JP7231108B2 - 有機el素子用材料、有機el素子、表示装置および照明装置 - Google Patents
有機el素子用材料、有機el素子、表示装置および照明装置 Download PDFInfo
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- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000037 tert-butyldiphenylsilyl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1[Si]([H])([*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical class N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 150000004867 thiadiazoles Chemical class 0.000 description 1
- 150000007979 thiazole derivatives Chemical class 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 150000003577 thiophenes Chemical class 0.000 description 1
- NZFNXWQNBYZDAQ-UHFFFAOYSA-N thioridazine hydrochloride Chemical class Cl.C12=CC(SC)=CC=C2SC2=CC=CC=C2N1CCC1CCCCN1C NZFNXWQNBYZDAQ-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OVTCUIZCVUGJHS-VQHVLOKHSA-N trans-dipyrrin Chemical class C=1C=CNC=1/C=C1\C=CC=N1 OVTCUIZCVUGJHS-VQHVLOKHSA-N 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- PWYVVBKROXXHEB-UHFFFAOYSA-M trimethyl-[3-(1-methyl-2,3,4,5-tetraphenylsilol-1-yl)propyl]azanium;iodide Chemical compound [I-].C[N+](C)(C)CCC[Si]1(C)C(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 PWYVVBKROXXHEB-UHFFFAOYSA-M 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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Description
本発明の一つの実施形態である一般式(1)で表される有機EL素子用材料は、以下に示されるフェナントロリン誘導体からなり、有機EL素子を構成する層のうち、いずれかの層に使用される材料を表す。つまり、有機EL素子用材料とは、下記一般式(1)で表されるフェナントロリン誘導体の用途を意味する。
次に、有機EL素子の実施の形態について詳細に説明する。有機EL素子は、陽極と陰極、およびそれら陽極と陰極との間に介在する有機層を有し、該有機層が電気エネルギーにより発光する。
有機EL素子の機械的強度を保つために、有機EL素子を基板上に形成することが好ましい。基板としては、ソーダガラスや無アルカリガラスなどのガラス基板や、プラスチック基板などが挙げられる。ガラス基板を用いる場合、厚みは、機械的強度を保つために十分な厚みがあればよく、0.5mm以上あれば十分である。ガラスの材質については、ガラスからの溶出イオンが少ないことが好ましく、無アルカリガラスが好ましい。また、SiO2などのバリアコートを施したソーダライムガラスも市販されており、これを使用することもできる。
基板上に陽極が形成される。陽極に用いる材料は、正孔を有機層に効率よく注入できる材料が好ましい。また、光を取り出すために、透明または半透明であることが好ましい。陽極に用いる材料としては、例えば、酸化亜鉛、酸化錫、酸化インジウム、酸化錫インジウム(ITO)、酸化亜鉛インジウム(IZO)などの導電性金属酸化物;金、銀、クロムなどの金属;ヨウ化銅、硫化銅などの無機導電性物質、ポリチオフェン、ポリピロール、ポリアニリンなどの導電性ポリマーなどが挙げられる。これらの中でも、ITOガラスやネサガラスが好ましい。これらの電極材料は、単独で用いてもよいし、複数の材料を積層または混合して用いてもよい。陽極を形成した基板の電気抵抗は、素子の発光に十分な電流が供給できる範囲であればよいが、素子の消費電力の観点からは、低抵抗であることが好ましい。例えば、電気抵抗が300Ω/□以下のITO基板であれば素子電極として機能するが、現在では10Ω/□程度の基板の供給も可能になっていることから、20Ω/□以下の低抵抗の基板を使用することが好ましい。陽極の厚みは抵抗値に合わせて任意に選ぶことができ、通常45~300nmの間で用いられることが多い。
正孔注入層は、陽極と正孔輸送層の間に挿入される層である。正孔注入層は1層であっても複数の層が積層されていてもよい。正孔輸送層と陽極の間に正孔注入層が存在すると、より低電圧駆動し、耐久寿命も向上するだけでなく、さらに素子のキャリアバランスが向上して発光効率も向上するため好ましい。
正孔輸送層は、陽極から注入された正孔を発光層まで輸送する層である。正孔輸送層は単層であっても複数の層が積層されて構成されていてもよい。
発光層は、単一層および複数層のいずれでもよい。発光層は、発光材料により形成され、これはホスト材料とドーパント材料との混合物であっても、ホスト材料単独であっても、2種類のホスト材料と1種類のドーパント材料との混合物であっても、いずれでもよい。すなわち、本発明の実施の形態における有機EL素子は、各発光層において、ホスト材料もしくはドーパント材料のみが発光してもよいし、ホスト材料とドーパント材料がともに発光してもよい。電気エネルギーを効率よく利用し、高色純度の発光を得るという観点からは、発光層はホスト材料とドーパント材料の混合物からなることが好ましい。また、ホスト材料とドーパント材料は、それぞれ一種類であっても、複数の組み合わせであっても、いずれでもよい。発光層がホスト材料とドーパント材料の混合物からなる場合、ドーパント材料はホスト材料の全体に含まれていても、部分的に含まれていても、いずれでもよい。ドーパント材料は積層されていても、分散されていても、いずれでもよい。ドーパント材料は発光色の制御ができる。ドーパント材料の量は、濃度消光現象を抑制する観点から、ホスト材料とドーパント材料の合計を100重量%として30重量%以下が好ましく、さらに好ましくは20重量%以下である。ドーピング方法は、ホスト材料との共蒸着法によって形成することができるが、ホスト材料と予め混合してから同時に蒸着してもよい。
本発明において、電子輸送層とは、陰極から電子が注入され、さらに電子を輸送する層である。電子輸送層には、電子注入効率が高く、注入された電子を効率良く輸送することが望まれる。そのため、電子輸送層を構成する材料は、電子親和力が大きく、電子移動度が大きく、安定性に優れ、製造時および使用時に、トラップとなる不純物が発生しにくい物質であることが好ましい。特に膜厚を厚く積層する場合には、低分子量の化合物は結晶化するなどして膜質が劣化しやすいため、安定な膜質を保つため、分子量400以上の化合物が好ましい。しかしながら、正孔と電子の輸送バランスを考えた場合に、電子輸送層が陽極からの正孔が再結合せずに陰極側へ流れることを効率よく阻止できる役割を主に果たすならば、電子輸送能力がそれ程高くない材料で構成されていても、発光効率を向上させる効果は電子輸送能力が高い材料で構成されている場合と同等となる。したがって、本発明における電子輸送層には、正孔の移動を効率よく阻止できる正孔阻止層も同義のものとして含まれる。正孔阻止層および電子輸送層は単独でも複数の材料が積層されて構成されていてもよい。
本発明において、陰極と電子輸送層の間に電子注入層を設けてもよい。一般的に電子注入層は陰極から電子輸送層への電子の注入を助ける目的で挿入される。挿入する場合は、電子受容性窒素を含むヘテロアリール環構造を有する化合物を用いてもよいし、上記のドナー性材料を含有する層を用いてもよい。
陰極に用いる材料は、電子を効率よく発光層に注入できる物質であれば特に限定されない。陰極に用いる材料としては、例えば、白金、金、銀、銅、鉄、錫、アルミニウム、インジウムなどの金属、またはこれらの金属とリチウム、ナトリウム、カリウム、カルシウム、マグネシウムなどの低仕事関数金属との合金や多層積層などが挙げられる。中でも、電気抵抗値や製膜しやすさ、膜の安定性、発光効率などの面から、主成分としてはアルミニウム、銀およびマグネシウムから選ばれた金属が好ましく、電子輸送層および電子注入層への電子注入が容易であることから、マグネシウムと銀で構成されることがより好ましい。
陰極保護のために、陰極上に保護層(キャップ層)を積層することが好ましい。保護層を構成する材料(キャッピング材料)としては、特に限定されないが、例えば、白金、金、銀、銅、鉄、錫、アルミニウムおよびインジウムなどの金属;これら金属を用いた合金;シリカ、チタニアおよび窒化ケイ素などの無機物;ポリビニルアルコール、ポリ塩化ビニル、炭化水素系高分子化合物などの有機高分子化合物などが挙げられる。また、一般式(1)で表される有機EL素子用材料も、キャッピング材料として利用できる。ただし、有機EL素子が、陰極側から光を取り出す素子構造(トップエミッション構造)である場合は、キャッピング材料は、可視光領域において光透過性を有することが好ましい。
本発明における電荷発生層は、一般に二重層からなり、具体的には、n型電荷発生層およびp型電荷発生層からなるpn接合電荷発生層を用いることが好ましい。上記pn接合型電荷発生層は、有機EL素子中で電圧が印加されることにより、電荷を発生、または電荷を正孔および電子に分離し、これらの正孔および電子を正孔輸送層および電子輸送層を経由して発光層に注入する。電荷発生層は、具体的には、複数の発光層が積層された有機EL素子において、該複数の発光層の中間の電荷発生層として機能する。n型電荷発生層は陽極側に存在する第一発光層に電子を供給し、p型電荷発生層は陰極側に存在する第二発光層に正孔を供給する。そのため、複数の発光層を積層した有機EL素子における発光効率をより向上させ、駆動電圧を下げることができ、素子の耐久寿命もより向上させることができる。
MS(m/z):640[M+H]+
1H-NMR(400MHz、CDCl3)δ:8.94(s、1H)、8.81-8.87(m、2H)、8.65-8.74(m、4H)、8.40-8.52(m、3H)、8.23-8.40(m、4H)、7.78-7.99(m、6H)、7.64-7.78(m、2H)、7.31-7.50(m、4H)。
MS(m/z):614[M+H]+
1H-NMR(400MHz、CDCl3)δ:9.23(s、1H)、8.84-8.88(m、2H)、8.65-8.79(m、3H)、8.34-8.43(m、1H)、8.24-8.34(m、1H)、7.82-8.20(m、9H)、7.58-7.74(m、4H)、7.42-7.52(m、2H)、7.31-7.42(m、2H)。
実施例1~12および比較例1~14において得られた素子を、それぞれ10mA/cm2で直流駆動し、初期駆動電圧を測定した。さらに、温度70℃の環境下、電流密度10mA/cm2で100時間直流駆動したときの電圧を測定し、初期駆動電圧からの電圧上昇量を算出した。
実施例13~24および比較例15~28において得られた有機EL素子を、それぞれ電流密度10mA/cm2で点灯させ、外部量子効率を測定し、発光効率を評価した。外部量子効率が高いほど、発光効率に優れると評価できる。
実施例25~63および比較例29~70において得られた有機EL素子を、10mA/cm2で点灯させ、輝度を測定し、発光効率を評価した。輝度が高いほど、発光効率に優れると評価できる。
実施例13~63および比較例15~70において得られた有機EL素子を、10mA/cm2の定電流で継続駆動させた。測定を始めた時点の輝度から輝度が20%低下する時間を測定し、耐久寿命とした。
陽極としてITO透明導電膜を125nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を38mm×46mmに切断し、エッチングを行った。得られた基板を、“セミコクリーン”(登録商標)56(商品名、フルウチ化学(株)製)を用いて15分間超音波洗浄してから、超純水で洗浄した。この基板を、素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、前記化合物1と、ドーパントである金属元素Liとを、蒸着速度比が化合物1:Li=99:1となるように100nm蒸着し、重量比が99:1の層を形成した。その後、アルミニウムを60nm蒸着して陰極とし、5mm×5mm角の素子を作製した。ここで言う膜厚は、水晶発振式膜厚モニター表示値であり、他の実施例および比較例においても共通する。
用いる化合物および化合物と金属元素の蒸着速度比を表1に記載の通りに変更したこと以外は実施例1と同様にして素子を作製した。各実施例および比較例の結果を表1に示す。なお、化合物2~26は以下に示す化合物である。
陽極としてITO透明導電膜を165nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を、38mm×46mmに切断し、エッチングを行った。得られた基板を、“セミコクリーン”56(商品名、フルウチ化学(株)製)を用いて15分間超音波洗浄してから、超純水で洗浄した。この基板を、素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、まず正孔注入層として、HAT-CN6を5nm蒸着し、次いで正孔輸送層として、HT-1を50nm蒸着した。次に、発光層として、ホスト材料H-1、ドーパント材料D-1の混合層を、ドープ濃度が5重量%になるようにして20nmの厚さに蒸着した。次に、電子輸送層として、ET-1と2E-1を蒸着速度比がET-1と2E-1=1:1となるように35nmの厚さに蒸着した。次に、電子注入層として、前記化合物1と、ドーパントである金属元素Liとを、蒸着速度比が化合物1:Li=99:1となるように10nm蒸着した。その後、アルミニウムを60nm蒸着して陰極とし、5mm×5mm角の有機EL素子を作製した。
用いる化合物および化合物と金属元素の蒸着速度比を表2に記載の通りに変更したこと以外は実施例13と同様にして有機EL素子を作製した。各実施例および比較例の結果を表2に示す。
陽極としてITO透明導電膜を165nm堆積させたガラス基板(ジオマテック(株)製、11Ω/□、スパッタ品)を、38mm×46mmに切断し、エッチングを行った。得られた基板を、“セミコクリーン”56(商品名、フルウチ化学(株)製)を用いて15分間超音波洗浄してから、超純水で洗浄した。この基板を、素子を作製する直前に1時間UV-オゾン処理し、真空蒸着装置内に設置して、装置内の真空度が5×10-4Pa以下になるまで排気した。抵抗加熱法によって、まず正孔注入層として、HAT-CN6を5nm蒸着した。次いで、正孔注入層上に正孔輸送層、発光層および電子輸送層からなる、発光ユニット(第一の発光ユニット)を形成した。
用いる化合物および化合物と金属元素の蒸着速度比を表3に記載の通りに変更したこと以外は実施例25と同様にして有機EL素子を作製した。実施例37ではn型電荷発生層として化合物1、ET-2金属元素Liとを、蒸着速度比が化合物1:ET-2:Li=49.5:49.5:1となるように10nm蒸着した。実施例38では発光層として、ホスト材料H-1、ドーパント材料D-2の混合層を、ドープ濃度が5重量%となるようにして20nmの厚さに蒸着した。各実施例および比較例の結果を表3に示す。なおD-2およびET-2は以下に示す化合物である。
電子輸送層の形成において、ET-1にかえて前記化合物1を用いたこと、および、n型電荷発生層の形成において、化合物1にかえてET-2を用いたこと以外は実施例25と同様にして有機EL素子を作製した。
用いる化合物および化合物と金属元素の蒸着速度比を表4に記載の通りに変更したこと以外は実施例39と同様にして有機EL素子を作製した。各実施例および比較例の結果を表4に示す。
用いる化合物、金属元素の種類および蒸着速度比を表5に記載の通りに変更したこと以外は実施例25と同様にして有機EL素子を作製した。
Claims (17)
- 前記一般式(1)においてnが1である、請求項1に記載の有機EL素子用材料。
- 前記一般式(1)においてAがフェニル基である、請求項1または2に記載の有機EL素子用材料。
- 前記一般式(1)においてnが0である、請求項1に記載の有機EL素子用材料。
- 前記一般式(1)においてL1またはL2がナフチレン基である、請求項1~4のいずれかに記載の有機EL素子用材料。
- 前記一般式(1)においてL2が単結合である、請求項1~5のいずれかに記載の有機EL素子用材料。
- 陽極と陰極との間に少なくとも電子輸送層と発光層とが存在し、電気エネルギーにより発光する発光素子であって、該電子輸送層が請求項1~6のいずれかに記載の有機EL素子用材料を含有する有機EL素子。
- 前記電子輸送層がさらにアルカリ金属錯体化合物を含有する、請求項7に記載の有機EL素子。
- 陽極と陰極との間に少なくとも電荷発生層と発光層とが存在し、電気エネルギーにより発光する発光素子であって、該電荷発生層が請求項1~6のいずれかに記載の有機EL素子用材料を含有する有機EL素子。
- 前記電荷発生層がさらにフェナントロリン二量体を含有する請求項9に記載の有機EL素子。
- 前記電荷発生層がさらにアルカリ金属または希土類金属を含有する請求項9または10に記載の有機EL素子。
- 前記アルカリ金属がLiである請求項11に記載の有機EL素子。
- 前記希土類金属がYbである請求項11に記載の有機EL素子。
- 陽極と陰極との間に少なくとも電子注入層と発光層とが存在し、電気エネルギーにより発光する発光素子であって、該電子注入層が請求項1~6のいずれかに記載の化合物を含有する有機EL素子。
- 前記発光層が下記一般式(2)で表される化合物を含有する請求項7~14のいずれかに記載の有機EL素子:
- 請求項7~15のいずれかに記載のEL素子を含む表示装置。
- 請求項7~15のいずれかに記載のEL素子を含む照明装置。
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