JPH0980414A - Liquid crystal display device - Google Patents
Liquid crystal display deviceInfo
- Publication number
- JPH0980414A JPH0980414A JP7230873A JP23087395A JPH0980414A JP H0980414 A JPH0980414 A JP H0980414A JP 7230873 A JP7230873 A JP 7230873A JP 23087395 A JP23087395 A JP 23087395A JP H0980414 A JPH0980414 A JP H0980414A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- shielding film
- display device
- crystal display
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は液晶表示装置に係
り、特に導電性の遮光膜を備えた液晶表示装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device provided with a conductive light shielding film.
【0002】[0002]
【従来の技術】従来の液晶表示装置は一般的に、二枚の
電極基板に液晶が挟持された構造をしており、1方の電
極基板は、透明絶縁性基板上にクロム等の遮光膜が形成
され、その上に絶縁膜が形成され、さらに透明電極が形
成されている構造である。2. Description of the Related Art Generally, a conventional liquid crystal display device has a structure in which a liquid crystal is sandwiched between two electrode substrates, one of which is a light-shielding film such as chrome on a transparent insulating substrate. Is formed, an insulating film is formed thereon, and a transparent electrode is further formed.
【0003】従来の遮光膜は一体構造となっており、上
記のように遮光膜を形成する際、遮光膜に起因する突起
や絶縁膜のピンホール等が原因で絶縁膜上の透明電極と
導通状態になった場合、透明電極にかかるはずの電圧
が、下層の遮光膜の全パターンにリークしてしまい、透
明電極の電圧が降下してしまう問題がある。The conventional light-shielding film has an integral structure, and when the light-shielding film is formed as described above, it is electrically connected to the transparent electrode on the insulating film due to protrusions caused by the light-shielding film or pinholes in the insulating film. In this case, the voltage that should be applied to the transparent electrode leaks to the entire pattern of the lower light-shielding film, and the voltage of the transparent electrode drops.
【0004】[0004]
【発明が解決しようとする課題】上記説明したように、
導電性の遮光膜が一体となっている構造では、透明電極
と導通状態になった場合、透明電極の電圧降下を起こ
し、表示に悪影響を及ぼしていた。本願発明は上記問題
点に鑑みなされたもので、表示状態の良い液晶表示装置
を提供することを目的とする。As described above,
In the structure in which the conductive light-shielding film is integrated, when it is brought into conduction with the transparent electrode, a voltage drop occurs in the transparent electrode, which adversely affects the display. The present invention has been made in view of the above problems, and an object thereof is to provide a liquid crystal display device in a good display state.
【0005】[0005]
【課題を解決するための手段】本発明は、透明絶縁性基
板上に所定パターンに導電性の遮光膜が形成され、遮光
膜が形成された透明絶縁性基板上に絶縁膜が形成され、
絶縁膜上に透明電極が形成され、透明電極を含む透明絶
縁性基板上に配向膜が形成された第一の電極基板と、透
明絶縁性基板上に透明電極が形成され、透明電極が形成
された絶縁性基板上に配向膜が形成された第二の電極基
板と、第一の電極基板と第二の電極基板とに挟持された
液晶と、を備えた液晶表示装置において、所定パターン
は、遮光膜の全体が導通することなく部分的に分割され
ていることを特徴とする液晶表示装置である。According to the present invention, a conductive light-shielding film is formed in a predetermined pattern on a transparent insulating substrate, and an insulating film is formed on the transparent insulating substrate having the light-shielding film formed thereon.
A transparent electrode is formed on the insulating film, a first electrode substrate having an alignment film is formed on the transparent insulating substrate including the transparent electrode, and a transparent electrode is formed on the transparent insulating substrate. In a liquid crystal display device comprising a second electrode substrate having an alignment film formed on an insulating substrate, and a liquid crystal sandwiched between the first electrode substrate and the second electrode substrate, the predetermined pattern is: The liquid crystal display device is characterized in that the entire light shielding film is partially divided without conducting.
【0006】本発明は、導電性の遮光膜を遮光膜全パタ
ーンに導通しないように分割して形成してあることによ
り、例えば絶縁膜のピンホールにより絶縁膜上の透明電
極と遮光膜が導通したとしても、ピンホールの無い部分
の遮光膜には導通しないため、透明電極の電圧降下を少
なくくい止めることができ、表示不良を解消することが
可能になる。According to the present invention, the conductive light-shielding film is divided and formed so as not to be electrically connected to the entire pattern of the light-shielding film. For example, the transparent electrode on the insulating film and the light-shielding film are electrically connected by the pinhole of the insulating film. Even if it does, since it does not conduct to the light-shielding film in the part where there is no pinhole, it is possible to suppress the voltage drop of the transparent electrode with a small amount, and it is possible to eliminate the display defect.
【0007】[0007]
【発明の実施の形態】以下、本発明を図面を参照して詳
細に説明する。図1に、本発明の一実施例における液晶
表示装置の構成を示す。本実施例は、薄膜トランジスタ
(以下、TFT:Thin Film Transis
tor)をスイッチング素子として用いたアクティブマ
トリクス型の液晶表示装置である。 まず、第一の電極
基板である対向基板として、ガラスから成る透明絶縁性
基板5上に、例えばクロム(Cr)から成りマトリクス
状に形成された遮光膜6と、その遮光膜6に囲まれた画
素領域にそれぞれ形成された赤(R)、緑(G)、青
(B)のカラーフィルタ7と、カラーフィルタ7の上に
全面に形成されカラーフィルタ7の保護、表面の平坦
化、さらに絶縁膜としてのトップコート8と、トップコ
ート8上に全面に形成されたITO(Indium T
in Oxide)から成る透明電極である対向電極9
と、さらに、最上部に全面に形成された配向膜10とか
ら成る。DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below with reference to the drawings. FIG. 1 shows the configuration of a liquid crystal display device according to an embodiment of the present invention. In this embodiment, a thin film transistor (hereinafter, referred to as TFT: Thin Film Transistor) is used.
is a liquid crystal display device of the active matrix type using (tor) as a switching element. First, as a counter substrate which is a first electrode substrate, a light-shielding film 6 made of, for example, chromium (Cr) and formed in a matrix on a transparent insulating substrate 5 made of glass, and surrounded by the light-shielding film 6. Red (R), green (G), and blue (B) color filters 7 respectively formed in the pixel regions, and the color filters 7 formed on the entire surface of the color filters 7 for protection, surface flattening, and insulation. The top coat 8 as a film and the ITO (Indium T) formed on the entire surface of the top coat 8.
counter electrode 9 which is a transparent electrode composed of in oxide)
And an alignment film 10 formed on the entire top surface.
【0008】そして、第二の電極基板であるTFTアレ
イ基板は、ガラスから成る透明絶縁性基板1上に個々の
画素領域に対応して設けられたTFT2と、TFT2の
一部に接続された透明電極である画素電極3と、さらに
最上層に全面に形成された配向膜4とから成る。The TFT array substrate, which is the second electrode substrate, is composed of a transparent insulating substrate 1 made of glass, a TFT 2 provided corresponding to each pixel region, and a transparent portion connected to a part of the TFT 2. The pixel electrode 3 which is an electrode, and the alignment film 4 formed on the entire uppermost layer are further formed.
【0009】そして、TFTアレイ基板と対向基板と
が、シール剤11及び図示しないスペーサーを介してお
互いに画素電極3と対向電極9の形成面を向き合わせ、
液晶12を挟持している。Then, the TFT array substrate and the counter substrate face the formation surfaces of the pixel electrode 3 and the counter electrode 9 with each other through the sealant 11 and a spacer (not shown).
The liquid crystal 12 is sandwiched.
【0010】そして、両電極基板の外側面には偏光板1
3a、13bが設けられており、TFTアレイ基板側に
照明となるバックライト14が配置され、さらにTFT
アレイ基板に駆動IC15が実装されて、本実施例の液
晶表示装置が構成されている。A polarizing plate 1 is provided on the outer surface of both electrode substrates.
3a and 13b are provided, and a backlight 14 for illumination is arranged on the TFT array substrate side.
The drive IC 15 is mounted on the array substrate to form the liquid crystal display device of this embodiment.
【0011】このうち、遮光膜6を含む対向基板の製造
方法を詳細に説明する。まず、ガラスから成る透明絶縁
性基板5上に、クロムを約1000A堆積させ、フォト
リソグラフィによりマトリクス状の遮光膜6を形成す
る。ここで、遮光膜6はTFTアレイ基板と組み合わせ
たときに、TFTアレイ基板のゲートライン及びドレイ
ンラインに対応するように形成される。Among these, a method of manufacturing the counter substrate including the light shielding film 6 will be described in detail. First, about 1000 A of chromium is deposited on the transparent insulating substrate 5 made of glass, and the light-shielding film 6 in a matrix is formed by photolithography. Here, the light shielding film 6 is formed so as to correspond to the gate line and the drain line of the TFT array substrate when combined with the TFT array substrate.
【0012】このとき、遮光膜6は図2(a)または同
図(b)に示すように細かく分割されるような形状にす
る。方法としては、フォトリソグラフィにて遮光膜6を
形成する際のマスクパターンを変えることで、容易に本
実施例のパターンを持つ遮光膜6を形成することができ
る。At this time, the light-shielding film 6 is shaped so as to be finely divided as shown in FIG. 2 (a) or 2 (b). As a method, by changing the mask pattern when forming the light shielding film 6 by photolithography, the light shielding film 6 having the pattern of this embodiment can be easily formed.
【0013】ここで遮光膜6の分割の間隔は約5μm〜
10μm程度が好ましい。この分割の間隔は広い方が確
実に絶縁されるが、あまり広いと遮光の性能を落とすこ
とになり、コントラストの低い表示となってしまう。Here, the dividing interval of the light shielding film 6 is about 5 μm.
About 10 μm is preferable. The wider the division interval is, the more surely the insulation is provided. However, if it is too wide, the light-shielding performance is deteriorated, resulting in a display with low contrast.
【0014】また、遮光膜6の材料はクロムに限らず、
他の金属や合金あるいは積層構造の金属等、導電性の物
質に関して様々な態様がある。次に、マトリクス状に形
成された遮光膜6に囲まれた領域は各画素領域となり、
各画素領域に赤、緑、青、のカラーフィルタ7を、例え
ば顔料分散法により1.0μm〜2.5μmの膜厚でそ
れぞれ形成する。顔料分散法以外に染色法、印刷法、電
着法等による形成方法でも可能である。The material of the light-shielding film 6 is not limited to chromium,
There are various modes of conductive materials such as other metals, alloys, and metals having a laminated structure. Next, the area surrounded by the light-shielding film 6 formed in a matrix becomes each pixel area,
The red, green, and blue color filters 7 are formed in the respective pixel regions by a pigment dispersion method, for example, with a film thickness of 1.0 μm to 2.5 μm. In addition to the pigment dispersion method, a forming method such as a dyeing method, a printing method, and an electrodeposition method can be used.
【0015】さらに、全面にカラーフィルタ7を保護
し、その表面を平坦化し、対向電極9と遮光膜6を絶縁
するためのトップコート8としてエポキシ樹脂等をスピ
ンナーにより約1μm〜2μm程度の膜厚で形成する。Further, as a top coat 8 for protecting the color filter 7 on the entire surface, flattening the surface, and insulating the counter electrode 9 and the light-shielding film 6, an epoxy resin or the like is formed by a spinner to have a film thickness of about 1 μm to 2 μm. To form.
【0016】次に全面にITOから成る透明電極9を例
えばスパッタ法により膜厚1000A〜2000Aに形
成する。最後に、全面にポリイミドから成る配向膜10
を例えばスピンコート法により膜厚800A〜900A
に形成して、所望の対向基板が完成する。Next, a transparent electrode 9 made of ITO is formed on the entire surface by sputtering, for example, to have a film thickness of 1000A to 2000A. Finally, the alignment film 10 made of polyimide is formed on the entire surface.
To a film thickness of 800A to 900A by, for example, a spin coating method.
Then, the desired counter substrate is completed.
【0017】なお、遮光膜6の分割パターンとして、図
2(a)、(b)の他にも図3の様に一画素ごとに分割
されているパターンである。さらに、図4(a)、
(b)の様に三画素ごとに分割されているパターン等も
ある。The dividing pattern of the light-shielding film 6 is not only the pattern shown in FIGS. 2 (a) and 2 (b) but also the pattern divided for each pixel as shown in FIG. Furthermore, as shown in FIG.
There is also a pattern in which each pixel is divided into three pixels as shown in (b).
【0018】これらの図は分割パターンのほんの一例に
過ぎず、この他に様々な態様が考えられることは言うま
でもない。分割に関しては、微細に分割すればリークの
被害が少なくてすむが、遮光膜を切る部分が多くなるの
で遮光の効果を犠牲にすることになる。そこを考えて設
計をすべきである。It is needless to say that these figures are merely examples of division patterns, and that various modes other than this are conceivable. As for the division, if the division is fine, the damage of the leak can be reduced, but the light shielding effect is sacrificed because the number of portions where the light shielding film is cut increases. The design should be done with that in mind.
【0019】また、本実施例は、対向基板側に遮光膜6
が形成された液晶表示装置であるが、アレイ基板側に遮
光膜が形成された液晶表示装置にも適用できる。さら
に、アクティブマトリクス型液晶表示装置に限らず、二
枚の電極基板に形成される電極がそれぞれストライプ状
であり、それが直交するように組み合わされたシンプル
マトリクス型液晶表示装置にも適用できる。Further, in this embodiment, the light shielding film 6 is provided on the counter substrate side.
Although it is a liquid crystal display device in which is formed, it is also applicable to a liquid crystal display device in which a light shielding film is formed on the array substrate side. Further, not only the active matrix type liquid crystal display device but also the simple matrix type liquid crystal display device in which the electrodes formed on the two electrode substrates each have a stripe shape and are combined so as to be orthogonal to each other.
【0020】また、赤、緑、青の各画素がデルタ配列し
ている遮光膜にも適用できる。このように本実施例は発
明の範囲で多くの変更または修正を加え得ることは勿論
である。It is also applicable to a light-shielding film in which red, green and blue pixels are arranged in a delta. As described above, it is needless to say that the present embodiment can add many changes or modifications within the scope of the invention.
【0021】本実施例の構成によれば、例えば遮光膜6
の形成に起因する突起やトップコート8のピンホール等
によって、対向電極9と遮光膜6が導通状態となって
も、対向電極9と接触している遮光膜6の分割された部
分にのみ電圧がリークし、遮光膜6の他の大部分に電圧
がリークすることが防げ、対向電極3の電圧降下を大幅
に減少することができる。このため表示むらを軽減させ
ることが可能になる。According to the configuration of this embodiment, for example, the light shielding film 6
Even if the counter electrode 9 and the light-shielding film 6 are brought into conduction due to a protrusion or a pinhole in the top coat 8 due to the formation of the above, voltage is applied only to the divided portion of the light-shielding film 6 in contact with the counter electrode 9. Can be prevented from leaking, and the voltage can be prevented from leaking to most other portions of the light shielding film 6, and the voltage drop of the counter electrode 3 can be greatly reduced. Therefore, it is possible to reduce display unevenness.
【0022】[0022]
【発明の効果】本発明によれば、導電性の遮光膜6を分
割パターンに形成することにより、トップコート8上の
透明電極9と遮光膜6が導通しても、対向電極の電圧降
下を少なくくい止めることができ、表示不良を解消する
ことができる。According to the present invention, by forming the conductive light-shielding film 6 in a divided pattern, even if the transparent electrode 9 on the top coat 8 is electrically connected to the light-shielding film 6, the voltage drop of the counter electrode is prevented. It can be stopped with a small amount, and display defects can be eliminated.
【図1】本発明の一実施例における液晶表示装置の構造
示す概略断面図である。FIG. 1 is a schematic cross-sectional view showing the structure of a liquid crystal display device according to an embodiment of the present invention.
【図2】本発明の一実施例における遮光膜のパターンを
示す平面図である。FIG. 2 is a plan view showing a pattern of a light shielding film according to an embodiment of the present invention.
【図3】本発明の一実施例における遮光膜を一画素分に
分割したパターンを示す平面図である。FIG. 3 is a plan view showing a pattern in which a light shielding film according to an embodiment of the present invention is divided into pixels.
【図4】本発明の一実施例における遮光膜を三画素分に
分割したパターンを示す平面図である。FIG. 4 is a plan view showing a pattern obtained by dividing a light shielding film into three pixels according to an embodiment of the present invention.
1、5…透明絶縁性基板 2…TFT 3…画素電極 4、10配向膜 6…遮光膜 7…カラーフィルタ 8…トップコート 9…対向電極 12…液晶 1, 5 ... Transparent insulating substrate 2 ... TFT 3 ... Pixel electrode 4, 10 Alignment film 6 ... Light-shielding film 7 ... Color filter 8 ... Top coat 9 ... Counter electrode 12 ... Liquid crystal
───────────────────────────────────────────────────── フロントページの続き (72)発明者 野瀬 伸市 埼玉県深谷市幡羅町一丁目9番地2号 株 式会社東芝深谷電子工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Nobu Shin Nose, 1-9-9 Harara-cho, Fukaya-shi, Saitama Incorporated company Toshiba Fukaya Electronics Factory
Claims (9)
性の遮光膜が形成され、前記遮光膜が形成された前記透
明絶縁性基板上に絶縁膜が形成され、前記絶縁膜上に透
明電極が形成され、前記透明電極を含む前記透明絶縁性
基板上に配向膜が形成された第一の電極基板と、 透明絶縁性基板上に透明電極が形成され、前記透明電極
が形成された前記絶縁性基板上に配向膜が形成された第
二の電極基板と、 前記第一の電極基板と前記第二の電極基板とに挟持され
た液晶と、を備えた液晶表示装置において、 前記所定パターンは、前記遮光膜の全体が導通すること
なく部分的に分割されていることを特徴とする液晶表示
装置。1. A conductive light-shielding film is formed in a predetermined pattern on a transparent insulating substrate, an insulating film is formed on the transparent insulating substrate on which the light-shielding film is formed, and a transparent electrode is formed on the insulating film. A first electrode substrate on which an alignment film is formed on the transparent insulating substrate including the transparent electrode, and a transparent electrode formed on the transparent insulating substrate, and the insulation on which the transparent electrode is formed. In a liquid crystal display device comprising a second electrode substrate having an alignment film formed on a flexible substrate, and a liquid crystal sandwiched between the first electrode substrate and the second electrode substrate, the predetermined pattern is A liquid crystal display device, wherein the entire light-shielding film is partially divided without electrical conduction.
り画素領域が形成されおり、前記所定パターンは前記行
方向及び列方向にそれぞれ一画素分の長さで分割されて
いることを特徴とする液晶表示装置。2. The liquid crystal display device according to claim 1, wherein a pixel region is formed by the matrix light-shielding film having a row direction and a column direction, and the predetermined pattern is one pixel in each of the row direction and the column direction. A liquid crystal display device characterized by being divided by the length of a minute.
ンは一画素分ごとに分割されていることを特徴とする液
晶表示装置。3. The liquid crystal display device according to claim 1, wherein the light-shielding film forms a pixel region, and the predetermined pattern is divided for each pixel.
ンは三画素分ごとに分割されていることを特徴とする液
晶表示装置。4. The liquid crystal display device according to claim 1, wherein a pixel region is formed by the light shielding film, and the predetermined pattern is divided every three pixels.
示装置において、 前記第一の電極基板または前記第二の電極基板にカラー
フィルタを備えたことを特徴とする液晶表示装置。5. The liquid crystal display device according to claim 1, 2, 3 or 4, wherein a color filter is provided on the first electrode substrate or the second electrode substrate.
示装置において、 前記第一の電極基板または前記第二の電極基板に液晶の
駆動電圧を制御するスイッチング素子を備えたことを特
徴とする液晶表示装置。6. The liquid crystal display device according to claim 1, 2, 3 or 4, wherein the first electrode substrate or the second electrode substrate is provided with a switching element for controlling a drive voltage of liquid crystal. Liquid crystal display device.
示装置において、 前記第一の電極基板、及び前記第二の電極基板の透明電
極はそれぞれストライプ状であり、それぞれのストライ
プが直交して配置されることを特徴とする液晶表示装
置。7. The liquid crystal display device according to claim 1, 2, 3 or 4, wherein the transparent electrodes of the first electrode substrate and the second electrode substrate are stripe-shaped, and the stripes are orthogonal to each other. A liquid crystal display device characterized in that the liquid crystal display device is arranged in a row.
示装置において、 前記遮光膜はクロム、またはクロムを含む合金であるこ
とを特徴とする液晶表示装置。8. The liquid crystal display device according to claim 1, 2, 3 or 4, wherein the light shielding film is made of chromium or an alloy containing chromium.
示装置において、 前記遮光膜が分割される間隔は5μm〜10μmである
ことを特徴とする液晶表示装置。9. The liquid crystal display device according to claim 1, 2, 3 or 4, wherein the interval at which the light shielding film is divided is 5 μm to 10 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7230873A JPH0980414A (en) | 1995-09-08 | 1995-09-08 | Liquid crystal display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7230873A JPH0980414A (en) | 1995-09-08 | 1995-09-08 | Liquid crystal display device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0980414A true JPH0980414A (en) | 1997-03-28 |
Family
ID=16914652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7230873A Pending JPH0980414A (en) | 1995-09-08 | 1995-09-08 | Liquid crystal display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0980414A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0967512A1 (en) * | 1998-01-09 | 1999-12-29 | Citizen Watch Co., Ltd. | Liquid crystal device having leakage current preventive function |
KR100350598B1 (en) * | 1998-06-19 | 2002-08-28 | 닛본 덴기 가부시끼가이샤 | Active matrix liquid crystal display device |
KR100987887B1 (en) * | 2003-06-30 | 2010-10-13 | 엘지디스플레이 주식회사 | In plane switching mode liquid crystal display device |
-
1995
- 1995-09-08 JP JP7230873A patent/JPH0980414A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0967512A1 (en) * | 1998-01-09 | 1999-12-29 | Citizen Watch Co., Ltd. | Liquid crystal device having leakage current preventive function |
EP0967512A4 (en) * | 1998-01-09 | 2002-01-02 | Citizen Watch Co Ltd | Liquid crystal device having leakage current preventive function |
US6744484B1 (en) | 1998-01-09 | 2004-06-01 | Citizen Watch Co., Ltd. | LCD having dummy electrodes or light-cutting film with current leakage preventing slits |
KR100350598B1 (en) * | 1998-06-19 | 2002-08-28 | 닛본 덴기 가부시끼가이샤 | Active matrix liquid crystal display device |
KR100987887B1 (en) * | 2003-06-30 | 2010-10-13 | 엘지디스플레이 주식회사 | In plane switching mode liquid crystal display device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100647097B1 (en) | Liquid crystal display device and method of manufacturing the same | |
KR100857132B1 (en) | liquid crystal display devices and manufacturing method of the same | |
US6208394B1 (en) | LCD device and method for fabricating the same having color filters and a resinous insulating black matrix on opposite sides of a counter electrode on the same substrate | |
JP2655941B2 (en) | Active matrix type liquid crystal display device and manufacturing method thereof | |
US5781261A (en) | Active matrix type LCD having light shield layers and counter electrodes made of the same material | |
US5828434A (en) | Liquid crystal display element with wall shaped spacers form between adjacent transparent electrodes and overlap portions of the light-shielding electrode films | |
US8400606B2 (en) | Liquid crystal display apparatus and method of manufacturing the same | |
JP4162129B2 (en) | Liquid crystal display device and manufacturing method thereof | |
KR100634768B1 (en) | Liquid crystal display device | |
KR20010104067A (en) | A liquid crystal display and a substrate for the same | |
JP2001005006A (en) | Liquid crystal display panel and its production | |
KR100302281B1 (en) | A array substrate of liquid crystal display element, liquid crystal display element using the array substrate and method for manufac turing array substrate | |
JP3777201B2 (en) | Active matrix display device and manufacturing method thereof | |
US6288765B1 (en) | Liquid crystal display device having improved thickness uniformity | |
JPH1184386A (en) | Active matrix type liquid crystal display device | |
KR100462376B1 (en) | reflective type LCD and method for fabricating the same | |
JPH0980414A (en) | Liquid crystal display device | |
US20080149933A1 (en) | Display panel | |
JP3828976B2 (en) | Liquid crystal display element and manufacturing method thereof | |
JPH1090693A (en) | Liquid crystal display element | |
KR101023307B1 (en) | Device and fabrication method for liquid crystal display | |
JP4862008B2 (en) | Liquid crystal display | |
KR100446382B1 (en) | Apparatus for fringe field switching liquid crystal display | |
JP4733263B2 (en) | Color liquid crystal display element | |
KR100956337B1 (en) | Liquid crystal display having improved viewing angle and manufacturing method thereof |