JPH09205056A - Method for stripping and cleaning resist - Google Patents

Abstract

PROBLEM TO BE SOLVED: To eliminate the need for enlarging an organic waste liquid treating tank even if the water in a water washing tank contains a large quantity of organic compound by mixing the waste water from the first water washing stage with a waste liquid of organic solvent and regenerating the mixture through distillation thereby increasing the stripping liquid to be recovered. SOLUTION: A work is subjected to stripping process twice using first and second stripping tanks 1a, 1b. Each stripping tank 1 employs an organic solvent exhibiting strong dissolution as a stripping liquid. Upon finishing immersion in the second stripping tank 1b, the work is immersed into water in a first water washing tank 2a. Excess water in the first water washing tank 2a is fed to a low pressure distillation tube 3. The first stripping tank la receives 100% stripping liquid along with the work and discharges 25% stripping liquid along with the work. Consequently, the low pressure distillation tube 3 receives 75% stripping liquid along with the work.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resist stripping method and a water washing method, and more particularly to a resist stripping method and a water washing method used in manufacturing a liquid crystal display panel.

[0002]

2. Description of the Related Art A liquid crystal display panel, for example, uses a pair of transparent substrates, which are arranged to face each other with a liquid crystal in between, as an envelope, and a display in which a large number of pixels are arranged in a matrix on one transparent substrate surface. The liquid crystal side surface of each transparent substrate is provided with an electronic circuit finely formed by a so-called photolithography technique.

Therefore, when manufacturing such a liquid crystal display panel, formation and removal of the photoresist film are repeated several times on the liquid crystal side surface of each transparent substrate.

In this case, the photoresist film is used as a mask for selectively etching a metal layer or the like formed over the entire liquid crystal side surface of the transparent substrate into a predetermined pattern.

In the manufacture of such a liquid crystal display panel, the photoresist (mask) which is no longer needed on the transparent substrate after the selective etching is formed of a highly soluble organic solvent such as monoethanolamine (MEA). (Hereinafter, referred to as a peeling solution), the transparent substrate is sufficiently washed with water.

That is, as shown in FIG. 2, the first peeling tank 1a, the second peeling liquid 1b, and the first water washing tank 2 are arranged along the transport direction of the transparent substrate (hereinafter, also referred to as a work).
a, the second water washing tank 2b, and the third water washing tank 2c are sequentially arranged. The work is first dipped in each peeling tank 1 in the following order, and when the photoresist film is sufficiently peeled by this, the work is dipped in each washing tank 2 in the following order. It is designed to be washed with water.

In this case, the peeling liquid is supplied from the outside to the second peeling tank 1b, and the excess peeling liquid is poured into the first peeling tank 1a. Then, the excess stripping liquid from the first stripping tank 1a is a vacuum distiller 3
It is collected via the second peeling tank 1b and reused in the second peeling tank 1b. Here, the resist solids and water separated by the vacuum distiller 3 are discharged to a river or the like through the organic waste liquid treatment tank 4.

Pure water is supplied to the third water washing tank 2c, and the surplus pure water is supplied to the second water washing tank 2b.
In addition, the surplus pure water in the second water washing tank 2b is removed by the third water washing tank 2b.
It is pouring into c. And the first flush tank 2
Excess pure water from a is discharged to a river or the like through the organic waste liquid treatment tank (biological treatment tank) 4.

[0009]

However, in the resist stripping and the water washing in such a method, a part of the stripping solution is brought from the second stripping tank 1b to the water washing tank 2 side together with the work, whereby each water washing tank is washed. The water in 2 becomes inevitable.

Although the influence of the contamination on the work can be reduced by providing a larger number of water washing tanks in multiple stages, the peeling liquid brought in with the work cannot be recovered at all.

The water in the water washing tank 2 is used as the organic waste liquid treatment tank 4
Will be discharged to a river or the like, and if the water in the first water washing tank 2a contains a large amount of organic substances, the organic waste liquid processing tank 4 is inevitable. It will be a big one. Therefore, at present, the organic waste liquid treatment tank 4 is obliged to occupy a corner of the premises.

The present invention has been made under these circumstances, and an object thereof is to provide a resist stripping method and a water washing method in which the stripping solution can be more recovered.

Another object of the present invention is to provide a resist stripping and rinsing method which does not require an increase in the size of the organic waste liquid treatment tank even when the water in the rinsing tank contains a large amount of organic substances. is there.

[0014]

In order to achieve such an object, the present invention comprises the following means.

Means 1. In the resist stripping and rinsing method in which the drainage by the stripping solution used for stripping the resist formed on the work is distilled and regenerated on the spot, and the work is washed in multiple stages, one of the drainages from the first washing step is used. It is characterized in that part or all of it is regenerated by distillation together with the drainage of the stripping solution.

Means 2. In the configuration of the means 1, the washing water for washing the work in multiple stages is a portion of the washing water that flows in the direction opposite to the washing order, and the washing water that flows into the first washing stage is the same. It is characterized in that a part of the organic waste liquid is treated.

Since the resist stripping and rinsing method constructed as in the means 1 is constructed so that the stripping liquid brought into the rinsing bath from the stripping tank together with the work can be collected, the stripping liquid can be collected more frequently. I will be able to do it.

Further, in the resist stripping and rinsing method constituted as the means 2, the water from the subsequent rinsing tank is guided to the organic waste liquid treating tank with respect to the rinsing tank capable of recovering the stripping solution. Even if the water in the washing tank contains a large amount of organic substances, the burden on the organic waste liquid treatment tank can be lightened, and the need for increasing the size can be eliminated.

[0019]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a schematic diagram showing an embodiment of the resist stripping and washing method according to the present invention.

In the figure, a first peeling tank 1a, a second peeling tank 1b, and a first water washing tank 2 are arranged along a work transfer path.
a, the second water washing tank 2b, and the third water washing tank 2c are arranged.

The work in this case is, for example, a glass substrate forming a part of a liquid crystal display panel, and a photoresist having a desired pattern on the surface of a metal film or the like formed over the entire main surface of the glass substrate. A film has been formed.

First, the work moving on the transfer route is first.
It is stopped above the stripping tank 1a, then moved downward by a mechanism (not shown) and immersed in the stripping solution in the first stripping tank 1a. Then, after the first immersion is completed, it is moved upward and further to the upper side of the second peeling tank 2b. Then, it is moved downward and immersed in the stripping solution in the second stripping tank 2b.

In this way, the work is placed on the first peeling tank 1a.
The reason why the stripping process is performed twice by using the second stripping tank 1b is that the stripping of the photoresist is performed without the residue. Therefore, the degree of contamination of each stripping solution is the same as that of the first stripping tank 1a and It goes without saying that the size of the second peeling tank 1b becomes smaller in this order.

As the stripping solution in each stripping tank 1, an organic solvent having a strong solubility such as monoethanolamine (MEA) is used.

The work, which has been immersed in the second peeling tank 1b, is then moved upward to the first washing tank 2a.
Is moved to above. Then, it is moved downward and immersed in the water in the first water washing tank 2a.

In this case, the peeling liquid adhering to the work is brought into the first water washing tank 2b together with the work as described above.

After completion of the first immersion as described above,
After that, it is moved upward and is moved to the upper side of the second water washing tank 2b. Then, it is moved downward and immersed in the water in the second water washing tank 2b. Further, similarly, it is immersed in the water in the third water washing tank 2c.

Also in this case, it is necessary to perform the water rinsing treatment three times by using the first water rinsing tank 2a, the second water rinsing tank 2b and the third water rinsing tank 2c in order to improve the reliability of the water rinsing processing. This is because the degree of pollution of each water is
First water washing tank 2a, second water washing tank 2b, and third water washing tank 2
It goes without saying that the size increases in the order of c.

Further, the peeling liquid is supplied from the outside to the second peeling tank 1b.
The excess stripping solution in 1 is poured into the first stripping tank 1a. Then, the excess stripping liquid in the first stripping tank 1a is supplied to the vacuum distiller 3.

This vacuum distiller 3 separates the resist solid content and water by distilling the stripping solution from the first stripping tank 1a, and the resist solid content and water are separated into an organic waste liquid treatment tank (biological treatment tank) 4 At the same time, the stripping liquid from which the resist solid content and water have been separated is recovered and supplied to the second stripping tank 1b for reuse.

On the other hand, pure water is supplied from the outside to the third water washing tank 2c, and the excess pure water in the third water washing tank 2c is poured into the second water washing tank 2b. It is like this.

A part of the surplus water in the second water washing tank 2b is poured into the first water washing tank 2a, and the remaining part is supplied to the organic waste liquid treatment tank 4. It is like this.

Here, from the second flush tank 2b to the first flush tank 2
The amount of pure water poured into a is preferably about three times the amount of the stripping liquid brought from the second stripping tank 1b into the first water washing bath 2a together with the work. That is, the second peeling tank 1b
When the amount of the stripping solution brought in together with the work is 20 l / h, for example, the amount of pure water poured from the second water washing tank 2b into the first water washing tank 2a is preferably set to 60 l / h.

The surplus water in the first water washing tank 2a is supplied to the vacuum distiller 3 described above. Therefore, since the stripping liquid brought into the first water washing bath 2a from the second stripping tank 1b together with the work can be collected, the stripping liquid can be collected more.

In this case, the stripping solution in the first water washing tank 2a is
The concentration will be diluted to about 4 times, and about 25% will be contained in the first flush tank 2a.

In the first water washing tank 2a, the liquid brought in with the work is 100% stripping liquid, whereas the liquid brought out with the work is 25% stripping liquid. The waste liquid sent to the distiller 3 becomes 75% of the stripping liquid brought in together with the work. That is, 75% is recovered from the first water washing tank 2a, and the load on the organic waste liquid treatment tank 4 is reduced to 25%.

Considering the processing capacity of the vacuum distiller 3, in the conventional case, if about 5 times the amount of liquid to be carried out is circulated and used, a processing capacity of 100 l / h is required, whereas In the case of the embodiment, an additional 60 l / h is added.

However, such an increase in processing capacity does not cause any particular problem and has almost no effect on an increase in equipment price or an increase in running cost.

As is clear from the above embodiments, since the stripping solution brought into the washing bath from the stripping tank together with the work can be collected, the stripping solution can be collected more. Become.

Further, since the water from the subsequent water washing tank is guided to the organic waste liquid treatment tank with respect to the water washing tank capable of collecting the stripping solution, even if the water in the water washing tank contains a large amount of organic substances. However, the burden on the organic waste liquid treatment tank can be lightened, and the need for increasing the size can be eliminated.

In the above-mentioned embodiment, the stripping tank 1 has two stages and the flushing tank 2 has three stages, but it goes without saying that the number of each stage is not limited. Is clear.

Although the above-described embodiments describe the method of removing the resist and washing with water in the manufacture of the liquid crystal display panel, the method is not limited to the manufacture of the liquid crystal display panel and may be used for other electronic parts such as semiconductor devices. It goes without saying that it can also be applied to manufacturing.

Further, although the above-mentioned embodiment is for the resist stripping solution, it goes without saying that it can be applied to other various organic solvent cleaning solutions for cleaning electronic parts. Further, the present invention can be applied to the case where the work is spin-spun and flushed with washing water, and the drainage at the initial stage of washing may be recovered and regenerated by distillation together with the organic solvent waste liquid.

[0044]

As is apparent from the above description,
According to the resist stripping and water washing method of the present invention, the stripping solution can be collected more.

Further, even if the water in the washing bath contains a large amount of organic substances, it is possible to eliminate the need to upsize the organic waste liquid treatment bath.

[Brief description of drawings]

FIG. 1 is a configuration diagram showing an embodiment of a resist stripping and washing method according to the present invention.

FIG. 2 is a configuration diagram showing an example of a conventional resist stripping and washing method.

[Explanation of symbols]

1 ... Peeling tank, 2 ... Washing tank, 3 ... Vacuum distiller, 4 ...
… Organic waste treatment tank.

Claims (3)

[Claims] 1. A resist stripping method for removing stains on a work or for distilling and regenerating the drainage of an organic solvent used for stripping a resist on the spot and washing the work in multiple stages. And a water washing method, wherein a part or all of the drainage water from the first water washing step is combined with the drainage of the organic solvent and regenerated by distillation, and the resist stripping and water washing method. 2. The rinsing water for rinsing a work in multiple stages is one in which a part of the rinsing water is introduced in a direction opposite to the order of rinsing, and is one of the rinsing water that is introduced into the first rinsing step. The method according to claim 1, wherein the part is treated with an organic waste liquid. 3. A resist stripping method in which the drainage of an organic solvent used for removing stains on a work or stripping a resist is distilled and regenerated on the spot, and the work is washed in multiple stages. And a method of washing with water, wherein a part or all of the drainage water from the first washing step is combined with the drainage of the organic solvent for distillation regeneration.