JP7565281B2 - 負極材料、負極片、電気化学装置及び電子装置 - Google Patents
負極材料、負極片、電気化学装置及び電子装置 Download PDFInfo
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- JP7565281B2 JP7565281B2 JP2021539889A JP2021539889A JP7565281B2 JP 7565281 B2 JP7565281 B2 JP 7565281B2 JP 2021539889 A JP2021539889 A JP 2021539889A JP 2021539889 A JP2021539889 A JP 2021539889A JP 7565281 B2 JP7565281 B2 JP 7565281B2
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Images
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- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/58—Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy; of polyanionic structures, e.g. phosphates, silicates or borates
- H01M4/583—Carbonaceous material, e.g. graphite-intercalation compounds or CFx
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Description
以下、本発明をよりよく説明するために、いくつの具体的な実施例と比較例を挙げる。ここで、リチウムイオン電池を例示として挙げる。
負極片の調製:集電体として、厚さが10μmである銅箔を用いて、活性材料として、SiOx(0.5≦x≦1.6)とグラファイトを用いて、SiOxとグラファイトのD/G値は表1に示し、その中、活性材料に対するSiOxの質量比が10%であり、バインダーとして、ポリアクリル酸を用いる。活性材料、導電性カーボンブラック、バインダーを95:1.2:3.8の質量比で混合して水に分散されてスラリーを形成し、撹拌、銅箔への塗工、乾燥、冷間圧延、裁断を経て、負極片を得た。
実施例2~17と比較例1~10において、SiOx粒子とグラファイト粒子の表面構造、粒子分布と形態の違いを除いて、正極片、負極片、リチウムイオン電池の調製はそれぞれ実施例1と同じであり、パラメータの違いを相応的な表に示す。
Wmは単分子層で吸着された気体の飽和吸着量である。
勾配は(c-1)/(WmC)であり、バイアスは1/WmCであり、総比表面積は(Wm*N*Acs/M)である。
比表面積はS=St/mであり、mはサンプルの質量であり、Acsは各N2分子が占める平均面積16.2A2である。
Claims (6)
- 集電体と、前記集電体の上に位置する活物質層とを含む負極片であって、
前記活物質層が負極材料とバインダーと導電剤とを含み、
前記負極材料がケイ素系材料粒子と炭素材料粒子を含み、
前記活物質層における前記ケイ素系材料粒子の質量分率が5%~30%であり、前記活物質層における前記バインダーの質量分率が0.5%~10%であり、前記活物質層における前記導電剤の質量分率が0.5%~5%であり、
前記炭素材料粒子のラマンスペクトルにおいて、シフト範囲が1255~1355cm-1と1575~1600cm-1であるピークをそれぞれDピークとGピークとし、前記ケイ素系材料粒子のラマンスペクトルにおいて、シフト範囲が1255~1355cm-1と1575~1600cm-1であるピークをそれぞれDピークとGピークとし、前記炭素材料粒子の散乱ピーク強度比D/GがAであり、前記ケイ素系材料粒子の散乱ピーク強度比D/GがBであり、0.15≦A≦0.9、0.8≦B≦2.0、0.2<B-A<1.8であり、
前記炭素材料粒子のDn50/Dv50の値はEであり、前記ケイ素系材料粒子のDn50/Dv50の値はFであり、F>Eであり、
前記炭素材料粒子の平均球形度はHであり、前記ケイ素系材料粒子の平均球形度はIであり、0.1<I-H≦0.3であり、
前記炭素材料粒子の粒子径範囲は0.01μm~80μmであり、前記ケイ素系材料粒子の平均粒子径は0.1μm~30μmであり、
前記ケイ素系材料粒子の表面には、炭素含有被覆層を含み、
前記ケイ素系材料粒子はSiO x を含み、0.5≦x≦1.6であり、前記炭素材料粒子はグラファイトを含む、負極片。 - 前記炭素材料粒子のDn50/Dv50の値であるEは0.1~0.65であり、及び/又は、前記ケイ素系材料粒子のDn50/Dv50の値であるFは0.3~0.85である、請求項1に記載の負極片。
- 前記炭素材料粒子の平均球形度であるHは0.6~0.8である、請求項1に記載の負極片。
- 前記ケイ素系材料粒子の平均球形度であるIは0.8~1.0である、請求項1に記載の負極片。
- 正極片と、
請求項1~4のいずれか1項に記載の負極片と、
前記正極片と前記負極片との間に設置されるセパレータと、
を含む電気化学装置。 - 請求項5に記載の電気化学装置を含む電子装置。
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