JPH0652578A - Optical information recording medium - Google Patents
Optical information recording mediumInfo
- Publication number
- JPH0652578A JPH0652578A JP4221989A JP22198992A JPH0652578A JP H0652578 A JPH0652578 A JP H0652578A JP 4221989 A JP4221989 A JP 4221989A JP 22198992 A JP22198992 A JP 22198992A JP H0652578 A JPH0652578 A JP H0652578A
- Authority
- JP
- Japan
- Prior art keywords
- film
- optical information
- recording medium
- information recording
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、光を利用して情報を記
録等することが可能な光情報記録媒体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical information recording medium capable of recording information using light.
【0002】[0002]
【従来技術】従来、非晶質−結晶質間で相転移させ、そ
れに伴って生じる反射率の変化を利用する相変化型の光
情報記録媒体(光ディスク)が知られている。この光情
報記録媒体は情報の書き込みを非晶質化により達成する
場合、記録膜全体が予め結晶質化された状態でなければ
ならない。ここで、真空蒸着法又はスパッタリング法等
で形成した直後の光情報記録媒体の記録膜は、少なくと
も一部分が非晶質状態となっているか、又は準安定な結
晶質状態となっている。従って、このものに情報の書き
込みを行う前には、記録膜全体を完全に結晶質化(初期
結晶質化)することが必要となる。又、光情報記録媒体
の記録膜の一旦記録された情報を全面消去するためにも
その記録膜全体を完全に結晶質化することが必要とな
る。2. Description of the Related Art Conventionally, there has been known a phase change type optical information recording medium (optical disk) which makes use of a change in reflectance caused by a phase transition between amorphous and crystalline. In this optical information recording medium, when information writing is achieved by amorphization, the entire recording film must be in a crystalline state in advance. Here, at least a part of the recording film of the optical information recording medium immediately after being formed by the vacuum evaporation method or the sputtering method is in an amorphous state or in a metastable crystalline state. Therefore, it is necessary to completely crystallize the entire recording film (initial crystallization) before writing information on this. Further, in order to completely erase the information once recorded on the recording film of the optical information recording medium, it is necessary to completely crystallize the entire recording film.
【0003】ここで、特開昭62−20153号公報
「光ディスクの初期結晶化方式」にて開示されたものが
知られている。ここでは、オーブン等を利用して光情報
記録媒体全体を加熱し、その記録膜を結晶質化する方法
や Arレーザ等の高出力レーザを利用して光情報記録媒
体の記録膜を照射加熱し、その記録膜を結晶質化する方
法が記載されている。Here, the one disclosed in Japanese Unexamined Patent Publication No. 62-20153, "Initial Crystallizing Method of Optical Disc" is known. Here, a method of heating the entire optical information recording medium by using an oven or the like to crystallize the recording film or a high power laser such as an Ar laser is used to irradiate and heat the recording film of the optical information recording medium. , A method of crystallizing the recording film is described.
【0004】[0004]
【発明が解決しようとする課題】前者の手段によると、
光情報記録媒体の記録膜全体を結晶質化するための温度
がその基板にも加わることになり、高温に耐えない材料
を用いた基板においては変形する恐れがあった。一方、
この変形を避けて低温で加熱する場合、記録膜全体を完
全に結晶質化するためには膨大な時間が必要であった。
又、後者の手段においても、光情報記録媒体の記録膜に
おける全トラックを結晶質化するためにはやはり膨大な
時間が必要となるという問題があった。According to the former means,
The temperature for crystallizing the entire recording film of the optical information recording medium is also applied to the substrate, and the substrate made of a material that cannot withstand high temperature may be deformed. on the other hand,
When heating at a low temperature while avoiding this deformation, a huge amount of time was required to completely crystallize the entire recording film.
Further, even in the latter means, there is a problem that an enormous amount of time is required to crystallize all the tracks in the recording film of the optical information recording medium.
【0005】本発明は、上記の課題を解決するために成
されたものであり、その目的とするところは、光情報記
録媒体の記録膜の初期結晶質化又は全面消去の時間を短
くすると共に基板等の変形の恐れをなくすことである。The present invention has been made to solve the above problems, and an object of the present invention is to shorten the time for initial crystallization of the recording film of the optical information recording medium or for complete erasing. It is to eliminate the risk of deformation of the substrate.
【0006】[0006]
【課題を解決するための手段】上記課題を解決するため
の発明の構成は、基板上に下層保護膜、記録膜、上層保
護膜を順次形成した光情報記録媒体において、前記記録
膜を加熱し最初に記録可能な状態となるまで結晶質化
(初期結晶質化)又は記録情報の全面消去状態となるま
で結晶質化を行うため少なくとも1層のヒータ膜を備え
たことを特徴とする。The structure of the invention for solving the above-mentioned problems is to heat the recording film in an optical information recording medium in which a lower protective film, a recording film and an upper protective film are sequentially formed on a substrate. It is characterized in that at least one heater film is provided to crystallize until the first recordable state (initial crystallization) or crystallize until the recorded information is completely erased.
【0007】[0007]
【作用及び効果】上記の手段によれば、光情報記録媒体
はヒータ膜に通電することにより記録膜を瞬時にその結
晶質化温度以上に加熱でき、瞬時に記録膜の結晶質化を
行わせることができる。即ち、光情報記録媒体の記録膜
の初期結晶質化又は全面消去が従来に比べ極めて短時間
に完了できる。これにより、光情報記録媒体は量産性が
得られると共に初期品質及び途中の使い易さも向上す
る。According to the above means, by energizing the heater film in the optical information recording medium, the recording film can be instantly heated to the crystallization temperature or higher, and the recording film can be instantly crystallized. be able to. That is, the initial crystallization or full erasure of the recording film of the optical information recording medium can be completed in an extremely short time as compared with the conventional case. As a result, the optical information recording medium can be mass-produced, and the initial quality and the ease of use in the middle can be improved.
【0008】[0008]
【実施例】以下、本発明を具体的な実施例に基づいて説
明する。図1は本発明に係る光情報記録媒体の断面構造
を示した模式図である。光情報記録媒体10は、例え
ば、円盤状の透明なガラス又はプラスチックから成る基
板1上に順次、以下の膜が積層され形成されている。先
ず、ポリカーボネイトから成る基板1上に、ZnS-Si
O2から成る下層保護膜2を厚さ 250nm成膜した。次
に、上記下層保護膜2上に GeTe-Sb2Te3から成る記
録膜3を厚さ80nm成膜した。その上に、ZnS-SiO2か
ら成る上層保護膜4を厚さ35nm成膜した。更に、上記上
層保護膜4上にAl から成る反射膜5を厚さ40nm成膜し
た。そして、上記反射膜5上にAl-Nから成る絶縁膜6
を厚さ30nm成膜した。最後に、上記絶縁膜6上にNi-C
r から成るヒータ膜7を厚さ30nm成膜した。ここで、下
層保護膜2、記録膜3、上層保護膜4、反射膜5及び絶
縁膜6の各膜はそれぞれスパッタリングにより形成し、
ヒータ膜7は蒸着により形成した。尚、これら各膜の成
膜方法としては、スパッタリング法や蒸着法に限定され
ることなく他の適当な方法を用いて形成しても良い。EXAMPLES The present invention will be described below based on specific examples. FIG. 1 is a schematic diagram showing a cross-sectional structure of an optical information recording medium according to the present invention. The optical information recording medium 10 is formed by sequentially laminating the following films on a substrate 1 made of, for example, disk-shaped transparent glass or plastic. First, on the substrate 1 made of polycarbonate, ZnS-Si
The lower protective film 2 made of O 2 was formed to a thickness of 250 nm. Next, a recording film 3 made of GeTe—Sb 2 Te 3 was formed on the lower protective film 2 to a thickness of 80 nm. An upper protective film 4 made of ZnS—SiO 2 was formed thereon with a thickness of 35 nm. Further, a reflective film 5 made of Al was formed on the upper protective film 4 to a thickness of 40 nm. The insulating film 6 made of Al-N is formed on the reflective film 5.
Was deposited to a thickness of 30 nm. Finally, Ni-C is formed on the insulating film 6.
A heater film 7 made of r was formed to a thickness of 30 nm. Here, each of the lower protective film 2, the recording film 3, the upper protective film 4, the reflective film 5 and the insulating film 6 is formed by sputtering,
The heater film 7 was formed by vapor deposition. The method for forming each of these films is not limited to the sputtering method or the vapor deposition method, and other suitable methods may be used.
【0009】図2は、上述の構成から成る光情報記録媒
体10のヒータ膜7を利用した初期結晶質化又は全面消
去工程を示した概念図である。光情報記録媒体10の初
期化又は全面消去時にはそのヒータ膜7の外周両端に電
極E1,E2 を当接し、直流又は交流電源を用いて通電さ
せる。この通電により、ヒータ膜7は発熱される。この
通電に当たっては、記録膜3の全面が速やかにその結晶
質化温度以上である200〜600℃となるようにヒータ膜7
に印加する電圧を調整した。このときの通電時間は1/1
00sec 程度の極めて短時間(瞬時)であった。即ち、光
情報記録媒体10は、記録膜3の初期結晶質化又は全面
消去工程に要する時間が極めて短いため量産化に適して
おり、基板1の変形などが生じる恐れもない。FIG. 2 is a conceptual diagram showing an initial crystallization or full erasing process using the heater film 7 of the optical information recording medium 10 having the above-mentioned structure. At the time of initializing or erasing the entire surface of the optical information recording medium 10, electrodes E 1 and E 2 are brought into contact with both ends of the outer periphery of the heater film 7 and are energized by using a direct current or an alternating current power source. This energization causes the heater film 7 to generate heat. During this energization, the heater film 7 is heated so that the entire surface of the recording film 3 is quickly heated to 200 to 600 ° C., which is higher than its crystallization temperature.
The voltage applied to was adjusted. The energizing time at this time is 1/1
It was an extremely short time (instantaneous) of about 00 seconds. That is, the optical information recording medium 10 is suitable for mass production because the time required for the initial crystallization of the recording film 3 or the entire surface erasing step is very short, and the substrate 1 is not likely to be deformed.
【0010】本発明は上記の実施例に限定されるもので
はなく、以下のような種々の変形が可能である。 (1) ヒータ膜の材質に反射率の高い金属を用いるなら
ば、反射膜と兼用することも可能となる。この場合に
は、反射膜上の絶縁膜もなくすことができる。 (2) ヒータ膜の材質をITO(Indium Tin Oxide:錫をド
ープした酸化インジウム)等の透明な導電性薄膜とすれ
ば、その成膜位置を上記実施例のように最上層とする必
要がなくなる。即ち、ヒータ膜は基板と反射膜との間の
任意の位置に成膜することができる。この場合、必要に
応じて絶縁膜をそのヒータ膜の両側又は片側に設けても
良い。 (3) ヒータ膜に電極を接続するため、各膜を必要な形状
に加工しても良い。 (4) ヒータ膜は必要に応じて複数としても良い。 (5) 記録膜の結晶質化に必要な発熱が得られる範囲内で
あればヒータ膜及び絶縁膜を適当な形状に加工しても良
い。 (6) 各膜の材質や膜厚は適当な他の材質や膜厚としても
良い。 例えば、下層保護膜や上層保護膜としては、上記ZnS-
SiO2以外にSiN,AlN,SiO2,TiO2 等の高融点な
透明誘電体を用いることができる。又、記録膜として
は、上記GeSbTe 系又はInSbTe 系等の書き換え可
能な相変化記録材料を用いることができる。又、反射膜
としては、上記Al 以外にAu 等を用いることができ
る。 (7) 上記実施例における最上層であるヒータ膜上に別の
保護膜や保護基板の両方又は一方を設定しても良いし、
その保護基板の代わりに同様の構成から成る光情報記録
媒体を貼り合わせても良い。 (8) ヒータ膜の発熱により得られる温度は、記録膜、保
護膜等の材質や光情報記録媒体の構造に応じて適当な温
度に制御しても良い。The present invention is not limited to the above embodiment, but various modifications such as the following are possible. (1) If a metal having a high reflectance is used as the material of the heater film, it can also be used as the reflective film. In this case, the insulating film on the reflective film can be eliminated. (2) If the material of the heater film is a transparent conductive thin film such as ITO (Indium Tin Oxide), it is not necessary to set the film forming position to the uppermost layer as in the above embodiment. . That is, the heater film can be formed at any position between the substrate and the reflective film. In this case, an insulating film may be provided on both sides or one side of the heater film as needed. (3) Since the electrodes are connected to the heater film, each film may be processed into a required shape. (4) A plurality of heater films may be provided if necessary. (5) The heater film and the insulating film may be processed into appropriate shapes as long as the heat generation necessary for crystallizing the recording film is obtained. (6) The material and film thickness of each film may be any other appropriate material and film thickness. For example, as the lower protective film and the upper protective film, the above ZnS-
Can be used SiN, AlN, and SiO 2, TiO 2 refractory transparent dielectric material such as a non-SiO 2. As the recording film, the rewritable phase change recording material such as GeSbTe system or InSbTe system described above can be used. As the reflective film, Au or the like can be used in addition to Al described above. (7) Either or both of another protective film and a protective substrate may be set on the heater film which is the uppermost layer in the above embodiment,
Instead of the protective substrate, an optical information recording medium having the same structure may be attached. (8) The temperature obtained by the heat generation of the heater film may be controlled to an appropriate temperature depending on the material of the recording film, the protective film, etc. and the structure of the optical information recording medium.
【図1】本発明の具体的な一実施例に係る光情報記録媒
体の断面構造を示した模式図である。FIG. 1 is a schematic view showing a cross-sectional structure of an optical information recording medium according to a specific example of the present invention.
【図2】同実施例に係る光情報記録媒体のヒータ膜によ
る初期化又は全面消去工程を示した概念図である。FIG. 2 is a conceptual diagram showing an initialization or full erasing process with a heater film of the optical information recording medium in the example.
1…基板 2…下層保護膜 3…記録膜 4…上層保護膜 5…反射膜 6…絶縁膜 7…ヒータ膜 10…光情報記録媒体 DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Lower protective film 3 ... Recording film 4 ... Upper protective film 5 ... Reflective film 6 ... Insulating film 7 ... Heater film 10 ... Optical information recording medium
Claims (1)
膜を順次形成した光情報記録媒体において、 前記記録膜を加熱し最初に記録可能な状態となるまで結
晶質化(初期結晶質化)又は記録情報の全面消去状態と
なるまで結晶質化を行うため少なくとも1層のヒータ膜
を備えたことを特徴とする光情報記録媒体。1. An optical information recording medium in which a lower protective film, a recording film, and an upper protective film are sequentially formed on a substrate, and the recording film is heated to crystallize until the first recordable state (initial crystallinity). Or an optical information recording medium having at least one heater film for crystallizing until the recorded information is completely erased.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4221989A JPH0652578A (en) | 1992-07-28 | 1992-07-28 | Optical information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4221989A JPH0652578A (en) | 1992-07-28 | 1992-07-28 | Optical information recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0652578A true JPH0652578A (en) | 1994-02-25 |
Family
ID=16775340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4221989A Pending JPH0652578A (en) | 1992-07-28 | 1992-07-28 | Optical information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0652578A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000039794A1 (en) * | 1998-12-25 | 2000-07-06 | Teijin Limited | Phase change-type optical recording medium and process for manufacturing the same |
EP1609614A1 (en) * | 2003-03-13 | 2005-12-28 | Sony Corporation | Optical recording medium |
-
1992
- 1992-07-28 JP JP4221989A patent/JPH0652578A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000039794A1 (en) * | 1998-12-25 | 2000-07-06 | Teijin Limited | Phase change-type optical recording medium and process for manufacturing the same |
EP1609614A1 (en) * | 2003-03-13 | 2005-12-28 | Sony Corporation | Optical recording medium |
EP1609614A4 (en) * | 2003-03-13 | 2006-07-26 | Sony Corp | Optical recording medium |
US7464391B2 (en) | 2003-03-13 | 2008-12-09 | Sony Corporation | Optical recording medium |
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