JPH0581680B2 - - Google Patents
Info
- Publication number
- JPH0581680B2 JPH0581680B2 JP61079620A JP7962086A JPH0581680B2 JP H0581680 B2 JPH0581680 B2 JP H0581680B2 JP 61079620 A JP61079620 A JP 61079620A JP 7962086 A JP7962086 A JP 7962086A JP H0581680 B2 JPH0581680 B2 JP H0581680B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- alloy plating
- zincate
- plating bath
- additive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007747 plating Methods 0.000 claims description 52
- 239000000654 additive Substances 0.000 claims description 17
- 239000002184 metal Chemical class 0.000 claims description 16
- 229910052751 metal Chemical class 0.000 claims description 16
- 230000000996 additive effect Effects 0.000 claims description 15
- 229920000768 polyamine Polymers 0.000 claims description 13
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 12
- 229920001281 polyalkylene Polymers 0.000 claims description 11
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 claims description 11
- 239000011701 zinc Substances 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 7
- 239000008139 complexing agent Substances 0.000 claims description 6
- 229910001854 alkali hydroxide Inorganic materials 0.000 claims description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 15
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 6
- -1 NaOH Chemical class 0.000 description 5
- 229920002873 Polyethylenimine Polymers 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 229910007567 Zn-Ni Inorganic materials 0.000 description 4
- 229910007614 Zn—Ni Inorganic materials 0.000 description 4
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- BUAXCDYBNXEWEB-UHFFFAOYSA-N 2-(chloromethyl)oxirane;n-methylmethanamine Chemical compound CNC.ClCC1CO1 BUAXCDYBNXEWEB-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005246 galvanizing Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 2
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 2
- 235000012141 vanillin Nutrition 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- SDKQKTMVNUGBPR-UHFFFAOYSA-N 2-(chloromethyl)oxirane;1h-imidazole Chemical compound C1=CNC=N1.ClCC1CO1 SDKQKTMVNUGBPR-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 229910018661 Ni(OH) Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NSOXQYCFHDMMGV-UHFFFAOYSA-N Tetrakis(2-hydroxypropyl)ethylenediamine Chemical compound CC(O)CN(CC(C)O)CCN(CC(C)O)CC(C)O NSOXQYCFHDMMGV-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000003934 aromatic aldehydes Chemical class 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 229940001468 citrate Drugs 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 229940050410 gluconate Drugs 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- LSHROXHEILXKHM-UHFFFAOYSA-N n'-[2-[2-[2-(2-aminoethylamino)ethylamino]ethylamino]ethyl]ethane-1,2-diamine Chemical compound NCCNCCNCCNCCNCCN LSHROXHEILXKHM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- SATCULPHIDQDRE-UHFFFAOYSA-N piperonal Chemical compound O=CC1=CC=C2OCOC2=C1 SATCULPHIDQDRE-UHFFFAOYSA-N 0.000 description 1
- 229920000333 poly(propyleneimine) Polymers 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Description
<産業上の利用分野>
本発明は、Zn化合物、水酸化アルカリ及びFe
(,)又はNi()の金属塩をそれらのキレ
ート剤とともに含み、さらに光沢添加剤が混合さ
れているジンケート型亜鉛合金めつき浴に関す
る。
<従来の技術>
Zn−Fe,Zn−Ni等の亜鉛合金めつきは、亜鉛
めつきと比較して、耐食性に優れているため、
種々のめつき浴が報告されている。そして、この
亜鉛合金めつきも、さらに耐食性を向上させるた
めに、亜鉛めつきと同様、めつき後クロメート処
理することが多い。この場合、Fe,Ni等の異種
金属の共析率は、めつき被膜の耐食性が良好でか
つクロメート皮膜が良好に生成する範囲となるよ
うにする必要がある。これらの共析率は、Zn−
Fe合金めつきにおいては、Fe共析率が0.1〜5
%、Zn−Ni合金めつきにおいては、Ni共析率が
2〜20%であることが知られている。そして、こ
れらの合金めつきを得るために、錯化剤を用いて
異種金属を可溶化したジンケート型亜鉛合金めつ
き浴が刊行物により公知となつている。例えば、
Zn−Fe合金めつきについては、「実務表面技術、
第29巻第8号(1982年)」第383〜387頁(社団法
人金属表面技術協会社刊行)、及び特開昭60−
181293号公報等に記載され、Zn−Ni合金めつき
については、「金属表面技術協会、第70回学術講
演大会要旨集(1982年)」第28〜29頁等に記載さ
れている。
<発明が解決しようとする問題点>
しかし、本発明者らが、上記刊行物に記載され
ているジンケート型の亜鉛合金めつき浴でめつき
を行なつたところ、広い範囲の電流密度で、均一
な光沢外観及び均一な異種金属の共析比率を得が
たいことがわかつた。
<問題点を解決するための手段>
本発明者らは、上記問題点を解決するために、
鋭意開発に努力をした結果、下記構成のジンケー
ト型亜鉛合金めつき浴に想到した。
Zn化合物、水酸化アルカリ及びFe(,)又
はNi()の金属塩でそれらの錯化剤とともに含
み、さらに光沢添加剤が混合されているジンケー
ト型亜鉛合金めつき浴において、光沢添加剤が、
ポリアルキレンポリアミンの塩基性窒素原子が
C1〜C3アルキル化されたポリアルキレンポリア
ミン又はこれを主成分とするものであることを特
徴とする。
<手段の詳細な説明>
以下、本発明の各構成について詳細に説明をす
る。
(1) ジンケート浴の基本組成である、Zn化合物、
例えばZnO及び水酸化アルカリ例えばNaOH,
KOHの各含有量は、通常、前者はZn濃度とし
て5〜40g/、後者はNaOHとして30〜200
g/とする。
(2) 異種金属であるFe(,)又はNi()の
金属塩の濃度は、通常、各金属濃度として前者
0.02〜5g/、後者0.02〜5g/である。
そして各金属塩としては、例えば、前者Fe2
(SO4)3・7H2O、FeSO4・7H2O、Fe(OH)3、
FeCl3・6H2O、FeCl2・4H2O等、後者
NiSO4・6H2O、NiCl2・6H2O、Ni(OH)2等を
用いる。そして、これらを浴中で安定化(可溶
化)させるために、錯化剤(キレート剤)を用
いるが、前者の場合、前述の特開昭60−181293
号公報第2〜3頁に記載されている下記のも
のが、後者の場合、前述の「金属表面技術協
会、第70回学術講演要旨集」第28頁に記載され
ている下記のものをそれぞれ例示できる。な
お、錯化剤の使用量は異種金属イオン1molに
対して1〜100molとなる量とする。
クエン酸塩、酒石酸塩、グルコン酸塩など
のオキシカルボン酸塩類;モノエタノールア
ミン、ジエタノールアミン、トリエタノール
アミンなどのアミノアルコール類;エチレン
ジアミン(EDA)、ジエチレントリアミン、
トリエチレンテトラミンなどのポリアミン
類;エチレンジアミン四酢酸塩、ニドロ三酢
酸塩などのアミノカルボン酸塩;ソルビツ
ト、ペンタエリスリトールなどの多価アルコ
ール類;チオ尿素類などの中から1種又は2
種以上を選んで用いる。特に、これらのうち
でトリエタノールアミンが望ましい。
酒石酸Na、グルコン酸Na、NaCNトリエ
タノールアミン、エチレンジアミン、ペンタ
エチレンヘキサミン、クアドロール、
EDTA・2Na、N−ハイドロキシエチルエ
チレンジアミン(HEEDA)などの中から1
種又は2種以上を選んで用いる。特に、これ
らのうちでHEEDA及びエチレンジアミンが
望ましい。
(3) 光沢添加剤となるか又はその主成分となるア
ルキル化ポリアルキレンポリアミンは下記のよ
うにして得、そのめつき浴に対する混合量は
0.1〜50g/、望ましくは1〜10g/とす
る。
平均分子量600〜5000のポリアルキレンポリ
アミンを、その塩基性窒素原子1当量当りC1
〜C3アルキル化剤0.1〜2.1モルと40〜100℃の
水溶液中で反応させる。ここで上記分子量が
600未満では高電流密度におけるコゲの抑制が
困難であり、5000を越えるとめつき浴への溶解
が困難となる。また、ポリアルキレンポリアミ
ンとしては、ポリエチレンイミン、ポリプロピ
レンイミン、ポリブチレンイミン等を使用でき
るが、特にポリエチレンイミンが望ましい。上
記アルキル化剤としては、慣用のアルキル化
剤、例えば、CH3Cl,CH3Br,CH3I,
C2H5Br,C2H5I,(CH3)2SO4,(C2H5)2SO4,
C3H7I,C3H7Cl,C3H7Br等を使用できる。
アルキル化ポリアルキレンポリアミンを主成
分とする光沢添加剤の場合、他の成分として
は、光沢添加剤として一般に使用されているイ
ミダゾール−エピクロルヒドリン反応物などの
複素環窒素化合物、ジメチルアミン−エピクロ
ルヒドリン反応物などのポリアミン、ポリビニ
ルアルコール(PVA)、ゼラチンなどの水溶性
高分子、アニスアルデヒド、ヘリオトロピン、
バニリン等の芳香族アルデヒド、チオ尿素等の
硫黄化合物を1種又は2種以上組合せて用い
る。そして、これらの他の成分は、光沢添加剤
全体として0.01〜30g/になるような量、上
記アルキル化ポリアルキレンポリアミンに混合
して用いる。
(4) 上記構成の亜鉛合金めつき浴は、通常の亜鉛
めつきと同様にして、ラツク法、バレル法等に
より、被めつき物をめつきできる。
<発明の作用・効果>
本発明のジンケート型亜鉛合金めつき浴は、光
沢添加剤として、ポリアルキレンポリアミンの塩
基性窒素原子が部分的にC1〜C3アルキル化され
たアルキル化ポリアルキレンポリアミンと、又は
それを主成分とするものとすることにより、下記
作用効果を奏する。
Zn化合物、例えばNnOは亜鉛イオンの供給、
水酸化アルカリ、例えばNaOHは亜鉛イオンの
浴中での安定化及び通電性向上、金属塩はFe
(,)又はNi()の各イオンの供給、錯化
剤はこれらのイオンの浴中での安定化(可溶化)
の各作用を奏する(ここまでは従来のジンケート
型合金めつき浴と変らない)。そして、光沢添加
剤は、めつき被膜中に析出される異種金属(Fe
又はNi)の共析率を広い電流密度範囲で安定さ
せ、かつ、めつき被膜の析出粒を微細化させる作
用がある。従つて、均一な光沢のめつき被膜を得
ることができ、しかも、クロメート処理した場
合、外観に優れていることは勿論、従来に比して
さらに耐食性に向上を図ることができる。
<実施例>
以下、本発明をよりよく理解するために、実施
例を比較例とともに挙げて説明をする。なお、本
発明の技術的範囲は、実施例に限定されるもので
はなく、特許請求の範囲の記載を逸脱しない範囲
で種々の態様に及ぶものである。
各実施例におけるアルキル化ポリエリレンイミ
ン(「APEI」と略す)は、平均分子量1200のポ
リエチレンイミンの20%水溶液100gに対して、
水冷、撹拌しながら(CH3)2SO488gを30分間か
けて添加し、続いて撹拌を継続しながら80℃に昇
温し2時間保持した後、撹拌を止め放冷したもの
を使用した。
また、めつき槽としてハルセル(267c.c.)の使
用した。ハルセルは、一度のめつき付けで広い範
囲の電流密度にわたるめつき結果が得らるためで
ある。そして、ハルセルめつきにより得ためつき
被膜の外観を目視観察するとともに、被めつき板
(ハルセル板:陰極)を高電流側から10cmの範囲
を五等分(四等分)切断し、各ピースのめつき被
膜中の異種金属共析率を各ピースを酸類に溶解し
原子吸光光度法により測定した。それらの結果を
第1表に示すが、各実施例のめつきを被膜は、均
一な光沢ないし半光沢の外観が得られるととも
に、広い電流密度範囲にわたり共析率のバラツキ
が小さい(安定している)ことがわかる。
なお、第1表におけるハルセル陰極板上の位置
番号と電流密度の関係は、下記の通りである。ま
た、位置を示す範囲は、高電流側を0cmとし、低
電流側への距離で示す。
0〜2cm…3.5〜6A/dm2以上
2〜4cm…2〜3.5A/dm2
4〜6cm…1〜2A/dm2
6〜8cm…0.37〜1A/dm2
8〜10cm…0〜0.37A/dm2
実施例 1
(Zn−Feめつき):
電流:1A、めつき時間:10分、浴温:25℃、
陽極:軟鋼板、陰極:銅板、の条件で行つた。
ここで、軟鋼板は、陽極としても、ジンケート
浴のような強アルカリ性めつき浴では、ほとんど
溶解せず、不溶性陽極として働く。また、銅板と
陰極としたのは、素材が鉄であると、共析率の分
析時に被めつき板の鉄成分が混入して分析値を大
きく狂わせるためである。
<Industrial Application Field> The present invention is directed to Zn compounds, alkali hydroxides and Fe
The present invention relates to a zincate type zinc alloy plating bath containing metal salts of (,) or Ni () together with their chelating agents, and further mixed with a brightness additive. <Conventional technology> Zinc alloy plating such as Zn-Fe and Zn-Ni has superior corrosion resistance compared to zinc plating.
Various plating baths have been reported. In order to further improve corrosion resistance, this zinc alloy plating is often subjected to chromate treatment after plating, similar to zinc plating. In this case, the eutectoid ratio of different metals such as Fe and Ni needs to be within a range where the corrosion resistance of the plating film is good and a chromate film is well formed. These eutectoid rates are Zn−
In Fe alloy plating, the Fe eutectoid rate is 0.1 to 5.
It is known that in Zn-Ni alloy plating, the Ni eutectoid rate is 2 to 20%. In order to obtain these alloy platings, zincate type zinc alloy plating baths in which dissimilar metals are solubilized using a complexing agent are known from publications. for example,
Regarding Zn-Fe alloy plating, see "Practical surface technology,
Volume 29, No. 8 (1982), pp. 383-387 (Published by Metal Surface Technology Association), and JP-A-60-
181293, etc., and Zn-Ni alloy plating is described in "Metal Surface Technology Association, 70th Academic Conference Abstracts (1982)", pages 28-29, etc. <Problems to be Solved by the Invention> However, when the present inventors performed plating with the zincate type zinc alloy plating bath described in the above publication, they found that in a wide range of current densities, It was found that it was difficult to obtain a uniform glossy appearance and a uniform eutectoid ratio of dissimilar metals. <Means for solving the problems> In order to solve the above problems, the present inventors
As a result of intensive development efforts, we came up with a zincate type zinc alloy plating bath with the following configuration. In a zincate type zinc alloy plating bath containing a Zn compound, an alkali hydroxide, and a metal salt of Fe(,) or Ni() together with a complexing agent thereof, and further mixed with a brightness additive, the brightness additive is
The basic nitrogen atom of polyalkylene polyamine
It is characterized by being a C 1 to C 3 alkylated polyalkylene polyamine or a product containing this as a main component. <Detailed Description of Means> Each configuration of the present invention will be described in detail below. (1) Zn compounds, which are the basic composition of zincate baths,
For example ZnO and alkali hydroxides such as NaOH,
The content of KOH is usually 5 to 40 g/Zn concentration for the former, and 30 to 200 g/NaOH for the latter.
Let it be g/. (2) The concentration of metal salts of Fe (,) or Ni (), which are dissimilar metals, is usually the former as the concentration of each metal.
0.02-5g/, the latter 0.02-5g/.
As each metal salt, for example, the former Fe 2
( SO4 ) 3・7H2O , FeSO4・7H2O , Fe(OH) 3 ,
FeCl 3・6H 2 O, FeCl 2・4H 2 O, etc., the latter
NiSO 4 .6H 2 O, NiCl 2 .6H 2 O, Ni(OH) 2 , etc. are used. In order to stabilize (solubilize) these in the bath, a complexing agent (chelating agent) is used.
In the case of the latter, the following items listed on pages 2 and 3 of the publication are replaced with the following items listed on page 28 of the aforementioned "Metal Surface Technology Association, 70th Academic Lecture Abstracts". I can give an example. The amount of the complexing agent used is 1 to 100 mol per 1 mol of different metal ions. Oxycarboxylic acid salts such as citrate, tartrate, and gluconate; Amino alcohols such as monoethanolamine, diethanolamine, and triethanolamine; Ethylenediamine (EDA), diethylenetriamine,
One or two of polyamines such as triethylenetetramine; aminocarboxylic acid salts such as ethylenediaminetetraacetate and nidrotriacetate; polyhydric alcohols such as sorbitol and pentaerythritol; thioureas, etc.
Select and use more than one species. Among these, triethanolamine is particularly desirable. Sodium tartrate, sodium gluconate, NaCN triethanolamine, ethylenediamine, pentaethylenehexamine, quadrol,
1 from EDTA, 2Na, N-hydroxyethylethylenediamine (HEEDA), etc.
Select and use one species or two or more species. Particularly preferred among these are HEEDA and ethylenediamine. (3) The alkylated polyalkylene polyamine, which becomes the gloss additive or its main component, is obtained as follows, and the amount mixed in the plating bath is
The amount is 0.1 to 50 g/, preferably 1 to 10 g/. A polyalkylene polyamine with an average molecular weight of 600 to 5000 has C 1 per equivalent of its basic nitrogen atom.
~ React with 0.1-2.1 mol of C3 alkylating agent in an aqueous solution at 40-100 °C. Here, the above molecular weight is
If it is less than 600, it is difficult to suppress burnt at high current density, and if it exceeds 5000, it becomes difficult to dissolve in the plating bath. Further, as the polyalkylene polyamine, polyethyleneimine, polypropyleneimine, polybutyleneimine, etc. can be used, but polyethyleneimine is particularly desirable. As the alkylating agent, conventional alkylating agents such as CH 3 Cl, CH 3 Br, CH 3 I,
C 2 H 5 Br, C 2 H 5 I, (CH 3 ) 2 SO 4 , (C 2 H 5 ) 2 SO 4 ,
C 3 H 7 I, C 3 H 7 Cl, C 3 H 7 Br, etc. can be used. In the case of gloss additives based on alkylated polyalkylene polyamines, other ingredients include heterocyclic nitrogen compounds such as imidazole-epichlorohydrin reactants, dimethylamine-epichlorohydrin reactants, etc., which are commonly used as gloss additives. polyamines, polyvinyl alcohol (PVA), water-soluble polymers such as gelatin, anisaldehyde, heliotropin,
One type or a combination of two or more types of aromatic aldehydes such as vanillin and sulfur compounds such as thiourea are used. These other components are used by being mixed with the alkylated polyalkylene polyamine in an amount such that the total amount of the gloss additive is 0.01 to 30 g/g/. (4) The zinc alloy plating bath having the above structure can be used to plate objects by the rack method, barrel method, etc. in the same manner as normal zinc plating. <Actions and Effects of the Invention> The zincate type zinc alloy plating bath of the present invention contains an alkylated polyalkylene polyamine in which basic nitrogen atoms of a polyalkylene polyamine are partially alkylated from C 1 to C 3 as a gloss additive. By using or having it as a main component, the following effects are achieved. Zn compounds, such as NnO, supply zinc ions,
Alkali hydroxide, such as NaOH, stabilizes zinc ions in the bath and improves conductivity, while metal salts use Fe.
(,) or Ni (), and the complexing agent stabilizes (solubilizes) these ions in the bath.
(Up to this point, it is the same as a conventional zincate-type alloy plating bath). The brightness additive is a dissimilar metal (Fe) precipitated in the plating film.
It has the effect of stabilizing the eutectoid rate of (or Ni) over a wide current density range and making the precipitated grains of the plating film finer. Therefore, it is possible to obtain a uniformly glossy plating film, and when it is chromate-treated, it not only has an excellent appearance but also has improved corrosion resistance compared to the conventional method. <Examples> In order to better understand the present invention, examples will be described below along with comparative examples. Note that the technical scope of the present invention is not limited to the embodiments, but extends to various embodiments without departing from the scope of the claims. In each example, the alkylated polyethyleneimine (abbreviated as "APEI") was
While cooling with water and stirring, 88 g of (CH 3 ) 2 SO 4 was added over 30 minutes, and then the temperature was raised to 80°C while stirring and held for 2 hours, after which stirring was stopped and the mixture was allowed to cool. . In addition, Hull Cell (267c.c.) was used as a plating tank. This is because the Hull Cell allows plating results over a wide range of current densities to be obtained with a single plating. Then, the appearance of the matted film obtained by Hull Cell plating was visually observed, and the plated plate (Hull Cell plate: cathode) was cut into five equal parts (quarters) within a 10 cm range from the high current side, and each piece was The eutectoid rate of different metals in the plated film was measured by dissolving each piece in an acid and using atomic absorption spectrometry. The results are shown in Table 1. The plating films of each example had a uniform glossy or semi-glossy appearance, and the variation in the eutectoid rate was small (stable and stable) over a wide current density range. It is clear that there are The relationship between the position number on the Hull Cell cathode plate and the current density in Table 1 is as follows. In addition, the range indicating the position is indicated by the distance to the low current side, with the high current side being 0 cm. 0 to 2 cm...3.5 to 6 A/dm 2 or more 2 to 4 cm...2 to 3.5 A/dm 2 4 to 6 cm...1 to 2 A/dm 2 6 to 8 cm...0.37 to 1 A/dm 2 8 to 10 cm...0 to 0.37 A /dm 2 Example 1 (Zn-Fe plating): Current: 1A, plating time: 10 minutes, bath temperature: 25℃,
The test was conducted under the following conditions: anode: mild steel plate, cathode: copper plate. Here, the mild steel plate is hardly dissolved even as an anode in a strong alkaline plating bath such as a zincate bath, and acts as an insoluble anode. Further, the reason why a copper plate was used as the cathode was because if the material was iron, the iron component of the plated plate would be mixed in during the analysis of the eutectoid rate, which would greatly deviate the analytical value.
【表】
実施例 2
実施例1において、光沢添加剤をAPEIのみと
した以外は、全て同一条件でめつきを行なつた。
実施例 3
実施例1において、さらにジメチルアミン−エ
ピクロルヒドリン(モル比1:1)反応物3g/
を追加した以外は全て同一条件でめつきを行な
つた。
比較例 1
実施例1において、光沢添加剤中のAPEIをア
ルキル化されていないポリエチレンイミン(分子
量1200)1.5g/とした以外は、全て同一条件
でめつきを行なつた。
比較例 2
実施例1において、光沢添加剤として市販ジン
ケート亜鉛めつき用光沢剤を6ml/用いた以外
は、全て同一条件でめつきを行なつた。
比較例 3
実施例1において、光沢添加剤としてエチレン
ジアミン−エピクロルヒドリン(モル比1:1)
反応物を5ml/用いた以外は、全て同一条件で
めつきを行なつた。実施例 4
(Zn−Niめつき)
下記組成のめつき浴を用いて、電流:1A、め
つき時間:10分、浴温:25℃、陽極:亜鉛板、陰
極:ブライト鋼板、の条件でめつきを行なつた。[Table] Example 2 Plating was carried out under the same conditions as in Example 1 except that only APEI was used as the gloss additive. Example 3 In Example 1, 3 g of dimethylamine-epichlorohydrin (molar ratio 1:1) reactant was added/
Plating was carried out under the same conditions except for the addition of . Comparative Example 1 Plating was carried out under the same conditions as in Example 1 except that APEI in the gloss additive was changed to 1.5 g/non-alkylated polyethyleneimine (molecular weight 1200). Comparative Example 2 Plating was carried out under the same conditions as in Example 1 except that 6 ml of a commercially available zincate brightener for galvanizing was used as the brightness additive. Comparative Example 3 In Example 1, ethylenediamine-epichlorohydrin (molar ratio 1:1) was used as the gloss additive.
Plating was carried out under the same conditions except that 5 ml of the reactant was used. Example 4 (Zn-Ni plating) Using a plating bath with the following composition, current: 1A, plating time: 10 minutes, bath temperature: 25℃, anode: zinc plate, cathode: bright steel plate. I performed a ceremonial ceremony.
【表】
実施例 5
下記組成のめつき浴を用いて、実施例3と同様
の条件でめつきを行なつた。
ZnO 10g/
NaOH 120g/
NiSO4・6H2O 3.6g/
HEEDA 5.7g/
APEI 3g/
実施例 6
実施例3において、さらにバニリン0.1g/
を追加した以外は全て同一条件でめつきを行なつ
た。
比較例 4
実施例3において、光沢添加剤中のAPEIをア
ルキル化されていないポリエチレンイミン(分子
量1200)1.5g/とした以外は、全て同一条件
でめつきを行なつた。
比較例 5
実施例3において、光沢添加剤として市販ジン
ケート亜鉛めつき用光沢剤を6ml/用いた以外
は、全て同一条件でめつきを行なつた。[Table] Example 5 Plating was carried out under the same conditions as in Example 3 using a plating bath having the following composition. ZnO 10g / NaOH 120g / NiSO 4 6H 2 O 3.6g / HEEDA 5.7g / APEI 3g / Example 6 In Example 3, vanillin 0.1g /
Plating was carried out under the same conditions except for the addition of . Comparative Example 4 Plating was carried out under the same conditions as in Example 3, except that APEI in the gloss additive was changed to 1.5 g/non-alkylated polyethyleneimine (molecular weight 1200). Comparative Example 5 Plating was carried out under the same conditions as in Example 3, except that 6 ml of a commercially available zincate brightener for galvanizing was used as the brightness additive.
【表】【table】
Claims (1)
20%の亜鉛合金めつき被膜を生成させるための合
金めつき浴であつて、 Zn化合物、水酸化アルカリ及びFe(,)又
はNi()の金属塩をそれらの錯化剤とともに含
み、さらに光沢添加剤が混合されているジンケー
ト型Zn合金メツキ浴において、 前記光沢添加剤が、ポリアルキレンポリアミン
の塩基性窒素原子が部分的にC1〜C3アルキル化
されたポリアルキル化ポリアルキレンポリアミン
又はこれを主成分とするものであること、 を特徴とするジンケート型亜鉛合金めつき浴。[Claims] 1 Fe eutectoid rate is 0.1 to 5%, or Ni eutectoid rate is 2 to 5%.
An alloy plating bath for producing a 20% zinc alloy plating film, which contains a Zn compound, an alkali hydroxide, and a metal salt of Fe (,) or Ni () together with a complexing agent thereof, and further improves gloss. In the zincate-type Zn alloy plating bath in which an additive is mixed, the brightness additive is a polyalkylated polyalkylene polyamine in which the basic nitrogen atoms of the polyalkylene polyamine are partially alkylated from C 1 to C 3 or this. A zincate type zinc alloy plating bath characterized by having as a main component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7962086A JPS62238387A (en) | 1986-04-07 | 1986-04-07 | Zincate type zinc alloy plating bath |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7962086A JPS62238387A (en) | 1986-04-07 | 1986-04-07 | Zincate type zinc alloy plating bath |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62238387A JPS62238387A (en) | 1987-10-19 |
JPH0581680B2 true JPH0581680B2 (en) | 1993-11-15 |
Family
ID=13695103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7962086A Granted JPS62238387A (en) | 1986-04-07 | 1986-04-07 | Zincate type zinc alloy plating bath |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62238387A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62240788A (en) * | 1986-04-14 | 1987-10-21 | Deitsupusoole Kk | Zinc-nickel alloy plating bath |
JPH02141596A (en) * | 1988-11-21 | 1990-05-30 | Yuken Kogyo Kk | Zincate-type zinc alloy plating bath |
JP4570738B2 (en) * | 1999-08-05 | 2010-10-27 | 日本表面化学株式会社 | Electrogalvanizing bath and plating method |
JP5219011B2 (en) | 1999-11-10 | 2013-06-26 | 日本表面化学株式会社 | Surface treatment liquid, surface treatment agent, and surface treatment method |
CN114787424A (en) | 2019-12-11 | 2022-07-22 | 优恳工业株式会社 | Alkaline zinc-iron plating bath |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5380334A (en) * | 1976-12-24 | 1978-07-15 | Basf Ag | Zinc electroplating bath |
-
1986
- 1986-04-07 JP JP7962086A patent/JPS62238387A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5380334A (en) * | 1976-12-24 | 1978-07-15 | Basf Ag | Zinc electroplating bath |
Also Published As
Publication number | Publication date |
---|---|
JPS62238387A (en) | 1987-10-19 |
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