JP6616421B2 - 流路部材 - Google Patents
流路部材 Download PDFInfo
- Publication number
- JP6616421B2 JP6616421B2 JP2017537852A JP2017537852A JP6616421B2 JP 6616421 B2 JP6616421 B2 JP 6616421B2 JP 2017537852 A JP2017537852 A JP 2017537852A JP 2017537852 A JP2017537852 A JP 2017537852A JP 6616421 B2 JP6616421 B2 JP 6616421B2
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- oxide layer
- substrate
- oxide
- outflow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 claims description 34
- 239000000919 ceramic Substances 0.000 claims description 27
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 239000001301 oxygen Substances 0.000 claims description 16
- 229910052760 oxygen Inorganic materials 0.000 claims description 16
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 14
- 229910052575 non-oxide ceramic Inorganic materials 0.000 claims description 13
- 239000011225 non-oxide ceramic Substances 0.000 claims description 13
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 13
- 238000000034 method Methods 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 11
- 238000005452 bending Methods 0.000 description 8
- 239000012530 fluid Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 4
- 238000009616 inductively coupled plasma Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001694 spray drying Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009694 cold isostatic pressing Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F21/00—Constructions of heat-exchange apparatus characterised by the selection of particular materials
- F28F21/04—Constructions of heat-exchange apparatus characterised by the selection of particular materials of ceramic; of concrete; of natural stone
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/87—Ceramics
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F1/00—Tubular elements; Assemblies of tubular elements
- F28F1/02—Tubular elements of cross-section which is non-circular
- F28F1/04—Tubular elements of cross-section which is non-circular polygonal, e.g. rectangular
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F19/00—Preventing the formation of deposits or corrosion, e.g. by using filters or scrapers
- F28F19/02—Preventing the formation of deposits or corrosion, e.g. by using filters or scrapers by using coatings, e.g. vitreous or enamel coatings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F3/00—Plate-like or laminated elements; Assemblies of plate-like or laminated elements
- F28F3/12—Elements constructed in the shape of a hollow panel, e.g. with channels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F2245/00—Coatings; Surface treatments
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Geometry (AREA)
- Inorganic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
を構成する前記基体の内面に、第2酸化層を備える。前記第1酸化層の表面から前記基体方向への深さ50nmにおける前記第1酸化層の酸素濃度をC1、前記第2酸化層の表面から前記基体方向への深さ50nmにおける前記第2酸化層の酸素濃度をC2としたとき、C2/C1が2以上10以下である。
1a:外面
1b:内面
2:流路
3:蓋体
4:中板
5:底板
6:流入口
7:流出口
8:第1酸化層
9:第2酸化層
10:流路部材
Claims (6)
- 非酸化物セラミックスからなる基体の内部に、流入口と流出口とを備える流路を有し、前記基体の外面に第1酸化層、前記流路を構成する前記基体の内面に、第2酸化層を備え、
前記第1酸化層の表面から前記基体方向への深さ50nmにおける前記第1酸化層の酸素濃度をC1、前記第2酸化層の表面から前記基体方向への深さ50nmにおける前記第2酸化層の酸素濃度をC2としたとき、C2/C1が2以上10以下である流路部材。 - 前記第1酸化層が、前記第2酸化層より厚い請求項1に記載の流路部材。
- 前記第2酸化層が、前記第1酸化層より厚い請求項1に記載の流路部材。
- 前記流路は、前記流出口に繋がる流出路と、該流出路および前記流入口の間の流通路とを有し、該流通路における前記第2酸化層の厚みは、前記流出路における前記第2酸化層の厚みよりも厚い請求項1乃至請求項3のいずれかに記載の流路部材。
- 非酸化物セラミックスからなる基体の内部に、流入口と流出口とを備える流路を有し、前記基体の外面に第1酸化層、前記流路を構成する前記基体の内面に、第2酸化層を備え、
前記流路は、前記流出口に繋がる流出路と、該流出路および前記流入口の間の流通路とを有し、該流通路における前記第2酸化層の厚みは、前記流出路における前記第2酸化層の厚みよりも厚い流路部材。 - 前記非酸化物セラミックスが、炭化珪素質セラミックスである請求項1乃至請求項5のいずれかに記載の流路部材。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015169293 | 2015-08-28 | ||
JP2015169293 | 2015-08-28 | ||
PCT/JP2016/075032 WO2017038700A1 (ja) | 2015-08-28 | 2016-08-26 | 流路部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017038700A1 JPWO2017038700A1 (ja) | 2018-07-26 |
JP6616421B2 true JP6616421B2 (ja) | 2019-12-04 |
Family
ID=58188582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017537852A Active JP6616421B2 (ja) | 2015-08-28 | 2016-08-26 | 流路部材 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10684081B2 (ja) |
EP (1) | EP3326988B1 (ja) |
JP (1) | JP6616421B2 (ja) |
KR (1) | KR102109491B1 (ja) |
WO (1) | WO2017038700A1 (ja) |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5946493A (ja) * | 1982-09-10 | 1984-03-15 | Toshiba Ceramics Co Ltd | 炭化珪素質熱交換器 |
US5004629A (en) * | 1989-06-16 | 1991-04-02 | General Electric Company | Transfer tube |
JPH07211832A (ja) * | 1994-01-03 | 1995-08-11 | Motorola Inc | 電力放散装置とその製造方法 |
US6436363B1 (en) | 2000-08-31 | 2002-08-20 | Engelhard Corporation | Process for generating hydrogen-rich gas |
US6783824B2 (en) * | 2001-01-25 | 2004-08-31 | Hyper-Therm High-Temperature Composites, Inc. | Actively-cooled fiber-reinforced ceramic matrix composite rocket propulsion thrust chamber and method of producing the same |
US6929852B2 (en) * | 2002-08-08 | 2005-08-16 | Siemens Westinghouse Power Corporation | Protective overlayer for ceramics |
EP1721880A1 (en) | 2004-02-09 | 2006-11-15 | Tokuyama Corporation | Metallized ceramic molding, process for producing the same and peltier device |
US7593229B2 (en) * | 2006-03-31 | 2009-09-22 | Hong Kong Applied Science & Technology Research Institute Co. Ltd | Heat exchange enhancement |
WO2009051735A2 (en) * | 2007-10-18 | 2009-04-23 | Roberts, Wayne | High efficiency, corrosion resistant heat exchanger and methods of use thereof |
JP2010173873A (ja) | 2009-01-28 | 2010-08-12 | Kyocera Corp | セラミック接合体およびこれを用いた支持部材 |
TW201043910A (en) * | 2009-06-03 | 2010-12-16 | High Conduction Scient Co Ltd | Water-cooling device and its manufacturing method |
DE102010004960A1 (de) * | 2010-01-20 | 2011-07-21 | J. Eberspächer GmbH & Co. KG, 73730 | Rohrkörper und Abgasanlage |
WO2012030557A1 (en) * | 2010-08-31 | 2012-03-08 | Corning Incorporated | Cellular ceramic articles with coated channels and methods for making the same |
US20120160361A1 (en) * | 2010-12-28 | 2012-06-28 | George Fischer | Construction and Manufacturing of Long Tubes with Embedded Corrosion- and Wear-Resistant Coatings Applied Directly to the Interior Surfaces |
JP6005930B2 (ja) * | 2011-07-28 | 2016-10-12 | 京セラ株式会社 | 流路部材、これを用いた熱交換器および電子部品装置ならびに半導体製造装置 |
JP5832212B2 (ja) * | 2011-09-21 | 2015-12-16 | 京セラ株式会社 | 流路部材およびこれを備える熱交換器 |
JP5869399B2 (ja) * | 2012-03-29 | 2016-02-24 | 京セラ株式会社 | 流路部材およびこれを用いた熱交換器ならびに半導体装置 |
JP5969325B2 (ja) * | 2012-08-30 | 2016-08-17 | 京セラ株式会社 | 流路部材およびこれを用いた電子装置 |
US9255036B2 (en) * | 2013-03-15 | 2016-02-09 | Corning Incorporated | Cellular ceramic article and method for manufacturing the same |
WO2015080839A1 (en) * | 2013-11-26 | 2015-06-04 | United Technologies Corporation | Gas turbine engine component coating with self-healing barrier layer |
US9199269B2 (en) * | 2014-02-14 | 2015-12-01 | Arthur Mark Krawczyk | Pipe painting process |
-
2016
- 2016-08-26 JP JP2017537852A patent/JP6616421B2/ja active Active
- 2016-08-26 US US15/755,604 patent/US10684081B2/en active Active
- 2016-08-26 EP EP16841732.7A patent/EP3326988B1/en active Active
- 2016-08-26 KR KR1020187004933A patent/KR102109491B1/ko active IP Right Grant
- 2016-08-26 WO PCT/JP2016/075032 patent/WO2017038700A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP3326988A1 (en) | 2018-05-30 |
EP3326988A4 (en) | 2018-09-05 |
EP3326988B1 (en) | 2019-11-06 |
US10684081B2 (en) | 2020-06-16 |
KR102109491B1 (ko) | 2020-05-12 |
JPWO2017038700A1 (ja) | 2018-07-26 |
KR20180030689A (ko) | 2018-03-23 |
WO2017038700A1 (ja) | 2017-03-09 |
US20190024991A1 (en) | 2019-01-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI599553B (zh) | Cooling plate, method of manufacturing the same, and device for semiconductor manufacturing apparatus | |
JP2019504470A (ja) | 耐食性構成部品および製造方法 | |
US20070261778A1 (en) | Method for the Production of a Metal-Ceramic Substrate or Copper-Ceramic Substrate, and Support to be Used in Said Method | |
TW201506000A (zh) | 冷卻板、其製法以及半導體製造裝置用元件 | |
KR101276506B1 (ko) | 표면 처리 세라믹스 부재, 그 제조 방법 및 진공 처리 장치 | |
KR20060103146A (ko) | 질화알루미늄 소결체, 반도체 제조용 부재 및 질화알루미늄소결체의 제조 방법 | |
JP7208326B2 (ja) | 熱交換器 | |
WO2002042241A1 (fr) | Corps fritte de nitrure d'aluminium, procede de production d'un corps fritte de nitrure d'aluminium, substrat ceramique et procede de production d'un substrat ceramique | |
JP5154141B2 (ja) | 希土類酸化物含有溶射基板及び積層板 | |
TWI816975B (zh) | 燒成夾具 | |
JP6616421B2 (ja) | 流路部材 | |
JP4381207B2 (ja) | 反応焼結炭化ケイ素構造体の製造方法 | |
US9953898B2 (en) | Flow channel member, and heat exchanger and semiconductor module each using same | |
JP6025586B2 (ja) | セッターの製造方法 | |
JP6363485B2 (ja) | セラミック流路体およびこれを備える熱交換器 | |
JP5085575B2 (ja) | 反応焼結炭化ケイ素構造体の製造方法 | |
JP6401012B2 (ja) | セラミック基体 | |
JP6290635B2 (ja) | 流路部材およびこれを用いた熱交換器ならびに半導体製造装置 | |
JP6934342B2 (ja) | 炭化珪素部材の製造方法 | |
JP6352773B2 (ja) | 熱交換用部材および熱交換器 | |
WO2021201108A1 (ja) | 流路部材およびその製造方法 | |
US12145891B2 (en) | Ceramic structural body | |
JP6678473B2 (ja) | スクレーパ | |
JP6980607B2 (ja) | 熱交換器および熱交換システム | |
JP2003183089A (ja) | セラミック積層品、セラミック積層品の製造方法およびセラミック積層体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180205 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190409 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190606 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20191008 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191107 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6616421 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |