JPH08227883A - Thermal treatment device - Google Patents

Abstract

PURPOSE: To enable the joint of a thermal treatment device to be hermetically sealed up by a method wherein flanges are provided to the joint between a gas inlet pipe or a gas exhaust pipe and an external communicating pipe, and a sealing member is disposed between the opposed surfaces of the flanges and restrained from rising in temperature. CONSTITUTION: A gas inlet pipe 15 is connected to one lower part of a reaction tube 8, and a gas feed pipe 6 is hermetically connected to the gas inlet pipe 15 through the intermediary of a joint 20. An exhaust pipe 17 is connected to the other lower part of the reaction tube 8, and a gas exhaust pipe 16 is hermetically connected to the exhaust pipe 17 through the intermediary of another joint 20. Flanges 30 and 31 are provided in the joints 20 respectively, and a sealing member 36 is arranged between the opposed surfaces of the flanges 30 and 31. The sealing member 36 is restrained from rising in temperature by controlling a voltage applied to a resistance heater 11. By this setup, the joint 20 is hermetically sealed up.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a heat treatment apparatus.

[0002]

2. Description of the Related Art An oxidation / diffusion device is an example of a heat treatment device having a process tube for supplying a process gas in heat treatment of an object to be processed in a semiconductor manufacturing process.

When the oxidation treatment is carried out in the above heat treatment apparatus, steam is generated by combusting hydrogen and oxygen in the combustion cylinder to form steam, and the steam forms a heating furnace in which the object to be treated is arranged. It is designed to be fed into the tube. For this reason, the object to be processed placed in a high-temperature atmosphere containing water vapor produces an oxide film on the surface due to its own alteration.

Also, when the diffusion treatment is carried out in the heat treatment apparatus, a process tube forming a heating furnace for heating the object to be processed is used, and the impurity compound is added to the object to be processed arranged in the process tube. The impurity atoms are diffused on the surface of the object to be processed by supplying the evaporated gas from the.

As described above, in the heat treatment apparatus such as the oxidation / diffusion apparatus, the supply tube is used to supply the process gas from the supply source to the process tube as a matter of course. With this quartz tube, it is a conventional means to connect a short take-out tube attached to a process tube and a short take-out tube attached to a supply source by connecting a connecting pipe.

By the way, in the case where an oxide film is generated by performing an oxidation treatment in the above-mentioned heat treatment apparatus, the so-called in-plane uniformity for making the thickness of the film formed on the surface of the object to be processed uniform. Is important. For this purpose, it is necessary to maintain the temperature of the gas to be supplied, that is, the temperature of water vapor, in a state where the temperature does not greatly change with respect to the processing temperature.

Therefore, in order to prevent such a decrease in the temperature of the supply gas, it is naturally conceivable to shorten the distance between the process tube and the combustion cylinder.

The connecting means at both ends of the connecting pipe is shown in FIG.
There is a means such as a structure in which the flange 120 is provided at the end of the pipe, the facing surfaces of the flange 120 are brought into contact with each other, and the O-ring 121 is interposed between the facing surfaces of the flange 120 as shown in FIG.

[0009]

However, the above-described connecting structure has a problem that the airtightness of the connecting portion deteriorates with time.

That is, as a measure against this kind of problem, the process tubes and pipes are regularly cleaned to prevent impurities such as particles from admixing and adhering to the wafer. Therefore, although the above-mentioned connecting portion is also a cleaning target, for example, the chemical liquid used for this cleaning impairs the flatness of the joint surface at the connecting portion, thereby deteriorating the airtightness at the joint surface. Sometimes. For example, when a hydrofluoric acid-based solvent is used as the cleaning liquid, the surface of the quartz tube is corroded and becomes rough, and the flatness of the connecting surface is impaired, resulting in poor airtightness.

Therefore, when the airtightness is deteriorated, the process gas used for the heat treatment in the heat treatment apparatus is liable to leak, and impurities such as oxygen, especially from the outside, may be allowed to infiltrate. . Therefore, in the case of the oxidation treatment, the amount of water vapor set to form an oxide film having a predetermined thickness may change,
The desired film quality may not be obtained due to the inclusion of oxygen from the outside. By the way, when oxygen is trapped from the outside, the quality of the oxide film on the object to be processed, which is generated only by oxygen contained in the steam supplied from the combustion cylinder, changes. Moreover, when the situation in which oxygen is involved or not involved occurs, the properties of the oxide film of the object to be processed change for each object to be processed, and the yield of the object to be processed deteriorates.

When a process gas leaks, for example, chlorine gas may be used as one of the oxidizing gases. In this case, there is a risk that an operator may suck the leaked gas. is there.

Such deterioration of the airtightness is remarkable in a flat flange or a spherical connecting portion in which quartz is directly contacted with each other.

Therefore, in order to solve the problem in such a structure in which the connecting surfaces directly contact each other, when an O-ring is interposed between the connecting surfaces of the connecting portions as shown in FIG. 9, airtightness is ensured. If the O-ring has low heat resistance or corrosion resistance, the airtightness may be impaired.

That is, when a rubber O-ring is used as the O-ring, the heat resistance is low,
Contact with water vapor or the above-mentioned chlorine gas used in the oxidation step may generate impurities such as sulfur.

In particular, since the supply quartz tube provided in the process tube has a relatively short length, the infrared rays emitted from the heat source and transmitted through the peripheral wall of the process tube easily reach the joint surface, and the temperature at the joint portion increases. The rise is significant. Therefore, when the O-ring falls into an overheated state, it becomes difficult to ensure airtightness in that portion.

Therefore, in order to avoid such a situation, it is conceivable to use a metal gasket having a relatively high heat resistance, but when such a gasket is used, the gasket is airtight by spring back. It is necessary to increase the fastening force between the quartz tubes in order to obtain the property.
However, when the fastening force is increased, there is a new problem that the quartz connecting portion is damaged.

As described above, if the airtightness at the connecting portion between the quartz tubes deteriorates, it becomes impossible to maintain desired film forming conditions.

Although the above is given as a problem in the case where the oxidation treatment is carried out by the heat treatment apparatus, the same problem may occur in the diffusion process.

Therefore, an object of the present invention is to provide a heat treatment apparatus having a structure capable of ensuring airtightness at the connection portion, in view of the problems at the pipe connection portion in the above conventional heat treatment apparatus. Especially.

[0021]

In order to achieve this object, the invention according to claim 1 is a heat treatment apparatus in which a gas introducing pipe or a gas exhausting pipe is hermetically provided in a reaction pipe. A flange portion provided at a connection portion between the exhaust pipe and an external communication pipe connected to communicate with the outside, a seal member arranged between facing surfaces of the flange portion, and a temperature rise of the seal member. It is characterized in that a temperature suppressing means for suppressing is provided.

The invention according to claim 2 is characterized in that the temperature suppressing means comprises a partition wall provided between the inside of the gas introduction pipe or the gas exhaust pipe of the flange portion and the flange portion.

The invention according to claim 3 is characterized in that the temperature suppressing means is provided with a cooling mechanism for circulating a cooling fluid for cooling the seal member.

According to a fourth aspect of the present invention, in a heat treatment apparatus in which a gas introducing pipe or a gas exhausting pipe is hermetically provided in a reaction pipe, the gas introducing pipe or the gas exhausting pipe is connected to communicate with the outside. A flange portion provided at a connection portion with the external communication pipe, a seal member arranged between facing surfaces of the flange portion, a cover body that covers at least a part of the seal member and the flange portion, and the cover body It is characterized in that a cooling fluid circulation mechanism for circulating a cooling fluid is provided inside.

According to a fifth aspect of the present invention, the cooling fluid is
It is characterized by being cooled air or an inert gas.

[0026]

In the present invention, since the temperature suppressing means for suppressing the temperature rise of the seal member is provided at the connecting portion, the temperature rise at the flange portion can be suppressed. As a result, thermal denaturation of the seal member located between the facing surfaces of the flange portion is prevented,
The temperature rise of the seal member can be suppressed and the sealing effect can be maintained.

[0027]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the apparatus of the present invention is applied to a vertical batch type oxidation treatment apparatus will be described in detail below with reference to the drawings.

In FIG. 1, reference numeral 1 denotes an external combustion device for combusting and combining oxygen and hydrogen.
Is provided with a combustion container 2 formed of a heat-resistant material such as quartz glass in a cylindrical shape. An oxygen introducing pipe 3 for supplying oxygen gas and a hydrogen introducing pipe 4 for supplying hydrogen gas are connected to the center of one end of the combustion container 2. Further, a resistance heater 5 for steam generation is provided so as to cover one end of the combustion container 2 and can heat oxygen gas and hydrogen gas to a combustion combination temperature (ignition point temperature) or more, for example, 900 ° C. .

At the center of the other end of the combustion container 2, one end of a gas supply pipe 6 made of a heat-resistant and corrosion-resistant material, for example, quartz glass, for supplying the produced gas is connected, and the other end of the gas supply pipe 6 is connected. Is connected to the vertical heat treatment device 7.

The vertical heat treatment apparatus 7 is provided therein with an airtight container made of a heat-resistant material such as quartz glass and installed substantially vertically, for example, a cylindrical reaction tube 8 made of quartz. A wafer boat 9 made of a heat-resistant material such as quartz glass is loaded into the reaction tube 8, for example, loaded from below.

The wafer boat 9 accommodates a plurality of objects to be processed, such as semiconductor wafers 10, which are stacked and mounted in the vertical direction at a predetermined pitch. Wafer boat 9
Is supported on the base 14a of the boat elevator 14,
When the feed screw 14b is rotated, it is fed into the reaction tube 8 from below and is fed out after processing.

A heating device such as a resistance heater 11 is coaxially provided on the outer periphery of the side wall of the reaction tube 8. This resistance heater 11
Is supported inside a cylindrical outer shell 13 made of, for example, stainless steel via a heat insulating material 12, and a heating furnace is constituted by the above members. The heating furnace is supported on the fixed base 13a.

By controlling the voltage applied to the resistance heater 11, the temperature of the region for containing the object to be treated in the reaction tube 8 is set to the oxide film formation temperature, for example, 300-120.
The uniform temperature in the range of 0 ° C. can be appropriately set.

A gas introducing pipe 15 for supplying a processing gas is connected to one side of the lower portion of the reaction pipe 8, and the gas introducing pipe 15 is hermetically connected to the gas supplying pipe 6 by a connecting portion 20. It is connected. An exhaust pipe 17 for exhausting the processing gas is connected to the other side of the lower portion of the reaction pipe 8. The exhaust pipe 17 is connected to the gas exhaust pipe 16 by a connection portion 20 similar to the above.

The gas exhaust pipe 16 is connected to an exhaust device (not shown) such as a factory exhaust system. As a result, the inside of the reaction tube 8 can be evacuated.

Next, the connection section 20 will be described more specifically. As shown in FIG. 2, the connecting portion 20 is
For example, cylindrical flange portions 30 and 31 made of quartz glass, a concave portion 32 provided in the flange portion 31, a cylindrical partition wall 35 provided in the extension direction of the quartz pipe on the flange 30 side, The ring-shaped sealing member 36 is made of, for example, Teflon and has a U-shaped cross section, which is provided to retain the airtightness of the connecting portion 20 by being fitted in the recess 32. In addition, a coil-shaped spring (not shown) is provided inside the ring-shaped seal material 36 in a U-shaped cross-section so that the ring-shaped seal material 36 has a reaction force.

Further, in order to press and fix the flange portions 30 and 31, disc-shaped pressing plates 37a and 37b made of, for example, SUS are provided. This pressing plate 37a
And 37b are provided with bolt holes for passing the bolts 38. By screwing the bolts 38 and the nuts 38b, the pressing plates 37a and 37b are screwed into the bolts 38 and the nuts 38b, and the flange portions 30 and 31 is pressed and fixed.

The operation of the vertical heat treatment apparatus described above will be described. First, after being heated to a predetermined combustion combination temperature by a resistance heater, oxygen and hydrogen are supplied into the combustion container 2 to combust and combine with each other to generate steam. This water vapor is supplied into the reaction tube 8 through the gas supply pipe 6, the connection portion 20, and the gas introduction pipe 15.

Depending on the process, as shown in FIG.
Cl may be supplied into the reaction tube 8 as a reaction gas together with oxygen and hydrogen. The inside of the reaction tube 8 has been heated in advance by the resistance heater 11 to an oxide film generation temperature, for example, 1000 ° C., and the semiconductor wafer 10 supported by the wafer boat 9 carried into the reaction tube 8 by the elevator 14 is lifted. An oxide film is formed on the surface by the water vapor.
The high-temperature processed gas after processing the semiconductor wafer 10 is exhausted by an exhaust device (not shown) through the exhaust pipe 17, the connecting portion 20, and the gas exhaust pipe 16.

Angles may occur between the end faces constituting the connection portion 20 set in the vicinity of the oxide film formation temperature atmosphere due to variations in the dimensions of the pipes and the assembly accuracy. Ring-shaped sealing material 36
Since it has a structure that can be pressed against, airtightness can be maintained. In addition, since the partition wall 35 is provided, it is possible to prevent the ring-shaped sealing material 36 from being directly affected by heat, and it is possible to avoid the influence of deterioration of the sealing property due to heat.

[Second Embodiment] Next, a second embodiment will be described. The second embodiment has a double partition structure in which a cylindrical partition is provided inside the partition 35 of the first embodiment. The same parts as those in the first embodiment are designated by the same reference numerals and the description thereof will be omitted. In FIG. 3, a cylindrical partition wall 41 is provided, and this partition wall 41 and the partition wall 3 are provided.
By adopting the double structure of No. 5, the influence of heat can be more surely prevented and the airtightness can be maintained.

[Third Embodiment] Next, a third embodiment will be described. In the third embodiment, instead of the partition wall 35 of the first embodiment, a mechanism for circulating a fluid for cooling the ring-shaped sealing material is provided to prevent thermal influence on the ring-shaped sealing material. The same parts as those in the first embodiment are designated by the same reference numerals and the description thereof will be omitted. In FIG. 4, a fluid passage 51, 52 for cooling the ring-shaped sealing material 36 by circulating a cooling fluid, for example, a cooling gas, between the flange portions 30, 31 and the gas supply pipe 6. Is provided. Further, the fluid passages 51, 52 are provided with fluid supply ports 51a, 52a for supplying a fluid such as a cooling gas to the fluid passages 51, 52.
Is provided. Discharge ports 51b and 52b for discharging the circulated cooling fluid are provided on the opposite sides of the fluid supply ports 51a and 52a.

As described above, the fluid passages 51 and 52 for cooling the ring-shaped sealing material 36 are provided, and the ring-shaped sealing material 36 is cooled by circulating the cooling fluid.
The influence of heat can be prevented more reliably, and the airtightness can be maintained. The cooling fluid may be a cooling gas such as cooled air or an inert gas, and is not limited to the cooling gas, but may be a liquid such as cooled water, which has a cooling effect. It goes without saying that anything can be used.

[Fourth Embodiment] Next, a fourth embodiment will be described. In the fourth embodiment, the flange portion 6 in FIG.
A ring-shaped sealing material 62 is provided on the outer periphery of the sealing material 0 and 61, and is formed of SUS so as to cover the sealing material 62 and the flange portions 60 and 61 and is configured to be divided into two. Cover bodies 63a and 63b are provided. Flange portions 66c, 66d, 67c, 67d are provided on these cover bodies 63a, 63b, respectively.
Is provided.

These flange portions 66c, 66d, 67
In order to press and fix c and 67d, disc-shaped pressing plates 68a and 68b made of, for example, SUS are provided.
The holding plates 68a and 68b are provided with bolt holes for passing the bolts 69, and the bolts 69 and the nuts 6 are provided.
By screwing 9b, the pressing plates 68a and 68b are screwed into the bolt 69 and the nut 69b, and the flange portions 66c, 66d, 67c and 67d are pressed and fixed.

Further, the cover body 63a is provided with cooling gas supply ports 64a and 64b for supplying a cooling gas into the cover bodies 63a and 63b. The cooling gas supplied from the cooling gas supply ports 64a and 64b is discharged to the outside through the gap 65 between the cover bodies 63a and 63b and the gas supply pipe 6. As described above, the cooling gas is supplied from the cooling gas supply ports 64a and 64b, and the cooling gas is circulated inside the cover bodies 63a and 63b to cool the seal material formed in the ring shape. It is possible to prevent thermal influence on the sealing material and maintain airtightness.

[Fifth Embodiment] Next, a fifth embodiment will be described. In the fifth embodiment, as shown in FIG. 6, the connecting portion 20 is provided with cylindrical flange portions 70 and 71 made of quartz glass, for example. The flange portion 71 is provided with a cylindrical partition wall 71a provided at a substantially central portion of the flange portion 71 and a cylindrical partition wall 71b in the extension direction of the quartz pipe on the flange portion 71 side.

The flange portion 70 and the flange portion 71
A ring-shaped seal member 74 made of, for example, Teflon and having a U-shaped cross section is provided between them. The ring-shaped sealing material 74 is configured to be able to maintain the airtightness of the connecting portion 20 by being fitted to the flange portion 70 and the flange portion 71. Also,
Cover bodies 75a, 75b formed of SUS and configured to be divided into two are provided so as to cover the flange portions 70, 71. These cover bodies 75a and 75b have flange portions 76, respectively.
c, 76d, 77c, 77d are provided. In order to press and fix these flange portions 76c, 76d, 77c, 77d, disc-shaped pressing plates 78a and 78b made of, for example, SUS are provided. This holding plate 78
The a and 78b are provided with bolt holes through which the bolt 79 is inserted. By screwing the bolt 79 and the nut 79b, the pressing plates 78a and 78b are screwed into the bolt 79 and the nut 79b, and the flange portion 76 is inserted.
c, 76d, 77c and 77d are fixed by pressing.

Further, the cover body 75a is provided with a cooling gas supply port 72 for supplying a cooling gas into the inside of the cover bodies 75a and 75b. The cover body 75b is discharged from a cooling fluid discharge port 73 for discharging the cooling gas supplied from the cooling gas supply port 72 to the outside. As described above, the cooling gas is supplied from the cooling gas supply port 72, and the cooling gas is circulated inside the cover bodies 75a and 75b to cool the ring-shaped sealing material, and the ring-shaped sealing material. Can be prevented from being affected by heat and airtightness can be maintained.

[Sixth Embodiment] Next, a sixth embodiment will be described. In the sixth embodiment, as shown in FIG. 7, the connecting portion 20 is provided with flange portions 80 and 81 formed in a cylindrical shape by, for example, quartz glass. The flange 81 is provided with a recess 81a. The flange portion 8 and the concave portion 81a have the flange portion 8
A ring-shaped sealing material 82 made of, for example, Teflon and having a U-shaped cross section is provided to maintain the airtightness of the connecting portion 20 by fitting the sealing member 82 into the concave portion 81a.

The sealing material 82 and the flange portion 80,
81 formed of SUS so as to cover 81
Covers 83a and 83b configured to be divided into two parts
Is provided. The flange portions 86c, 86d, 87c, 8 are provided on the cover bodies 83a, 83b, respectively.
7d is provided. These flange portions 86c,
Press plates 88a and 88b made of, for example, SUS are provided to press and fix 86d, 87c, and 87d. The holding plates 88a and 88b are provided with bolt holes for passing the bolts 89, and the holding plates 88a and 88b are screwed into the holding plates 88a and 88b.
The flanges 86c, 86d, 87c and 87d are pressed and fixed by screwing the bolts 89 and the nuts 89b into a and 88b.

The cover bodies 83a and 83b are provided with
Cooling gas supply ports 84a and 84b for supplying cooling gas are provided inside the cover bodies 83a and 83b. In addition, the gas supply pipe 6 and the cover body 83 are provided between the cover bodies 83 a and 83 b and the gas supply pipe 6.
Spacer 90 for opening a gap between a and 83b
A plurality of gas supply pipes 6 are provided in the circumferential direction.
With these spacers 90, the cover body 83a,
83b is positioned and the cooling gas supply port 8 is provided.
The cooling gas supplied from the gas supply pipes 4a and 84b is discharged to the outside through the gap 91 between the cover bodies 83a and 83b and the gas supply pipe 6.

As described above, the cooling gas supply ports 84a, 8a
A cooling gas is supplied from 4b to the cover bodies 83a, 8a.
It is possible to circulate a cooling gas inside 3b to cool the ring-shaped sealing material. In addition, it is possible to prevent the ring-shaped sealing material from being affected by heat and to maintain airtightness.

[Seventh Embodiment] Next, a seventh embodiment will be described. In FIG. 8, the connecting portion 20 has a convex joined body 100 at least having a spherical outer shape made of, for example, quartz glass, and the outer diameter of the convex joined body 100 that fits into the convex joined body 100. Also has a concave joint body 101 having a large outer diameter.

In the convex joint 100, a spherical portion 102 is provided at one end of the gas supply pipe 6, and means for hermetically sealing the connecting portion 20, for example, the spherical portion 102 is provided with an elastic heat resistant member such as an O-ring 103. The groove portion 104 to be housed is provided in a ring shape, and the through hole portion 105 which is a gas flow path communicating with the gas supply pipe 6 is opened. On the other hand, in the concave joined body 101 forming the concave surface, the spherical cap 106 is provided at one end of the gas introduction pipe 15 as described above,
It is configured to fit with the spherical portion 102 of the convex bonded body 100.

Further, pressing plates 110 and 111 made of, for example, SUS are provided as a pressing and fixing device for the convex joint body 100 and the concave joint body 101. Bolt holes 112 are provided in the pressing plates 110 and 111, and the bolts 113 pass through the bolt holes 112 and are pressed and fixed by a nut 115 through a spring 114 using spring pressure.

As described above, the convex bonded body 100 is
Since they are pressed and fixed by the concave joint body 101 having an outer diameter larger than the outer diameter of the convex joint body 100, these joint portions 117 have few contact portions and the O-ring is less likely to be exposed to gas. . When connecting the gas supply pipe 6 and the gas introduction pipe 15, the gas supply pipe 6
Even if there is an angle between the gas introduction pipe 15 and the gas introduction pipe 15, it does not hit against one side because it is formed into a spherical shape, and because an unreasonable force is not applied, some displacement deformation is absorbed and airtight sealing can be maintained. I can.

As described above, by ensuring the airtightness at the pipe connecting portion, it becomes possible to stabilize the heat treatment conditions executed in the process tube.

Of course, the present invention is not limited to the above-mentioned embodiments, and the point can be modified within the scope of the gist of the present invention. Further, although the ring-shaped sealing material has a U-shaped cross section, it is not limited to this, and in addition to the U-shaped V-shaped, U-shaped,
It goes without saying that it may be C-shaped or the like.
The spring may have a U-shaped, V-shaped, or O-shaped cross section.

Further, in the above-mentioned embodiment, the connecting portion of the process gas supply pipe has been described, but it can be applied to the purge gas supply pipe. Further, the present invention is not limited to the oxidation treatment device, and if it is a heat treatment device, a diffusion device, a CVD
It can be applied to any of an apparatus, an etching apparatus, and the like. Further, the present invention can be applied not only to the above batch processing but also to single wafer processing.

[0061]

As described above, according to the present invention, the sealing effect can be maintained even when the heat treatment is performed at a high temperature.

[Brief description of drawings]

FIG. 1 is a schematic diagram for explaining an embodiment of a heat treatment apparatus according to the present invention.

FIG. 2 is a cross-sectional view for explaining an embodiment of a connecting portion used for piping of the heat treatment apparatus according to the present invention.

FIG. 3 is a cross-sectional view for explaining a second embodiment of a connecting portion used for piping of a heat treatment device.

FIG. 4 is a sectional view for explaining a third embodiment of a connecting portion used for piping of a heat treatment apparatus.

FIG. 5 (a) is a cross-sectional view for explaining a fourth embodiment of the connecting portion used for the piping of the heat treatment apparatus. (B) It is a side view for explaining the 4th example of the connection part used for piping of a heat treatment equipment.

FIG. 6 (a) is a cross-sectional view for explaining a fifth embodiment of the connection portion used for the piping of the heat treatment apparatus. (B) It is a side view for demonstrating the 5th Example of the connection part used for piping of a heat processing apparatus.

FIG. 7 (a) is a cross-sectional view for explaining a sixth embodiment of the connecting portion used for the piping of the heat treatment apparatus. (B) It is a side view for explaining a 6th example of a connecting part used for piping of a heat treatment equipment.

FIG. 8 is a cross-sectional view for explaining a seventh embodiment of a connecting portion used for piping of a heat treatment device.

[Explanation of symbols]

 20 connection part 30,31 flange part 36 sealing material 35 partition wall 51,52 fluid passage 63a, 63b cover body

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[Procedure amendment]

[Submission date] December 27, 1995

[Procedure Amendment 1]

[Document name to be amended] Statement

[Name of item to be corrected] Brief description of the drawing

[Correction method] Change

[Correction content]

[Brief description of drawings]

FIG. 1 is a schematic diagram for explaining an embodiment of a heat treatment apparatus according to the present invention.

FIG. 2 is a cross-sectional view for explaining an embodiment of a connecting portion used for piping of the heat treatment apparatus according to the present invention.

FIG. 3 is a cross-sectional view for explaining a second embodiment of a connecting portion used for piping of a heat treatment device.

FIG. 4 is a sectional view for explaining a third embodiment of a connecting portion used for piping of a heat treatment apparatus.

FIG. 5 (a) is a cross-sectional view for explaining a fourth embodiment of the connecting portion used for the piping of the heat treatment apparatus. (B) It is a side view for explaining the 4th example of the connection part used for piping of a heat treatment equipment.

FIG. 6 (a) is a cross-sectional view for explaining a fifth embodiment of the connection portion used for the piping of the heat treatment apparatus. (B) It is a side view for demonstrating the 5th Example of the connection part used for piping of a heat processing apparatus.

FIG. 7 (a) is a cross-sectional view for explaining a sixth embodiment of the connecting portion used for the piping of the heat treatment apparatus. (B) It is a side view for explaining a 6th example of a connecting part used for piping of a heat treatment equipment.

FIG. 8 is a cross-sectional view for explaining a seventh embodiment of a connecting portion used for piping of a heat treatment device.

FIG. 9 is a cross-sectional view for explaining a conventional connecting means.

[Explanation of reference numerals] 20 connection part 30, 31 flange part 36 ring-shaped seal material 35 partition walls 51, 52 fluid passages 63a, 63b cover body

Claims (5)

[Claims] 1. A heat treatment apparatus in which a gas introduction pipe or a gas exhaust pipe is hermetically provided in a reaction pipe, and a connection between the gas introduction pipe or the gas exhaust pipe and an external communication pipe connected to communicate with the outside. A heat treatment apparatus comprising: a flange portion provided on the portion; a seal member disposed between opposing surfaces of the flange portion; and a temperature suppressing unit that suppresses a temperature rise of the seal member. 2. The temperature suppressing means comprises a partition wall provided between the inside of a gas introduction pipe or a gas exhaust pipe of the flange portion and the flange portion. The heat treatment apparatus described. 3. The heat treatment apparatus according to claim 1, wherein the temperature suppressing means is provided with a cooling mechanism for circulating a cooling fluid for cooling the seal member. 4. A heat treatment apparatus in which a gas introduction pipe or a gas exhaust pipe is hermetically provided in a reaction pipe, and a connection between the gas introduction pipe or the gas exhaust pipe and an external communication pipe connected to communicate with the outside. A flange portion provided on the flange portion, a seal member disposed between the facing surfaces of the flange portion, a cover body that covers at least a part of the seal member and the flange portion, and a cooling fluid inside the cover body. A heat treatment apparatus comprising a circulating cooling fluid circulation mechanism. 5. The heat treatment apparatus according to claim 3 or 4, wherein the cooling fluid is cooled air or an inert gas.