JPH0512033B2 - - Google Patents
Info
- Publication number
- JPH0512033B2 JPH0512033B2 JP59085789A JP8578984A JPH0512033B2 JP H0512033 B2 JPH0512033 B2 JP H0512033B2 JP 59085789 A JP59085789 A JP 59085789A JP 8578984 A JP8578984 A JP 8578984A JP H0512033 B2 JPH0512033 B2 JP H0512033B2
- Authority
- JP
- Japan
- Prior art keywords
- thermal spraying
- low
- pressure
- chamber
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007751 thermal spraying Methods 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 19
- 238000005422 blasting Methods 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 5
- 239000007921 spray Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000007750 plasma spraying Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Nozzles (AREA)
- Coating By Spraying Or Casting (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は低圧溶射方法に関するものであつ
て、特に品質の優れた溶射層を形成することので
きる低圧溶射方法に係る。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a low-pressure thermal spraying method, and particularly to a low-pressure thermal spraying method capable of forming a thermally sprayed layer of excellent quality.
(従来の技術)
近年、被処理体をチヤンバー内に配置すると共
に、このチヤンバー内を20〜50Torr程度の真空
に近い不活性ガス雰囲気に保持し、この状態でプ
ラズマ溶射を施す溶射法(LPC溶射法)が注目
されている。その理由は、この方法においては、
溶射が低圧雰囲気下で行われるために、ガンから
被処理体へと向かう溶射粒子が、その移動中に雰
囲気ガスによつて、冷却されたり酸化されたりす
るのを防止し得ると共に、またその速度の低下を
も防止することができ、その結果、溶射被覆の性
能を向上することができるためである。またこの
方法によれば騒音の発生を防止し得るという利点
もある。(Prior art) In recent years, a thermal spraying method (LPC thermal spraying) has been developed in which the object to be treated is placed in a chamber, the chamber is maintained in an inert gas atmosphere close to a vacuum of about 20 to 50 Torr, and plasma spraying is performed in this state. law) is attracting attention. The reason is that in this method,
Since thermal spraying is carried out under a low-pressure atmosphere, the thermal spray particles traveling from the gun to the workpiece can be prevented from being cooled or oxidized by atmospheric gas during their movement, and their speed can be reduced. This is because it is possible to prevent a decrease in the thermal spray coating, and as a result, the performance of the thermal spray coating can be improved. This method also has the advantage of preventing the generation of noise.
(発明が解決しようとする問題点)
ところで被処理体には、溶射を行う前にブラス
ト処理を施しておく必要があるが、上記した従来
の方法においては、溶射前に大気中でブラスト処
理を行い、処理の終了した被処理体をチヤンバー
内に搬入し、次いでチヤンバー内を低圧雰囲気と
すると共に、プラズマ溶射を施すという手順を採
用するのが普通である。したがつて従来法におい
ては、ブラスト処理の完了した清浄な被処理体の
表面が、溶射されるまでの間は再び大気にさらさ
れ、酸化されたり、酸素が付着することになる。
この結果、たとえ低圧雰囲気下で溶射を行つたと
しても、被処理体の表面が上記のように酸化され
たり酸素の付着した状態となつているので、溶射
層と被処理体との間に充分な密着性が得られない
という問題が生じている。この点は、被処理体の
材質が鋼やアルミニウムのような場合にも問題と
はなるが、特にタービンブレード(母材MM007、
溶射層ニコラリ:商品名)のように溶射層の高温
剥離強度の要求される場合に大きな問題となつて
いる。(Problem to be Solved by the Invention) By the way, it is necessary to perform blasting on the object to be treated before thermal spraying, but in the conventional method described above, blasting is not performed in the atmosphere before thermal spraying. It is common practice to carry the treated object into a chamber, create a low-pressure atmosphere in the chamber, and perform plasma spraying. Therefore, in the conventional method, the clean surface of the object to be treated, which has been subjected to blasting, is exposed to the atmosphere again until it is thermally sprayed, and is oxidized or has oxygen attached to it.
As a result, even if thermal spraying is performed in a low-pressure atmosphere, the surface of the object to be treated is oxidized or has oxygen attached to it as described above, so there is sufficient space between the thermal spray layer and the object to be treated. A problem has arisen in that good adhesion cannot be obtained. This is a problem when the material to be processed is steel or aluminum, but it is especially true for turbine blades (base material MM007,
This is a big problem when high temperature peel strength is required for the thermally sprayed layer, such as the thermally sprayed layer Nikolali (trade name).
この発明は上記に鑑みなされたもので、その目
的は、品質、特に母材との密着性の改善された溶
射層を形成することのできる低圧溶射方法を提供
することにある。 The present invention has been made in view of the above, and its object is to provide a low-pressure thermal spraying method that can form a thermal sprayed layer with improved quality, particularly improved adhesion to the base material.
(問題点を解決するための手段)
上記目的に沿うこの発明の低圧溶射方法は、減
圧されたチヤンバー内に配置した被処理体に不活
性ガスを用いてブラスト処理を行つた後、これを
大気にさらすことなく、減圧雰囲気下でこの被処
理体に溶射を行うことを特徴としている。(Means for Solving the Problems) The low-pressure thermal spraying method of the present invention, which meets the above objectives, involves blasting a workpiece placed in a depressurized chamber using an inert gas, and then blowing the workpiece into the atmosphere. The process is characterized in that the thermal spraying is carried out on the object to be treated under a reduced pressure atmosphere without exposing it to the atmosphere.
(作用)
上記方法によれば、従来のように低圧溶射前に
被処理体表面に酸化膜が形成されたり、酸素が付
着することがなく、清浄な表面に溶射層を形成す
ることが可能となり、溶射層の品質、特に剥離強
度を改善することが可能となる。(Function) According to the above method, an oxide film is not formed on the surface of the object to be treated before low-pressure thermal spraying, and oxygen does not adhere to the surface of the object, unlike conventional methods, and it is possible to form a thermal spray layer on a clean surface. , it becomes possible to improve the quality of the sprayed layer, especially the peel strength.
(実施例)
次ぎにこの発明の低圧溶射方法の具体的な実施
例につき、図面を参照しつつ詳細に説明する。(Example) Next, specific examples of the low-pressure thermal spraying method of the present invention will be described in detail with reference to the drawings.
第1図において、1は真空チヤンバー、2は排
気装置をそれぞれ示しており、この排気装置2に
よつて真空チヤンバー1内を所定の真空度になる
まで排気し得るようなされている。上記真空チヤ
ンバー1内には、被加工体Aが配置されている
が、この被加工体Aは上記チヤンバー1内におい
て、図示しない駆動源によつて必要な方向への駆
動、例えば図の場合には上下方向駆動及び回転駆
動し得るようなされている。また上記チヤンバー
1の一方の側壁には横向きにプラズマ溶射ガン3
が取着されているが、この溶射ガン3によつて被
加工体Aに溶射を施す訳である。なお、上記プラ
ズマ溶射ガン3には、電源及び粉末供給源4が接
続されている。そしてさらに上記チヤンバー1の
側壁の溶射ガン3よりも下方の位置には、ブラス
トガン5が取着されており、このブラストガン5
にブラスト材供給源6が接続されている。この場
合、ブラスト材としては種々のものを用いること
ができるが、具体的にはスチールボール、スチー
ルチツプ、ガラスビーズ、セラミツクス系のブラ
スト材等を挙げることができる。また上記溶射ガ
ン3とブラストガン5にはそれぞれ、アルゴン等
の不活性ガス供給源7が接続されており、不活性
ガスを、必要に応じて溶射ガン3とブラストガン
5とに切換供給し得るようなされている。 In FIG. 1, reference numeral 1 indicates a vacuum chamber, and reference numeral 2 indicates an evacuation device, which allows the inside of the vacuum chamber 1 to be evacuated to a predetermined degree of vacuum. A workpiece A is disposed in the vacuum chamber 1, and the workpiece A is driven within the chamber 1 in a necessary direction by a drive source (not shown), for example, in the case shown in the figure. is designed to be able to be driven vertically and rotationally. Also, on one side wall of the chamber 1, a plasma spray gun 3 is installed horizontally.
This thermal spray gun 3 is used to spray the workpiece A. Note that the plasma spray gun 3 is connected to a power source and a powder supply source 4. Further, a blast gun 5 is attached to the side wall of the chamber 1 at a position below the thermal spray gun 3.
A blasting material supply source 6 is connected to. In this case, various blasting materials can be used, and specific examples include steel balls, steel chips, glass beads, ceramic blasting materials, and the like. Further, an inert gas supply source 7 such as argon is connected to the thermal spray gun 3 and the blast gun 5, respectively, and the inert gas can be switched and supplied to the thermal spray gun 3 and the blast gun 5 as necessary. It's been like that.
次ぎに上記した低圧溶射装置における被処理体
Aの処理手順について説明する。まず被処理体A
をチヤンバー1内に挿入すると共に、該チヤンバ
ー1内を所定の真空度になるまで減圧する。次い
でブラストガン5を作動させ、一方被処理体Aを
駆動することによつて、被処理体Aの表面にブラ
スト処理を行う。このブラスト処理が終了する
と、次いで溶射ガン3を作動させ、また被処理体
Aを駆動することによつて被処理体Aの表面に溶
射層を形成し、この溶射処理が終了するとチヤン
バー1内を大気圧に戻して被処理体Aをチヤンバ
ー1から取り出して一連の処理を完了する。 Next, the processing procedure for the object A to be processed in the above-described low-pressure thermal spraying apparatus will be explained. First, the object to be processed A
is inserted into the chamber 1, and the pressure inside the chamber 1 is reduced to a predetermined degree of vacuum. Next, the blast gun 5 is activated and the object A to be processed is driven, thereby performing blasting on the surface of the object A. When this blasting process is completed, the thermal spray gun 3 is then activated and the object A is driven to form a thermal spray layer on the surface of the object A. When this thermal spraying process is completed, the interior of the chamber 1 is The pressure is returned to atmospheric pressure, the object to be processed A is taken out from the chamber 1, and a series of treatments is completed.
上記においては、被処理体Aは、低圧のチヤン
バー1内において、酸素等の有害なガスを含まな
い不活性雰囲気下でブラスト処理され、次いでそ
の表面を大気にさらすことなく、連続的に低圧溶
射を行うことが可能となる。そのため従来のよう
に汚染された被処理体Aの表面にではなく、清浄
な表面に溶射層を形成することが可能となり、そ
の結果、溶射層の品質、特に母材と溶射被膜との
密着性を改善することが可能となる。 In the above, the object to be treated A is blasted in a low-pressure chamber 1 in an inert atmosphere that does not contain harmful gases such as oxygen, and then continuously subjected to low-pressure thermal spraying without exposing its surface to the atmosphere. It becomes possible to do this. Therefore, it is possible to form a sprayed layer on a clean surface rather than on the contaminated surface of object A as in the past, and as a result, the quality of the sprayed layer, especially the adhesion between the base material and the sprayed coating, is improved. It becomes possible to improve.
第2図には低圧溶射装置の変更例を示すが、こ
れはブラストガン5と溶射ガン3とが一体的に形
成された形式の、すなわちブラスト機能を有する
溶射ガン8を用いた装置例である。この場合、他
の部分は上記と略同様な構造であり、同一の部分
は同一の符号で示してある。 FIG. 2 shows a modified example of the low-pressure thermal spraying device, and this is an example of a device in which the blast gun 5 and the thermal spray gun 3 are integrally formed, that is, a thermal spray gun 8 having a blasting function is used. . In this case, the other parts have substantially the same structure as above, and the same parts are indicated by the same reference numerals.
この装置においても上記装置と同様な一連の処
理が可能であり、品質の優れた溶射被膜を形成す
ることが可能である。 This apparatus can also perform a series of treatments similar to those of the above apparatus, and can form a thermally sprayed coating of excellent quality.
以上にこの発明の低圧溶射方法の実施例の説明
をしたが、この発明の低圧溶射方法は上記実施例
に限定されるものではなく、種々変更して実施す
ることが可能である。例えば上記においては、プ
ラズマ溶射法を用いた例を示しているが、ガス溶
射等の他の溶射法を採用することが可能である。 Although the embodiments of the low-pressure thermal spraying method of the present invention have been described above, the low-pressure thermal spraying method of the present invention is not limited to the above embodiments, and can be implemented with various modifications. For example, although the above example uses plasma spraying, other spraying methods such as gas spraying may be used.
(発明の効果)
この発明の低圧溶射方法は上記のように構成さ
れたものであり、したがつてこの発明の低圧溶射
方法によれば、品質、特に母材との密着性が改善
され、充分な剥離強度を有する溶射被膜を形成す
ることが可能となる。(Effects of the Invention) The low-pressure thermal spraying method of the present invention is configured as described above. Therefore, according to the low-pressure thermal spraying method of the present invention, the quality, especially the adhesion to the base material, is improved and the It becomes possible to form a sprayed coating with a high peel strength.
第1図はこの発明方法を実施するのに使用する
低圧溶射装置の一実施例の説明図、第2図はその
変更例の説明図である。
1……チヤンバー、3,8……溶射ガン、5…
…ブラストガン、A……被処理体。
FIG. 1 is an explanatory diagram of an embodiment of a low-pressure thermal spraying apparatus used to carry out the method of the present invention, and FIG. 2 is an explanatory diagram of a modified example thereof. 1...Chamber, 3, 8...Thermal spray gun, 5...
...Blast gun, A...Object to be processed.
Claims (1)
に不活性ガスを用いてブラスト処理を行つた後、
これを大気にさらすことなく、減圧雰囲気下でこ
の被処理体に溶射を行うことを特徴とする低圧溶
射方法。1 After performing blasting using an inert gas on the object to be treated placed in a reduced pressure chamber,
A low-pressure thermal spraying method characterized in that thermal spraying is performed on the object to be treated in a reduced pressure atmosphere without exposing it to the atmosphere.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59085789A JPS60227856A (en) | 1984-04-27 | 1984-04-27 | Low-pressure thermal spray device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59085789A JPS60227856A (en) | 1984-04-27 | 1984-04-27 | Low-pressure thermal spray device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60227856A JPS60227856A (en) | 1985-11-13 |
JPH0512033B2 true JPH0512033B2 (en) | 1993-02-17 |
Family
ID=13868652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59085789A Granted JPS60227856A (en) | 1984-04-27 | 1984-04-27 | Low-pressure thermal spray device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60227856A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0418299A1 (en) * | 1988-06-06 | 1991-03-27 | Osprey Metals Limited | Spray deposition |
JP4649126B2 (en) * | 2004-06-11 | 2011-03-09 | 学校法人 中央大学 | Thermal spraying method for forming thermal spray coating with excellent adhesion |
CA2663036C (en) * | 2006-09-11 | 2016-06-21 | Enbio Limited | A method of simultaneously abrasively blasting and doping surfaces |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58116066U (en) * | 1982-02-01 | 1983-08-08 | 三菱重工業株式会社 | Thermal spray equipment |
-
1984
- 1984-04-27 JP JP59085789A patent/JPS60227856A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60227856A (en) | 1985-11-13 |
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