No. 61-270,744, No. 62-948, EP No. 217,310, Patent Application No. 1983-
No. 175,234, #61-251.482, 61
-268,249, #61-276283, I62
-67528, 162-67509, -62-67
, No. 510, #62-58.513, 562-130
．． No. 819, #62-143, No. 467, #62-16
6.117, or US Pat. No. 4,686,167, JP-A-62-178.246, JP-A-63-234.24
No. 4, No. 63-234, 245, No. 63-234.2
No. 46 No. 63-294, 552, No. 63-306.
No. 438, Patent Application No. 117, #62-2
No. 47.478, #63-105.682, #63-
114.118, l63-110.051, '63
-114.119, 163-116,239, 16
3-147.339, -63-179,760, l
No. 63-229,163, Patent Application No. 1-18,377,
1-18.378, 1-18,379, 11-
No. 15,755, No. 1-16,814, No. 1-40.
No. 792, No. 1-42.615, 5l-42,616
You can use those listed in the No.

In the present invention, when the hydrazine derivative represented by general formula (n) is contained in a photographic light-sensitive material, it is preferably contained in a silver halide emulsion layer, but it is preferably contained in a non-photosensitive hydrophilic colloid layer (for example, a protective layer). , intermediate layer, filter layer, antihalation layer, etc.).Specifically, if the compound used is water-soluble, it may be contained in an aqueous solution, or if it is poorly water-soluble, it may be contained in alcohols, esters, etc. Of organic solvents that are miscible with water, such as ketones? f
It can be added to the hydrophilic colloid solution as liquid F. When added to the silver halide emulsion layer, it can be added at any time from the start of chemical ripening to before coating. It is preferable to add it during the coating process, especially to the coating liquid prepared for coating.

In the present invention, the hydrazine derivative represented by the general formula (I[) is preferably contained in an amount of 1×10-' mol to 1X10-' mol per 1 mol of silver halide.
It is preferable to contain Xl0-' to 4X10-' moles.

Next, tetrazolium hard! Ji! An example of a tetrazolium compound used in a developing system is JP-A-52
-18317, 53-17719 and 53-
Compounds described in No. 17720 etc. can be used,
A typical compound is a compound represented by the following general formula.

General formula (V) General formula (vl) In the formula, R□, R3, R4, R5, R8, R9, R1゜ button and "11" are allyl group, phenyl group (e.g. phenyl group, tolyl group, hydroxyphenyl group, carboxyphenyl group, aminophenyl group, mercaptophenyl group, etc.), naphthyl group (e.g. α-naphthyl group, β-naphthyl group, hydroxynaphthyl group, carboxynaphthyl group,
(aminonaphthyl group, etc.), and heterocyclic groups (e.g., thiazolyl group, benzothiazolyl group, oxacylyl group, pyrimidinyl group, pyridyl group, etc.), all of which are groups that form metal chelates or complexes. But that's fine. R2, R6 and R7 are allyl group, phenyl group, naphthyl group, heterocyclic group, alkyl group (e.g. methyl group, ethyl group, propyl group, butyl group,
mercaptomethyl group, mercaptoethyl group, etc.), hydroxyl group, carboxyl group, tobacco salts, carboxyalkyl group (e.g. methoxycarbonyl group, ethoxycarbonyl group, etc.), amino group (e.g. amino group, ethylamino group, anilino group) ), mercapto group, nitro group, and hydrogen atom, D represents a divalent aromatic group, E represents a group selected from alkylene group, arylene group, and aralalkylene group, and n represents a group selected from alkylene group, arylene group, and aralalkylene group. /Represents Katoba 2. However, when the compound forms an inner salt, n is /.

Next, specific examples of the tetrazolium compound used in the present invention will be shown, but the compounds that can be used in the present invention are not necessarily limited to these.

(1) 2-(benzothiazol-2-yl)-3-phenyl! -dodecyl-2H-tetraso IJ uumbromide (2) 2.3-diphenyl-yo-(gut-octyloquinphenyl)-2H-tetrazolium-chloride (3)2. j, j-) rifonyl-2H-tetrazolium (4)2. J, t-tri(p-carboxyethylphenyl)-2H-tetrazolium (5) co(benzothiazol-2-yl)-3-phenyl-yo-(0-chlorophenyl)-24-tetrazolium (6) x, 3 -diphenyl-2H-tetrazolium (7
)2.3-diphenyl-! -Methyl-2H-tetrazolium (8) 3-(p-hydroxyphenyl)-yo-methyl-2-phenyl-2H-tetrazolium (9) 2.3
-diphenyl-y-ethyl-2H-tetrazolium α02,3-diphenyl-jn-hexylucoH-tetrazolium 01)! -Cyano2,3-diphenyl-2H-tetrazolium Q22-(benzothiazol-2-yl)-y-phenyl-5-(ψ-tolyl)-2H-tetrazolium α32-(penzothiazole-coyl)-! -(guchlorophenyl)-3-(a-nitrophenyl)-2
H-tetrazolium Q4 s-ethoxycarbonyl-λ,3-di(3-nitrophenyl)-28-tetrathulium teracetyl-
2,3-di(p-ethoxyphenyl)-2H-tetrazolium 2,! -diphenyl-5-(1)-)lyl)-2H-tetrazolium 2,! -diphenyl-5-(p-iodo-7enyl)-2
H-tetrazolium 2,3-diphenyl-! -(p-diphenyl)-xH-
Tetrazolium r-(p-7'romophenyl)-2-phenyl-5-(
co,g,z-trichlorophenyl)-2H-tetrazolium 3-(p-hydroxyphenyl)-r-(p-nitrophenyl)-2-phenyl-jH-tetrazolium j-(j,4A-dimethoxy7phenyl)- 3-(2-ethoxyphenyl)-u-(4t-methoxyphenyl)-
xH-tetrazolium! -(←-dianophenyl)-2
,3-diphenyl-xH-tetrazolium 3-(p-acetamidophenyl)-x,j-diphenyl-rH-tetrathulium teracetyl-2,3-diphenyl-5H-tetrazolium j-(flucoyl)-2,J- diphenyl-2H-
Tetrazolium! -(thieno-2-yl)-x,3-diphenyl-2H
-Tetrazolium 2,3-diphenyl-! -(pyrido-guyl)-2H
-Tetrazolium 2,3-diphenyl-! -(Kinoru Coil)-2
H-tetrazolium 2,3-diphenyl-! -(benzoxazole-2-
yl)-2H-tetrazolium 2,3-diphenyl-!
-nitro 2H-tetrazolium 2.2/, 3. J/-tetraphenyl-! .

j'-/, μm butylene-di(2)1-tetrazoliumco, J', J, j'-tetraphenyl-! .

When the tetrazolium compound used in the present invention is used as a non-diffusible compound, a non-diffusible compound obtained by reacting a diffusible compound among the above-mentioned exemplified compounds with an anion is used.

Examples of the anion moiety include higher alkylbenzenesulfonic acid anions such as p-dodecylbenzenesulfonic acid anions, higher alkyl sulfate ester anions such as lauryl sulfate anions, and dialkyl sulfonants such as di-2-ethylhexyl sulfocinate anions. Polyether alcohol sulfate ester anions such as succinate anions and cetyl biliethenoxysulfate anions, higher fatty acid anions such as stearate anions,
Examples include polymers such as polyacrylic acid anions with acid groups attached.

By appropriately selecting the anion moiety and the cation moiety, the non-diffusible tetrazolium compound according to the present invention can be synthesized. These non-diffusible tetrazolium compounds can be produced by dispersing the anionic and cationic moieties, which are soluble salts, in gelatin and then mixing them into a gelatin matrix, or by pre-synthesizing crystals of the oxidizing agent. In some cases, it is dissolved in a suitable solvent (eg dimethyl sulfoxide) and then dispersed in a gelatin matrix. In order to make the dispersion completely uniform, it may be emulsified and dispersed using an appropriate homogenizer such as an ultrasonic wave or a Manton-Gorlin homogenizer.

As mentioned above, the tetrazolium compound used in the present invention can be either a diffusible tetrazolium compound button or a non-diffusible tetrazolium compound when the silver gold of the present invention is used. Higher contrast images can be obtained using non-diffusible tetrazolium compounds. Therefore, for example, when particularly excellent halftone dot performance is required, it is relatively advantageous to use non-diffusive tetrazolium.

The tetrazolium compounds used in the present invention may be used alone or in combination.

The tetrazolium compound used in the present invention is.../xlO per mole of silver halide! It is preferable to use the amount in the range of ×10 −2 mol.

Next, the emulsions used in the high contrast emulsion layer button and the soft emulsion layer used in the hydrazine case or tetrazolium high contrast development system will be explained.

The silver halide in the silver halide photographic emulsion is not particularly limited and may have any halogen composition such as silver chloride, silver chlorobromide, silver iodobromide, etc. Preferred is chloride chain or silver chlorobromide (Br tamol or less is preferred).

The silver halide emulsion may or may not be chemically sensitized. Particularly preferred is unchemically sensitized. Sulfur sensitization, reduction sensitization and noble metal sensitization are known as chemical sensitization methods, and any of these may be used alone or in combination. A preferred chemical sensitization method is sulfur sensitization, and sulfur sensitizers include sulfur compounds found in gelatin,
Various sulfur compounds such as thiosulfates, thioureas,
Rhodanines and the like can be used.

Among the noble metal sensitization methods, the gold sensitization method is a typical method and uses a gold compound, mainly a total complex salt. There is no problem in containing complex salts of noble metals other than pure metals, such as platinum, palladium, and rhodium.

As the reduction sensitizer, stannous salts, amines, formamidine sulfinic acid, silane compounds, etc. can be used.

The average grain size of the silver halide is preferably 0.7 μm or less, and particularly preferably o, rμrn-o, or tμm. Average grain size is a term commonly used and easily understood by experts in the field of silver halide photographic science. Particle size means the particle diameter in the case of particles that are spherical or can be approximated to a sphere. If the particle is cubic, the edge length is X J": kπ and the particle size. The average particle projected area is also determined by algebraic mean or geometric mean. For details on how to determine the mean particle size, see theory of
The Photographic Zorose, x, “C, E, M
ees and T. H. James Author: The theo
ry of the photography
processJ), 3rd edition 1. ,? A-43 page (/
ri6g, (Macmillan "~Icm1IlanJ")
) Please refer to .

There are no limitations on the shape of the silver halide grains, and they may be planar, spherical, cubic, /ψ-hedral, regular octahedral, or any other shape. Also, the narrower the particle size distribution, the better.
In particular, a so-called monodisperse emulsion in which 20%, preferably J-%, of the total number of grains falls within a grain size range of ±10% of the average grain size is preferred.

The soluble silver salt and soluble halogen salt used in the present invention may be reacted by any one-sided mixing method, simultaneous mixing method, or a combination thereof.

It is also possible to use a method of forming particles by blowing them under an excess of gold and silver ions (so-called back mixing method).

As one type of simultaneous mixing method, a method of keeping pAgt' constant in the liquid phase in which silver halide is produced, that is, the so-called Chondrald double jet method, can be used. According to this method, the crystal form is regular and A silver halide emulsion with nearly uniform grain size can be obtained.

For more information on silver halide emulsions and their preparation methods, please refer to RESEARC: HDISC: LQS (JRE/
Volume 76 Item 17&u3P, 22~P, z3(
/! P7♂/February) or in the literature cited.

Next, the polyalkylene oxide compound used in the FSL development system will be explained.

The polyalkylene/oxide compound used in the present invention is an alkylene oxide having 2 to ψ carbon atoms, such as ethylene oxide, propylene-7,2-oxide, butylene-/,
Polyalkylene oxide consisting of at least 10 units of ethylene oxide, such as 2-oxide, and active hydrogen atoms such as water, aliphatic alcohol, aromatic alcohol, fatty acid, organic amine, hequintol derivative, etc. It includes condensates with individual compounds or block copolymers of two or more polyalkylene oxides. That is, as polyalkylene oxide compounds, specifically polyalkylene glycols polyalkylene glycol alkyl ethers
Aryl ethers (alkylaryl) Esters, polyalkylene glycol esters, polyalkylene glycol fatty acid amides, polyalkylene glycol amines, polyalkylene/glycol block copolymers, polyalkylene glycol graft polymers, and the like can be used.

The number of poly'noalkyloxy/oxide chains in the molecule is not limited to one, and two or more may be coated with gold. The individual polyalkylene oxide chains may then consist of fewer alkylene oxide units than IO, but the total number of alkylene oxide units in the molecule must be at least 10. If there is more than one polyalkylene oxide chain in the molecule, each of them may consist of different alkylene oxide units, such as ethylene oxide and propyle/oxide. The polyalkylene oxide compound used in the present invention is
Preferably, it contains alkylene oxide units of 1ψ or more and 100 trenches.

Specific examples of the polyalkylene/oxide compounds used in the present invention are as follows.

Polyalkylene oxide compound example t H(J(CH2CH2(J),)12CH(J(
CH2Cf-12(J)15H225 (J(CH2CH2(J) 3oH ψ C:8H Eng, CH2CHC8)-116(J((,')
t2C:H2(J) ,5)17 C1□H23C00(CH2CH20)8oHji,,H
23C(JNH(C)12Cf(2(J)15HriC14H29N(CH2)(CH2CH20)24Ha
+b+c=j O b:a+c=/O:P In the present invention, the amount of the polyalkylene/oquinodo compound added is from 10-4 to 0.2% per mole of silver halide.
It is preferable to contain 1 mol Ag, especially 10-3~/
It is preferable to contain 0 ''f1 mole of Ag.

Next, the Lith emulsion used in the Lith development system and the FSL development system will be explained.

The silver halide composition contains at least 60 mol% of silver chloride (preferably 7! mol or more), and contains silver iodide fO-j
Silver chlorobromide or silver chloroiodobromide containing mole fraction is recommended. More preferably silver chloride! or silver chlorobromide (preferably Brr mole φ or less).

There are no particular restrictions on the morphology, crystal habit, size distribution, etc. of the silver halide grains, but those with a grain size of 0.7 μm or less are preferred.

There are no restrictions on the shape of the silver halide grains, and they may be tabular, spherical, cubic, /4L-hedral, regular octahedral, or any other shape. In addition, the narrower the particle size distribution, the more precise it is, and especially if the total number of particles is within a particle size range of 0% of the average particle size, it is desirable! So-called monodispersed emulsions are the most commonly used.

Although the following chemical sensitization may or may not be performed, non-chemical sensitization is particularly preferred.

Silver halide emulsions include gold compounds such as chloroauric acid salts, gold trichloride, salts of noble metals such as iridium, sulfur compounds that react with silver salts to form silver sulfide, stannous salts, and amines. Sensitivity can be increased without making the particles coarser with reducing substances.

Further, iron compounds such as metal group salts such as iridium, red blood salts, etc. can be present during physical ripening of silver halide grains or during nucleation.

Next, the photographic material used in the present invention may contain various compounds for the purpose of preventing fogging or stabilizing photographic performance during the manufacturing process, storage, or photographic processing of the photographic material. can.

That is, azoles such as benzothiazolium salts, nitroindazoles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptobenzothiazoles, mercaptothiadiazoles, aminotriazoles. , benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles (in particular /-phenyl-!-mercaptotetrazole); mercaptopyrimidines; mercaptotriazines; thioketo compounds, such as oxazolinthione; azaindenes, such as triazaindene. , tetraazaindenes (particularly hydroxy-substituted (/, j, 3a).

7) Tetrazaindenes), pentaazaindene, etc.; benzenethiosulfonic acid, benzene/ze/sulfinic acid,
Many compounds known as antifoggants or stabilizers can be added, such as benzenesulfonic acid amides and the like.

The photographic emulsions and non-photosensitive hydrophilic colloids of the present invention may contain inorganic or organic hardeners.

For example, chromium salts (chromium alum, chromium acetate, etc.), aldehydes (formaldehyde, cryoxal, glitaraldehyde, etc.), N-methylol compounds (dimethylol urea, methylol dimethylhydantoin, etc.)
, dioxane derivatives ('+3-dihydroxydioxane, etc.), active hinyl compounds (/, 3.j-) lyacryloyl-hexahytrose S-) riazine, bis(vinylsulfonyl) methyl ether, N, N/-methylene bis[ β-(vinylsulfonyl) fropionamide], etc.)
, active halogen compounds (2,φ-dichloro-bu-hydroxy-s-triazinato), mucohalokenic acids (mucochloric acid, mucophenoxychloroic acid, etc.) inoxazoles, dialdehyde starch, 2-chloro-bu-hydroxytriazinyl Compounded gelatin and the like can be used alone or in combination.

In the photosensitive emulsion layer and/or non-photosensitive hydrophilic colloid layer of the present invention, an f'i coating aid, antistatic property, slip property improvement,
Various known surfactants may be used for various purposes such as emulsifying and dispersing, preventing adhesion, and improving photographic properties.

Gelatin is advantageously used as the binder housing or protective colloid for photographic emulsions, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein; hydroxyethyl cellulose,
Cellulose derivatives such as carphoki/methylcellulose and cellulose sulfate esters; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol, polyvinyl alcohol partial acetal, poly+J-1'J-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid,
A wide variety of synthetic hydrophilic polymeric materials can be used, such as single or copolymers of polyacrylamide, polyvinylimidazole, polyvinylpyrazole, and the like.

As the gelatin, in addition to lime-treated gelatin, acid-treated gelatin may be used, and gelatin hydrolysates and gelatin enzymatically decomposed products can also be used.

The photographic emulsion of the present invention may contain a dispersion of water-insoluble or sparingly soluble synthetic polymers for the purpose of improving dimensional stability. For example, alkyl (meth)acrylate, alkoxy acrylic (meth)acrylate, glycidyl (meth)acrylate, (meth)acrylamide, vinyl ester (e.g. vinyl acetate), acrylonitrile, olefin, styrene, etc. alone or in combination, or these and acrylic acid. , methacrylic acid, α,β-unsaturated dicarboxylic acid, hydroxyalkyl (meth)acrylate, sulf7-alkyl (meth)acrylate, styrene sulfonic acid, and the like can be used.

The silver halide emulsion of the present invention may be spectrally sensitized with a short-wave sensitizing dye, but is preferably not spectrally sensitized.

Various other additives may be used in the silver halide photographic material used in the present invention, such as desensitizers, plasticizers, slip agents, development accelerators, oils, and dyes.

These additives and the aforementioned additives are specifically described in Research Disclosure (Research D).
issue) No. 176, pages 22-31 (R
D-17643) (Dec, 197B) can be used.

In the light-sensitive material used in the present invention, the emulsion layer and the protective layer may be a single layer or a multilayer consisting of two or more layers, and in the case of zero multilayers, an intermediate layer or the like may be provided between them.

In the photographic light-sensitive material of the present invention, the photographic emulsion layer and other layers are coated on one side or both sides of a flexible support commonly used in photographic light-sensitive materials. Useful flexible supports include films of synthetic polymers such as cellulose acetate, cellulose acetate, polystyrene, and polyethylene terephthalate.

Known processing solutions such as developing solutions can be used in the present invention.

Specifically, PQ! JE developer, MQ developer, or LIS developer may be selected and used from the following viewpoints.

That is, the selection may be made depending on the type of photosensitive material to be processed, the type of high contrast system used, the sensitivity, etc.

For more information on the development method used, please see RESEARC.
HDISCLOSURE 1? Volume 6 Item 176
43■ term, χ term, χ℃ term 2.28~F, 30 (19
78, December).

Next, among the typical systems, the developer used in the hydrazine or tetrazolium high contrast development system will be explained first.

In order to obtain photographic properties of super hardness of 1 m (γ value of 10 or more) using a silver halide photographic light-sensitive material using a hydrazine derivative or a tetrazolium compound, the conventional unstable Lith developer (contagious developer) must be used. It is not necessary to use a stable developer, and a stable developer can be used. That is, for the above-mentioned silver halide photographic light-sensitive material, a developer containing a sufficient amount of sulfite ions as a preservative (particularly 0, /Ji mol/1 or more) can be used. When using a hydrazine derivative, the pH value of the developer is as follows! Above, especially 10. ! The range of 10 to 2.3 is preferable, and when a tetrazolium compound is used, the range of 9 to 2 is preferable, particularly the range of 10 to 1/2 is preferable.

There is no particular restriction on the developing agent used in the developing solution used in the invention, but it is preferable to contain dihydroxybenzenes because it is easy to obtain good halftone quality. Combinations of phenyl-3-pyrazolidones or combinations of dihydroxyhensens and p-amine phenols may also be used.

Examples of the dihydroxybenzene developing agent used in the present invention include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropyl/hydroquinone, methylhydroquinone/, 2,3-dichlorohydroquinone, co,!
Hydroquinone is particularly preferred.

The developing agent for /-phenyl-3-pyrazolidone or its derivative used in the present invention is /-phenyl-3-pyrazolidone, /-phenyl-g, 4t-dimethyl-3-
Pyrazolidone, /-phenyl-gumethyl-guhydroxymethyl-3-pyrazolidone, /-phenyl-a,i
wt-dihydroxymethyl-3-virasoliton,/-phenyl-! -Methyl-3-pyrazolidone, /-p-7minofukonyl-g, goo-dimethyl-3-pyrazolidone, /
-p-tolyl-9, goudimethyl-3-pyrazolidone, and the like.

Examples of p-amine 8-phenol developing agents used in the present invention include N-methyl-p-aminophenol, p-7minophenol, N-(β-hydroxyethyl)-p-aminephenol, N-(4t-hydroxyphenyl ) glycine, co-methyl-P-aminophenol, p-benzylaminophenol, among others, N-methyl-p-aminophenol, etc.
-Aminophenol is preferred.

It is usually preferable to use the developing agent in an amount of o, or mol/l-1, ♂ mol/l! Yes. ! When using a combination of dihydroxybenzenes and t-phenyl-3-birasolitons or p-amino-phenols, the former is o,
or mole/l-0゜! mol/l, the latter 0.01 mol/l
It is best to use it in an amount of less than 1 liter.

Preservatives for sulfite used in the present invention include sodium sulfite, potassium sulfite, lithium sulfite, ammonium sulfite, sodium bisulfite, potassium metabisulfite,
Examples include formaldehyde and sodium bisulfite. Sulfite is o, trt mole/1 or more, especially O0! Mol/1 or more is preferable! Yes. Also, the upper limit is 2. jmol/l! It is preferable to do so.

Alkaline agents used to set pH include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, trisodium phosphate, and potassium triphosphate.
Contains H regulators and buffers.

Additives used in addition to the above components include compounds such as boric acid and borax, development inhibitors such as sodium bromide, potassium bromide, and potassium iodide; ethylene glyfur, diethylene glycol, triethylene glycol, and dimethyl formamide. , methyl selonulf, hexylene glycol, ethanol, methanol, and other organic solvents: /-phenyl-! -Mercaptotetrazole, 2-mercaptobenzimidazole-! -Mercapto compounds such as sulfonic acid sodium salts,! - Indazole compounds such as ditroindazole! - An anti-capri agent or a black pepper inhibitor such as a penztriazole compound such as methylpenztriazole, and may further contain a coloring agent, a surfactant, an antifoaming agent, a water softener, as necessary. It may also contain a hardening agent, such as an amino compound described in JP-A-104-4T4.

The developing solution used in each system of the present invention contains a silver stain preventive agent as described in Japanese Patent Application Laid-Open Nos. Compounds described in No. t7 can be used. The compounds described in Japanese Patent Application No. 109/1974, No. 74tJ can be used as solubilizing agents added to the developer, and the compounds described in Japanese Patent Application No. 413/1973 can be used as pH buffers used in the developer. Compounds described in this issue can be used.

The developing temperature is /♂″C to ro 0c, and the developing time is /!~
I like to seconds! Yes.

Next, I will explain about the Lith developer used in the Lith developing system.

The lithium developer preferably used in the present invention basically consists of ortho- or para-dihydroxybenzene, an alkaline agent, a small amount of free sulfite, a sulfite ion buffer, and the like. The ortho- or dihydroxybenzene used as the developing agent can be appropriately selected from those well known in the field of photography.

Specific examples include hydroquinone, chlorohydroquinone, bromohydroquinone, inpropylhydroquinone, toluhydroquinone, methylhydroquinone,
2.3-dichlorohydroquinone, 2. ! -Dimethylhydroquinone, etc.

Among these, hydroquinone is particularly practical.

These developing agents may be used alone or in combination. The amount of developing agent added is preferably 7 to 100 g per liter of developer solution! Siku! 〜♂og. The sulfite ion buffer is used in an amount effective to keep the sulfite concentration in the developer almost constant, and is used in amounts such as aldehyde bisulfite alkali adducts such as formalin sodium bisulfite adducts, ketone-sulfite adducts such as acetone sodium bisulfite adducts, etc. Examples include hydrogen alkali adducts, carbonyl sulfite-amine condensation products such as sodium bis(2-hydroxyethyl)aminomethane sulfonate, and the like. The amount of sulfite ion buffer used is 3 to 130 g per 1 l of developer solution.

The concentration of free ionic sulfite can be controlled by adding an alkali sulfite salt such as strained sodium sulfate to the developer used in the present invention. The amount of sulfite added is developer solution/l.
Generally, the amount is less than tg, particularly preferably less than 3 g, but of course it may be as much as 1 g.

In many cases, it is preferable to include an alkali halide (particularly a bromide such as sodium bromide or heptalium bromide) as a development regulator. Alkali halides are developer/
ll cow, 0/~10g.

Good! Siku is 0. /～! It is preferable to add g.

An alkaline agent is added to adjust the pH of the developer to 9 or higher (particularly 9.7 to 7).

Ordinary developing solutions use sodium carbonate or potassium carbonate as an alkaline agent, and there are various amounts of the added amount.

In addition to the above-mentioned components, the developer used in the present invention may optionally contain water-soluble acids (e.g. acetic acid, boric acid), alkalis (
For example, pH buffering agents such as hydroxides (IJum), salts (eg, sodium carbonate) can be included. Certain alkalis not only make the developer alkaline;
It also acts as a pH buffer and development regulator. Further ingredients that can be added to the developer are preservatives such as jetanolamine, ascorbic acid, kojic acid, and henzotriazole, phenyl! - antifoggants such as mercabutotetrazole, and organic solvents such as triethylene glycol, dimethylformamide, and methanol.

The developer prepared as described above only needs to contain each component before use, and the developer composition can also be divided into two or more parts before use.

For example, if the developer is divided into a part containing a dissolved developing agent and a part containing an alkali, it can be used immediately by simply diluting the image part.

Of course, both the so-called powder type developer and the liquid type developer can exhibit equally good photographic performance.

In this method, the development temperature is xooC-<t.

Although 0C is a bit of a trick, it is possible to develop at other temperatures as well! not.

The development time is preferably 10 to 260 seconds, particularly 10 to 0 seconds, although it depends on the development temperature.

Next, the developer used in the FSL development system is a high pH developer containing a dihydroxybenzene developing agent, a high concentration of sulfite ions (specifically, 0.2 mol/1 or more), and a nitroindazole compound. Use.

Here, as the dihydroxybenzene developing agent, those used in the above-mentioned Lith developer can be similarly used. Hydroquinone is particularly practical.

! Furthermore, in order to keep the sulfite ion concentration constant, the aforementioned sulfite ion buffer can be used as necessary.

Specifically, the aforementioned sulfite or its buffer can be used.

Further, the pH of the developer is preferably 10.1 or higher.

For more information on nitroindazole compounds and the developer used here, please visit JP-A-Sho! ♂-/9094
T! It is described in.

In this method, the development temperature is preferably 3o-rooc, and the development time is preferably 70 seconds to 60 seconds.

(Example) Next, the present invention will be explained in detail based on examples.

I solution: 600 g of water - 18 g of gelatin, pH 3.0 N solution: Ag NOs 200 g, water 800 d Above 1. Emulsion A was prepared using Solution II in the following manner.

l) Emulsion A (Br 1 mol% grain size 0.20tt
Rh1.0XIO-'mol/MoaL/Ag)■
, Liquid: KBr1.4g NaC116g (NH4),
RhCl! * 4111 g Water 800 Jd Add [[,
The addition was maintained at a constant rate for 0 minutes. After removing the soluble salts from this emulsion using a conventional method well known in the art, gelatin was added to the emulsion as a stabilizer without chemical ripening. Indene was added. The average grain size of this emulsion is 0.2
0 μ, emulsion yield is 1 kg, gelatin content is 60
It was g. A polyalkylene oxide compound (PEO) is added to this emulsion, A hydrazine compound (Hz) is added, and the emulsion is designated as B. A tetrazolium salt (T salt) is designated as C. A compound of the general formula (I) of the present invention and an ultraviolet absorber (UV After adding absorbent) (compound '#(2)) in the amount shown in Table 1, polyethyl acrylate latex was added in a solid content of 30 wt% based on gelatin, and as an ffl film agent,
Add 1,3-vinylsulfonyl-2-propanol,
4. on polyethylene terephthalate film. Qg/r
rf Ag content, and on top of that a protective layer with gelatin added with yellow dye to improve safelight safety at L2hg/rrr. This sample was exposed to light through an optical wedge using Dainippon Screen's printer P-607 for light production.
Table 1 shows the T value (measured using the method described above) after standard processing for each system.

Here, regarding samples NCLA-1 to 8, FSL
Development processing was performed using system developer FS-2 (manufactured by Fuji Photo Film ■), developer Pa\ for samples kB-1 to 8, and developer B for samples hc-i to 4. .

(2.) Using Samples 14CLA-1 to 8, image exposure was carried out under the exposure conditions shown in Table 3 with the document configuration shown in Figure 1, and then automatic copying made by Fuji Photo Film ■ was carried out. After processing was carried out on a machine FG-660F using developer solution FS-2 for the FSL system manufactured by the same company for a development time of 20 seconds at 38° C., the quality of the extracted character image was evaluated.

Here, the light source filter is Fuji Photo Film ■
5C-38 or 5C-41 was used as shown in Table 2.

Extracted character image quality 5 means that when a manuscript like the one shown in Figure 1 is properly exposed so that 50% of the halftone dot area becomes 50% of the halftone dot area on the photosensitive material for return, a character with a width of 3011 m is reproduced. In terms of image quality, the image quality is very good. -Excellent character image quality 1 refers to the image quality that can only reproduce characters with a width of 150 μm or more when given the same appropriate exposure, and is poor character quality, with a sensory evaluation of 4 to 2 between 5 and 1. A rank was established. A value of 3 or higher is a practical level.

However, the number of seconds required for exposure is determined by using a medium density filter (N
D filter) was applied and the exposure amount was adjusted so that each sample had the same number of exposure seconds.

As is clear from Table 2, test N, which is the structure of the present invention,
α5.6 and 11-16 show excellent character extraction performance.

Dainippon Screen ■P-607 (ultra high pressure mercury lamp...ORC-CHM-1000) for exposure light B ■Idol fin manufactured by Eye Graphics■ (metal halide lamp 3KW...MQ-300) The emission energy distribution of the light source is It is shown in Figure 2.

(Safelight safety test) (3) Same as (2) using samples NaB-1 to 8 and C-1 to 4! Exposure and printing were performed under the conditions shown in No. 13 to evaluate the image quality of the printed characters.

In addition, NctB-1 to NctB-8 were prepared using a developer (A) using an automatic processor FC-660F manufactured by Fuji Photo Film 38"C20.
Second processing was performed. On the other hand, kC-L~4 was processed at 38℃2 using developer (B) in an automatic processor GR-27 manufactured by Konica ■.
0 second processing was performed.

As is clear from Table 3, Test 14 is the configuration of the present invention.
112122.28.30 and 33.36 show excellent character extraction performance.

Developer B Ethylenecyaminetetraacetic acid disodium salt (dihydrate) 0.75g Anhydrous potassium sulfite 51.7g Anhydrous potassium carbonate 60.4g Hydroquinone
15.1g 1-phenyl-3-pyrazolidone 0.51g Sodium bromide 2.285-Methylbenztriazole 0,124g
1-phenyl-5-mercaptotitrazole 0゜018g 5-nitroindazole 0.106g Add diethyl glycol water 1j!・Developer A Hydroquinone N-Methyl-P-Aminophenol 1/2fE Salt Sodium Hydroxide Potassium Hydroxide 5-Sulfosalicylic Acid Boric Acid Potassium Sulfite Ethylenediamine Tetraacetic Acid Disodium Chloride Bromide 5-Methylbenztriazo- Add n-Petit Rouge Ethanol and fruit water (pH-10°98°5) 45.0g 0°18°55°45°25°110°l.

g 6.0g 01 g 15° g 1 (pH-11゜ 6) ( table ) ( table )

[Brief explanation of the drawing]

FIG. 1 shows the configuration at the time of exposure when forming a cut-out character image by overlapping and repeating, and each reference numeral indicates the following. (B. Transparent or semi-transparent pasting base (opening) Line drawing original (black areas indicate line drawings) (C) Transparent or semi-transparent pasting base (2. Halftone dot original (black areas indicate halftone dots) (H) Photosensitive material for return (the shaded area indicates the photosensitive layer) Figure 2 shows the spectral energy distribution of each of the light sources used for exposure (■).The vertical axis shows the relative energy; The horizontal axis indicates wavelength (n-).

Claims (1)

[Claims] In a method for forming an image by imagewise exposing a bright room silver halide photographic light-sensitive material having at least one light-sensitive silver halide emulsion layer on a support, at least one of the emulsion layer or other hydrophilic colloid layer A photosensitive material containing a redox compound in its layer that releases a development inhibitor when oxidized and exhibiting a γ value of 10.0 or more is exposed to light that does not substantially contain light of 370 nm or less. An image forming method in which a layer is imagewise exposed.