JP7561517B2 - テスト装置 - Google Patents
テスト装置 Download PDFInfo
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- JP7561517B2 JP7561517B2 JP2020080947A JP2020080947A JP7561517B2 JP 7561517 B2 JP7561517 B2 JP 7561517B2 JP 2020080947 A JP2020080947 A JP 2020080947A JP 2020080947 A JP2020080947 A JP 2020080947A JP 7561517 B2 JP7561517 B2 JP 7561517B2
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- 238000012360 testing method Methods 0.000 title claims description 96
- 230000005855 radiation Effects 0.000 claims description 115
- 239000000523 sample Substances 0.000 claims description 57
- 238000001816 cooling Methods 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 37
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000001419 dependent effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000691 Re alloy Inorganic materials 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000007849 functional defect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2601—Apparatus or methods therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2607—Circuits therefor
- G01R31/2637—Circuits therefor for testing other individual devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2862—Chambers or ovens; Tanks
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2863—Contacting devices, e.g. sockets, burn-in boards or mounting fixtures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2865—Holding devices, e.g. chucks; Handlers or transport devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2868—Complete testing stations; systems; procedures; software aspects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
- G01R31/2877—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature related to cooling
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
本発明は、特許請求の範囲の独立請求項の前文に係るテスト装置に関する。
半導体デバイス製造は、フォトリソグラフィーおよび化学処理ステップの複数のステップシーケンスを用いて、半導体材料で形成されたウェハ上に集積回路を作成するために一般的に用いられるプロセスである。プロセスの一部として、ウェハ上に形成された集積回路は、通常、特別なテストパターンを適用されることにより、機能上の欠陥がないかテストされる。このテストは、ウェハプローバと呼ばれるテスト装置を用いて実行される。
本発明の主な目的は、上に提示された先行技術の問題を低減または排除しさえすることである。
本発明によるテスト装置は、真空チャンバ、集積回路を含むウェハを保持するためのチャック、ウェハ上の集積回路に電気的に接触するためのプローブカード、プローブカードに対してチャックを移動させるための手段、真空チャンバ内に配置され、チャックとプローブカードとを囲む第1の放射シールド、および第1の放射シールドに熱的に接続される冷却ユニットを含む。本発明によるテスト装置では、プローブカードに対してチャックを移動させるための手段は、第1の端部および第2の端部を有する支柱を含み、支柱の第1の端部はチャックに取り付けられ、第1の放射シールドは、支柱が通過するように構成される第1の開口部を有する第1の固定された部分と、支柱に取り付けられ、第1の開口部を覆うように構成される第1の可動部分とを含む。
異なる実施形態において、同じ参照符号が、同じであるかまたは同様の構成要素に用いられる。
Claims (16)
- テスト装置であって、
-真空チャンバと、
-集積回路を含むウェハを保持するためのチャックと、
-前記ウェハ上の前記集積回路に電気的に接触するためのプローブカードと、
-前記プローブカードに対して前記チャックを移動するための手段と、
-前記真空チャンバ内に配置され、前記チャックおよび前記プローブカードを囲む第1の放射シールドと、
-前記第1の放射シールドに熱的に接続される冷却ユニットとを備え、
-前記プローブカードに対して前記チャックを移動するための手段は、第1の端部および第2の端部を有する支柱を含み、前記支柱の前記第1の端部は前記チャックに取り付けられ、
-前記第1の放射シールドは、前記支柱が通過するように構成される第1の開口部を有する第1の固定された部分と、前記支柱に取り付けられ、前記第1の開口部を覆うように構成される第1の可動部分とを含む、テスト装置。 - 前記第1の可動部分は、前記支柱が通過するように構成される第2の開口部を有することを特徴とする、請求項1に記載のテスト装置。
- 前記テスト装置は、前記真空チャンバ内に配置され、前記第1の放射シールドを囲む第2の放射シールドを備え、前記第2の放射シールドは、前記支柱が通過するように構成配される第3の開口部を有する第2の固定された部分と、前記支柱に取り付けられ、前記第3の開口部を覆うように構成される第2の可動部分とを含むことを特徴とする、請求項1または請求項2に記載のテスト装置。
- 前記第2の可動部分は、前記支柱が通過するように構成される第4の開口部を有することを特徴とする、請求項3に記載のテスト装置。
- 前記冷却ユニットは、前記第1の放射シールドに熱的に接続される第1の温度段と、前記第2の放射シールドに熱的に接続される第2の温度段とを有することを特徴とする、請求項3または請求項4に記載のテスト装置。
- 前記冷却ユニットは、前記チャックおよび前記プローブカードに熱的に接続される第3の温度段を有することを特徴とする、請求項5に記載のテスト装置。
- 前記放射シールドの前記固定された部分は前記開口部の周りに第1のリップを含み、前記放射シールドの前記可動部分はその外縁に配置される第2のリップを含み、前記第1のリップおよび前記第2のリップは互いに向き合うように配置されることを特徴とする、請求項1から請求項6のいずれか1項に記載のテスト装置。
- 前記放射シールドは、前記固定された部分または前記可動部分に取り付けられ、前記固定された部分と前記可動部分との間の間隙をシールドするためのシールを含むことを特徴とする、請求項1~請求項7のいずれか1項に記載のテスト装置。
- 前記放射シールドは、前記固定された部分に可撓性要素を用いて取り付けられ、前記固定された部分と前記可動部分との間の間隙を閉じるための中実リングを含むことを特徴とする、請求項1~請求項7のいずれか1項に記載のテスト装置。
- 互いに向き合う前記固定された部分および前記可動部分の表面の少なくとも一方は熱吸収性とされることを特徴とする、請求項1から請求項9のいずれか1項に記載のテスト装置。
- 前記プローブカードに対して前記チャックを移動するための手段は、前記支柱の前記第2の端部に取り付けられ、前記支柱を3つの垂直方向に移動するための第1のアクチュエータを含むことを特徴とする、請求項1~請求項10のいずれか1項に記載のテスト装置。
- 前記プローブカードに対して前記チャックを移動させるための手段は、前記支柱の前記第2の端部に取り付けられ、前記支柱をその長手方向軸の周りにおいて回転させるための第2のアクチュエータを含むことを特徴とする、請求項11に記載のテスト装置。
- 前記支柱は1つまたは複数の管を含むことを特徴とする、請求項1~請求項12のいずれか1項に記載のテスト装置。
- 前記管はシートメタルで形成されることを特徴とする、請求項13に記載のテスト装置。
- 前記管の壁厚は0.05mm~0.3mmの範囲であることを特徴とする、請求項13または請求項14に記載のテスト装置。
- 前記冷却ユニットは、閉ループヘリウム循環を用いる乾式クライオスタットであることを特徴とする、請求項1~請求項15のいずれか1項に記載のテスト装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP19172489.7A EP3734301A1 (en) | 2019-05-03 | 2019-05-03 | Cryogenic wafer prober with movable thermal radiation shield |
EP19172489.7 | 2019-05-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020184629A JP2020184629A (ja) | 2020-11-12 |
JP7561517B2 true JP7561517B2 (ja) | 2024-10-04 |
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ID=66397100
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020080947A Active JP7561517B2 (ja) | 2019-05-03 | 2020-05-01 | テスト装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11181574B2 (ja) |
EP (2) | EP3734301A1 (ja) |
JP (1) | JP7561517B2 (ja) |
KR (1) | KR102752734B1 (ja) |
CN (1) | CN111965516B (ja) |
CA (1) | CA3079000A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113064046B (zh) * | 2021-04-09 | 2021-11-26 | 深圳群芯微电子有限责任公司 | 一种光电耦合器辐射效应测试设备及测试方法 |
US11639957B2 (en) * | 2021-07-02 | 2023-05-02 | Northrop Grumman Systems Corporation | Planar ring radiation barrier for cryogenic wafer test system |
US11480299B1 (en) | 2022-03-22 | 2022-10-25 | Anyon Systems Inc. | Cryostat and quantum computing system having same |
TWI814491B (zh) * | 2022-07-18 | 2023-09-01 | 財團法人國家實驗研究院 | 檢測裝置之可拆卸保護結構 |
WO2025033724A1 (ko) * | 2023-08-09 | 2025-02-13 | 한국기초과학지원연구원 | 프로브스테이션 장치 |
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US5835997A (en) * | 1995-03-28 | 1998-11-10 | University Of South Florida | Wafer shielding chamber for probe station |
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US6700397B2 (en) * | 2000-07-13 | 2004-03-02 | The Micromanipulator Company, Inc. | Triaxial probe assembly |
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- 2020-04-29 US US16/861,257 patent/US11181574B2/en active Active
- 2020-04-30 CN CN202010368026.7A patent/CN111965516B/zh active Active
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Also Published As
Publication number | Publication date |
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CA3079000A1 (en) | 2020-11-03 |
EP3734305B1 (en) | 2024-08-07 |
KR102752734B1 (ko) | 2025-01-08 |
US11181574B2 (en) | 2021-11-23 |
KR20200128358A (ko) | 2020-11-12 |
CN111965516B (zh) | 2024-12-20 |
CN111965516A (zh) | 2020-11-20 |
US20200348357A1 (en) | 2020-11-05 |
EP3734305A1 (en) | 2020-11-04 |
EP3734305C0 (en) | 2024-08-07 |
JP2020184629A (ja) | 2020-11-12 |
EP3734301A1 (en) | 2020-11-04 |
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