JPH08236924A - Device and method for removing semiconductor - Google Patents
Device and method for removing semiconductorInfo
- Publication number
- JPH08236924A JPH08236924A JP7039698A JP3969895A JPH08236924A JP H08236924 A JPH08236924 A JP H08236924A JP 7039698 A JP7039698 A JP 7039698A JP 3969895 A JP3969895 A JP 3969895A JP H08236924 A JPH08236924 A JP H08236924A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- substrate
- heating resistor
- bump
- flow path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/799—Apparatus for disconnecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置から半導体素
子あるいは半導体パッケ−ジを取りはずす装置及びその
方法に係り、特にバンプを介して基板に半導体素子等を
基板に接続した半導体装置から半導体を取りはずすに好
適な装置及び方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device and method for removing a semiconductor element or a semiconductor package from a semiconductor device, and more particularly to a semiconductor device in which a semiconductor element or the like is connected to the substrate via bumps. Apparatus and method suitable for.
【0002】[0002]
【従来の技術】近年の半導体装置の高速化は半導体及び
実装の高密度化を促進させている。このため、半導体チ
ップは大型化が進み、半導体及びそのパッケ−ジは接続
面全面に接続パッドを持つフリップチップ型のものが多
用され、基板上に多数の半導体を半田等の低融点金属で
搭載する実装構造が増えている。このような半導体装置
の製造工程等において一部の半導体に不具合が検出され
た場合、それらの半導体又はそのパッケ−ジを取りはず
す必要が生じる。このためには他の半導体接続部に損傷
を与えぬように一個の半導体又はパッケ−ジの接続部を
その融点以上に加熱する必要がある。従来の周辺のみに
接続部がある場合は赤外線等で照射加熱することが可能
であった。また、半導体又はパッケ−ジガ小さい場合
は、長時間要するものの背面から全体を加熱することも
可能であった。2. Description of the Related Art The recent increase in the speed of semiconductor devices has accelerated the densification of semiconductors and packaging. For this reason, semiconductor chips are becoming larger in size, and semiconductors and their packages are often flip-chip type having connection pads on the entire connection surface, and many semiconductors are mounted on a substrate with a low melting point metal such as solder. The number of mounting structures that can be used is increasing. When a defect is detected in some semiconductors in the manufacturing process of such a semiconductor device, it becomes necessary to remove those semiconductors or their packages. For this purpose, it is necessary to heat the connecting portion of one semiconductor or package to its melting point or higher so as not to damage other semiconductor connecting portions. In the conventional case where there is a connecting portion only in the periphery, it was possible to irradiate and heat with infrared rays or the like. In the case of a semiconductor or a small package, it took a long time to heat the entire surface from the back surface.
【0003】[0003]
【発明が解決しようとする課題】しかし、大型の半導体
又はパッケ−ジで全面に接続バンプがある場合は周辺か
らの赤外線照射は適用出来ないばかりでなく、背面から
の加熱も長時間を要し、周辺の半導体等の接続に損傷を
与える。更に、樹脂を用いたパッケ−ジでは背面からの
加熱は非常に困難である。However, when a large semiconductor or package has connection bumps on the entire surface, infrared irradiation from the periphery cannot be applied, and heating from the back also requires a long time. , Damage the connection of surrounding semiconductors. Furthermore, it is very difficult to heat from the back side of a package using resin.
【0004】本発明の目的は前述の大型で全面にバンプ
を持つフリップチップ型の半導体又はそのパッケ−ジを
取りはずす手段を提供することにある。An object of the present invention is to provide a means for removing the large-sized flip chip type semiconductor having bumps on the entire surface thereof or the package thereof.
【0005】[0005]
【課題を解決するための手段】この目的は接続バンプ高
さより厚さ又は径の小さな発熱抵抗体に通電し、バンプ
を溶融切断し、再付着を防止することで達成できる。ま
た、チップと基板の間に加熱気体の流路を形成し、引上
げ荷重を作用させながら接続部を加熱気体で溶融させる
ことで達成できる。◆本発明の除去装置及び方法は以下
のいずれかを特徴とする。This object can be achieved by energizing a heating resistor having a thickness or diameter smaller than the height of the connecting bump to melt and cut the bump to prevent reattachment. Further, it can be achieved by forming a heated gas flow path between the chip and the substrate and melting the connection portion with the heated gas while applying a pulling load. The removal device and method of the present invention are characterized by any of the following.
【0006】(1):半導体又は半導体パッケ−ジをバ
ンプ部を介して基板に接続した半導体装置の一部の半導
体又は半導体パッケ−ジをそのバンプを溶融させて基板
から取り除く半導体除去装置において、バンプ高さより
直径の小さい線又はバンプ高さより板厚の小さい板状の
発熱抵抗体を隣合う2つの半導体又は半導体パッケ−ジ
の間に入り得る断面寸法を持つ2つの端子間に接続する
こと。(1): A semiconductor removing device for removing a part of a semiconductor or semiconductor package of a semiconductor device in which a semiconductor or a semiconductor package is connected to a substrate through a bump portion by melting the bump and removing it from the substrate, A wire having a diameter smaller than the bump height or a plate-shaped heating resistor having a smaller plate thickness than the bump height is connected between two terminals having a cross-sectional size that can be inserted between two adjacent semiconductors or semiconductor packages.
【0007】(2):(1)において、発熱抵抗体の電
気回路は発熱抵抗体部以外では半導体及び基板の(ア−
スを含む)すべての電気回路から分離されていること。
◆ (3):(1)または(2)において、発熱抵抗体の端
子内側で端子に隣接する部分の幅が半導体又は半導体パ
ッケ−ジの実装間隔より小さいこと。(2): In (1), the electric circuit of the heat-generating resistor has a semiconductor circuit and a substrate (
Separated from all electrical circuits).
◆ (3): In (1) or (2), the width of the portion inside the terminal of the heating resistor adjacent to the terminal is smaller than the mounting interval of the semiconductor or the semiconductor package.
【0008】(4):(3)において、発熱抵抗体の端
子内側部にスリットを設けるなどしてバンプ材料の再固
着を防止する機能を有すること。◆ (5):(3)において、発熱抵抗体の端子内側部に絶
縁性の膜等を接合すること。◆ (6):(1)または(2)において、発熱抵抗体にセ
ラミックと樹脂膜、又はこれらのいずれかが接合されて
いること。(4): In (3), the heating resistor has a function of preventing re-fixation of the bump material by providing a slit inside the terminal. ◆ (5): In (3), an insulating film or the like is bonded to the inside of the terminal of the heating resistor. ◆ (6): In (1) or (2), either the ceramic and the resin film, or one of them is bonded to the heating resistor.
【0009】(7):半導体又は半導体パッケ−ジをバ
ンプ部を介して基板に接続した半導体装置の一部の半導
体又は半導体パッケ−ジをそのバンプを溶融させて基板
から取り除く装置であって、半導体又は半導体パッケ−
ジの1個のみを覆い、その下面の1辺と基板の間から流
入し、対向する他の1辺と基板の間から流出する流路を
形成し、この流路を含む循環流路を形成し流路内にヒ−
タとファンとを有すること。(7) A device for removing a part of a semiconductor or semiconductor package of a semiconductor device in which a semiconductor or a semiconductor package is connected to a substrate through a bump portion by melting the bump and removing it from the substrate, Semiconductor or semiconductor package
A flow path that covers only one of the lower surfaces, flows in between one side of the lower surface and the substrate, and flows out between the other opposite side and the substrate, and forms a circulation flow path including this flow path. Hear in the flow path
Have a fan and a fan.
【0010】(8):(7)において、半導体又は半導
体パッケ−ジの背面を吸着して引き上げ力をさせる機構
を有すること。◆ (9):(1)乃至(8)のいずれかの半導体除去装置
を半導体又は半導体パッケ−ジの除去方法に用いるこ
と。◆ (10):(1)乃至(8)のいずれかの半導体除去装
置を、または(9)の除去方法を用いて半導体装置を製
造すること。(8): In (7), a mechanism for adsorbing the rear surface of the semiconductor or the semiconductor package to provide a pulling force is provided. (9): Use the semiconductor removing device according to any one of (1) to (8) in a method for removing a semiconductor or a semiconductor package. (10): Manufacturing a semiconductor device using the semiconductor removing device according to any one of (1) to (8) or the removing method according to (9).
【0011】[0011]
【作用】電極間に接続された細線又は箔状の導電性発熱
体に電流又は電圧を制御して通電すると半導体素子等の
接続バンプを形成する低融点金属の融点以上にすること
ができる。これを接続バンプに接触させるとバンプは溶
融し半導体素子等を基板から取りはずすことが出来る。
またチップと基板間に気体の流路を形成し、ここに加熱
気体を流すことで熱伝達率の向上を図り、他のチップの
接続部が熱伝導により損傷を生じる温度に上昇する前に
該当チップを取りはずすことができる。When the thin wire or foil-shaped conductive heating element connected between the electrodes is energized by controlling the current or voltage, the melting point of the low melting point metal for forming the connection bump of the semiconductor element or the like can be raised. When this is brought into contact with the connection bump, the bump melts and the semiconductor element or the like can be removed from the substrate.
In addition, a gas flow path is formed between the chip and the substrate, and the heating gas is caused to flow through this to improve the heat transfer coefficient, which is applicable before the temperature rises to the temperature at which the connection part of another chip is damaged by heat conduction. The tip can be removed.
【0012】[0012]
【実施例】以下、本発明を実施例の図により説明する。
図1は本発明の第1の実施例である。◆図1では基板2
に半導体チップ又は半導体パッケ−ジ1が半田ボ−ルな
どの接続バンプ3により接続されている。バンプ高さよ
り薄い発熱抵抗体4がホルダ−電極5に発熱体固定ネジ
6で固定されている。これにより、損傷し易い発熱体の
交換が可能になる。The present invention will be described below with reference to the drawings of the embodiments.
FIG. 1 is a first embodiment of the present invention. ◆ Board 2 in Figure 1
Further, a semiconductor chip or a semiconductor package 1 is connected by connecting bumps 3 such as solder balls. A heating resistor 4 thinner than the bump height is fixed to the holder-electrode 5 with a heating element fixing screw 6. As a result, it becomes possible to replace the heating element that is easily damaged.
【0013】ホルダ−7は電極5の固定及び電極5と電
源をつなぐ導電体の固定と絶縁の役割を果たす。このホ
ルダ−はXYZステ−ジ52に接続されたア−ム51に
取り付けられており、XYZステ−ジにより取りはずす
べき半導体等の位置に移動すると共に発熱体が半導体等
1と基板2の間に入るよう高さを調節する。この後発熱
体を移動させ接続バンプを溶融切断する。The holder 7 plays a role of fixing the electrode 5 and fixing and insulating a conductor connecting the electrode 5 and a power source. This holder is attached to an arm 51 connected to an XYZ stage 52, moves to the position of a semiconductor or the like to be removed by the XYZ stage, and a heating element is placed between the semiconductor 1 and the substrate 2. Adjust the height to fit. After that, the heating element is moved to melt and cut the connection bump.
【0014】この実施例では発熱体としてステンレス箔
を用いており、半田が発熱体に固着することがない。半
導体等の間隔は一般に小さいため、電極は半導体等の背
面の高さより長くし、かつこの高さより上で発熱体をネ
ジどめすることで、より小さい半導体間隔に適応でき
る。またこの実施例では、発熱部の幅をバンプ径より大
きくしてバンプ構成金属の再固着を防いでいる。In this embodiment, the stainless steel foil is used as the heating element, and the solder does not stick to the heating element. Since the distance between semiconductors and the like is generally small, the electrode can be made longer than the height of the back surface of the semiconductor and the heating element can be screwed above this height to accommodate a smaller semiconductor distance. Further, in this embodiment, the width of the heat generating portion is made larger than the diameter of the bump to prevent re-bonding of the bump-constituting metal.
【0015】図2に第2の実施例を示す。この図は手持
ち型を示しているが、自動装置に取り付けても同様の効
果がある。発熱体4はステンレス等半田の濡れ性の悪い
材料でできており、スリット11を有している。このス
リットの有る部分には電気がほとんど流れないため発熱
しない。このためスリットの無い部分で溶融したバンプ
材料はこの部分に触れると冷されて凝固し、基板と半導
体等の接続パッド間の再固着を防ぐ。FIG. 2 shows a second embodiment. Although this figure shows a hand-held type, the same effect can be obtained even when attached to an automatic device. The heating element 4 is made of a material such as stainless steel having poor solder wettability and has a slit 11. Electricity hardly flows to the part with the slit, so that it does not generate heat. Therefore, the bump material melted at the portion without slits is cooled and solidified when touching this portion, and prevents re-adhesion between the substrate and the connection pad such as a semiconductor.
【0016】スリットの無い部分の幅が半導体等の実装
間隔より小さければ、発熱体の曲げ剛性が小さいため、
基板と半導体等間に挿入することができる。このスリッ
トと同様の効果は、発熱抵抗体に絶縁性の膜等を接合し
ても達成できる。図2の電極の外側には切り込み12が
有り、発熱体がずれることを防ぐ。またホルダ−7には
発熱体張力付与機構13が備えられている。これは調整
ネジで両側の軸を介してホルダ−をおし拡げることによ
り発熱体に張力を付与し、発熱体の変形抵抗を増すもの
で、これにより、半導体等と基板の間への挿入を容易に
すると共にバンプの溶融切断作業の迅速化を図れる。If the width of the non-slit portion is smaller than the mounting interval of the semiconductor or the like, the bending rigidity of the heating element is small,
It can be inserted between the substrate and the semiconductor or the like. The same effect as this slit can be achieved by joining an insulating film or the like to the heating resistor. There are notches 12 on the outside of the electrodes in FIG. 2 to prevent the heating element from shifting. Further, the holder 7 is provided with a heating element tension applying mechanism 13. This is to increase the deformation resistance of the heating element by applying tension to the heating element by expanding the holder through the shafts on both sides with the adjusting screw, which allows insertion between the semiconductor and the substrate. This facilitates and speeds up the melt cutting work of the bump.
【0017】図3に第3の実施例を示す。発熱体は必ず
しも導電性材料だけで有る必要は無い。第3図では、導
電性発熱体4に銀ロウ等でセラミック21を固着してい
る。これにより熱容量が増大し作業が円滑になる。また
スリット部にはポリイミド等の樹脂膜を設けている。こ
れによりスリットからの半田の漏れを防げる。また発熱
抵抗体がバンプ材の濡れ性が良い場合は樹脂膜を両面に
設けることにより発熱体への溶融金属の付着を防げる。FIG. 3 shows a third embodiment. The heating element does not necessarily have to be a conductive material. In FIG. 3, the ceramic 21 is fixed to the conductive heating element 4 with silver solder or the like. As a result, the heat capacity increases and the work becomes smooth. Further, a resin film such as polyimide is provided in the slit portion. This prevents the solder from leaking from the slit. When the heating resistor has good wettability with the bump material, a resin film is provided on both sides to prevent the molten metal from adhering to the heating element.
【0018】第4の実施例を図4に示す。この例では導
電性発熱体としてニッケル等の半田濡れ性の良い金属の
箔を用いている。この発熱体では幅の広い部分に半田を
付着させることで半導体等と基板のパッドへの溶融金属
の付着を防ぐ。A fourth embodiment is shown in FIG. In this example, a metal foil having good solder wettability such as nickel is used as the conductive heating element. In this heating element, solder is attached to a wide portion to prevent the molten metal from adhering to the pads of the semiconductor and the substrate.
【0019】図5は第5の実施例を示す。この例では発
熱体としてワイヤ−を用いている。この場合は溶融金属
の再付着を防止するのが困難なため溶融金属を半導体等
と基板のあいだから押し出してしまう必要が有り、ワイ
ヤ−径は箔の場合の厚さに比べ大きく取る必要が有る。FIG. 5 shows a fifth embodiment. In this example, a wire is used as the heating element. In this case, it is difficult to prevent the reattachment of the molten metal, so it is necessary to extrude the molten metal between the semiconductor and the substrate, and the wire diameter needs to be larger than the thickness of the foil. .
【0020】図6は第6の実施例を示す。本実施例は熱
風を半導体等1と基板2の間に有る接続バンプに吹き付
けるための装置で有る。流路30内にはヒ−タ31とモ
−タ32により駆動されるファン33が有る。流路内壁
36は半導体等の上部と弾性体34を介した接触してい
る。FIG. 6 shows a sixth embodiment. The present embodiment is an apparatus for blowing hot air onto the connection bumps between the semiconductor 1 and the substrate 2. Inside the flow path 30 is a fan 33 driven by a heater 31 and a motor 32. The inner wall 36 of the flow path is in contact with the upper portion of the semiconductor or the like via the elastic body 34.
【0021】外壁35は弾性体を介して基板2に接触し
ている。側壁37は半導体等の側面にほぼ接触している
が同時に弾性体を介して半導体等の上面と基板に接触し
ている。これによりファンにより送られた空気はヒ−タ
で加熱され、半導体等と基板の間に流入し接続バンプを
加熱する。このように空気を循環させることにより流路
内のバンプを急速に加熱することができ、周辺の半導体
等の接続に悪影響を及ぼすこと無く流路内の半導体等を
取りはずすことが可能である。The outer wall 35 is in contact with the substrate 2 via an elastic body. The side wall 37 is almost in contact with the side surface of the semiconductor or the like, but at the same time is in contact with the upper surface of the semiconductor or the like and the substrate via the elastic body. As a result, the air sent by the fan is heated by the heater and flows between the semiconductor and the substrate to heat the connection bumps. By circulating the air in this way, the bumps in the flow channel can be rapidly heated, and the semiconductor and the like in the flow channel can be removed without adversely affecting the connection of peripheral semiconductors and the like.
【0022】また本実施例では半導体等の上面には吸盤
39が接触しており、この吸盤はベロ−38を介して真
空ポンプ40に到る流路につながっている。半導体等を
この吸盤で引き上げながら加熱することにより溶融金属
の再付着を防げる。In this embodiment, the suction cup 39 is in contact with the upper surface of the semiconductor or the like, and this suction cup is connected to the flow path to the vacuum pump 40 via the tongue 38. It is possible to prevent the reattachment of the molten metal by heating the semiconductor or the like while pulling it up with this suction cup.
【0023】[0023]
【発明の効果】本発明によると全面に接続バンプを有す
る大型の半導体素子及びそのパッケ−ジの取外しが可能
となる。According to the present invention, a large-sized semiconductor device having connection bumps on the entire surface and its package can be removed.
【図1】本発明の第一の実施例の概観図である。FIG. 1 is a schematic view of a first embodiment of the present invention.
【図2】本発明の第二の実施例の概観図である。FIG. 2 is a schematic view of a second embodiment of the present invention.
【図3】本発明の第三の実施例の発熱体上面図及び断面
図である。FIG. 3 is a top view and a sectional view of a heating element according to a third embodiment of the present invention.
【図4】本発明の第四の実施例の発熱体上面図である。FIG. 4 is a top view of a heating element according to a fourth embodiment of the present invention.
【図5】本発明の第五の実施例の概観図である。FIG. 5 is a schematic view of a fifth embodiment of the present invention.
【図6】本発明の第六の実施例の概観図である。FIG. 6 is a schematic view of a sixth embodiment of the present invention.
1…半導体又は半導体パッケ−ジ、2…基板、3…接続
バンプ、4…導電性発熱体、5…電極、6…発熱体固定
ネジ、7…ホルダ−、11…スリット、12電極切り込
み、13…発熱体張力付与機構、14…調整ネジ、21
…セラミック、22…樹脂膜、30…流路、31…ヒ−
タ、32…モ−タ、33…ファン、34…弾性体、35
…流路外壁、36…流路内壁、37…流路側壁、38…
ベロ−、39…吸盤、40…しんくうポンプ、51…ア
−ム、52…XYZステ−ジ、53…電流又は電圧制御
装置。DESCRIPTION OF SYMBOLS 1 ... Semiconductor or semiconductor package, 2 ... Substrate, 3 ... Connection bump, 4 ... Conductive heating element, 5 ... Electrode, 6 ... Heating element fixing screw, 7 ... Holder, 11 ... Slit, 12 Electrode notch, 13 … Heating element tension applying mechanism, 14… Adjusting screw, 21
... ceramic, 22 ... resin film, 30 ... flow path, 31 ... hi
32, motor, 33, fan, 34, elastic body, 35
... channel outer wall, 36 ... channel inner wall, 37 ... channel side wall, 38 ...
Bello, 39 ... Sucker, 40 ... Shinpu pump, 51 ... Arm, 52 ... XYZ stage, 53 ... Current or voltage control device.
Claims (17)
介して基板に接続した半導体装置の一部の半導体又は半
導体パッケ−ジをそのバンプを溶融させて基板から取り
除く半導体除去装置において、バンプ高さより直径の小
さい線又はバンプ高さより板厚の小さい板状の発熱抵抗
体を隣合う2つの半導体又は半導体パッケ−ジの間に入
り得る断面寸法を持つ2つの端子間に接続することを特
徴とする半導体除去装置。1. A semiconductor removing apparatus for removing a part of a semiconductor or semiconductor package of a semiconductor device in which a semiconductor or a semiconductor package is connected to a substrate through a bump portion from the substrate by melting the bump. A wire having a smaller diameter or a plate-shaped heating resistor having a smaller thickness than the bump height is connected between two terminals having a cross-sectional dimension that can be inserted between two adjacent semiconductors or semiconductor packages. Semiconductor removing device.
では半導体及び基板の(ア−スを含む)全ての電気回路
から分離されていることを特徴とする請求項1に記載の
半導体除去装置。2. The semiconductor circuit according to claim 1, wherein the electric circuit of the heating resistor is separated from all the electric circuits of the semiconductor and the substrate (including the ground) except for the heating resistor section. Removal device.
分の幅が半導体又は半導体パッケ−ジの実装間隔より小
さいことを特徴とする請求項1または2に記載の半導体
除去装置。3. The semiconductor removing apparatus according to claim 1, wherein a width of a portion of the heating resistor inside the terminal adjacent to the terminal is smaller than a mounting interval of the semiconductor or the semiconductor package.
てバンプ材料の再固着を防止する機能を有することを特
徴とする請求項3に記載の半導体除去装置。4. The semiconductor removing apparatus according to claim 3, wherein a slit is provided inside the terminal of the heating resistor to prevent the re-fixation of the bump material.
合することを特徴とする請求項3に記載の半導体除去装
置。5. The semiconductor removing apparatus according to claim 3, wherein an insulating film is bonded to the inside of the terminal of the heating resistor.
れらのいずれかが接合されていることを特徴とする請求
項1または2に記載の半導体除去装置。6. The semiconductor removing device according to claim 1, wherein the heating resistor is bonded to the ceramic and the resin film, or one of them.
介して基板に接続した半導体装置の一部の半導体又は半
導体パッケ−ジをそのバンプを溶融させて基板から取り
除く装置であって、半導体又は半導体パッケ−ジの1個
のみを覆い、その下面の1辺と基板の間から流入し、対
向する他の1辺と基板の間から流出する流路を形成し、
この流路を含む循環流路を形成し流路内にヒ−タとファ
ンを持つことを特徴とする半導体除去装置。7. An apparatus for removing a part of a semiconductor or a semiconductor package of a semiconductor device in which the semiconductor or the semiconductor package is connected to the substrate through a bump portion from the substrate by melting the bump. Forming a flow path that covers only one of the semiconductor packages and that flows in between one side of the lower surface and the substrate and flows out between the other one side and the substrate that face each other.
A semiconductor removing device characterized by forming a circulation flow path including this flow path and having a heater and a fan in the flow path.
して引き上げ力をさせる機構を有することを特徴とする
請求項7に記載の半導体除去装置。8. The semiconductor removing apparatus according to claim 7, further comprising a mechanism for adsorbing a rear surface of the semiconductor or the semiconductor package to apply a pulling force.
介して基板に接続した半導体装置の一部の半導体又は半
導体パッケ−ジをそのバンプを溶融させて基板から取り
除く半導体除去方法において、バンプ高さより直径の小
さい線又はバンプ高さより板厚の小さい板状の発熱抵抗
体を隣合う2つの半導体又は半導体パッケ−ジの間に入
り得る断面寸法を持つ2つの端子間に接続した装置を用
いることを特徴とする半導体除去方法。9. A semiconductor removing method for removing a part of a semiconductor or a semiconductor package of a semiconductor device in which a semiconductor or a semiconductor package is connected to a substrate through a bump portion from the substrate by melting the bump. Using a device in which a wire having a smaller diameter or a plate-shaped heating resistor having a smaller thickness than the bump height is connected between two terminals having a cross-sectional dimension that can be inserted between two adjacent semiconductors or semiconductor packages. A method for removing a semiconductor, comprising:
外では半導体及び基板の(ア−スを含む)すべての電気
回路から分離されていることを特徴とする請求項9に記
載の半導体除去方法。10. The semiconductor circuit according to claim 9, wherein the electric circuit of the heating resistor is separated from all the electric circuits of the semiconductor and the substrate (including the ground) except for the heating resistor section. Removal method.
部分の幅が半導体又は半導体パッケ−ジの実装間隔より
小さいことを特徴とする請求項9または10に記載の半
導体除去方法。11. The semiconductor removing method according to claim 9, wherein a width of a portion of the heating resistor inside the terminal adjacent to the terminal is smaller than a mounting interval of the semiconductor or the semiconductor package.
けてバンプ材料の再固着を防止する機能を有することを
特徴とする請求項11に記載の半導体除去方法。12. The method for removing a semiconductor according to claim 11, wherein a slit is provided inside the terminal of the heating resistor to prevent the re-fixation of the bump material.
接合することを特徴とする請求項11に記載の半導体除
去方法。13. The method for removing a semiconductor according to claim 11, wherein an insulative film is bonded to the inside of the terminal of the heating resistor.
これらのいずれかが接合されていることを特徴とする請
求項9または10に記載の半導体除去方法。14. The semiconductor removing method according to claim 9, wherein the heating resistor is bonded to the ceramic and the resin film, or one of them.
を介して基板に接続した半導体装置の一部の半導体又は
半導体パッケ−ジをそのバンプを溶融させて基板から取
り除く方法であって、半導体又は半導体パッケ−ジの1
個のみを覆い、その下面の1辺と基板の間から流入し、
対向する他の1辺と基板の間から流出する流路を形成
し、この流路を含む循環流路を形成し流路内にヒ−タと
ファンを持つことを特徴とする半導体除去方法。15. A method of melting a part of a semiconductor or a semiconductor package of a semiconductor device in which the semiconductor or the semiconductor package is connected to the substrate through a bump portion, and removing the semiconductor or the semiconductor package from the substrate by melting the bump. 1 of semiconductor package
Covers only the individual, and flows in from one side of the lower surface and the board,
A semiconductor removing method characterized in that a flow path is formed to flow out between another opposite side and a substrate, a circulation flow path including this flow path is formed, and a heater and a fan are provided in the flow path.
着して引き上げ力をさせる機構を有することを特徴とす
る請求項15に記載の半導体除去方法。16. The method for removing a semiconductor according to claim 15, further comprising a mechanism for adsorbing a rear surface of the semiconductor or the semiconductor package to apply a pulling force.
することを特徴とする半導体装置。17. A semiconductor device manufactured by using the removing method according to claim 16.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7039698A JPH08236924A (en) | 1995-02-28 | 1995-02-28 | Device and method for removing semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7039698A JPH08236924A (en) | 1995-02-28 | 1995-02-28 | Device and method for removing semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08236924A true JPH08236924A (en) | 1996-09-13 |
Family
ID=12560248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7039698A Pending JPH08236924A (en) | 1995-02-28 | 1995-02-28 | Device and method for removing semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08236924A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003008144A1 (en) * | 2001-07-17 | 2003-01-30 | Waka Manufacturing Co., Ltd. | Resistance welding method and resistance welding machine |
US6860419B2 (en) * | 2002-08-30 | 2005-03-01 | Agilent Technologies, Inc. | Apparatus and method for controlling movement of a device after packaging |
JP2007258285A (en) * | 2006-03-22 | 2007-10-04 | Asti Corp | Removal device of electronic part |
US7500308B2 (en) | 1999-09-01 | 2009-03-10 | Fujitsu Limited | Method of detaching electronic component from printed circuit board |
-
1995
- 1995-02-28 JP JP7039698A patent/JPH08236924A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7500308B2 (en) | 1999-09-01 | 2009-03-10 | Fujitsu Limited | Method of detaching electronic component from printed circuit board |
WO2003008144A1 (en) * | 2001-07-17 | 2003-01-30 | Waka Manufacturing Co., Ltd. | Resistance welding method and resistance welding machine |
US6860419B2 (en) * | 2002-08-30 | 2005-03-01 | Agilent Technologies, Inc. | Apparatus and method for controlling movement of a device after packaging |
JP2007258285A (en) * | 2006-03-22 | 2007-10-04 | Asti Corp | Removal device of electronic part |
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