JPH0519452A - Pellicle and its mounting method - Google Patents
Pellicle and its mounting methodInfo
- Publication number
- JPH0519452A JPH0519452A JP3168577A JP16857791A JPH0519452A JP H0519452 A JPH0519452 A JP H0519452A JP 3168577 A JP3168577 A JP 3168577A JP 16857791 A JP16857791 A JP 16857791A JP H0519452 A JPH0519452 A JP H0519452A
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- reticle
- frame
- photomask
- magnetic fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 10
- 239000011553 magnetic fluid Substances 0.000 claims abstract description 10
- 238000007789 sealing Methods 0.000 claims abstract description 5
- 239000000853 adhesive Substances 0.000 claims description 13
- 230000001070 adhesive effect Effects 0.000 claims description 13
- 230000000694 effects Effects 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 7
- 239000000428 dust Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
(57)【要約】
【目的】 レチクル又はフォトマスク防塵用のペリクル
の構造とレチクル又はフォトマスクへの装着方法に関
し、防塵効果を高め、且つ着脱を容易にすることを目的
とする。
【構成】 ペリクル膜１をフレーム２の上面に張設して
なるペリクルにおいて、フレーム２の少なくとも下面2S
側を永久磁石で構成する。レチクル又はフォトマスクへ
の装着は、先ずフレーム２の下面2Sに点在させた接着手
段３でレチクル又はフォトマスクに固定し、その後フレ
ーム２の下面全周にわたり磁性流体４を注入してシール
する。
(57) [Summary] [Object] With regard to the structure of a reticle or a photomask dustproof pellicle and a method of mounting the reticle or photomask on a reticle or a photomask, it is an object to enhance the dustproof effect and facilitate the attachment / detachment. [Constitution] In a pellicle formed by stretching a pellicle film 1 on an upper surface of a frame 2, at least a lower surface 2S of the frame 2
The side is composed of a permanent magnet. For attachment to the reticle or photomask, first, the bonding means 3 scattered on the lower surface 2S of the frame 2 is used to fix the reticle or photomask, and then the magnetic fluid 4 is injected over the entire lower surface of the frame 2 for sealing.
Description
【０００１】[0001]
【産業上の利用分野】本発明は半導体装置等の製造にお
けるフォトリソグラフィ工程で使用するレチクル又はフ
ォトマスク（以下、レチクルで代表する）防塵用のペリ
クルの構造と、そのペリクルをレチクルに装着する方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reticle or photomask (hereinafter referred to as reticle) dustproof pellicle structure used in a photolithography process in the manufacture of semiconductor devices and a method for mounting the pellicle on the reticle. Regarding
【０００２】近年、半導体装置は高密度・高集積化に伴
ってパターンの微細化が進行しており、レチクル上に付
着した微小な塵埃でも転写パターンの欠陥となるように
なって来た。そのため、レチクルへの塵埃の付着を防止
する目的でレチクルにペリクルを装着することが広く行
われるようになっている。In recent years, as semiconductor devices have become finer in pattern with higher density and higher integration, even fine dust adhering to the reticle has become a defect in the transfer pattern. Therefore, pellicles have been widely mounted on a reticle for the purpose of preventing dust from adhering to the reticle.
【０００３】ペリクルは透明薄膜をフレームの片面に張
設したものであり、これをレチクルに装着すると透明薄
膜がフレームの高さの分だけレチクルのマスクパターン
の位置から離れ、露光装置のレンズの焦点から外れるた
め、透明薄膜上には比較的大きな塵埃の付着が許容され
る。The pellicle is formed by stretching a transparent thin film on one side of a frame. When this is mounted on a reticle, the transparent thin film is separated from the mask pattern position of the reticle by the height of the frame, and the focus of the lens of the exposure apparatus is increased. Therefore, a relatively large amount of dust is allowed to adhere to the transparent thin film.
【０００４】[0004]
【従来の技術】従来例を図２を参照しながら説明する。
図２は従来例の説明図であり、ペリクルをレチクルに装
着した状態を示す部分断面図である。尚、図中、図１と
同じものには同一の符号を付与した。１はペリクル膜、
12はフレーム、13は接着手段、５はレチクルである。2. Description of the Related Art A conventional example will be described with reference to FIG.
FIG. 2 is an explanatory view of a conventional example, and is a partial cross-sectional view showing a state in which a pellicle is mounted on a reticle. In the figure, the same parts as those in FIG. 1 are designated by the same reference numerals. 1 is a pellicle film,
12 is a frame, 13 is a bonding means, and 5 is a reticle.
【０００５】ペリクル膜１は例えばニトロセルローズか
らなる透明薄膜である。フレーム12は例えばアルミニウ
ムからなり、その上面にはペリクル膜１が貼着されてい
る。接着手段13はクッション性を有する基材の両面に接
着剤を付着させたものであり、その平面形状はフレーム
12のそれと略等しく、片面は予めフレーム12の下面に接
着されている。この接着手段13の付いたペリクルをレチ
クル５上に載置し、押圧することにより、ペリクルをレ
チクル５に装着する。The pellicle film 1 is a transparent thin film made of, for example, nitrocellulose. The frame 12 is made of aluminum, for example, and the pellicle film 1 is attached to the upper surface thereof. The adhering means 13 is formed by adhering adhesive on both sides of a base material having a cushioning property, and its plane shape is a frame.
Approximately the same as that of 12, one side is previously bonded to the lower surface of the frame 12. The pellicle having the adhesive means 13 is placed on the reticle 5 and pressed to mount the pellicle on the reticle 5.
【０００６】尚、図２においてはペリクルはレチクル５
の片面に装着されているが、両面に装着することが多
い。In FIG. 2, the pellicle is the reticle 5.
Although it is attached to one side of, it is often attached to both sides.
【０００７】[0007]
【発明が解決しようとする課題】ところが、上記のよう
なペリクルを上記のような方法でレチクルに装着した場
合、接着部分が必ずしも全周にわたり密着するとは限
らず、隙間から塵埃が内部に侵入することがある、ペ
リクル装着後にレチクルの欠陥（塵埃付着等）が判明し
てペリクルを除去する（引き剥がす）と、レチクル上に
接着剤が残ると共にペリクルが再使用不可能になる、と
いう問題があった。However, when the above-described pellicle is mounted on the reticle by the above-described method, the bonded portion does not always come into close contact with the reticle, and dust enters inside through the gap. Sometimes, if a reticle defect (such as dust adhesion) is found after the pellicle is mounted and the pellicle is removed (stripped off), there is a problem that the adhesive remains on the reticle and the pellicle cannot be reused. It was
【０００８】本発明はこのような問題を解決して、防塵
効果を高め、且つ着脱を容易にすることが可能なペリク
ル及びその装着方法を提供することを目的とする。It is an object of the present invention to solve the above problems and to provide a pellicle capable of enhancing the dustproof effect and facilitating attachment and detachment, and a method of attaching the pellicle.
【０００９】[0009]
【課題を解決するための手段】この目的は、本発明によ
れば、[1] ペリクル膜１をフレーム２の上面に張設して
なるペリクルにおいて、該フレーム２の少なくとも下面
2S側が永久磁石で構成されているとを特徴とするペリク
ルとし、[2] 該フレーム２をその下面2Sの一部に接する
接着手段３により該レチクル５に固定する工程と、該フ
レーム２と該レチクル５との空隙に磁性流体４を注入し
てシールする工程と、を有することを特徴とするペリク
ルの装着方法とすることで、達成される。According to the present invention, there is provided [1] a pellicle in which a pellicle film 1 is stretched on an upper surface of a frame 2, and at least a lower surface of the frame 2 is provided.
A pellicle characterized in that the 2S side is composed of a permanent magnet, [2] a step of fixing the frame 2 to the reticle 5 by an adhesive means 3 in contact with a part of the lower surface 2S thereof; And a step of injecting the magnetic fluid 4 into a space between the reticle 5 and sealing the magnetic fluid 4 to achieve a pellicle mounting method.
【００１０】[0010]
【作用】ペリクルのフレームとレチクルとの空隙に磁性
流体を注入すると磁性流体はフレームの永久磁石に吸着
保持されて空隙を埋め、確実にシールされる。When the magnetic fluid is injected into the space between the frame and the reticle of the pellicle, the magnetic fluid is adsorbed and held by the permanent magnet of the frame to fill the space and to be surely sealed.
【００１１】又、本発明では磁性流体がシールを行うか
ら、接着手段はシールの機能を必要とせず、ペリクルを
固定する機能があればよい。従って接着手段をフレーム
下面全面に付ける必要はなく、又、大きな接着力を必要
としない。その結果、ペリクルの剥離は容易となり、レ
チクル上の接着剤の残留は僅かとなり、ペリクルの再使
用も可能となる。Further, in the present invention, since the magnetic fluid seals, the adhering means does not need the function of sealing, but may have the function of fixing the pellicle. Therefore, it is not necessary to attach the adhesive means to the entire lower surface of the frame, and a large adhesive force is not required. As a result, the pellicle can be peeled off easily, the amount of adhesive remaining on the reticle becomes small, and the pellicle can be reused.
【００１２】[0012]
【実施例】本発明に基づくペリクル及びその装着方法の
実施例を図１を参照しながら説明する。図１は本発明の
実施例の説明図であり、(a) はペリクルをレチクルに装
着した状態を示す部分断面図、(b) は斜視図である。図
において、１はペリクル膜、２はフレーム、３は接着手
段、４は磁性流体、５はレチクルである。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a pellicle and its mounting method according to the present invention will be described with reference to FIG. FIG. 1 is an explanatory view of an embodiment of the present invention, (a) is a partial sectional view showing a state in which a pellicle is mounted on a reticle, and (b) is a perspective view. In the figure, 1 is a pellicle film, 2 is a frame, 3 is an adhesive means, 4 is a magnetic fluid, and 5 is a reticle.
【００１３】ペリクル膜１は例えばニトロセルローズか
らなる透明薄膜である。フレーム２は例えばアルミニウ
ムからなる上フレーム2aと永久磁石からなる下フレーム
2bを張り合わせたものである。上フレーム2aの上面には
ペリクル膜１が貼着されており、下フレーム2bの下面2S
がレチクル５との接着面となっている。この下面2Sの一
部には接着手段３が予め接着されている（数個所に点在
している）。接着手段３はクッション性を有する基材の
両面に接着剤を付着させたものの小片であり、幅はフレ
ーム２の幅より狭い。The pellicle film 1 is a transparent thin film made of, for example, nitrocellulose. The frame 2 is, for example, an upper frame 2a made of aluminum and a lower frame made of a permanent magnet.
It is a combination of 2b. The pellicle film 1 is attached to the upper surface of the upper frame 2a and the lower surface 2S of the lower frame 2b.
Is the adhesion surface with the reticle 5. Adhesive means 3 is previously adhered to a part of the lower surface 2S (spots are scattered at several places). The adhering means 3 is a small piece in which an adhesive is applied to both sides of a base material having a cushioning property, and its width is narrower than the width of the frame 2.
【００１４】この接着手段３の付いたペリクルをレチク
ル５上に載置し、押圧することにより、ペリクルをレチ
クルに固定し、その後、フレーム２とレチクル５との空
隙に磁性流体４を注入してシールすることにより、ペリ
クルの装着が完了する。尚、図２においてはペリクルは
レチクルの片面に装着されているが、両面に装着するこ
とが多い。The pellicle having the adhesive means 3 is placed on the reticle 5 and pressed to fix the pellicle to the reticle, and then the magnetic fluid 4 is injected into the gap between the frame 2 and the reticle 5. The mounting of the pellicle is completed by sealing. Although the pellicle is mounted on one side of the reticle in FIG. 2, it is often mounted on both sides.
【００１５】このようにして装着したペリクルとレチク
ルとは完全にシールされ、内部に塵埃が侵入することは
なかった。又、装着したペリクルの剥離は容易であり、
そのペリクルの再使用が可能であった。The pellicle and the reticle thus mounted were completely sealed, and no dust entered the inside. Also, it is easy to peel off the mounted pellicle,
The pellicle could be reused.
【００１６】本発明は以上の実施例に限定されることな
く、更に種々変形して実施出来る。例えば、フレーム２
を上フレーム2aと下フレーム2bとに分けず、全体を永久
磁石としても、本発明は有効である。The present invention is not limited to the above embodiments, but can be modified in various ways. For example, frame 2
The present invention is effective even if the above is not divided into the upper frame 2a and the lower frame 2b and the whole is made a permanent magnet.
【００１７】[0017]
【発明の効果】以上説明したように、本発明によれば、
防塵効果を高め、且つ着脱を容易にすることが可能なペ
リクル及びレチクルへの装着方法を提供することが出
来、半導体装置等製造におけるコスト低減に寄与する。As described above, according to the present invention,
It is possible to provide a mounting method for a pellicle and a reticle, which can enhance the dustproof effect and can be easily attached and detached, and contribute to cost reduction in manufacturing a semiconductor device or the like.
【図１】 本発明の実施例の説明図である。FIG. 1 is an explanatory diagram of an example of the present invention.
【図２】 従来例の説明図である。FIG. 2 is an explanatory diagram of a conventional example.
１ ペリクル膜 ２, 12 フレーム 2a 上フレーム 2b 下フレーム 2S 下面 ３, 13 接着手段 ４ 磁性流体 ５ レチクル 1 Pellicle membrane 2, 12 frames 2a upper frame 2b lower frame 2S bottom surface 3, 13 Adhesive means 4 magnetic fluid 5 reticle
Claims (2)
張設してなるペリクルにおいて、 該フレーム(2) の少なくとも下面(2S)側が永久磁石で構
成されているとを特徴とするペリクル。1. A pellicle having a pellicle film (1) stretched on an upper surface of a frame (2), characterized in that at least a lower surface (2S) side of the frame (2) is made of a permanent magnet. Pellicle.
張設してなるペリクルをレチクル(5) 上に装着する方法
であって、 該フレーム(2) をその下面(2S)の一部に接する接着手段
(3) により該レチクル(5) に固定する工程と、 該フレーム(2) と該レチクル(5) との空隙に磁性流体
(4) を注入してシールする工程と、を有することを特徴
とするペリクルの装着方法。2. A method for mounting on a reticle (5) a pellicle comprising a pellicle film (1) stretched on the upper surface of a frame (2), the frame (2) being mounted on the lower surface (2S) of the reticle. Adhesive means that touches a part
(3) fixing to the reticle (5) with a magnetic fluid in the gap between the frame (2) and the reticle (5).
And (4) injecting and sealing the pellicle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3168577A JPH0519452A (en) | 1991-07-10 | 1991-07-10 | Pellicle and its mounting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3168577A JPH0519452A (en) | 1991-07-10 | 1991-07-10 | Pellicle and its mounting method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0519452A true JPH0519452A (en) | 1993-01-29 |
Family
ID=15870632
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3168577A Withdrawn JPH0519452A (en) | 1991-07-10 | 1991-07-10 | Pellicle and its mounting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0519452A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5585229A (en) * | 1994-02-25 | 1996-12-17 | Fuji Photo Film Co., Ltd. | Heat treatment method of photographic polyester support |
| EP1445652A2 (en) * | 2003-01-09 | 2004-08-11 | ASML Holding N.V. | Removable pellicle frame for photolithographic reticle using magnetic force |
| KR20150119148A (en) * | 2013-03-15 | 2015-10-23 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | Pellicle film, and pellicle |
-
1991
- 1991-07-10 JP JP3168577A patent/JPH0519452A/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5585229A (en) * | 1994-02-25 | 1996-12-17 | Fuji Photo Film Co., Ltd. | Heat treatment method of photographic polyester support |
| EP1445652A2 (en) * | 2003-01-09 | 2004-08-11 | ASML Holding N.V. | Removable pellicle frame for photolithographic reticle using magnetic force |
| EP1445652A3 (en) * | 2003-01-09 | 2004-12-29 | ASML Holding N.V. | Removable pellicle frame for photolithographic reticle using magnetic force |
| SG115604A1 (en) * | 2003-01-09 | 2005-10-28 | Asml Holding Nv | Removable reticle window and support frame using magnetic force |
| KR20150119148A (en) * | 2013-03-15 | 2015-10-23 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | Pellicle film, and pellicle |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19981008 |