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JPH05198018A - Production apparatus and production for photosetting substrate - Google Patents

Production apparatus and production for photosetting substrate

Info

Publication number
JPH05198018A
JPH05198018A JP15850692A JP15850692A JPH05198018A JP H05198018 A JPH05198018 A JP H05198018A JP 15850692 A JP15850692 A JP 15850692A JP 15850692 A JP15850692 A JP 15850692A JP H05198018 A JPH05198018 A JP H05198018A
Authority
JP
Japan
Prior art keywords
substrate
diffusion filter
resin
photocurable
curing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15850692A
Other languages
Japanese (ja)
Inventor
Akira Nishizawa
昭 西沢
Tetsuya Kondo
哲也 近藤
Takeo Kojima
竹夫 小島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP15850692A priority Critical patent/JPH05198018A/en
Publication of JPH05198018A publication Critical patent/JPH05198018A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain the high-quality photosetting substrate having excellent transparency. CONSTITUTION:A stamper 7 and a substrate 5 to allow the passage of UV rays are superposed by holding a spacer 6 therebetween and a photosetting resin is previously injected into a space where the thickness is determined by the spacer 6. The above-mentioned substrate 5 is irradiated with UV rays from a light source through a diffusion filter 3, by which the photosetting resin is cured. The diffusion filter 3 which is visible when the distance between an evaluation diagram consisting of lines having prescribed widths and spacings and the diffusion filter is a specified value or below in the case of viewing the evaluation diagram via this diffusion filter 3 is used as the diffusion filter 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、レンチキュラーレン
ズ、球面・非球面レンズ、光ディスク、光カード等を作
成するに際し使用されて好適な光硬化基板を得るための
光硬化基板の製造装置及び製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photo-curing substrate manufacturing apparatus and manufacturing method for obtaining a suitable photo-curing substrate which is used in producing a lenticular lens, a spherical / aspherical lens, an optical disk, an optical card and the like. It is about.

【0002】[0002]

【従来の技術】光硬化性樹脂を用いた光硬化基板の成形
は、レンチキュラーレンズ、球面・非球面レンズ、光デ
ィスク、光カード等の分野に近年幅広く応用されてい
る。光硬化性樹脂を用いる利点は、加工が困難な複雑な
形状や情報ビットのようなサブミクロンオーダの形状が
容易に転写できること、短時間で硬化できること、材料
のバリエーションが豊富で、諸々の物理特性のものが自
由に選べるという点にある。
2. Description of the Related Art Molding of a photocurable substrate using a photocurable resin has been widely applied in recent years in the fields of lenticular lenses, spherical / aspherical lenses, optical disks, optical cards and the like. The advantage of using a photo-curable resin is that it can easily transfer complicated shapes that are difficult to process and shapes in the sub-micron order such as information bits, can be cured in a short time, has a wide variety of materials, and has various physical characteristics. There is the point that you can freely choose one.

【0003】このような光硬化性樹脂(以下、単に樹脂
と記すこともある)を成形する装置は、樹脂を注入する
金型と、樹脂を硬化させる光源があれば良く、付随する
金型の開閉機構や樹脂の注入機構などを加えても非常に
コンパクトな装置ですみ、省スペース、省エネルギーの
点からも注目されている。一般に光ディスクの成形装置
は、例えば、特開昭55−160338号公報や特開昭
57−15235号公報などに開示されている。
An apparatus for molding such a photo-curable resin (hereinafter, also simply referred to as a resin) may have a mold for injecting the resin and a light source for curing the resin. It is a very compact device even if it has an opening / closing mechanism and a resin injection mechanism, and it is attracting attention from the viewpoint of space saving and energy saving. Generally, an optical disk molding apparatus is disclosed, for example, in Japanese Patent Laid-Open Nos. 55-160338 and 57-15235.

【0004】従来のこの種の成形装置の特徴は、金型の
少なくとも一面が光透過性の材料(例えばガラス)であ
り、その面に光源からの光が直接入射するようになって
いることである。ここで、樹脂を均一に硬化させるため
に光照度を面内均一にする必要があり、金型と光源の距
離を分布が最も良くなる位置に定めたり、光源であるラ
ンプの形状を金型の形状に合わせたものを使用するなど
して対策していた。さらに、光源と金型との間に遮光部
材を配設して、光源からの直接光が金型に照射されない
ようにして、間接光のみで樹脂を硬化させたものもあ
る。
A feature of the conventional molding apparatus of this type is that at least one surface of the mold is made of a light-transmissive material (for example, glass), and light from the light source is directly incident on the surface. is there. Here, in order to uniformly cure the resin, it is necessary to make the light illuminance uniform in the surface, and the distance between the mold and the light source is set to a position where the distribution is best, or the shape of the lamp that is the light source is the shape of the mold. I was taking countermeasures such as using the one that fits to. Further, there is also one in which a resin is cured only by indirect light by disposing a light shielding member between the light source and the mold so that the mold is not irradiated with the direct light from the light source.

【0005】[0005]

【発明が解決すべき課題】上記した従来の成形装置を用
いて種々の光硬化基板を製作してみると、この光硬化基
板の肉厚がおよそ100 μm以下の薄い場合には、透明性
の優れた均一硬化した基板が得られるが、肉厚が厚くな
り、およそ1 mm以上になると基板の表面にスジ状の模
様が発生する。この模様は、光源であるランプの形状を
そのまま反映した形状となっており、棒状のランプを用
いたときには平行なスジ模様がランプの設置方向に対応
した位置に発生している。そして、この模様は肉厚が厚
くなればなる程顕著に表れる傾向にある。その理由は、
光源からの光が均一に拡散されず、すなわち、光の均一
化が図れないため、樹脂の硬化が基板内で均一に行われ
ず、その硬化の不均一さが表れてしまうからである。こ
のような模様は、光硬化基板の外観をそこなうばかりで
なく光学特性も劣化させるので、各種のレンズや光硬化
基板である光ディスクの成形等では大きな問題となって
いた。
When various photo-curing substrates are manufactured by using the above-mentioned conventional molding apparatus, when the photo-curing substrate has a thin wall thickness of about 100 μm or less, the transparency is An excellent uniformly cured substrate can be obtained, but when the wall thickness becomes thicker than approximately 1 mm, streaky patterns occur on the surface of the substrate. This pattern is a shape that directly reflects the shape of the lamp that is the light source, and when a rod-shaped lamp is used, parallel streak patterns occur at positions corresponding to the installation direction of the lamp. And this pattern tends to appear more prominently as the wall thickness increases. The reason is,
This is because the light from the light source is not uniformly diffused, that is, the light cannot be made uniform, so that the resin is not uniformly cured in the substrate, and unevenness of the curing appears. Such a pattern not only impairs the appearance of the photocurable substrate but also deteriorates the optical characteristics, and thus has been a serious problem in molding various lenses and optical discs that are the photocurable substrate.

【0006】[0006]

【課題を解決するための手段】本発明はかかる点に鑑み
なされたものであり、光硬化性樹脂を注入する金型と、
注入した樹脂を硬化させる光源とからなる光硬化基板の
製造装置であって、前記金型と前記光源との間に、拡散
フィルタを設けたことを特徴とする光硬化基板の製造装
置を提供するものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and a mold for injecting a photocurable resin,
Provided is a photocurable substrate manufacturing apparatus comprising a light source for curing the injected resin, wherein the photocurable substrate manufacturing apparatus is characterized in that a diffusion filter is provided between the mold and the light source. It is a thing.

【0007】[0007]

【作用】上記のように構成された光硬化基板の製造装置
では、光源からの光は拡散フィルタを通して照射される
ので、光の方向がランダムとなって散乱拡散し、光が均
一化して、光硬化性樹脂が注入された金型にあたる。
In the photo-curing substrate manufacturing apparatus configured as described above, since the light from the light source is applied through the diffusion filter, the directions of the light are randomized and scattered and diffused to make the light uniform and It corresponds to a mold in which a curable resin is injected.

【0008】[0008]

【実施例】本発明になる光硬化基板の製造装置の一実施
例を以下図面と共に詳述する。図1は光硬化基板の製造
装置の概略断面図である。同図において、1は反射鏡で
あり、ミラータイプのものはアルミニウム製の鏡面板を
半円状に加工したもの、またディンプルタイプのものは
ミラータイプのものに5φ程度のディンプルを多数刻印
したものである。2は光源となる紫外線ランプであり、
Aタイプは棒状紫外線ランプで金型面上の最大照度52m
W/cm、照度分布が85%のもの、またBタイプは球状
紫外線ランプで、金型面上の最大照度24mW/cm、照
度分布94%のものである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a photocurable substrate manufacturing apparatus according to the present invention will be described in detail below with reference to the drawings. FIG. 1 is a schematic cross-sectional view of a photo-curing substrate manufacturing apparatus. In the figure, 1 is a reflecting mirror, a mirror type is a semi-circular aluminum mirror plate, and a dimple type is a mirror type with a large number of 5φ dimples stamped. Is. 2 is an ultraviolet lamp as a light source,
Type A is a rod-shaped UV lamp with a maximum illuminance of 52 m on the mold surface.
W / cm, the illuminance distribution is 85%, and the B type is a spherical ultraviolet lamp with a maximum illuminance of 24 mW / cm on the mold surface and an illuminance distribution of 94%.

【0009】3は通常市販されている拡散フィルタであ
り、これは例えば厚さ3.6 mmのソーダ石灰ガラス製の
スリガラスを用いたものである。なお、4は筐体であ
る。また、本実施例においては、紫外線ランプ2と拡散
フィルタ3との間の距離を500 mm、拡散フィルタ3と
筐体4との間の距離を100 mmに設定してある。5は透
明で光学的に均質な材質の基板で、例えばソーダガラ
ス,石英ガラスなどのガラス類が用いられる。6は金属
板からなるスペーサで、本実施例では厚さ1.2 mmの光
硬化基板(以下、単にディスク基板と記すこともある)
を作成する関係上、1.2 mmの厚さのものが用いられ
る。7はその表面に所定の信号が凹凸形状として形成さ
れた、例えばニッケルスタンパである。8はこのニッケ
ルスタンパ7を補強するために、そこに裏打ちされた補
強板である。なお、本発明は、例えば直径120 mmのデ
ィスク基板を作成するためのものであるから、金型を構
成するニッケルスタンパ7,スペーサ6,基板5となる
ソーダ石灰ガラスなどは、当然それに合致した形状・寸
法に形成されているものである。また、9は後述する光
硬化性樹脂が注入される空間部、10はセンターピンで
ある。
Reference numeral 3 is a commercially available diffusion filter, which uses, for example, frosted glass made of soda-lime glass having a thickness of 3.6 mm. In addition, 4 is a housing. In this embodiment, the distance between the ultraviolet lamp 2 and the diffusion filter 3 is set to 500 mm, and the distance between the diffusion filter 3 and the housing 4 is set to 100 mm. Reference numeral 5 is a transparent and optically homogeneous substrate, and glass such as soda glass and quartz glass is used. Reference numeral 6 denotes a spacer made of a metal plate, and in this embodiment, a photo-curing substrate having a thickness of 1.2 mm (hereinafter may be simply referred to as a disk substrate).
The thickness of 1.2 mm is used for the purpose of making. Reference numeral 7 is, for example, a nickel stamper on the surface of which a predetermined signal is formed as an uneven shape. Reference numeral 8 is a reinforcing plate lined with the nickel stamper 7 to reinforce it. Since the present invention is for producing a disk substrate having a diameter of 120 mm, for example, the nickel stamper 7, the spacer 6, and the soda lime glass that will be the substrate 5 that compose the mold have shapes that naturally conform to them. -It is formed to dimensions. Further, 9 is a space portion into which a photo-curable resin described later is injected, and 10 is a center pin.

【0010】次に図1を用いて、ディスク基板を作成す
る方法につき詳細に説明する。まず、ニッケルスタンパ
7と紫外線を通す基板5とをスペーサ6を挾んで重ね、
スペーサ6によって厚さが決定される空間(この空間に
樹脂層が注入され最終的にディスク基板となる)に図示
しない光硬化性樹脂を注入する。その後、センターピン
10を挿入する。この際、光硬化性樹脂は十分脱泡し、
注入に際して泡が発生しないようにする。次に、基板5
にランプ2よりの紫外線を拡散フィルタ3を通して照射
し、前記した空間9内に注入されている光硬化性樹脂を
硬化させ、ディスク基板を作成する。そして、ニッケル
スタンパ7を樹脂層(ディスク基板)から剥離すること
により、基板5上に、表面に凹凸形状が形成された光硬
化基板となる樹脂層が形成される。なお、光硬化樹脂
は、DPHA(日本化薬株式会社製)に光重合開始剤D
arocur1173(メルク・ジャパン株式会社製)を0.
3 重量%添加したものを使用した。
Next, with reference to FIG. 1, a method for producing a disk substrate will be described in detail. First, the nickel stamper 7 and the substrate 5 that transmits ultraviolet rays are stacked with the spacer 6 in between.
A photo-curable resin (not shown) is injected into a space whose thickness is determined by the spacer 6 (a resin layer is injected into this space to finally form a disk substrate). Then, the center pin 10 is inserted. At this time, the photocurable resin is sufficiently defoamed,
Avoid bubbles during injection. Next, the substrate 5
Ultraviolet rays from the lamp 2 are radiated through the diffusion filter 3 to cure the photocurable resin injected into the space 9 to prepare a disk substrate. Then, the nickel stamper 7 is peeled off from the resin layer (disk substrate) to form a resin layer on the substrate 5, which serves as a photo-curing substrate having an uneven shape on the surface. The photo-curable resin is DPHA (manufactured by Nippon Kayaku Co., Ltd.)
arocur 1173 (Merck Japan Ltd.)
The one to which 3% by weight was added was used.

【0011】上記した装置によれば、光源である紫外線
ランプ2よりの紫外線は、反射鏡1及び拡散フィルタ3
を通して照射されるので、光の方向がランダムとなって
散乱拡散効果が一段と増し、光の均一化が図れる。した
がって、ディスク基板に強度ムラ等が発生するようなこ
とはなく、外観が良く、しかも光学特性の劣化がないデ
ィスク基板が得られる。以下種々の方法でデイスク基板
を作成し、外観を評価した結果を表1に記す。
According to the above apparatus, the ultraviolet light from the ultraviolet lamp 2 which is the light source is reflected by the reflecting mirror 1 and the diffusion filter 3.
Since the light is radiated through, the direction of the light becomes random and the scattering and diffusion effect is further increased, and the light can be made uniform. Therefore, the disc substrate is free from unevenness in strength, has a good appearance, and has no deterioration in optical characteristics. Table 1 shows the results of evaluating the appearance of the disk substrates prepared by various methods.

【0012】[0012]

【表1】 [Table 1]

【0013】表1に示されているように、拡散フィルタ
を用いない場合には、ランプの種類や反射鏡の形状を変
えても外観は殆んど変化しないが拡散フィルタを取付け
ると大幅に改善されることがわかる。
As shown in Table 1, when the diffusion filter is not used, the appearance hardly changes even if the type of the lamp or the shape of the reflecting mirror is changed, but it is greatly improved by installing the diffusion filter. I understand that it will be done.

【0014】また、デイスク基板の照射面側の平滑性を
タリステップ(テーラーアンドボブソン社製)を用いて
測定し、その平均粗さをもって評価した。従来よりも、
表面粗さが1/10に減少する効果が確認できた。なお、本
実施例では、平均粗さが約500 オングストローム以下の
成形品を良好とし、約1000オングストロームを越えたも
のを不良としている。
Further, the smoothness of the irradiated surface side of the disk substrate was measured by using Taristep (manufactured by Taylor and Bobson Co.), and the average roughness was evaluated. Than before
It was confirmed that the surface roughness was reduced to 1/10. In this example, a molded product having an average roughness of about 500 angstroms or less is regarded as good, and a product having an average roughness of more than about 1000 angstrom is regarded as defective.

【0015】また、拡散フィルタ3は、表面に細かな凹
凸がある透明な基板、または細かな気泡を内部に含有し
た透明な基板、または屈折率が異なる微小な粒子を内部
に含有した透明な基板など、光を散乱拡散させるもので
あれば良い。すなわち、表面又はその内部が微視的にみ
て光学的に不均一であることを利用し、光源からの入射
光を散乱させる効果が生じ、光が十分拡散されるもので
あれば良い。また、透明であれば、拡散により光照度が
多少減少するが、樹脂の硬化に問題が生じることもな
い。
Further, the diffusion filter 3 is a transparent substrate having fine irregularities on its surface, a transparent substrate containing fine air bubbles inside, or a transparent substrate containing fine particles having different refractive indexes therein. As long as it scatters and diffuses light. That is, it is sufficient that the surface or the inside thereof is optically non-uniform when viewed microscopically, and the effect of scattering the incident light from the light source is produced and the light is sufficiently diffused. Further, if it is transparent, the light illuminance is slightly reduced by diffusion, but there is no problem in curing the resin.

【0016】具体的な基板としてはガラス,セラミック
ス,プラスチックなどがあるが、現在一般に入手しやす
いガラスで良い。特に、上記実施例で説明した表面に凹
凸のある透明なガラス、いわゆるスリガラス入手しやす
く、効果も大きい。このように、拡散フィルタ3は光を
散乱拡散させるものであれば良いが、使用される金型,
光源,光硬化樹脂により一定の性能が要求される。そこ
で、拡散フィルタ3の性能評価について説明する。
Specific substrates include glass, ceramics, plastics, etc., but glass that is generally readily available at present may be used. In particular, the transparent glass having irregularities on the surface described in the above examples, so-called frosted glass, is easily available and has a large effect. As described above, the diffusion filter 3 may be any one as long as it scatters and diffuses light.
Certain performance is required depending on the light source and photocurable resin. Therefore, the performance evaluation of the diffusion filter 3 will be described.

【0017】図2(A)に示すように、白色板W上に太
さ1cmの黒い線Bを2本,間隔を5cmとって引き、これ
を評価図Mとする。この評価図M上に拡散フィルタ3を
おき、図2(B)に示すように、評価図から徐々に拡散
フィルタを離していき、2本の黒い線の区別(すなわち
線の間隔)が判らなくなった時の、拡散フィルターと評
価図との距離(間隔)dを測定する。黒い線が分からな
くなった時の距離が所定値(実際に、使用される金型,
光源,光硬化樹脂により決定される値)以下である拡散
フィルターを使用すれば、上述した効果が得られる。
As shown in FIG. 2A, two black lines B having a thickness of 1 cm are drawn on the white plate W at intervals of 5 cm, and this is designated as an evaluation diagram M. The diffusion filter 3 is placed on the evaluation diagram M, and the diffusion filter is gradually separated from the evaluation diagram as shown in FIG. 2B, and the distinction between the two black lines (that is, the interval between the lines) becomes unclear. Then, the distance (distance) d between the diffusion filter and the evaluation chart is measured. The distance when the black line disappears is a predetermined value (actually, the mold used,
The above-mentioned effect can be obtained by using a diffusion filter whose value is less than or equal to the value determined by the light source and the photocurable resin.

【0018】そして、上述した実施例の装置で、拡散フ
ィルタ3として、例えばソーダ石灰ガラス製スリガラス
を用いるとする。1.2 mm厚のソーダ石灰ガラス製スリ
ガラスでは、その使用枚数と黒い線が分からなくなった
時の距離との関係、及びその時の成形結果は、表2に示
す通りであった。
In the apparatus of the above-mentioned embodiment, the diffusion filter 3 is made of, for example, soda-lime glass frosted glass. Table 2 shows the relationship between the number of used soda-lime glass frosted glasses having a thickness of 1.2 mm and the distance when the black line disappeared, and the molding result at that time.

【0019】[0019]

【表2】 [Table 2]

【0020】この結果から、実施例の装置の拡散フィル
タ3としては、1枚使用すれば効果が現われ、2枚以上
使用すれば確実な効果が得られるといえる。つまり、黒
い線が分からなくなった時の距離が10数cm以下である
性能を有する拡散フィルタを使用すると効果が現われ、
10cm以下にすると良好な結果が得られるといえる。
From these results, it can be said that the effect will appear when one diffusion filter 3 is used in the apparatus of the embodiment, and a reliable effect can be obtained when two or more filters are used. In other words, the effect appears when using the diffusion filter that has the performance that the distance when the black line disappears is less than 10 cm.
It can be said that good results are obtained when the distance is 10 cm or less.

【0021】そこで、拡散フィルタとして別の基板を使
用する場合を考える。拡散フィルタ3として、例えば近
紫外線域に吸収のないメタクリル樹脂(PMMA)を用
いる。厚さ2mmのPMMA板にナンバー 400のサンド
ペーパを用い表面にスジ状のキズをつけ、フィルタとし
た。その使用枚数と黒い線が分からなくなった時の距離
との関係は表3の左欄に示すようになったので、実施例
の装置の拡散フィルタ3としては、1枚使用すれば効果
が現われ、2枚以上使用すれば十分な効果が得られると
予想される。そして、実際にディスク基板を製作して、
フィルタの枚数と成形品の表面粗さを測定した結果、表
3の右欄のような結果が得られた。
Therefore, consider the case where another substrate is used as the diffusion filter. As the diffusion filter 3, for example, methacrylic resin (PMMA) that does not absorb in the near ultraviolet range is used. Using a sandpaper of No. 400 on a PMMA plate with a thickness of 2 mm, scratches were formed on the surface to form a filter. Since the relationship between the number of sheets used and the distance when the black line is no longer understood is as shown in the left column of Table 3, as the diffusion filter 3 of the apparatus of the embodiment, the effect appears when one sheet is used. It is expected that a sufficient effect will be obtained if two or more sheets are used. Then, actually making a disk substrate,
As a result of measuring the number of filters and the surface roughness of the molded product, the results shown in the right column of Table 3 were obtained.

【0022】[0022]

【表3】 [Table 3]

【0023】表3に示す結果から明らかなように、上述
した拡散フィルタの性能評価と成形品の表面粗さとがほ
ぼ対応している。したがって、拡散フィルタを所定の幅
と間隔を有する線からなる評価図を前記拡散フィルタを
介して目視した時、評価図と拡散フィルタとの距離によ
り、拡散フィルタを容易かつ確実に評価できるといえ
る。
As is clear from the results shown in Table 3, the performance evaluation of the diffusion filter described above and the surface roughness of the molded product substantially correspond to each other. Therefore, it can be said that the diffusion filter can be easily and surely evaluated based on the distance between the evaluation diagram and the diffusion filter when the diffusion filter is viewed through the diffusion filter, the evaluation diagram including lines having a predetermined width and interval.

【0024】また、拡散フィルタを1枚のフィルタで構
成しようとすると、表面の加工が複雑となり高価なもの
となりやすい。しかし、本実施例のように、拡散フィル
タを複数枚のフィルタで構成し、所定の性能が得られる
ようにすることで、フィルタの加工が簡単となる。た
だ、フィルタの枚数が増加すると、光透過率が低下して
光量が減少するので、あまり枚数を増加させることは得
策でない。ガラスの光透過率は約90%なので、ガラス
でフィルタを構成する場合では2,3枚が適切である。
If the diffusion filter is composed of one filter, the surface processing becomes complicated and the cost tends to be high. However, as in the present embodiment, by configuring the diffusion filter with a plurality of filters so that a predetermined performance can be obtained, the processing of the filter becomes easy. However, if the number of filters increases, the light transmittance decreases and the amount of light decreases, so increasing the number of filters is not a good idea. Since the light transmittance of glass is about 90%, two or three sheets are suitable when the filter is made of glass.

【0025】[0025]

【発明の効果】本発明は、光硬化性樹脂を注入する金型
と、注入した樹脂を硬化させる光源からなる光硬化基板
の製造装置であって、金型と光源との間の空間に拡散フ
ィルタを設けたことにより、ランプからの直接入射光も
反射鏡からの反射光も関係なく散乱させるため、硬化し
た光基板表面の模様を著しく減少させ、透明性に優れた
高品質の光硬化基板を提供することができる。
INDUSTRIAL APPLICABILITY The present invention is a photocurable substrate manufacturing apparatus comprising a mold for injecting a photocurable resin and a light source for curing the injected resin, which is diffused in a space between the mold and the light source. By providing a filter, both the direct incident light from the lamp and the reflected light from the reflecting mirror are scattered regardless, so the pattern on the surface of the cured optical substrate is significantly reduced, and a high-quality photocurable substrate with excellent transparency. Can be provided.

【0026】また、本発明によれば、拡散フィルタとし
て、表面に細かな凹凸がある透明な基板、細かな気泡を
内部に含有した透明な基板、屈折率が異なる微小な粒子
を内部に含有した透明な基板を用いることができ、さら
に、拡散フィルタを所定の幅と間隔を有する線からなる
評価図を前記拡散フィルタを介して目視した場合、評価
図と拡散フィルタとの距離が一定値以下である時に目視
可能なものであることにより評価するようにしたので、
効果が得られる拡散フィルタの選択も容易である。
Further, according to the present invention, as the diffusion filter, a transparent substrate having fine irregularities on the surface, a transparent substrate containing fine air bubbles inside, and fine particles having different refractive indexes inside are contained. A transparent substrate can be used, and further, when an evaluation diagram consisting of a line having a predetermined width and spacing is viewed through the diffusion filter, the distance between the evaluation diagram and the diffusion filter is a certain value or less. At some point I tried to evaluate it by being visible, so
It is also easy to select a diffusion filter that produces an effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明になる光硬化基板の製造装置の一実施例
の概略断面図である。
FIG. 1 is a schematic sectional view of an embodiment of a photocurable substrate manufacturing apparatus according to the present invention.

【図2】本発明になる光硬化基板の製造装置に使用され
る拡散フィルタの評価方法を説明する図である。
FIG. 2 is a diagram illustrating a method of evaluating a diffusion filter used in the photocurable substrate manufacturing apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

2 光源 3 拡散フィルタ 5 基板 6 スペーサ 7 ニッケルスタンパ M 評価図 d 評価図と拡散フィルタとの距離 2 Light source 3 Diffusion filter 5 Substrate 6 Spacer 7 Nickel stamper M Evaluation chart d Distance between evaluation chart and diffusion filter

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】光硬化性樹脂を注入する金型と、注入した
樹脂を硬化させる光源とからなる光硬化基板の製造装置
であって、 前記金型と前記光源との間に、拡散フィルタを設けたこ
とを特徴とする光硬化基板の製造装置。
1. A manufacturing apparatus of a photo-curing substrate comprising a mold for injecting a photo-curable resin and a light source for curing the injected resin, wherein a diffusion filter is provided between the mold and the light source. An apparatus for manufacturing a photocurable substrate, which is provided.
【請求項2】拡散フィルタは、表面に細かな凹凸がある
透明な基板、または細かな気泡を内部に含有した透明な
基板、または屈折率が異なる微小な粒子を内部に含有し
た透明な基板であることを特徴とする請求項1記載の光
硬化基板の製造装置。
2. The diffusion filter is a transparent substrate having fine irregularities on the surface, a transparent substrate containing fine bubbles inside, or a transparent substrate containing fine particles having different refractive indexes inside. The photocurable substrate manufacturing apparatus according to claim 1, wherein:
【請求項3】拡散フィルタは、所定の幅と間隔を有する
線からなる評価図を前記拡散フィルタを介して目視した
場合、評価図と拡散フィルタとの距離が一定値以下であ
る時に目視可能なものであることを特徴とする請求項1
記載の光硬化基板の製造装置。
3. The diffusion filter is visible when an evaluation diagram made up of lines having a predetermined width and interval is visually observed through the diffusion filter, when the distance between the evaluation diagram and the diffusion filter is a certain value or less. It is a thing, It is characterized by the above-mentioned.
The manufacturing apparatus of the photocurable substrate described.
【請求項4】光硬化性樹脂を注入する金型と、注入した
樹脂を硬化させる光源とによる光硬化基板の製造方法で
あって、 散乱拡散した光を光硬化性樹脂に照射して光硬化性樹脂
を硬化させ、光硬化基板の面粗れを小さくしたことを特
徴とする光硬化基板の製造方法。
4. A method of manufacturing a photocurable substrate, comprising a mold for injecting a photocurable resin and a light source for curing the injected resin, wherein the photocurable resin is irradiated with scattered and diffused light. A method for producing a photo-curable substrate, characterized in that a surface-curing surface of the photo-curable substrate is reduced by curing a photosensitive resin.
JP15850692A 1991-05-27 1992-05-26 Production apparatus and production for photosetting substrate Pending JPH05198018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15850692A JPH05198018A (en) 1991-05-27 1992-05-26 Production apparatus and production for photosetting substrate

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP15100391 1991-05-27
JP3-151003 1991-05-27
JP15850692A JPH05198018A (en) 1991-05-27 1992-05-26 Production apparatus and production for photosetting substrate

Publications (1)

Publication Number Publication Date
JPH05198018A true JPH05198018A (en) 1993-08-06

Family

ID=26480405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15850692A Pending JPH05198018A (en) 1991-05-27 1992-05-26 Production apparatus and production for photosetting substrate

Country Status (1)

Country Link
JP (1) JPH05198018A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999024977A1 (en) * 1997-11-12 1999-05-20 First Light Technology, Inc. System and method of forming bonded storage disks with low power light assembly
US6352612B1 (en) 1998-05-19 2002-03-05 Steag Hamatech, Inc. System for forming bonded storage disks with low power light assembly
EP1818721A2 (en) * 2006-02-14 2007-08-15 Hitachi Global Storage Technologies Netherlands B.V. System, method, and apparatus for noncontact and diffuse curing exposure for making photopolymer nanoimprinting stamper
JP2008218421A (en) * 1996-09-12 2008-09-18 Mitsubishi Chemicals Corp Organic electroluminescent element and its manufacturing method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008218421A (en) * 1996-09-12 2008-09-18 Mitsubishi Chemicals Corp Organic electroluminescent element and its manufacturing method
WO1999024977A1 (en) * 1997-11-12 1999-05-20 First Light Technology, Inc. System and method of forming bonded storage disks with low power light assembly
US6352612B1 (en) 1998-05-19 2002-03-05 Steag Hamatech, Inc. System for forming bonded storage disks with low power light assembly
US6500297B1 (en) 1998-05-19 2002-12-31 Steag Hamatech, Inc. Method of forming bonded storage disks with low power light assembly
EP1818721A2 (en) * 2006-02-14 2007-08-15 Hitachi Global Storage Technologies Netherlands B.V. System, method, and apparatus for noncontact and diffuse curing exposure for making photopolymer nanoimprinting stamper
US7377765B2 (en) 2006-02-14 2008-05-27 Hitachi Global Storage Technologies System, method, and apparatus for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper
EP1818721A3 (en) * 2006-02-14 2009-12-02 Hitachi Global Storage Technologies Netherlands B.V. System, method, and apparatus for noncontact and diffuse curing exposure for making photopolymer nanoimprinting stamper
US7731889B2 (en) 2006-02-14 2010-06-08 Hitachi Global Storage Technologies Netherlands B.V. Method for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper

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