JP6103633B2 - Ozone-supported high-quality homogeneous metal oxide thin film fabrication technology, and oxide thin-film transistor manufacturing method using the thin-film fabrication technology - Google Patents

Description

The present invention relates to a high-quality homogeneous metal oxide thin film production technique for improving the electronic properties and composition distribution of a thin film produced by a thin film production method using a raw material solution with the assistance of ozone, and an oxide thin film transistor using the thin film production technique. it relates to the manufacture how.

A thin film transistor (TFT) is an indispensable device for controlling the display of a display. However, in view of higher resolution and larger size that will be developed in the future, the materials and structures used so far have a higher display speed. The limits are already visible. For example, the mobility of amorphous silicon TFTs is about 0.5 cm ² / (V · s), and it is reported that 4K × 2K displays are limited to 80 type for 60 Hz display and 50 type for 120 Hz display. (Non-Patent Document 1).
Therefore, recently, TFTs using metal oxides as active layers have been developed. In particular, amorphous using indium gallium zinc oxide (IGZO) (Non-patent Documents 2 and 3), indium zinc oxide (IZO) (Non-patent Document 4), zinc tin oxide (ZTO) (Non-patent Document 5), etc. The development of TFTs using metal oxides is extremely remarkable, and it has been reported that the mobility exceeds 10 cm ² / (V · s).

On the other hand, when examining the power ratio of the semiconductor factory, it is reported that more than 10% of power is consumed in the vacuum pump. In order to reduce the environmental load, an attempt to replace the entire TFT manufacturing process with a non-vacuum process is very important. So far, papers have been reported in which TFTs having IGZO or IZO as an active layer by a sol-gel method or a spin coating method are used (Non-patent Documents 6-9).
However, these papers also use a vacuum process such as plasma CVD for the gate insulating film. Non-vacuum processes for both the gate insulating film and the semiconductor layer (channel layer) are indispensable for making the TFT fabrication process non-vacuum processes. In response to this demand, there have already been reports on oxide TFTs in which a gate insulating film (AlO _x ) and an active layer (ZTO) thin film are formed by spin coating (Non-patent Document 10). Therefore, the present inventors tried to manufacture an oxide TFT by using a mist chemical vapor deposition (CVD) method.

Since the mist CVD method is a chemical vapor deposition method, unlike the sol-gel method or the spin coating method, there is an advantage that thin films can be continuously stacked. Moreover, several times of treatments are not required to obtain an appropriate film thickness as in the spin coating method.
The present inventors have succeeded in producing an oxide TFT having the same performance as that of an IGZO TFT produced by the atmospheric pressure method reported so far (Non-Patent Document 11). . However, further improvement in characteristics is required.

J.Y.Kwon, Nikkei Electronics, 2008.5.5 (2008) pp.93-104 K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors", Nature, 432 (2004) pp .488 M. Kimura, T. Nakanishi, K. Nomura, T. Kamiya, and H. Hosono, "Trap features in amorphous-InGaZnO4 thin-film transistors", Appl. Phys Lett., 92 (2008) pp.133512. NL Dehuff, ES Kettenring, D. Hong, HQ Chiang, JF Wager, RL Hoffman, C.-H. Park, and DA Keszler, "Transparent thin-film transistors with zinc indium oxide channel layer", J. Appl.Phys. , 97 (2005) pp.064505. H.Q.Chiang, J.F.Wager, R.L.Hoffman, J. Jeong, and D.A.Keszler, "High mobility transparent thinfilm transistors with amorphous zinc tin oxide channel layer", Appl. Phys. Lett., 86 (2005) pp.013503. KB. Park, JB. Seon, GH Kim, M. Yang, B. Koo, HJ Kim, MK. Ryu, and SY. Lee, "High Electrical Performance of Wet-Processed Indium Zinc Oxide Thin-Film Transistors", IEEE Electron Device Lett., 31 (2010) pp.311. PK Nayak, T. Busani, E. Elamurugu, P. Barquinha, R. Martins, Y. Hong, and E. Fortunato, "Zinc concentration dependence study of solution processed amorphous indium gallium zinc oxide thin film transistors using high-kdielectric", Appl. Phys. Lett., 97 (2010) pp.183504. Y.S.Rim, D.L.Kim, "Effect of Zr addition on ZnSnO thin-film transistors using a solution process", Appl. Phys. Lett., 97 (2010) pp.233502. GH Kim, BD Ahn, HS Shin, WH Jeong, HJ Kim, and HJ Kim, "Effect of indium composition ratio on solution-processed nanocrystalline InGaZnO this film transistors", Appl. Phys. Lett., 94 (2009) pp.233501 . C. Avis and J. Jang, "High performance solution processed oxide TFT with aluminum oxide gate dielectric fabricated by a sol-gel method", J. Mater. Chem., 21 (2011) pp.10649-10652. "Electrical Properties of the Thin-Film Transistor With an Indium-Gallium-Zinc Oxide Channel and an Aluminum Oxide Gate Dielectric Stack Formed by Solution-Based Atmospheric Pressure Deposition" Mamoru Furuta, Toshiyuki Kawaharamura, Dapeng Wang, Tatsuya Toda, and Takashi Hirao IEEE Electron Device Lett., Vol.33 (2012) pp.851-853.

The present invention has improved characteristics by using ozone, there is provided a manufacturing how the oxide thin film transistor according to thin film deposition.

According to the first aspect of the present invention, ozone is introduced into a film formation chamber using a step of forming a gate electrode on a substrate and a raw material solution in which a metal compound necessary for forming a metal oxide insulator is dissolved. While forming a gate insulating film made of a metal oxide insulator on the substrate so as to cover the gate electrode, and using a raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved a manufacturing method of an oxide thin film transistor Ru comprising forming a channel layer made of a metal oxide semiconductor on the gate insulating film while introducing ozone into the deposition chamber, at least,
In the step of forming the gate insulating film, an atomized raw material solution in which a metal compound necessary for forming a metal oxide insulator is dissolved is introduced in the vicinity of the substrate while introducing ozone into the film formation chamber. It is a step of forming a gate insulating film by reacting,
In the step of forming the channel layer, an atomized raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved is chemically reacted in the vicinity of the substrate while introducing ozone into the film formation chamber. The present invention relates to a method for manufacturing an oxide thin film transistor, which is a step of forming a channel layer .

The invention according to claim 2 is a channel layer made of a metal oxide semiconductor on a substrate while introducing ozone into a film formation chamber using a raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved. And using a raw material solution in which a metal compound necessary for forming the metal oxide insulator is dissolved, the metal oxide insulation is formed so as to cover the channel layer while introducing ozone into the film formation chamber. forming a gate insulating film made of the body, a method of manufacturing an oxide thin film transistor comprising the steps, the Ru comprises at least producing a gate electrode on the gate insulating film,
In the step of forming the gate insulating film, an atomized raw material solution in which a metal compound necessary for forming a metal oxide insulator is dissolved is introduced in the vicinity of the substrate while introducing ozone into the film formation chamber. It is a step of forming a gate insulating film by reacting,
In the step of forming the channel layer, an atomized raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved is chemically reacted in the vicinity of the substrate while introducing ozone into the film formation chamber. The present invention relates to a method for manufacturing an oxide thin film transistor, which is a step of forming a channel layer .

The invention according to claim 3 is the method for producing an oxide thin film transistor according to claim 1 or 2 , wherein the metal oxide semiconductor is a metal oxide semiconductor containing at least zinc (Zn) as a constituent element. About.

According to a fourth aspect of the present invention, the metal compound necessary to form the metal oxide insulator is an acetylacetonate compound, an acetic acid compound, a chloride, a sulfide, a nitric acid compound, an ammonium compound, or a carbonic acid compound. It is either, It is related with the manufacturing method of the oxide thin-film transistor in any one of Claim 1 thru | or 3 .

In the invention according to claim 5 , the metal compound necessary to form the metal oxide semiconductor is any one of an acetylacetonate compound, an acetic acid compound, a chloride, a sulfide, a nitric acid compound, an ammonium compound, and a carbonic acid compound. the method for producing an oxide thin film transistor according to any one of claims 1 to 4, characterized in that the or.

According to a sixth aspect of the present invention, there is provided a film forming chamber having a source gas inlet and a gas outlet, wherein a substrate is disposed between the source gas inlet and the gas outlet, and a source for forming a film A source gas supply means for supplying gas; and an energy supply means for supplying energy for forming a thin film, and generating a film on the surface of the substrate by flowing the source gas in a direction along the substrate surface, The distance between the substrate surface and the inner wall of the film formation chamber is a predetermined distance in the range of 0.1 mm to 10.0 mm, and the velocity of the source gas flowing on the substrate surface in the film formation chamber is 0.4 m / It relates to a method for producing an oxide thin film transistor according to any one of claims 1 to 5, characterized in that a fine channel (FC) structure a predetermined speed can be achieved for sec to 4.0 m / sec or less.

The invention according to claim 7, the step of forming a step and / or the channel layer to form the gate insulating film, according to any one of claims 1 to 6, characterized in that is carried out under atmospheric pressure The present invention relates to a method for manufacturing an oxide thin film transistor.

The invention according to claim 8 is a method in which the step of forming the gate electrode and the step of forming the source / drain electrodes are performed by applying an atomized raw material solution or by causing a chemical reaction in the vicinity of the substrate. a process for producing an oxide thin film transistor according to any one of claims 1 to 7, characterized in that is carried out by photolithography.

Invention, the oxide thin film transistor according to any one of claims 1 to 7 forming a step and a source and drain electrode forming the gate electrode, characterized in that performed by the printing method according to claim 9 It relates to the manufacturing method.

The invention according to claim 10 uses a metal oxide thin film on a substrate while introducing ozone into a film forming chamber using an atomized raw material solution in which a metal compound necessary for forming a metal oxide thin film is dissolved. A film forming chamber having a source gas inlet and a gas outlet, and a substrate is disposed between the source gas inlet and the gas outlet, and a film A source gas supply means for supplying a source gas for forming; and an energy supply means for supplying energy for forming a thin film, and a film is formed on the surface of the substrate by flowing the source gas in a direction along the substrate surface. The distance between the substrate surface and the inner wall of the film formation chamber is a predetermined distance in the range of 0.1 mm to 10.0 mm, and the velocity of the source gas flowing through the substrate surface in the film formation chamber is 0.4 m / sec or more and 4.0 By using a fine channel (FC) structure that can achieve a predetermined speed in the range of / sec or less, the oxide thin film is formed in the presence of ozone to make the composition distribution in the surface of the oxide thin film uniform. The present invention relates to a method for producing a featured oxide thin film.

The invention according to claim 11 relates to the method for producing an oxide thin film according to claim 10 , wherein the metal oxide is a multi-component metal oxide.

According to the first aspect of the present invention, in the thin film manufacturing method using the raw material solution in which the metal compound is dissolved, the step of forming the gate insulating film made of the metal oxide insulator introduces ozone into the film forming chamber. By doing so, the effects of improving the dielectric constant, density, and surface roughness of the gate insulating film can be obtained. In addition, since the gate insulating film can be formed at a low temperature while maintaining a high breakdown field strength (E _BD ), the manufacturing method can be easily processed.
In a thin film manufacturing method using a raw material solution in which a metal compound is dissolved, a step of forming a channel layer made of a metal oxide semiconductor is performed while introducing ozone into a film formation chamber, thereby reducing the amount of impurities. It is effective in improving density and reducing the amount of defects.

Further, in the thin film manufacturing method using a raw material solution in which a metal compound is dissolved, the step of forming the gate insulating film is used to form a metal oxide insulator while introducing ozone into the film formation chamber. In order to obtain an appropriate film thickness, it is possible to continuously deposit thin films by carrying out a chemical reaction in the vicinity of the substrate of an atomized raw material solution in which a necessary metal compound is dissolved. This has the effect of not requiring processing several times.

Further, in the thin film manufacturing method using the raw material solution in which the metal compound is dissolved, the step of forming the channel layer is necessary for forming the metal oxide semiconductor while introducing ozone into the film formation chamber. By carrying out a chemical reaction in the vicinity of the substrate of the atomized raw material solution in which the metal compound is dissolved, it is possible to continuously stack thin films, and several times to obtain an appropriate film thickness. Therefore, there is an effect that it is not necessary to perform a process over a wide range.

  As described above, a bottom-gate oxide thin film transistor having excellent characteristics can be obtained.

According to the invention of claim 2, in the thin film manufacturing method using the raw material solution in which the metal compound is dissolved, the step of forming the channel layer made of the metal oxide semiconductor is performed while introducing ozone into the film formation chamber. By being performed, it is possible to reduce the amount of impurities, improve the density, reduce the amount of defects, and the like.
In a thin film manufacturing method using a raw material solution in which a metal compound is dissolved, a step of forming a gate insulating film made of a metal oxide insulator is performed while introducing ozone into a film forming chamber, whereby a gate insulating film is formed. The effect of improving the dielectric constant, improving the density, and improving the surface roughness can be obtained. Further, since it is possible to form the gate insulating film at a low temperature while maintaining high breakdown field strength (E _BD), Ru can be processed to facilitate manufacturing method.

Further, in the thin film manufacturing method using a raw material solution in which a metal compound is dissolved, the step of forming the gate insulating film is used to form a metal oxide insulator while introducing ozone into the film formation chamber. In order to obtain an appropriate film thickness, it is possible to continuously deposit thin films by carrying out a chemical reaction in the vicinity of the substrate of an atomized raw material solution in which a necessary metal compound is dissolved. This has the effect of not requiring processing several times.

Further, in the thin film manufacturing method using the raw material solution in which the metal compound is dissolved, the step of forming the channel layer is necessary for forming the metal oxide semiconductor while introducing ozone into the film formation chamber. By carrying out a chemical reaction in the vicinity of the substrate of the atomized raw material solution in which the metal compound is dissolved, it is possible to continuously stack thin films, and several times to obtain an appropriate film thickness. Therefore, there is an effect that it is not necessary to perform a process over a wide range.
As described above, a top-gate oxide thin film transistor having excellent characteristics can be obtained.

According to the invention of claim 3 , the metal oxide semiconductor is a metal oxide semiconductor containing at least zinc (Zn) as a constituent element. The oxide thin film transistor of claim 1 or 2 , By being a manufacturing method, an oxide thin film transistor having excellent characteristics can be manufactured.

According to the inventions according to claims 4 and 5 , the metal compound necessary for forming the metal oxide insulator or metal oxide semiconductor is an acetylacetonate compound, an acetic acid compound, a chloride, a sulfide, or a nitric acid compound. , ammonium compounds, by a method of manufacturing an oxide thin film transistor according to any one of claims 1 to 3 or 1 to 4, characterized in that any of a carbonate compound, a metal oxide insulator A gate insulating film or a channel layer made of a metal oxide semiconductor can be formed.

According to the invention of claim 6 , by forming the gate insulating film and the channel layer in the presence of ozone using the fine channel (FC) structure, composition unevenness does not occur depending on the location, and the oxide thin film transistor The in-plane composition can be made uniform.

According to the seventh aspect of the present invention, the step of forming the gate insulating film and / or the step of forming the channel layer is performed under atmospheric pressure, so that the burden on the environment can be reduced.

According to an eighth aspect of the present invention, the step of forming the gate electrode and the step of forming the source / drain electrodes are performed by applying an atomized raw material solution or by causing a chemical reaction in the vicinity of the substrate. The oxide thin film transistor manufacturing method according to any one of claims 1 to 7 , characterized in that the processing is performed under atmospheric pressure throughout the entire process. It can be a gentle manufacturing method.

According to the invention of claim 9, oxidation according to the step of forming a step and a source and drain electrode forming the gate electrode, any one of claims 1 to 7, characterized in that performed by printing By using the method for manufacturing the thin film transistor, the processing is performed under the atmospheric pressure throughout the entire process, so that the manufacturing method can be made environmentally friendly.

By manufacturing an oxide thin film transistor in the manufacturing method according to any one of claims 1 to 9, it may be an oxide thin film transistor having excellent characteristics.

According to the inventions according to claims 10 and 11 , by forming the oxide thin film in the presence of ozone using the fine channel (FC) type mist CVD system, composition unevenness does not occur depending on the location. An oxide thin film having a uniform internal composition can be manufactured.

It is an example of a sectional view of a bottom gate type oxide thin film transistor manufactured by the manufacturing method of the present invention. It is a figure which shows the fine channel (FC) type mist CVD system used in the manufacturing method of this invention. Is a diagram showing the surface state of the AlO _X film in the case of there O ₃ support was measured using an atomic force microscope (AFM). Is a diagram showing the surface state of the AlO _X film in the case of O ₃ without assistance measured using an atomic force microscope (AFM). It is a graph which shows the relationship between the electric field strength ( _EBD ) of a AlO _X thin film, and substrate temperature. It is a graph showing a binding state of AlO _X in the thin film by FT-IR. The dielectric constant of the gate insulating film (AlO _X) and (kappa) is a graph showing the relation between the substrate temperature. It is a graph which shows the relationship between the density of the AlO _X thin film by X-ray reflectivity measurement, and a substrate temperature. It is a graph which shows the electrical property of an IGZO thin film. 6 is a graph showing transfer characteristics of an oxidized TFT of Comparative Example 1. 10 is a graph showing transfer characteristics of an oxidized TFT of Comparative Example 2. 10 is a graph showing transfer characteristics of an oxidized TFT of Comparative Example 3. 3 is a graph showing transfer characteristics of an oxidation TFT of Example 1. In Comparative Example 1 (without surface treatment of the gate insulating film with O ₃ ) and Comparative Example 2 (with surface treatment of the gate insulating film with O ₃ ), the stress application time and the gate voltage capable of flowing 1 nA of drain current It is a graph which shows transition. It is a graph which shows the transfer characteristic of the oxide TFT in the Inlet (upstream), Center (center), and Outlet (downstream) part of a fine channel (FC) type mist CVD system. It is a figure for showing the place of the Inlet (upstream), Center (center), and Outlet (downstream) part of a fine channel (FC) type mist CVD system. It is a graph which shows the in-plane composition distribution which analyzed the IGZO thin film used for (a) Comparative example 1, (b) Example 1, and (c) Example 2 by energy dispersive X ray spectroscopy (EDS).

  Hereinafter, a manufacturing method of an oxide thin film transistor according to the present invention and an oxide thin film transistor manufactured by the manufacturing method will be described.

Embodiment Mode 1 Manufacturing Method of Bottom-Gate Type Oxide Thin Film Transistor
First, a method for manufacturing a bottom-gate oxide thin film transistor will be described.
The method for producing a bottom-gate oxide thin film transistor (hereinafter sometimes referred to as an oxide TFT) of the present invention includes at least the following steps.
(1) Step of forming a gate electrode on the substrate (2) The gate electrode while introducing ozone into the film formation chamber using a raw material solution in which a metal compound necessary for forming a metal oxide insulator is dissolved A step of forming a gate insulating film made of a metal oxide insulator on the substrate so as to cover (3) film formation using a raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved Forming a channel layer made of a metal oxide semiconductor on the gate insulating film while introducing ozone into the chamber

<Step 1: Gate electrode formation step>
FIG. 1 is a cross-sectional view of a bottom-gate oxide thin film transistor (10) manufactured by the manufacturing method of the present invention.
First, a gate metal thin film is formed on a substrate (1), and then the gate metal thin film is patterned to form a gate electrode (2).
As a material of the substrate (1), a general material used for a thin film transistor can be used, and a material made of glass, single crystal, ceramics, resin, or the like can be used. Specifically, for example, blue plate glass, Pyrex (registered trademark), alkali-free glass, silicon (Si), sapphire single crystal (α-Al ₂ O ₃ ), alumina (Al ₂ O ₃ ), quartz, gallium oxide single crystal (Β-Ga ₂ O ₃ ), polycarbonate (PC), polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), cyclic polyolefin resin and the like are used. However, it is not limited to these.
Among these, glass (non-alkali glass) is preferably used in the present invention. By using glass as a substrate, a thin film transistor having excellent versatility can be obtained.

As a material of the gate electrode (2), those known in the field of thin film transistors can be widely adopted, and are not particularly limited. However, ordinary materials such as Cu, Al, Cr, Ti, Mo, MoW, Ag, and Au, and Transparent conductive oxides (TCO) such as ITO, AZO, and GZO can be used. When ITO, AZO, or GZO is used, it can be produced by a method (mist chemical vapor deposition CVD method) in which an atomized raw material solution is subjected to a chemical reaction in the vicinity of the substrate by applying heat or the like. .
The method for forming the gate metal thin film can be a known method in the field of thin film transistors, and is not particularly limited. Specifically, a sputtering method is used. Further, a patterning method after forming a film by mist chemical vapor deposition (CVD), a printing method, or the like can be used. Since these methods are atmospheric pressure processes, they are preferable in terms of environment.

A known method can be used as a patterning method for the gate electrode (2). Specifically, for example, photolithography.
Moreover, a well-known method can be used as an etching method at the time of forming a pattern. That is, the pattern can be formed by wet etching or dry etching.
Further, the etching can be performed not only by wet etching and dry etching but also by other etching methods. For example, there is a method of misting an etching solution and etching using the mist (see JP 2011-181784).
The patterning method (pattern preparation conditions), the etching method (etching conditions) for forming the pattern, and the like are appropriately set according to the pattern shape, the film forming method, and the type of compound constituting the thin film.

<Process 2: Gate insulating film formation process>
Next, a gate insulating film (3) is formed on the substrate (1) so as to cover the gate electrode (2).
In the present invention, the gate insulating film (3) is made of a metal oxide. As the metal oxide, all metal oxide insulators and metal oxide dielectrics such as AlO _X (alumina), SiO _X , HfO _X , ZrO _X , LaO _X , YO _X , GaO _X , and MgO can be used. .
The step of forming the gate insulating film (3) is performed using a raw material solution in which a metal compound necessary for forming the metal oxide insulator is dissolved. In particular, it is preferable to use a mist chemical vapor deposition (CVD) method. In addition, it is preferable to perform this process under atmospheric pressure in consideration of an environmental load, but of course, the atmospheric pressure can be changed as necessary.
Specifically, the mist CVD method atomizes a raw material solution in which a metal compound necessary for forming a metal oxide insulator is dissolved using means such as an ultrasonic vibrator or an electric field spray method, and the mist A gate insulating film is formed by transporting the converted raw material solution and causing a chemical reaction by applying heat or the like in the vicinity of the substrate. At this time, the gas containing the atomized raw material solution (mist) may be rectified using a rectifier.
A metal compound necessary for forming the metal oxide insulator is not particularly limited, and an acetylacetonate compound, an acetic acid compound, a chloride, a sulfide, a nitric acid compound, an ammonium compound, and a carbonic acid compound can be used.
The solvent is not particularly limited, but water, hydrocarbon compounds (alcohol, ketone, ether, carboxylic acid, aromatic), acidic solvent (hydrochloric acid, acetic acid), alkaline solvent (ammonia), hydrogen peroxide water, and their A mixture or the like can be used. In particular, in this example, a mixture of water and methanol was used.
As this mist CVD method, a fine channel (FC) type mist CVD system or a linear source (LS) type mist CVD system corresponding to a continuous process can be used. Specifically, the fine channel (FC) type mist CVD system is a film forming chamber having a source gas inlet and a gas outlet and in which a substrate is disposed between the source gas inlet and the gas outlet. A source gas supply means for supplying a source gas for forming a film, and an energy supply means for supplying energy for forming a thin film, and the substrate gas by flowing the source gas in a direction along the substrate surface. A film is formed on the surface of the substrate, and a distance between the substrate surface and the inner wall of the film formation chamber is a predetermined distance in a range of about 0.1 mm to about 10.0 mm, and the substrate surface in the film formation chamber is Refers to a film forming apparatus in which the flow rate of the flowing source gas is a predetermined speed in the range of about 0.4 m / sec or more and about 4.0 m / sec or less. Details of this fine channel (FC) type mist CVD system , JP 2005-307238 and JP disclosed in JP 2007-138230. Details of the linear source (LS) mist CVD system are disclosed in Japanese Patent Application Laid-Open No. 2007-254869.
Since the mist CVD method is an atmospheric pressure (non-vacuum) process, there is an advantage that it does not need a vacuum pump unlike a vacuum process such as a sputtering method and is therefore environmentally friendly.

Further, it is preferable to surface-treat the substrate with ozone (O ₃ ) before forming the gate insulating film. Thereby, organic substances on the substrate can be removed.

This gate insulating film forming step is performed in the presence of ozone while introducing ozone into the film formation chamber.
The method for introducing ozone (O ₃ ) into the film formation atmosphere (supporting ozone) is not particularly limited. The ozone concentration in the film formation atmosphere is not particularly limited, but is preferably 10 to 20000 ppm. As shown in FIG. 2, it can be introduced from there into the passage of the carrier gas and the dilution gas is provided to inlet ozone (O ₃₎ ozone (O ₃₎ to the deposition atmosphere.

The breakdown electric field strength (E _BD ) of the gate insulating film (3) depends on the temperature at which the gate insulating film (3) (metal oxide insulator thin film) is formed. Usually, when the substrate temperature is lower than 400 ° C., the breakdown electric field strength (E _BD ) of the gate insulating film (3) is rapidly decreased. However, by forming the gate insulating film ( ₃ ) in the presence of ozone (O ₃ ) (ozone support), a sufficient breakdown electric field strength can be obtained even when the substrate temperature is about 340 ° C. Moreover, the breakdown electric field strength is improved when it is produced in the presence of O ₃ . That is, with the support of O ₃ , it is possible to achieve a low temperature in the gate insulating film forming process and an improvement in breakdown electric field strength.
The breakdown electric field strength (E _BD ) is a value defined by an electric field (V / cm) flowing through 1 μA / cm ² .

  In addition, with the assistance of ozone, the dielectric constant of the gate insulating film (3) can be improved. Thereby, a highly insulating gate insulating film can be obtained.

Furthermore, the density of the gate insulating film (3) can be improved by this ozone support. The density of the gate insulating film (3) is high in the region where the film formation temperature is high, and is low in the region where the film formation temperature is low, and a correlation with the breakdown electric field strength (E _BD ) is observed. , Further improvement in density can be achieved.

  In the gate insulating film forming step of the present invention, a relatively flat gate insulating film can be obtained in any film forming temperature range, but the surface roughness tends to be improved as the temperature is lower. Furthermore, by providing ozone support, the surface roughness of the gate insulating film (3) can be improved, and the gate insulating film (3) with better flatness can be obtained.

After the formation of the gate insulating film, when a situation arises where it must be left under atmospheric pressure for the convenience of the process, the surface of the gate insulating film (3) is treated with ozone (O ₃ ) (interface treatment) ) Is preferable.
In the case of an AlO _X thin film, the gate insulating film (3) is ideally hydrophilic.
When the gate insulating film (3) formed by the above method is (a) normally washed at room temperature, (b) treated at room temperature in an O ₃ atmosphere for 5 minutes, (c) 300 ° C. When the treatment was performed in an Ar atmosphere for 5 minutes, (d) the surface tension of the surface of the gate insulating film (3) was examined in each case of treatment at 300 ° C. for 5 minutes in an O ₃ atmosphere. As a result, in the case of the above condition (a), the contact angle of the gate insulating film (3) and distilled water is 50 °, and in the case of the above condition (b), this contact angle is 29 °. ), The contact angle was 8 °. In the case of the above condition (d), the contact angle was almost 0 °. That is, it was found that the hydrophilicity of the gate insulating film (3) is improved by surface-treating the gate insulating film (3) with O ₃ .
Therefore, in the present invention, it is preferable to perform surface treatment of the surface of the gate insulating film (3) with ozone (O ₃ ). As a result, the hydrophilicity of the gate insulating film (3) is improved and becomes superhydrophilic.
This is because impurities such as organic substances adhering to the surface of the gate insulating film are removed by O ₃ treatment by being left under atmospheric pressure.
Further, the removal of the organic substance improves the initial growth state of the channel layer (active layer), and thus the state of the channel layer (active layer) can be improved. In addition, impurities such as organic substances present on the interface, irregularities, and voids generated by the presence of them become factors that trap electrons. For these comprehensive reasons, the reliability of the oxide TFT can be improved.

<Step 3: Channel layer forming step>
Next, a metal oxide semiconductor thin film is formed on the gate insulating film (3), and then the metal oxide semiconductor thin film is patterned to form a channel layer (active layer) (4).
Examples of the metal oxide semiconductor forming the channel layer (4) include IGZO (indium gallium zinc oxide), ZnO (zinc oxide), ZTO (zinc tin oxide), IZO (indium zinc oxide), ITZO (indium tin zinc oxide). Any metal oxide semiconductor such as SnO _X (tin oxide), TiO _X (titanium oxide), and GaO _X (gallium oxide) can be used.
The step of forming the channel layer (4) is performed using a raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved. Among them, it is preferable to use a mist chemical vapor deposition (CVD) method that has little influence on the lower layer. In addition, it is preferable to perform this process under atmospheric pressure in consideration of an environmental load, but of course, the atmospheric pressure can be changed as necessary.
Specifically, a raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved is atomized using means such as an ultrasonic vibrator or an electric field spray method, and the atomized raw material solution is conveyed. Then, a channel layer (4) is formed on the gate insulating film (3) by causing a chemical reaction by applying heat or the like in the vicinity of the substrate.
A metal compound necessary for forming the metal oxide semiconductor is not particularly limited, and an acetylacetonate compound, an acetic acid compound, a chloride, a sulfide, a nitric acid compound, an ammonium compound, and a carbonic acid compound can be used.
As this mist CVD method, a fine channel (FC) type mist CVD system, a linear source (LS) type mist CVD system, or the like can be used. The details of the fine channel (FC) type mist CVD system and the linear source (LS) type mist CVD system are as described in the section of the gate insulating film forming step.

As a patterning method of the channel layer (4), a known method can be used. Specifically, for example, photolithography.
Moreover, a well-known method can be used as an etching method at the time of forming a pattern. That is, the pattern can be formed by wet etching or dry etching.
Further, the etching is not limited to wet etching and dry etching, and etching can be performed by other etching methods. For example, there is a mist etching method (described above) in which an etching solution is made mist and etching is performed using this mist.
The patterning method (pattern preparation conditions), the etching method (etching conditions) for forming the pattern, and the like are appropriately set according to the pattern shape, the film forming method, and the type of compound constituting the thin film.

This channel layer forming step is also performed in the presence of ozone in the same manner as the gate insulating film.
The method of introducing ozone (O ₃ ) into the film formation atmosphere (supporting ozone) and the ozone concentration are the same as in the gate insulating film formation step.

  This ozone support contributes to reducing the amount of impurities, improving density, reducing the amount of defects, and the like.

When a fine channel (FC) type mist CVD system is used in the gate insulating film forming step and the channel layer forming step, the characteristics of the oxide TFTs manufactured without O ₃ support in both steps differ from upstream to downstream. This is considered to be because compositional nonuniformity occurs from upstream to downstream when a fine channel (FC) is used. The fine channel (FC) can produce a homogeneous thin film when a single material is used. However, in the case of a multi-material such as this time, the location dependence of the composition cannot be avoided from the viewpoint of reaction.
On the other hand, by providing O ₃ support in both steps, the location dependence seen without O ₃ support is not seen. This is because O ₃ adsorbs on the surface, so that the thin film growth reaction of the raw material existing excessively in the reaction space can be suppressed, or the adsorption probability of the raw material on the surface can be made uniform. For this reason, it is considered that the surface reaction rate of each component is kept constant.

<Step 4: Source / drain electrode formation step>
Next, a source / drain electrode metal thin film is formed on the channel layer (4), and then the source / drain electrode metal thin film is patterned to form a source electrode (5) and a drain electrode (6).
The method for forming the source / drain electrode metal thin film can employ a known method in the field of thin film transistors, and is not particularly limited, but a method of patterning after film formation by a mist CVD method or a printing method can be used. Since these methods are atmospheric pressure processes, they are preferable in terms of environment.
As materials for the source electrode (5) and the drain electrode (6), those known in the field of thin film transistors can be widely used, and are not particularly limited.

As a patterning method for the source electrode (5) and the drain electrode (6), a known method can be used. Specifically, for example, photolithography.
Moreover, a well-known method can be used as an etching method at the time of forming a pattern. That is, the pattern can be formed by wet etching or dry etching.
Further, the etching can be performed not only by wet etching and dry etching but also by other etching methods. For example, there is a method in which an etching solution is misted and etching is performed using the mist.
The patterning method (pattern preparation conditions), the etching method (etching conditions) for forming the pattern, and the like are appropriately set according to the pattern shape, the film forming method, and the type of compound constituting the thin film.

  A protective (passivation) film may be formed before and after forming the source / drain electrodes. As the material for the passivation film, those known in the field of thin film transistors can be widely used, and are not particularly limited.

Moreover, it is preferable to heat-process a channel layer (4). The heat treatment is preferably performed at 200 to 400 ° C. for 2 minutes or more for about 1 hour in order to stabilize.
By heat-treating the channel layer (4), the characteristics of the channel layer (4) can be improved.

In this example, driving of the oxide TFT was confirmed by reduction treatment. In the reduction treatment, a reducing gas such as H ₂ can be used, but it is preferable to use a mixed gas of N ₂ and H ₂ for safety. In this case, the mixing ratio of H ₂ is preferably about 1-5%.

Through the above steps 1 to 4, the field effect mobility (μ _lin ) is 7.0 or more, the subthreshold coefficient (S) is about 0.3, and the hysteresis (ΔV _H ) is 0.6 or less. A thin film transistor can be obtained.

(Embodiment 2: Method for manufacturing top-gate oxide thin film transistor)
Next, a method for manufacturing a top-gate oxide thin film transistor will be described.
The manufacturing method of the top gate type oxide thin film transistor of the present invention includes at least the following steps.
(1) A step of forming a channel layer made of a metal oxide semiconductor on a substrate while introducing ozone into a film formation chamber using a raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved ( 2) A gate made of a metal oxide insulator so as to cover the channel layer while introducing ozone into a film forming chamber using a raw material solution in which a metal compound necessary for forming the metal oxide insulator is dissolved. Step of Forming Insulating Film (3) Step of Forming Gate Electrode on the Gate Insulating Film Thereby, a top gate type oxide thin film transistor can be manufactured.
The film formation method in each of these steps is the same as that of the bottom-gate oxide thin film transistor of Embodiment 1.

  Although it demonstrates still in detail based on the following Examples, the oxide thin-film transistor which concerns on this invention, and its manufacturing method are not limited to these.

<Evaluation of the effects of ozone support in gate insulating film formation>
In order to evaluate the effect of ozone support in the gate insulating film forming process, an AlO _X thin film was prepared. The film thickness was adjusted to about 50 nm for measuring the breakdown electric field strength and about 200 nm for measuring the FT-IR. A fine channel (FC) mist CVD system shown in FIG. 2 was used for the production of the AlO _X thin film. The production conditions for the AlO _X thin film are shown in Table 1 below.
The difference in characteristics depending on the presence or absence of O ₃ support during the formation of the AlO _X thin film was evaluated.

3 and 4 are views showing the surface state of the AlO _X film was measured using an atomic force microscope (AFM), Figure 3 _{O 3} there supporting a photograph when FIG. 4 of the _{O 3} without assistance is there.
O ₃ case with support, both when the O ₃ without assistance, but also able to obtain a relatively flat thin film at any temperature range, the substrate temperature tended to surface roughness is as good as is at a low temperature. There were no pinholes.
Comparing the surface roughness, towards the case of the O ₃ support there is compared with the O ₃ without assistance, RMS was superior to the less flatness.

FIG. 5 is a graph showing the relationship between the breakdown electric field strength (E _BD ) of the AlO _X thin film and the substrate temperature.
In the case of no O ₃ support, the breakdown electric field strength (E _BD ) of the gate insulating film (AlO _X ) decreased at less than 400 ° C. On the other hand, when O _{3 was} supported, the breakdown electric field strength (E _BD ) did not decrease even at 340 ° C., and maintained a high value. Further, by supporting O ₃ as compared to the case without O ₃ support, an improvement in breakdown electric field strength (E _BD ) (> 7 MV / cm to> 8 MV / cm) was observed.
Furthermore, was also confirmed when using ammonia (NH ₃₎ instead of O _3, the effect was not observed so much.

FIG. 6 is a graph showing the bonding state in the AlO _X thin film by FT-IR.
In the case of no O ₃ support, vibration due to OH groups was confirmed at 350 ° C. or lower, but vibration due to OH groups was not observed at 350 ° C. with O ₃ support.

FIG. 7 is a graph showing the relationship between the relative dielectric constant (κ) of the AlO _X thin film and the substrate temperature.
The AlO _X thin film generally reported has a relative dielectric constant of about 6-9, but the AlO _X thin film produced by the above method has sufficiently maintained its characteristics.
In the case without O ₃ support, the relative dielectric constant (κ) is> 6, but in the case with O ₃ support, the relative dielectric constant (κ) is> 8, and the gate insulating film (AlO with the O ₃ support) An improvement in the dielectric constant of _X ) was observed.

The density of the AlO _X thin film was determined by X-ray reflectivity measurement. Table 2 below is a table showing the relationship between the density of the AlO _X thin film and the substrate temperature, and FIG. 8 is a graph thereof.
The density was high in the region where the substrate temperature was high, and the density was low in the region where the substrate temperature was low. That is, a correlation with the height of the breakdown electric field strength (E _BD ) was observed.
And further improvement in density was confirmed with O ₃ support.

<Evaluation of the effect of ozone support in the channel layer (active layer) formation process>
In order to evaluate the effect of ozone support in the channel layer (active layer) formation process, an indium gallium zinc oxide (IGZO) thin film was prepared. The fine channel type mist CVD system shown in FIG. 2 was used for the production of the IGZO thin film. The production conditions for the IGZO thin film are shown in Table 3 below.
The difference in characteristics depending on the presence or absence of O ₃ support during the formation of the IGZO thin film was evaluated.

FIG. 9 is a graph showing the electrical characteristics of the IGZO thin film.
When O ₃ comparing the case without the case with support, towards the case of the O ₃ support there is the electron density decreases. Moreover, although the fall of the mobility was also seen, it seems to be because the electron density is too low.
From this result, it is considered that the amount of impurities in the thin film is reduced by O ₃ support. When composition analysis (SIMS) was performed, it was confirmed that the impurity concentration in the thin film was reduced by O ₃ support. Table 4 below shows the results.

Example 1
First, a gate (chrome (Cr)) electrode having a film thickness of 50 nm was wired on a glass substrate Eagle-XG (manufactured by Corning) by a sputtering method (150 ° C.).
Next, a gate insulating film (AlO _X ) was formed on the substrate so as to cover the gate electrode by a mist CVD method under the manufacturing conditions shown in Table 5 below, and this gate insulating film (AlO _X ) was formed at 300 ° C. in an O ₃ atmosphere. For 5 minutes.

Next, a channel layer (active layer) (IGZO) was formed on the gate insulating film formed by the above method by mist CVD under the conditions shown in Table 6 below. Thereafter, a channel layer (active layer) was patterned with a photoresist. In addition, all the pattern formation by the process so far used wet etching. Thereafter, source / drain (indium tin oxide (ITO)) electrodes were wired by sputtering. At this time, the source / drain electrodes were patterned by a lift-off process.
Finally, in order to reduce the channel layer (active layer), heat treatment was performed at 350 ° C. for 1 hour in a mixed gas atmosphere of H ₂ and N ₂ (H ₂ (5%) + N ₂ ).

Example 2
In Example 1, a sample produced under the same conditions as Example 2 except that the mixing ratio of In, Ga, and Zn raw materials used as solutes was In: Ga: Zn = 3: 2: 2.

Comparative Example 1
In Example 1, O ₃ support was not performed in both the gate insulating film (AlO _X ) formation step and the channel layer (IGZO) formation step, and the surface treatment of the channel layer (IGZO) with O ₃ was not performed. A sample produced under the same conditions except that the substrate temperature in the step of forming the gate insulating film (AlO _X ) was 430 ° C. was set as Comparative Example 1.

Comparative Example 2
In Example 1, O ₃ support was not performed in both the gate insulating film (AlO _X ) forming step and the channel layer (IGZO) forming step, and the substrate temperature in the gate insulating film (AlO _X ) forming step was 430. A sample prepared under the same conditions except that the temperature was changed to ° C. was referred to as Comparative Example 2.

Comparative Example 3
A sample manufactured under the same conditions as Example 1 except that O ₃ support was not performed in the channel layer (IGZO) formation step was defined as Comparative Example 3.

  The transfer characteristics of the oxide TFTs of Example 1 and Comparative Example 1-3 are shown in Table 7 below. 10 is a graph showing the transfer characteristics of Comparative Example 1, FIG. 11 is a Comparative Example 2, FIG. 12 is a Comparative Example 3, and FIG.

Comparing Comparative Example 1 and Comparative Example 2, it can be seen that the hysteresis (ΔV _H ) is greatly reduced by performing the surface treatment of the gate insulating film with O ₃ .
Comparing Comparative Example 2 and Comparative Example 3, it can be seen that the mobility (μ) is improved by O ₃ support in the gate insulating film formation step.
Comparing Comparative Example 3 and Example 1, the mobility (μ), subthreshold coefficient (S), and hysteresis (ΔV _H ) are supported by O ₃ in both the gate insulating film forming step and the channel layer (active layer) forming step. ) Is improving.

FIG. 14 shows that the stress addition time and drain current of 1 nA can flow in Comparative Example 1 (without surface treatment of the gate insulating film with O ₃ ) and Comparative Example 2 (with surface treatment of the gate insulating film with O ₃ ). It is a graph which shows transition of various gate voltages. According to this result, an effect is seen in terms of reliability by the interface treatment with O ₃ .

FIG. 15 is a graph showing the relationship between the gate current / drain current and the gate voltage in the Inlet, Center, and Outlet portions of the fine channel (FC) mist CVD system. FIG. 16 is a diagram showing the locations of the Inlet (upstream), Center (center), and Outlet (downstream) portions. 30/45 and 45/45 in the right figure indicate W (width) / L (length) of the channel layer. FIG. 17 is a graph showing an in-plane composition distribution obtained by analyzing the IGZO thin film used in (a) Comparative Example 1, (b) Example 1, and (c) Example 2 by energy dispersive X-ray spectroscopy (EDS). It is.
The oxide TFT (Comparative Example 2) manufactured without O ₃ support has different characteristics from upstream to downstream. As shown in FIG. 17 (a), this is thought to be due to the occurrence of compositional irregularities from upstream to downstream when a fine channel (FC) is used. The fine channel (FC) can produce a homogeneous thin film when a single material is used. However, in the case of a multi-material such as this time, the location dependence of the composition cannot be avoided from the viewpoint of reaction.
On the other hand, in the case of O ₃ support there, seen location depends on the case of the O ₃ without assistance is no longer seen. This is considered to be because the composition unevenness is eliminated by using O ₃ as shown in FIGS. 17 (b) and 17 (c). It is the same even if the composition ratio is changed. The reason why composition unevenness is eliminated by using O ₃ is that O ₃ is adsorbed on the surface, or because the probability of adsorption to the surface of the raw material can be made uniform, it exists excessively in the reaction space. It is conceivable that the thin film growth reaction of the starting material can be suppressed. That is, it is considered that there is an effect of keeping the surface reaction rate of each component constant.

  The present invention is suitably used for a device for controlling display on a display. Current electronic devices are generally manufactured by a vacuum process. This technology is the first step in converting the thin film transistor fabrication process aimed at practical application to the atmospheric pressure process. Future technological innovations can be expected to be applied to various electronic devices and will be regarded as important. It is a patent.

1: Substrate 2: Gate electrode 3: Gate insulating film 4: Channel layer (active layer)
5: Source electrode 6: Drain electrode 10: Bottom gate type oxide thin film transistor

Claims (11)

Forming a gate electrode on the substrate;
From the metal oxide insulator on the substrate so as to cover the gate electrode while introducing ozone into the film formation chamber using a raw material solution in which a metal compound necessary for forming the metal oxide insulator is dissolved. Forming a gate insulating film,
Forming a channel layer made of a metal oxide semiconductor on the gate insulating film while introducing ozone into the film formation chamber using a raw material solution in which a metal compound necessary for forming the metal oxide semiconductor is dissolved; a method of producing an oxide thin film transistor Ru comprising at least,
In the step of forming the gate insulating film, an atomized raw material solution in which a metal compound necessary for forming a metal oxide insulator is dissolved is introduced in the vicinity of the substrate while introducing ozone into the film formation chamber. It is a step of forming a gate insulating film by reacting,
In the step of forming the channel layer, an atomized raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved is chemically reacted in the vicinity of the substrate while introducing ozone into the film formation chamber. By this, it is a process of forming a channel layer, The manufacturing method of an oxide thin-film transistor characterized by the above-mentioned. Forming a channel layer made of a metal oxide semiconductor on a substrate while introducing ozone into a film formation chamber using a raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved;
A gate insulating film made of a metal oxide insulator so as to cover the channel layer while introducing ozone into a film forming chamber using a raw material solution in which a metal compound necessary for forming the metal oxide insulator is dissolved Forming a step;
A process of forming a gate electrode on the gate insulating film, a method of manufacturing an oxide thin film transistor Ru comprising at least,
In the step of forming the gate insulating film, an atomized raw material solution in which a metal compound necessary for forming a metal oxide insulator is dissolved is introduced in the vicinity of the substrate while introducing ozone into the film formation chamber. It is a step of forming a gate insulating film by reacting,
In the step of forming the channel layer, an atomized raw material solution in which a metal compound necessary for forming a metal oxide semiconductor is dissolved is chemically reacted in the vicinity of the substrate while introducing ozone into the film formation chamber. By this, it is a process of forming a channel layer, The manufacturing method of an oxide thin-film transistor characterized by the above-mentioned. 3. The method of manufacturing an oxide thin film transistor according to claim 1, wherein the metal oxide semiconductor is a metal oxide semiconductor containing at least zinc (Zn) as a constituent element. The metal compound necessary for forming the metal oxide insulator is any one of an acetylacetonate compound, an acetic acid compound, a chloride, a sulfide, a nitric acid compound, an ammonium compound, and a carbonic acid compound. The manufacturing method of the oxide thin-film transistor in any one of Claim 1 thru | or 3 . A metal compound necessary for forming the metal oxide semiconductor is any one of an acetylacetonate compound, an acetic acid compound, a chloride, a sulfide, a nitric acid compound, an ammonium compound, and a carbonic acid compound. The manufacturing method of the oxide thin-film transistor in any one of Claims 1 thru | or 4 . A film forming chamber having a source gas inlet and a gas outlet and in which a substrate is disposed between the source gas inlet and the gas outlet, and a source gas supply means for supplying a source gas for forming a film And an energy supply means for supplying energy for forming a thin film, and forming a film on the surface of the substrate by flowing the source gas in a direction along the surface of the substrate. The distance from the inner wall is a predetermined distance in the range of 0.1 mm to 10.0 mm, and the velocity of the source gas flowing on the substrate surface in the film forming chamber is 0.4 m / sec to 4.0 m / sec. 6. The method of manufacturing an oxide thin film transistor according to claim 1, wherein a fine channel (FC) structure capable of achieving a predetermined speed in a range of 1 to 5 is used. The gate insulating film forming a step and / or the channel layer to form is, method of manufacturing an oxide thin film transistor according to any one of claims 1 to 6, characterized in that at atmospheric pressure. The step of forming the gate electrode and the step of forming the source / drain electrodes are performed by a method of forming a film by applying an atomized raw material solution or by causing a chemical reaction in the vicinity of the substrate and a photolithography method. A method for producing an oxide thin film transistor according to any one of claims 1 to 7 . The process and forming source and drain electrodes to form a gate electrode, a manufacturing method of an oxide thin film transistor according to any one of claims 1 to 7, characterized in that is carried out by a printing method. Production of an oxide thin film that forms a metal oxide thin film on a substrate while introducing ozone into a film forming chamber using an atomized raw material solution in which a metal compound necessary for forming the metal oxide thin film is dissolved A method,
A film forming chamber having a source gas inlet and a gas outlet and in which a substrate is disposed between the source gas inlet and the gas outlet, and a source gas supply means for supplying a source gas for forming a film And an energy supply means for supplying energy for forming a thin film, and forming a film on the surface of the substrate by flowing the source gas in a direction along the surface of the substrate. The distance from the inner wall is a predetermined distance in the range of 0.1 mm to 10.0 mm, and the velocity of the source gas flowing on the substrate surface in the film forming chamber is 0.4 m / sec to 4.0 m / sec. Using the fine channel (FC) structure capable of achieving a predetermined speed in the range of the above, the oxide thin film is formed in the presence of ozone to make the composition distribution in the surface of the oxide thin film uniform. Production of oxide thin film Method. The method for producing an oxide thin film according to claim 10, wherein the metal oxide is a multi-component metal oxide.