JPH0762546A - Atmospheric plasma surface treating device - Google Patents
Atmospheric plasma surface treating deviceInfo
- Publication number
- JPH0762546A JPH0762546A JP23076893A JP23076893A JPH0762546A JP H0762546 A JPH0762546 A JP H0762546A JP 23076893 A JP23076893 A JP 23076893A JP 23076893 A JP23076893 A JP 23076893A JP H0762546 A JPH0762546 A JP H0762546A
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- Prior art keywords
- gas
- pair
- side walls
- box
- treated
- Prior art date
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Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は表面処理方法あるいは
薄膜形成方法とその装置に関し、特に大気圧グロ−放電
プラズマによるプラズマ表面処理法あるいは製膜法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method or a thin film formation method and an apparatus therefor, and more particularly to a plasma surface treatment method or a film formation method using atmospheric pressure glow discharge plasma.
【0002】[0002]
【従来の技術】金属、セラミック材など固体材料の表面
に炭素膜、フッ化炭素膜などを形成するには、従来は反
応ガスとしてのフッ化炭素系あるいは炭化水素系物質な
どのガスとヘリウム、アルゴン、ネオンなどの希ガスま
たはN2 等の不活性ガスの混合ガスを真空槽内で高周波
電界でプラズマ化してコ−ティング処理や薄膜形成を行
っていたが、近年に至り真空発生装置や真空容器などを
必要としない大気圧プラズマ表面処理法や薄膜形成法が
要望されるにともない、開発が進められまた技術内容が
開示されている。代表的なものとして、特願昭63−1
66599(特開平2−15171)、特願昭61−1
93934(特開昭63−50478)、特願昭63−
138630(特開平1−306569)が挙げられ
る。図7は、これらの発明で使用される薄膜形成装置を
模式的に示す概要立面図であり、図7のA−A断面図を
図8に示す。この装置の構造は、誘電体製の四角形箱状
(または筒体)の反応容器1を構成して、その上下また
は左右に対向する側壁1a,1b(図8では左右の側
壁)の外表面に、それぞれ電極2a,2bを取り付け、
高周波高電圧の電源3に接続し反応容器1の導入口1c
から、ヘリウム(He)、ネオン(Ne)またはアルゴ
ン(Ar)などの希ガスまたはN2 等の不活性ガスとC
F4 などのフッ化炭素系あるいは炭化水素系物質の反応
ガスとの混合ガスを、矢印Cのように流し、導入口1c
の反対側の吹出し口1dの下に被処理物体5を位置させ
矢印Bの方向に移動するように置く。このような構造
で、前記の混合ガスを流して電極2a,2bに高周波高
電圧を印加すると、グロ−放電7により混合ガスがプラ
ズマ化し矢印Dのように流れ、そこに生成されるラジカ
ルが吹出し口1dから吹き出されて被処理物体5の表面
が改質あるいは表面に薄膜が形成される。2. Description of the Related Art In order to form a carbon film, a fluorocarbon film or the like on the surface of a solid material such as a metal or a ceramic material, conventionally, a gas such as a fluorocarbon-based or hydrocarbon-based substance as a reaction gas and helium, A rare gas such as argon or neon or a mixed gas of an inert gas such as N 2 is converted into plasma by a high frequency electric field in a vacuum chamber for coating treatment or thin film formation. With the demand for an atmospheric pressure plasma surface treatment method and a thin film forming method that do not require a container or the like, development has been promoted and technical contents have been disclosed. As a typical example, Japanese Patent Application No. 63-1
66599 (JP-A-2-15171), Japanese Patent Application No. 61-1
93934 (Japanese Patent Laid-Open No. 63-50478), Japanese Patent Application No. 63-
138630 (JP-A-1-306569). FIG. 7 is a schematic elevational view schematically showing the thin film forming apparatus used in these inventions, and FIG. 8 is a sectional view taken along line AA of FIG. This device has a structure in which a dielectric rectangular box-shaped (or cylindrical) reaction vessel 1 is formed, and the outer surfaces of side walls 1a and 1b (left and right side walls in FIG. 8) facing each other vertically or horizontally are formed. , The electrodes 2a and 2b are attached,
Inlet port 1c of the reaction vessel 1 connected to a high frequency and high voltage power source
From a rare gas such as helium (He), neon (Ne) or argon (Ar) or an inert gas such as N 2 and C
A mixed gas with a reaction gas of a fluorocarbon-based or hydrocarbon-based substance such as F 4 is flown as shown by an arrow C, and the inlet 1c
The object 5 to be processed is positioned below the outlet 1d on the opposite side of the above, and is placed so as to move in the direction of arrow B. When a high-frequency high voltage is applied to the electrodes 2a, 2b by flowing the mixed gas with such a structure, the mixed gas is turned into plasma by the glow discharge 7 and flows as shown by an arrow D, and radicals generated there are blown out. The surface of the object 5 to be processed is reformed or a thin film is formed on the surface by being blown out from the mouth 1d.
【0003】[0003]
【発明が解決しようとする課題】上記の吹出し口から吹
き出したガスは、被処理物体の表面を処理するととも
に、大気中に拡散するが、この拡散ガスは上記の表面と
の反応によって、固体やガスとしての副生成物が生成さ
れ、周囲の環境を汚染し有害になる場合がある。そこ
で、吹出しガスや副生成物(固体及びガス)が周囲に拡
散するのを防止するか、或いは少なくとも拡散量を減少
させることが要望されていた。本発明はこれらの要望に
対応する装置を提供することを目的とする。The gas blown out from the above-mentioned outlet treats the surface of the object to be treated and diffuses into the atmosphere. This diffused gas reacts with the above-mentioned surface to produce solids and solids. By-products as gases are produced which can pollute the surrounding environment and become harmful. Therefore, there has been a demand for preventing blowout gas and by-products (solid and gas) from diffusing into the surroundings, or at least reducing the amount of diffusion. The present invention aims to provide a device that meets these needs.
【0004】[0004]
【課題を解決するための手段】本発明は下記のような手
段によりこの課題を解決した。 (1)電極を有し誘電体製で箱状の反応容器の周囲に、
混合ガスが吹出し口から被処理物体の表面に接触して処
理を終わった後に排出ガスとして吹き出されるガスを吸
引する空間を形成するための箱体を設け、この箱体の外
周に別の空間を形成する外箱体を設け、その上部からA
r,N2 等の不活性ガスを導入し下端から被処理物体に
向け吹き出す構造にする。また、被処理物体が移動され
る場合には、前記の反応容器と箱体の側壁の被処理物体
に対向する先端部を垂直中心軸面側に向け傾斜させる。 (2)被処理物体が通気性を有する織物などの繊維状の
場合は、電極を有する誘電体製の箱状の反応容器の周囲
に、Ar,N2 等の不活性ガスを被処理物体に向けて吹
き出す空間を画定する箱体を設け、また被処理物体に対
し反応容器と反対側に、反応済み混合ガスと不活性ガス
の合計吹き出し面積よりもやや大きい開口面積を有する
ガス吸引用の別の空間を画定する受箱体を設ける構造に
する。移動する被処理物体の場合は(1)項に準ずる構
造とする。The present invention has solved this problem by the following means. (1) Around a box-shaped reaction container made of a dielectric material with electrodes,
A box body is provided to form a space for sucking the gas blown out as exhaust gas after the mixed gas comes into contact with the surface of the object to be treated from the outlet and finishes the treatment, and another space is provided on the outer periphery of the box body. The outer box body that forms the
The structure is such that an inert gas such as r or N 2 is introduced and blown out from the lower end toward the object to be processed. Further, when the object to be processed is moved, the front end portions of the side walls of the reaction container and the box body facing the object to be processed are inclined toward the vertical central axis surface side. (2) When the object to be treated is a fibrous material such as a breathable woven fabric, an inert gas such as Ar or N 2 is applied to the object to be treated around a dielectric box-shaped reaction container having an electrode. A box that defines a space to be blown out is provided, and a separate space for gas suction that has an opening area slightly larger than the total blowing area of the reacted mixed gas and the inert gas is provided on the side opposite to the reaction container with respect to the object to be processed. The structure is such that a receiving box body that defines the space is provided. In the case of a moving object to be processed, the structure conforms to the item (1).
【0005】[0005]
【作用】上記の(1)の場合、導入口から入った反応ガ
スはプラズマ化され、被処理物体を処理し未反応ガスと
副生成ガス等となって反応容器の外の空間内に吸引さ
れ、外部の回収装置などにより回収されるが、この吸引
の際に大気中の成分が混入して前記の処理に影響する場
合は、混入を防止するための別の外箱体を設けてAr,
N2 等の不活性ガスが被処理物体に吹き付けられる。大
気中の成分が混入しても処理に影響しない場合には、外
箱体を省略することができる。また、移動する被処理物
体の場合に、箱体及び各空間の壁の被処理物体に対向す
る先端部を傾斜させることにより、大気を巻き込み難く
するとともに、未反応ガス及び不活性ガスの回収が確実
に行われる。被処理物体が通気性の繊維材料製である上
記(2)項の場合は、吹き付けられたプラズマは被処理
物体を処理し、ガスの未反応分や副生成ガスは被処理物
体を通過して吹き付け側と反対側に抜けて受箱体内に吸
引されて環境を汚染しない。被処理物体が移動する場合
は前記(1)項の場合と同様である。In the case of the above (1), the reaction gas entering from the introduction port is turned into plasma, and the object to be treated is processed into unreacted gas, byproduct gas, etc., and sucked into the space outside the reaction container. , When it is recovered by an external recovery device, etc., but when the components in the air are mixed during this suction and affect the above-mentioned processing, another external box body is provided to prevent mixing, and Ar,
An inert gas such as N 2 is blown onto the object to be treated. The outer box body can be omitted when the components in the air do not affect the treatment. Further, in the case of a moving object to be processed, by tilting the tip of the box and the wall of each space facing the object to be processed, it becomes difficult for the atmosphere to be entrapped, and the unreacted gas and the inert gas are collected. Definitely done. In the case of the above item (2) in which the object to be processed is made of a breathable fiber material, the sprayed plasma processes the object to be processed, and unreacted gas and by-product gas pass through the object to be processed. It does not contaminate the environment by coming out to the side opposite to the spraying side and being sucked into the receiving box body. The case where the object to be processed moves is the same as in the case of the above item (1).
【0006】[0006]
【実施例】本発明による大気圧プラズマ表面処理装置の
第1実施例の縦断面図を図1(B)に、図1(B)のA
矢視図を図2に示す。これらの図において、先行技術と
して示した図7及び図8と同じ部材には同じ符号を付け
る。平面図で四角形の誘電体製箱状の反応容器1の、図
で左右の両側壁1a,1bの外表面には、それぞれ電極
2a,2bが取り付けられ、この電極2aと2bは高周
波、高電圧の電源3に接続される。箱状の反応容器1
は、前記の両側壁1a,1bと、図で左右の両側壁間を
連結する前後の周壁1fと、これら1対の側壁と周壁の
上面を覆う上壁1eとから成り、この上壁には丸穴状の
反応ガスの導入口1cが設けられ、下面は開口されてガ
スの吹出し口1dとなっていて、直立する両側壁1a,
1bの下方には所定の距離を保って被処理物体5が水平
に置かれている。反応容器1の外周には、空間S1 を形
成するように側壁10a,10bを有する誘電体製で四
角形の箱体10が設けられ、容器自体の構造は前記の反
応容器の構成とほぼ同一なので説明を省略する、箱体1
0の上端の左右両側には吐き出し口10c,10′cが
前記反応容器1の導入口1cの両外側方に設けられ、前
記の側壁10a,10bの下端部は、反応容器1の側壁
1a,1bの下端部とほぼ同じ高さだけ被処理物体5の
上面より上方に位置し、これらの側壁中で左、右の関係
で同じ側にある側壁1aと10a、1bと10bの下端
部の間には、それぞれ、吸引口10dと10′dが形成
される。箱体10の外周には、さらに外側の空間S2 を
形成するように導電体製で四角形の外箱体11が設けら
れ、その上面の左右両外側には導入口11cと11′c
が、それぞれ、前記の吐き出し口10c,10′cの外
側方に設けられ両側壁11aと11bの下端部は、側壁
10a,10bの下端部とほぼ同じ高さだけ被処理物体
5の上面より上方に位置し、側壁10aと11a、10
bと11bのそれぞれの間は吐き出し口11d,11′
d を形成する。外気が混入してもこの処理に問題がな
い場合には、図1(A)のように図1(B)に示した外
箱体11を省略し簡易型反応容器1とすることができ
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A vertical cross-sectional view of a first embodiment of an atmospheric pressure plasma surface treatment apparatus according to the present invention is shown in FIG. 1 (B), and FIG.
An arrow view is shown in FIG. In these figures, the same members as those in FIGS. 7 and 8 shown as the prior art are designated by the same reference numerals. Electrodes 2a and 2b are attached to the outer surfaces of the left and right side walls 1a and 1b of the reaction box 1 made of a dielectric box having a rectangular shape in a plan view. The electrodes 2a and 2b are high-frequency and high-voltage. Is connected to the power supply 3 of. Box-shaped reaction vessel 1
Is composed of the side walls 1a and 1b, front and rear peripheral walls 1f connecting left and right side walls in the figure, and a pair of side walls and an upper wall 1e covering the upper surface of the peripheral wall. A round-hole-shaped reaction gas inlet 1c is provided, and the lower surface is opened to form a gas outlet 1d.
An object 5 to be processed is horizontally placed below 1b with a predetermined distance. A dielectric rectangular box 10 having side walls 10a and 10b so as to form a space S 1 is provided on the outer periphery of the reaction container 1, and the structure of the container itself is almost the same as the structure of the reaction container. Box 1 without description
Outlet ports 10c and 10'c are provided on both left and right sides of the upper end of 0 on both outer sides of the inlet port 1c of the reaction vessel 1, and the lower end portions of the side walls 10a and 10b are the side wall 1a of the reaction vessel 1. Between the lower end portions of the side walls 1a and 10a, 1b and 10b, which are located above the upper surface of the object 5 to be processed and which are on the same side in the left and right relations, at substantially the same height as the lower end portion of 1b. The suction ports 10d and 10'd are formed in each of them. On the outer periphery of the box body 10, a quadrangular outer box body 11 made of a conductor is provided so as to form a space S 2 on the outer side, and inlets 11c and 11'c are formed on the left and right outer sides of the upper surface thereof.
However, the lower ends of both side walls 11a and 11b provided outside the discharge ports 10c and 10'c are located above the upper surface of the object 5 to be processed by substantially the same height as the lower ends of the side walls 10a and 10b. Located on the side walls 10a and 11a, 10
The outlets 11d and 11 'are provided between b and 11b, respectively.
form d. When there is no problem in this process even when the outside air is mixed, the outer box body 11 shown in FIG. 1B can be omitted as shown in FIG.
【0007】図3は、被処理物体5が移動(図では矢印
Bのように左方へ)される場合に対応するための第2実
施例を示す縦断面図であり、反応容器21の両側壁21
a,21bと箱体30の両側壁30a,30bの下端部
は、それぞれ、垂直軸面側に向かって内方に、外箱体3
1の両側壁31a,31bの下端部は垂直軸面に対して
外側に向かって傾斜しているが、それ以外の点は図1と
全く同様であり、外気が混入しても処理に問題がない場
合は、図1(A)に準じ外箱体11を省略できる。FIG. 3 is a vertical cross-sectional view showing a second embodiment for dealing with the case where the object 5 to be processed is moved (to the left as shown by arrow B in the figure). Wall 21
a, 21b and the lower end portions of both side walls 30a, 30b of the box body 30, respectively, inwardly toward the vertical axis surface side, the outer box body 3
The lower end portions of the both side walls 31a and 31b of No. 1 are inclined outward with respect to the vertical axis surface, but other than that are exactly the same as those in FIG. 1, and there is a problem in processing even if outside air is mixed. If not, the outer box body 11 can be omitted according to FIG.
【0008】次に上記第1と第2の実施例の装置の作用
について説明する。図1及び図2を参照すると、反応容
器1の導入口1cから入ったCF4 などの反応ガスとH
e等の希釈ガスの混合ガスは、電極2a,2bに印加さ
れた高周波高電圧によるグロ−放電7によりプラズマ化
され、生成されたラジカルが吹出し口1dから吹き出て
被処理物体5の表面を処理して改質した後、未反応ガス
や、副生成ガス等となって吸引口10d,10′dから
空間S1 に入り吐き出し口10c,10′cから図示し
ない回収容器に回収される。外箱体11(31)の導入
口11c,11′c(31c,31′c)からAr,N
2 等の不活性ガスが導入され第2の空間S2 を経て吐き
出し口11d,11′d(31d,31′d)から被処
理物体5に吹き付けられて、一部は吸引口10d,1
0′d(30d,30′d)に吸引され、大部分は外方
の大気へ吐き出され、大気中の成分が上記の表面改質の
処理に影響を与えないように大気の侵入を遮断する。図
3に示すように、被処理物体5が矢印Bの方向に移動さ
れる場合、各側壁の下端部がそれぞれ被処理物体5の表
面に対して垂直中心軸面側に向かって傾斜して曲げられ
ているので、大気の巻き込みを阻止するように作用する
と同時に処理ガスの回収を一層確実にする。Next, the operation of the devices of the first and second embodiments will be described. Referring to FIGS. 1 and 2, a reaction gas such as CF 4 and H 2 which have entered through the inlet 1c of the reaction vessel 1 and H
The mixed gas of the diluent gas such as e is turned into plasma by the glow discharge 7 by the high frequency high voltage applied to the electrodes 2a and 2b, and the generated radicals are blown out from the blowout port 1d to treat the surface of the object 5 to be treated. After reforming, the unreacted gas, by-product gas, etc. enter the space S 1 through the suction ports 10d, 10'd and are collected in a recovery container (not shown) through the discharge ports 10c, 10'c. Ar, N from the inlets 11c, 11'c (31c, 31'c) of the outer box 11 (31)
Inert gas 2 or the like is introduced second space S 2 menstrual and outlet 11d, is blown from 11'd (31d, 31'd) to be treated object 5, some of the suction port 10d, 1
It is sucked in 0'd (30d, 30'd), and most of it is discharged to the outside atmosphere, and the invasion of the atmosphere is blocked so that the components in the atmosphere do not affect the treatment of the above surface modification. . As shown in FIG. 3, when the object 5 to be processed is moved in the direction of the arrow B, the lower ends of the side walls are bent with respect to the surface of the object 5 to be inclined toward the vertical central axis surface side. Therefore, it acts to prevent the entrainment of the atmosphere, and at the same time, ensures the recovery of the processing gas.
【0009】次に図4を参照して、被処理物体が織物ま
たは編物のような通気性構造の繊維状になっている場合
に対応する第3実施例の縦断面図を示し、図5に図4の
A矢視図を示す。この実施例の装置において、図1及び
図2と同じ部材には同じ符号を付け、異なる点のみにつ
いて説明する。被処理物体25は通気性繊維状で、箱体
10自体は構造が図1及び図2の場合と同じであるが、
10f,10′fは導入口で、10g,10′gは吐き
出し口であり、被処理物体25に対してガス吐き出し側
と反対側には、反応容器1及び第1の箱体10のガス吐
き出し口の合計面積よりもやや大きい吸引口12dが上
に向けて開口された偏平で断面が四角形の受箱体12が
備えられ、受箱体12は誘電体製で下側には吐き出し口
12cが設けられている。大気が処理に影響を与えない
場合は箱体10を省略できる。図6は繊維状の被処理物
体25が移動(図で矢印Bのように左方へ)される場合
の第4実施例を示し、第2実施例と同様に反応容器21
の両側壁21a,21bの下端部は被処理物体25の表
面に向かって傾斜し、箱体30の両側壁30a,30b
の下端部と下方の受箱体32の両側壁32a,32bは
それぞれ外方へ傾斜しているが大気が処理に影響しない
場合は実施例3と同様箱体10を省略できる。Next, referring to FIG. 4, there is shown a vertical cross-sectional view of a third embodiment corresponding to the case where the object to be treated is a fiber having a breathable structure such as a woven or knitted material, and FIG. The A arrow line view of FIG. 4 is shown. In the apparatus of this embodiment, the same members as those in FIGS. 1 and 2 are designated by the same reference numerals, and only different points will be described. The object to be treated 25 is a breathable fiber, and the box body 10 itself has the same structure as in FIGS. 1 and 2,
10f and 10'f are inlets, and 10g and 10'g are outlets. The gas outlet of the reaction container 1 and the first box 10 is on the side opposite to the gas outlet side of the object 25 to be treated. A flat and rectangular cross-section box body 12 having a suction port 12d that is slightly larger than the total area of the mouth is provided upward. The box body 12 is made of a dielectric material and has a discharge port 12c on the lower side. It is provided. If the atmosphere does not affect the processing, the box 10 can be omitted. FIG. 6 shows a fourth embodiment in the case where the fibrous object 25 to be processed is moved (to the left as indicated by arrow B in the figure), and the reaction vessel 21 is the same as the second embodiment.
The lower ends of both side walls 21a and 21b of the box are inclined toward the surface of the object to be processed 25, and both side walls 30a and 30b of the box body 30 are formed.
The lower end portion and both side walls 32a and 32b of the lower receiving box 32 are inclined outward, but if the atmosphere does not affect the processing, the box 10 can be omitted as in the third embodiment.
【0010】上記の第3実施例の作用を以下に説明す
る。第1実施例(図1参照)と異なり、未反応ガスと副
生成ガス等が通気性を有する被処理物体25を通り抜け
るので、処理装置の反対側にある受箱体12により吸引
し、処理部への大気の進入は繊維状の被処理物体25に
対し、箱体10の吐き出し口10g,10′gからの不
活性ガスを吹き出させて阻止する。図6の第4実施例が
示すように、被処理物体25が矢印Bの方向へ移動する
場合は、各側壁の端部が曲げられていて、大気の巻き込
みが阻止されるとともに、ガスの回収を確実にすること
は第2実施例(図3参照)と同様である。The operation of the above third embodiment will be described below. Unlike the first embodiment (see FIG. 1), the unreacted gas, the by-product gas, and the like pass through the air-permeable object 25 to be processed, and thus are sucked by the receiving box 12 on the opposite side of the processing apparatus, The invasion of the atmosphere to the fibrous object 25 is prevented by blowing out the inert gas from the outlets 10g and 10'g of the box body 10. As shown in the fourth embodiment of FIG. 6, when the object to be processed 25 moves in the direction of the arrow B, the end portions of the respective side walls are bent to prevent the entrainment of the atmosphere and recover the gas. This is the same as in the second embodiment (see FIG. 3).
【0011】[0011]
【発明の効果】プラズマの吹出し口の周囲に吸引空間を
設けることにより、また被処理物体が通気性を有する繊
維状物体の場合は被処理物体に対し吹出し口と反対側に
吸引空間を形成する受箱体を設けることにより、また被
処理物体が処理の間移動される場合には、反応容器、箱
体、外箱体、受箱体の被処理物体に対向する端面を適当
な方向に傾斜させることにより反応に関係した処理済み
の副生成ガスや未反応ガスが大気中に放出され環境に悪
影響を与えたり、大気が反応容器内に流入し反応に悪影
響を与えることも防止される。EFFECTS OF THE INVENTION By providing a suction space around the outlet of plasma, or when the object to be treated is a fibrous object having air permeability, a suction space is formed on the side opposite to the outlet with respect to the object to be treated. When the object to be processed is moved during the process by providing the box body, the end faces of the reaction container, the box body, the outer box body, and the box body facing the object to be processed are inclined in an appropriate direction. By doing so, the treated by-product gas and unreacted gas related to the reaction are released into the atmosphere and adversely affect the environment, and the atmosphere is prevented from flowing into the reaction vessel and adversely affecting the reaction.
【図1】本図の(A)は本発明による大気圧プラズマ表
面処理装置の1実施例の簡略型の模式縦断面図であり、
本図の(B)は標準型を示す。FIG. 1A is a schematic vertical sectional view of a simplified type of an embodiment of an atmospheric pressure plasma surface treatment apparatus according to the present invention,
(B) of this figure shows a standard type.
【図2】図1(B)のA矢視平面図である。FIG. 2 is a plan view taken along arrow A in FIG.
【図3】被処理物体が移動する場合に対処するための第
2実施例の縦断面図である。FIG. 3 is a vertical cross-sectional view of a second embodiment for coping with the case where the object to be processed moves.
【図4】被処理物体が繊維状の場合に対処するための第
3実施例の縦断面図である。FIG. 4 is a vertical cross-sectional view of a third embodiment for coping with the case where the object to be processed is fibrous.
【図5】図4のA矢視図である。5 is a view on arrow A in FIG. 4. FIG.
【図6】被処理物体が繊維状で移動する場合に対処する
第4実施例の縦断面図である。FIG. 6 is a vertical cross-sectional view of a fourth embodiment which deals with the case where the object to be processed moves in a fibrous shape.
【図7】従来の大気圧プラズマ表面処理装置の概要を示
す立面図である。FIG. 7 is an elevational view showing an outline of a conventional atmospheric pressure plasma surface treatment apparatus.
【図8】図7のA−A断面図である。8 is a cross-sectional view taken along the line AA of FIG.
1,21 反応容器 1a,1b,21a,21b 反応容器の側壁 1c 導入口 1d 吹出し口 1e,10e,11e 上壁 1f,11f 周壁 2a,2b 電極 3 電源 5,25 被処理物体 7 グロ−放電 10,30 箱体 10a,10b 箱体の側壁 10c,10′c 箱体の吐き出し口 10d,10′d 箱体の吸引口 10f,10′f 箱体の導入口 10g,10′g 箱体の吐き出し口 11,31 外箱体 11a,11b,31a,31b 外箱体の側壁 11c,11′c,31c,31′c 外箱体の導入口 11d,11′d 外箱体の吐き出し口 12,32:受箱体 12a,12b,32a,32b 受箱体の側壁 12c 受箱体の吐き出し口 12d 受箱体の吸引口 B,C 矢印 S1,S2 空間1, 21 Reaction container 1a, 1b, 21a, 21b Side wall 1c of reaction container 1c Inlet port 1d Outlet port 1e, 10e, 11e Upper wall 1f, 11f Peripheral wall 2a, 2b Electrode 3 Power supply 5, 25 Object to be treated 7 Glow discharge 10 , 30 Box 10a, 10b Side wall of the box 10c, 10'c Box outlet 10d, 10'd Box inlet 10f, 10'f Box inlet 10g, 10'g Box outlet Mouth 11,31 Outer box body 11a, 11b, 31a, 31b Side wall of outer box body 11c, 11'c, 31c, 31'c Outer box body inlet 11d, 11'd Outer box body outlet 12, 32 : receiving box body 12a, 12b, 32a, 32b receiving box body suction port B of the outlet 12d receiving boxes of the side wall 12c receiving box body, C arrows S 1, S 2 space
Claims (5)
極間の空隙の一方端から反応ガスとしてのフッ化炭素系
あるいは炭化水素系物質などのガスと、ヘリウム、アル
ゴン、ネオンなどの希ガスまたはN2 等の不活性ガスと
の混合ガスが導入され、前記電極間の他方端に静止、ま
たは移動可能に置かれる被処理物体の表面に吹き付けら
れて高周波、高電圧下でのグロ−放電によりプラズマ化
された前記混合ガスにより、前記被処理物体の表面を改
質あるいは表面に例えばアモルファス炭素膜を析出形成
させる大気圧プラズマ表面処理装置において、 前記表面処理装置は、 所定の間隔を保って対向して平行に配置された側壁と、
その外表面上に前記1対の電極のそれぞれが配置され被
処理物体の表面との間に所定距離の隙間を保って配置さ
れた1対の側壁と、前記両側壁の前後両端部間を連結す
る周壁と、これらの側壁と周壁の上面を覆う上壁とを有
し、前記上壁の中央部に前記混合ガスの導入口が明けら
れ、前記側壁の下端と前記被処理物体との間の隙間が処
理済みガスの吐き出し口を形成する箱状または筒状の誘
電体製反応容器と、 この反応容器を囲んでさらに外周に配置されて前記両電
極の表面との間に所定の空間を形成する1対の側壁と、
前記両側壁の前後両端部間を連結する周壁と、これらの
両側壁と周壁の上面を覆う上壁とを有し、この上壁上で
前記反応容器の混合ガスの導入口に対しほぼ対称の位置
に明けられた1対の処理済みガスの吐き出し口を有し、
前記側壁の下端は前記被処理物体に対し前記反応容器の
下端に対し所定の距離を保って配置される誘電体製箱体
と、を有し、前記反応容器の下端から吐き出された処理
済みガスが前記箱体の側壁と前記反応容器の側壁との間
の空間を上方に流れて前記の吐き出し口を通過し回収さ
れるようになっていることを特徴とする大気圧プラズマ
表面処理装置。1. A gas such as a fluorocarbon-based or hydrocarbon-based substance as a reaction gas and helium, argon, neon or the like from one end of a gap between a pair of electrodes arranged to face each other under atmospheric pressure. Noble gas or a mixed gas with an inert gas such as N 2 is introduced, and is sprayed on the surface of the object to be treated, which is placed at the other end between the electrodes, either stationary or movably, under high frequency and high voltage. In the atmospheric pressure plasma surface treatment apparatus for modifying the surface of the object to be treated or depositing and forming, for example, an amorphous carbon film on the surface of the object to be treated by the mixed gas turned into plasma by glow discharge, the surface treatment apparatus has a predetermined interval. And side walls arranged in parallel facing each other,
Each of the pair of electrodes is arranged on the outer surface thereof, and a pair of side walls arranged with a gap of a predetermined distance from the surface of the object to be processed is connected to the front and rear end portions of the both side walls. Having a peripheral wall and an upper wall that covers the upper surfaces of the side wall and the peripheral wall, the introduction port of the mixed gas is opened in the central portion of the upper wall, and between the lower end of the side wall and the object to be processed. A box-shaped or cylindrical dielectric reaction container whose gap forms an outlet for the treated gas, and a reaction chamber that surrounds the reaction container and is arranged on the outer periphery to form a predetermined space between the surfaces of the electrodes. A pair of side walls
It has a peripheral wall connecting the front and rear ends of the both side walls, and an upper wall that covers the upper surfaces of the both side walls and the peripheral wall, and is substantially symmetric with respect to the inlet of the mixed gas of the reaction vessel on the upper wall. Has a pair of treated gas outlets open in position,
The lower end of the side wall has a dielectric box body which is arranged at a predetermined distance from the lower end of the reaction container with respect to the object to be processed, and the processed gas discharged from the lower end of the reaction container. Flows upward in a space between the side wall of the box and the side wall of the reaction vessel, passes through the discharge port, and is collected.
装置において;前記箱体の外周にさらに別の導電体製外
箱体が付加して設けられ、この外箱体は前記箱体を囲ん
でさらに外周に配置されて前記箱体の両側面の外表面と
の間に所定の空間を形成する1対の側壁と、これらの両
側壁の前後端部間を連結する周壁と、これらの両側壁と
周壁の上面を覆う上壁とを有し、この上壁上で前記箱体
の1対の処理済みガスの吐き出し口の外側にほぼ対称の
位置に明けられた1対の不活性ガスの導入口を有して、
前記側壁の下端は前記被処理物体に対し所定の距離を保
って配置され、前記不活性ガスは前記箱体の両側壁の外
表面と外箱体の内表面との間の空間を流れて前記箱体の
側壁と前記反応容器の側壁との間の空間に流入して吐き
出され、外部空気が前記反応容器内に流入するのを防止
して、前記処理済みガスとともに前記箱体内を流れその
上部の吐き出し口を通過し回収されることを特徴とする
大気圧プラズマ表面処理装置。2. The atmospheric pressure plasma surface treatment apparatus according to claim 1, wherein an outer casing made of a conductor is further provided on the outer periphery of the casing, and the outer casing encloses the casing. And a pair of side walls that are arranged on the outer periphery to form a predetermined space between the outer surface of both side surfaces of the box body, a peripheral wall that connects the front and rear end portions of the both side walls, and both sides thereof. A wall and an upper wall that covers the upper surface of the peripheral wall, on which a pair of inert gas is provided outside the pair of treated gas outlets of the box in a substantially symmetrical position. Have an inlet,
The lower end of the side wall is arranged at a predetermined distance from the object to be processed, and the inert gas flows in a space between outer surfaces of both side walls of the box and an inner surface of the outer box, and It flows into the space between the side wall of the box and the side wall of the reaction vessel and is discharged to prevent external air from flowing into the reaction vessel, and flows in the box body together with the treated gas to the upper part thereof. Atmospheric pressure plasma surface treatment apparatus, characterized in that it is passed through the discharge port of and recovered.
面処理装置において;前記被処理物体は前記1対の電極
中の一方の電極から他方の電極に向かう方向に移動され
て処理され、前記反応容器と箱体のそれぞれ1対の側壁
の下端は前記1対の電極の垂直中心軸面に向かって内向
に傾斜され、前記外箱体の1対の側壁の下端は前記垂直
中心軸面に対し外向に傾斜されていることを特徴とする
大気圧プラズマ表面処理装置。3. The atmospheric pressure plasma surface treatment apparatus according to claim 1, wherein the object to be treated is moved and treated in a direction from one electrode of the pair of electrodes toward the other electrode, The lower ends of the pair of side walls of the reaction vessel and the box are inclined inwardly toward the vertical central axis of the pair of electrodes, and the lower ends of the pair of side walls of the outer box are aligned with the vertical central axis. An atmospheric pressure plasma surface treatment apparatus, which is inclined outward.
極間の空隙の一方端から反応ガスとしてのフッ化炭素系
あるいは炭化水素系物質などのガスと、ヘリウム、アル
ゴン、ネオンなどの希ガスまたはN2 等の不活性ガスと
の混合ガスが導入され、前記電極間の他方端に静止しま
たは移動可能に置かれる被処理物体の表面に吹き付けら
れて高周波、高電圧下でのグロ−放電によりプラズマ化
された前記混合ガスにより、前記被処理物体の表面を改
質あるいは表面に例えばアモルファス炭素膜を析出形成
させる大気圧プラズマ表面処理装置において、 前記被処理物体は織物、編物など前記混合ガスが通過可
能な通気性繊維材料製であり、 前記表面処理装置は、 所定の間隔を保って対向して平行に配置されその外面上
に前記1対の電極のそれぞれが配置され被処理物体の上
方との間に所定距離の隙間を保って配置される1対の側
壁と、前記両側壁の前後端部間を連結する周壁と、これ
らの両側壁と周壁の上面を覆う上壁とを有し、前記上壁
の中央部に前記混合ガスの導入口が明けられ、前記側壁
の下端に処理済みガスの吐き出し口を形成する箱状また
は筒状の誘電体製反応容器と、 この反応容器を囲んでさらに外周に配置され前記両電極
の表面との間に所定の空間を形成するとともに前記反応
容器のそれぞれの側壁の下端との間に1対の不活性ガス
の吐き出し口を形成する1対の側壁と、前記両側壁の前
後両端部間を連結する周壁と、前記両側壁と周壁の上面
を覆う上壁とを有し、この上壁上で前記反応容器の混合
ガスの導入口に対しほぼ対称の位置に1対の不活性ガス
の導入口が明けられた誘電体製箱体と、 前記被処理物体に対し前記反応容器と箱体の反対側に、
反応容器及び箱体のガス吹出し口の合計面積よりもやや
大きい吸引口が上に向けて開口され、断面が四角形偏平
で底部に吐き出し口が設けられた誘電体製の受箱体と、 を含んで成り、 前記反応容器からの処理済みガスが、その外側を流れる
前記箱体からの不活性ガスに囲まれてシ−ルされた状態
で前記被処理物体を通過して前記受箱体に吸引され回収
されることを特徴とする大気圧プラズマ表面処理装置。4. A gas such as a fluorocarbon-based or hydrocarbon-based substance as a reaction gas and helium, argon, neon or the like from one end of a gap between a pair of electrodes arranged to face each other under atmospheric pressure. Noble gas or a mixed gas with an inert gas such as N 2 is introduced and sprayed on the surface of the object to be treated, which is placed at the other end between the electrodes, either stationary or movably, under high frequency and high voltage. In an atmospheric pressure plasma surface treatment apparatus that modifies the surface of the object to be processed or deposits and forms, for example, an amorphous carbon film on the surface by the mixed gas that has been turned into plasma by glow discharge, the object to be processed is a woven fabric, a knitted fabric, or the like. The surface treatment device is made of a breathable fiber material that allows the mixed gas to pass therethrough, and the surface treatment device is arranged in parallel to face each other with a predetermined interval, and each of the pair of electrodes is provided on the outer surface thereof. A pair of side walls, which are arranged with a predetermined distance from the upper side of the object to be processed, a peripheral wall connecting front and rear end portions of the both side walls, and upper surfaces of the side wall and the peripheral wall. A box-shaped or cylindrical dielectric reaction container having an upper wall for covering, the introduction port of the mixed gas is opened in the central portion of the upper wall, and an outlet for the treated gas is formed at the lower end of the side wall. And a pair of inert gas discharges between the lower end of each side wall of the reaction vessel and a predetermined space formed around the reaction vessel to form a predetermined space with the surfaces of the electrodes. It has a pair of side walls forming a mouth, a peripheral wall connecting front and rear ends of the both side walls, and an upper wall covering upper surfaces of the both side walls and the peripheral wall, and the reaction vessel is mixed on the upper wall. A pair of inert gas inlets are opened at positions approximately symmetrical to the gas inlet. A dielectric made box body which, on the opposite side of the reaction vessel and the box with respect to the object to be processed object,
A dielectric container box having a suction port that is slightly larger than the total area of the gas outlets of the reaction container and the box and that opens upward, and has a rectangular flat cross section and a discharge port at the bottom. The processed gas from the reaction vessel is sucked into the receiving box body through the object to be processed in a sealed state surrounded by the inert gas from the box body flowing outside. Atmospheric pressure plasma surface treatment equipment characterized by being collected and recovered.
装置において、 前記被処理物体は前記1対の電極中の一方の電極から他
方の電極に向かう方向に移動されて処理され、前記反応
容器の側壁の下端は前記1対の電極の垂直中心軸面に向
かって内向に傾斜され、前記箱体の1対の側壁の下端は
前記垂直中心軸面に対し外向に傾斜され、前記受箱体の
側壁は前記箱体の1対の側壁の下端よりも広く上向に傾
斜されていることを特徴とする大気圧プラズマ表面処理
装置。5. The atmospheric pressure plasma surface treatment apparatus according to claim 4, wherein the object to be treated is moved and treated in a direction from one electrode of the pair of electrodes toward the other electrode, and the reaction vessel is treated. Lower ends of the side walls of the pair of electrodes are inwardly inclined toward the vertical center axis planes of the pair of electrodes, and lower ends of the pair of side walls of the box body are inclined outwards with respect to the vertical center axis planes of the box body. 2. The atmospheric pressure plasma surface treatment apparatus according to claim 1, wherein the side walls of the box are wider and wider than the lower ends of the pair of side walls of the box body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23076893A JPH0762546A (en) | 1993-08-25 | 1993-08-25 | Atmospheric plasma surface treating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23076893A JPH0762546A (en) | 1993-08-25 | 1993-08-25 | Atmospheric plasma surface treating device |
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Publication Number | Publication Date |
---|---|
JPH0762546A true JPH0762546A (en) | 1995-03-07 |
Family
ID=16912964
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JP23076893A Pending JPH0762546A (en) | 1993-08-25 | 1993-08-25 | Atmospheric plasma surface treating device |
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