JP6204518B2 - 感光性樹脂組成物、ドライフィルム、及びプリント配線板 - Google Patents
感光性樹脂組成物、ドライフィルム、及びプリント配線板 Download PDFInfo
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- JP6204518B2 JP6204518B2 JP2016044536A JP2016044536A JP6204518B2 JP 6204518 B2 JP6204518 B2 JP 6204518B2 JP 2016044536 A JP2016044536 A JP 2016044536A JP 2016044536 A JP2016044536 A JP 2016044536A JP 6204518 B2 JP6204518 B2 JP 6204518B2
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- photosensitive resin
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- 150000007974 melamines Chemical class 0.000 claims description 15
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 8
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- 125000003118 aryl group Chemical group 0.000 description 7
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- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 6
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- 229930185605 Bisphenol Natural products 0.000 description 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
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- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- JAOPKYRWYXCGOQ-UHFFFAOYSA-N n,n-dimethyl-1-(4-methylphenyl)methanamine Chemical compound CN(C)CC1=CC=C(C)C=C1 JAOPKYRWYXCGOQ-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- NIUZJTWSUGSWJI-UHFFFAOYSA-M triethyl(methyl)azanium;chloride Chemical compound [Cl-].CC[N+](C)(CC)CC NIUZJTWSUGSWJI-UHFFFAOYSA-M 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Chemical group 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Landscapes
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Materials For Photolithography (AREA)
Description
カラム:SHODEX KF−800P,KF−005,KF−003,KF−001の4本直列、
移動相:THF、
流量:1ml/分、
カラム温度:45℃、
検出器:RI、
換算:ポリスチレン。
(1−1)合成例A−1〜合成例A−4及び合成例B−1〜合成例B−3
還流冷却器、温度計、空気吹き込み管及び攪拌機を取付けた四つ口フラスコ内に、表1中の「第一反応」欄に示す成分を加えて、これらをエアバブリング下で攪拌することで混合物を調製した。この混合物をフラスコ内でエアバブリング下で攪拌しながら、「反応条件」欄に示す反応温度及び反応時間で加熱した。これにより、中間体の溶液を調製した。
・エポキシ化合物1:式(7)で示され、式(7)中のR1〜R8がすべて水素であるエポキシ当量250g/eqのビスフェノールフルオレン型エポキシ化合物。
・エポキシ化合物2:式(7)で示され、式(7)中のR1及びR5がいずれもメチル基、R2〜R4及びR6〜R8がいずれも水素であるエポキシ当量279g/eqのビスフェノールフルオレン型エポキシ化合物。
・エポキシ化合物3:ビフェニルノボラック型エポキシ樹脂(日本化薬株式会社製の品名NC−3000−H、エポキシ当量288g/eq)。
・エポキシ化合物4:クレゾールノボラック型エポキシ樹脂(新日鉄住金化学株式会社製、品番YDC−700−5、エポキシ当量203g/eq)。
・エポキシ化合物5:ビスフェノールA型エポキシ樹脂(三菱化学株式会社製、品番jER1001、エポキシ当量472g/eq)。
・ω−カルボキシ−ポリカプロラクトン(n≒2)モノアクリレート:東亜合成株式会社製、商品名アロニックスM−5300(数平均分子量290)。
後掲の表に示す成分の一部を3本ロールで混練してから、後掲の表に示す全成分をフラスコ内で撹拌混合することで、感光性樹脂組成物を得た。感光性樹脂組成物を作製する際、メラミン化合物(F)を感光性樹脂組成物中で均一に分散させた。なお、表2〜表4に示される成分の詳細は次の通りである。
・不飽和化合物A:トリメチロールプロパントリアクリレート。
・不飽和化合物B:ε―カプロラクトン変性ジペンタエリストールヘキサアクリレート(日本化薬株式会社製、品番KAYARAD DPCA−20)。
・光重合開始剤A:2,4,6−トリメチルベンゾイル−ジフェニル−フォスフィンオキサイド(BASF社製、品番Irgacure TPO)。
・光重合開始剤B:1−ヒドロキシ-シクロヘキシル−フェニル−ケトン(BASF社製、品番Irgacure 184)。
・光重合開始剤C:4,4’−ビス(ジエチルアミノ)ベンゾフェノン。
・結晶性エポキシ樹脂A:ビフェニル型結晶性エポキシ樹脂(三菱化学株式会社製の品名YX−4000、融点105℃、エポキシ当量187g/eq)。
・結晶性エポキシ樹脂B:ビスフェノール型結晶性エポキシ樹脂(新日鉄住金化学株式会社製の品名YSLV−80XY、融点75〜85℃、192g/eq)。
・非晶性エポキシ樹脂Cの溶液:長鎖炭素鎖含有ビスフェノールA型エポキシ樹脂(DIC製、品番EPICLON EXA−4816、液状樹脂、エポキシ当量410g/eq)を固形分90%でジエチレングリコールモノエチルエーテルアセテートに溶解させた溶液(固形分90%換算のエポキシ当量は、455.56g/eq)。
・非晶性エポキシ樹脂Dの溶液:ビフェニルノボラック型エポキシ樹脂(日本化薬株式会社製の品名NC−3000、軟化点53〜63℃、エポキシ当量280g/eq)を固形分80%でジエチレングリコールモノエチルエーテルアセテートに溶解させた溶液(固形分80%換算のエポキシ当量は、350g/eq)。
・カルボキシル基を有する有機フィラーAの分散液:平均一次粒子径0.07μmの架橋ゴム(NBR)を、分散液全量に対して含有量15重量%で、メチルエチルケトン中で分散させた分散液(JSR株式会社製、品番XER−91−MEK;酸価10.0mgKOH/g)。
・カルボキシル基を有する有機フィラーBの分散液:カルボキシル基変性水素化ニトリルゴムのポリマー(線状粒子)を、分散液全量に対して含有量17重量%で、メチルエチルケトン中で分散させた分散液(JSR株式会社製、品番XER−32−MEK)。
・カルボキシル基及び水酸基を有する有機フィラーCの分散液:平均一次粒子径0.07μmの架橋ゴム(SBR)を、分散液全量に対して含有量15重量%で、メチルエチルケトン中で分散させた分散液(JSR株式会社製、品番XSK−500)。
・エポキシ基を有する有機フィラー:パウダー状で、平均一次粒子径0.3μmのグリシジル変性アクリロニトリルブタジエンゴム。
・メラミン:日産化学工業株式会社製、微粉メラミン;感光性樹脂組成物中において平均粒子径8μmで分散。
・メラミン誘導体:メラミンと1,2,3,6−テトラヒドロ無水フタル酸の反応物であるメラミン−テトラヒドロフタル酸塩;感光性樹脂組成物中において平均粒子径6μmで分散。
・酸化防止剤:ヒンダードフェノール系酸化防止剤(BASF社製、品番IRGANOX 1010)。
・シランカップリング剤:3−グリシドキシプロピルトリメトキシシラン。
・界面活性剤:DIC製、品番メガファックF−477。
・レオロジーコントロール剤:ビッグケミー・ジャパン株式会社製、品番BYK−430。
・溶剤A:ジエチレングリコールモノエチルエーテルアセテート。
・溶剤B:メチルエチルケトン。
各実施例及び比較例の感光性樹脂組成物を次のように用いてテストピースA及びBを作製した。
各実施例及び比較例の感光性樹脂組成物を、ポリエチレンテレフタレート製のフィルム上にアプリケータで塗布してから、95℃で25分加熱することで乾燥させることにより、フィルム上に厚み25μmのドライフィルムを形成した。
各実施例及び比較例の感光性樹脂組成物から形成されたドライフィルムの厚みを30μmにした以外は、テストピースAと同様の手順で、テストピースBを得た。
(1)現像性
各実施例及び比較例のテストピースAについて、前記現像処理後のプリント配線板の非露光部を観察し、その結果を次のように評価した。
良:露光されていない皮膜が全て除去されている。
不適:露光されていない皮膜の一部がプリント配線板上に残存した。
各実施例及び比較例のテストピースAについて、硬化物からなる層に形成された穴を観察し、その結果を次のように評価した。
A:穴の底の直径が40μm以上である。
B:穴の底の直径が25μm以上40μm未満である。
C:穴の底の直径が25μm未満であるか、或いは明確な穴が形成されない。
各実施例及び比較例のテストピースAの導体配線における外部に露出する部分の上に、市販の無電解ニッケルメッキ浴を用いてニッケルメッキ層を形成してから、市販の無電解金メッキ浴を用いて金メッキ層を形成した。これにより、ニッケルメッキ層及び金メッキ層からなる金属層を形成した。硬化物からなる層及び金属層を目視で観察した。また、硬化物からなる層に対してセロハン粘着テープ剥離試験をおこなった。その結果を次のように評価した。
A:硬化物からなる層及び金属層の外観に異常は認められず、セロハン粘着テープ剥離試験による硬化物からなる層の剥離は生じなかった。
B:硬化物からなる層に変色が認められるが、セロハン粘着テープ剥離試験による硬化物からなる層の剥離は生じなかった。
C:硬化物からなる層の浮き上がりが認められ、セロハン粘着テープ剥離試験による硬化物からなる層の剥離が生じた。
各実施例及び比較例のテストピースAにおける導体配線(くし型電極)にDC30Vのバイアス電圧を印加しながら、プリント配線板を121℃、97%R.H.の試験環境下に100時間曝露した。この試験環境下における硬化物からなる層のくし型電極間の電気抵抗値を常時測定し、その結果を次の評価基準で評価した。
A:試験開始時から100時間経過するまでの間、電気抵抗値が常に106Ω以上を維持した。
B:試験開始時から80時間経過するまでは電気抵抗値が常に106Ω以上を維持したが、試験開始時から100時間経過する前に電気抵抗値が106Ω未満となった。
C:試験開始時から80時間経過する前に電気抵抗値が106Ω未満となった。
各実施例及び比較例のテストピースAについて、硬化物からなる層の上に導電テープを貼り付けた。この導電テープにDC100Vのバイアス電圧を印加しながら、テストピースAを85℃、85%R.H.の試験環境下に2000時間曝露した。この試験環境下における硬化物からなる層の導体配線と導電テープとの間の電気抵抗値を常時測定し、その結果を次の評価基準で評価した。
A:試験開始時から2000時間経過するまでの間、電気抵抗値が常に108Ω以上を維持した。
B:試験開始時から1000時間経過するまでは電気抵抗値が常に108Ω以上を維持したが、試験開始時から2000時間経過する前に電気抵抗値が108Ω未満となった。
C:試験開始時から1000時間経過する前に電気抵抗値が108Ω未満となった。
各実施例及び比較例のテストピースAを121℃、100%RHの環境下で100時間放置した後、硬化物からなる層の外観を次の評価基準で評価した。
A:硬化物からなる層に異常は見られなかった。
B:硬化物からなる層に変色が見られた。
C:硬化物からなる層に大きな変色が見られ、一部膨れが発生していた。
各実施例及び比較例のテストピースBについて、硬化物からなる層の外表面を、メッキ処理の前工程において一般的なデスミア処理に基いた下記手順で粗化させた。デスミア用膨潤液として市販されている膨潤液(アトテックジャパン(株)製のスウェリング・ディップ・セキュリガンスP)を用いて膨潤処理を60℃で5分間行い、硬化物の表面を膨潤させた。そして、この膨潤された表面に対して湯洗を行った。続いて過マンガン酸カリウムを含有し、デスミア液として市販されている酸化剤(アトテックジャパン(株)製のコンセントレート・コンパクトCP)を用いて粗化処理を80℃で10分間行い、湯洗後の硬化物表面を粗化した。このように粗化された硬化物表面に対して湯洗を行い、更に、この硬化物表面におけるデスミア液の残渣を中和液(アトテックジャパン(株)製のリダクションソリューション・セキュリガントP)を用いて40℃で5分間除去した。そして、中和後の硬化物表面を水洗した。このようにして粗面が付与された皮膜(感光性樹脂組成物の硬化物からなる層)の膜厚を測定し、デスミア液に対する硬化物の粗化耐性を次の評価基準で評価した。
A:粗化による膜厚の減少が5μm未満である。
B:粗化による膜厚の減少が5μm以上、10μm未満である。
C:粗化による膜厚の減少が10μm以上である。
各実施例及び比較例のテストピースBについて、硬化物からなる層に、上記(7)の方法で粗面を付与した後、市販の薬液を用いてテストピースBの粗面に無電解銅メッキ処理で初期配線を形成した。この初期配線が設けられたテストピースBを150℃で1時間加熱した。次に電解銅メッキ処理により、2A/dm2の電流密度の下で市販の薬液から初期配線に厚さ33μmの銅を直接析出させ、続いて銅を析出させたテストピースBを180℃で30分間加熱して銅メッキ層を形成した。このようにして形成された銅メッキ層と、テストピースBにおける硬化物との密着性を次の評価基準で評価した。ここで、無電解銅メッキ処理後及び電解銅メッキ処理後の両方の加熱時にテストピースBにブリスターが確認されない場合、銅メッキ層と硬化物との密着強度を下記の手順で評価した。この密着強度はJIS−C6481に準拠して測定された。
A:無電解銅メッキ処理後の加熱時にブリスターが確認されず、電解銅メッキ処理後の加熱時でもブリスターが確認されなかった。また、銅の密着強度は0.4kN/m以上であった。
B:無電解銅メッキ処理後の加熱時にブリスターが確認されず、電解銅メッキ処理後の加熱時でもブリスターが確認されなかった。また、銅の密着強度は、0.4kN/m未満であった。
C:無電解銅メッキ処理後の加熱時、或いは電解銅メッキ処理後の加熱時にブリスターが確認された。
Claims (7)
- カルボキシル基含有樹脂(A)と、
エチレン性不飽和結合を一分子中に少なくとも一つ有する不飽和化合物(B)と、
光重合開始剤(C)と、
エポキシ化合物(D)と、
カルボキシル基を有する有機フィラー(E1)を含む有機フィラー(E)と、
メラミン及びメラミン誘導体の群から選択される少なくとも1種のメラミン化合物(F)とを含有し、
前記カルボキシル基含有樹脂(A)が、ビスフェノールフルオレン骨格を有するカルボキシル基含有樹脂を含有する、
感光性樹脂組成物。 - 前記有機フィラー(E1)の平均一次粒子径が1μm以下である、請求項1に記載の感光性樹脂組成物。
- 前記有機フィラー(E1)が、ゴム成分を含有する、請求項1又は2に記載の感光性樹脂組成物。
- 前記ゴム成分が、架橋アクリルゴム、架橋NBR、架橋MBS、及び架橋SBRの群から選択される少なくとも1種の重合体を含有する、請求項3に記載の感光性樹脂組成物。
- 請求項1乃至4のいずれか一項に記載の感光性樹脂組成物を含有する、ドライフィルム。
- 請求項1乃至4のいずれか一項に記載の感光性樹脂組成物の硬化物を含む層間絶縁層を備える、プリント配線板。
- 請求項1乃至4のいずれか一項に記載の感光性樹脂組成物の硬化物を含むソルダーレジスト層を備える、プリント配線板。
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