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JPH0685350A - Gas laser oscillator - Google Patents

Gas laser oscillator

Info

Publication number
JPH0685350A
JPH0685350A JP23400692A JP23400692A JPH0685350A JP H0685350 A JPH0685350 A JP H0685350A JP 23400692 A JP23400692 A JP 23400692A JP 23400692 A JP23400692 A JP 23400692A JP H0685350 A JPH0685350 A JP H0685350A
Authority
JP
Japan
Prior art keywords
laser
gas
anode
discharge
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23400692A
Other languages
Japanese (ja)
Inventor
Takashi Oishi
高志 大石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP23400692A priority Critical patent/JPH0685350A/en
Publication of JPH0685350A publication Critical patent/JPH0685350A/en
Pending legal-status Critical Current

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  • Lasers (AREA)

Abstract

PURPOSE:To obtain stabilized laser beams by a method wherein multiple cavities are provided on the wall surface near the anode and cathode of a discharge electrode along the flowing direction of laser gas so as to absorb the residual reflected shock waves. CONSTITUTION:Cavities 13a-13d are provided near the anode 7b, cathode 7a on the electrode fitting boards 12a, 12b fitted with the anode 7b and cathode 7a in a discharge part. At this time, the widths Wa, Wb of these cavities 13a (13c), 13b (13d) are specified to meet the formulas I, II to the electrode width Wc. Likewise, the depths Ha, Hb of the cavities 13a (13c), 13b (13d) are specified to meet the formulas III, IV. Besides, the other width La, Lb of the cavities 13a (13c), 13b (13d) are specified to meet the formulas V, VI to the electrode width Wc. Furthermore, the pitches Ma, Mb of the cavities 13a (13c), 13b (13d) are specified to meet the formulas VII, VIII. Through these procedures, the laser gas can flow from left to right between the cathode 7a and anode 7b.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、安定なレーザビームを
得ることができるガスレーザ発振装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas laser oscillator capable of obtaining a stable laser beam.

【0002】[0002]

【従来の技術】現在知られている従来のガスレーザ発振
装置について図3、図4を参照して説明する。図3はガ
スレーザ発振装置1の断面図を示すもので、気密容器2
には、レーザ発振に係るレーザガス3が封入されるが、
この気密容器2内には、容器壁2aに沿って周方向に順
に、送風機4、冷却器5a、空隙6を介して対向する放
電電極の陰極7a、陽極7bおよび冷却器5bが設置さ
れている。
2. Description of the Related Art A currently known conventional gas laser oscillator will be described with reference to FIGS. FIG. 3 shows a cross-sectional view of the gas laser oscillator device 1.
The laser gas 3 for laser oscillation is enclosed in
Inside the airtight container 2, a blower 4, a cooler 5a, a cathode 7a of a discharge electrode, an anode 7b, and a cooler 5b which are opposed to each other via a gap 6 are sequentially installed in the circumferential direction along the container wall 2a. .

【0003】また、気密容器2内には、さらに送風機4
に駆動装置8が設置されている。放電電極7a,7bは
電極支持盤9aを介して気密容器2外の高圧電源(図示
せず)と接続されており、又、7bは電極支持盤9bに
取付けられている。
A blower 4 is further provided in the airtight container 2.
The drive device 8 is installed in the. The discharge electrodes 7a and 7b are connected to a high-voltage power source (not shown) outside the airtight container 2 via the electrode supporting board 9a, and 7b is attached to the electrode supporting board 9b.

【0004】このような構成のガスレーザ発振器1を運
転すると、まず駆動装置8が稼働し、その動力は送風機
に伝えられ、レーザガス3は、送風機4により冷却器5
aを通過して放電電極の陰極7a、陽極7b間の空隙
(放電領域)6に導かれる。すると、高電圧電源(図示
せず)から給電された放電電極の陰極7a、陽極7b
は、空隙6にパルス状のグロー放電を生じさせ、流れ込
んだレーザガス3を励起させてレーザ発振させる。レー
ザ発振によって生じたレーザビーム(図示せず)は気密
容器2の外に取り出される。
When the gas laser oscillator 1 having such a configuration is operated, first, the driving device 8 is operated, the power thereof is transmitted to the blower, and the laser gas 3 is cooled by the blower 4 to the cooler 5.
After passing through a, it is guided to the space (discharge region) 6 between the cathode 7a and the anode 7b of the discharge electrode. Then, the cathode 7a and the anode 7b of the discharge electrode fed from a high voltage power source (not shown).
Generates a pulsed glow discharge in the air gap 6 to excite the laser gas 3 that has flowed in to cause laser oscillation. A laser beam (not shown) generated by the laser oscillation is taken out of the airtight container 2.

【0005】[0005]

【発明が解決しようとする課題】一方、グロー放電に係
るエネルギーの90%以上は、レーザガス3の加熱によ
り消費される。するとレーザガス3はこの加熱によって
膨脹し、膨脹速度が音速をこえると図4に示すように衝
撃波10aが放電電極の陰極7a、陽極7b間の空隙6
に発生する。この衝撃波10aは発生後、10b,10
cと進んで行く。しかし、陽極7bや電極取付け板11
に反射して10dにように陰極側に進む。このように電
極間を反射して衝撃波が残存して、放電の安定は、放電
電極の陰極7a、陽極7bの間の空隙6を流れるレーザ
ガス3の流速と濃度の安定に大きく依存する。
On the other hand, 90% or more of the energy related to glow discharge is consumed by heating the laser gas 3. Then, the laser gas 3 expands due to this heating, and when the expansion speed exceeds the speed of sound, the shock wave 10a causes a gap 6 between the cathode 7a and the anode 7b of the discharge electrode as shown in FIG.
Occurs in. After the shock wave 10a is generated, 10b, 10
Go ahead with c. However, the anode 7b and the electrode mounting plate 11
And then proceed to the cathode side as in 10d. In this way, the shock wave remains after being reflected between the electrodes, and the stability of the discharge largely depends on the stability of the flow velocity and the concentration of the laser gas 3 flowing through the gap 6 between the cathode 7a and the anode 7b of the discharge electrode.

【0006】本発明は、上記事情に鑑みてなされたもの
であり、レーザガス3の流速および濃度を安定にして、
安定なレーザビームを得ることができるガスレーザ発振
装置を提供することを目的とする。
The present invention has been made in view of the above circumstances, and stabilizes the flow velocity and concentration of the laser gas 3,
An object of the present invention is to provide a gas laser oscillating device that can obtain a stable laser beam.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
本発明のガスレーザ発振装置は、放電電極の陽極及び、
陰極近傍の壁面にレーザガスの流れ方向に沿って複数個
の空洞部を設け、衝撃波の反射した残存衝撃波を吸収す
ることを特徴としている。
To achieve the above object, a gas laser oscillator according to the present invention comprises an anode of a discharge electrode and
It is characterized in that a plurality of cavities are provided on the wall surface near the cathode along the flow direction of the laser gas to absorb the residual shock wave reflected by the shock wave.

【0008】[0008]

【作用】本発明のガスレーザ発振装置においては、陽極
及び陰極より発生した衝撃波を、陽極及び陰極近傍に設
けた空洞部の内部まで導くことにより、衝撃波の反射波
を吸収又は、緩和して放電電極間の空隙にあるレーザガ
スの粗密を低減することができる。
In the gas laser oscillating device of the present invention, the shock wave generated from the anode and the cathode is guided to the inside of the cavity provided in the vicinity of the anode and the cathode, thereby absorbing or relaxing the reflected wave of the shock wave and discharging electrode. It is possible to reduce the density of the laser gas in the space between them.

【0009】[0009]

【実施例】以下図1、図2を参照して本発明の一実施例
を説明する。図1は、本発明の一実施例に係るガスレー
ザ発振装置1の放電部の要部構成図である。又、図2
は、図1の斜視図を示すものである。本実施例に係る放
電部の基本構成は、図3に示したものと実質には異なら
ないので、対応する箇所には同一の符号を付して詳しい
説明は省略する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a configuration diagram of a main part of a discharge part of a gas laser oscillator 1 according to an embodiment of the present invention. Moreover, FIG.
FIG. 3 shows a perspective view of FIG. Since the basic structure of the discharge unit according to the present embodiment is not substantially different from that shown in FIG. 3, the corresponding portions are designated by the same reference numerals and detailed description thereof will be omitted.

【0010】この放電部において、陽極7b、陰極7a
を取付けている電極取付盤12a,12bの陽極7b、
陰極7a近傍に凹部13a,13b,13c,13dを
設ける。これらの凹部13a(13c),13b(13
d)の幅Wa,Wbはともに電極幅Wcに対して、 Wa=0.5〜3.0×Wc Wb=0.5〜3.0×Wc となるようにする。又、凹部13a(13c),13b
(13d)の部さHa,Hbの寸法は Ha=1.0〜3.0×Wa Hb=1.0〜3.0×Wb となるようにする。又、凹部13a(13c),13b
(13d)の幅La,Lbは電極幅Wcに対して、 La=0.1〜1.0×Wc Lb=0.1〜1.0×Wc となるようにする。又、凹部13a(13c),13b
(13d)のピッチMa,Mbの寸法は Ma=0.1〜0.5×La Mb=0.1〜0.5×Lb となるようにする。レーザガスは、図3と同様に電極7
a,7b間を左から右に流れる。
In this discharge part, the anode 7b and the cathode 7a
Anode 7b of the electrode mounting board 12a, 12b to which the
Recesses 13a, 13b, 13c, 13d are provided near the cathode 7a. These recesses 13a (13c), 13b (13
The widths Wa and Wb in d) are both set to Wa = 0.5 to 3.0 × Wc and Wb = 0.5 to 3.0 × Wc with respect to the electrode width Wc. Also, the recesses 13a (13c), 13b
The dimensions of the portions Ha and Hb of (13d) are set to be Ha = 1.0 to 3.0 × Wa Hb = 1.0 to 3.0 × Wb. Also, the recesses 13a (13c), 13b
The widths La and Lb of (13d) are set to La = 0.1 to 1.0 × Wc and Lb = 0.1 to 1.0 × Wc with respect to the electrode width Wc. Also, the recesses 13a (13c), 13b
The dimensions of the pitches Ma and Mb of (13d) are set to be Ma = 0.1 to 0.5 × La Mb = 0.1 to 0.5 × Lb. The laser gas is applied to the electrode 7 as in FIG.
Flows from left to right between a and 7b.

【0011】この様にすると図1において、図4に示す
反射衝撃波10c,10dは、それぞれ10e,10f
のようになり、凹部13a,13b部の衝撃波が消減、
または、緩和する。これにより放電電極の陰極7a、陽
極7b間にあるレーザガスの粗密が減少し放電が安定に
なる。放電の安定は、この放電によりレーザガスが励起
されることにより発振するレーザ光も安定する。凹部1
3a(13c),13b(13d)は陽極7b、陰極7
a側のいずれか一方にだけ設けるようにしても両方同様
な効果が得られる。
In this way, in FIG. 1, the reflected shock waves 10c and 10d shown in FIG. 4 are respectively 10e and 10f.
And the shock waves in the recesses 13a and 13b are reduced,
Or relax. As a result, the density of the laser gas between the cathode 7a and the anode 7b of the discharge electrode is reduced and the discharge becomes stable. Regarding the stability of the discharge, the laser light oscillated by exciting the laser gas by this discharge is also stabilized. Recess 1
3a (13c) and 13b (13d) are an anode 7b and a cathode 7.
Even if it is provided only on one of the sides a, the same effect can be obtained.

【0012】[0012]

【発明の効果】以上説明のように、本発明のガスレーザ
発振装置によれば、放電電極間に発生する衝撃波の残存
する反射衝撃波を減少させることができ、これによるレ
ーザガスの粗密を少なくなり安定したレーザビームを得
ることができる。
As described above, according to the gas laser oscillating device of the present invention, it is possible to reduce the reflected shock wave remaining of the shock wave generated between the discharge electrodes, thereby reducing the density of the laser gas and stabilizing it. A laser beam can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に係る放電部の要部構成図。FIG. 1 is a configuration diagram of a main part of a discharge unit according to an embodiment of the present invention.

【図2】図1の陽極部の斜視図。FIG. 2 is a perspective view of an anode section in FIG.

【図3】従来のガスレーザ発振装置の断面図。FIG. 3 is a sectional view of a conventional gas laser oscillator.

【図4】図3の放電部の断面図。4 is a cross-sectional view of the discharge part of FIG.

【符号の説明】[Explanation of symbols]

2…気密容器、 3…レーザガス、4…送風
機、 5a,5b…冷却器、7a,7b…放
電電極。
2 ... Airtight container, 3 ... Laser gas, 4 ... Blower, 5a, 5b ... Cooler, 7a, 7b ... Discharge electrode.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 レーザガスが封入されたガスレーザ本体
と、このガスレーザ本体内部にレーザガスを循環させる
送風手段と、循環されるレーザガスを冷却する冷却手段
と、前記レーザガスの循環流路に設けられ且つ放電が行
われる部分を残して基盤に埋設された陽極と陰極とから
なる一対の放電電極と、該放電電極へのレーザガス流入
口の直前に設けられた縮流路と、前記放電電極からのレ
ーザガス流出口に設けられた拡大路を有する放電部とを
具備したガスレーザ発振器において、放電電極近傍の壁
面にレーザガスの流れ方向に沿って複数個の空洞部を設
けたことを特徴とするガスレーザ発振装置。
1. A gas laser main body in which a laser gas is enclosed, an air blower for circulating the laser gas inside the gas laser main body, a cooling means for cooling the circulated laser gas, and a discharge provided in a circulation flow path of the laser gas. A pair of discharge electrodes consisting of an anode and a cathode buried in the substrate leaving a portion to be performed, a contraction flow path provided immediately before the laser gas inlet to the discharge electrode, and a laser gas outlet from the discharge electrode. A gas laser oscillator comprising: a discharge part having an enlarged path provided in the gas laser oscillator, wherein a plurality of cavities are provided on a wall surface near the discharge electrode along the flow direction of the laser gas.
JP23400692A 1992-09-02 1992-09-02 Gas laser oscillator Pending JPH0685350A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23400692A JPH0685350A (en) 1992-09-02 1992-09-02 Gas laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23400692A JPH0685350A (en) 1992-09-02 1992-09-02 Gas laser oscillator

Publications (1)

Publication Number Publication Date
JPH0685350A true JPH0685350A (en) 1994-03-25

Family

ID=16964080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23400692A Pending JPH0685350A (en) 1992-09-02 1992-09-02 Gas laser oscillator

Country Status (1)

Country Link
JP (1) JPH0685350A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0883945A (en) * 1994-09-12 1996-03-26 Toshiba Corp Excimer laser oscillator
JPH08167748A (en) * 1994-12-14 1996-06-25 Hitachi Ltd Pulse laser oscillator device
EP1051780A2 (en) * 1998-10-09 2000-11-15 Cymer, Inc. Shock wave dissipating laser chamber
JP2003060270A (en) * 2001-08-10 2003-02-28 Gigaphoton Inc Pulse oscillation gas laser device
JP2006229136A (en) * 2005-02-21 2006-08-31 Komatsu Ltd Pulse oscillation type discharge excitation laser equipment
WO2017022105A1 (en) * 2015-08-05 2017-02-09 ギガフォトン株式会社 Laser chamber

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0883945A (en) * 1994-09-12 1996-03-26 Toshiba Corp Excimer laser oscillator
JPH08167748A (en) * 1994-12-14 1996-06-25 Hitachi Ltd Pulse laser oscillator device
EP1051780A2 (en) * 1998-10-09 2000-11-15 Cymer, Inc. Shock wave dissipating laser chamber
EP1051780A4 (en) * 1998-10-09 2006-02-01 Cymer Inc Shock wave dissipating laser chamber
JP2003060270A (en) * 2001-08-10 2003-02-28 Gigaphoton Inc Pulse oscillation gas laser device
JP2006229136A (en) * 2005-02-21 2006-08-31 Komatsu Ltd Pulse oscillation type discharge excitation laser equipment
JP4579002B2 (en) * 2005-02-21 2010-11-10 株式会社小松製作所 Pulse oscillation type discharge excitation laser equipment
WO2017022105A1 (en) * 2015-08-05 2017-02-09 ギガフォトン株式会社 Laser chamber
US10965085B2 (en) 2015-08-05 2021-03-30 Gigaphoton Inc. Laser chamber with metal damper member

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