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JPH08217877A - Polyimide resin and polyimide film - Google Patents

Polyimide resin and polyimide film

Info

Publication number
JPH08217877A
JPH08217877A JP2936895A JP2936895A JPH08217877A JP H08217877 A JPH08217877 A JP H08217877A JP 2936895 A JP2936895 A JP 2936895A JP 2936895 A JP2936895 A JP 2936895A JP H08217877 A JPH08217877 A JP H08217877A
Authority
JP
Japan
Prior art keywords
polyimide resin
polyimide
polyimide film
coefficient
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2936895A
Other languages
Japanese (ja)
Inventor
Masaru Nishinaka
賢 西中
Taku Ito
卓 伊藤
Hitoshi Nojiri
仁志 野尻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP2936895A priority Critical patent/JPH08217877A/en
Publication of JPH08217877A publication Critical patent/JPH08217877A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PURPOSE: To obtain the subject resin, suitably usable for TAB and FPC applications, comprising a specific compound and a linear diamine compound, excellent in heat resistance, having a high elastic modulus, low water absorption properties, a low hygroscopic expansion coefficient and a linear expansion coefficient so as to reduce warping and curling in use as a composite material with a copper foil. CONSTITUTION: This resin comprises a compound of the formula, preferably pyromellitic dianhydride and a linear diamine compound (preferably p- phenylenediamine). The mixing ratio of the compound of the formula to the pyromellitic dianhydride is preferably (100:0)-(10:90).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はポリイミド樹脂及びポリ
イミドフィルムに関し、より詳しくは耐熱性に優れ、高
弾性率、低吸水率性、低吸湿膨脹係数を有し、かつ銅箔
との複合材料として用いた場合に反りやカールを小さく
するのに適した線膨脹係数を有するTAB(Tape-Automa
ted-Bonding)用途又はFPC(Flexible-Printed-Circui
t)用途に適したポリイミド樹脂及びポリイミドフィルム
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyimide resin and a polyimide film, more specifically, it has excellent heat resistance, high elastic modulus, low water absorption, low coefficient of hygroscopic expansion, and a composite material with a copper foil. TAB (Tape-Automa) having a coefficient of linear expansion suitable for reducing warpage and curl when used.
ted-Bonding) or FPC (Flexible-Printed-Circui)
t) Polyimide resin and polyimide film suitable for use.

【0002】[0002]

【従来の技術】ポリイミド樹脂は、優れた耐熱性や電気
絶縁性を有しており、電気機器を始めとして広く工業材
料として従来から用いられている。ポリイミド樹脂は、
このように他のポリマーに比べ種々の優れた特性を有し
ているが、技術の進歩と共に、ポリイミド樹脂に求めら
れる特性も高度なものとなり、用途に応じて種々の性能
を併せ持つことが望まれている。
2. Description of the Related Art Polyimide resins have excellent heat resistance and electrical insulation properties, and have been widely used as industrial materials such as electrical equipment. The polyimide resin is
As described above, it has various excellent properties as compared with other polymers, but with the advancement of technology, the properties required for polyimide resins also become more advanced, and it is desired to have various performances depending on the application. ing.

【0003】特に近年、より小形化・精密化の傾向が顕
著になっている電気・電子材料用途に用いられることが
多くなったために、用いられるポリイミド樹脂の寸法安
定性が強く望まれるようになっている。なかでもフィル
ム用途では、加工工程において応力を受ける工程、温度
変化を受ける工程を数多く含むために、応力や温度変化
による寸法変化が小さいことが望まれている。応力によ
る寸法変化を小さくするにはフィルムが高弾性率を有す
ることが有効であり、また温度変化による寸法変化を小
さくするにはフィルムの線膨脹係数が小さいことが有効
である。
Particularly, in recent years, the polyimide resin used has been strongly demanded to have dimensional stability because it is often used for electric / electronic materials which are more and more miniaturized and refined. ing. In particular, in film applications, it is desired that the dimensional change due to stress or temperature change be small, since it includes many processes in which stress is applied and temperature changes in the processing process. It is effective that the film has a high elastic modulus to reduce the dimensional change due to stress, and that the film has a small linear expansion coefficient to reduce the dimensional change due to the temperature change.

【0004】もっとも、ポリイミド樹脂がフィルムとし
て用いられる用途は、フレキシブルプリント基板用途、
TAB用ベースフィルム用途、銅線被覆用途等が主であ
り、これらはいずれも銅等の金属或いはガラス等と複合
化される用途であるため、線膨脹係数が銅等の金属或い
はガラス等に比較して極端に小さくなると、銅箔等の熱
による伸縮量がポリイミド樹脂の伸縮量よりも大きくな
るために反りやカールを生ずる。特に接着剤を中間層と
する銅箔/接着剤/ポリイミド樹脂の3層積層体の場
合、銅箔の張り合せ温度や接着剤の硬化温度から室温に
冷却される過程でポリイミド樹脂と銅箔の線膨脹係数の
差によりカールが生ずる。
However, the applications in which the polyimide resin is used as a film are flexible printed circuit board applications,
Mainly used for base film for TAB, copper wire coating, etc., all of which are used in combination with metal such as copper or glass, so the coefficient of linear expansion is compared with metal such as copper or glass. If it becomes extremely small, the amount of expansion and contraction of the copper foil or the like due to heat becomes larger than the amount of expansion and contraction of the polyimide resin, so that warping and curling occur. In particular, in the case of a three-layer laminate of copper foil / adhesive / polyimide resin having an adhesive as an intermediate layer, the polyimide resin and the copper foil are separated from each other in the process of cooling from the bonding temperature of the copper foil or the curing temperature of the adhesive to room temperature. Curling occurs due to the difference in linear expansion coefficient.

【0005】この知見は、例えば特開平05−0705
91号公報でも述べられており、銅箔と同等の線膨脹係
数を持つ高弾性率のポリイミドフィルムが示されてい
る。然し、銅やガラスは吸湿しないがポリイミド樹脂は
吸湿して寸法変化や電気特性の低下を起こすので、ポリ
イミド樹脂が銅箔よりもやや大きい線膨脹係数を持つこ
とがより好ましいと思われ、具体的には17〜49pp
m程度の線膨脹係数を持つことが好ましいと思われる。
This finding is based on, for example, Japanese Patent Laid-Open No. 05-0705.
No. 91 publication also discloses a high elastic modulus polyimide film having a linear expansion coefficient equivalent to that of a copper foil. However, copper and glass do not absorb moisture, but polyimide resin absorbs moisture and causes dimensional changes and deterioration of electrical characteristics.Therefore, it is more preferable that the polyimide resin has a coefficient of linear expansion slightly larger than that of the copper foil. 17 to 49 pp
It seems preferable to have a linear expansion coefficient of about m.

【0006】また、ポリイミド樹脂は、電気特性や寸法
安定性の点から、低吸水率であることや低吸湿膨脹係数
を持つことが重要である。このように、ポリイミド樹脂
は、高弾性率に加え、複合される銅箔等の金属やガラス
等の材料と線膨脹係数が近いこと、更に、低吸湿性、低
吸湿膨脹係数であることが望まれる。
Further, it is important that the polyimide resin has a low water absorption coefficient and a low hygroscopic expansion coefficient from the viewpoint of electrical characteristics and dimensional stability. As described above, the polyimide resin is desired to have a high coefficient of linear expansion and a coefficient of linear expansion close to that of a material such as a metal such as copper foil or glass to be composited, in addition to a high elastic modulus, and a low hygroscopicity and a low hygroscopic expansion coefficient. Be done.

【0007】高弾性率のポリイミド樹脂を得るには、直
線性の高いモノマーを原料とすることが有効であること
が従来より知られている。例えば、ピロメリット酸二無
水物とパラフェニレンジアミンのような直線性の高いモ
ノマーのみを用いて合成したポリイミド樹脂は非常に高
い高弾性率を有することが分かっている。然し、このよ
うな構造のポリイミド樹脂は、非常に脆く、線膨脹係数
が極端に小さくなり過ぎるために銅箔等の金属材料と接
合したときにカールを生じ、実用上好ましくないし、吸
湿率も大きくなってしまう。
It is conventionally known that it is effective to use a monomer having high linearity as a raw material in order to obtain a polyimide resin having a high elastic modulus. For example, it has been found that a polyimide resin synthesized using only highly linear monomers such as pyromellitic dianhydride and paraphenylenediamine has a very high elastic modulus. However, the polyimide resin having such a structure is very brittle, and has a coefficient of linear expansion which is extremely small, so that curling occurs when it is bonded to a metal material such as a copper foil, which is not preferable in practice and has a large moisture absorption rate. turn into.

【0008】このためジアミン化合物に 4,4'-ジアミノ
ジフェニルエーテルを共重合させることによって、しな
やかで線膨脹係数を銅箔に近付けることができることが
米国特許第 4,886,874号明細書等に開示されている。然
し、それに示されているピロメリット酸二無水物、パラ
フェニレンジアミン、 4,4'-ジアミノジフェニルエーテ
ルの共重合体では、線線膨脹係数を銅箔に近付けると弾
性率がやや小さくなり実用的ではなかったし、吸水率に
ついても改善されていない。
Therefore, it is disclosed in US Pat. No. 4,886,874 that the linear expansion coefficient can be made close to that of a copper foil with flexibility by copolymerizing a diamine compound with 4,4'-diaminodiphenyl ether. However, in the copolymer of pyromellitic dianhydride, paraphenylenediamine, and 4,4'-diaminodiphenyl ether shown therein, the elastic modulus becomes a little small when the coefficient of linear thermal expansion is brought close to that of copper foil, which is not practical. There was no improvement in water absorption.

【0009】また、酸二無水物として 4,4'-オキシジフ
タル酸を用い、ジアミン成分に直線性ジアミン及び屈曲
性ジアミンを併用して共重合することによって低吸水性
の高弾性ポリイミドフィルムを実現できることが特開平
05−271410号公報等に開示されている。然し、
ここに示されているポリイミドフィルムは線膨脹係数が
銅箔に比べて小さく、線膨脹係数を銅箔に近付けると弾
性率が低くなる傾向があった。
Further, by using 4,4'-oxydiphthalic acid as an acid dianhydride and copolymerizing a linear diamine and a flexible diamine in combination with a diamine component, it is possible to realize a highly elastic polyimide film having low water absorption. Is disclosed in Japanese Patent Application Laid-Open No. 05-271410. However,
The polyimide film shown here has a smaller coefficient of linear expansion than that of the copper foil, and when the coefficient of linear expansion is close to that of the copper foil, the elastic modulus tends to decrease.

【0010】更に、ポリイミド樹脂の吸水率を下げるた
めに含弗素モノマーを導入することが有効であることが
知られている。然し、含弗素モノマーが高価であること
や、弗素を導入したポリイミド樹脂は銅箔等の金属材料
との接着性が悪いこと等の問題がある。このように、ポ
リイミド樹脂において、高弾性率、適当な大きさの線膨
脹係数、低吸水率、低吸湿膨脹係数の全てを実現するこ
とは困難であった。
Further, it is known that it is effective to introduce a fluorine-containing monomer in order to reduce the water absorption of the polyimide resin. However, there are problems that the fluorine-containing monomer is expensive and that the polyimide resin containing fluorine has poor adhesiveness to a metal material such as copper foil. As described above, it has been difficult to realize all of a high elastic modulus, a linear expansion coefficient of an appropriate size, a low water absorption coefficient, and a low hygroscopic expansion coefficient in a polyimide resin.

【0011】[0011]

【発明が解決しようとする課題】本発明は、耐熱性に優
れ、高弾性率と適当な大きさの線膨脹係数、低吸水率、
低吸湿膨脹係数の全てを実現するポリイミド樹脂及びポ
リイミドフィルムを提供することを目的とする。
The present invention is excellent in heat resistance, has a high elastic modulus, a linear expansion coefficient of an appropriate size, a low water absorption rate,
An object of the present invention is to provide a polyimide resin and a polyimide film that realize all of the low hygroscopic expansion coefficients.

【0012】[0012]

【課題を解決するための手段】上記の課題を解決するた
めに、本発明者等はポリイミド樹脂の分子構造について
鋭意検討の結果、特定構造の化合物を原料として用いて
合成した芳香族ポリイミド樹脂が耐熱性、高弾性率、適
当な線膨脹係数、低吸水率、低吸湿膨脹係数を持つこと
を見出だして本発明を完成した。即ち、本発明は、第1
に、次の式(I)
In order to solve the above problems, the inventors of the present invention have earnestly studied the molecular structure of a polyimide resin, and as a result, an aromatic polyimide resin synthesized using a compound having a specific structure as a raw material has been found. The present invention has been completed by discovering that it has heat resistance, high elastic modulus, appropriate linear expansion coefficient, low water absorption coefficient, and low hygroscopic expansion coefficient. That is, the present invention is the first
And the following formula (I)

【0013】[0013]

【化2】 に示される化合物と直線性ジアミン化合物とからなるポ
リイミド樹脂に関する。
Embedded image And a linear diamine compound.

【0014】本発明は、第2に、式(I)で示される化
合物とピロメリット酸二無水物とを任意の割合で混合し
たものと直線性ジアミン化合物とからなることを特徴と
するポリイミド樹脂に関する。
Secondly, the present invention comprises a polyimide resin characterized by comprising a linear diamine compound and a mixture of the compound represented by the formula (I) and pyromellitic dianhydride in an arbitrary ratio. Regarding

【0015】本発明は、第3に、前記直線性ジアミン化
合物にパラフェニレンジアミンを用いることに関する。
本発明は、第4に、上述したポリイミド樹脂からなるこ
とを特徴とするポリイミドフィルムに関する。
The present invention thirdly relates to the use of paraphenylenediamine as the linear diamine compound.
Fourthly, the present invention relates to a polyimide film comprising the above-mentioned polyimide resin.

【0016】本発明を次に詳細に説明する。本発明のポ
リイミド樹脂は、その前駆体であるポリアミド酸重合体
溶液から得られるが、このポリアミド酸重合体溶液は公
知の方法で製造することができる。即ち、テトラカルボ
ン酸二無水物成分とジアミン成分とを実質等モル使用
し、有機極性溶媒中で重合して得ることができる。
The present invention will now be described in detail. The polyimide resin of the present invention can be obtained from a polyamic acid polymer solution as its precursor, and this polyamic acid polymer solution can be produced by a known method. That is, it can be obtained by polymerizing in a polar organic solvent using substantially equimolar amounts of the tetracarboxylic dianhydride component and the diamine component.

【0017】本発明で使用する直線性ジアミンは、エー
テル基、メチレン基、イソプロピリデン基、ヘキサフル
オロイソプロピリデン基、カルボニル基等の屈曲基を主
鎖中に含まず、2個のアミノ基の窒素原子とそれらが結
合している炭素原子が一直線に並ぶ構造を持つジアミン
化合物を指す。例えば、次に示すような化合物を例示す
ることができる。
The linear diamine used in the present invention does not contain a bending group such as an ether group, a methylene group, an isopropylidene group, a hexafluoroisopropylidene group and a carbonyl group in the main chain, and has a nitrogen atom of two amino groups. A diamine compound having a structure in which atoms and the carbon atoms to which they are attached are aligned. For example, the following compounds can be exemplified.

【0018】[0018]

【化3】 Embedded image

【0019】[式中、Xは、F、Cl、Br、CH3
CH3 O又はCF3 を表わす。] 本発明の目的を達成するためには、酸二無水物成分とし
て上記の式(I)に示される化合物を単独、又はピロメ
リット酸二無水物と任意の割合で混合して用い、ジアミ
ン成分として直線性ジアミン化合物を用いることが必須
であり、この酸二無水物を用いることにより得られるポ
リイミド樹脂の吸水率を低く抑えることができ、ピロメ
リット酸二無水物や直線性ジアミン化合物を用いること
によって高弾性率とし、またそれらを組合わせることに
よって適当な大きさの線膨脹係数を実現することができ
る。
[In the formula, X is F, Cl, Br, CH 3 ,
Represents CH 3 O or CF 3 . In order to achieve the object of the present invention, the compound represented by the above formula (I) is used alone or as a mixture with pyromellitic dianhydride in any proportion as an acid dianhydride component, and a diamine component is used. It is essential to use a linear diamine compound as, it is possible to suppress the water absorption of the polyimide resin obtained by using this acid dianhydride low, using pyromellitic dianhydride or linear diamine compound It is possible to realize a high elastic modulus, and by combining them, a linear expansion coefficient of an appropriate size can be realized.

【0020】これは、前記の式(I)に示される化合物
に含まれる電子供与性のエステル基がイミド基の分極率
を低く抑える結果、水分子のイミド基への吸着量が少な
くなることが低吸水率の原因であると考えられる。
This is because the electron-donating ester group contained in the compound represented by the above formula (I) suppresses the polarizability of the imide group to a low level, and as a result, the amount of water molecules adsorbed on the imide group is reduced. It is considered to be the cause of low water absorption.

【0021】また、ピロメリット酸二無水物や直線性ジ
アミン化合物を用いて重合することによって分子の直線
性を維持し、高い弾性率を維持することができる。更
に、これらのモノマーを組合わせることにより分子の柔
軟性と剛直性とが両立した結果、適当な大きさの線膨脹
係数を有することとなり、高弾性率、適当な大きさの線
膨脹係数、低吸水率を実現することとなる。
Further, by polymerizing with pyromellitic dianhydride or a linear diamine compound, the linearity of the molecule can be maintained and a high elastic modulus can be maintained. Furthermore, by combining these monomers, the flexibility and rigidity of the molecule are compatible with each other. As a result, it has a linear expansion coefficient of an appropriate size, a high elastic modulus, a linear expansion coefficient of an appropriate size, and a low expansion coefficient. The water absorption rate will be realized.

【0022】酸二無水物成分として式(I)に示される
化合物とピロメリット酸二無水物とを混合する割合は任
意であるが、ピロメリット酸二無水物の割合が大きいと
得られるフィルムが脆くなるところから、式(I)に示
される化合物とピロメリット酸二無水物との混合比は1
00:0〜10:90の範囲であることが好ましい。ピ
ロメリット酸二無水物の比率が小さいほど吸水率が小さ
くなるし、ピロメリット酸二無水物の比率が大きほど得
られるポリイミド樹脂の弾性率が高く、線膨脹係数は小
さくなる。従って、低吸水性が特に求められる用途に用
いる場合にはピロメリット酸二無水物の比率を下げ、高
弾性率が求められる用途に用いる場合にはピロメリット
酸二無水物の比率を上げることでそれぞれの用途に適し
たポリイミド樹脂乃至ポリイミドフィルムを得ることが
できる。
The ratio of the compound represented by the formula (I) and pyromellitic dianhydride as an acid dianhydride component may be mixed arbitrarily, but if the ratio of pyromellitic dianhydride is large, a film obtained is Since it becomes brittle, the mixing ratio of the compound represented by the formula (I) and pyromellitic dianhydride is 1
It is preferably in the range of 00:00 to 10:90. The smaller the proportion of pyromellitic dianhydride, the smaller the water absorption, and the larger the proportion of pyromellitic dianhydride, the higher the elastic modulus of the obtained polyimide resin and the smaller the coefficient of linear expansion. Therefore, by lowering the ratio of pyromellitic dianhydride when used in applications where low water absorption is particularly required, and by increasing the ratio of pyromellitic dianhydride when used in applications where high elastic modulus is required. A polyimide resin or polyimide film suitable for each application can be obtained.

【0023】直線性ジアミンとしては、パラフェニレン
ジアミンを用いることがより好ましい。パラフェニレン
ジアミンは、脂肪族の置換基等を有しないので、耐熱性
に優れ分子が効率良く配向するためにポリイミド樹脂の
弾性率を高く保つことができる。
It is more preferable to use para-phenylenediamine as the linear diamine. Since para-phenylenediamine does not have an aliphatic substituent or the like, it has excellent heat resistance and the molecules are efficiently oriented, so that the elastic modulus of the polyimide resin can be kept high.

【0024】本発明のポリイミド樹脂の前駆体であるポ
リアミド酸の平均分子量は、10,000〜1,00
0,000であることが望ましい。平均分子量が10,
000未満では出来上がったポリイミドフィルムが脆く
なるし、1,000,000を超えるとポリアミド酸溶
液の粘度が高くなり過ぎ取扱いが難しくなって好ましく
ない。
The polyamic acid, which is the precursor of the polyimide resin of the present invention, has an average molecular weight of 10,000 to 1,000.
It is desirable to be 10,000. Average molecular weight is 10,
When it is less than 000, the finished polyimide film becomes brittle, and when it exceeds 1,000,000, the viscosity of the polyamic acid solution becomes too high, which is not preferable because it is difficult to handle.

【0025】ポリアミド酸重合体の生成反応に使用され
る有機極性溶媒としては、例えば、ジメチルスルホキシ
ド、ジエチルスルホキシド等のスルホキシド系溶媒、N,
N-ジメチルホルムアミド、N,N-ジエチルホルムアミド等
のホルムアミド系溶媒、N,N-ジメチルアセトアミド、N,
N-ジエチルアセトアミド等のアセトアミド系溶媒、N-メ
チル−2-ピロリドン、N-ビニル−2-ピロリドン等のピロ
リドン系溶媒、フェノール、o-、m-又はp-クレゾール、
キシレノール、ハロゲン化フェノール、カテコール等の
フェノール系溶媒、或いはヘキサメチルホスホルアミ
ド、γ−ブチロラクトン等を挙げることができ、これら
を単独又は混合物として用いるのが望ましいが、更には
キシレン、トルエン等の芳香族炭化水素を一部使用する
こともできる。
Examples of the organic polar solvent used in the polyamic acid polymer formation reaction include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, N,
Formamide solvents such as N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, N,
N-diethylacetamide and other acetamide solvents, N-methyl-2-pyrrolidone, N-vinyl-2-pyrrolidone and other pyrrolidone solvents, phenol, o-, m- or p-cresol,
Examples thereof include xylenol, halogenated phenol, phenolic solvents such as catechol, hexamethylphosphoramide, γ-butyrolactone and the like, and it is desirable to use these alone or as a mixture, and further, aroma such as xylene and toluene. Group hydrocarbons can also be used in part.

【0026】このポリアミド酸重合体を得るための合成
方法における原料の添加の順序に制限はなく、様々の順
序、混合、分割等の方法を組合せて添加しても良い。ま
た、このポリアミド酸重合体は有機極性溶媒中に5〜4
0重量%、好ましくは10〜30重量%溶解されている
のが取扱いの面からも好ましい。ポリアミド酸重合体溶
液の合成法を、具体的に説明すると次の方法を挙げるこ
とができる。
There is no limitation on the order of addition of the raw materials in the synthetic method for obtaining the polyamic acid polymer, and various methods such as ordering, mixing and dividing may be added in combination. Further, this polyamic acid polymer is added to an organic polar solvent in an amount of 5-4.
It is preferably dissolved in 0% by weight, preferably 10 to 30% by weight from the viewpoint of handling. The method for synthesizing the polyamic acid polymer solution will be specifically described as follows.

【0027】合成法1: 容器に有機極性溶媒と1種以
上の直線性ジアミンをとり、冷却撹拌する。次いで、式
(I)で示される化合物を上記反応溶液に実質等モル加
え、好ましくは20分以上冷却撹拌して、ポリアミド酸
共重合体溶液を得る。
Synthetic Method 1: An organic polar solvent and one or more linear diamines are placed in a container and stirred with cooling. Then, the compound represented by the formula (I) is added to the reaction solution in substantially equimolar amounts, and the mixture is cooled and stirred for preferably 20 minutes or more to obtain a polyamic acid copolymer solution.

【0028】合成法2: 容器に有機極性溶媒と1種以
上の直線性ジアミンをとり、冷却撹拌する。次いで、式
(I)で示される化合物とピロメリット酸二無水物との
混合物を、酸二無水物成分のモル数とジアミン成分のモ
ル数とが等しくなるように上記反応溶液に加え、好まし
くは20分以上冷却撹拌して、ポリアミド酸共重合体溶
液を得る。
Synthetic Method 2: An organic polar solvent and one or more linear diamines are placed in a container and stirred with cooling. Then, a mixture of the compound represented by formula (I) and pyromellitic dianhydride is added to the above reaction solution so that the number of moles of the acid dianhydride component and the number of moles of the diamine component are equal, and preferably, The mixture is cooled and stirred for 20 minutes or more to obtain a polyamic acid copolymer solution.

【0029】合成法3: 容器に有機極性溶媒と式
(I)で示される化合物をとり、冷却撹拌する。次い
で、直線性ジアミンを上記反応溶液に実質等モルよりも
過剰に加え、好ましくは20分以上冷却撹拌する。更
に、ピロメリット酸二無水物を、酸二無水物成分のモル
数とジアミン成分のモル数とが等しくなるように、上記
反応溶液に徐々に冷却撹拌しながら加えて、ポリアミド
酸共重合体溶液を得る。
Synthesis method 3: An organic polar solvent and a compound represented by the formula (I) are placed in a container, and the mixture is cooled and stirred. Next, the linear diamine is added to the above reaction solution in excess of substantially equimolar amount, and the mixture is cooled and stirred for preferably 20 minutes or more. Further, pyromellitic dianhydride is added to the above reaction solution while gradually cooling and stirring so that the number of moles of the acid dianhydride component and the number of moles of the diamine component are equal, and a polyamic acid copolymer solution is added. To get

【0030】このようにして得られる芳香族ポリアミド
酸重合体溶液から本発明のポリイミド樹脂乃至ポリイミ
ドフィルムを得るためには、熱的に脱水・閉環する熱的
方法、脱水剤を用いる化学的方法のいずれを用いても良
いが、化学的方法によると生成するポリイミド樹脂及び
ポリイミドフィルムの伸びや引張強度等の機械特性が優
れたものになるので好ましい。
In order to obtain the polyimide resin or polyimide film of the present invention from the aromatic polyamic acid polymer solution thus obtained, a thermal method of thermally dehydrating and ring-closing or a chemical method of using a dehydrating agent is used. Any of these may be used, but the chemical method is preferable because the resulting polyimide resin and polyimide film have excellent mechanical properties such as elongation and tensile strength.

【0031】ここで用いる脱水剤としては、例えば無水
酢酸等の脂肪族酸無水物、無水安息香酸等の芳香族酸無
水物等が挙げられる。また、触媒としては、例えばトリ
エチルアミン等の脂肪族第3級アミン類、ジメチルアニ
リン等の芳香族第3級アミン類、ピリジン、ピコリン、
イソキノリン等の複素環式第3級アミン類等が挙げられ
る。
Examples of the dehydrating agent used here include aliphatic acid anhydrides such as acetic anhydride and aromatic acid anhydrides such as benzoic anhydride. Examples of the catalyst include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as dimethylaniline, pyridine, picoline,
Examples include heterocyclic tertiary amines such as isoquinoline.

【0032】ポリイミドフィルムの作製方法を具体的に
説明する。上記のポリアミド酸重合体又はその溶液に化
学量論以上の脱水剤と触媒量の第3級アミンを混合した
溶液をドラム或いはエンドレスベルト上に流延又は塗布
して膜状とし、その膜を150℃以下の温度で約1〜9
0分間乾燥し、自己支持性のポリアミド酸の膜を得る。
次いで、これをドラム或いはエンドレスベルトから引き
剥して端部を固定する。その後、約100〜500℃ま
で徐々に加熱することによってイミド化し、冷却後、端
部の固定を取外して本発明のポリイミドフィルムを得
る。
A method for producing a polyimide film will be specifically described. A solution prepared by mixing the above polyamic acid polymer or a solution thereof with a stoichiometric or more dehydrating agent and a catalytic amount of a tertiary amine is cast or coated on a drum or an endless belt to form a film. Approximately 1-9 at temperatures below ℃
Dry for 0 minutes to obtain a self-supporting polyamic acid film.
Then, this is peeled off from the drum or the endless belt to fix the ends. Then, the polyimide film of the present invention is obtained by imidizing by gradually heating to about 100 to 500 ° C., cooling and then removing the fixing of the end portions.

【0033】本発明のポリイミド樹脂及びポリイミドフ
ィルムには、各種の有機添加剤や無機のフィラー類或い
は各種の強化材を複合することも可能である。そのよう
な添加剤としては、一般に使用されるものを適宜使用す
ることができるが、特に限定されるものではない。ま
た、その量についても任意に決定でき、ポリイミド樹脂
及びポリイミドフィルムの製造工程の任意の段階で添加
することができる。
The polyimide resin and the polyimide film of the present invention can be compounded with various organic additives, inorganic fillers or various reinforcing materials. As such an additive, a commonly used additive can be appropriately used, but it is not particularly limited. Also, the amount thereof can be arbitrarily determined, and it can be added at any stage of the production process of the polyimide resin and the polyimide film.

【0034】本発明のポリイミド樹脂及びポリイミドフ
ィルムは、耐熱性に優れ、高弾性率、低吸水率性、低吸
湿膨脹係数を有しており、電気・電子機器用途として有
用であり、特に銅箔との複合材料として用いた場合に反
りやカールを小さくするのに適した線膨脹係数を有する
TAB(Tape-Automated-Bonding)用途又はFPC(Flexi
ble-Printed-Circuit)用途に有用であり、銅線被覆材料
やリードフレーム固定用テープ、耐熱性粘着テープ、航
空機や人工衛星の断熱材等としても使用可能である。
INDUSTRIAL APPLICABILITY The polyimide resin and polyimide film of the present invention are excellent in heat resistance, have a high elastic modulus, a low water absorption rate and a low coefficient of hygroscopic expansion, and are useful as electric and electronic equipment applications, and particularly copper foil. TAB (Tape-Automated-Bonding) or FPC (Flexi) having a coefficient of linear expansion suitable for reducing warpage and curl when used as a composite material with
It is useful for ble-Printed-Circuit) applications, and can also be used as copper wire coating material, lead frame fixing tape, heat resistant adhesive tape, heat insulating material for aircraft and satellites, etc.

【0035】[0035]

【実施例】次に、実施例を挙げて本発明を具体的に説明
するが、本発明はこれらに限定されるものではない。 実施例1 セパラブルフラスコにN,N-ジメチルホルムアミドとパラ
フェニレンジアミン1当量をとり、ジアミン化合物が完
全に溶解するまで室温で良く撹拌した後、氷で冷却し
た。次に、式(I)
EXAMPLES Next, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. Example 1 N, N-dimethylformamide and 1 equivalent of para-phenylenediamine were placed in a separable flask, stirred well at room temperature until the diamine compound was completely dissolved, and then cooled with ice. Next, the formula (I)

【0036】[0036]

【化4】 で示される化合物1当量を加えて、ポリアミド酸のN,N-
ジメチルホルムアミド溶液を得た。なお、N,N-ジメチル
ホルムアミドの使用量は、パラフェニレンジアミンと式
(I)で示される化合物のモノマー仕込濃度が18重量
%になるようにした。
[Chemical 4] 1 equivalent of the compound represented by
A dimethylformamide solution was obtained. The amount of N, N-dimethylformamide used was such that the monomer charge concentration of para-phenylenediamine and the compound represented by formula (I) was 18% by weight.

【0037】得られたポリアミド酸溶液をガラス板上に
流延塗布し、約100℃で約15分間乾燥後、ポリアミ
ド酸塗膜をガラス板から剥し、その塗膜を支持枠に固定
した後、約150℃で約4分間、約250℃で約4分
間、約350℃で約4分間加熱し、脱水閉環乾燥し、約
75μm のポリイミドフィルムを得た。
The polyamic acid solution thus obtained was cast-coated on a glass plate, dried at about 100 ° C. for about 15 minutes, the polyamic acid coating film was peeled from the glass plate, and the coating film was fixed on a supporting frame. The film was heated at about 150 ° C. for about 4 minutes, at about 250 ° C. for about 4 minutes, at about 350 ° C. for about 4 minutes, and dehydrated and ring-closed dried to obtain a polyimide film of about 75 μm.

【0038】得られたポリイミドフィルムの吸水率、弾
性率、線膨脹係数、吸湿膨脹係数、銅箔/接着剤/ポリ
イミドフィルムの3層積層体の反りを調べた。反りにつ
いては、銅箔/接着剤/ポリイミドフィルムの3層積層
体(大きさ35mm×40mm)を20℃65%RHの環境
下に48時間放置したものを目視で観察し、反りの良否
を判定した。それらの結果は表1に示す通りである。
The polyimide film thus obtained was examined for water absorption, elastic modulus, linear expansion coefficient, hygroscopic expansion coefficient, and warpage of a three-layer laminate of copper foil / adhesive / polyimide film. Regarding the warp, the quality of the warp was judged by visually observing a three-layer laminate of copper foil / adhesive / polyimide film (size 35 mm x 40 mm) left in an environment of 20 ° C and 65% RH for 48 hours. did. The results are shown in Table 1.

【0039】実施例2 セパラブルフラスコにN,N-ジメチルホルムアミドとパラ
フェニレンジアミン2当量をとり、ジアミン化合物が完
全に溶解するまで室温で良く撹拌した後、氷で冷却し
た。次に、式(I)で示される化合物1当量を加えて2
0分間冷却撹拌した。次いで、ピロメリット酸二無水物
1当量を徐々に加え、20分間冷却撹拌して、ポリアミ
ド酸のN,N-ジメチルホルムアミド溶液を得た。実施例1
と同様の方法で焼成し、約75μm のポリイミドフィル
ムを得た。
Example 2 N, N-dimethylformamide and 2 equivalents of paraphenylenediamine were placed in a separable flask, stirred well at room temperature until the diamine compound was completely dissolved, and then cooled with ice. Then, 1 equivalent of the compound of formula (I) is added to give 2
The mixture was cooled and stirred for 0 minutes. Then, 1 equivalent of pyromellitic dianhydride was gradually added, and the mixture was cooled and stirred for 20 minutes to obtain a N, N-dimethylformamide solution of polyamic acid. Example 1
The film was baked in the same manner as in 1. to obtain a polyimide film of about 75 μm.

【0040】得られたポリイミドフィルムの諸物性は、
表1に示す通りである。 比較例1 セパラブルフラスコにN,N-ジメチルホルムアミドと 4,
4'-ジアミノジフェニルエーテル1当量をとり、ジアミ
ン化合物が完全に溶解するまで室温で良く撹拌した後、
氷で冷却した。次に、ピロメリット酸二無水物1当量を
加え、40分間冷却撹拌した。ポリアミド酸のN,N-ジメ
チルホルムアミド溶液を得た。実施例1と同様の方法で
焼成し、約75μm のポリイミドフィルムを得た。
The physical properties of the obtained polyimide film are as follows.
It is as shown in Table 1. Comparative Example 1 A separable flask was charged with N, N-dimethylformamide and 4,
After taking 1 equivalent of 4'-diaminodiphenyl ether and stirring well at room temperature until the diamine compound is completely dissolved,
Cooled with ice. Next, 1 equivalent of pyromellitic dianhydride was added, and the mixture was cooled and stirred for 40 minutes. A N, N-dimethylformamide solution of polyamic acid was obtained. Firing was performed in the same manner as in Example 1 to obtain a polyimide film of about 75 μm.

【0041】得られたポリイミドフィルムの諸物性は、
表1に示す通りである。 比較例2 セパラブルフラスコにN,N-ジメチルホルムアミドとパラ
フェニレンジアミン1当量をとり、ジアミン化合物が完
全に溶解するまで室温で良く撹拌した後、氷で冷却し
た。次に、ピロメリット酸二無水物2当量を加え、40
分間冷却撹拌した。次いで、 4,4'-ジアミノジフェニル
エーテル1当量を加えた。その後1時間冷却撹拌して、
ポリアミド酸のN,N-ジメチルホルムアミド溶液を得た。
実施例1と同様の方法で焼成し、約75μm のポリイミ
ドフィルムを得た。
The physical properties of the obtained polyimide film are as follows.
It is as shown in Table 1. Comparative Example 2 N, N-dimethylformamide and 1 equivalent of para-phenylenediamine were placed in a separable flask, well stirred at room temperature until the diamine compound was completely dissolved, and then cooled with ice. Next, add 2 equivalents of pyromellitic dianhydride, and add 40
The mixture was cooled and stirred for a minute. Then 1 equivalent of 4,4'-diaminodiphenyl ether was added. Then cool and stir for 1 hour,
A N, N-dimethylformamide solution of polyamic acid was obtained.
Firing was performed in the same manner as in Example 1 to obtain a polyimide film of about 75 μm.

【0042】得られたポリイミドフィルムの諸物性は、
表1に示す通りである。 比較例3 セパラブルフラスコにN,N-ジメチルホルムアミドとパラ
フェニレンジアミン2当量及び 4,4'-ジアミノジフェニ
ルエーテル1当量をとり、ジアミン化合物が完全に溶解
するまで室温で良く撹拌した後、氷で冷却した。次に、
3,3',4,4'-ベンゾフェノンテトラカルボン酸二無水物2
当量を加えて、20分間冷却撹拌した後、ピロメリット
酸二無水物1当量を加え、1時間冷却撹拌して、ポリア
ミド酸のN,N-ジメチルホルムアミド溶液を得た。実施例
1と同様の方法で焼成し、約75μm のポリイミドフィ
ルムを得た。
The physical properties of the obtained polyimide film are as follows.
It is as shown in Table 1. Comparative Example 3 A separable flask was charged with N, N-dimethylformamide, 2 equivalents of paraphenylenediamine and 1 equivalent of 4,4'-diaminodiphenyl ether, and well stirred at room temperature until the diamine compound was completely dissolved, and then cooled with ice. did. next,
3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride 2
After adding an equivalent amount and cooling and stirring for 20 minutes, 1 equivalent of pyromellitic dianhydride was added and cooling and stirring for 1 hour to obtain a N, N-dimethylformamide solution of polyamic acid. Firing was performed in the same manner as in Example 1 to obtain a polyimide film of about 75 μm.

【0043】得られたポリイミドフィルムの諸物性は、
表1に示す通りである。 比較例4 セパラブルフラスコにN,N-ジメチルホルムアミドとパラ
フェニレンジアミン3当量をとり、ジアミン化合物が完
全に溶解するまで室温で良く撹拌した後、氷で冷却し
た。次に、 4,4'-オキシジフタル酸無水物4当量を加え
て、20分間冷却撹拌した後、 4,4'-ジアミノジフェニ
ルエーテル1当量を加え、1時間冷却撹拌して、ポリア
ミド酸のN,N-ジメチルホルムアミド溶液を得た。実施例
1と同様の方法で焼成し、約75μm のポリイミドフィ
ルムを得た。
The physical properties of the obtained polyimide film are as follows.
It is as shown in Table 1. Comparative Example 4 N, N-dimethylformamide and 3 equivalents of paraphenylenediamine were placed in a separable flask, well stirred at room temperature until the diamine compound was completely dissolved, and then cooled with ice. Next, after adding 4 equivalents of 4,4'-oxydiphthalic anhydride and cooling and stirring for 20 minutes, 1 equivalent of 4,4'-diaminodiphenyl ether was added and cooling and stirring for 1 hour to obtain N, N of polyamic acid. -A dimethylformamide solution was obtained. Firing was performed in the same manner as in Example 1 to obtain a polyimide film of about 75 μm.

【0044】得られたポリイミドフィルムの諸物性は、
表1に示す通りである。 比較例5 セパラブルフラスコにN,N-ジメチルホルムアミドと 4,
4'-ジアミノジフェニルエーテル2当量をとり、ジアミ
ン化合物が完全に溶解するまで室温で良く撹拌した後、
氷で冷却した。次に、式(I)で示される化合物1当量
及びピロメリット酸二無水物1当量を加え1時間冷却撹
拌して、ポリアミド酸のN,N-ジメチルホルムアミド溶液
を得た。実施例1と同様の方法で焼成し、約75μm の
ポリイミドフィルムを得た。得られたポリイミドフィル
ムの諸物性は、表1に示す通りである。
The physical properties of the obtained polyimide film are as follows.
It is as shown in Table 1. Comparative Example 5 A separable flask was charged with N, N-dimethylformamide and 4,
After taking 2 equivalents of 4'-diaminodiphenyl ether and stirring well at room temperature until the diamine compound is completely dissolved,
Cooled with ice. Next, 1 equivalent of the compound represented by formula (I) and 1 equivalent of pyromellitic dianhydride were added, and the mixture was cooled and stirred for 1 hour to obtain a N, N-dimethylformamide solution of polyamic acid. Firing was performed in the same manner as in Example 1 to obtain a polyimide film of about 75 μm. The physical properties of the obtained polyimide film are as shown in Table 1.

【0045】[0045]

【表1】 [Table 1]

【0046】表1においては、最も一般的な組成のポリ
イミドフィルムの特性が比較例1として示されており、
吸水率や吸湿膨脹係数が大きい欠点あることがが明らか
である。これに対して、本発明である実施例1では、弾
性率や線膨脹係数を殆ど変えずに低吸水率や低吸湿膨脹
係数を実現できることが明らかである。
In Table 1, the characteristics of the polyimide film having the most general composition are shown as Comparative Example 1,
It is obvious that there is a drawback that the water absorption rate and the hygroscopic expansion coefficient are large. On the other hand, in Example 1 which is the present invention, it is apparent that the low water absorption coefficient and the low hygroscopic expansion coefficient can be realized without changing the elastic modulus and the linear expansion coefficient.

【0047】また、比較例2及び比較例4では、弾性率
や吸湿膨脹係数は優れた特性を示しているが、線膨脹係
数が小さい。比較例3では、弾性率や吸湿膨脹係数は優
れているが、吸水率が大きい。比較例5では、吸水率は
優れているが、弾性率が低く線膨脹係数が大き過ぎる。
これらに対して、本発明である実施例2では、比較的高
い弾性率を持ちながら、適度な大きさの線膨脹係数と低
吸水率や低吸湿膨脹係数を実現できることが明らかであ
る。
Further, in Comparative Examples 2 and 4, although the elastic modulus and the coefficient of hygroscopic expansion are excellent, the coefficient of linear expansion is small. In Comparative Example 3, the elastic modulus and the coefficient of hygroscopic expansion are excellent, but the water absorption is large. In Comparative Example 5, the water absorption rate is excellent, but the elastic modulus is low and the linear expansion coefficient is too large.
On the other hand, it is apparent that in Example 2 of the present invention, it is possible to realize a linear expansion coefficient and a low water absorption coefficient or a low hygroscopic expansion coefficient of an appropriate size while having a relatively high elastic modulus.

【0048】このように、本発明の式(I)で示される
化合物と直線性ジアミンとを重合させることにより合成
したポリイミドフィルムは、汎用のポリイミドフィルム
に低吸水性を付与した特性を示し、弾性率や線膨脹係数
を大きく変えることなく低吸水率を実現できる。また、
酸二無水物成分に式(I)で示される化合物とピロメリ
ット酸二無水物とを混合したものを用いることによって
TAB用ベースフィルム等の高弾性率が必要な用途に適
した低吸水性のポリイミドフィルムを実現できる。
As described above, the polyimide film synthesized by polymerizing the compound represented by the formula (I) of the present invention and the linear diamine exhibits the property of imparting low water absorption to a general-purpose polyimide film, and has elasticity. A low water absorption rate can be realized without greatly changing the coefficient or linear expansion coefficient. Also,
By using a mixture of the compound represented by the formula (I) and pyromellitic dianhydride as the acid dianhydride component, it is possible to obtain a low water absorption property suitable for applications requiring a high elastic modulus such as a base film for TAB. A polyimide film can be realized.

【0049】[0049]

【発明の効果】本発明のポリイミド樹脂及びポリイミド
フィルムは、耐熱性に優れると共に、高弾性率、適度な
線膨脹係数、低吸水率、低吸湿膨脹係数の全てを兼ね備
えることができる。
INDUSTRIAL APPLICABILITY The polyimide resin and polyimide film of the present invention are excellent in heat resistance and have all of a high elastic modulus, an appropriate linear expansion coefficient, a low water absorption coefficient and a low hygroscopic expansion coefficient.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 次の式(I) 【化1】 で示される化合物と直線性ジアミン化合物とからなるこ
とを特徴とするポリイミド樹脂。
1. The following formula (I): A polyimide resin comprising a compound represented by and a linear diamine compound.
【請求項2】 式(I)で示される化合物とピロメリッ
ト酸二無水物と直線性ジアミン化合物とからなることを
特徴とするポリイミド樹脂。
2. A polyimide resin comprising a compound represented by formula (I), pyromellitic dianhydride and a linear diamine compound.
【請求項3】 直線性ジアミン化合物がパラフェニレン
ジアミンである請求項1又は2に記載のポリイミド樹
脂。
3. The polyimide resin according to claim 1, wherein the linear diamine compound is paraphenylenediamine.
【請求項4】 請求項1乃至3のいずれかに記載のポリ
イミド樹脂からなることを特徴とするポリイミドフィル
ム。
4. A polyimide film comprising the polyimide resin according to any one of claims 1 to 3.
JP2936895A 1995-02-17 1995-02-17 Polyimide resin and polyimide film Pending JPH08217877A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2936895A JPH08217877A (en) 1995-02-17 1995-02-17 Polyimide resin and polyimide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2936895A JPH08217877A (en) 1995-02-17 1995-02-17 Polyimide resin and polyimide film

Publications (1)

Publication Number Publication Date
JPH08217877A true JPH08217877A (en) 1996-08-27

Family

ID=12274222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2936895A Pending JPH08217877A (en) 1995-02-17 1995-02-17 Polyimide resin and polyimide film

Country Status (1)

Country Link
JP (1) JPH08217877A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11152331A (en) * 1997-11-20 1999-06-08 Kanegafuchi Chem Ind Co Ltd Production of polyamic acid and polyimide film
WO2000061658A1 (en) * 1999-04-09 2000-10-19 Kaneka Corporation Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these
JP2007091980A (en) * 2005-09-30 2007-04-12 Kaneka Corp Hot melt polyimide film and metal laminate plate by using the same
JP2009013422A (en) * 2008-09-03 2009-01-22 Kaneka Corp Coating material
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JP2022507674A (en) * 2018-11-19 2022-01-18 ピーアイ・アドバンスド・マテリアルズ・カンパニー・リミテッド Polyamic acid composition for packaging electronic components and methods for packaging electronic components using this
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11152331A (en) * 1997-11-20 1999-06-08 Kanegafuchi Chem Ind Co Ltd Production of polyamic acid and polyimide film
WO2000061658A1 (en) * 1999-04-09 2000-10-19 Kaneka Corporation Polyimide resin, resin composition with improved moisture resistance comprising the same, adhesive solution, filmy bonding member, layered adhesive film, and processes for producing these
US6693162B2 (en) 1999-04-09 2004-02-17 Kaneka Japan Corporation Polyimide resin and resin composition, adhesive solution, film-state joining component,and adhesive laminate film improved in moisture resistance using it, and production methods therefor
JP2007091980A (en) * 2005-09-30 2007-04-12 Kaneka Corp Hot melt polyimide film and metal laminate plate by using the same
JP2009013422A (en) * 2008-09-03 2009-01-22 Kaneka Corp Coating material
WO2014199965A1 (en) * 2013-06-10 2014-12-18 日産化学工業株式会社 Resin composition for display substrates, resin thin film for display substrates, and method for producing resin thin film for display substrates
CN105283486A (en) * 2013-06-10 2016-01-27 日产化学工业株式会社 Resin composition for display substrates, resin thin film for display substrates, and method for producing resin thin film for display substrates
KR20160019466A (en) * 2013-06-10 2016-02-19 닛산 가가쿠 고교 가부시키 가이샤 Resin composition for display substrates, resin thin film for display substrates, and method for producing resin thin film for display substrates
JPWO2014199965A1 (en) * 2013-06-10 2017-02-23 日産化学工業株式会社 Resin composition for display substrate, resin thin film for display substrate, and method for producing resin thin film for display substrate
CN105283486B (en) * 2013-06-10 2017-09-29 日产化学工业株式会社 The manufacture method of display base plate resin combination, display base plate resin film and display base plate resin film
JP2022507674A (en) * 2018-11-19 2022-01-18 ピーアイ・アドバンスド・マテリアルズ・カンパニー・リミテッド Polyamic acid composition for packaging electronic components and methods for packaging electronic components using this
JP2022509089A (en) * 2018-11-19 2022-01-20 ピーアイ・アドバンスド・マテリアルズ・カンパニー・リミテッド Polyamic acid composition for packaging electronic components and methods for packaging electronic components using this

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