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JPH02185373A - Synthetic grindstone - Google Patents

Synthetic grindstone

Info

Publication number
JPH02185373A
JPH02185373A JP738389A JP738389A JPH02185373A JP H02185373 A JPH02185373 A JP H02185373A JP 738389 A JP738389 A JP 738389A JP 738389 A JP738389 A JP 738389A JP H02185373 A JPH02185373 A JP H02185373A
Authority
JP
Japan
Prior art keywords
polishing
abrasive
abrasive grain
matrix
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP738389A
Other languages
Japanese (ja)
Inventor
Tsutomu Shibuya
勉 渋谷
Akio Nakamura
中村 明男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanebo Ltd
Original Assignee
Kanebo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanebo Ltd filed Critical Kanebo Ltd
Priority to JP738389A priority Critical patent/JPH02185373A/en
Publication of JPH02185373A publication Critical patent/JPH02185373A/en
Pending legal-status Critical Current

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  • Polishing Bodies And Polishing Tools (AREA)

Abstract

PURPOSE:To eliminate the need for an abrasive oil material at polishing time, by dispersing an abrasive grain fine particle by relatively connecting in the matrix whose structure is composed of the uniformly mixing body of polyvinylacetal resin, at least one kind of heat hardening resin solidified body, the amorphous body of a silicate the abrasive oil material consisting of at least one kind of surface active agent. CONSTITUTION:In case of performing the polishing of an aluminum disk, the abrasive grain fine particle filled uniformly and compactly in the matrix resin having an excellent water resistance and abrasive grain holding power and connected mutually shows a sharp sharpness, i.e. polishing power together with the grindstone surface hardness caused by the optimum hardness, elasticity, brittleness, etc., of the matrix and the abrasive grain count, moreover the exuding of the contained abrasive oil material. Also the abrasive grain is reproduced by being re-newed immediately at its abrasive face with the new abrasive grain connected at the back appearing on the surface even if being dropped in order by the slide friction polishing action and the polishing chip, dropping abrasive grain, etc., are easy to be discharge from a continuous fine pore as well and also the contained abrasive oil material constrains the secondary cohesion of the polishing chip and dropped abrasive grain fine powder.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は平坦な表面を有する金属板、例えば、磁気ディ
スク基盤の素材たるアルミニウム合金製原盤(以下アル
ミディスクと略称する)等の軟質金属の表面の研削・琢
磨、すなわち研磨に供する合成砥石に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is a metal plate having a flat surface, such as a soft metal such as an aluminum alloy master disk (hereinafter referred to as an aluminum disk) that is a material for a magnetic disk base. It relates to a synthetic whetstone used for surface grinding and polishing, that is, polishing.

(従来の技術) 従来、平坦な表面を有する金属板で比較的軟質なもの、
例えばアルミディスク等の表面研磨は、精密旋盤等を用
いた機械加工、炭化珪素等の微粉末スラリーを用いた所
謂ラッピング加工、あるいはレジノイド系砥石や、ウレ
タン系砥石等の合成砥石を用いた加工等が一般的であっ
た。
(Prior art) Conventionally, a relatively soft metal plate with a flat surface,
For example, surface polishing of aluminum disks, etc. can be done by machining using a precision lathe, so-called lapping using a slurry of fine powder such as silicon carbide, or processing using a synthetic grindstone such as a resinoid grindstone or a urethane grindstone. was common.

しかしながら、精密旋盤等を用いた機械加工は、作業者
の熟練度により仕上がり精度、作業効率が異なる上、全
般的に作業性が悪く、小型の被研磨体を大量に処理する
ような場合、その効率の低さが顕著であった。
However, machining using precision lathes, etc. has different finishing accuracy and work efficiency depending on the skill level of the worker, and is generally poor in workability. The efficiency was noticeably low.

また、炭化珪素等の低粒微粉末スラリーを用いたラッピ
ング加工法の場合は、スラリーのロス、使用量が多く経
済的に不利な上、周囲の作業環境や作業者を汚染し、更
にはその高濃度廃液の処理に大変な手間と費用とを要す
るという問題点かあった。
In addition, in the case of lapping processing using a slurry of low-grain fine powder such as silicon carbide, it is economically disadvantageous due to the loss of slurry and the amount used, and it also contaminates the surrounding working environment and workers, and furthermore, There was a problem in that it required a great deal of effort and expense to treat highly concentrated waste liquid.

かかる砥粒微粉末スラリーを用いるラッピング加工法に
代えて、合成砥石を用いた加工が近年急速に普及しつつ
ある。しかし合成砥石も、例えばビトリファイド系やレ
ジノイド系の硬質砥石等では、研磨性能が不充分で充分
な仕上り粘度が得られなかったり、検索力が不足したり
、あるいは目詰まり現象等好ましからざる現象を惹起し
、高能率をもって一定の性能が得られない等の問題点が
あった。すなわち、平面部分の研磨、特にアルミディス
ク等、平坦度と面精度とが同時に要求される研11にお
いては、被研磨体の表面と、研磨材の表面との面相瓦間
を接触させ、−時に研磨を進めてゆくことが必要であり
、例えばレジノイド系あるいはウレタン系等の独立気孔
構造の合成砥石を使用した場合は、研磨作用による研磨
屑、脱落砥粒等がこの気孔に入り込み、目詰まり現象を
惹き起こし易く、研磨効果の持続性に欠け、頻繁なドレ
ッシング(表面更新)作業が必要となるのである。
In place of the lapping method using such a fine abrasive powder slurry, processing using a synthetic grindstone is rapidly becoming popular in recent years. However, synthetic whetstones, such as vitrified or resinoid hard whetstones, have insufficient polishing performance and may not be able to obtain a sufficient finish viscosity, lack retrieval ability, or cause undesirable phenomena such as clogging. However, there were problems such as inability to obtain a certain level of performance with high efficiency. That is, in polishing flat parts, especially in polishing 11 where flatness and surface precision are required at the same time, such as aluminum disks, the surface of the object to be polished and the surface of the abrasive material are brought into contact, and sometimes - It is necessary to proceed with polishing. For example, if a resinoid-based or urethane-based synthetic whetstone with an independent pore structure is used, polishing debris, fallen abrasive grains, etc. due to the polishing action can enter the pores and cause clogging. The polishing effect is not sustainable, and frequent dressing (surface renewal) work is required.

これに対して、連続気孔を有するポリビニルアセタール
系樹脂を結合材として用いたものは、研磨屑、脱落砥粒
等が気孔外に排出され易く、目詰まり現象を起こし難い
ため、優れた合成砥石として一般的に知られたものであ
るが、比較的耐水性に劣り、かかる精密研磨用途には不
向きであった。
On the other hand, those using polyvinyl acetal resin with continuous pores as a bonding material are easy to discharge polishing debris, fallen abrasive grains, etc. to the outside of the pores, and are less likely to cause clogging, making them excellent synthetic grindstones. Although it is generally known, it has relatively poor water resistance and is not suitable for such precision polishing applications.

また、耐水性付与を目的として熱硬化性樹脂硬化体を配
合したものも、特公昭!9−1888号および同53−
6762号各公報などく提案され、耐水性合成砥石とし
て公知のものである。特に後者の発明においては、熱硬
化性樹脂の配合比率を変えることにより、弾性のあるも
のから剛性に至るまでの性質を有する研磨材が得られ、
殊に粒度の細かい砥石は、軟質、硬質、難削材の研磨に
有用であるとされていたが、その研削力においては尚不
充分な面があり、平坦な表面を有する軟質金属板、特に
アルミディスク等の平面研磨に不向きであった。
In addition, Tokkosho! contains a cured thermosetting resin for the purpose of imparting water resistance. No. 9-1888 and No. 53-
It has been proposed in various publications such as No. 6762, and is known as a water-resistant synthetic whetstone. In particular, in the latter invention, by changing the blending ratio of the thermosetting resin, an abrasive material with properties ranging from elastic to rigid can be obtained.
In particular, fine-grained whetstones were said to be useful for polishing soft, hard, and difficult-to-cut materials, but their grinding power was still insufficient, and they were particularly useful for polishing soft metal plates with flat surfaces. It was not suitable for flat surface polishing of aluminum disks, etc.

更にまた、ポリビニルアセタール系砥石の耐Q品性、抗
圧力の不足を補うと共に、研削材の接着、抱合力を増大
させるために、珪酸ゲルをマトリックス中に添加する方
法が特公昭8G−2’2448号として提案されている
が、この方法によって製造された従来の合成砥石も上記
同様、軟質金属板号公報には、ポリビニルアセタール系
砥石の表面硬度と砥粒番手との関係を限定し、かつ珪酸
ゲルをマトリックス中に添加した合成砥石が提案されて
おり、この合成砥石は特にアルミディスク等の平面研磨
に対して優れた平坦度と高い面精度とを同時に満足する
ものである。そして、この合成砥石は例えばラッピング
研磨機に装着され、研磨面を研磨油剤で濡らしつつ、ア
ルミディスク等の研磨が行われる。ところが、この研磨
油剤は研磨時に研磨面から回りに拡散されるので、上記
の研磨方法は多量の研磨油剤を必要とするという問題が
あった。
Furthermore, in order to compensate for the lack of Q quality resistance and anti-pressure of polyvinyl acetal grinding wheels, and to increase the adhesion and binding power of abrasive materials, a method of adding silicic acid gel to the matrix was proposed in Japanese Patent Publication No. 8G-2'. 2448, but the conventional synthetic grindstone manufactured by this method is similar to the above, and the soft metal plate publication limits the relationship between the surface hardness of the polyvinyl acetal grindstone and the abrasive grain count, and A synthetic whetstone in which silicic acid gel is added to the matrix has been proposed, and this synthetic whetstone simultaneously satisfies excellent flatness and high surface precision, especially for flat surface polishing of aluminum disks and the like. Then, this synthetic grindstone is attached to, for example, a lapping polishing machine, and an aluminum disk or the like is polished while the polishing surface is wetted with polishing oil. However, since this polishing oil is diffused around the polishing surface during polishing, the above polishing method has the problem of requiring a large amount of polishing oil.

この問題を解決するために研磨油剤を回収して再利用す
ることも試みられたが、5μ以下という細い金属固形分
を多く含むため、一般の濾過器ではすぐに目が閉恵して
しまうという問題があった。
Attempts have been made to collect and reuse the polishing oil in order to solve this problem, but since it contains a large amount of thin metal solids (less than 5 microns), ordinary filters quickly become obsolete. There was a problem.

(発明が解決しようとする問題点) 本発明者等は、上述の技術的現状と問題点とに鑑み、鋭
意研究を行なった結果、本発明を完成するに至ったもの
であり、その目的とするところは、優れた平坦度と高い
面精度とを同時に満足するように仕上げられた軟質金属
板、特にアルミディスク等、就中、極めて精密な用途に
供せられる特殊アルミ合金の環状盤等に使用でき、しか
も研磨時に研磨油剤を必要としない合成砥石を提供する
にある。
(Problems to be Solved by the Invention) The present inventors have completed the present invention as a result of intensive research in view of the above-mentioned technical current situation and problems. This is applied to soft metal plates finished to satisfy both excellent flatness and high surface precision, especially aluminum disks, and especially annular disks made of special aluminum alloys used for extremely precise applications. To provide a synthetic whetstone which can be used and does not require a polishing oil during polishing.

(問題点を解決するための手段) 上述の目的は、連続微細気孔を具えた三次元網状組織を
なす構造体であって、該組織がポリビニルアセタール系
樹脂と少なくとも一種の熱硬化性樹脂の硬化体と珪酸塩
の非晶体と少なくとも一種の界面活性剤からなる研磨油
剤との均一混合体よりなるマトリックスと、該マトリッ
クス中において相連接し実質的に連線状態をなして存在
する砥粒微細粒子との混合体からなることを特徴とする
合成砥石により達成される。
(Means for Solving the Problems) The above object is to provide a structure having a three-dimensional network structure with continuous fine pores, which structure is formed by curing polyvinyl acetal resin and at least one thermosetting resin. a matrix consisting of a homogeneous mixture of an amorphous body, a silicate, and a polishing oil consisting of at least one type of surfactant; and abrasive fine particles that are interconnected with each other and exist in a substantially continuous state in the matrix. This is achieved by a synthetic whetstone characterized by being made of a mixture of

本発明砥石の微細三次元網状組織をなす構造体は、レジ
ノイド系やウレタン系人造砥石の独立気泡構造とは組織
を全く異にし、独立気泡は存在せず、空隙中に枝が立体
的に伸びた様な組織であり気孔は無限に連通したものと
なる。従って、研磨作業に起因する砥粒脱落物、研磨屑
はこの間隙から系外に排出され易く、また捕捉された場
合も他の独立気泡構造の砥石に見る如く、気泡部分にこ
れらが堆積し、目詰まり等好ましからざる現象を惹起し
難いものである。独立気泡構造の場合は目詰まり現象に
より研磨効果の持続性に欠け、頻繁なドレッシング作業
(表面更新)が必要となる。
The fine three-dimensional network structure of the grindstone of the present invention is completely different from the closed cell structure of resinoid-based or urethane-based artificial grindstones; there are no closed cells, and branches extend three-dimensionally into the voids. The structure is like that, and the pores are infinitely connected. Therefore, abrasive particles and polishing debris caused by polishing work are easily discharged from the system through these gaps, and even if they are captured, they accumulate in the bubbles, as seen in other closed-cell structure grindstones, It is difficult to cause undesirable phenomena such as clogging. In the case of a closed-cell structure, the polishing effect is not sustainable due to clogging, and frequent dressing operations (surface renewal) are required.

上述の効果が十分に得られるのは、平均気孔径10乃至
100μmの範囲であり、これを下回ると密すぎて、目
詰まり等の現象が出易い。また、これを上回ると、構造
的に粗すぎて物性の均一性という面でや1難がある。
The above-mentioned effects can be sufficiently obtained within the range of average pore diameter of 10 to 100 μm; below this range, the pores are too dense and phenomena such as clogging tend to occur. Moreover, if it exceeds this, the structure will be too rough and there will be some difficulty in terms of uniformity of physical properties.

また気孔率は60〜86容量チの範囲にあることが好ま
しい。80容量係未満の場合は、独立気泡が存在するよ
うになり、85チ容量を超えると強度の面でや1不十分
なものとなる。
Further, the porosity is preferably in the range of 60 to 86 by volume. If the capacity is less than 80, closed cells will be present, and if the capacity exceeds 85, the strength will be insufficient.

砥粒の結合材としてポリビニルアセクール系樹脂と熱硬
化性樹脂の硬化体および珪酸塩の非晶体を用いた合成砥
石は特開昭61−1112480号公報により公知のも
のであるが、この合成砥石は熱硬化性樹脂硬化体を配合
しているため耐水性があり、また珪酸塩の非晶体を併用
しているので軟質金属研磨用砥石として、極めて好まし
い研削力を有し、特に砥石自体のs粍も少なく、且つ、
目詰まり等好ましからざる現象を引き起むしにくい性能
が付与されるのである。結合材であるマトリックスとし
て上述の如く、ポリビニルアセタール系樹脂に熱硬化性
樹脂の硬化体、及び珪酸塩の非晶体を併用するととべよ
りポリビニルアセタール系合成砥石に特有な靭性(ねば
り)を低減せしめ、適度な脆性(もろさ)を有する合成
砥石となるものであり、特に珪酸塩非晶体は砥石に適度
な魔性を付与し、且つ、その研削力を向上させるという
優れた効果を有する。
A synthetic whetstone using a hardened polyvinyl acecool resin, a thermosetting resin, and an amorphous silicate as a binder for abrasive grains is known from JP-A-61-1112480. Because it contains a hardened thermosetting resin, it is water resistant, and because it also uses an amorphous silicate, it has extremely favorable grinding power as a grindstone for polishing soft metals. There are few blemishes, and
This provides performance that makes it difficult to cause undesirable phenomena such as clogging. As mentioned above, when polyvinyl acetal resin is used in combination with a hardened thermosetting resin and an amorphous silicate as a matrix which is a binding material, the toughness (stickiness) peculiar to polyvinyl acetal synthetic grinding wheels is reduced. The synthetic whetstone has an appropriate degree of brittleness, and the amorphous silicate in particular has the excellent effect of imparting appropriate magic properties to the whetstone and improving its grinding power.

本発明で言う熱硬化性樹脂としては、メラミン系樹脂、
フェノール系樹脂、尿素系樹脂、熱硬化型ウレタン系樹
脂、エポキシ系樹脂等が挙げられるが、通常はメラミン
系樹脂、フェノール系樹脂が用いられる。
The thermosetting resin referred to in the present invention includes melamine resin,
Examples include phenolic resins, urea resins, thermosetting urethane resins, and epoxy resins, but melamine resins and phenol resins are usually used.

本発明で言う珪酸塩の非晶体とは、二酸化珪素と各種の
塩基からなる種々の珪酸塩に酸を作用させるととくよっ
て生ずるゲル状物質を指し、塩基としては、例えばソー
ダ灰を使用した珪酸塩の場合、NatOa x8i0*
 @ yH*o  なる化学式で示されるものであり、
Na 20/ 8 iot  のモル比が2及び4のも
のを用いることが好ましい。この場合、ゲル状物質の一
般式は、 で示される無機高分子体が分子間架橋をし、非結晶性の
三次元化合物となったものとなる。塩基としては、この
他、水酸化アルミ等を用いる場合もある。
In the present invention, the amorphous silicate refers to a gel-like substance that is produced when acid is applied to various silicates made of silicon dioxide and various bases. For salt, NatOa x8i0*
It is represented by the chemical formula @yH*o,
It is preferable to use those having a molar ratio of Na 20/ 8 iot of 2 and 4. In this case, the general formula of the gel-like substance is an inorganic polymer represented by intermolecular crosslinking to form an amorphous three-dimensional compound. In addition to this, aluminum hydroxide or the like may be used as the base.

上記結合材マトリックスは、研磨の主材である砥粒微細
粒子を効果的に把持する役割をはだすもので、研磨作業
に際しては、1つの砥粒が表面を研磨して、系外に排除
されると同時に新しい砥粒を自生させ、研磨作業を継続
させてゆくもの、すなわち、砥石は自身摩耗しつつ、研
磨を行うものであるが、上記珪酸塩非晶体の併用により
マトリックス自体も若干の研削力を有するものとなり得
、研削力が格段に向上すると同時に砥石自体の摩耗も低
減し得るものである。
The above-mentioned binder matrix plays the role of effectively holding fine abrasive particles, which are the main material of polishing. During polishing work, one abrasive grain polishes the surface and is eliminated from the system. At the same time, new abrasive grains are produced spontaneously to continue the polishing work. In other words, the grindstone itself performs polishing while wearing itself out. However, by using the silicate amorphous material mentioned above, the matrix itself also undergoes some grinding. This can significantly improve the grinding force and at the same time reduce the wear of the grindstone itself.

マトリックス中に混合されるもう一つの成分である界面
活性剤からなる研磨油剤は、砥石自身が摩耗する時に、
除々に砥石表面に染出し、研磨力を向上し得るものであ
る。
Another component mixed into the matrix is a polishing oil consisting of a surfactant, which acts as a polishing oil when the grinding wheel itself wears out.
It gradually oozes out onto the surface of the whetstone and can improve the polishing power.

ここで界面活性剤からなる研磨油剤とは、研削性の向上
及び仕上げ面粗さの向上という研磨油剤の基本的な性能
に加え、研磨屑や脱落砥粒微粉の二次凝集という現象を
抑制する作用をもつものであれば、特に限定はされない
が、通常はアルキルリン酸エステル塩、ポリオキシアル
キレンアルキルエーテル等が用いられる。
Here, a polishing oil made of a surfactant has the basic performance of improving grindability and finished surface roughness, as well as suppressing the phenomenon of secondary aggregation of polishing debris and fallen abrasive particles. Although there is no particular limitation as long as it has an effect, alkyl phosphate salts, polyoxyalkylene alkyl ethers, and the like are usually used.

本発明に言う砥粒微細粒子とは、ダイヤモンド、窒化ホ
ウ素、炭化珪素、熔融アルミナ、ガーネット、エメリー
、酸化セリウム、酸化クロム等研削力を有する化合物ま
たは単体からなる研磨材料のいずれかを粉砕し、適当な
方法にてJIS規格R8001に規定された粒度に分級
されたものを指すものであるが、炭化珪素、熔融アルミ
ナ、酸化クロム、酸化セリウムよりなる群から選ばれた
超硬セラミックス砥粒の少なくとも1種を選定すること
が望ましい。
The abrasive fine particles referred to in the present invention are made by pulverizing either a compound or a single abrasive material having abrasive power such as diamond, boron nitride, silicon carbide, fused alumina, garnet, emery, cerium oxide, chromium oxide, etc. It refers to those classified by an appropriate method to the particle size specified in JIS standard R8001, and at least one of the cemented carbide ceramic abrasive grains selected from the group consisting of silicon carbide, fused alumina, chromium oxide, and cerium oxide. It is desirable to select one type.

更に1本発明における要点は、新暦性能を持つ砥粒の配
位・分布状態に係る点である。すなわち、この種の合成
砥石においては、研磨面に存在する砥粒々子が摩擦して
脱落し、系外に排出されるという現象を繰り返し、砥石
は自らの厚みを減少させつつ、被研磨体表面を研磨して
ゆくものであるが、砥粒の比率が少ないと、1個の砥粒
が独立して存在することとなり、その砥粒が脱落した後
は、ミクロ的見方をすれば結合材のみで表面を摺擦する
。すなわち研磨力の少ない部分での摺擦を行う為、切れ
味(研削力)が劣るものとなる。特に本発明の如く、ア
ルミディスク等軟質金属の表面研磨を目的とする場合、
かかる現象は好ましくなく、表面斑、研N斑等の問題に
つながり易い。
Another key point of the present invention is the coordination and distribution state of abrasive grains that have the New Calendar performance. In other words, in this type of synthetic whetstone, the abrasive grains existing on the polishing surface are rubbed off, fall off, and are discharged from the system repeatedly, and the whetstone reduces its own thickness while increasing the surface of the object to be polished. However, if the ratio of abrasive grains is small, each abrasive grain will exist independently, and after that abrasive grain falls off, from a microscopic perspective, only the binder will remain. Scrub the surface with. In other words, since the rubbing is performed in areas with low abrasive force, the sharpness (grinding force) is poor. Especially when the purpose is to polish the surface of a soft metal such as an aluminum disk, as in the present invention,
Such a phenomenon is undesirable and tends to lead to problems such as surface unevenness and abrasive unevenness.

本発明においては、かかる好ましからざる現象を回避す
る為、個々の砥粒がマトリックス中で各々独立して存在
せず、隣接した砥粒々子と相互に連接し、実質的に連続
した状態をなして分布している。かかる砥粒の状態は、
本発明になる砥石のマトリックスが、60〜85容量−
という高い気孔率をもって三次元的に均一に連通した、
平均孔径10〜100μmの連続気孔構造をなし、この
ようなマトリックスの微細骨格中に適度な粒度の砥粒微
細粒が充分な量をもって、所謂、目白押しをなして配位
され、均一に分布していることに由来する。また、かか
る配位・分布を確実にするための好適な砥粒番手は、少
なくとも800番、含有量は混合体重量の26重量−以
上、更に好適には混合体重量の50重量−以上である。
In the present invention, in order to avoid such undesirable phenomena, individual abrasive grains do not exist independently in the matrix, but are interconnected with adjacent abrasive grains, forming a substantially continuous state. It is distributed. The condition of such abrasive grains is
The matrix of the grinding wheel according to the present invention has a capacity of 60 to 85 -
It has a high porosity and is uniformly connected three-dimensionally.
It has a continuous pore structure with an average pore diameter of 10 to 100 μm, and a sufficient amount of fine abrasive grains of appropriate grain size are arranged in a so-called crowd in the microskeleton of such a matrix, and are uniformly distributed. It comes from being there. In order to ensure such coordination and distribution, a suitable abrasive grain count is at least 800, and the content is at least 26 weights of the mixture weight, more preferably at least 50 weights of the mixture weight. .

そして、砥粒番手が低い程、すなわち砥粒々径が大きい
程、硬度を高めにすることが好ましい。
Further, it is preferable that the lower the abrasive grain count, that is, the larger the diameter of the abrasive grains, the higher the hardness.

本発明にかかる砥石は次の如き方法にて製造される。The grindstone according to the present invention is manufactured by the following method.

すなわち、平均重合度300〜zooo、IN化度80
モル−以上のポリビニルアルコール、その誘導体または
変性体の一種あるいはそれ以上を混合して水溶液となし
、それに熱硬化性樹脂のモノマー オリゴマーあるいは
重合体等からなる前駆体の水溶液、非水溶媒溶液、エマ
ルジョン等、および珪酸塩の水溶液またはコロイドを加
えて均一に撹拌し更に砥粒、架橋剤としてのアルデヒド
類、触媒としての酸類、及び気孔生成剤としての澱粉類
等を加え、均一粘稠スラリーを調製し、これを所定の型
枠に注型する。然る後、40乃至100℃の温度にて約
−昼夜、湯浴あるいはその他の浴中で反応固化を行なっ
た後取り出し、水洗いして余剰のアルデヒド類、酸類、
気孔生成剤を除去し中間体を得る。
That is, the average degree of polymerization is 300 to zooo, and the degree of IN is 80.
An aqueous solution is prepared by mixing one or more moles of polyvinyl alcohol, its derivatives or modified products, and an aqueous solution, non-aqueous solution, or emulsion of a precursor consisting of a monomer, oligomer, or polymer of a thermosetting resin. etc., and an aqueous solution or colloid of silicate, stirred uniformly, and further added with abrasive grains, aldehydes as a crosslinking agent, acids as a catalyst, starches as a pore-forming agent, etc., to prepare a uniform viscous slurry. This is then cast into a predetermined mold. After that, the reaction is solidified at a temperature of 40 to 100°C day and night in a hot water bath or other bath, and then taken out and washed with water to remove excess aldehydes, acids,
The pore forming agent is removed to obtain an intermediate.

次に熱硬化性樹脂のモノマー、オリゴマーあるいは重合
体等からなる前駆体の水溶液、非水溶媒溶液、エマルジ
ョン等、および界面活性剤からなる研磨油剤を加えて均
一に撹拌しな溶液を準備し、前記中間体をこれに含浸し
、所定量に絞った後、100°C程度の温度で加熱し水
分を蒸発除去、乾燥する。その後樹脂の硬化を行なう為
の熱処理(キユアリング)を行なわねばならないが、キ
ユアリングに必要な温度および時間は使用した樹脂の種
類および量によって微砂に異なるものである。
Next, an aqueous solution, non-aqueous solvent solution, emulsion, etc. of a precursor made of a thermosetting resin monomer, oligomer or polymer, etc., and a polishing oil made of a surfactant are added to prepare a uniformly stirred solution, This is impregnated with the intermediate, squeezed to a predetermined amount, heated at a temperature of about 100°C to evaporate water, and dried. Thereafter, heat treatment (curing) must be performed to cure the resin, but the temperature and time required for curing vary slightly depending on the type and amount of resin used.

一般的には100乃至250℃で20乃至100時間の
キユアリングを施せば、硬化反応ははゾ達成される。
Generally, curing is carried out at 100 to 250° C. for 20 to 100 hours to achieve the curing reaction.

硬化が不充分であると靭性が大きく、またキユアリング
条件が過酷で硬化が進みすぎると熱分解が同時に生起し
、好ましからざる現象が起こり易いので、条件の選定は
慎重に行なう必要があるまたキユアリングにおいて急激
な昇温を避ける為、段階的な昇温を行なったり、不活性
ガス雰囲気の中で行ない局部的酸化・劣化を抑制するこ
とも有効である。更に熱硬化を促進するための触媒を併
用することも有効である。
If curing is insufficient, the toughness will be large, and if the curing conditions are harsh and curing progresses too much, thermal decomposition will occur at the same time, which is likely to cause undesirable phenomena, so conditions must be selected carefully. In order to avoid rapid temperature increases, it is also effective to increase the temperature in stages or to perform the process in an inert gas atmosphere to suppress local oxidation and deterioration. Furthermore, it is also effective to use a catalyst to promote thermal curing.

また、中間体に熱硬化性樹脂のモノマ、オリゴマーある
いは重合体等からなる前駆体の水溶液、非水溶媒溶液、
エマルシヨン等の溶液を含浸し、所定量に絞った後、1
00″C程度の温度で加熱し水分を蒸発除去、乾燥し、
キユアリングを施した硬化体に界面活性剤からなる研磨
油剤を含浸し、所定11に絞った後、100″C程度の
温度で加熱し水分を蒸発除去、乾燥する方法でも本発明
の合成砥石を得ることができる。
In addition, as an intermediate, an aqueous solution, a non-aqueous solution of a precursor consisting of a thermosetting resin monomer, oligomer or polymer, etc.
After impregnating with a solution such as emulsion and squeezing it to a specified amount, 1
Heat at a temperature of about 00"C to remove water by evaporation and dry.
The synthetic grindstone of the present invention can also be obtained by impregnating a cured product with an abrasive oil made of a surfactant, squeezing it to a predetermined temperature of 11, heating it at a temperature of about 100"C to evaporate water, and drying it. be able to.

液状の樹脂は、水溶液、有機溶剤に溶解した溶液、エマ
ルシヨン、あるいは樹脂原液のいずれも使用しうるが、
作業性および混合比のコントロールのし易さから見て、
水溶液を使用する方法が最も好適である。
The liquid resin may be an aqueous solution, a solution dissolved in an organic solvent, an emulsion, or a resin stock solution.
From the viewpoint of workability and ease of controlling the mixing ratio,
The method using an aqueous solution is most preferred.

(作用) 前述の如くして得られた砥石は所望の形状に成型された
後、水中に投入し、12時間以上放置し、完全に湿潤状
態に到らしめ、最大2%程度膨潤させ安定した後軟質金
属の表面研磨用途に供せられるが、特にアルミディスク
等、特殊アルミ合金の環状盤の表面研磨の如き、極めて
精密な用途に供せられる場合、研磨前後の厚み、すなわ
ち研削員が精度高く定められており、しかも平坦度、厚
みのバラツキが極端におさえられている為、一般的な研
磨装置には適用されに<<、例えば両面ラッピング式研
磨機等、極めて精密な装置に装置して用いることが好ま
しい。ここで両面ラッピング式研磨機とは、円形または
環形盤状の金属性定盤を上下両面に備え、その間に被研
磨体を1枚またはそれ以上挾みこんで圧着し、上下両定
盤を逆方向に回転せしめ、被研磨体表面を摺動擦過して
、研磨を行なう装置を言い、本発明になる砥石を適用す
る場合には、砥石が均一表面を形成するよう、両定盤に
これを装着して用いるのである。
(Function) After the grindstone obtained as described above was molded into a desired shape, it was placed in water and left for 12 hours or more to reach a completely wet state and swelled by a maximum of 2% and stabilized. It is used for surface polishing of soft metals, but especially when used for very precise purposes such as surface polishing of special aluminum alloy annular disks such as aluminum disks, the thickness before and after polishing, that is, the accuracy of the grinder, Because it is highly defined and the variation in flatness and thickness is extremely suppressed, it cannot be applied to general polishing equipment. It is preferable to use it. Here, a double-sided lapping type polishing machine is equipped with circular or ring-shaped metal surface plates on both the upper and lower surfaces, and one or more objects to be polished are sandwiched between them and crimped, and both the upper and lower surface plates are rotated in opposite directions. This refers to a device that performs polishing by rotating the grinding wheel to slide and scrape the surface of the object to be polished. When applying the grinding wheel of the present invention, it is attached to both surface plates so that the grinding wheel forms a uniform surface. It is used as such.

か(して本発明になる砥石を両面ラッピング式研磨機に
装着し、例えばアルミディスクの研磨を行なうと、優れ
た耐水性と砥粒保持力とを有するマトリックス樹脂中に
均−且つ緻密に充填され、相互に連接した砥粒微細粒子
は、その砥粒番手とマトリックスの適度な硬度、弾性、
脆性な?に由来する砥石表面硬度、さらには含有される
研磨油剤の染出しと相俟って、冴えた切れ味、すなわち
研磨力を示し、また砥粒粒子は摺擦研磨作用により順次
脱落しても背後に連接した新しい砥粒が表面に現れて、
砥面が直ちに更新再生されるとともに、研磨屑、脱落砥
粒等は連続微細気孔から排出され易く、また含有される
研磨油剤が研磨屑や脱落砥粒微粉の二次M集を抑制する
ため、目詰まりを起こし難いから、高い研磨力が長期に
亙って維持される。また、本発明砥石の超微細砥粒の前
述せる特殊な配位・分布状態のために、研磨作業時、マ
トリックス樹脂のみによる摺擦現象を生ずることなく、
平坦な被研磨体全面に亙って砥粒粒子が接触・摺擦し、
常時均一な研磨作用が行なわれる。
(Then, when the grinding wheel of the present invention is installed in a double-sided lapping type polishing machine to polish, for example, an aluminum disk, it is evenly and densely packed into the matrix resin, which has excellent water resistance and abrasive grain retention. The interconnected abrasive fine particles have appropriate hardness, elasticity, and
Is it fragile? The surface hardness of the grinding wheel, which is derived from the grinding process, and the bleeding of the abrasive oil contained in the grinding wheel result in a sharp sharpness, or abrasive power. New connected abrasive grains appear on the surface,
The abrasive surface is immediately renewed and regenerated, and polishing debris, fallen abrasive grains, etc. are easily discharged from continuous fine pores, and the contained polishing oil suppresses secondary M collection of polishing debris and fallen abrasive grain fine powder. Since clogging does not easily occur, high polishing power is maintained over a long period of time. In addition, due to the above-mentioned special coordination and distribution state of the ultrafine abrasive grains of the grindstone of the present invention, during polishing work, there is no rubbing phenomenon caused only by the matrix resin.
The abrasive particles contact and rub over the entire surface of the flat object to be polished,
Uniform polishing action is always performed.

従って、本発明砥石は平坦な平面を有する軟質金属板に
、研゛磨斑のない、高い平滑度と優れた仕上がり面精度
とを効率良く与えるものである。
Therefore, the grinding wheel of the present invention efficiently provides a soft metal plate having a flat surface with high smoothness without polishing spots and excellent finished surface accuracy.

(実施例) 以下実施例に従い本発明の実施態様を説明する。(Example) Embodiments of the present invention will be described below with reference to Examples.

尚、本実施例において使用した研磨装置・測定機器・被
研磨体等は次の通りである。
The polishing equipment, measuring instruments, object to be polished, etc. used in this example are as follows.

・研磨装置・・・バーチカル型銅ローラー研磨機・表面
粗さ計・・・東京精密社製 表面粗さ計(型式、サーフ
コム 5B3A) ・被研磨剤・・・グラビア印刷用銅ローラー(直径11
0mmX長さ100100O又研磨条件及び測定条件は
下記の通りである。
・Polishing equipment: Vertical copper roller polishing machine ・Surface roughness meter: Surface roughness meter manufactured by Tokyo Seimitsu Co., Ltd. (model: Surfcom 5B3A) ・Abraded material: Copper roller for gravure printing (diameter 11
0mm x length 100100O The polishing conditions and measurement conditions are as follows.

・新暦条件 ・荷      重  85KC7 ・砥石回転数 70Orpm ・砥石送りスピード mm7分 ・ローラ回転数 11orpm ・研    磨 2往復(1mX4回)・研磨量評価 ・ローラー研磨量(単位μm)= 研磨前ローラー径−研磨後ローラー径 ・砥石摩耗量(単位mm ) == 研磨前砥石厚さ一研磨後砥石厚さ ・表面精度測定条件 なおここでいうRa l Rmax  は、次式のパラ
メーターを示す。
- Calendar conditions - Load: 85KC7 - Grinding wheel rotation speed: 70 orpm - Grinding wheel feed speed: mm7 minutes - Roller rotation speed: 11 orpm - Polishing: 2 round trips (1 m x 4 times) - Evaluation of polishing amount - Roller polishing amount (unit: μm) = Roller diameter before polishing - Roller diameter after polishing/Wheelstone wear amount (unit: mm) == Grindstone thickness before polishing - Grindstone thickness after polishing/Surface accuracy measurement conditions Note that Ra l Rmax here indicates the parameter of the following formula.

Ra  ”’  中心線平均粗さ Ra =110Ll f (x) ldxf (x)は
、粗さ曲線を示す。
Ra ''' Centerline average roughness Ra = 110Ll f (x) ldxf (x) indicates the roughness curve.

Rmax・・・最大高さ Rmax = Pmax −Vmin Pmax・・・粗さ曲線における最大山高さVmin・
・・        最大谷深さ砥粒として、炭化珪素
粉末の3000番のものを選定した。aooo番は平均
粒径4.1〜5.9μmのものである。重合度170G
、完全鹸化のポリビニルアルコールを水溶液となし、こ
れに水溶性フェノール樹脂として住人デュレズ株製PR
−861人を所定量と、触媒としての硫酸、架橋剤とし
てのホルムアルデヒド、気孔生成剤としテノコーンスタ
ーチとを加え、さらに二酸化珪素にソーダ灰を加えた珪
酸塩の水溶液を所定量加えた後、前述砥粒と混合して均
一のスラリー状液を調製した。このスラリー液を所定の
型枠に注型し、60℃にて1昼夜反応固化せしめた。し
かる後、水洗いし、過剰の酸、ホルムアルデハイド、コ
ーンスターチ等を除去して乾燥し合成砥石の中間体を得
た。また、水溶液のメラミン樹脂として住友デエレズ昨
牧M−3本噂の水溶液の所定量と鐘紡株製ベルクーラン
トI Got (主成分高級脂肪酸アマイド、高級脂肪
酸エステル塩)、ベルクーラント1002(主成分アル
キル隣酸エステル塩、ポリオキシアルキルエーテル)、
第一工業製薬e?3iグリセリン13Gの所定量を均一
に撹拌した溶液を準備し、前記中間体をこれに含浸し、
所定量に絞った後、乾燥し、130℃の温度にて約60
時間熱処理を行ない合成砥石を得た。
Rmax... Maximum height Rmax = Pmax - Vmin Pmax... Maximum peak height Vmin in the roughness curve
... Silicon carbide powder No. 3000 was selected as the maximum valley depth abrasive grain. No. aooo has an average particle size of 4.1 to 5.9 μm. Polymerization degree 170G
, Completely saponified polyvinyl alcohol was made into an aqueous solution, and a water-soluble phenol resin was added to it as a water-soluble phenolic resin, PR manufactured by Jurez Co., Ltd.
- After adding a predetermined amount of 861 people, sulfuric acid as a catalyst, formaldehyde as a crosslinking agent, and tenocone starch as a pore-forming agent, and further adding a predetermined amount of an aqueous solution of silicate containing silicon dioxide and soda ash, as described above. A uniform slurry liquid was prepared by mixing with abrasive grains. This slurry liquid was cast into a predetermined mold, and reacted and solidified at 60°C for one day and night. Thereafter, it was washed with water to remove excess acid, formaldehyde, cornstarch, etc., and dried to obtain an intermediate for a synthetic grindstone. In addition, as an aqueous solution of melamine resin, a predetermined amount of the rumored aqueous solution of Sumitomo Deerez Sanmaki M-3, Bell Coolant I Got (main component higher fatty acid amide, higher fatty acid ester salt) manufactured by Kanebo Co., Ltd., Bell Coolant 1002 (main component alkyl ester salt), acid ester salt, polyoxyalkyl ether),
Daiichi Kogyo Seiyaku e? Prepare a solution in which a predetermined amount of 3i glycerin 13G is uniformly stirred, impregnate it with the intermediate,
After squeezing to a predetermined amount, dry it at a temperature of 130℃ for about 60℃.
A synthetic whetstone was obtained by heat treatment for a period of time.

本実施例で用いた砥石の組成は第1表に示す。The composition of the grindstone used in this example is shown in Table 1.

次にこの合成砥石を研磨装置に取付は研磨装置の所定の
条件にて、研磨を行なった。所定時間研磨後、被研磨材
の表面形状を検査した。
Next, this synthetic whetstone was attached to a polishing device, and polishing was performed under the predetermined conditions of the polishing device. After polishing for a predetermined period of time, the surface shape of the polished material was inspected.

結果を第1表に記す。The results are shown in Table 1.

(以下余白) 第   1   表 次に、第1表の実施例で作成した中間体に、水溶液のメ
ラ(樹脂として昭和高分子■[8M−700の水溶液を
含浸し、所定量に絞った後、乾燥し、150℃の温度に
て約50時間熱処理を行ない、更に鐘紡株製ベルクーラ
ント1001、ベルクーラント1002の所定量を含浸
し、所定量に絞り、合成砥石を得た。
(Margin below) Table 1 Next, the intermediate prepared in the example in Table 1 was impregnated with an aqueous solution of Showa Polymer 8M-700 as a resin and squeezed to a predetermined amount. It was dried, heat-treated at a temperature of 150° C. for about 50 hours, impregnated with a predetermined amount of Bell Coolant 1001 and Bell Coolant 1002 manufactured by Kanebo Co., Ltd., and squeezed to a predetermined amount to obtain a synthetic whetstone.

本実施例で用いた砥石の組成は第2表に示す。The composition of the grindstone used in this example is shown in Table 2.

次にこの合成砥石を研磨装置に取付は研磨装置の所定の
条件にて、研磨を行なった。所定時間研磨後、被研磨材
の表面形状を検査した。
Next, this synthetic whetstone was attached to a polishing device, and polishing was performed under the predetermined conditions of the polishing device. After polishing for a predetermined period of time, the surface shape of the polished material was inspected.

結果を第2表に記す。The results are shown in Table 2.

(以下余白) 第1表及び第2表から明らかな如く、本発明になる合成
砥石は、研磨時に研磨油剤で濡らしながら研磨をしなく
ても、適度の研削力を有し、かつ表置精度においても良
好な結果を示す。RmaxがRaの略10〜14程度の
値を示しており、条痕が少なく、良い仕上がりである事
がわかる。
(Left below) As is clear from Tables 1 and 2, the synthetic whetstone of the present invention has appropriate grinding power and surface placement accuracy even without being wetted with abrasive oil during polishing. It also shows good results. It can be seen that Rmax shows a value of approximately 10 to 14 compared to Ra, indicating that there are few scratches and a good finish.

(発明の効果) 以上詳述した様に、本発明による合成砥石は、研磨時に
研磨油剤を必要としないため加工コストの低減という効
果を奏する。
(Effects of the Invention) As described in detail above, the synthetic grindstone according to the present invention does not require a polishing oil during polishing, and therefore has the effect of reducing processing costs.

また、本発明による合成砥石は優れた平坦度と高い面精
度とを同時に備えた、軟質金属板、例えばアルミディス
クを効率良く経済的有利に取得することが可能となった
ため、電子工業、事務機器産業等の発達に伴う情報S′
債媒体としての高精度仕上アルミディスク等の品質向上
ならびに急速な需要増に十分対処することができるので
、産業界への寄与は頗る大である。
In addition, the synthetic whetstone according to the present invention makes it possible to efficiently and economically obtain soft metal plates, such as aluminum disks, which have both excellent flatness and high surface precision, and is used in the electronic industry, office equipment, etc. Information S′ accompanying the development of industry, etc.
The contribution to industry will be significant, as it will be able to sufficiently address the rapid increase in demand and improve the quality of high-precision finished aluminum disks used as bond media.

出願人 鐘 紡 株式 会 社゛Applicant Kanebo Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] (1)連続微細気孔を具えた三次元網状組織をなす構造
体であって、該組織がポリビニルアセタール系樹脂と少
なくとも一種の熱硬化性樹脂の硬化体と珪酸塩の非晶体
と少なくとも一種の界面活性剤からなる研磨油剤との均
一混合体よりなるマトリックスと、該マトリックス中に
おいて相連接し実質的に連続状態をなして存在する砥粒
微細粒子との混合体からなることを特徴とする合成砥石
(1) A structure having a three-dimensional network structure with continuous fine pores, the structure forming an interface between a polyvinyl acetal resin, at least one type of cured thermosetting resin, and at least one type of amorphous silicate. A synthetic whetstone characterized by comprising a matrix consisting of a homogeneous mixture with a polishing oil consisting of an activator, and a mixture of fine abrasive particles interlocking with each other and existing in a substantially continuous state in the matrix. .
(2)前記界面活性剤からなる研磨油剤の含有率が、重
量比において1〜10%の範囲である請求項(1)に記
載の合成砥石。
(2) The synthetic grindstone according to claim 1, wherein the content of the polishing oil made of the surfactant is in the range of 1 to 10% by weight.
JP738389A 1989-01-13 1989-01-13 Synthetic grindstone Pending JPH02185373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP738389A JPH02185373A (en) 1989-01-13 1989-01-13 Synthetic grindstone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP738389A JPH02185373A (en) 1989-01-13 1989-01-13 Synthetic grindstone

Publications (1)

Publication Number Publication Date
JPH02185373A true JPH02185373A (en) 1990-07-19

Family

ID=11664414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP738389A Pending JPH02185373A (en) 1989-01-13 1989-01-13 Synthetic grindstone

Country Status (1)

Country Link
JP (1) JPH02185373A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0631637A (en) * 1992-06-19 1994-02-08 Shiyouken Kogyo Kk Porous rubber abrasive for buff
EP0595003A1 (en) * 1992-10-28 1994-05-04 Bakelite AG Thermosetting composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5175288A (en) * 1974-12-26 1976-06-29 Toshimasa Takebe KETSUGOGATAKENMAZAI
JPS61192480A (en) * 1985-02-22 1986-08-27 Kanebo Ltd Synthetic grinding stone for soft metal
JPS61195183A (en) * 1985-02-22 1986-08-29 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション Abrasive powder fixation type polyurethane abrasive material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5175288A (en) * 1974-12-26 1976-06-29 Toshimasa Takebe KETSUGOGATAKENMAZAI
JPS61192480A (en) * 1985-02-22 1986-08-27 Kanebo Ltd Synthetic grinding stone for soft metal
JPS61195183A (en) * 1985-02-22 1986-08-29 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション Abrasive powder fixation type polyurethane abrasive material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0631637A (en) * 1992-06-19 1994-02-08 Shiyouken Kogyo Kk Porous rubber abrasive for buff
EP0595003A1 (en) * 1992-10-28 1994-05-04 Bakelite AG Thermosetting composition

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