JPH0490543A - Photosensitive material processor and processing method - Google Patents

Abstract

PURPOSE:To contrive the simplification and the miniaturization of this processor and to improve the processing efficiency by disposing a heating means heating a processing solution in a part of the processing room through which a photosensitive material passes. CONSTITUTION:The processor is constituted such that in a processing tank a continuous processing passage having plural processing rooms 6A-6E connected on a narrow width passage successively is provided and while a water washing solution is supplied into the continuous processing passage, the water washing solution is filled into the continuous processing passage, and a silver halide photosensitive material is treated during passing through each of processing rooms successively. In a part of the processing from where the silver halide photosensitive material passes through, the heater 41 heating the processing solution in the processing room is disposed. With the heater 41, so that the average temp. of the water washing solution in the processing room reaches 22-42 deg.C, the washing processing is conducted. Like this, the heating means is only disposed in the processing room to be a part, so that excessive pipings, heaters, etc., are unnecessary and the constitution of the processor becomes simple and the processor in miniaturized. Here the the processing room providing the heating means is preferably the latter half of the processing room and the heat efficiency is improved.

Description

[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a photosensitive material processing apparatus and processing method for processing a silver halide photosensitive material (hereinafter sometimes abbreviated as photosensitive material or photosensitive material) after exposure. Regarding.

<Prior art> Black and white photosensitive materials are processed through steps such as black and white development, fixing, and water washing after exposure, while color photosensitive materials are processed through steps such as color development and water washing after exposure.
It is processed through processes such as desilvering, water washing, and stabilization.

Black and white developer for black and white development, fixer for fixing, color developer for color development, bleach, bleach-fix, fixer for desilvering, tap water or ion exchange water for washing, A stable night is used for the stabilization process, respectively.

The temperature of each processing solution is usually adjusted to 30 to 40°C, and the photosensitive material is immersed in these processing solutions to be processed.

Such processing is usually performed by a processing device such as an automatic processor.

In such cases, in recent years there has been a demand for environmental conservation and resource saving, and it is desired to reduce the amount of each processing liquid used.

On the other hand, with the development of small-scale processing systems called minilabs, photosensitive materials are now being processed at stores such as photo shops, and there is a desire for smaller equipment.

In view of the above-mentioned circumstances, the present applicant has previously developed a system that includes ``a plurality of cleaning chambers formed of block-shaped members and sequentially connected by narrow passages, and a photosensitive material passing through each of the cleaning chambers sequentially. has proposed a photosensitive material processing apparatus J characterized by having a conveying means for conveying (Japanese Patent Application No. 1-27034).

In addition, in such a photosensitive material processing apparatus, an apparatus has been proposed which is applied to processes other than washing (washing) such as development and desilvering (Japanese Patent Application No. 1-90422).

Furthermore, the applicant has proposed a "photosensitive material processing apparatus in which a processing tank is removably loaded with a rack having a plurality of processing chambers connected by passages and a conveyance means for sequentially passing the photosensitive material through each processing chamber." a first chamber including a processing chamber through which the photosensitive material first passes in the processing tank;
A partition member is installed on the rack side to partition the area from the second area including the processing chamber through which the photosensitive material passes last, and an end of the partition member engages with the inner surface of the processing tank to separate the first and second areas. 2
They have also proposed a photosensitive material processing apparatus characterized in that it is configured to substantially block the flow of processing liquid between regions (Japanese Patent Application No. 1-248930).

These devices have the advantage that the apparatus can be made smaller and the processing efficiency is improved, so that the amount of processing liquid used can be reduced.

In this way, processing efficiency is improved because each processing chamber is connected by a narrow passage, so there is almost no mixing of processing liquids between each processing chamber, and each processing This is because the concentration ratio of the liquid composition of the processing liquid in the room is maintained.

For example, in the case of washing water, washing water (washing water) is used between each processing room.
The degree of contamination of the washing water changes according to the direction in which it is supplied, and by transporting the photosensitive material in the opposite direction to the direction in which the washing water is supplied, the photosensitive material is sequentially treated with clean washing water, improving washing efficiency. do.

Furthermore, in order to further improve processing efficiency, the present applicant has developed a system in which the silver halide photosensitive material is A photosensitive material processing apparatus configured to carry out processing by contacting a processing liquid filled in each processing chamber while sequentially passing through each processing chamber, wherein at least one pair of photosensitive material is provided in each narrow passageway. A photosensitive material processing apparatus characterized in that the blades described above are installed so that the tips of the blades are in contact with each other when the silver halide photosensitive material is not passing through.'' -155667).

In this case, since the blade has a large effect of blocking the liquid flow, the flow of the processing liquid between each processing chamber is blocked, and the effect of maintaining the concentration ratio of the processing liquid composition in each processing chamber is It has been confirmed that the processing efficiency is significantly improved compared to the conventional method.

For example, when applied to water washing treatment, the effect of significantly improving the washing efficiency can be obtained.

However, in processing equipment of any configuration, heating means are usually installed in each processing chamber, which contributes to complicating the equipment and works against miniaturization of the equipment. It was supposed to be done.

In addition, when washing with water, the temperature of the washing water in each processing chamber is kept the same, and it has been found that with this method, the film quality of the sensitive material is not sufficient after washing, which tends to result in poor drying. ing.

<Problems to be Solved by the Invention> The first objective of the present invention is to provide a photosensitive material processing apparatus and processing method that can simplify and downsize the apparatus, and the second objective is to provide a photosensitive material processing apparatus and processing method that can simplify and downsize the apparatus. In addition to the first objective, it is possible to improve the processing efficiency in the processing step immediately before the drying step, and the film quality of the photosensitive material is improved, so that the drying can be carried out more efficiently. The purpose is to provide a processing method.

Means for Solving the Problems> Such objects are achieved by the following inventions (1) to (4).

(1) A continuous processing path having a plurality of processing chambers sequentially connected by narrow passages is provided in the processing tank, and while the washing liquid is supplied to the continuous processing path, the washing liquid is supplied to the continuous processing path. A photosensitive material processing apparatus is configured such that the silver halide photosensitive material is processed while sequentially passing through each of the processing chambers, wherein some of the processing chambers through which the silver halide photosensitive material passes ,
How to heat the processing liquid in this processing chamber? 1. A photosensitive material processing device characterized by being equipped with easy means.

(2) The above (1) in which some of the processing chambers are final processing chambers.
The photosensitive material processing apparatus described in .

(3) At least one or more pairs of blades are installed in each of the narrow passages so that the tips of the blades are in contact with each other when the silver halide photosensitive material is not passing through.
The photosensitive material processing apparatus according to 1) or (2).

(4) After the exposed silver halide photosensitive material is at least developed and processed to have fixing ability, a plurality of processes are sequentially connected by a narrow passage when performing a water washing process immediately before the drying process. A method of washing the silver halide photosensitive material by sequentially passing through each of the processing chambers by filling the continuous processing path with the washing liquid while supplying the washing liquid to a continuous processing path having a chamber, the method comprising: , the difference in liquid temperature between the washing liquid in the first processing chamber through which the silver halide photosensitive material first passes and the washing liquid in the final processing chamber through which it passes last is 0.5 to
A processing method characterized in that the silver halide photosensitive material is washed with water by heating the washing liquid in the final processing chamber to a temperature of 60°C.

<Function> In the present invention, a plurality of processing chambers are sequentially connected by a narrow passage, and a water washing process (including a stabilization process) immediately before the drying process is performed in this continuous processing path.

In this case, a heating means is provided in some of the processing chambers through which the sensitive material passes, and the average temperature of the washing liquid in each processing chamber is 22 to 42°C.
Wash with water so that the

In this way, since it is only necessary to install the heating means in some of the processing chambers, extra piping, heaters, etc. are unnecessary, and the configuration of the apparatus can be simplified and the apparatus can be made smaller.

At this time, it is preferable that the processing chamber provided with the heating means is a latter half processing chamber.

The reason is that the washing liquid is supplied so that it flows in the opposite direction to the direction of movement of the photosensitive material (countercurrent, counterflow, counterflow), so when the latter half of the processing chamber is heated, the first half of the processing chamber is also gradually heated.
This is because it becomes possible to heat efficiently.

Further, from the viewpoint of ease of installing the heating means, it is convenient to use the lowest processing chamber, and from the viewpoint of heating efficiency, it is preferable to provide the heating means in the final processing chamber.

When installing in the final processing chamber, the temperature of the washing liquid in the final processing chamber should be 2 to 40°C higher than the temperature of the washing liquid in the first processing chamber.
Preferably, the water washing treatment can be carried out at a temperature of 5 to 20°C.

Further, in this case, a temperature gradient can be formed in the washing liquid between the respective processing chambers from the final processing chamber to the first processing chamber.

In particular, when the temperature of the washing liquid is set to the above temperature difference between the first processing chamber and the final processing chamber, the film quality of the sensitive material is improved.
The drying efficiency in the next step, the drying step, is improved.

Furthermore, instead of providing a heater or the like in the final processing chamber, the water fc liquid to be replenished may be heated and replenished.

In this way, it is substantially unnecessary to provide a heater or the like in the device, and the device can be manufactured easily.

On the other hand, by applying the continuous processing path, at the same time, the concentration ratio of the liquid composition of the washing liquid is maintained between each processing chamber according to the supply direction of the washing liquid, and the processing efficiency of washing is improved.

The effect of maintaining the temperature difference of the washing liquid between the processing chambers and the concentration ratio of the liquid composition as described above is achieved by installing at least one pair of blades in a narrow passage so that the tips of the blades touch each other when the sensitive material does not pass through. Further improvement can be achieved by installing them in such a way that they are in contact with each other.

Therefore, in the present invention, the water washing process and the drying process can be performed consistently and efficiently, and the process can be speeded up.

Specific composition> Hereinafter, a specific configuration of the present invention will be explained in detail.

1 to 3 show an example of the configuration of a photosensitive material processing apparatus of the present invention that performs a water washing process immediately before the drying process.

Moreover, this product implements the treatment method of the present invention.

The washing process in the present invention includes a process having a washing ability using washing water, a rinsing liquid, etc. as a washing liquid, and a process having a stabilizing ability using a stabilizing liquid as a washing liquid.

The illustrated photosensitive material processing apparatus uses washing water as a washing liquid, and this will be described as a representative example.

In this case, FIG. 1 is a cross-sectional side view of the photosensitive material processing apparatus,
Figure 2 is a sectional view taken along the line ■-■ in Figure 1, and Figure 3 is
FIG. 2 is a sectional view taken along line mm in FIG. 1; As shown in these figures, the photosensitive material processing apparatus 1 of the present invention has a vertically long processing tank 2 having a predetermined volume. A rack 3 is removably loaded into the processing tank 2. This rack 3 has side plates 31 and 32, and several block-shaped members (hereinafter referred to as block bodies) 4 are installed between these side plates.

These block bodies 4 are made of, for example, polyethylene, polypropylene, polyphenylene oxide (PPO), A
It is made of hard materials such as plastics such as BS resin, phenol resin, polyester resin, and polyurethane resin, ceramics such as alumina, or various metals such as stainless steel and titanium. In particular, polypropylene has excellent moldability, is lightweight, and has sufficient strength.
Preferably, it is made of plastic such as PPO or ABS resin.

In the illustrated example, the block body 4 is a solid member, but it is also a hollow member (manufactured by blow molding, for example).
It may also be configured as

Such a block body 4 provides five processing chambers 6A, 6B, and 6C1, which are spaces for washing the photosensitive material S.
6D and 6E are formed.

Each of these processing chambers 6A to 6E is filled with washing water W.

In the illustrated configuration, the volume per processing chamber is 20~
It may be about 3000mffi.

In addition, the processing chambers 6A and 6B, 6B and 60.
Narrow passages 71, 72, 73 and 74 are formed between 6C and 6D and between 6D and 6E to connect both processing chambers.

Furthermore, similar passages 75 and 76 are formed in the upper portions of the processing chambers 6A and 6E for carrying in and carrying out the photosensitive material S, respectively. The width of these passages 71 to 76 (
The effective slit width is preferably about 0.5 to 5 mm, which is about 5 to 40 times the thickness of the photosensitive material S.

With such a width, the photosensitive material S can be transported without any trouble.

In addition, in the illustrated configuration, the length of the passage between the processing chambers is 1
The length is preferably about 0 to 200 mm, preferably about 20 to 60 mm.

In this way, the processing chambers 6A to 6E and the passages 71 to 76 form a continuous processing path.

A pair of blades 15 is installed in each of the passages 71 to 74, as shown.

The pair of blades 15 are attached to the block body 4 so that their tips are in close contact with each other when the photosensitive material S is not passing through.

The structure is such that when the photosensitive material S passes through, the tip portion is pushed out by the entry of the photosensitive material S.

FIG. 4(a) shows an enlarged view of the processing path 71 portion in FIG. 1.

As shown in FIG. 4(a), the blade 15 is composed of a base portion attached to the block body 4 and a tip portion whose thickness gradually decreases toward the tip, and the two blades are used in combination. Further, the blade 15 is shown in FIG.
), the base portion and the tip portion may have the same thickness.

At this time, the average inclination angle of the tip of the blade 15 with respect to the surface of the photosensitive material S is generally preferably about 30 to 60 degrees, particularly preferably about 30 to 45 degrees.

In addition, the entire length of the blade 15 including the base part, which is the attachment part of the block body 4, is the effective slit width (W) of the passage.
The length may be longer than this length, but it is generally preferable to set it to 10 to 50 mm, which is 2 to 20 times this length, and particularly preferably 3 to 50 mm.
It is preferable to set it to 15 to 25 mm, which is ~10 times.

It is preferable that the overlap between the tips of the pair of blades 15 facing each other when the photosensitive material does not pass through is about 1 to 10 mm, particularly about 2 to 5 mm.

In addition, the thickness should be at least 17,100 times the length of the blade 15 or at least 0.5 mm (
In general, it may be O,'7 to 2 mm, particularly 1 to 1.5 mm.

By setting such conditions, it is possible to ensure close contact between the tips of the blades 15 when the photosensitive material S is not passing through, and to effectively block the flow of the washing water W.
Further, the circulation of the washing water W when the photosensitive material S passes through can be made small (only a small amount exists).

The material of the blade 15 is 1, for example, natural rubber, chloroprene rubber, nitrile rubber, butyl rubber, fluororubber, inbrene rubber, butadiene rubber, styrene-butadiene rubber,
Elastic materials such as various rubbers such as ethylene propylene rubber and silicone rubber, and soft plastics such as soft polyvinyl chloride, polyethylene, polypropylene, ionomer resins, fluorine resins, and silicone resins, as long as they do not adversely affect the washing water W. Although there are no particular limitations, silicone rubber is particularly preferred.

As shown in FIGS. 1 and 2, processing chambers 6A, 6B,
One pair of conveyance rollers 8 is installed near the center of each of 6D and 6E, and three pairs of conveyance rollers 8 are installed in the processing chamber 6C. Furthermore, a pair of conveying rollers 8 are installed near the photosensitive material populations in the passages 7 and 5 and near the photosensitive material outlet in the passage 76, respectively.

Each of these conveyance rollers 8 is connected to the side plate 3 at its rotating shaft 81.
1.32, both of the pair of rollers are driven to rotate, and the photosensitive material S is conveyed by sandwiching it between the rollers.

As shown in FIG. 2, the drive mechanism for the conveyance rollers 8 includes a bevel gear 83 fixed at a predetermined location on a main shaft 82 extending vertically in the figure, and a bevel gear 83 fixed at one end of the rotating shaft 81 of each conveyance roller 8. When the bevel gear 84 is engaged with the bevel gear 84 and the main shaft 82 is rotated in a predetermined direction by the operation of a drive source (not shown) such as a motor, one of the conveying rollers 8 of the pair of rollers is rotated. There is. Then, each conveyance roller 8
A gear 85 is fixed to the other end of the rotating shaft 81, and the rotation of one roller 8 of the roller pair is transmitted to the other roller 8 by meshing with this gear 85.

The constituent material of each conveyance roller 8 is preferably one having durability and chemical resistance against washing water W, such as various rubbers such as neorene and EPT rubber, elastomers such as Sunbrain, Thermolan, Hytrel, etc. Hard vinyl chloride, polypropylene, polyethylene, ABS resin,
ppo, nylon, polyacetal (POM), phenolic resin, polyphenylene, sulfide (PPS), polyether sulfone (PES).

Polyetheretherketone (PEEK), various resins such as Teflon, ceramics such as alumina, stainless steel,
Examples include metals having corrosion resistance such as titanium and Hastelloy, or a combination thereof.

A guide 9 for guiding the photosensitive material S is installed between the conveying roller 8 and the passages 71 to 74 in the processing chambers 6A, 6B, 6D, and 6E.

The guides 9 are composed of a pair of plate-shaped members, and are placed facing each other with a distance between them through which the photosensitive material S passes.

Further, a reversing guide 10 is installed between the conveying rollers 8 in the processing chamber 6C, which is curved in an arc shape and changes the direction of the photosensitive material S along this curved portion.

These guides 9 and 10 are made of molded plastic or metal plates, for example.

Further, it is preferable that the guide 9.1o has substantially uniform openings (not shown) passing through the guide. This allows the washing water W to flow and promotes circulation, thereby improving the washing efficiency.

The guides 9 and 10, the conveyance rollers 8, and their drive system constitute means for conveying the photosensitive material S.

Among the processing chambers 6A to 6E, a final processing chamber 6E through which the photosensitive material S passes last is provided with a heater 41 serving as a heating means.

The heater 41 circulates the washing water W in the processing chamber 6E through the circulation pump 4.
Circulation configured to take out and put back by 3
It is installed in the middle of the M45 pipeline. Then, the washing water W introduced into the circulation path 45 is heated so that the temperature of the washing water W in the processing chamber 6E is 30 to 70°C, preferably 38 to 55°C.

Further, a temperature sensor 47 is installed in the processing chamber 6E to detect the temperature of the washing water W in the room.

The heater 41 and the temperature sensor 47 are each controlled by a control means 50.
The temperature detected by the temperature sensor 47 is input to the control means 50 via an A/D converter or the like, and the control means 50 turns the heater 41 ON10 F F on the basis of these detected temperatures. The structure is such that the amount of heat generated is controlled.

Control at this time is, for example, by determining a set temperature of the flushing water W in the processing chamber 6E, using this as a reference, operating the heater 41 when the water temperature drops below this, and operating the heater 41 when the set temperature is reached. You can do something like stop it.

Thereby, the temperature of the washing water W in the processing chamber 6E can be controlled with an accuracy of ±1°C.

Above the processing chamber 6E, one end is open and the other end is a passage 76.
A liquid supply path 11 communicating with the block body 4 is formed through the block body 4 . Further, above the processing chamber 6A, a drain passage 12 is formed passing through the block body 4 and having one end open and the other end communicating with the passage 75.

On the other hand, the processing tank 2 is provided with a liquid supply pipe 13 and a drain pipe 14 that penetrate the side wall thereof and are open to the inner surface of the processing tank. Then, with the rack 3 loaded in the processing tank 2, the liquid supply path 11 and the liquid supply pipe 13, and the liquid drain path 12 and the liquid drain pipe 14 are connected, respectively.

The liquid supply pipe 13 is for supplying (replenishing) the washing water W, and the liquid drain pipe 14 is for discharging the overflow liquid OF of the washing water W that has been exhausted after processing due to overflow, etc. be.

A plate-shaped partition member 17 is installed in the rack 3 .

As shown in FIG. 5, this partition member 7 partitions a first region 18 indicated by diagonal lines on the left side of the figure and a second region 19 indicated by crossed diagonal lines on the right side of the figure. This is to block distribution.

The first region 18 is a processing chamber 6 through which the photosensitive material S first passes.
This area includes A, and in the illustrated example, also includes process 6B, which is passed through second.

The second region 19 is the processing chamber 6 through which the photosensitive material S passes last.
In the example shown in FIG. 15, it also includes the process 6D that is passed through second to last.

As shown in FIG. 2, both ends 171.1 of the partition member 17
72 is formed with a taper (width gradually decreases toward the bottom in the figure), while 21 on both side walls of the processing tank 2 corresponding to this taper is formed.
．． 22 is also tapered at the same angle. As a result, when the rack 3 is inserted into the processing tank 2, the ends 171, 172 of the partition member 17 engage with the inner surfaces of the side walls 21, 22 of the processing tank 2, and the first area 18 and the second area 19 are separated. compartmentalize.

At this time, the engaging portion comes into close contact with the rack 3 due to its own weight, and substantially blocks the flow of the washing water W.

Note that if a sealing member such as a gasket made of an elastic material is installed on this engaging portion, for example, the end portions 171 and 172,
This is preferable because the blocking performance of the washing water W is further improved.

The taper angles of the end portions 171, 172 of the partition member 17 and the side walls 21, 22 of the processing tank 2 are not particularly limited, but are preferably about 2 to 10 degrees with respect to the vertical direction.

Note that the same material as the block body 4 can be used for the partition member 17, and the partition member 17 and each block body 4 and side plates 31 and 32 may be made by joining different members. It may be formed integrally.

Next, the usage and operation of the photosensitive material processing apparatus 1 having the above configuration will be explained.

When starting the processing of the photosensitive material S, the washing water W is supplied from the liquid supply port 13, and the processing chambers 6A to 6E and the narrow passages 71 to 74 are filled with the washing water W.

At this time, as described above, since the blade 15 is configured to block the flow of the washing water W when the photosensitive material S is not passing through, a sheet-like material is conveyed in place of the photosensitive material S when the washing water W is supplied. It is preferable to carry out the supply smoothly.

Further, each of the processing chambers 6A to 6E may be provided with a liquid supply port and filled with the washing water W.

The temperature of the washing water W filled at this time is about 15 to 70°C.

Then, the washing water W in the final processing chamber 6E is heated by the heater 41 installed in the circulation path 45, and as described above,
The temperature is 30 to 70°C, preferably 38 to 55°C.

In this case, before processing the photosensitive material S, the blade 1
5 has a large blocking effect on the washing water W, and there is almost no circulation of the washing water W between the processing chambers, but the washing water W in the final processing chamber 6E reaches the above-mentioned predetermined temperature (T"C) equilibrium state. When this happens, the temperature of each processing chamber will be as follows.

Processing chamber temperature ("C) GE T 6D T-(0,2~4) 6CT-(0,4~8) 6B T-(0,5~12) SA T-(0,6~16) Above When the temperature of the washing water W in the final processing chamber 6E reaches an equilibrium state, the photosensitive material S is carried into the washing water W in the passage 75 above the processing chamber 6A, and the washing process is started.

At the same time that the process is started in this manner, the supply (replenishment) of the washing water W from the liquid supply pipe 13 is started.

As mentioned above, at the same time as the processing of the photosensitive material S starts, the washing water W is
The reason for starting the replenishment is that the blade 15 has a great blocking effect on the washing water W, and the washing water W does not substantially flow until the photosensitive material S enters the blade 15.

Therefore, strictly speaking, the replenished washing water W does not flow until the leading edge of the photosensitive material S reaches the blade 15 installed in the passage 74 below the final processing chamber 6E.
As will be described later, since the amount of replenishing water W is small, it will not flow back from the liquid supply pipe 13 (the amount can be accommodated by the gap in the passage 76, and there will be no problem).

However, in some cases, the tip of the photosensitive material S may be connected to the passage 74.
It is also possible to perform replenishment when the blade 15 is reached.

During processing, this replenishment continues and the overflow fluid OF+ is drained from the drain pipe 14.

Also, the washing water W in the final processing chamber 6E is heated by the heater 41 during processing. The temperature is controlled to the predetermined temperature by the temperature sensor 47 and the control means 50.

At this time, the temperature of the washing water W does not vary widely due to replenishment, since the amount of replenishment of the washing water W changes by a small amount as described later, and can be immediately recovered by the heater 41. .

Alternatively, a method may be adopted in which the replenishing washing water W is kept at a predetermined temperature. In such a method, installation of the heater 41 etc. may be unnecessary in some cases, and the concept of the heating means in the present invention includes such a device.

During this process, since there is a slight flow of washing water W between each processing chamber due to the passage of the photosensitive material S, each processing chamber 6A to
There is a gradient in the temperature of the washing water W in 6E from the final processing chamber 6E to the first processing chamber 6A through which the photosensitive material S first passes.

At this time, assuming that the temperature of the washing water W in the final processing chamber 6E at the time of running equilibrium is T'C as described above, the temperatures of each processing chamber are as follows.

Processing chamber temperature ('C) 6E T 6D T-(0,2~4) 6CT-(0,4~8) 6B T-(0,5~12) 6A T-(0,6~16) On the other hand, The photosensitive material S is placed in the processing chamber 6 as shown by the arrow in the figure.
A, 6B, 6C16D, and 6E are transported in this order.

Therefore, the flow direction of the washing water W is opposite to the conveyance direction of the photosensitive material S (counter flow). This flow also improves the water washing efficiency.

Further, while the photosensitive material S is sequentially transported through the processing chambers 6A to 6E, it is processed with the washing water W at a low temperature in the processing chamber 6A and at the highest temperature in the processing chamber 6E.

In the present invention, generally, the temperature difference of the washing water W between the final processing chamber and the first processing chamber is 0.5 to 60°C, preferably 2 to 40°C, both at the start of the process and at the running equilibrium. do. In particular, by setting the temperature difference to 2 to 40°C, the effect of improving drying efficiency can be obtained.

The temperature of each processing chamber is not particularly limited as long as it satisfies the above conditions, and for example, it may form a temperature gradient that gradually decreases from the final processing chamber 6E to the first processing chamber 6A. However, a plurality of adjacent processing chambers may have the same temperature.

Then, at the same time that the processing is completed and the photosensitive material S is carried out from the washing water W in the passage 76 above the processing chamber 6E, replenishment is stopped.

In this case, due to the effect of blocking the liquid flow by the blade 15, it becomes possible to carry out processing with the temperature difference of the washing water W between the final processing chamber 6E and the first processing chamber 6A within the above range, and the temperature difference in the washing water W in the final processing chamber 6E becomes Since it is possible to increase the washing water W to the highest level, the film quality of the sensitive material is improved, and the drying efficiency in the next step, the smoke discharge step, is improved.

For this reason, the amount of heat generated by the drying device used in combination with the illustrated photosensitive material processing device can be reduced, leading to reductions in power consumption and miniaturization of the device. Also,
It becomes possible to shorten the smoke emitting time.

Furthermore, in order to remove washing water W carried by the photosensitive material and facilitate drying, a squeeze roller or the like ( (not shown), this removal efficiency is improved by the present invention.

Furthermore, in the above, the degree of contamination of the washing water W in each processing chamber due to chemicals carried over from the pre-bath carried on the photosensitive material S is reduced by the squeezing effect of the blade 15. Because the amount of liquid is extremely small, and because the liquid barrier properties of the blade 15 are extremely high, and because the washing water W is supplied as described above, the processing chamber 6A is large, and the processing chambers 6B and 6C1 are large.
6D and 6E, and the concentration ratio of the liquid composition in each processing chamber is maintained extremely well.

Therefore, the water washing efficiency is significantly improved, and the amount of replenishment can be greatly reduced.

The amount of replenishment may be determined by the amount of flow determined by the gap between the photosensitive material S and the blade 15 that is created when the blade 15 is spread apart during the passage of the photosensitive material S.

Such replenishment amount mainly depends on the width, thickness, conveyance speed, etc. of the photosensitive material S, and taking color paper as an example, it is as shown in Table 1.

Table 1 Medium sensitive material (mm) Conveyance speed Replenishment amount (water supply amount) 82, 5 60cm/min 13
mj/min 80cm/min 17 mj/min 100
cm/min 21 rnl1 min 127
60cm/min 19.4mg/min 80cm/
min 26 ml 1 min 100 cm/min 3
2.4mg/min 151 60cm/min
23 at/min 80cm/min 31 m
j/min 100cm/min 3g, 5mj/min The replenishment amount exemplified in Table 1 is about 50 to 80% of the conventional replenishment amount. No outbreaks have occurred.

Furthermore, the fruiting device that can improve the water washing efficiency can be made smaller.

Further, when the photosensitive material S is not passing through (unprocessed), the blade 15 blocks the flow of the washing water W, so mixing of the washing water W hardly occurs. As a result, even if the treatment is stopped for a long period of time and then resumed, efficient water washing can be carried out immediately.

The timing of replenishment and the amount of replenishment described above may be controlled using known control methods and means. The control means in this case can be the same as that for controlling the heater and the like.

In the illustrated example, the configuration is such that the heater 41 is installed in the final processing chamber, but from the viewpoint of ease of manufacturing the processing device,
In some cases, the heater 41 may be installed in the lowermost processing chamber 6C. The processing chamber 6C is located at a position where it is easiest to attach the heater, and it is possible to form a temperature gradient similar to that described above from the processing chamber 6C to the processing chamber 6A.

Furthermore, in this device, the sensitive material is heated during processing, and although the water temperature in the processing chamber 6C in which the heater 41 is installed is not heated, the washing water in the processing chambers 6D and 6E is also heated in sequence. become.

In any case, in the present invention, the temperatures of the washing water in each processing chamber are not all the same.

Further, in the illustrated example, a heater is used as a heating means installed in the final processing chamber and installed in the circulation path, but the heating means is not limited to this.

For example, a method may be adopted in which a planar heating element is embedded in a block forming the final processing chamber.

In this case, the embedding position is preferably within about 20 mm, preferably about 1 to 10 mm, from the position in contact with the washing water W, and is preferably installed in a manner surrounding the processing chamber.

In addition, if the material is made of a material that does not cause any trouble even if it comes into contact with the washing water W, it may be installed inside the processing chamber (and this is also preferable).

Examples of such planar heating elements include panel heaters with built-in heaters, oil circulation panel heaters, planar heating elements containing various conductive fillers, and heater elements covered with insulating materials, among others. Particularly preferred are those containing a conductive filler and those in which the heater element is coated with an insulating material (such as an organic material, ceramics, or a mixture thereof).

Examples of conductive fillers include organic conductive fillers such as carbon-based materials such as carbon black, graphite, and carbon fibers, metal powders such as iron, aluminum, titanium, and nickel, or titanium dioxide, iron oxide, and oxide. Examples include inorganic conductive fillers such as metal oxide powders such as zinc and magnesium oxide.

Specific examples of such planar heating elements include: ■ Those made by mixing carbon and paper fiber with heat-resistant resin (manufactured by Toho Rayon ■, Toho Veslon ■), ■ Those made by mixing carbon black and heat-resistant resin thing(
(manufactured by Kaken ■).

■ Inorganic conductive paint (■ rHMc111 manufactured by Himax
J), ■Product name: NR-Ceramics plate heater (manufactured by Nippon Steel), ■Product name: NR-Fluororesin plate heater (manufactured by Nippon Steel), ■Part name: Samicon Super 340 (manufactured by Sakari $E Netsu), ■ Product name: Idemitsu surface heater (manufactured by Idemitsu Kosan), ■ Teflon submersible panel heater, Product name: Heatflon (manufactured by Two-Tone, Noguchi Seisakusho ■), ■ Product name: Thin heater F-1, F-2 (made by Narasaki Sangyo ■), 0 Product 22 Silicone rubber heater (made by Taiyo ■) Product name: Flexible mesh heater, type S
S type, J-KK type, KA type, KE type, 5-TS type, R-
type, R-3 type, KK type, 5-SS type (made by Taiyo) ■Product name: VALFLON PFA immersion plate heater [PL-500] (manufactured by PALFLON), ■Product name: New Black Heater NBHI, NBHS
2. NBHS4, NBH36 (■Made by Nikkei) ■Product name: Quick Ultra Heater QUT-40 (■
manufactured by Teikoku Piston Ring).

Among these, the above-mentioned (1) and (2) having a negative temperature coefficient of resistance (negative characteristics) are preferable.

If you use this type of water, the current value will decrease as the temperature rises, the amount of heat generated will decrease, and the temperature will converge to a certain level. If you set the conditions or set the conditions, the water temperature will be detected and this item will turn ON10 F.
There is no need to control F, etc. This eliminates the need to install a control means, etc., leading to miniaturization and simplification of the device.

Further, when using the above-mentioned phases 1 to 2 and 2 to [phase], the ON10 F F may be controlled by the control means based on the detected temperature, similar to the illustrated heater.

In the illustrated example, one pair of blades 15 are provided in each of the passages 71 to 74.
Although the configuration is such that a plurality of pairs are installed, the present invention is not limited to this, and a plurality of pairs may be provided.

When using a plurality of pairs, the number is usually 2 to 5 pairs, and all blades may have the same shape, or blades with different lengths may be used in combination.

By providing a plurality of pairs, the squeezing effect and liquid blocking performance can be improved, and thereby the amount of replenishment can be further reduced. For example, if one pair is expanded to two pairs under the same conditions, the reduction will be about 20 to 30% when there are two pairs compared to when there is one pair.

In the above description, replenishment is performed at the same time as processing, but replenishment may also be performed during non-processing.

However, in such a case, a bypass may be provided to connect adjacent processing chambers, and a liquid amount corresponding to the amount of replenishment in the preceding processing chamber may be allowed to flow into the subsequent processing chamber.

Further, in the illustrated example, the number of processing chambers is five, but the number is not limited to this, and can be various depending on the purpose and use, and is usually 3 to 30.

In the above description, a pair of blades is used as a shielding means for maintaining the temperature difference of the washing water and the concentration ratio of the liquid composition in each processing chamber, and it is most preferable to use a pair of blades in order to obtain the effect. It is not limited to this.

For example, a single blade may be used. When using this blade, one blade is installed so as to close a narrow passage, one end (base) of one blade is fixed to the passage wall, and the other end (
For example, the photosensitive material S may be passed through a gap formed between the tip (the leading end) and the wall surface of the passage.

In addition to the blade, other shielding means may also be used. Specifically, it may be a valve that uses buoyancy, a shielding plate that uses the rotation of a crank arm, or a roller shutter that uses the rotation of a cylinder with a slit-like opening (Japanese Patent Application No. 27034, 1-248930, etc.).

Further, although the above description has typically been made using rinsing water as the rinsing liquid, a stabilizing liquid or the like may be used as described above.

In either case, since the water washing efficiency is good, it is sufficient to use only one tank for the water washing treatment.

For details on the washing liquid used in the present invention, please refer to "Fundamentals of Photographic Engineering" edited by the Photographic Society of Japan, published by Corona Publishing (1978).
P299 r Chapter 4 Development Process", etc. can be referred to.

The light-sensitive material in the present invention may be any of various color and black and white light-sensitive materials. For example, in addition to the color paper mentioned above, color negative film, color reversal film, color positive film, color reversal photographic paper, photographic material for plate making, X-ray photographic material, black and white negative film, black and white photographic paper, and photographic material for microphotography. etc.

Therefore, the photosensitive material to be washed with water by the photosensitive material processing apparatus of the present invention is one that has been exposed to light and then at least developed according to the processing steps, and has been processed to have fixing ability.

Here, specifically, the treatment having fixing ability is a fixing treatment in the case of a black and white photosensitive material, and a bleach-fixing treatment and a fixing treatment in the case of a color photosensitive material.

The present invention can be applied to various photosensitive material processing apparatuses, such as wet copying machines, automatic developing machines, printer processors, video printer processors, photo print production coin machines, and color paper processing machines for plate inspection.

Although the configuration examples of the present invention have been described above, the present invention is not limited to these.

<Example> Hereinafter, the present invention will be specifically explained with reference to Examples.

Example 1 Using the color paper described as sample P-2 in Example 2 of JP-A-63-70857,
After imagewise exposure of this light-sensitive material, continuous processing (running test) was performed using Fuji Color Paper Processing Machine PP600 until twice the capacity of the color developing tank was replenished (2 rounds) in the following processing steps.

Treatment process Temperature Time Replenishment amount°
Tank capacity Color development 38℃ 1 minute 40 seconds 290m
j 171 bleach constant j $ 35℃
60 seconds 180 mj 9 j washing ■ 33
~35℃ 30 seconds 41 Water washing 033~35
℃ 30 seconds 41 water washing■ 33-35℃
30 seconds 182 mj 41 drying 70
~80°C for 50 seconds The following washing water was used.

Ion exchange water (3 pp each of calcium and magnesium)
m or less) Such processing is referred to as processing IA.

In processing IA, instead of using three washing tanks, the same processing was carried out using the photosensitive material processing apparatus shown in FIGS. 1 to 3 as the washing tanks.

The equipment in this case is as follows.

(1) Processing chamber - Capacity per unit 250mj (However,
(120 mj of liquid in the circulation path is added to the processing chamber 6E) (2) 3 mm in the passage (3)
Length of passage between processing chambers 45mm (4) blades (
(1 pair for each passage between processing chambers) Thickness: 1 mm (same thickness throughout) Length: 25 mm Overlap of tips: 3 mm (when not passing through sensitive material) Material: silicone rubber Average inclination angle: 45° ( 5) Temperature treatment chamber for washing water in each treatment chamber At the start of treatment At running equilibrium 6E
45.3℃ 45.5℃60 3
2,4℃ 42.3℃6C28,5℃
38.7℃6B 31.3℃
35.2℃ 6A 31.7℃ 3
This temperature of 2.7°C was obtained by setting the temperature of the washing water in the final processing chamber 6E to 45±2°C.

Such processing is referred to as processing IB.

Furthermore, in treatment IB, a water wiping roller (a stainless steel roller whose surface was wrapped with water-absorbing nylon "Siebe" manufactured by Asahi Kasei ■) was installed between the water washing tank and the drying device, and the same treatment was carried out.

This is referred to as a processing IC.

In addition, in treatment IB, the temperature of the washing tank was controlled by installing heaters in all rooms, and the temperature of the washing water in all rooms was set to 35° C., and other treatments were carried out in the same manner.

This is set as the processing ID.

In this treatment ID, a water wiping roller similar to that of the treatment IC was installed, and the other treatments were carried out in the same manner.

This is called a processing IE.

These treatments IA to IE are summarized in Table 2.

Note that the water washability was evaluated using the residual developing agent and the residual dye as follows. Moreover, the drying time is the time required for sufficient drying. Furthermore, the number of heaters is shown as an indicator of miniaturization and simplification of the device.

(1) The residual developing agent-treated photosensitive material was left for 3 days at 60°C and 70% humidity, the color density of the white background area was measured, and the amount of active agent corresponding to this color density was determined and evaluated. .

(2) The density of the white background area immediately after residual dye treatment was examined and evaluated based on the degree of whiteness corresponding to the presence or absence of residual dye.

From Table 2, it can be seen that in the processing IB and IC of the present invention, the equipment can be downsized and simplified, and the washing efficiency can be improved compared to the conventional processing IA, and the drying time can also be shortened, and the drying efficiency can be improved. I can see that it will improve. On the other hand,
Processing ID and IE with the same temperature of washing water in each processing chamber
Although the washing efficiency and drying efficiency are improved compared to the conventional treatment IA, they are slightly inferior to the present invention, and the installation of the heater is It can be seen that this invention is considerably inferior to the present invention because the number of cases is large and the installation of circulation paths is required accordingly.

In addition, when the temperature difference of the washing water between the first treatment chamber and the final treatment chamber was made larger than the above, it was confirmed that the drying time could be shortened within the preferable temperature difference according to the present invention.

Example 2 In the processing IB and IC of Example 1, instead of using a heater, the processing chamber 6E was installed in the block body forming the processing chamber 6E.
The treatment was the same except that the sheet heating element was installed in a manner that surrounded the area.

At this time, the planar heating element (flexible) was attached to the surface of the part that came into contact with the washing water, and was intermittently energized by sensor control. At this time, the sheet heating element is Samicon Super 3
40 (manufactured by Sakaguchi Dentsu ■) was used.

These processes are referred to as processes 2B and 2C, corresponding to processes IB and lc, respectively.

In these treatments 2B and 2C, results equivalent to those in treatments IB and IC were obtained.

<Effects of the Invention> According to the present invention, it is possible to downsize and simplify the device. In addition, by regulating the installation position of the heating means, it is possible to further improve processing efficiency such as water washing and stabilization immediately before the drying process, and it is also possible to improve drying efficiency and speed up the processing. can be achieved.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional side view showing an example of the configuration of a photosensitive material processing apparatus according to the present invention. FIG. 2 is a sectional view taken along the line ■-■ in FIG. 1. 3 is a sectional view taken along the line m--■ in FIG. 1. FIGS. 4(a) and 4(b) are enlarged cross-sectional views showing the blade portion in FIG. 1, respectively. FIG. 5 is a schematic diagram showing the first region and the second region in the photosensitive material processing apparatus of the present invention. Explanation of symbols■...Photosensitive material processing device 2...Processing tank 21.22...Side wall 3...Rack 31.32...Side plate 4...Block bodies 6A to 6E...Processing chamber 71 to 76...Pathway 8...Conveyance roller 81...Rotating shaft 82...Main shaft 83.84...Bevel gear 85...Gear 9...Guide 10...Reversing guide 11...・Liquid supply path 12...Drainage path 13...Liquid supply pipe 14...Drainage pipe 15...Blade 17...Partition member 171, 172...End portion 18...First Area 19...Second area 41...Heater 43...Pump 45...Circulation path 47...Temperature sensor 50...Control means S...Photosensitive material W...Washing water OF+ ...Overflow liquid applicant: Representative of Fuji Photo Film Co., Ltd. Patent attorney: Kakan Ishii, patent attorney
Increase 1) Tatsuya G l G・3 F G,4 (bl IG

Claims (4)

[Claims] (1) A continuous processing path having a plurality of processing chambers sequentially connected by narrow passages is provided in the processing tank, and while the washing liquid is supplied to the continuous processing path, the washing liquid is supplied to the continuous processing path. A photosensitive material processing apparatus is configured such that the silver halide photosensitive material is processed while sequentially passing through each of the processing chambers, wherein some of the processing chambers through which the silver halide photosensitive material passes ,
A photosensitive material processing apparatus characterized in that a heating means for heating the processing liquid in the processing chamber is installed. (2) The photosensitive material processing apparatus according to claim 1, wherein the part of the processing chambers is a final processing chamber. (3) At least one pair of blades are installed in each of the narrow passages so that the tips of the blades are in contact with each other when the silver halide photosensitive material is not passing through. photosensitive material processing equipment. (4) After the exposed silver halide photosensitive material is at least developed and processed to have fixing ability, a plurality of processes are sequentially connected by a narrow passage when performing a water washing process immediately before the drying process. A method of washing the silver halide photosensitive material by sequentially passing through each of the processing chambers by filling the continuous processing path with the washing liquid while supplying the washing liquid to a continuous processing path having a chamber, the method comprising: , so that the difference in liquid temperature between the washing liquid in the first processing chamber through which the silver halide photosensitive material first passes and the washing liquid in the final processing chamber through which it passes last is 0.5 to 60°C. A processing method characterized by washing a silver halide photosensitive material with water by heating a washing liquid in a final processing chamber.