JP6408949B2 - Deposition equipment - Google Patents

Description

  The present invention relates to a film forming apparatus for forming a film on a surface of a substrate.

  Conventionally, in a film forming apparatus that continuously forms a film on the surface of a belt-like substrate wound around a film forming roller, a plurality of film forming zones are formed inside the chamber, and individual film forming is performed for each film forming zone. There is a film forming apparatus that enables film formation under film conditions (for example, pressure, component of material gas). In such a film forming apparatus, the pressure inside each film forming zone needs to be maintained at a pressure determined for each film forming zone while maintaining a pressure higher than that outside the film forming zone.

  Therefore, conventionally, as described in Patent Document 1, in order to form a film formation zone, a plurality of covers that cover the outer peripheral surface of the film formation roller are provided. Each cover has a wall facing the outer peripheral surface of the film forming roller (hereinafter referred to as a roller facing wall) and a partition wall extending outward in the radial direction of the film forming roller. The roller facing wall and the partition wall of the cover form a film forming zone on the outer side in the radial direction of the film forming roller on the roller facing wall. In each film formation zone, an evaporation source for sputtering is arranged.

  The roller facing wall is formed with an opening through which particles of the film forming material jumping out of the evaporation source pass toward the base material. The roller facing wall is arranged at a position spaced outward in the radial direction of the film forming roller. That is, a gap is formed between the surface facing the inner side in the radial direction of the film forming roller on the roller facing wall and the outer peripheral surface of the film forming roller. When the gas inside the film formation zone passes through the opening of the roller facing wall during the film formation process, the setting of the size of this gap limits the flow rate of the gas that flows out of the film formation zone along the outer peripheral surface of the film formation roller. It is possible. As a result, the pressure inside the film formation zone can be maintained at a pressure higher than the pressure outside the film formation zone during the film formation operation.

  In the film forming process, when particles of the film forming material are ejected from the evaporation source inside the film forming zone, the particles collide with the base material on the outer peripheral surface of the film forming roller through the opening of the roller facing wall. Thereby, it is possible to form a thin film on the substrate surface. In order to prevent the particles from adhering to the roller facing wall of the cover during film formation, the mask having an opening is formed on the opposite side of the roller facing wall to the film forming roller, that is, on the roller facing wall. It is attached to the surface facing the radially outer side of the roller. The opening width of the mask (the width in the width direction of the film forming roller) defines the range in which the thin film formed on the substrate surface is formed.

JP 2014-65932 A

  In the film forming apparatus described in Patent Document 1, in the cover for forming the film forming zone, the surface facing the radially inner side of the film forming roller on the roller facing wall is radially outward with respect to the outer peripheral surface of the film forming roller. It is arranged at a position separated by the width of the gap. Therefore, the mask disposed on the surface facing the radially outer side of the film forming roller on the roller facing wall is separated from the outer peripheral surface of the roller by a distance obtained by adding the thickness of the roller facing wall and the gap. Therefore, when the distance between the mask and the outer peripheral surface of the film forming roller is increased, particles from the evaporation source are likely to spread outside the opening width of the mask after passing through the opening of the mask. The amount of particles spreading outside the mask opening width and adhering to the substrate is less than the amount of particles adhering to the substrate within the range of the mask opening width. As a result, at the both end portions in the width direction of the base material during film formation, there is a possibility that a region where the thickness of the thin film to be formed is thin is larger outside the opening width of the mask. For this reason, it is difficult to improve the thickness distribution of the thin film.

  The present invention has been made in view of the above circumstances, and can suppress the distance between the mask and the outer peripheral surface of the film forming roller and improve the thickness distribution of the thin film to be formed. An object is to provide a membrane device.

A film forming apparatus according to claim 1 of the present invention is a film forming apparatus that continuously forms a film on the surface of a belt-like substrate using a gas, and is attached to a chamber and the inside of the chamber so as to be rotatable. The film forming roller having an outer peripheral surface capable of contacting the substrate and the film forming roller fixed to the chamber and disposed at a position with a gap between the film forming roller on both sides in the width direction of the film forming roller. A pair of partition walls, a circumferential direction limiting portion for forming at least one film formation zone facing the outer peripheral surface of the film forming roller inside the chamber, and an outer peripheral surface of the film forming roller inside the film forming zone And a mask having an opening that defines the width of the thin film formed by the film formation on the surface of the base material, and the partition wall extends radially outward of the film formation roller. A facing outer surface, An inner side surface facing the radially inner side of the roller, the mask is attached to the outer side surface of the partition wall, and the inner side surface of the partition wall is more than the outer peripheral surface of the film forming roller The film forming roller is located on the inner side in the radial direction of the film forming roller, and on the outer side of the film forming roller in the width direction of the outer peripheral surface, along the circumferential direction of the film forming roller. An annular groove extending in the direction is formed, and the partition wall has an annular shape that can be inserted into the annular groove, and the partition wall is inserted into the groove and the inner wall of the groove Between the inner surface of the partition wall and the inner wall of the groove facing it, the gap in the width direction is Width direction that restricts gas flow in the width direction of the film forming roller Forming a tract, characterized in that.

In the configuration according to claim 1 of the present invention, the mask and the outer peripheral surface of the film forming roller are brought close to each other while forming a gap allowing the gas to flow in the width direction between the partition wall and the film forming roller. This improves the thickness distribution of the thin film formed. Specifically, according to the above configuration, the inner surface of the partition wall facing the inner side in the radial direction of the film forming roller is located on the inner side in the radial direction of the film forming roller from the outer peripheral surface of the film forming roller. That is, the outer peripheral surface of the film forming roller and the inner surface of the partition wall overlap in the radial direction of the film forming roller. Furthermore, the mask disposed inside the film formation zone formed inside the chamber is attached to the outer surface of the partition wall facing the outer side in the radial direction of the film formation roller. Therefore, the distance between the mask and the outer peripheral surface of the film forming roller can be reduced to a distance smaller than the thickness of the partition wall (that is, the distance between the outer surface and the inner surface). As a result, it is possible to reduce the area where the film thickness is thin at both ends in the width direction of the substrate during film formation, improving the thickness distribution of the thin film and improving the film thickness uniformity. In addition, the partition walls fixed to the chamber are arranged at positions on the both sides of the film forming roller in the width direction with a gap between the film forming rollers. This gap can function as a width direction flow path that restricts the flow of gas from the outer peripheral surface of the film formation roller to the outside in the width direction of the film formation roller.
Further, in the above configuration, the mask and the outer peripheral surface of the film forming roller are formed with an annular partition wall having a simple shape, while forming a gap allowing the gas to flow in the width direction between the partition wall and the film forming roller. Can be made closer to each other to improve the thickness distribution of the thin film formed. Further, since the annular partition has a simple shape, it can be easily manufactured with high accuracy. Furthermore, the annular partition is inserted into an annular groove formed on the outer side in the width direction of the outer peripheral surface of the film forming roller, so that the inner surface of the annular partition It is possible to be positioned on the inner side in the radial direction of the film forming roller from the outer peripheral surface. Therefore, it is possible to secure the thickness of the partition wall and thereby improve the rigidity of the partition wall. In addition, since an annular gap is formed uniformly between the annular partition and the inner wall of the groove, the amount of gas passing through the gap can be made uniform over the entire circumference of the film forming roller. is there.
Further, in the above configuration, the gap has a width direction gap formed between the inner surface of the partition wall and the inner wall of the groove facing the partition wall, and the width direction gap is a width direction of the film forming roller. A width direction flow path that restricts the flow of gas to is formed.

  Furthermore, it is preferable that the annular partition is constituted by a plurality of arc-shaped portions separated from each other.

  According to such a configuration, it is possible to easily assemble the annular partition wall into the chamber by fixing the arc-shaped portions constituting the annular partition wall to the chamber after the film forming roller is assembled in the chamber. . That is, in the case of an annular partition wall that is continuous over the entire circumference, the partition wall is attached to both sides of the film formation roller before the film formation roller is assembled in the chamber, and then the film formation roller with the partition wall attached is assembled in the chamber. It is necessary and the assembly work is complicated. On the other hand, as described above, in the case of the annular partition wall constituted by a plurality of arc-shaped portions separated from each other, the partition wall can be easily assembled into the chamber after the film formation roller is assembled in the chamber. Is possible.

A film forming apparatus according to claim 3 of the present invention is a film forming apparatus that continuously forms a film on the surface of a belt-like substrate using a gas, and is attached to a chamber and the inside of the chamber so as to be rotatable. The film forming roller having an outer peripheral surface capable of contacting the substrate and the film forming roller fixed to the chamber and disposed at a position with a gap between the film forming roller on both sides in the width direction of the film forming roller. A pair of partition walls, a circumferential direction limiting portion for forming at least one film formation zone facing the outer peripheral surface of the film forming roller inside the chamber, and an outer peripheral surface of the film forming roller inside the film forming zone And a mask having an opening that defines the width of the thin film formed by the film formation on the surface of the base material, and the partition wall extends radially outward of the film formation roller. A facing outer surface, Has an inner surface facing radially inward of the rollers, the inner surface of the partition wall than the outer peripheral surface of the deposition roller located radially inwardly of the film-forming roller, said partition wall, A body portion fixed to the chamber and disposed at a position spaced in the width direction from both end portions in the width direction of the film forming roller, and having a body portion having the outer surface and the inner surface, and extending from the body portion to the outer surface. And the mask is attached to the outer surface of the main body , and the gap is formed between the extension and the outer peripheral surface of the film forming roller facing the extension. There is a gap, and the width direction gap forms a width direction flow path that restricts the flow of gas in the width direction of the film forming roller.

In the configuration according to the third aspect of the present invention, as in the configuration according to the first aspect, a gap is formed between the partition wall and the film forming roller so as to allow a gas to flow in the width direction. The thickness distribution of the thin film to be formed is improved by bringing the outer peripheral surface of the film forming roller closer to each other. Specifically, according to the above configuration, the inner surface of the partition wall facing the inner side in the radial direction of the film forming roller is located on the inner side in the radial direction of the film forming roller from the outer peripheral surface of the film forming roller. That is, the outer peripheral surface of the film forming roller and the inner surface of the partition wall overlap in the radial direction of the film forming roller. Furthermore, the mask disposed inside the film formation zone formed inside the chamber is attached to the outer surface of the partition wall facing the outer side in the radial direction of the film formation roller. Therefore, the distance between the mask and the outer peripheral surface of the film forming roller can be reduced to a distance smaller than the thickness of the partition wall (that is, the distance between the outer surface and the inner surface). As a result, it is possible to reduce the area where the film thickness is thin at both ends in the width direction of the substrate during film formation, improving the thickness distribution of the thin film and improving the film thickness uniformity. In addition, the partition walls fixed to the chamber are arranged at positions on the both sides of the film forming roller in the width direction with a gap between the film forming rollers. This gap can function as a width direction flow path that restricts the flow of gas from the outer peripheral surface of the film formation roller to the outside in the width direction of the film formation roller.
In addition, according to the above configuration, the main body portion of the partition wall is positioned in the width direction of the film forming roller so that the inner side surface thereof can be positioned on the radially inner side of the film forming roller with respect to the outer peripheral surface of the film forming roller. It arrange | positions in the position spaced apart from the both ends in the said width direction. Thereby, the mask attached to the outer surface of the main body can be brought closer to the outer peripheral surface of the film forming roller, and the thickness distribution of the formed thin film can be improved. That is, the main body portion of the partition wall is disposed at a position spaced in the width direction from both end portions in the width direction of the film forming roller, and the mask is attached to the outer surface of the main body portion. Therefore, the distance between the mask and the outer peripheral surface of the film forming roller can be reduced to a distance smaller than the thickness of the main body (that is, the distance between the outer surface and the inner surface). In addition, the inner side surface of the main body can be positioned radially inward of the film forming roller with respect to the outer peripheral surface of the film forming roller, ensuring the thickness of the main body, thereby improving the rigidity of the partition wall. It is possible.
Further, in the above configuration, the extension of the partition wall extends along the outer surface from the main body, and forms a gap with the outer peripheral surface of the film forming roller. Since this gap functions as a width direction flow path, it is possible to restrict the gas flow outward in the width direction of the film forming roller. That is, in this configuration, the gap has a widthwise gap formed between the extension and the outer peripheral surface of the film forming roller facing the extension, and the widthwise gap is a gas in the width direction of the film forming roller. The width direction flow path which restricts the flow of the is formed.

  Moreover, it is preferable that the said circumferential direction restriction | limiting part is attached to the said outer surface of the said partition.

  The partition wall is fixed to the chamber so that it is positioned with high accuracy inside the chamber. For this reason, the circumferential direction restricting portion is attached to the outer surface of the partition wall, so that the circumferential direction restricting portion can be easily and accurately disposed at a position facing the outer peripheral surface of the film forming roller.

  Further, the circumferential direction restricting portion has an inter-zone exhaust plate facing the outer peripheral surface of the film forming roller, and the inter-zone exhaust plate forms a gap with respect to the outer peripheral surface of the film forming roller. In a secured state, it is preferably fixed to the outer surface of the partition wall.

  According to such a configuration, the inter-zone exhaust plate can be easily secured with a uniform gap with respect to the peripheral surface of the film forming roller by being fixed to the outer surface of the partition wall.

  As described above, according to the film forming apparatus of the present invention, the distance between the mask and the outer peripheral surface of the film forming roller can be suppressed, and the thickness distribution of the formed thin film can be improved.

It is a front view which shows typically the internal structure of the film-forming apparatus which concerns on embodiment of this invention. It is a perspective view which shows the chamber inside of the film-forming apparatus of FIG. It is a perspective view of the film-forming roller of FIG. It is a perspective view which shows the film-forming roller of FIG. 1, a partition ring, and the exhaust plate between zones. It is a disassembled perspective view of the partition structure which shows the procedure of the assembly of the partition structure of FIG. 1, and the attachment of a mask. FIG. 6 is a perspective view of the mask and its peripheral portion showing a state where the mask of FIG. 5 is attached. 7A is a cross-sectional view taken along the line VII-VII in FIG. 1, and FIG. 7B is an enlarged view of the vicinity of the partition ring in FIG. 7A. It is sectional drawing which shows the state by which the partition ring of FIG. 1 was fixed to the chamber. FIG. 9A is a diagram showing a state in which film formation by sputtering is performed on the substrate surface using the mask of FIG. 8, and FIG. 9B is the thickness of the film formed on the substrate surface in FIG. 9A. It is a graph which shows the relationship between the position of the width direction of a base material. It is sectional drawing which shows arrangement | positioning of the mask in the film-forming zone of FIG. It is an expanded sectional view of the mask vicinity of FIG. FIG. 2 is a perspective explanatory view showing a state in which the gas inside the film formation zone of FIG. 1 is exhausted to the outside of the film formation zone in the width direction and the circumferential direction of the film formation roller. It is a section explanatory view showing the state where the partition ring suitable for the film-forming roller without a groove concerning other embodiments of the present invention is arranged. FIG. 14A shows a comparative example of the present invention, in which a partition ring is arranged on the outer side in the radial direction of the outer peripheral surface of the film forming roller, and a film is formed by sputtering on the substrate surface in a state where a mask is attached to the partition ring. FIG. 14B is a graph showing the relationship between the thickness of the film formed on the substrate surface of FIG. 14A and the position in the width direction of the substrate.

  Hereinafter, embodiments of the film forming apparatus of the present invention will be described in more detail with reference to the drawings.

  The film forming apparatus 1 shown in FIGS. 1 and 2 is an apparatus that continuously forms a thin film on the surface of a strip-shaped substrate B using a gas G in a plurality (four in FIG. 1) of film forming zones 11. . The film forming apparatus 1 may be an apparatus that continuously forms a thin film on the surface of the base material B using the gas G, and a film forming apparatus that performs sputtering, vacuum evaporation, plasma CVD, or the like is used. In the following embodiments, a film forming apparatus 1 that performs sputtering will be described as an example.

  The film forming apparatus 1 is disposed in a chamber 2, a film forming roller 3 that is rotatably mounted inside the chamber 2, a partition wall structure 4 that forms a plurality of film forming zones 11, and each film forming zone 11. The mask 5 and the evaporation source 6, the unwinding unit 7 for unwinding the substrate B from the roll of the substrate B to the film forming roller 3, and the winding unit 8 for winding the substrate B after film formation into a roll. It has.

  The base material B is made of resin, metal, glass, or the like and may be a thin strip.

  The chamber 2 is a hollow housing having an internal space 2a. The chamber 2 is connected to pumps 13 and 15 such as a turbomolecular pump (abbreviation: TMP) or a vacuum pump as exhaust means.

  The internal space 2 a of the chamber 2 is partitioned into five spaces, that is, four film formation zones 11 and one transfer zone 12 by the film formation roller 3 and the partition structure 4. The four film formation zones 11 are film formation areas where the film formation of the base material B is performed on the surface of the film formation roller 3. Note that at least one film formation zone 11 is sufficient. The number of deposition zones may be one or more. The conveyance zone 12 is a non-film formation area where the base material B is not formed, and the unwinding unit 7 and the winding unit 8 are accommodated therein.

  Each film formation zone 11 is provided with a gas supply port 14. A gas G such as argon or oxygen used in film formation by sputtering is supplied to each film formation zone 11 through a gas supply port 14. Since each film formation zone 11 is connected to a pump 13, the pressure in each film formation zone 11 can be adjusted individually. The evaporation source 6 installed in each film formation zone 11 is selected according to the type of thin film formed in each film formation zone 11. A plurality of pumps 13 may be connected to each film formation zone 11 and arranged side by side in the width direction of the film formation roller 3.

  A pump 15 is connected to the transport zone 12. Thereby, the conveyance zone 12 is decompressed to a vacuum state or a low pressure state. A plurality of pumps 15 may be connected to the transport zone 12.

Each film formation zone 11 communicates with the transport zone 12 via a width direction flow path 36 and a circumferential direction flow path 37 shown in FIG. The dimensions of the width direction flow path 36 and the circumferential direction flow path 37 are set according to the shape and mounting position of the partition wall structure 4. By setting the dimensions of the width direction flow path 36 and the circumferential direction flow path 37, the amount of the exhaust gas E flowing outside the film formation zone 11 is limited. For example, in the case of the film forming apparatus 1 that performs sputtering, the film forming zone 11 is maintained at a higher pressure than the inside of the transfer zone 12. In this case, for example, the pressure in the film formation zone 11 is about 0.3 to 0.5 Pa, and the pressure in the transfer zone 12 is a base pressure that is lower than that, for example, 10 ⁻³ to 10 ^−4. It is set to about Pa. Before the film formation process, the pressure in all the film formation zones 11 and the transfer zone 12 is lowered to about 10 ⁻³ to 10 ⁻⁴ Pa by the pump 15. In the case of the film forming apparatus 1 that performs CVD, the film forming zone 11 may be set at a lower pressure (negative pressure) than the inside of the transfer zone 12 so that dirty gas does not flow out of the film forming zone 11. .

  As shown in FIG. 3, the film forming roller 3 has a cylindrical shape (so-called stepped cylindrical shape) in which both ends are partially small in diameter. That is, the film-forming roller 3 is a circle formed on the outer peripheral surface 3a that can come into contact with the base material B and the outer portion of the film-forming roller 3 in the width direction D1 with respect to both ends of the outer peripheral surface 3a in the width direction D1. And an annular groove 3b. The outer peripheral surface 3a is polished and smooth so as not to damage the base material B. The annular groove 3 b extends over the entire circumference of the film forming roller 3 along the circumferential direction D <b> 2 of the film forming roller 3. The groove 3b in FIG. 3 is open to the outside in the width direction D1, but may be closed.

  The film forming rollers 3 are each made of a metal such as stainless steel. The film forming roller 3 is rotatably mounted inside the chamber 2. That is, both end portions 3c (see FIG. 7) of the rotation shaft O of the film forming roller 3 are connected to the first mounting portion 2b and the second mounting portion 2c provided on the pair of opposite side walls of the chamber 2 via the bearings 31. (See FIG. 7).

  The film forming roller 3 may be temperature adjusted. For example, as shown in FIG. 7, the temperature of the film forming roller 3 is adjusted by supplying and discharging the liquid medium M to and from the space (not shown) inside the film forming roller 3 through the pipe 32. It is possible. By forming the film forming roller 3 at a high temperature or a low temperature, it is possible to form a film on the substrate B with good film quality and good adhesion. A gap around the pipe 32 is sealed by a seal member 33.

  The belt-like base material B is sequentially conveyed to each film formation zone 11 while being wound around the outer peripheral surface 3 a of the film formation roller 3.

As shown in FIGS. 1 and 2 and 6, the partition wall structure 4 includes a pair of ring partition walls 21 provided on both sides of the film forming roller 3 in the width direction D <b> 1 and a periphery attached to the pair of ring partition walls 21. And a direction restriction unit 22. The circumferential direction restricting portion 22 includes an inter-zone exhaust plate 24 described later,
It has a differential exhaust cover 25 and a partition plate 26 (see FIGS. 2 and 6).

  As shown in FIG. 4, the pair of ring partition walls 21 has an annular shape that can be inserted into the annular groove 3 b. In the present embodiment, as shown in FIG. 5, the annular ring partition wall 21 is composed of a plurality of arc-shaped portions 21 </ b> A and 21 </ b> B that are separated from each other.

  The ring partition wall 21 is a highly rigid member that is not easily deformed by heat. For example, the ring partition wall 21 is a member made of steel or the like and having a thickness of about 10 mm.

  As shown in FIGS. 7 to 8, the ring partition wall 21 has an outer surface 21 a facing the radially outer side R <b> 1 of the film forming roller 3 and an inner side surface 21 b facing the radially inner side R <b> 2 of the film forming roller 3. Yes. The ring partition wall 21 is fixed to the side wall of the chamber 2 via a fixing member 35 such as a bracket. The ring partition walls 21 are respectively inserted into the grooves 3b at both ends of the film forming roller 3 so that the inner side surface 21b is located on the radially inner side R2 of the film forming roller 3 with respect to the outer peripheral surface 3a of the film forming roller 3. Thus, the ring partition wall 21 is disposed at a position where a gap 36 is opened between the inner wall of the groove 3b (that is, the width direction wall 3b1 and the radial direction wall 3b2). The gap 36 includes a widthwise gap 36a between the inner side surface 21b of the ring partition wall 21 and the widthwise wall 3b1 of the groove 3b, and a radial direction gap 36b between the side surface of the ring partition wall 21 and the radial wall 3b2 of the groove 3b. And have.

  The gap 36 forms a width direction flow path 36 that restricts the flow of gas from the outer peripheral surface 3 a of the film forming roller 3 to the outside in the width direction D1 of the film forming roller 3. In other words, the film formation roller 3 and the ring partition wall 21 form a pressure barrier in the width direction of the film formation roller 3 for separating each film formation zone 11 from the outside.

  Since the ring partition wall 21 is fixed to the chamber 2, the ring partition wall 21 can function as a reference for the assembly position of the circumferential direction limiting portion 22 while ensuring the dimensional accuracy of the gap 36.

  As shown in FIG. 7 (b), the ring partition wall 21 and the width direction wall 3b1 of the groove 3b are processed with high accuracy, so that the ring partition wall 21 and the width direction wall 3b1 form the entire circumference of the film forming roller 3. The width direction gap 36a can set the width c1 with high accuracy. Therefore, it is possible to limit the amount of gas passing through the width direction gap 36 a with high accuracy over the entire circumference of the film forming roller 3.

  As shown in FIGS. 1 and 2 and FIGS. 11 to 12, the circumferential direction restricting portion 22 faces the outer peripheral surface 3 a of the film forming roller 3 by restricting the gas flow in the circumferential direction D <b> 2 of the film forming roller 3. At least one (four in FIG. 1) deposition zone 11 is formed inside the chamber 2.

  The circumferential direction restricting portion 22 is attached to the outer side surface 21 a of the ring partition wall 21. Specifically, the circumferential direction restricting portion 22 includes an inter-zone exhaust plate 24 facing the outer peripheral surface 3a of the film forming roller 3 and a differential exhaust cover disposed on both sides of the inter-zone exhaust plate 24 in the circumferential direction D2. 25 and a partition plate 26.

  The inter-zone exhaust plate 24 is a plate-like member having an opening 24a as shown in FIG. 4 and FIGS. The inter-zone exhaust plate 24 extends along the width direction D1 of the film forming roller 3 and is fixed to the pair of ring partition walls 21 with screws or the like. The inter-zone exhaust plate 24 is disposed with a gap with respect to the outer peripheral surface 3 a of the film forming roller 3. The width of the inter-zone exhaust plate 24 is about the same as the width of the film forming roller 3 and is large enough to allow a gap 28 (see FIG. 2) between the inter-zone exhaust plate 24 and the side wall of the chamber 2. Is set.

  The differential exhaust cover 25 is a thin plate member as shown in FIGS. 1-2 and 5-6. Similar to the inter-zone exhaust plate 24, the differential exhaust cover 25 extends along the width direction D <b> 1 of the film forming roller 3, and is fixed to the pair of ring partition walls 21 by screws or the like. It arrange | positions in the state which opened the clearance gap with respect to 3a.

  A circumferential flow path 37 that allows the flow of the exhaust gas E from the film formation zone 11 in the circumferential direction D2 by the gap between the outer peripheral surface 3a of the film formation roller 3 and the differential exhaust cover 25 and the inter-zone exhaust plate 24. (See FIGS. 11 to 12).

The differential exhaust covers 25 are respectively arranged on both sides of each film formation zone 11 in the circumferential direction D2. That is, the differential exhaust cover 25 is disposed on both sides of the inter-zone exhaust plate 24 in the circumferential direction D2. Thus, a differential exhaust zone 27 (see FIGS. 1 and 2), which is an exhaust passage, is formed between the film formation zones 11 by the pair of differential exhaust covers 25 and the inter-zone exhaust plate 24.
The differential exhaust zone 27 communicates with each film formation zone 11 via the opening 24a of the inter-zone exhaust plate 24 and the circumferential flow path 37 (see FIG. 12). The differential exhaust zone 27 communicates with the transfer zone 12 through a gap 28 (see FIG. 2) between the inter-zone exhaust plate 24 and the side wall of the chamber 2. The dimensions of the gap and the opening 24a are set so that the pressure in the differential exhaust zone 27 is between the pressure in the transport zone 12 and the pressure in the film formation zone 11 higher than that. Due to these pressure differences, the exhaust gas E can flow in the order of the film formation zone 11, the differential exhaust zone 27, and the transfer zone 12, as shown in FIG.

  Further, the differential exhaust cover 25 is also arranged at a position where the film formation zone 11 and the transfer zone 12 shown in FIG.

  As shown in FIG. 2 and FIGS. 5 to 6, the partition plate 26 prevents the gas inside the film formation zone 11 from leaking from paths other than the width direction flow path 36 and the circumferential direction flow path 37 (see FIG. 12). It is a member. As shown in FIG. 5, the partition plate 26 includes a circumferential portion 26 a extending in the circumferential direction of the film forming roller 3 and a width direction portion 26 b extending in the width direction of the film forming roller 3. The circumferential portion 26 a is disposed so as to close the gap between the ring partition wall 21 and the side wall of the chamber 2 on the outer side in the width direction of the film forming roller 3 than the ring partition wall 21. The circumferential portion 26a is fixed to the ring partition wall 21 with screws or the like. The width direction portion 26 b has a width larger than the width of the film forming roller 3. The width direction portion 26b is fixed to the pair of ring partition walls 21 with screws or the like. Both end portions of the width direction portion 26 b protrude outward in the width direction from the pair of ring partition walls 21 and abut against the side wall of the chamber 2.

  As described above, the constituent members of the circumferential direction restricting portion 22 (that is, the inter-zone exhaust plate 24, the differential exhaust cover 25, and the partition plate 26) are attached to the ring partition 21 having high rigidity. With reference to the ring partition wall 21, it is accurately positioned inside the chamber 2. Therefore, these inter-zone exhaust plate 24, differential exhaust cover 25, and partition plate 26 are not required to have high rigidity, and can be manufactured at low cost using a thin aluminum plate or the like.

  The partition wall structure 4 of the present embodiment is composed of a pair of high-rigidity ring partition walls 21 and a circumferential direction restricting portion 22 attached to the outer surface 21a of the ring partition wall 21. Compared with the case where the partition wall structure is constructed, it can be easily manufactured with high accuracy so that thermal distortion does not occur.

  When assembling the partition structure 4, as shown in FIG. 5, with respect to the outer peripheral surface 21 a of the ring partition wall 21, as shown in the order indicated by the reference numerals 1 to 4 circled in FIG. 5, The partition structure 4 is assembled by attaching the first: inter-zone exhaust plate 24, the second: differential exhaust cover 25, and the third: partition plate 26 in this order. Then, the mask 5 is attached to the outer peripheral surface 21a of the ring partition wall 21 as the fourth.

  As shown in FIGS. 2 and 5 to 6, the mask 5 is a thin plate-like member having an opening 5 a. The width of the opening 5a (that is, the width in the width direction D1 of the film forming roller 3) defines the width of the thin film formed by film formation on the surface of the substrate B.

  The mask 5 is disposed inside the film forming zone 11 so as to face the outer peripheral surface 3 a of the film forming roller 3 while allowing a gap between the mask 5 and the outer peripheral surface 3 a of the film forming roller 3. The mask 5 extends along the width direction D1 of the film forming roller 3, and is fixed to the outer side surfaces 21a of the pair of ring partition walls 21 by screws or the like.

  The mask 5 is a part different from the partition wall structure 4 attached to the partition wall structure 4. The mask 5 prevents the deposition material from adhering to the partition wall structure 4 and makes the thin film formed on the surface of the base material B uniform in the width direction of the base material B. The mask 5 is replaced for each batch process of the film formation process (for example, after the film formation process for one roll of the base material B is completed).

  In the present embodiment, as shown in FIG. 7B, a spacer 34 is provided between the mask 5 and the ring partition wall 21. The spacer 34 adjusts the gap c <b> 3 between the mask 5 and the ring partition wall 21. By selecting the spacers 4 having different thicknesses, the gap between the mask 5 and the ring partition wall 21 can be adjusted in accordance with the thickness of the base material B. Further, in consideration of the thermal load of the base material B at the time of film formation, it is possible to adjust by selecting the spacer 4 when it is desired to widen the gap between the mask 5 and the base material B. The spacer 34 may be omitted.

  As shown in FIGS. 8 and 11 to 12, the opening 5 a of the mask 5 communicates with the width direction flow path 36 and the circumferential direction flow path 37.

  In the film forming apparatus 1, the mask 5 is attached to the outer surface 21 a of the ring partition wall 21 as shown in FIGS. Then, by inserting the ring partition wall 21 into the groove 3b of the film forming roller 3, the inner side surface 21b of the ring partition wall 21 is located on the radially inner side R2 of the film forming roller 3 with respect to the outer peripheral surface 3a of the film forming roller 3. positioned. Thereby, the distance between the mask 5 and the outer peripheral surface 3a of the film forming roller 3 is the thickness of the ring partition wall 21 (that is, the distance between the outer surface 21a and the inner surface 21b, for example, as shown in FIG. 9A). It is possible to approach a distance (for example, about 3 to 5 mm) smaller than about 10 mm). Thereby, the distance A1 between the mask 5 and the base material B can be reduced. In this state, when the particles P of the film-forming material by sputtering jump out of the range of the erosion width W of the evaporation source 6, the particles P pass outside the opening 5 a of the mask 5 and then outside the width of the opening 5 a of the mask 5. It becomes difficult to spread. More specifically, in this state, the range in which the particle P is blocked by the edge of the opening 5a (the range of the shadow) is narrow, and the range in which the particle P that has jumped out from the range of the erosion width W uniformly collides with the base material B. Becomes wider. Therefore, as shown in FIG. 9B, it is possible to reduce the region J1 where the film thickness is thin at both ends in the width direction D1 of the base material B during film formation. As a result, the thickness distribution of the thin film can be improved and the film thickness uniformity can be improved.

  On the other hand, as compared with the arrangement of the ring partition wall 21 shown in FIG. 9A of this embodiment, as a comparative example of the present invention, as shown in FIG. 14A, the inner side surface 121b of the ring partition wall 121b. Is positioned on the radially outer side R1 of the outer peripheral surface 3a of the film forming roller 3, the length obtained by adding the distance between the ring partition wall 121 and the outer peripheral surface 3a to the thickness of the ring partition wall 121 is And the outer peripheral surface 3a. Therefore, since the gap A2 between the mask 5 attached to the outer surface 121a of the ring partition wall 121 and the base material B becomes large, the film at the end in the width direction of the base material B as shown in FIG. A region J2 having a small thickness and not uniform becomes large. On the other hand, if the opening width of the mask 5 is increased in order to enlarge the region having a uniform film thickness, there is a possibility that the sputtering particles P collide with the outer peripheral surface 3a of the film forming roller 3 to form a film. In this case, in order to prevent the formation of a film on the outer peripheral surface 3a, it is necessary to use a base material B that is sufficiently wider than the effective width of the film formation (the width capable of forming a thin film having a uniform thickness) . On the other hand, as described above, in the arrangement of the ring partition wall 21 shown in FIG. 9A of the present embodiment, the gap A1 between the mask 5 and the base material B can be reduced. The film thickness nonuniformity part of the edge part becomes narrow, and it is possible to use the base material B effectively.

  When the temperature of the film forming roller 3 is adjusted, the film forming roller 3 expands and contracts in the width direction in accordance with the temperature change. Therefore, the radial gap 36b between the ring partition wall 21 and the radial wall 3b2 of the groove 3b of the film forming roller 3 ( (See FIG. 8) may vary. For example, both end portions 3c of the rotation shaft of the film forming roller 3 shown in FIG. 7A are positioned in the width direction D1 of the film forming roller 3 at the first mounting portion 2b (fixed side) of the chamber 2 due to temperature change. Is supported so as not to change, and is supported so as to allow a change in position in the width direction D1 on the second mounting portion 2c side (free side). In this embodiment, the width c2 (see FIG. 7A) of the radial gap 36b between the side wall of the ring partition wall 21 close to the second mounting portion 2c (free side) and the radial wall 3b2 of the groove 3b is the temperature. However, since the radial gap 36b on the side close to the first mounting portion 2b (fixed side) does not change, the width c2 of the radial gap 36b is different on both sides of the film forming roller 3 in the width direction.

  On the other hand, the width-direction gap 36a (see FIG. 8) between the ring partition wall 21 and the width-direction wall 3b1 of the groove 3b of the film forming roller 3 can be expanded or contracted in the width direction due to a temperature change. Since there is no fluctuation, the width c1 of the width direction gap 36a is the same on both sides in the width direction of the film forming roller 3. Therefore, by setting the width c1 of the width direction gap 36a to be smaller than the width c2 of the radial direction gap 36b, the gap 36 formed by the width direction gap 36a and the radial direction gap 36b, that is, the width direction flow path. The amount of the exhaust gas E flowing through 36 can be maintained uniformly on both sides of the film forming roller 3 in the width direction on the entire circumference of the film forming roller 3. That is, the flow rate of the exhaust gas E in the width direction can be controlled (that is, the zone separation ability can be set) by the width c1 of the width direction gap 36a.

In the present embodiment, the outer diameter of the ring partition wall 21 is made slightly larger than the maximum outer diameter of the film forming roller 3. Therefore, by assembling the ring partition wall 21 with high accuracy, the mask 5 and the circumferential direction restricting portion 22 (that is, the inter-zone exhaust plate 24, the differential exhaust cover 25, and the partition plate 26) are attached to the outer peripheral surface 21a of the ring partition wall 21. The positioning of the mask 5 and the circumferential direction restricting portion 22 becomes unnecessary only by attaching to the mask.

(Feature)
(1)
In the film forming apparatus 1 of the present embodiment, the inner side surface 21b of the ring partition wall 21 that faces the inner side R2 of the film forming roller 3 is closer to the inner side R2 of the film forming roller 3 than the outer peripheral surface 3a of the film forming roller 3. positioned. That is, the outer peripheral surface 3 a of the film forming roller 3 and the inner side surface 21 b of the ring partition wall 21 overlap in the radial direction of the film forming roller 3. Further, the mask 5 disposed inside the film formation zone 11 formed inside the chamber 2 is attached to an outer surface 21 a facing the radially outer side R 1 of the film formation roller 3 in the ring partition wall 21. Therefore, the distance between the mask 5 and the outer peripheral surface 3 a of the film forming roller 3 can be reduced to a distance smaller than the thickness of the ring partition wall 21. As a result, it is possible to reduce the area where the film thickness is thin at both ends in the width direction D1 of the base material B at the time of film formation, improve the thickness distribution of the thin film, and improve the film thickness uniformity. .

  Furthermore, since the inner side surface 21b of the ring partition wall 21 is located on the radially inner side R2 of the film forming roller 3 relative to the outer peripheral surface 3a of the film forming roller 3, the distance between the outer side surface 21a of the ring partition wall 21 and the inner side surface 21b ( That is, even if the thickness of the ring partition wall 21 is increased, interference between the ring partition wall 21 and the film forming roller 3 does not occur. Therefore, the thickness of the ring partition wall 21 can be increased to improve the rigidity of the ring partition wall 21. Is possible. Thereby, the dimension management of the width direction gap 36a formed between the inner side surface 21b of the ring partition wall 21 and the width direction wall 3b1 of the groove 3b of the film forming roller 3 can be performed with high accuracy.

  The ring partition wall 21 fixed to the chamber 2 is disposed at a position where a gap is formed between the ring partition wall 21 and the film forming roller 3 on both sides of the film forming roller 3 in the width direction D1. The gap 36 can function as a width direction flow path 36 that restricts the flow of gas from the outer peripheral surface 3 a of the film forming roller 3 to the outside in the width direction D 1 of the film forming roller 3. That is, the width direction gap 36a formed between the inner side surface 21b of the ring partition wall 21 and the width direction wall 3b1 of the groove 3b of the film forming roller 3 causes the pressure inside the film forming zone 11 to be higher than the pressure outside thereof. It is possible to function as a differential exhaust unit that can discharge the gas inside the film formation zone 11 to the outside while maintaining the same. Since the width direction gap 36a is on the circumferential surface side of the film forming roller 3, even when the temperature of the film forming roller 3 is changed, the symmetry of the size of the width direction gap 36a can be maintained. The symmetry of the gas flow rate limiting performance by the ring partition walls 21 at both ends can be maintained. Therefore, the uniformity of the exhaust distribution can be ensured.

(2)
Further, in the film forming apparatus 1 of the present embodiment, the film forming roller 3 has a portion on the outer side in the width direction D1 of the film forming roller 3 beyond both ends in the width direction D1 of the outer peripheral surface 3a of the film forming roller 3. An annular groove 3b extending along the circumferential direction D2 is formed. The ring partition wall 21 is inserted into the groove 3b and disposed at a position where a gap 36 is opened between the ring partition wall 21 and the inner wall of the groove 3b. In this configuration, the annular ring partition wall 21 having a simple shape forms a gap 36 between the ring partition wall 21 and the film forming roller 3 and allows the gas to flow in the width direction D1, while forming the film with the mask 5. It is possible to improve the thickness distribution of the thin film formed by bringing the outer peripheral surface 3a of the roller 3 close to each other. Moreover, since the annular ring partition 21 has a simple shape, it is easy to manufacture with high precision. Furthermore, the annular ring partition wall 21 is inserted into an annular groove 3b formed outside the width direction D1 outside the end portion in the width direction D1 of the outer peripheral surface 3a of the film forming roller 3, so that the annular ring partition wall 21 is inserted. The inner side surface 21b of the film forming roller 3 can be located on the radially inner side R2 of the film forming roller 3 with respect to the outer peripheral surface 3a of the film forming roller 3. Therefore, it is possible to secure the thickness of the ring partition wall 21, thereby improving the rigidity of the ring partition wall 21. In addition, since the annular gap 36 is uniformly formed between the annular ring partition wall 21 and the inner wall of the groove 3 b, the amount of gas passing through the gap 36 is uniform over the entire circumference of the film forming roller 3. It is possible to

  Further, in the present embodiment, the ring partition 21 made of an annular member is employed as a partition for forming the width direction flow path 36 that restricts the gas flow outward in the width direction D1 of the film forming roller 3. Therefore, the structure of the partition is simple, and the manufacture of the partition and the assembly to the chamber 2 are easy.

  Further, in the case of the film forming roller 3 having the groove 3b, it is easy to distinguish the outer peripheral surface 3a, which is the conveyance part of the base material B, from the other groove 3b. Therefore, when the film forming roller 3 is attached to the chamber 2, the groove 3b portion of the film forming roller 3 is gripped with a jig or the like, so that the film forming roller 3 can be easily handled.

(3)
Furthermore, in the film forming apparatus 1 of the present embodiment, the annular ring partition wall 21 is composed of a plurality of arc-shaped portions 21A and 21B separated from each other. Therefore, after the film forming roller 3 is assembled in the chamber 2, arc-shaped portions 21 </ b> A and 21 </ b> B constituting the annular ring partition wall 21 are fixed to the chamber 2, so that the annular ring partition wall 21 can be easily attached to the chamber 2. Can be assembled. The ring partition wall 21 may be an annular shape whose entire circumference is continuous.

(4)
Furthermore, in the film forming apparatus 1 according to the present embodiment, the circumferential direction restriction portion 22 is attached to the outer surface 21 a of the ring partition wall 21. Therefore, the ring partition wall 21 is fixed to the chamber 2 to be positioned with high accuracy inside the chamber 2, and the circumferential direction restriction portion 22 is attached to the outer surface 21 a of the ring partition wall 21, thereby 22 can be arranged with high accuracy and easily at a position facing the outer peripheral surface 3 a of the film forming roller 3.

(5)
Furthermore, in the film forming apparatus 1 of the present embodiment, the circumferential direction restricting portion 22 has an inter-zone exhaust plate 24 that faces the outer peripheral surface 3a of the film forming roller 3, and the inter-zone exhaust plate 24 is formed into a film. The roller 3 is fixed to the outer surface 21a of the ring partition wall 21 with a clearance secured to the outer peripheral surface 3a. Therefore, the inter-zone exhaust plate 24 can easily ensure a uniform gap with respect to the peripheral surface of the film forming roller 3.

(6)
Further, in the film forming apparatus 1 of the present embodiment, the partition structure 4 includes a ring partition 21 made of an annular member, a plate-shaped interzone exhaust plate 24, a differential exhaust cover 25 made of a curved plate, and the like. It can be manufactured by combining relatively simple shaped parts. Therefore, it is possible to reduce the manufacturing cost of the partition wall structure 4.

(Modification)
(A)
In the above embodiment, an example is shown in which the groove 3b is formed at both ends in the width direction of the film forming roller 3, and the ring partition wall 21 is inserted into the groove 3b. However, the present invention is not limited to this. Absent.

  As another embodiment of the present invention, as shown in FIG. 13, as a ring partition wall corresponding to a cylindrical film forming roller 3 having no groove, a body part 21 c and You may arrange | position the ring partition 21 which has the extension part 21c.

  That is, the ring partition wall 21 shown in FIG. 13 includes a main body portion 21c and an extension portion 21d protruding from the main body portion 21c. The main body portion 21c and the extension portion 21d are integrally formed of a material such as steel, but may be separate parts.

  The main body 21c has an annular shape having a rectangular cross section. The main body 21c has an outer surface 21a facing the outer side in the radial direction (upper side in FIG. 13) of the film forming roller 3 and an inner side surface 21b facing the inner side in the radial direction (lower side in FIG. 13). The main body portion 21 c is fixed to the chamber 2 via a fixing member 35. The main body 21c is disposed at a position spaced from both ends in the width direction of the film forming roller 3 by a radial gap 36c in the width direction. That is, the radial gap 36 c extending in the radial direction of the film forming roller 3 is formed by the side surface of the main body 21 c and the width direction end of the film forming roller 3.

  The extension portion 21d protrudes from the main body portion 21c and extends along the outer surface 21a. The extension part 21d has an annular shape like the main body part 21c. The extension portion 21d is thinner than the main body portion 21c. A width-direction gap 36 d is formed by the extension 21 d and the outer peripheral surface 3 a of the film forming roller 3. A width direction flow path 36 that restricts the flow of gas from the outer peripheral surface 3a of the film forming roller 3 to the outside in the width direction of the film forming roller 3 is formed by the width direction gap 36d and the radial direction gap 36c communicating therewith. It is possible. The mask 5 is attached to the outer side surface 21a of the main body 21c with screws or the like. The extension part 21d supports the mask 5 from the film forming roller 3 side. The mask 5 may be fixed to the extension portion 21d with a screw or the like.

  In the embodiment shown in FIG. 13, the main body portion 21c of the ring partition wall 21 is disposed at a position spaced in the width direction from both ends in the width direction of the film forming roller 3, and the mask 5 is disposed on the outer surface of the main body portion 21c. It is attached to 21a. Therefore, the distance between the mask 5 and the outer peripheral surface 3a of the film forming roller 3 can be reduced to a distance smaller than the thickness of the main body 21c (that is, the distance between the outer surface 21a and the inner surface 21b). Further, the inner side surface 21b of the main body portion 21c can be positioned on the radially inner side of the film forming roller 3 with respect to the outer peripheral surface 3a of the film forming roller 3, thereby ensuring the thickness of the main body portion 21c. The rigidity of the ring partition wall 21 can be improved. Further, the extension 21 d of the ring partition 21 part extends along the outer surface 21 a from the main body 21 c, and forms a width direction gap 36 d between the outer peripheral surface 3 a of the film forming roller 3. Since this gap functions as the width direction flow path 36, it is possible to restrict the gas flow outward in the width direction of the film forming roller 3. The extension 21d may not be provided.

(B)
In addition, the partition of this invention does not need to be ring shape like said ring partition 21. FIG. The partition walls are arranged at positions on the both sides of the film forming roller 3 in the width direction so as to leave a gap between the film forming roller 3 and the film forming roller 3 from the outer peripheral surface 3a of the film forming roller 3 by the gap. If it is possible to form a width direction flow path that restricts the flow of gas outward in the width direction, various shapes can be adopted.

(C)
In the above embodiment, the belt-like base material B is transported from the unwinding section 7 to the winding section 8 via the film forming roller 3, but the transporting direction of the base material B is reversed to take up the winding section. It is also possible to supply the base material B from the 8 side and wind it around the unwinding part 7.

(D)
In order to cool the mask 5, the ring partition wall 21 that supports the mask 5 may have a liquid cooling structure that is cooled by a liquid refrigerant.

(E)
The part (step part) having the groove 3 b of the film forming roller 3 may be manufactured separately from the other part of the film forming roller 3 and then combined with the other part.

DESCRIPTION OF SYMBOLS 1 Film-forming apparatus 2 Chamber 3 Film-forming roller 3a Outer peripheral surface 3b Groove 4 Partition structure 5 Mask 21 Ring partition 21a Outer side surface 21b Inner side surface 22 Circumferential restriction part 24 Inter-zone exhaust plate 36 Width direction flow path

Claims (5)

A film forming apparatus for continuously forming a film on the surface of a belt-like substrate using a gas,
A chamber;
A film-forming roller rotatably attached to the inside of the chamber and having an outer peripheral surface capable of contacting the substrate;
A pair of partition walls fixed to the chamber and disposed at positions spaced apart from the film forming roller on both sides in the width direction of the film forming roller;
A circumferential direction limiting portion for forming at least one film forming zone facing the outer peripheral surface of the film forming roller inside the chamber;
A mask having an opening that is disposed opposite to the outer peripheral surface of the film-forming roller in the film-forming zone and that defines the width of the thin film formed by the film-forming on the surface of the substrate;
With
The partition has an outer surface facing the radially outer side of the film forming roller and an inner surface facing the radially inner side of the film forming roller,
The mask is attached to the outer surface of the partition;
The inner side surface of the partition wall is located on the radially inner side of the film forming roller with respect to the outer peripheral surface of the film forming roller ,
An annular groove extending along the circumferential direction of the film forming roller is formed on the outer side in the width direction of the film forming roller from both ends in the width direction of the outer peripheral surface of the film forming roller,
The partition has an annular shape that can be inserted into the annular groove,
The partition is inserted into the groove and disposed at a position where the gap is formed between the inner wall of the groove,
The gap has a widthwise gap formed between the inner surface of the partition wall and the inner wall of the groove facing the partition, and the widthwise gap restricts the gas flow in the width direction of the film forming roller. Forming a widthwise flow path,
Deposition device. The annular partition is constituted by a plurality of arc-shaped portions separated from each other.
The film forming apparatus according to claim 1 . A film forming apparatus for continuously forming a film on the surface of a belt-like substrate using a gas,
A chamber;
A film-forming roller rotatably attached to the inside of the chamber and having an outer peripheral surface capable of contacting the substrate;
A pair of partition walls fixed to the chamber and disposed at positions spaced apart from the film forming roller on both sides in the width direction of the film forming roller;
A circumferential direction limiting portion for forming at least one film forming zone facing the outer peripheral surface of the film forming roller inside the chamber;
A mask having an opening that is disposed opposite to the outer peripheral surface of the film-forming roller in the film-forming zone and that defines the width of the thin film formed by the film-forming on the surface of the substrate;
With
The partition has an outer surface facing the radially outer side of the film forming roller and an inner surface facing the radially inner side of the film forming roller,
The inner side surface of the partition wall is located on the radially inner side of the film forming roller with respect to the outer peripheral surface of the film forming roller,
The partition is
A body portion fixed to the chamber and disposed at positions spaced from the both end portions in the width direction of the film forming roller, and having the outer surface and the inner surface ;
An extension extending from the main body along the outer surface;
Have
The mask is attached to the outer surface of the main body ,
The gap has a gap in the width direction formed between the extension and the outer peripheral surface of the film forming roller facing the extension, and the gap in the width direction allows a gas flow in the width direction of the film forming roller. Forming a restrictive widthwise flow path,
Deposition device. The circumferential direction restriction portion is attached to the outer surface of the partition wall,
Film forming apparatus according to any one of claims 1-3. The circumferential direction restriction portion has an inter-zone exhaust plate facing the outer peripheral surface of the film forming roller,
The inter-zone exhaust plate is fixed to the partition wall in a state in which a gap is secured with respect to the outer peripheral surface of the film forming roller.
The film forming apparatus according to claim 4 .

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