JPH05315434A - Semiconductor wafer retainer - Google Patents
Semiconductor wafer retainerInfo
- Publication number
- JPH05315434A JPH05315434A JP11439892A JP11439892A JPH05315434A JP H05315434 A JPH05315434 A JP H05315434A JP 11439892 A JP11439892 A JP 11439892A JP 11439892 A JP11439892 A JP 11439892A JP H05315434 A JPH05315434 A JP H05315434A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- semiconductor wafer
- film member
- plate member
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体ウェーハを保持
し、搬送する半導体ウェーハ保持具に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor wafer holder that holds and conveys semiconductor wafers.
【0002】[0002]
【従来の技術】通常、半導体ウェーハを把み保持したり
する際には、半導体ウェーハに損傷や汚染しないよう
に、埃が付きにくい材質で軟い材料で製作されたピンセ
ットや真空吸着による保持具で行なわれていた。しかし
ながら、近年、半導体ウェーハの大口径化に伴い、ピン
セットでは保持力が弱く、真空吸着を利用した保持具が
使われるようになった。2. Description of the Related Art Usually, when holding and holding a semiconductor wafer, tweezers made of a soft material that is hard to attach dust or a holder by vacuum suction so as not to damage or contaminate the semiconductor wafer. It was done in. However, in recent years, with the increase in the diameter of semiconductor wafers, the holding force of the tweezers is weak, and holding tools using vacuum suction have come to be used.
【0003】図3(a)及び(b)は従来の半導体ウェ
ーハ保持具の例を示す図である。従来、この種の保持具
は、例えば、図3(a)に示すように、真空排気による
ウェーハ5を吸着する吸着口をもつ吸着板6や、例え
ば、図3(b)に示すように、上部から高圧流体を引き
込み、噴出口7から流体が放射状に噴出させ、この噴出
口7の開口面積と比較して十分小さい開口面積の吸着口
8をもつ中空盤体9が使用されていた。3A and 3B are views showing an example of a conventional semiconductor wafer holder. Conventionally, this type of holder has, for example, as shown in FIG. 3 (a), a suction plate 6 having a suction port for sucking the wafer 5 by vacuum exhaust, or, for example, as shown in FIG. 3 (b), A high pressure fluid is drawn in from the upper part, the fluid is ejected radially from the ejection port 7, and a hollow disc body 9 having an adsorption port 8 having an opening area sufficiently smaller than the opening area of the ejection port 7 is used.
【0004】前者の保持具は、ウェーハキャリアからウ
ェーハを取出したり、収納したりする際に使用され、後
者はウェーハを一つの場所から他の場所に移載する際に
用いられていた。The former holder was used for taking out and storing the wafer from the wafer carrier, and the latter was used for transferring the wafer from one place to another.
【0005】[0005]
【発明が解決しようとする課題】上述した従来の半導体
ウェーハ保持具では、真空吸着板の保持具では、ウェー
ハが歪んでいる場合に吸着穴が全部ウェーハと接触せ
ず、リークするために保持出来なかったり、後者の中空
盤体のものでは、歪んだウェーハを保持するもののウェ
ーハの外側の一部を吸着したりするので、ウェーハを均
等な吸着力で保持することができず、しばしば落として
破損させる問題があった。In the conventional semiconductor wafer holder described above, when the wafer is distorted, the suction holes do not come into contact with all the wafers and can be held because they leak. In the latter, the latter one holds the distorted wafer but adsorbs a part of the outer side of the wafer, so the wafer cannot be held with an even adsorption force and is often dropped and damaged. There was a problem that caused it.
【0006】本発明の目的は、ウェーハが歪んでいても
全面を均一に保持し、強力にウェーハを保持する半導体
ウェーハ保持具を提供することである。It is an object of the present invention to provide a semiconductor wafer holder that holds a wafer evenly, even if the wafer is distorted.
【0007】[0007]
【課題を解決するための手段】本発明の半導体ウェーハ
保持具は、一面に排気口をもつ板部材と、この板部材の
他面にその周囲を被着して取付けられるとともに複数の
穴が形成される柔軟な弾性のある膜部材と、この膜部材
と前記板部材に挿入されるスペーサ部材を備えている。SUMMARY OF THE INVENTION A semiconductor wafer holder according to the present invention is provided with a plate member having an exhaust port on one surface, and a plurality of holes formed on the other surface of the plate member by attaching the periphery thereof. And a spacer member inserted into the film member and the plate member.
【0008】[0008]
【実施例】次に本発明について図面を参照して説明す
る。The present invention will be described below with reference to the drawings.
【0009】図1(a)及び(b)は本発明の一実施例
を示す半導体ウェーハ保持具の平面図及び断面図であ
る。この半導体ウェーハ保持具は、図1に示すように、
一面側に排気経路1aに通ずる排気口1bをもつ板部材
1と、この板部材1の他面側に取付けられるとともに複
数の吸着口4をもつ弾性のある柔軟な膜部材3と、この
膜部材3と板部材1との間に挿入されるスペーサ部材2
とで構成されている。1A and 1B are a plan view and a sectional view of a semiconductor wafer holder showing an embodiment of the present invention. This semiconductor wafer holder, as shown in FIG.
A plate member 1 having an exhaust port 1b communicating with the exhaust path 1a on one surface side, an elastic flexible film member 3 attached to the other surface side of the plate member 1 and having a plurality of suction ports 4, and this film member Spacer member 2 inserted between plate 3 and plate member 1
It consists of and.
【0010】ここで膜部材3は、例えば、薄いゴム板か
樹脂板から製作し、表面にごみが付着しないように、フ
ッ素加工処理を施すことである。また、図面には示さな
いが排気口1bに接続される真空排気管は、保持具が操
作し易いようにフレキシブルチューブとすることであ
る。なおスペーサ部材3は板部材1より突出させ排気経
路1aと通ずる穴を設けることである。Here, the film member 3 is made of, for example, a thin rubber plate or a resin plate, and is subjected to a fluorine processing treatment so as to prevent dust from adhering to the surface. Although not shown in the drawings, the vacuum exhaust pipe connected to the exhaust port 1b is a flexible tube so that the holder can be easily operated. The spacer member 3 is to project from the plate member 1 and to have a hole communicating with the exhaust path 1a.
【0011】図2(a)〜(c)は図1の半導体ウェー
ハ保持具の操作手順を説明するため断面図である。次
に、この半導体ウェーハ保持具の操作手順について説明
する。まず、図2(a)に示すように、膜部材3をウェ
ーハ5に接触させながら、板部材1をウェーハ5に乗せ
る。次にスペーサ部材2で形成される空間部を真空排気
し、ウェーハ5を膜部材3に吸着する。次に、図2
(c)に示すように、他の場所に半導体ウェーハ保持具
を移動させ、保持されたウェーハ5を移載する部分と接
触させながら、前記空間部に空気を導入し、ウェーハ5
を解放し、移載を完了する。FIGS. 2A to 2C are sectional views for explaining the operation procedure of the semiconductor wafer holder of FIG. Next, an operation procedure of this semiconductor wafer holder will be described. First, as shown in FIG. 2A, the plate member 1 is placed on the wafer 5 while the film member 3 is in contact with the wafer 5. Next, the space formed by the spacer member 2 is evacuated and the wafer 5 is attracted to the film member 3. Next, FIG.
As shown in (c), the semiconductor wafer holder is moved to another location, and air is introduced into the space while contacting the portion on which the held wafer 5 is to be transferred.
To complete the transfer.
【0012】このように柔軟な膜部材であれば、ウェー
ハ5に反りや凹凸があっても、ウェーハ5の表面状態に
応じて膜部材3が変形し、ウェーハ5の全面と接触し、
吸着口4を塞ぎ吸着するので、ウェーハ面を均一の吸着
で保持できる。With such a flexible film member, even if the wafer 5 is warped or uneven, the film member 3 is deformed according to the surface state of the wafer 5 and comes into contact with the entire surface of the wafer 5,
Since the suction port 4 is closed and sucked, the wafer surface can be held by uniform suction.
【0013】なおこの実施例では、スペーサ部材2を板
部材1より突出させているが、スペーサ部材2を膜部材
に貼付けても良い。この場合は、膜部材の自重を増加さ
せることになるので、膜部材と板部材の引き離しが容易
に行えるので、ウェーハの解放がより早く出来る利点が
ある。Although the spacer member 2 is projected from the plate member 1 in this embodiment, the spacer member 2 may be attached to the film member. In this case, since the self-weight of the film member is increased, the film member and the plate member can be easily separated from each other, so that there is an advantage that the wafer can be released more quickly.
【0014】[0014]
【発明の効果】以上説明したように本発明は、排気経路
に通ずる排気口を一面にもつ板部材の他面にその周囲で
取付けられるとともに複数の吸着口を有する柔軟な弾性
のある膜部材と、この膜部材と前記板部材との間に挿入
され前記膜部材と前記板部材とを所定の間隔に引離すス
ペーサ部材とを設けることによって、前記膜部材がウェ
ーハの反りあるいは凹凸に応じて変形しながらウェーハ
全面と接触し、複数の吸着口で吸着することが出来る。
従って、本発明によれば、ウェーハが歪んでいても全面
を均一な保持力で強力に保持出来る半導体ウェーハ保持
具が得られるという効果がある。As described above, according to the present invention, there is provided a flexible elastic membrane member having a plurality of suction ports which is attached to the other surface of a plate member having an exhaust port communicating with an exhaust path on one side thereof. By providing a spacer member that is inserted between the film member and the plate member and separates the film member and the plate member at a predetermined interval, the film member is deformed according to the warp or unevenness of the wafer. While contacting the entire surface of the wafer, it can be adsorbed by a plurality of adsorption ports.
Therefore, according to the present invention, there is an effect that it is possible to obtain a semiconductor wafer holder that can strongly hold the entire surface with a uniform holding force even if the wafer is distorted.
【図1】本発明の一実施例を示す半導体ウェーハ保持具
の平面図及び断面図である。FIG. 1 is a plan view and a cross-sectional view of a semiconductor wafer holder according to an embodiment of the present invention.
【図2】図1の半導体ウェーハ保持具の操作手順を説明
するための断面図である。FIG. 2 is a sectional view for explaining an operation procedure of the semiconductor wafer holder of FIG.
【図3】従来の半導体ウェーハ保持具の例を示す図であ
る。FIG. 3 is a diagram showing an example of a conventional semiconductor wafer holder.
1 板部材 1a 排気経路 1b 排気口 2 スペーサ部材 3 膜部材 4,8 吸着口 5 ウェーハ 6 吸着板 7 噴出口 9 中空盤体 DESCRIPTION OF SYMBOLS 1 Plate member 1a Exhaust path 1b Exhaust port 2 Spacer member 3 Membrane member 4,8 Adsorption port 5 Wafer 6 Adsorption plate 7 Jet port 9 Hollow disk body
Claims (1)
材の他面にその周囲を被着して取付けられるとともに複
数の穴が形成される柔軟な弾性のある膜部材と、この膜
部材と前記板部材に挿入されるスペーサ部材を備えるこ
とを特徴とする半導体ウェーハ保持具。1. A plate member having an exhaust port on one surface, a flexible elastic film member having a plurality of holes formed while being attached to the other surface of the plate member by surrounding the periphery thereof, and the film. A semiconductor wafer holder comprising a member and a spacer member inserted into the plate member.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11439892A JPH05315434A (en) | 1992-05-07 | 1992-05-07 | Semiconductor wafer retainer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11439892A JPH05315434A (en) | 1992-05-07 | 1992-05-07 | Semiconductor wafer retainer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05315434A true JPH05315434A (en) | 1993-11-26 |
Family
ID=14636687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11439892A Withdrawn JPH05315434A (en) | 1992-05-07 | 1992-05-07 | Semiconductor wafer retainer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05315434A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1320121A2 (en) * | 2001-12-03 | 2003-06-18 | Nitto Denko Corporation | Semiconductor wafer transport method and apparatus |
CN100390954C (en) * | 2004-05-09 | 2008-05-28 | 郑光镐 | Plane holding device |
JP2009260317A (en) * | 2008-04-12 | 2009-11-05 | Erich Thallner | Device and method for adding wafer to carrier and/or separating from carrier |
WO2012112025A1 (en) * | 2011-02-16 | 2012-08-23 | Texchem Advanced Products Incorporated Sdn. Bhd. | Single and dual stage wafer cushion and wafer separator |
CN108288601A (en) * | 2018-01-29 | 2018-07-17 | 环维电子(上海)有限公司 | A kind of suction nozzle, component suction nozzle and discharge method |
CN111941213A (en) * | 2019-05-16 | 2020-11-17 | 株式会社迪思科 | Grinding device |
KR20220047053A (en) * | 2020-10-08 | 2022-04-15 | 한국철도기술연구원 | Gripper for various shapes of products |
-
1992
- 1992-05-07 JP JP11439892A patent/JPH05315434A/en not_active Withdrawn
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1320121A2 (en) * | 2001-12-03 | 2003-06-18 | Nitto Denko Corporation | Semiconductor wafer transport method and apparatus |
EP1320121A3 (en) * | 2001-12-03 | 2006-07-05 | Nitto Denko Corporation | Semiconductor wafer transport method and apparatus |
CN100390954C (en) * | 2004-05-09 | 2008-05-28 | 郑光镐 | Plane holding device |
JP2009260317A (en) * | 2008-04-12 | 2009-11-05 | Erich Thallner | Device and method for adding wafer to carrier and/or separating from carrier |
WO2012112025A1 (en) * | 2011-02-16 | 2012-08-23 | Texchem Advanced Products Incorporated Sdn. Bhd. | Single and dual stage wafer cushion and wafer separator |
CN108288601A (en) * | 2018-01-29 | 2018-07-17 | 环维电子(上海)有限公司 | A kind of suction nozzle, component suction nozzle and discharge method |
CN111941213A (en) * | 2019-05-16 | 2020-11-17 | 株式会社迪思科 | Grinding device |
CN111941213B (en) * | 2019-05-16 | 2024-02-13 | 株式会社迪思科 | grinding device |
KR20220047053A (en) * | 2020-10-08 | 2022-04-15 | 한국철도기술연구원 | Gripper for various shapes of products |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990803 |